JP2850152B2 - Method for producing ethylene copolymer - Google Patents
Method for producing ethylene copolymerInfo
- Publication number
- JP2850152B2 JP2850152B2 JP5433790A JP5433790A JP2850152B2 JP 2850152 B2 JP2850152 B2 JP 2850152B2 JP 5433790 A JP5433790 A JP 5433790A JP 5433790 A JP5433790 A JP 5433790A JP 2850152 B2 JP2850152 B2 JP 2850152B2
- Authority
- JP
- Japan
- Prior art keywords
- ethylene
- acid ester
- carboxylic acid
- methyl
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229920001038 ethylene copolymer Polymers 0.000 title 1
- -1 yttrium compound Chemical class 0.000 claims description 25
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 19
- 239000005977 Ethylene Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 12
- 229920001400 block copolymer Polymers 0.000 claims description 11
- 150000002601 lanthanoid compounds Chemical class 0.000 claims description 11
- 239000003999 initiator Substances 0.000 claims description 9
- 229910052727 yttrium Inorganic materials 0.000 claims description 6
- 125000003262 carboxylic acid ester group Chemical class [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 claims 4
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 description 18
- 150000001733 carboxylic acid esters Chemical class 0.000 description 12
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 10
- 229910052765 Lutetium Inorganic materials 0.000 description 7
- 239000004698 Polyethylene Substances 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- 229920000573 polyethylene Polymers 0.000 description 7
- 229910052769 Ytterbium Inorganic materials 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000178 monomer Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229920001577 copolymer Polymers 0.000 description 5
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910052772 Samarium Inorganic materials 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 3
- CSDQQAQKBAQLLE-UHFFFAOYSA-N 4-(4-chlorophenyl)-4,5,6,7-tetrahydrothieno[3,2-c]pyridine Chemical compound C1=CC(Cl)=CC=C1C1C(C=CS2)=C2CCN1 CSDQQAQKBAQLLE-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 2
- 229910052693 Europium Inorganic materials 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000007334 copolymerization reaction Methods 0.000 description 2
- 125000000058 cyclopentadienyl group Chemical group C1(=CC=CC1)* 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- LMAUULKNZLEMGN-UHFFFAOYSA-N 1-ethyl-3,5-dimethylbenzene Chemical compound CCC1=CC(C)=CC(C)=C1 LMAUULKNZLEMGN-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- VASMKZNTLITACA-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethanol;methyl 2-methylprop-2-enoate Chemical compound COC(=O)C(C)=C.OCCOCCO VASMKZNTLITACA-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- RUMACXVDVNRZJZ-UHFFFAOYSA-N 2-methylpropyl 2-methylprop-2-enoate Chemical compound CC(C)COC(=O)C(C)=C RUMACXVDVNRZJZ-UHFFFAOYSA-N 0.000 description 1
- CFVWNXQPGQOHRJ-UHFFFAOYSA-N 2-methylpropyl prop-2-enoate Chemical compound CC(C)COC(=O)C=C CFVWNXQPGQOHRJ-UHFFFAOYSA-N 0.000 description 1
- ZVYGIPWYVVJFRW-UHFFFAOYSA-N 3-methylbutyl prop-2-enoate Chemical compound CC(C)CCOC(=O)C=C ZVYGIPWYVVJFRW-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000005234 alkyl aluminium group Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000005103 alkyl silyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 description 1
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 1
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- GMSCBRSQMRDRCD-UHFFFAOYSA-N dodecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCOC(=O)C(C)=C GMSCBRSQMRDRCD-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- VKLYZBPBDRELST-UHFFFAOYSA-N ethene;methyl 2-methylprop-2-enoate Chemical compound C=C.COC(=O)C(C)=C VKLYZBPBDRELST-UHFFFAOYSA-N 0.000 description 1
