JP2834359B2 - Soft magnetic alloy film - Google Patents
Soft magnetic alloy filmInfo
- Publication number
- JP2834359B2 JP2834359B2 JP4060737A JP6073792A JP2834359B2 JP 2834359 B2 JP2834359 B2 JP 2834359B2 JP 4060737 A JP4060737 A JP 4060737A JP 6073792 A JP6073792 A JP 6073792A JP 2834359 B2 JP2834359 B2 JP 2834359B2
- Authority
- JP
- Japan
- Prior art keywords
- flux density
- magnetic flux
- soft magnetic
- alloy
- alloy film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910001004 magnetic alloy Inorganic materials 0.000 title claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 22
- 239000013078 crystal Substances 0.000 claims description 19
- 229910052689 Holmium Inorganic materials 0.000 claims description 8
- 229910052775 Thulium Inorganic materials 0.000 claims description 8
- 229910052742 iron Inorganic materials 0.000 claims description 8
- 230000005415 magnetization Effects 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 2
- 239000010941 cobalt Substances 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical group [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 2
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 claims description 2
- 230000004907 flux Effects 0.000 description 27
- 229910045601 alloy Inorganic materials 0.000 description 18
- 239000000956 alloy Substances 0.000 description 18
- 239000010409 thin film Substances 0.000 description 17
- 239000010408 film Substances 0.000 description 13
- 229910017061 Fe Co Inorganic materials 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 229910052761 rare earth metal Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 239000011162 core material Substances 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 230000003993 interaction Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 150000002910 rare earth metals Chemical class 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052723 transition metal Inorganic materials 0.000 description 2
- 150000003624 transition metals Chemical class 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910017112 Fe—C Inorganic materials 0.000 description 1
- 229910001106 Ho alloy Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000013590 bulk material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005090 crystal field Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F10/00—Thin magnetic films, e.g. of one-domain structure
- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/126—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing rare earth metals
Landscapes
- Magnetic Heads (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Thin Magnetic Films (AREA)
Description
【０００１】[0001]
【産業上の利用分野】本発明は、高密度記録用磁気ヘッ
ド等に適した飽和磁束密度の高い軟磁性合金膜に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a soft magnetic alloy film having a high saturation magnetic flux density suitable for a magnetic head for high density recording and the like.
【従来の技術】近年、磁気記録の分野では、その高密度
化が強く要求されている。これに伴い記録媒体上の記録
波長が短くなり、それによる反磁界に抗して記録パター
ンを安定に保持するために、より高い保磁力（Ｈc）の
媒体が用いられるようになっている。このような媒体に
記録するためには、ギャップから強力な磁界を発生する
磁気ヘッドが必要であり、そのコア材料として高い飽和
磁束密度のものが必要とされる。一方、記録再生兼用磁
気ヘッドの場合、媒体からの微小磁界を効率よく検出す
るために、コアの初透磁率（μ）も高いことが要求され
る。ところで、磁気ヘッドの記録効率を上げるにはギャ
ップ部の磁界分布を急峻にすることが有効であり、これ
に適した磁気ヘッドとして、薄膜ヘッド、及び高飽和磁
束密度薄膜をギャップ近傍にのみ配したメタル イン ギ
ャップ（ＭＩＧ）型ヘッドが挙げられる。尚、上記のよ
うな線記録密度の向上とは別に、トラック密度の向上
も、面記録密度の向上に重要であり、ヘッドの狭トラッ
ク化が推進されている。ヘッドを狭トラックに加工する
にはフォトリソグラフィーによる加工が行われる薄膜ヘ
ッドが有利である。また、薄膜ヘッドは高周波化にも有
利な形状である。このように、磁気ヘッドのコア材料と
しては、高飽和磁束密度かつ良好な軟磁気特性のものを
薄膜という形で得ることが強く要求されている。2. Description of the Related Art In recent years, in the field of magnetic recording, higher density has been strongly demanded. Accordingly, the recording wavelength on the recording medium is shortened, and a medium having a higher coercive force (Hc) has been used in order to stably maintain the recording pattern against a demagnetizing field caused thereby. To record on such a medium, a magnetic head that generates a strong magnetic field from the gap is required, and a core material having a high saturation magnetic flux density is required. On the other hand, in the case of a recording / reproducing magnetic head, the core must also have a high initial magnetic permeability (μ) in order to efficiently detect a minute magnetic field from the medium. In order to increase the recording efficiency of the magnetic head, it is effective to make the magnetic field distribution in the gap portion steep. As a suitable magnetic head, a thin film head and a high saturation magnetic flux density thin film are arranged only in the vicinity of the gap. Metal-in-gap (MIG) type heads are mentioned. In addition to the above-described improvement in the linear recording density, the improvement in the track density is also important for the improvement in the areal recording density. In order to process the head into a narrow track, a thin film head processed by photolithography is advantageous. Further, the thin film head has a shape that is advantageous for high frequency operation. As described above, it is strongly demanded that the core material of the magnetic head has a high saturation magnetic flux density and good soft magnetic properties in the form of a thin film.
