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JP2847844B2 - Optical waveguide - Google Patents
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JP2847844B2 - Optical waveguide - Google Patents

Optical waveguide

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Publication number
JP2847844B2
JP2847844B2 JP1006390A JP1006390A JP2847844B2 JP 2847844 B2 JP2847844 B2 JP 2847844B2 JP 1006390 A JP1006390 A JP 1006390A JP 1006390 A JP1006390 A JP 1006390A JP 2847844 B2 JP2847844 B2 JP 2847844B2
Authority
JP
Japan
Prior art keywords
waveguide
optical
light
optical waveguide
diffusion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1006390A
Other languages
Japanese (ja)
Other versions
JPH03214107A (en
Inventor
正明 岩崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP1006390A priority Critical patent/JP2847844B2/en
Publication of JPH03214107A publication Critical patent/JPH03214107A/en
Application granted granted Critical
Publication of JP2847844B2 publication Critical patent/JP2847844B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、基板の表面にチャンネル状に形成された光
導波路に関する。
Description: TECHNICAL FIELD The present invention relates to an optical waveguide formed in a channel shape on a surface of a substrate.

〔従来の技術〕[Conventional technology]

光導波路は、熱拡散,イオン交換,イオン注入等によ
り基板の表面近くの高屈折率層として形成され、導波路
中に光を閉じ込め、光スイッチ,変調器などの機能素子
を集積した光集積回路を構成することができる。特に光
集積回路の素子間の光路変換を行うために曲がり導波路
は重要である。このとき、曲がり導波路の曲率半径が小
さいほど短かい伝搬距離で光路を変換することができる
が、曲がり導波路の損失は曲率半径の減少にともない増
加する。これは、曲がり導波路において光が伝搬する時
曲がりの外側にはみ出した光の一部が半径方向に放射さ
れ、その放射損失は曲率半径が小さいほど大きくなるこ
とを意味している。光集積回路の目的の1つは素子の小
型化であり、これを実現するには、曲がり導波路の曲率
半径を小さく、かつ、放射損失を低くする必要があっ
た。
The optical waveguide is formed as a high refractive index layer near the surface of the substrate by thermal diffusion, ion exchange, ion implantation, etc., confine the light in the waveguide, and integrate an optical switch, modulator and other functional elements. Can be configured. In particular, a bent waveguide is important for performing optical path conversion between elements of an optical integrated circuit. At this time, as the radius of curvature of the curved waveguide is smaller, the optical path can be converted with a shorter propagation distance, but the loss of the curved waveguide increases as the radius of curvature decreases. This means that when the light propagates in the bent waveguide, a part of the light protruding outside the bend is radiated in the radial direction, and the radiation loss increases as the radius of curvature decreases. One of the purposes of the optical integrated circuit is to reduce the size of the element. To achieve this, it was necessary to reduce the radius of curvature of the bent waveguide and to reduce the radiation loss.

一般に曲がり導波路の放射損失は、曲がり部分の放射
に伴う導波光の減衰定数αで表わすことができ、この減
衰定数αは曲率半径Rと屈折率差ΔN(導波モードの実
行屈折率Nと導波路に近接する表面屈折率nsとの差N−
ns)とにより下記の式で決定される。
In general, the radiation loss of a bent waveguide can be represented by the attenuation constant α of the guided light accompanying the radiation of the bent portion, and the attenuation constant α is the radius of curvature R and the refractive index difference ΔN (the effective refractive index N of the waveguide mode and Difference N− from the surface refractive index n s near the waveguide
n s ) is determined by the following equation.

αA・(N2−n▲2 s▼)-1・exp(−B・R) ……(1) 但し,A、Bは導波路で決まる定数 従来、曲がり導波路の放射損失を低減するために、基
板の屈折率を減少させることが知られている酸化マグネ
シウムを曲がり導波路の外側に追拡散し、屈折率差ΔN
を大きくする方法が報告されている。
αA · (N 2 −n 2 s ▼) −1 · exp (−BR · R) (1) where A and B are constants determined by the waveguide. Conventionally, in order to reduce radiation loss of a bent waveguide. Then, magnesium oxide, which is known to reduce the refractive index of the substrate, is bent and diffused out of the waveguide, and the refractive index difference ΔN
It has been reported how to increase the size.

