Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP2840164B2 - Quartz glass boat and its manufacturing method - Google Patents
[go: Go Back, main page]

JP2840164B2 - Quartz glass boat and its manufacturing method - Google Patents

Quartz glass boat and its manufacturing method

Info

Publication number
JP2840164B2
JP2840164B2 JP24600892A JP24600892A JP2840164B2 JP 2840164 B2 JP2840164 B2 JP 2840164B2 JP 24600892 A JP24600892 A JP 24600892A JP 24600892 A JP24600892 A JP 24600892A JP 2840164 B2 JP2840164 B2 JP 2840164B2
Authority
JP
Japan
Prior art keywords
quartz glass
boat
quartz
wafer
glass boat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP24600892A
Other languages
Japanese (ja)
Other versions
JPH076975A (en
Inventor
恭一 稲木
雅明 青山
直樹 山田
博至 木村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Quartz Products Co Ltd
Original Assignee
Shin Etsu Quartz Products Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17142090&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=JP2840164(B2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Shin Etsu Quartz Products Co Ltd filed Critical Shin Etsu Quartz Products Co Ltd
Priority to JP24600892A priority Critical patent/JP2840164B2/en
Publication of JPH076975A publication Critical patent/JPH076975A/en
Application granted granted Critical
Publication of JP2840164B2 publication Critical patent/JP2840164B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Surface Treatment Of Glass (AREA)
  • Joining Of Glass To Other Materials (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体熱処理用石英ガ
ラスボート、特にライフタイム劣化の少ない石英ガラス
ボートに関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a quartz glass boat for heat treatment of semiconductors, and more particularly to a quartz glass boat with little deterioration in life time.

【0002】[0002]

【従来の技術】半導体製造に使用される機械、装置、容
器、管などは耐熱性とともに、化学的に高純度が要求さ
れている。そして、これら部材はどのような条件下で
も、ウエーハと反応したり、あるいは痕跡といえどもど
のような元素もウエーハに与えない部材でなければなら
ない。こうした要求にこたえる材料として、従来、石英
ガラスが用いられてきた。石英ガラスには、結晶質石英
を電気溶融法で溶融しガラス化した石英ガラス、酸水素
火炎法で溶融しガラス化した石英ガラス、およびゾルー
ゲル法やスート法で製造した合成石英ガラス等がある。
しかしながら、前記酸水素火炎法で溶融して得た石英ガ
ラスは該石英ガラス中にOH基が多く含有され、高温で
長時間使用するとつぶれや変形を起こすという欠点を有
していた。また、合成石英ガラスは結晶質石英粉から得
られた石英ガラスに比して粘度が低いため実際のプロセ
スでは使用されていない。そのため、従来、半導体工業
用治具として、特に熱処理温度が1100℃以上のプロ
セスでは専ら電気溶融法により得られた石英ガラス(以
下電気溶融石英ガラスという)が用いられてきた。
2. Description of the Related Art Machines, equipment, containers, tubes, and the like used in semiconductor manufacturing are required to have high heat resistance and high chemical purity. These members must be members that do not react with the wafer under any conditions or give any element, even traces, to the wafer. Conventionally, quartz glass has been used as a material that meets these requirements. Examples of the quartz glass include quartz glass obtained by melting and vitrifying crystalline quartz by an electric melting method, quartz glass melted and vitrified by an oxyhydrogen flame method, and synthetic quartz glass manufactured by a sol-gel method or a soot method.
However, the quartz glass obtained by melting by the oxyhydrogen flame method has a drawback that the quartz glass contains a large amount of OH groups and is crushed or deformed when used at a high temperature for a long time. Synthetic quartz glass is not used in actual processes because it has a lower viscosity than quartz glass obtained from crystalline quartz powder. For this reason, conventionally, as a jig for the semiconductor industry, quartz glass (hereinafter referred to as electro-fused quartz glass) obtained exclusively by an electro-melting method has been used particularly in a process in which the heat treatment temperature is 1100 ° C. or higher.