【０００２】[0002]
【発明が解決しようとする課題】高飽和磁束密度の薄膜
としてはＦｅを主成分とするものが種々提案されてい
る。例えば、Ｆｅを主成分とする結晶粒を著しく微細に
することにより（実効的な結晶磁気異方性の低減）、良
好な軟磁気特性を得た例として本発明者等は特願平１−
２７８２２０号，特願平１−２９８８２９号などを出願
している。これらの飽和磁束密度の上限は約１８kＧで
あった。また、純鉄を何らかの方法で軟磁性化したとし
ても、その飽和磁束密度は２１.５kＧである。将来的
に、より一層の高記録密度化を考えた場合、さらに高い
飽和磁束密度が要求されてくると予想される。Ｃｏ（１
０〜７０ａｔ％）を含むＦｅ−Ｃｏ合金はＦｅよりも高
い飽和磁束密度を有し、中でもＦｅ−Ｃｏ（Ｃｏ；４０
ａｔ％）合金は２４.２kＧ（室温）もの飽和磁束密度を
有することが知られている。２４.０kＧの飽和磁束密度
を有するＦｅ−Ｃｏ（Ｃｏ；５０ａｔ％）合金はパーメ
ンジュール（Permendur）と呼ばれ、バルクの材料とし
て既に実用化されている。しかし、薄膜としてこの合金
を作製した場合、良好な軟磁気性特性を得ることは極め
て困難である。これは、Ｆｅ−Ｃｏ合金が＋８×１０-5
もの大きな磁歪を有することに起因している。即ち、ス
パッタ、蒸着等の薄膜形成プロセスにより作製された薄
膜には、１０8〜１０10dyn/cm2の内部応力が存在し、こ
れをゼロにすることは現実的には不可能に近いため、こ
の応力による逆磁歪効果で、薄膜を構成する各結晶には
大きな磁気異方性を生じることになる。多結晶体である
薄膜ではこのような異方性の分散（不均質性）が顕著と
なり、スムーズな磁化の反転が行われなくなり、軟磁気
特性が得られなくなってしまう。このような異方性は極
めて大きなものなので、結晶の微細化により、これを軽
減したとしても、実用に供し得るほどの軟磁気特性を得
ることは難しい。これを解決するにはＦｅ−Ｃｏ合金結
晶の持つ磁歪を低減することが必要である。その方法と
してはＳｉやＡｌを多量に添加することが既に提案され
ている。（論文 N.Tsuya、K.Arai、K.Ohmori、and T.Ho
nma :IEEE Trans.Magn、MAG-18（1982）1424.，M.Hayak
awa、K.Hayasi、W.Ishiwata,Y.Ochiai、M.Matsuda、Y.I
wasaki and K.Aso:IEEE Trans. Magn. MAG-23（1987）3
092.など）しかし、これら非磁性元素の多量の添加によ
り、飽和磁束密度は２０kＧを切るため、Ｆｅ系薄膜に
対する優位性はあまりなかった。Various thin films having Fe as a main component have been proposed as high saturation magnetic flux density thin films. For example, the present inventors have obtained an example of obtaining excellent soft magnetic properties by remarkably reducing the crystal grains containing Fe as a main component (effective reduction of crystal magnetic anisotropy).
278220 and Japanese Patent Application No. 1-298829. The upper limit of the saturation magnetic flux density was about 18 kG. Even if pure iron is softened by any method, its saturation magnetic flux density is 21.5 kG. In the future, in order to further increase the recording density, it is expected that a higher saturation magnetic flux density will be required. Co (1
(0-70 at%) has a higher saturation magnetic flux density than Fe.
at%) alloys are known to have a saturation magnetic flux density as high as 24.2 kG (room temperature). An Fe—Co (Co; 50 at%) alloy having a saturation magnetic flux density of 24.0 kG is called “permendur” and has already been put to practical use as a bulk material. However, when this alloy is manufactured as a thin film, it is extremely difficult to obtain good soft magnetic properties. This is because the Fe—Co alloy is + 8 × 10 −5.