第4図は、従来の曲がり導波路の一例を示す斜視図で
あり、Ti拡散曲がり導波路32の外側に酸化マグネシウム
追拡散層33を形成した構造である。酸化マグネシウムの
追拡散により、Ti拡散導波路との屈折率差ΔNを大きく
し、導波路への光閉じ込めを強めることで放射損失を低
減している。第4図において31はニオブ酸リチウム結晶
基板,32はTi拡散曲がり導波路,33は酸化マグネシウム追
拡散層である。マグネシウム追拡散法のTi拡散曲がり導
波路(ニオブ酸リチウム結晶基板)の放射損失低減への
利用は、ビー・シュパート(B.SCHUPPERT)のエレクト
ロニクス・レターズ(ELECTRONICS LETTERS),23巻,15
号、797〜798ページに述べられている。
FIG. 4 is a perspective view showing an example of a conventional bent waveguide, and has a structure in which a magnesium oxide additional diffusion layer 33 is formed outside a Ti diffusion bent waveguide 32. FIG. Radiation loss is reduced by increasing the refractive index difference ΔN from the Ti diffusion waveguide by the additional diffusion of magnesium oxide and strengthening light confinement in the waveguide. In FIG. 4, 31 is a lithium niobate crystal substrate, 32 is a Ti diffusion bending waveguide, and 33 is a magnesium oxide additional diffusion layer. The use of the magnesium additional diffusion method for reducing radiation loss of a Ti diffusion bending waveguide (lithium niobate crystal substrate) is described in B. SCHUPPERT's ELECTRONICS LETTERS, Vol. 23, No. 15,
Issue, pages 797-798.

この光導波路を基本にした光集積回路は、一般に光伝
送路に挿入され、光ファイバ中を伝搬された光を信号処
理するために使用される場合が多い。また、高速、大容
量の光通信システムでは、光ファイバとして単一モード
光ファイバが使用され、光源には半導体レーザが使われ
る。半導体レーザは直線偏光を射出するが、単一モード
光ファイバ中を伝搬された光は一般に楕円偏光となり、
また、その偏光状態も時間的に変動する。すなわち、光
集積回路と単一モード光ファイバを直結するためには、
光集積回路の特性の偏光依存性を除去する必要がある。
An optical integrated circuit based on this optical waveguide is generally inserted into an optical transmission line and is often used for signal processing of light propagated in an optical fiber. In a high-speed, large-capacity optical communication system, a single mode optical fiber is used as an optical fiber, and a semiconductor laser is used as a light source. A semiconductor laser emits linearly polarized light, but light propagated in a single mode optical fiber generally becomes elliptically polarized light,
Further, the polarization state also varies with time. That is, in order to directly connect the optical integrated circuit and the single mode optical fiber,
It is necessary to remove the polarization dependence of the characteristics of the optical integrated circuit.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

結晶基板に形成された光導波路の導波光は、一般に独
立な2つのモード即ち、偏光方向が基板表面に垂直なTM
モードとそれに直交する偏光成分をもつTEモードに分離
される。例えば通常、良く用いられるLiNbO3 Z板では曲
がり導波路において、TMモードでは異常光に対する屈折
率差Δneが関与し、TEモードでは常光に対する屈折率差
Δnoが関与し、それらの大きさに差があるため(Δne
Δno)、TMモード、TEモードの光を各々導波させたとき
の放射損失をLoss(TM),Loss(TE)とするとLoss(TM)<Los
s(TE)となり、光導波路に損失の偏光依存性が生ずる欠
点があった。酸化マグネシウムの追拡散では異常光に対
する屈折率neと常光に対する屈折率noが共に減少し、Δ
ne,Δnoが共に大きくなるため損失の偏光依存性を低減
するには至らない。
The guided light of an optical waveguide formed on a crystal substrate generally has two independent modes, that is, a TM whose polarization direction is perpendicular to the substrate surface.
The light is separated into a mode and a TE mode having a polarization component orthogonal to the mode. For example, the refractive index difference Δn e for the extraordinary light is involved in the TM mode in the bent waveguide in the LiNbO 3 Z plate that is often used, and the refractive index difference Δn o for the ordinary light is involved in the TE mode. Because of the difference (Δn e >
Δn o ), assuming that the radiation loss when guiding the light in the TM mode and the TE mode is Loss (TM) and Loss (TE) , respectively, Loss (TM) <Loss
s (TE) , and the optical waveguide has a drawback that the polarization dependence of loss occurs. Refractive index n o In additionally diffusion of magnesium oxide for ordinary light refractive index n e for extraordinary light are both decreased, delta
n e, does not lead to reduce the polarization dependence of the losses for the [Delta] n o are both increased.