- FFYWKOUKJFCBAM-UHFFFAOYSA-N ethenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC=C FFYWKOUKJFCBAM-UHFFFAOYSA-N 0.000 description 1
- BLCTWBJQROOONQ-UHFFFAOYSA-N ethenyl prop-2-enoate Chemical compound C=COC(=O)C=C BLCTWBJQROOONQ-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- FKIRSCKRJJUCNI-UHFFFAOYSA-N ethyl 7-bromo-1h-indole-2-carboxylate Chemical compound C1=CC(Br)=C2NC(C(=O)OCC)=CC2=C1 FKIRSCKRJJUCNI-UHFFFAOYSA-N 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- PBOSTUDLECTMNL-UHFFFAOYSA-N lauryl acrylate Chemical compound CCCCCCCCCCCCOC(=O)C=C PBOSTUDLECTMNL-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229950010610 lutetium chloride Drugs 0.000 description 1
- AEDROEGYZIARPU-UHFFFAOYSA-K lutetium(iii) chloride Chemical compound Cl[Lu](Cl)Cl AEDROEGYZIARPU-UHFFFAOYSA-K 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- HVYCQBKSRWZZGX-UHFFFAOYSA-N naphthalen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C(OC(=O)C(=C)C)=CC=CC2=C1 HVYCQBKSRWZZGX-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 230000037048 polymerization activity Effects 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- SJMYWORNLPSJQO-UHFFFAOYSA-N tert-butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C)(C)C SJMYWORNLPSJQO-UHFFFAOYSA-N 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- UJJLJRQIPMGXEZ-UHFFFAOYSA-N tetrahydro-2-furoic acid Chemical compound OC(=O)C1CCCO1 UJJLJRQIPMGXEZ-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- QNLXXQBCQYDKHD-UHFFFAOYSA-K ytterbium(iii) bromide Chemical compound Br[Yb](Br)Br QNLXXQBCQYDKHD-UHFFFAOYSA-K 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Landscapes
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Polymerization Catalysts (AREA)
- Graft Or Block Polymers (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、三価有機ランタニド化合物存在下エチレン
と不飽和カルボン酸エステルを共重合することによりエ
チレン系ブロック共重合体を効率よく製造する方法に関
する。The present invention relates to a method for efficiently producing an ethylene-based block copolymer by copolymerizing ethylene and an unsaturated carboxylic acid ester in the presence of a trivalent organic lanthanide compound. About.
[従来の技術と解決すべき課題] 従来のポリオレフィンは、分子中に極性基がないため
接着性、印刷性及び他のポリマーとの相溶性に劣るとい
う欠点があった。[Conventional Technology and Problems to be Solved] Conventional polyolefins have a defect that they have poor polarizability, printability and compatibility with other polymers because there is no polar group in the molecule.
これらの欠点を改善するためα−オレフィンと極性ビ
ニルモノマーとの共重合が試みられている。その例とし
て、特開昭59−43003によるとルイス酸存在下TiCl4,Al
(C2H5)2Clを触媒としてプロピレンと不飽和カルボン
酸エステルの共重合方法が提案されている。また、特開
昭64−14217によると0価のニッケルキレート化合物と
アルミノキサンを用いてエチレンと不飽和カルボン酸エ
ステルの共重合が提案されているが、いずれも多量のル
イス酸が必要であるか或は、助触媒のアルミノキサンが
大過剰必要である等の問題点がある。In order to improve these drawbacks, attempts have been made to copolymerize an α-olefin with a polar vinyl monomer. For example, JP-A-59-43003 discloses that TiCl 4 , Al
A method for copolymerizing propylene with an unsaturated carboxylic acid ester using (C 2 H 5 ) 2 Cl as a catalyst has been proposed. According to JP-A-64-14217, copolymerization of ethylene and an unsaturated carboxylic acid ester using a zero-valent nickel chelate compound and an aluminoxane has been proposed, but any of them requires a large amount of Lewis acid. However, there is a problem that a large excess of aluminoxane as a cocatalyst is required.
本発明者らは既に二価ランタニド化合物とアルキルア
ルミの複核錯体を用いてエチレン−MMAブロック共重合
体の合成を報告している(日本化学会第58春季年会講演
予稿集I,1 II B07,1989)が、このような二価ランタニ
ド化合物を用いた場合重合活性が低いという問題点があ
る。The present inventors have already reported the synthesis of an ethylene-MMA block copolymer using a dinuclear complex of a divalent lanthanide compound and an alkyl aluminum (Preprints of the 58th Annual Meeting of the Chemical Society of Japan I, 1 II B07) However, when such a divalent lanthanide compound is used, there is a problem that the polymerization activity is low.