【0003】しかしながら、この電気溶融石英ガラスに
は、ヒーターなどの構造物からの汚染、特に石英ガラス
中で拡散速度の速いアルカリ金属元素不純物が拡散し易
いという欠点を有している。そこで、この欠点を解決す
る手段として、治具の肉厚方向に特定量のOH基を含有
せしめる多層構造体が既に提案されている。これら多層
構造体は、炉芯管等の構造が簡単な部材には好適である
が、ボートのように構造が複雑、特にウエーハを置載す
る溝等を有する構造では、これまで不適とされてきた。
そのため、ウエーハ用ボートには専ら前記OH基含有の
ない電気溶融石英ガラスが用いられてきた。
However, this electrofused quartz glass has a drawback that contamination from a structure such as a heater, particularly an alkali metal element impurity having a high diffusion rate easily diffuses in quartz glass. Therefore, as means for solving this drawback, a multilayer structure in which a specific amount of OH groups is contained in the thickness direction of the jig has already been proposed. These multilayer structures are suitable for members having a simple structure such as a furnace core tube, but have been considered to be unsuitable so far in a structure such as a boat having a complicated structure, particularly in a structure having a groove for mounting a wafer. Was.
For this reason, electrofused silica glass containing no OH group has been used exclusively for wafer boats.

【0004】[0004]

【発明が解決しようとする課題】このようにウエーハ用
ボート材料として電気溶融石英ガラスが専ら用いられて
きたが、最近、この電気溶融石英ガラスボートで熱処理
したウエーハにライフタイムの規格値以下になるものが
多く発生することがわかった。この原因について本発明
者らは鋭意研究したところ、前記ライフタイムの低下は
鉄、クロム、ニッケル、銅等の重金属不純物に基づくこ
とがわかった。そして、この重金属不純物の汚染は電気
溶融石英ガラス中にOH基、特に特定量のOH基をドー
プすることにより効率的に低減できることを発見した。
As described above, electro-fused quartz glass has been used exclusively as a material for a wafer boat, but recently, a wafer heat-treated with this electro-fused quartz glass boat has a lifetime below a standard value. It turns out that many things occur. The present inventors have conducted intensive studies on the cause, and found that the decrease in the lifetime is due to heavy metal impurities such as iron, chromium, nickel, and copper. It has been found that the contamination of heavy metal impurities can be efficiently reduced by doping OH groups, particularly a specific amount of OH groups, into the electro-fused quartz glass.

【0005】さらに、本発明者らは前記ボートにOH基
をドープする手段として、石英ガラスボートを水素雰囲
気中で加熱処理するか、または酸水素炎、あるいはプロ
パンガス炎に接触させることにより容易に行いうること
も発見した。こうした知見に基づき本発明は完成された
ものであり、本発明は、ライフタイム劣化の少ない石英
ガラスボートを提供することを目的とする。
Further, the inventors of the present invention can easily dope a quartz glass boat by heating it in a hydrogen atmosphere or by bringing it into contact with an oxyhydrogen flame or a propane gas flame. I also discovered what could be done. The present invention has been completed based on these findings, and an object of the present invention is to provide a quartz glass boat with less deterioration in lifetime.

【0006】また、本発明は、上記ライフタイム劣化の
少ない石英ガラスボートの製造方法を提供することを目
的とする。
It is another object of the present invention to provide a method for manufacturing a quartz glass boat with less deterioration of the lifetime.

【0007】[0007]

【課題を解決するための手段】本発明は、結晶質石英粉
を電気溶融して得た石英ガラス部材を成形してなる石英
ガラスボートにおいて、ウエーハと接触する部位が少な
くとも5μmのOH基含有層を有し、その含有量が80
ppm以上であることを特徴とする石英ガラスボート、
および前記結晶質石英粉を電気溶融して得た石英ガラス
部材で形成した電気溶融石英ガラスボートを水素雰囲気
中で加熱処理するか、または酸水素炎あるいはプロパン
ガス炎に接触することによりOH基を石英ガラス中に含
有することによりライフタイム劣化の少ない石英ガラス
ボートの製造方法に関する。
According to the present invention, there is provided a quartz glass boat formed by forming a quartz glass member obtained by electromelting crystalline quartz powder, wherein a portion in contact with a wafer has an OH group-containing layer having at least 5 μm. Having a content of 80
ppm or more, a quartz glass boat,
And heat treatment of an electrofused quartz glass boat formed of a quartz glass member obtained by electromelting the crystalline quartz powder in a hydrogen atmosphere, or by contacting with an oxyhydrogen flame or a propane gas flame to form an OH group. The present invention relates to a method for manufacturing a quartz glass boat which has less deterioration in life time by being contained in quartz glass.