This is due to having a large magnetostriction. That is, a thin film produced by a thin film forming process such as sputtering or vapor deposition has an internal stress of 10 8 to 10 10 dyn / cm 2 , and it is practically impossible to reduce this to zero. Due to the inverse magnetostriction effect caused by this stress, a large magnetic anisotropy occurs in each crystal constituting the thin film. In a polycrystalline thin film, such anisotropic dispersion (heterogeneity) becomes remarkable, so that smooth magnetization reversal is not performed and soft magnetic characteristics cannot be obtained. Since such anisotropy is extremely large, it is difficult to obtain soft magnetic characteristics that can be put to practical use even if the anisotropy is reduced by crystal refinement. In order to solve this, it is necessary to reduce the magnetostriction of the Fe—Co alloy crystal. As a method therefor, it has already been proposed to add a large amount of Si or Al. (Papers N. Tsuya, K. Arai, K. Ohmori, and T. Ho
nma: IEEE Trans.Magn, MAG-18 (1982) 1424., M. Hayak
awa, K. Hayashi, W. Ishiwata, Y. Ochiai, M. Matsuda, YI
wasaki and K. Aso: IEEE Trans. Magn. MAG-23 (1987) 3
However, since the saturation magnetic flux density is less than 20 kG by adding a large amount of these nonmagnetic elements, there is little advantage over the Fe-based thin film.
【０００３】本発明は、上記の問題点を解決し、Ｆｅ−
Ｃｏ合金の高い飽和磁束密度を保ちつつＦｅ−Ｃｏ合金
結晶のもつ本質的な磁歪を低減し、軟磁性を有する薄膜
を得ることを可能とするものである。[0003] The present invention solves the above-mentioned problems and provides Fe-
The object is to reduce the essential magnetostriction of the Fe—Co alloy crystal while maintaining the high saturation magnetic flux density of the Co alloy, and to obtain a thin film having soft magnetism.
【０００４】[0004]
【課題を解決するための手段】請求項１記載の軟磁性合
金膜は、Ｆｅx Ｃｏy Ｒz （Ｆｅ：鉄，Ｃｏ：コバル
ト，Ｒ：Ｈｏ（ホルミウム）及び又はＴｍ（ツリウ
ム））なる組成を有し、体心立方構造の結晶からなるこ
とを特徴とするものである。 但し、３０ａｔ％≦x≦９５ａｔ％ （ａｔ％＝原子パ
ーセント） ５ａｔ％≦y≦７０ａｔ％ ０.１ａｔ％≦z≦５ａｔ％The soft magnetic alloy film according to the present invention has a composition of Fex Coy Rz (Fe: iron, Co: cobalt, R: Ho (holmium) and / or Tm (thulium)). And a crystal having a body-centered cubic structure. However, 30 at% ≤ x ≤ 95 at% (at% = atomic percent) 5 at% ≤ y ≤ 70 at% 0.1 at% ≤ z ≤ 5 at%
【０００５】請求項２に記載の発明は、結晶粒の平均粒
径が４０ｎｍ以下であることを特徴とする請求項１に記
載の高飽和磁化軟磁性合金膜である。According to a second aspect of the present invention, there is provided the high saturation magnetization soft magnetic alloy film according to the first aspect, wherein the average grain size of the crystal grains is 40 nm or less.
【０００６】平衡状態において、ＨｏやＴｍ等の希土類
金属はＦｅやＣｏにほとんど固溶しないが、スパッタや
蒸着等の、いわゆる気相急冷プロセスにより、強制的に
固溶させる（非平衡相を形成する）ことが可能である。
異なる結晶構造の化合物が析出した場合、飽和磁化等の
性質が大きく変化してしまうが、この場合、高い飽和磁
化を有するＦｅ−Ｃｏの体心立方格子（ｂｃｃ）構造を
有したままＨｏやＴｍを少量固溶させることができる。
合金膜の作製には真空蒸着あるいは、ＲＦ２極スパッ
タ、マグネトロンスパッタ、３極スパッタ、イオンビー
ムスパッタ、対向ターゲット型スパッタ等の既存の薄膜
作製装置を用いることができる。In the equilibrium state, rare earth metals such as Ho and Tm hardly form a solid solution in Fe or Co, but are forcibly dissolved in a so-called gas phase quenching process such as sputtering or vapor deposition (formation of a non-equilibrium phase). It is possible.