[課題を解決するための手段] そこで本発明者らはさらに鋭意研究を重ねた結果、2
つの(置換)シクロペンタジェニル基を有する三価のイ
ットリウム化合物又は三価のランタニド化合物またはこ
れらと有機アルミニウム化合物を開始剤(触媒とも称す
る)として用いエチレンの重合をリビング的に行いその
成長末端に不飽和カルボン酸エステルを作用させること
によりエチレン−不飽和カルボン酸エステルブロック共
重合体が得られることを見いだし、本発明を完成するに
いたった。[Means for Solving the Problems] The inventors of the present invention have conducted intensive studies and found that
A trivalent yttrium compound or a trivalent lanthanide compound having two (substituted) cyclopentagenyl groups or a trivalent lanthanide compound or an organoaluminum compound is used as an initiator (also referred to as a catalyst) to polymerize ethylene in a living manner and at the growth terminal The present inventors have found that an ethylene-unsaturated carboxylic acid ester block copolymer can be obtained by acting an unsaturated carboxylic acid ester, thereby completing the present invention.
本発明は、エチレンと不飽和カルボン酸エステルとを
ブロック共重合するに際し、2つの(置換)シクロペン
タジエニル基を有する三価のイットリウム化合物又は三
価のランタニド化合物、又はそれと有機アルミニウム化
合物とを開始剤として用いることを特徴とするエチレン
と不飽和カルボン酸エステルのブロック共重合体の製造
方法に関する。In the present invention, when block copolymerizing ethylene and an unsaturated carboxylic acid ester, a trivalent yttrium compound or a trivalent lanthanide compound having two (substituted) cyclopentadienyl groups or an organoaluminum compound is used. The present invention relates to a method for producing a block copolymer of ethylene and an unsaturated carboxylic acid ester, which is used as an initiator.
本発明で使用され得る三価有機Y化合物および三価有
機ランタニド化合物は式(1)(2) [式中R1〜R10は水素原子または炭素数1〜5の炭化水
素基またはケイ素を含む炭化水素基であり、R1〜R10は
隣接するR基と炭化水素基を介して結合していてもよ
い。本発明において「(置換)シクロペンタジエニル
基」とは非置換又は置換シクロペンタジエニル基を意味
する。MはY、La、Ce、Pr、Nd,Pm、Sm、Eu、Ga、Tb、D
y、Ho、Er、Tm、Yb、Luである。Xは水素原子または炭
素数1〜10の炭化水素基またはケイソを含む炭化水素基
である。Yは炭素数1〜3のアルキレン基またはアルキ
ルシリル基である。Dは溶媒分子でありn=0〜3であ
る。]で示される。The trivalent organic Y compound and the trivalent organic lanthanide compound which can be used in the present invention are represented by formulas (1) and (2). [Wherein R 1 to R 10 are a hydrogen atom, a hydrocarbon group having 1 to 5 carbon atoms or a silicon-containing hydrocarbon group, and R 1 to R 10 are bonded to an adjacent R group via a hydrocarbon group. May be. In the present invention, "(substituted) cyclopentadienyl group" means an unsubstituted or substituted cyclopentadienyl group. M is Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Ga, Tb, D
They are y, Ho, Er, Tm, Yb, and Lu. X is a hydrogen atom, a hydrocarbon group having 1 to 10 carbon atoms, or a hydrocarbon group containing keiso. Y is an alkylene group or an alkylsilyl group having 1 to 3 carbon atoms. D is a solvent molecule and n = 0 to 3. ].