【0008】上記において、「結晶質石英粉」とは、水
晶等の天然の結晶質二酸化ケイ素を微粉砕したガラス原
料を意味する。また、「電気溶融」とは、ガラス化のた
めに電気を使用した加熱手段を用いて溶融することをい
う。前記結晶質石英粉の粒度範囲は、10〜1000μ
m,好ましくは50〜500μmがよい。粒度が10μ
m以下では細かい気泡が発生し、また粒度が1000μ
m以上では純化が難しく、不純物の混入が起こり易くな
る。
In the above description, “crystalline quartz powder” means a glass material obtained by finely pulverizing natural crystalline silicon dioxide such as quartz. Further, “electric melting” means melting using heating means using electricity for vitrification. The particle size range of the crystalline quartz powder is 10 to 1000 μm.
m, preferably 50 to 500 μm. Particle size is 10μ
m or less, fine bubbles are generated, and the particle size is 1000 μm.
Above m, it is difficult to purify and impurities are likely to be mixed.

【0009】上記電気溶融石英ガラスボート中のOH基
含有層に含まれるOH基の含有量は、少なくとも80p
pmである。そして、該OH基を含有する層の肉厚は、
5μm以上でかつボート材全体の肉厚の1/2以下でな
ければならない。OH基の含有量が80ppm以下では
重金属不純物の汚染を抑制する作用が少なく、従来の石
英ガラスボートとほとんど変わらない。また、OH基含
有層が5μm以下では、重金属不純物によるウエーハ汚
染の抑制効果が果たせず、その層がボート材の1/2以
上ではボートの耐熱性を悪くし使用に耐えない。
The content of the OH group contained in the OH group-containing layer in the electro-fused quartz glass boat is at least 80 p.
pm. And the thickness of the layer containing the OH group is
It must be at least 5 μm and at most 1 / of the thickness of the entire boat material. When the content of the OH group is 80 ppm or less, the effect of suppressing contamination of heavy metal impurities is small, and is almost the same as the conventional quartz glass boat. On the other hand, if the OH group-containing layer is 5 μm or less, the effect of suppressing wafer contamination by heavy metal impurities cannot be achieved, and if the layer is 1 / or more of the boat material, the heat resistance of the boat deteriorates and the boat cannot be used.

【0010】上記に規定する範囲のOH基を電気溶融石
英ガラスボートに含有せしめるには、石英ガラス材料で
形成したボートを、水素雰囲気中に600〜800℃
で、1〜2時間加熱するか、あるいは酸水素ガスバーナ
ーまたはプロパンガスバーナーで前記成形ボートを焼き
仕上げすることにより達成できる。ただし、後者の場合
には、バーナーで強く焼き仕上げすると、ボートが変形
するので注意する必要がある。
In order to make the electrofused quartz glass boat contain OH groups in the above-defined range, a boat made of a quartz glass material is placed in a hydrogen atmosphere at 600 to 800 ° C.
By heating for 1 to 2 hours, or by baking the formed boat with an oxyhydrogen gas burner or a propane gas burner. However, in the latter case, it is necessary to be careful that the boat will be deformed if it is baked with a burner.

【0011】上記電気溶融石英ガラスボートを再使用す
る場合には、ウエーハの熱処理段階で、重金属不純物が
付着するので、ボートを弗酸液で洗浄し、再度OH基を
ドープする必要がある。
When the electrofused quartz glass boat is reused, heavy metal impurities adhere during the heat treatment of the wafer. Therefore, it is necessary to wash the boat with a hydrofluoric acid solution and dope OH groups again.

【0012】以下に実施例を示しさらに本発明を詳細に
説明する。
Hereinafter, the present invention will be described in detail with reference to Examples.

【0013】(ライフタイムの測定法)セミテックス製
LIFE TECHー88Rを使用してウエーハ面内の
ライフタイムをマップ測定する方法。
(Measurement method of lifetime) A method of measuring the lifetime in a wafer surface using LIFE TECH-88R manufactured by Semitex.

【0014】(OH基含有量の測定法)赤外分光光度法
により表面から50μmの層のOH基含有量を測定する
方法。
(Measurement method of OH group content) A method of measuring the OH group content of a layer 50 μm from the surface by infrared spectrophotometry.