When a compound having a different crystal structure precipitates, properties such as saturation magnetization change greatly. In this case, Ho or Tm is retained while maintaining a body-centered cubic lattice (bcc) structure of Fe—Co having high saturation magnetization. Can be dissolved in a small amount.
For the production of the alloy film, an existing thin film production apparatus such as vacuum deposition, RF bipolar sputtering, magnetron sputtering, tripolar sputtering, ion beam sputtering, and facing target type sputtering can be used.
【０００７】[0007]
【作用】磁歪の本質的な原因は、電子のスピン間の相互
作用が関与している。即ち、結晶構造が変らない場合、
異なる電子状態を持つ元素が固溶すると、スピン間の相
互作用が変化して磁歪が変化する。このような効果が大
きいことが期待できる元素として希土類金属が考えられ
る。希土類金属は３ｄ遷移金属と異なり、軌道磁気モー
メントが生きている（３ｄ遷移金属はスピン磁気モーメ
ントのみ）ので、軌道に伴う異方的な電子雲と格子を構
成する原子の電子との静電的な相互作用がある。このよ
うな結晶場の中での磁性イオンの軌道の振舞いから磁気
異方性を説明するモデルとして一イオンモデルがある
が、同様なメカニズムで磁歪の変化も期待できる。この
ような観点に立ち、本発明者らは、鋭意研究を重ねた結
果、希土類元素の中で、特にＨｏとＴｍがＦｅ−Ｃｏの
磁歪を際立たせて低減させる効果を有することを見出し
た。ここで、Ｈｏ及び又はＴｍの濃度（ｚ）は０.１ａ
ｔ％以上でないと、その効果が明確にあらわれない。ま
たＨｏ及び又はＴｍを５ａｔ％以上添加すると、体心立
方構造単相状態を維持することができなくなり、非晶質
相が混在するようになって、飽和磁束密度が低下してく
る。尚、本発明の合金膜においては、大部分が体心立方
構造であればよく、部分的には体心立方構造でなくとも
良い。また、ＦｅxＣｏyＲzにおいて、３０≦x≦９５ａ
ｔ％、５≦ｙ≦７０ａｔ％としたのは、Ｆｅより高い飽
和磁束密度を得るためである。ところで、既に述べたよ
うにＨｏやＴｍはＦｅやＣｏには平衡状態では非固溶で
ある。このような非固溶物質を強制固溶させた場合、結
晶粒が微細化することが知られている。このような微細
化によって、上記の磁歪の低減効果と相まって、実効的
な異方性をより低下させることにより、より良好な軟磁
気特性を得ることができる。尚、結晶粒径が４０ｎｍよ
り大きいときは、このような実効的な異方性低減効果は
現われない。また、このような結晶の微細化を更に促進
するには、成膜時に基板をイオン照射すること、あるい
は基板を冷却すること等が有効である。The essential cause of magnetostriction is the interaction between electron spins. That is, if the crystal structure does not change,
When elements having different electronic states form a solid solution, the interaction between spins changes and magnetostriction changes. Rare earth metals can be considered as elements that can be expected to have a large effect as described above. Unlike the 3d transition metal, the rare earth metal has an orbital magnetic moment that is alive (the 3d transition metal has only a spin magnetic moment), so that the anisotropic electron cloud accompanying the orbit and the electrons of the atoms constituting the lattice are electrostatically charged. Interaction. There is a one-ion model as a model for explaining magnetic anisotropy from the behavior of orbits of magnetic ions in such a crystal field, but a change in magnetostriction can be expected by a similar mechanism. From such a viewpoint, the present inventors have conducted intensive studies and, as a result, have found that, among rare earth elements, Ho and Tm in particular have an effect of prominently reducing the magnetostriction of Fe—Co. Here, the concentration (z) of Ho and / or Tm is 0.1a.
