JP2821838B2 - Plasma display panel and manufacturing method thereof - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma display panel and a method of manufacturing the same, and more particularly, to a plasma display panel capable of preventing a barrier pattern from jumping at an end of a barrier and a method of manufacturing the same.

[0002]

2. Description of the Related Art A plasma display panel has a DC
Type and AC type. Figure 2 shows the plasma display panel.
FIG. 3 is a perspective view showing an example of a DC type basic unit of the
You. This DC type plasma display panel is
Back plate 1 on which a cathode electrode group (anode) 3 is formed, and a cathode
Two insulating plates of front plate 2 on which electrode group (cathode) 4 is formed
A structure in which a barrier 5 is provided inside 1 and 2 to form a discharge cell
Consists of That is, the anode electrodes crossing each other
The group 3 and the cathode electrode group 4 prevent light crosstalk from occurring between the electrodes, and the gap between the rear plate 1 and the front plate 2 is reduced.
A barrier 5 is provided for holding at a certain interval, and the barrier 5
Forming a discharge cell composed of more display cells and auxiliary cells,
A rare gas is sealed between the electrodes and formed on the back plate 1 and the front plate 2.
The intersection of the two electrode groups 3 and 4 is one pixel (display cell)
It corresponds to the configuration .

[0003] The plasma display panel is
At the time of discharge in a discharge space, gaseous gas atoms are excited by electrons, and the excited atoms return to a ground state to generate light. By the way, the lifetime of atoms in this excited state is about 10 ⁻⁸ sec, and some of them have a lifetime of about 1 to 10 msec. Collides with the structure, where it recombines and disappears. Excited atoms with a long life are easily ionized by the collision of electrons and generate ion electrons.Therefore, the more these atoms exist in space, the more easily ionization occurs, stabilizing the discharge and lowering the discharge voltage. It is effective. For this reason, the larger the discharge space becomes, the more advantageous it is. Therefore, it is expected that the pixel area is reduced and the discharge space is widened.

[0004] By the way, barriers definitive in such a variety of plasma display panel is, usually, a printing method or a sand
It is formed by blast method, but recently
There has been proposed a method of forming using a lithography method .
This photolithography method is a method in which a substance that senses light is applied to a substrate, a pattern for shielding the light energy is prepared in advance, and the energy that has passed through the shielding mask is irradiated onto a sample to form a pattern. It is. According to the barrier forming method, for example, the conventional printing
Compared with the method, a plasma display panel having a line width and a line interval of 100 μm or less and a barrier height of 100 μm or more can be obtained.

[0005] The barrier formation method of the plasma display panel by the photolithography method is a DC type.
To describe an example, as shown in FIG. 3, (see FIG. 3a) the step of coating the formed insulating substrate slip the electrodes for the barrier formation of a mixture of UV-curable resin to the ceramic powder, the coating layer The step (see FIG. 3b) of exposing only a portion necessary for barrier formation with an exposure mask and curing it (see FIG. 3b) once or several times to obtain a formation layer having a required height (see FIG. 3c). Step of developing and patterning the formed layer of No. to elute the non-exposed portion (see FIG. 3D), and baking the UV-cured portion (see FIG. 3E) .
And a method of forming a barrier through the following five steps.

[0006]

However, even in the case of the barrier forming method using the photolithography method , the following problems remain . That is, since the barrier pattern has a small line width, the adhesive force (adhesive area) with the substrate glass is weak, and when the barrier is baked, it cannot withstand the shrinkage in the length direction of the barrier line, and the pattern edge is not formed. The phenomenon of jumping may occur. The pattern is lost when the panel is sealed, and the missing pattern remains on the panel and crushes the pixels, thereby lowering the yield. And other issues.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and an object thereof is to provide a plasma display panel which prevents a jumping phenomenon of an end portion of a barrier pattern and has a good yield and a method of manufacturing the same. To provide.