このような化合物の例としては、ビスシクロペンタジ
エニルルテチウムハイドライド、ビスシクロペンタジエ
ニルルテチウムメチル、ビスシクロペンタジエニルルテ
チウムエチル、ビスシクロペンタジエニルルテチウムビ
ストリメチルシリルメチル、ビスペンタメチルシクロペ
ンタジエニルルテチウムハイドライド、ビスペンタメチ
ルシクロペンタジエニルルテチウムメチル、ビスペンタ
メチルシクロペンタジエニルルテチウムビストリメチル
シリルメチル、ビスシクロペンタジエニルイッテルビュ
ウムハイドライド、ビスシクロペンタジエニルイッテル
ビュウメチル、ビスペンタメチルシクロペンタジエニル
イッテルビュウムハイドライド、ビスペンタメチルシク
ロペンタジエニルイッテルビュウムメチル、ビスペンタ
メチルシクロペンタジエニルイッテルビュウムビストリ
メチルシリルメチル、ビスシクロペンタジエニルサマリ
ウムハイドライド、ビスシクロペンタジエニルサマリウ
ムメチル、ビスペンタメチルシクロペンタジエニルサマ
リウムハイドライド、ビスペンタメチルシクロペンタジ
エニルサマリウムメチル、ビスペンタメチルシクロペン
タジエニルサマリウムビストリメチルシリルメチル、ビ
スシクロペンタジエニルヨーロピウムハイドライド、ビ
スシクロペンタジエニルヨーロピウムメチル、ビスペン
タメチルシクロペンタジエニルヨーロピウムハイドライ
ド、ビスペンタメチルシクロペンタジエニルヨーロピウ
ムメチル、ビスペンタメチルシクロペンタジエニルネオ
ジウムメチル、ビスペンタメチルシクロペンタジエニル
セリウムハイドライド、ビスペンタメチルシクロペンタ
ジエニルイットリウムメチル、ビスインデニルルテチウ
ムメチル、エチレンビスインデニルルテチウムメチル、
エチレンビスシクロペンタジエニルルテチウムメチルお
よびこれらの化合物ノエーテラート、テトラヒドロフラ
ネートなどが挙げられるがこれに限定されるものではな
い。Examples of such compounds include biscyclopentadienyl lutetium hydride, biscyclopentadienyl lutetium methyl, biscyclopentadienyl lutetium ethyl, biscyclopentadienyl lutetium bistrimethylsilylmethyl, bispentamethylcyclopentadienyl Lutetium hydride, bispentamethylcyclopentadienyl lutetium methyl, bispentamethylcyclopentadienyl lutetium bistrimethylsilylmethyl, biscyclopentadienyl ytterbium hydride, biscyclopentadienyl ytterbium methyl, bispentamethylcyclopentadi Any ytterbium hydride, bispentamethylcyclopentadienyl ytterbium methyl, bispentamethylcyclopenta Any ytterbium bistrimethylsilylmethyl, biscyclopentadienyl samarium hydride, biscyclopentadienyl samarium methyl, bispentamethylcyclopentadienyl samarium hydride, bispentamethylcyclopentadienyl samarium methyl, bispentamethylcyclopentadi Enylsamarium bistrimethylsilylmethyl, biscyclopentadienyl europium hydride, biscyclopentadienyl europium methyl, bispentamethylcyclopentadienyl europium hydride, bispentamethylcyclopentadienyl europium methyl, bispentamethylcyclo Pentadienyl neodymium methyl, bispentamethylcyclopentadienyl cerium hydride, bispentame Le cyclopentadienyl yttrium methyl, bis indenyl lutetium methyl, ethylene bis indenyl lutetium methyl,
Examples include, but are not limited to, ethylene biscyclopentadienyl lutetium methyl and their compounds noetherate, tetrahydrofuranate, and the like.
これらの化合物は、公知の方法(Tobin J.Marks,J.A
m.Chem.Soc.,107,8091,1985.;William.J.Evans,J.Am.Ch
em.Soc.,105,1401,1983.;P.L.Watson,A.C.S.Symp.,495,
1983.;Tobin J.Marks,WO 8605788)により合成するこ
とが出来るが、合成方法により限定されるものではな
い。These compounds can be prepared by known methods (Tobin J. Marks, JA
m.Chem.Soc., 107,8091,1985.; William.J.Evans, J.Am.Ch
em. Soc., 105, 1401, 1983 .; PLWatson, ACSSymp., 495,
1983 .; Tobin J. Marks, WO 8605788), but is not limited by the synthesis method.