【0015】[0015]

【実施例】結晶質石英粉を電気溶融して直径12mmの
石英ガラス棒を成形した。この石英ガラス棒を用いてウ
エーハ熱処理用ボートを3台制作した。このボートに
5″ウエーハをセットし、石英炉芯管内に挿入し、12
00℃で5時間加熱処理を行った。 加熱処理の終わっ
たウエーハを取り出し、そのライフタイムを測定し、規
格値の100μsec以下となる部分の割合を求めた。
また、各ボートの表面から50μmにおけるOH基の含
有量を測定した。
EXAMPLE A crystalline quartz powder was electromelted to form a quartz glass rod having a diameter of 12 mm. Using this quartz glass rod, three boats for wafer heat treatment were produced. A 5 ″ wafer was set in this boat, and inserted into the quartz furnace core tube.
Heat treatment was performed at 00 ° C. for 5 hours. The wafer after the heat treatment was taken out, its lifetime was measured, and the ratio of the portion where the standard value was 100 μsec or less was determined.
Further, the content of OH groups at 50 μm from the surface of each boat was measured.

【0016】一方、比較例として、結晶質石英粉を酸水
素溶融して得た石英ガラスを用いてボートを形成した。
このボートにウエーハをセットし前記と同様に加熱処理
を行った。上記結果を表1に示す。
On the other hand, as a comparative example, a boat was formed using quartz glass obtained by melting crystalline quartz powder with oxyhydrogen.
A wafer was set in this boat and subjected to a heat treatment in the same manner as described above. The results are shown in Table 1.

【0017】[0017]

【表1】 * ウエーハ面内でライフタイムが規格値以下となる
割合。
[Table 1] * The percentage of the lifetime within the wafer surface below the specified value.

【0018】上記比較例2は、表面も中心部でのOH基
含有量が180ppmと多いために、1200℃、5時
間加熱処理を行ったところ、ボートのウエーハ支持棒が
変形した。このため、次の熱処理を行うとき、ウエーハ
が巧くウエーハ支持棒に置載できず正常に熱処理できた
ウエーハ、は全体の50%になってしまった。
In Comparative Example 2, since the OH group content at the center of the surface was as large as 180 ppm, the wafer was subjected to heat treatment at 1200 ° C. for 5 hours, and the wafer support rod of the boat was deformed. For this reason, when the next heat treatment was performed, 50% of the wafers could not be properly placed on the wafer support bar and could be normally heat-treated.

【0019】[0019]

【発明の効果】本発明の電気溶融石英ガラスボートを用
いて加熱処理したウエーハは上記表1に示すようにライ
フタイムの規格値以下となる割合が著しく減少する。す
なわち、本発明の電気溶融石英ガラスボートは耐熱性を
低下することなく、ライフタイムの優れたウエーハを容
易に製造できるボートであることがわかる。
As shown in the above Table 1, the proportion of the wafer which has been subjected to the heat treatment using the electro-fused quartz glass boat of the present invention is significantly reduced as shown in Table 1 above. That is, it can be seen that the electro-fused quartz glass boat of the present invention is a boat that can easily manufacture a wafer having an excellent lifetime without lowering the heat resistance.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 木村 博至 福井県武生市北府2−13−60 信越石英 株式会社 武生工場内 (56)参考文献 特開 昭62−268129(JP,A) 特開 昭62−14722(JP,A) (58)調査した分野(Int.Cl.6,DB名) H01L 21/22 501 H01L 21/22 511 H01L 21/205──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Hiroshi Kimura 2-13-60 Kitafu, Takefu-shi, Fukui Prefecture Shin-Etsu Quartz Co., Ltd. Takefu Factory (56) References JP-A-62-268129 (JP, A) 62-1722 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) H01L 21/22 501 H01L 21/22 511 H01L 21/205