[0008]

A plasma display panel according to a first aspect of the present invention as means for achieving the above object is provided in parallel with each other with a certain space therebetween.
And between the front insulating plate and the rear insulating plate arranged oppositely,
Provide two sets of electrodes that intersect and face each other, and both sets of electrodes
In orthogonal plasma display panel provided with barriers for forming a discharge cell to a portion between, has a configuration formed by providing an under glass layer on the longitudinal ends of the barrier.

A plasma display panel according to a second aspect of the present invention is the plasma display panel according to the first aspect.
In the panel, the deformation point of the glass composition of the under glass layer is set to a temperature equal to or lower than the deformation point of the glass composition forming the barrier.

Furthermore, the manufacturing method as claimed in claim 3 of the present invention has a structure that forms an under glass layer of claim 1 by the photo lithography method. The method of manufacturing a plasma display panel according to claim 4 of the present invention is the same as the method of manufacturing claim 3 of the present invention .
Thus, the under glass layer is formed simultaneously with the formation of the barrier.

[0011]

[Action] Plasma display panel and manufacturing method thereof of the present invention, since to form the under glass layer on the longitudinal ends of the barrier, upon firing when the barrier formation, the length of the barrier lines The under glass layer acts to suppress the shrinkage in the direction, so that the jump-up can be suppressed. Also, the yield point of the glass composition of the under glass layer,
When the temperature is equal to or lower than the yield point of the glass composition forming the barrier, the adhesiveness is improved, so that the jumping of the edge of the barrier pattern is further suppressed.

[0012]

Embodiments of the present invention will be described below with reference to the drawings. Here, FIG.
FIG. 9 is a schematic diagram showing an example of a longitudinal end portion of a barrier pattern on an anode electrode side panel (back plate) of a plasma display panel .

Embodiment 1 A plasma display panel of this embodiment and a method of manufacturing the same.
With respect to D shown in FIG.
A description will be given based on a C-type plasma display panel.
You. This plasma display panel is briefly described as follows.
An anode electrode 3 and a cathode electrode 4 are formed inside the back plate 1 and the front plate 2, a barrier 5 is formed between the electrodes 3 and 4, and a rare gas is sealed between the electrodes 3 and 4. The intersection of the two electrodes 3 and 4 corresponds to one pixel.

[0014] rear plate 1 and the front plate 2, an insulating substrate made of glass plate or the like, inside the rear plate 1, an anode electrode 3 is provided a plurality of parallel, also on the inside of the front plate 2 , A plurality of cathode electrodes 4 are provided so as to be orthogonal to the anode electrode 3. Here, for the anode electrode 3 and the cathode electrode 4, a conductive metal such as Ni, Cu, Ag, or Pd, or an alloy thereof is used, and a paste in which a small amount of glass is mixed with these metals is used. Further, as the cathode electrode 4, indium oxide,
Transparent electrode with tin oxide deposited (ITO electrode, Indiu
m-Tin-Oxide Abbreviation) it is more suitable to use a
doing.

Further, as the under-glass layer 7 Oyobi barrier 5, it has an insulating property and an insulating paste is densified by firing at about 450-700 ° C.. For example, SiO
₂ : 15% by weight, Al ₂ O ₃ : 20% by weight, Fe ₂ O
_{3:10 wt%,} Cr _{2 O} 3: 3 wt%, MnO:
7% by weight, CoO: 2% by weight, PbO: 35% by weight, B
_A slip was prepared by mixing 50 parts by weight of an ultraviolet curable resin and a solvent with 100 parts by weight of ceramic powder composed of ₂ O ₃ : 8% by weight. But this insulation pace
The plasma display panel is not limited to
Pages of any type and composition depending on the shape and form of the
A strike can be used.

[0016] Then, the end portion 6 of the barrier 5 which is formed on the inner side of the rear plate 1, an under glass layer 7 is provided between the rear plate 1. In addition, it is important that the underglass layer 7 has an underglass area larger than the area indicated by the product of the length a of the contact portion with the end 6 of the barrier 5 and the width e of the barrier.