本発明に使用される有機アルミニウム化合物は、 式(3) AlRnX3-n (3) [式中Rは脂肪族炭化水素基、Xはハロゲン元素、n=
1〜3の整数] 本発明に用いられるカルボン酸エステルとしては式
(4)(5) [式中Rは脂肪族炭化水素基、芳香族炭化水素基、およ
びハロゲン、アミン、エーテル等の官能基を含む炭化水
素基の中から選ばれた一価の基である。]に示すものが
有効に使用され得る。The organoaluminum compound used in the present invention is represented by the formula (3) AlR n X 3-n (3) wherein R is an aliphatic hydrocarbon group, X is a halogen element, and n =
Integer of 1-3] The carboxylic acid ester used in the present invention is represented by the formula (4) or (5) [In the formula, R is a monovalent group selected from an aliphatic hydrocarbon group, an aromatic hydrocarbon group, and a hydrocarbon group containing a functional group such as halogen, amine, and ether. ] Can be effectively used.
具体的には、アクリル酸メチル、アクリル酸エチル、
アクリル酸n−プロピル、アクリル酸イソプロピル、ア
クリル酸n−ブチル、アクリル酸イソブチル、アクリル
酸sec−ブチル、アクリル酸t−ブチル、アクリル酸イ
ソアミル、アクリル酸ラウリル、アクリル酸ベンジル、
アクリル酸フェニル、アクリル酸ビニル、メタクリル酸
メチル、メタクリル酸エチル、メタクリル酸n−プロピ
ル、メタクリル酸イソプロピル、メタクリル酸n−ブチ
ル、メタクリル酸イソブチル、メタクリル酸sec−ブチ
ル、メタクリル酸t−ブチル、メタクリル酸イソアミ
ル、メタクリル酸n−ヘキシル、メタクリル酸シクロヘ
キシル、メタクリル酸ラウリル、メタクリル酸アリル、
メタクリル酸ビニル、メタクリル酸ベンジル、メタクリ
ル酸フェニル、メタクリル酸ナフチル、メタクリル酸2
−メトキシエチル、メタクリル酸ジエチレングリコール
モノメチルエーテル、メタクリル酸2−ジメチルアミノ
エチル等が例示されるがこれらに限定されるものではな
い。Specifically, methyl acrylate, ethyl acrylate,
N-propyl acrylate, isopropyl acrylate, n-butyl acrylate, isobutyl acrylate, sec-butyl acrylate, t-butyl acrylate, isoamyl acrylate, lauryl acrylate, benzyl acrylate,
Phenyl acrylate, vinyl acrylate, methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, isobutyl methacrylate, sec-butyl methacrylate, t-butyl methacrylate, methacrylic acid Isoamyl, n-hexyl methacrylate, cyclohexyl methacrylate, lauryl methacrylate, allyl methacrylate,
Vinyl methacrylate, benzyl methacrylate, phenyl methacrylate, naphthyl methacrylate, methacrylic acid 2
-Methoxyethyl, diethylene glycol monomethyl methacrylate, 2-dimethylaminoethyl methacrylate, and the like, but are not limited thereto.
重合は不活性気体中上述した三価有機Y化合物および
三価有機ランタニド化合物を触媒として用い、溶媒存在
下第1のモノマーであるエチレンを常圧で導入してエチ
レン重合を行い、その後第2のモノマーである不飽和カ
ルボン酸エステルを系中に加えて共重合することにより
ブロック共重合を得る。In the polymerization, the above-mentioned trivalent organic Y compound and trivalent organic lanthanide compound are used as a catalyst in an inert gas, ethylene is introduced as a first monomer at normal pressure in the presence of a solvent, and ethylene polymerization is performed. A block copolymer is obtained by adding an unsaturated carboxylic acid ester as a monomer into the system and copolymerizing the system.