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 結晶質石英粉を電気溶融して得た石英ガ
ラス部材を成形してなる石英ガラスボートにおいて、ウ
エーハと接触する部位が少なくとも5μmのOH基含有
層を有し、その層のOH基含有量が80ppm以上であ
ることを特徴とするライフタイム劣化の少ない石英ガラ
スボート。
1. A quartz glass boat formed by molding a quartz glass member obtained by electromelting crystalline quartz powder, wherein a portion to be in contact with a wafer has an OH group-containing layer of at least 5 μm, and the OH A quartz glass boat having a low life time deterioration, wherein the base content is 80 ppm or more.
【請求項2】 結晶質石英粉を電気溶融して得た石英ガ
ラス部材で形成した石英ガラスボートを水素雰囲気中で
加熱処理することを特徴とする請求項1記載の石英ガラ
スボートの製造方法。
2. The method for producing a quartz glass boat according to claim 1, wherein a quartz glass boat formed of a quartz glass member obtained by electromelting crystalline quartz powder is heat-treated in a hydrogen atmosphere.
【請求項3】 結晶質石英粉を電気溶融して得た石英ガ
ラス部材で形成した石英ガラスボートを酸水素炎または
プロパンガス炎で処理することを特徴とする請求項1記
載の石英ガラスボートの製造方法。
3. The quartz glass boat according to claim 1, wherein a quartz glass boat formed of a quartz glass member obtained by electromelting crystalline quartz powder is treated with an oxyhydrogen flame or a propane gas flame. Production method.
JP24600892A 1992-08-24 1992-08-24 Quartz glass boat and its manufacturing method Expired - Fee Related JP2840164B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24600892A JP2840164B2 (en) 1992-08-24 1992-08-24 Quartz glass boat and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24600892A JP2840164B2 (en) 1992-08-24 1992-08-24 Quartz glass boat and its manufacturing method

Publications (2)

Publication Number Publication Date
JPH076975A JPH076975A (en) 1995-01-10
JP2840164B2 true JP2840164B2 (en) 1998-12-24

Family

ID=17142090

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24600892A Expired - Fee Related JP2840164B2 (en) 1992-08-24 1992-08-24 Quartz glass boat and its manufacturing method

Country Status (1)

Country Link
JP (1) JP2840164B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113430479B (en) * 2021-06-25 2022-05-20 常州大学 Ti-Al-Si-C coating modified by carbon nano material on surface of titanium and titanium alloy and preparation method thereof

Also Published As

Publication number Publication date
JPH076975A (en) 1995-01-10

Similar Documents

Publication Publication Date Title
CN1088444C (en) Polycrystalline silicon rod and process for preparing the same
EP2315727B1 (en) Method for producing quartz glass doped with nitrogen
CN101426744B (en) Component of quartz glass for use in semiconductor manufacture and method for producing the same
US7082789B2 (en) Silica glass member for semiconductor and production method thereof
EP1188722B1 (en) Article comprising a body made of quartz glass having improved resistance against plasma corrosion, and method for production thereof
JP4181226B2 (en) Manufacturing method of high purity, high heat resistant quartz glass
JP2810941B2 (en) Method for producing polygonal columnar silica glass rod
JP3393063B2 (en) Heat-resistant synthetic silica glass for shielding impurity metal and method for producing the same
JP2840164B2 (en) Quartz glass boat and its manufacturing method
JP3268049B2 (en) Quartz glass material and its manufacturing method
JPH10114532A (en) Production of jig for heat-treating quartz-glass semiconductor
JP2777858B2 (en) Silica glass tube for heat treatment of semiconductor and method for producing the same
JP2522830B2 (en) Quartz glass material for semiconductor heat treatment and manufacturing method thereof
JP2878916B2 (en) Silica glass member for semiconductor heat treatment and method for producing the same
JP2003012333A (en) Quartz glass member and method of manufacturing the same
JP2008056533A (en) Quartz glass and method for producing the same
JP3187510B2 (en) Method of manufacturing member for heat treatment of semiconductor wafer
JP2002160930A (en) Porous quartz glass and its manufacturing method
JP3386908B2 (en) Quartz glass for heat treatment jig of silicon semiconductor element and method for producing the same
JP3687872B2 (en) Method for producing electric furnace material for heat treatment such as high purity silicon, and electric furnace material for heat treatment
JP2777855B2 (en) Composite quartz glass tube for semiconductor heat treatment
JP3110639B2 (en) Quartz glass for silicon semiconductor element heat treatment jig
JPH0446020A (en) Production of highly heat-resistant quartz glass
JPH05279049A (en) Production of synthetic quartz glass
JP3294356B2 (en) Quartz glass furnace core tube for semiconductor wafer processing

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 9

Free format text: PAYMENT UNTIL: 20071016

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20081016

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20091016

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20101016

Year of fee payment: 12

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20111016

Year of fee payment: 13

LAPS Cancellation because of no payment of annual fees