本発明の目的は、基板表面の屈折率neを増加させるこ
とにより、損失の偏光依存性を低減した光導波路を提供
することにある。
An object of the present invention, by increasing the refractive index n e of the substrate surface is to provide an optical waveguide with reduced polarization dependence loss.

〔課題を解決するための手段〕[Means for solving the problem]

本発明は、光学的異方性を有する結晶基板に不純物を
拡散して形成された曲線形状を含むチャンネル光導波路
において、少なくとも前記光導波路の曲線部分に沿った
隣接した部位に基板表面から外拡散(アウト・ディフュ
ージョン(out diffusion))が施されていることを特
徴とする光導波路である。
The present invention is directed to a channel optical waveguide including a curved shape formed by diffusing impurities into a crystal substrate having optical anisotropy, wherein at least an adjacent portion along the curved portion of the optical waveguide is diffused out of the substrate surface. An optical waveguide characterized in that (out diffusion) has been performed.

〔作用〕[Action]

ニオブ酸リチウムに代表される光学的異方性を有する
結晶では、外拡散を施された部位では、異常光に対する
屈撤率neが増加する。このため、本発明では、異常光に
対する横方向の閉じ込めが弱くなり、常光と異常光(TE
モードとTMモード)との放射損失の差は減少し、光導波
路の損失偏光依存性は低減する。
The crystal having optical anisotropy represented by lithium niobate, the site that has been subjected to external diffusion,屈撤factor n e for extraordinary light is increased. Therefore, in the present invention, lateral confinement of extraordinary light is weakened, and ordinary light and extraordinary light (TE
The difference between the radiation loss of the mode and the TM mode is reduced, and the loss polarization dependence of the optical waveguide is reduced.

従って、本発明により、損失の偏光依存性を従来例よ
りも改善することができる。
Therefore, according to the present invention, the polarization dependence of the loss can be improved as compared with the conventional example.

〔実施例〕〔Example〕

第1図は本発明の一実施例の斜視図である。1は、Z
軸が基板表面に垂直であるニオブ酸リチウム結晶基板,2
はTi拡散曲がり導波路,3は外拡散層である。Ti曲がり導
波路は、先ず、スパッタあるいは蒸着法等によって結晶
基板上にTi膜を堆積させ、フォトリソグラフィなどの微
細加工の工程を経てパターン化されたTi膜を熱拡散する
ことにより形成される。
FIG. 1 is a perspective view of one embodiment of the present invention. 1 is Z
Lithium niobate crystal substrate whose axis is perpendicular to the substrate surface, 2
Is a Ti diffusion bending waveguide, and 3 is an outer diffusion layer. The Ti-bent waveguide is formed by first depositing a Ti film on a crystal substrate by sputtering or vapor deposition, and thermally diffusing the patterned Ti film through a fine processing step such as photolithography.

拡散は一般にはで電気炉で行なわれ、真空または不活
性ガス雰囲気中で結晶基板を約1000℃に熱し、結晶表面
からLi2Oを外部へ放出して高屈折層(導波路)を形成す
る。Li2Oが外部へ放出されることにより、異常光に対す
る屈折率neが変化し、その屈折率増加量は10-3程度であ
る。これにより、異常光に対する横方向の閉じ込めが弱
くなり常光と異常光との放射損失の差は減少し、光導波
路の損失偏光依存性は低減する。
Diffusion is generally performed in an electric furnace, and the crystal substrate is heated to about 1000 ° C. in a vacuum or inert gas atmosphere, and Li 2 O is released to the outside from the crystal surface to form a high refractive layer (waveguide). . By Li 2 O that is released to the outside, the refractive index n e is changed with respect to extraordinary light, the refractive index increment is about 10 -3. As a result, the lateral confinement of extraordinary light is weakened, the difference in radiation loss between ordinary light and extraordinary light is reduced, and the loss polarization dependence of the optical waveguide is reduced.