不活性気体としては窒素、ヘリウム、アルゴン等が用
いられるが好ましくはアルゴンである。As the inert gas, nitrogen, helium, argon or the like is used, but argon is preferable.
重合に使用する溶媒は、塩化メチレン、クロロホル
ム、四塩化炭素のようなハロゲン化炭化水素、ヘキサ
ン、ヘプタン、ベンゼン、トルエン、キシレンのような
炭化水素類、テトラヒドロフラン、エーテル等が挙げら
れるがいずれも完全に脱水脱気されたものを用いるのが
よい。Solvents used for the polymerization include halogenated hydrocarbons such as methylene chloride, chloroform and carbon tetrachloride, hydrocarbons such as hexane, heptane, benzene, toluene and xylene, tetrahydrofuran and ether, all of which are complete. It is preferable to use dewatered and degassed water.
重合に使用する不飽和カルボン酸エステルモノマー
は、カルシウムハイドライド、モレキュラーシーブによ
り十分に乾燥したものを重合に供する直前に不活性気体
下で蒸留したものを用いる。As the unsaturated carboxylic acid ester monomer used for the polymerization, one that has been sufficiently dried with calcium hydride or molecular sieve and distilled under an inert gas immediately before being used for the polymerization is used.
重合温度は用いた溶媒の凝固点から沸点までの広範囲
にわたって可能であるが室温程度の方がより好ましい。The polymerization temperature can be in a wide range from the freezing point to the boiling point of the solvent used, but is preferably about room temperature.
また、分子量分布の狭いブロック共重合体が製造でき
ることが本発明の製造方法の1つの特徴である。One feature of the production method of the present invention is that a block copolymer having a narrow molecular weight distribution can be produced.
本発明の製造方法を用いれば、分子量分布の狭いエチ
レン系ブロック共重合体が容易に合成することができ
る。By using the production method of the present invention, an ethylene-based block copolymer having a narrow molecular weight distribution can be easily synthesized.
また、本方法は、相応する三価有機Y化合物および有
機ランタニド化合物のハロゲン化物(例えばビスシクロ
ペンタジエニルルテチウムクロリド、ビスペンタメチル
シクロペンタジエニルイッテルビュウムブロミド等)と
等量以下のアルキルアルカリ化合物を系中で反応させる
ことによっても重合触媒となる。In addition, the present method comprises the use of a halide of a corresponding trivalent organic Y compound and an organic lanthanide compound (for example, biscyclopentadienyl lutetium chloride, bispentamethylcyclopentadienyl ytterbium bromide, etc.) and an equivalent or less of an alkyl alkali. The reaction of the compound in the system also serves as a polymerization catalyst.
更に本発明においては触媒濃度、エチレンモノマー濃
度を決定すると反応温度、重合時間を調節することによ
り共重合体のエチレン連鎖部分の重合度を自由に制御出
来、さらに第2のモノマーである不飽和カルボン酸エス
テルの濃度、重合時間を調節することによりブロックコ
ポリマーのカルボン酸エステル部分の重合度も自由に制
御出来る点も大きな特徴である。Further, in the present invention, when the catalyst concentration and the ethylene monomer concentration are determined, the degree of polymerization of the ethylene chain portion of the copolymer can be freely controlled by adjusting the reaction temperature and the polymerization time. Another major feature is that the degree of polymerization of the carboxylic acid ester portion of the block copolymer can be freely controlled by adjusting the concentration of the acid ester and the polymerization time.
[実施例] 以下、実施例によって具体的に説明するが、本発明が
これにより何ら制限されない。EXAMPLES Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited thereto.
実施例、比較例に於て生成する共重合体の分子量はCP
Uにより求め、分子量分布はMw/Mnにより見積った。ま
た、共重合体中のエチレン、カルボン酸エステルの量比
は、1H−NMR及び13C−NMRより算出した。The molecular weight of the copolymers produced in Examples and Comparative Examples was CP
The molecular weight distribution was estimated by Mw / Mn. The quantitative ratio of ethylene and carboxylic acid ester in the copolymer was calculated from 1 H-NMR and 13 C-NMR.