That is, the dimension is preferably such that the contact length a between the under glass layer 7 and the barrier 5 is 50 μm or more. If the contact length a is too short, the effect of suppressing the jump of the barrier end portion 6 is small. If the contact length a is too long, only the display area is reduced, which is not effective. Optimal contact length a
Was 100 μm to 2 mm. The thickness b of the under glass layer 7 needs to be 5 μm to 100 μm. If it is too thin, it will not be effective in suppressing the jumping, and if it is too thick, the step of the barrier 5 on the under glass layer 7 will become large during firing, and the barrier 5 will be crushed when the rear panel 2 is sealed. But not preferred. The optimal thickness is 10 μm
30 μm is required. Also, the width c of the under glass layer 7
Has no problem if the width of ca is 0 μm or more. If it is shorter than this, there is no effect in suppressing the jump of the end portion 6 of the barrier 5, and if it is too long, it is not effective because the size of the panel is increased only. The optimum ca was 20 μm to 2 mm. There is no problem if the length d of the under glass layer 7 is equal to or larger than the barrier width e. If it is shorter than this, there is no effect in suppressing the jump of the end 6 of the barrier 5. The optimum de is 20 μm or more, and may be a continuous one that straddles each of the barriers 5, 5,.

The under glass layer 7 and the barrier 5 in this embodiment are specifically formed by the following steps. That is, a glass powder, printing the ceramic powder or the like, a paste obtained by mixing an organic binder and a solvent to the inner end of the rear plate 1 which is formed of the anode electrode 3 in a thick film printing method, 520 ° C.
And the under glass layer 7 is obtained. Next, the barrier 5 is formed by a photolithography method. Here, the barrier 5 is formed by laminating such that the end portion straddles the under glass layer 7. The ultraviolet-cured barrier forming portion is fired at 520 ° C. to form the barrier 5. Is formed through the above steps.

In this embodiment, the anode electrode 3
The under glass layer 7 is formed at the longitudinal end of the barrier 5 formed between the barrier electrode 5 and the cathode electrode 4. The glass layer 7 acts so that it can be suppressed.

Embodiment 2 The plasma display panel of this embodiment and the method of manufacturing the same are the same as those of Embodiment 1 described above except that the under-glass layer 7 is used.
Is a configuration using an insulating paste whose deformation point of the glass composition is lower than the deformation point of the glass composition forming the barrier 5. Here, as the under glass layer 7, SiO ₂ :
18% by weight, Al ₂ O ₃ : 2% by weight, Fe ₂ O ₃ : 10
_Wt%, Cr _{2 O} 3: 3 wt%, MnO: 7 wt%, C
oO: 2 wt%, PbO: 46 _{wt%, B 2} O 3: 12
Wt% Tona Rousset ceramic powder: 100 parts by weight of the ultraviolet curable resin were mixed 50 parts by weight and the solvent used after the slip, as a barrier 5, are used the same as in Example 1.

In this embodiment, since the under glass layer 7 has a lower bending point than the barrier end 5, the adhesion state is improved, and the under glass layer 7 acts to further prevent the barrier end 5 from jumping up. .

Next, in order to confirm the operation and effect of the above-described first and second embodiments, an evaluation test was conducted on the jumping of the barrier end. Table 1 shows the results. In order to confirm the optimal dimensions of the under glass layer 7 and the barrier contact portion, the dimensions and shapes were changed (Comparative Examples 1 to 5).
4) and the conventional example were also evaluated.

[0023]

[Table 1]

Then, as shown in Table 1, Examples 1 and 2
No jump was observed for Comparative Examples 1 to 4 and the conventional example, but the presence of a jump was recognized. Particularly, for the conventional example, the jump was large and it was difficult to use. That was confirmed.