If it is not at least t%, the effect will not be apparent. If Ho and / or Tm is added at 5 at% or more, the body-centered cubic single-phase state cannot be maintained, and the amorphous phase is mixed, resulting in a decrease in the saturation magnetic flux density. In addition, in the alloy film of the present invention, it is sufficient that most of the alloy film has a body-centered cubic structure, and it is not necessary to partially have the body-centered cubic structure. In FexCoyRz, 30 ≦ x ≦ 95a
The reason for setting t% and 5 ≦ y ≦ 70 at% is to obtain a higher saturation magnetic flux density than Fe. By the way, as already described, Ho and Tm are insoluble in Fe and Co in an equilibrium state. It is known that when such a non-solid solution material is forcibly dissolved, crystal grains are refined. Such miniaturization, combined with the above-described effect of reducing magnetostriction, further reduces the effective anisotropy, so that better soft magnetic characteristics can be obtained. When the crystal grain size is larger than 40 nm, such an effective anisotropy reduction effect does not appear. In order to further promote the miniaturization of such crystals, it is effective to irradiate the substrate with ions during film formation, or to cool the substrate.
【０００８】[0008]
【実施例】ＤＣ三極高速スパッタ装置を用い、水冷した
銅基板上にＦｅ−Ｃｏ−Ｒ合金膜（ＲはＨｏ又はＴｍで
ある）を成膜した。合金ターゲットはアーク溶解により
作製した。スパッタ時のＡｒガス圧は４.２×１０-2Ｔ
ｏｒｒ．、ターゲット電圧１kＶとした。EXAMPLE An Fe--Co--R alloy film (R is Ho or Tm) was formed on a water-cooled copper substrate using a DC triode high-speed sputtering apparatus. The alloy target was produced by arc melting. Ar gas pressure during sputtering is 4.2 × 10 -2 T
orr. , And a target voltage of 1 kV.
【０００９】また、各種組成の軟磁性合金膜の磁歪と飽
和磁束密度の測定値を表１に示す。磁歪の測定は、基板
から剥離した合金膜に歪ゲージを貼り付けて行なった。
飽和磁束密度は振動試料型磁力計により測定した。結晶
構造はＸ線回折により同定した。Table 1 shows the measured values of the magnetostriction and the saturation magnetic flux density of the soft magnetic alloy films having various compositions. The measurement of magnetostriction was performed by attaching a strain gauge to the alloy film separated from the substrate.
The saturation magnetic flux density was measured by a vibrating sample magnetometer. The crystal structure was identified by X-ray diffraction.
【００１０】[0010]
【表１】 [Table 1]
【００１１】表１から、Ｈｏ又はＴｍを添加すること
で、磁歪を低減させることができることがわかる。そし
て、本実施例のサンプルＮｏ．〜及び，は磁歪
が小さいにもかかわらず、純鉄の飽和磁束密度（２１.
５ｋＧ）よりも大きい飽和磁束密度を有している。しか
しながら、比較例であるサンプルＮｏ．のように、Ｈ
ｏの濃度が５at％を超えると、磁歪が負の範囲で大きく
なり過ぎるばかりでなく、飽和磁束密度が著しく低下し
てしまう。これは、Ｈｏの濃度が高過ぎると、体心立方
構造が崩れ、キュリー温度の低い非晶質相が混在してく
るためと考えられる。（尚、比較例Ｎｏ．以外の合金
膜の結晶構造は体心立方構造であった。）From Table 1, it can be seen that magnetostriction can be reduced by adding Ho or Tm. Then, in the sample No. And, despite the small magnetostriction, the saturation flux density of pure iron (21.
5 kG). However, the sample No. Like, H
When the concentration of o exceeds 5 at%, not only the magnetostriction becomes too large in the negative range, but also the saturation magnetic flux density is significantly reduced. This is considered to be because if the concentration of Ho is too high, the body-centered cubic structure collapses and an amorphous phase having a low Curie temperature is mixed. (The crystal structure of the alloy films other than Comparative Example No. was a body-centered cubic structure.)