第2図,第3図は、外拡散層を必要としない部分をLi
2CO3,LiNbO3などで覆い、熱処理を行なうことにより形
成した実施例の斜視図である。第2図は、Ti拡散曲がり
導波路外側のみに外拡散層3を有し、第3図は、Ti拡散
曲がり導波路の外周近傍に外拡散層3を施した場合であ
る。第2図、第3図のいずれの場合も、第1図と同様な
発明の効果が得られる。
FIG. 2 and FIG. 3 show that the portion not requiring the outer diffusion layer is made of Li.
FIG. 2 is a perspective view of an embodiment formed by covering with 2 CO 3 , LiNbO 3 or the like and performing heat treatment. FIG. 2 shows the case where the outer diffusion layer 3 is provided only on the outside of the Ti diffusion bending waveguide, and FIG. 3 shows the case where the outer diffusion layer 3 is provided near the outer periphery of the Ti diffusion bending waveguide. 2 and 3, the same effects as those of FIG. 1 can be obtained.

〔発明の効果〕〔The invention's effect〕

以上、説明したように本発明は光学的異方性を有する
結晶基板に不純物を拡散して形成されたチャンネル導波
路に沿った隣接した部位に外拡散層を設けることによ
り、異常光線に対する屈折率neを増加させて光導波路の
損失に関する偏光依存性を低減させる効果がある。
As described above, the present invention provides an outer diffusion layer at an adjacent portion along a channel waveguide formed by diffusing impurities into a crystal substrate having optical anisotropy, thereby providing a refractive index for extraordinary rays. n e increases the effect of reducing the polarization dependency regarding loss of the optical waveguide.

【図面の簡単な説明】[Brief description of the drawings]

第1図は、本発明による光導波路の一実施例を示す斜視
図、第2図は、Ti拡散曲がり導波路の外側のみ外拡散層
を有する実施例の斜視図、第3図は、Ti拡散曲がり導波
路の外周近傍に外拡散層を有する実施例の斜視図であ
る。第4図は従来の光導波路を示す斜視図である。 1,31……ニオブ酸リチウム結晶基板、2,32……Ti拡散曲
がり導波路、3……外拡散層、33……酸化マグネシウム
追拡散層。
FIG. 1 is a perspective view showing an embodiment of an optical waveguide according to the present invention, FIG. 2 is a perspective view of an embodiment having an outer diffusion layer only outside a Ti diffusion bending waveguide, and FIG. FIG. 4 is a perspective view of an embodiment having an outer diffusion layer near the outer periphery of a bent waveguide. FIG. 4 is a perspective view showing a conventional optical waveguide. 1,31: Lithium niobate crystal substrate; 2,32: Ti diffusion bending waveguide; 3: outer diffusion layer; 33: magnesium oxide additional diffusion layer.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】光学的異方性を有する結晶基板に不純物を
熱拡散して形成された曲線形状を含むチャンネル光導波
路において、少なくとも前記光導波路の曲線部分に沿っ
た隣接した部位に基板表面から外拡散が施されているこ
とを特徴とする光導波路。
1. A channel optical waveguide including a curved shape formed by thermally diffusing an impurity into a crystal substrate having optical anisotropy, wherein at least a portion adjacent to the curved portion of the optical waveguide along a curved portion is formed from the substrate surface. An optical waveguide characterized by being subjected to external diffusion.
JP1006390A 1990-01-18 1990-01-18 Optical waveguide Expired - Lifetime JP2847844B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1006390A JP2847844B2 (en) 1990-01-18 1990-01-18 Optical waveguide

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1006390A JP2847844B2 (en) 1990-01-18 1990-01-18 Optical waveguide

Publications (2)

Publication Number Publication Date
JPH03214107A JPH03214107A (en) 1991-09-19
JP2847844B2 true JP2847844B2 (en) 1999-01-20

Family

ID=11739923

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1006390A Expired - Lifetime JP2847844B2 (en) 1990-01-18 1990-01-18 Optical waveguide

Country Status (1)

Country Link
JP (1) JP2847844B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5320840B2 (en) * 2008-06-17 2013-10-23 富士通株式会社 Optical device and manufacturing method thereof

Also Published As

Publication number Publication date
JPH03214107A (en) 1991-09-19

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