With respect to the dimensions of the under glass layer 7 and the barrier contact portion, the following was confirmed. That is, the contact length a between the under glass layer 7 and the barrier 5 is 5
If the thickness is 0 μm or less, the barrier edge is not sufficiently suppressed from rising, and if it is 2.1 mm or more, the display area is reduced. When the thickness b of the under glass layer 7 is 4 μm or less, it has no effect on suppressing the barrier jumping up,
In the case of m or more, the step of the barrier on the under glass layer becomes large at the time of sintering, and problems such as crushing of the barrier at the time of sealing the insulating plate easily occur. The width c of the under glass layer 7 is preferably such that the difference between the width c and the contact length a is in the range of 20 μm to 2 mm. The length d of the under glass layer 7 may have a difference between the length and the width of the contact portion of 20 μm or more, and may be continuous over each barrier.

It should be noted that the present invention is not limited to the above-described embodiment, but includes a configuration that can be modified and implemented without changing the gist of the present invention. In the above-described embodiment, the configuration in which the barrier is formed on the insulating plate on the anode electrode side has been described. For example, the configuration in which an under glass layer is formed on the insulating plate on the cathode electrode side and the barrier is formed thereon It may be. In each of the embodiments described above, the plasma
DC type plasma as shown in Fig. 1 as a spray panel
Explained when applied to display panels
Is not limited to this type,
Applicable to various types of plasma display panels
Wear. Further, in the above-described embodiment, the barrier is formed by photolithography.
As described in the case of forming by the luffy method, the barrier is
It can be formed by the general method used from
Is natural.

[0027]

As apparent from the above description, according to the flop plasma display panel of claim 1 of the present invention, prior to
Since forming the under-glass layer in the longitudinal ends of the serial barrier, upon firing of the barrier, the shrinkage in the longitudinal direction of the barrier line, by the under-glass layer, that the jump can be suppressed Has an effect .

The plasma display according to claim 2 of the present invention.
According to the play panel, the deformation point of the glass composition of the under glass layer is set to a temperature equal to or lower than the deformation point of the glass composition forming the barrier.
In addition, since the adhesion is improved, there is an effect that the jumping of the end of the barrier pattern can be further suppressed.

[0029] The plasma display according to claim 3 of the present invention.
According to the panel manufacturing method, the under glass layer
Since it is formed by the lithographic method, the barrier
Optimal contact length and optimal thickness for preventing undercut
This has the effect that the lath layer can be formed accurately. Also book
According to the manufacturing method of the fourth aspect of the invention, the under glass layer
And barrier formation at the same time.
Has the effect of improving the adhesion of
You.

[Brief description of the drawings]

FIG. 1 shows an embodiment of the present invention and is a schematic configuration diagram of a longitudinal end portion of a barrier pattern on an anode side panel.

FIG. 2 shows a DC type panel of a plasma display panel.
It is a schematic diagram which shows the basic unit of an example of a plasma display panel .

3 is an explanatory view for explaining a process of performing a barrier formed by the photo lithography method.

[Explanation of symbols]

1 ... rear plate, 2 ... front plate, 3 ... anode electrode, 4 ... cathode electrode, 5 ... barrier, end of 6 ... barrier, 7 ... under-glass layer , A: contact length, b: thickness of under glass layer, c: width of under glass layer, d: length of under glass layer, e
... Barrier width

──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. ⁶ , DB name) H01J 11/00-17/64 H01J 9/02

Claims (4)

(57) [Claims] 1. A pair of parallel and mutually spaced apart spaces .
Opposing between the front and rear insulation plates
Two electrode groups that intersect with each other
A plasma display panel provided with a barrier for forming a discharge cell at an intersecting portion, wherein an under glass layer is provided at a longitudinal end of the barrier. 2. The plasma display panel according to claim 1, wherein the deformation point of the glass composition of the under-glass layer has a temperature equal to or lower than the deformation point of the glass composition forming the barrier. 3. The method for manufacturing a plasma display panel according to claim 1, wherein the under glass layer according to claim 1 is formed by a photolithography method. 4. The method according to claim 3, wherein the under-glass layer is formed simultaneously with the formation of the barrier.