【００１２】図１にＨｏが０.５ａｔ％の合金膜の飽和
磁束密度のＦｅ：Ｃｏ比による変化を示した。この合金
は体心立方構造の結晶組織を有しており、Ｈｏを含まな
いバルクのＦｅ−Ｃｏ合金（比較例；破線）と比較して
も飽和磁束密度の低下は大きくなく、図１に示すＣｏの
含有量比が５原子％以上７０原子％以下であるＦｅ−Ｃ
ｏ−Ｈｏ合金は、純鉄の飽和磁束密度である２１.５ｋ
Ｇよりも大きい十分な飽和磁束密度を有している。ま
た、この合金の結晶粒の粒径をＸ線回折のピークの半値
幅から求めたところ、３０nm以下であった。FIG. 1 shows the change in the saturation magnetic flux density of the alloy film with Ho of 0.5 at% depending on the Fe: Co ratio. This alloy has a crystal structure of a body-centered cubic structure, and the saturation magnetic flux density is not significantly reduced as compared with a bulk Fe-Co alloy containing no Ho (a comparative example; broken line), and is shown in FIG. Fe—C having a Co content ratio of 5 atomic% or more and 70 atomic% or less
The o-Ho alloy has a saturation magnetic flux density of pure iron of 21.5 k.
It has a sufficient saturation magnetic flux density larger than G. The grain size of the crystal grains of this alloy was found to be 30 nm or less when determined from the half width of the peak of the X-ray diffraction.
【００１３】[0013]
【発明の効果】本発明の軟磁性合金膜は、Ｈｏ及び又は
Ｔｍの少量添加により体心立方構造を有し、高飽和磁束
密度を有したまま磁歪が低減されたものである。これよ
り純鉄（Ｂs＝２１.５kＧ）よりも高い飽和磁束密度の
薄膜の軟磁性化が可能となる。このような非常に高い飽
和磁束密度を有する薄膜を磁気ヘッドに応用した場合、
微小トラック及び微小ギャップから強力な磁界を発生す
ることが可能になり、今後のより一層の高密度磁気記録
に適した磁気ヘッドを提供することができる。The soft magnetic alloy film of the present invention has a body-centered cubic structure by adding a small amount of Ho and / or Tm, and has a reduced magnetostriction while maintaining a high saturation magnetic flux density. This makes it possible to soften a thin film having a higher saturation magnetic flux density than pure iron (Bs = 21.5 kG). When a thin film having such a very high saturation magnetic flux density is applied to a magnetic head,
A strong magnetic field can be generated from the minute track and the minute gap, and a magnetic head suitable for higher density magnetic recording in the future can be provided.
【図１】合金中のＣｏ比に対する飽和磁束密度の関係を
示すグラフである。FIG. 1 is a graph showing a relationship between a Co ratio in an alloy and a saturation magnetic flux density.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭64−8606（ＪＰ，Ａ) (58)調査した分野(Int.Cl.6，ＤＢ名) H01F 10/16 C22C 38/00 303 G11B 5/31──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-64-8606 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) H01F 10/16 C22C 38/00 303 G11B 5 / 31
Claims (2)
コバルト，Ｒ：Ｈｏ（ホルミウム）及び又はＴｍ（ツリ
ウム））なる組成を有し、体心立方構造の結晶からなる
ことを特徴とする高飽和磁化軟磁性合金膜。 但し、 ３０ａｔ％≦x≦９５ａｔ％ （ａｔ％＝原子
パーセント） ５ａｔ％≦y≦７０ａｔ％ ０.１ａｔ％≦z≦５ａｔ％1. Fex Coy Rz (Fe: iron, Co:
A high saturation magnetization soft magnetic alloy film having a composition of cobalt, R: Ho (holmium) and / or Tm (thulium), and comprising a body-centered cubic crystal. However, 30 at% ≦ x ≦ 95 at% (at% = atomic percent) 5 at% ≦ y ≦ 70 at% 0.1 at% ≦ z ≦ 5 at%
ことを特徴とする請求項１に記載の高飽和磁化軟磁性合
金膜。2. The high saturation magnetization soft magnetic alloy film according to claim 1, wherein the average grain size of the crystal grains is 40 nm or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4060737A JP2834359B2 (en) | 1992-03-17 | 1992-03-17 | Soft magnetic alloy film |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4060737A JP2834359B2 (en) | 1992-03-17 | 1992-03-17 | Soft magnetic alloy film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0653040A JPH0653040A (en) | 1994-02-25 |
| JP2834359B2 true JP2834359B2 (en) | 1998-12-09 |
Family
ID=13150878
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4060737A Expired - Fee Related JP2834359B2 (en) | 1992-03-17 | 1992-03-17 | Soft magnetic alloy film |
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| Country | Link |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP3182399B2 (en) * | 1997-09-17 | 2001-07-03 | 株式会社東芝 | Soft magnetic alloy film and manufacturing method thereof, magnetic head, and magnetic disk |
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| JPH0653040A (en) | 1994-02-25 |
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