実施例1 十分に乾燥アルゴンガス置換した50mlのフラスコに公
知の方法(P.L.Watson,A.C.S.Symp.,495,1983.)で合成
されたビスペンタメチルシクロペンタジエニルイッテル
ビュウメチルモノエーテラートのトルエン溶液(0.02
M)1mlとdry−トルエン20mlを投入し、冷却減圧により
アルゴンガスをエチレンに置換した後磁気撹拌器を用い
て撹拌しながら重合温度30℃に昇温した。5分間エチレ
ン重合をおこなった後、未反応のエチレンガスを冷却減
圧により再びアルゴンガスに置換した。この時、生成し
たポリエチレンを注射器で5mlでサンプリングした。残
りの反応溶液にカルシウムハイドライドおよびモレキュ
ラーシーブにより乾燥したメチルメタクリレート1mlを
注射器で加えて約1時間撹拌を続けた。反応後反応液を
多量のメタノール中にあけポリマーを析出させた。得ら
れたポリマーは、クロロホルム中で加熱還流しクロロホ
ルム不溶部を濾取し、乾燥後秤量、GPC、NMR測定を行な
った。Example 1 A toluene solution of bispentamethylcyclopentadienyl ytterbium methyl monoetherate synthesized by a known method (PLWatson, ACS Symp., 495, 1983.) in a well-dried argon gas purged 50 ml flask (0.02
M) 1 ml and dry-toluene 20 ml were charged, and the argon gas was replaced with ethylene by cooling under reduced pressure. After that, the temperature was raised to a polymerization temperature of 30 ° C. while stirring using a magnetic stirrer. After ethylene polymerization was performed for 5 minutes, unreacted ethylene gas was replaced with argon gas again under cooling and reduced pressure. At this time, the produced polyethylene was sampled with a syringe at 5 ml. 1 ml of methyl methacrylate dried with calcium hydride and molecular sieve was added to the remaining reaction solution with a syringe, and stirring was continued for about 1 hour. After the reaction, the reaction solution was poured into a large amount of methanol to precipitate a polymer. The obtained polymer was heated and refluxed in chloroform, and the chloroform-insoluble portion was collected by filtration. After drying, weighing, GPC, and NMR measurement were performed.
実施例2 ポリエチレン重合時間を10分とする以外実施例1と同
様に行なった。Example 2 The same procedure as in Example 1 was carried out except that the polymerization time for polyethylene was changed to 10 minutes.
実施例3 ポリエチレン重合時間を15分とする以外実施例1と同
様に行なった。Example 3 It carried out similarly to Example 1 except having made polyethylene polymerization time into 15 minutes.
実施例4 開始剤としてビスペンタメチルシクロペンタジエニル
サマリウムハイドライドを用い、ポリエチレン重合時間
を1分とする以外は、実施例1と同様に行なった。Example 4 The same operation as in Example 1 was carried out except that bispentamethylcyclopentadienyl samarium hydride was used as an initiator and the polymerization time of polyethylene was 1 minute.
実施例5 開始剤としてビスペンタメチルシクロペンタジエニル
サマリウムハイドライドを用い、ポリエチレン重合時間
を3分とする以外は、実施例1と同様に行なった。Example 5 The same operation as in Example 1 was carried out except that bispentamethylcyclopentadienyl samarium hydride was used as an initiator and the polymerization time of polyethylene was 3 minutes.
比較例1 開始剤としてビスペンタメチルイッテルビュウムビス
テトラヒドロフラネート(二価)を用いた以外は実施例
1と同様に共重合を行なったが共重合体は得られなかっ
た。Comparative Example 1 Copolymerization was carried out in the same manner as in Example 1 except that bispentamethylytterbium bistetrahydrofuranate (divalent) was used as an initiator, but no copolymer was obtained.
実施例6 開始剤としてビスペンタメチルシクロペンタジエニル
イッテルビュウムメチルトリメチルアルミニウムを用い
る以外は、実施例1と同様に行なった。Example 6 The same operation as in Example 1 was performed except that bispentamethylcyclopentadienyl ytterbium methyltrimethylaluminum was used as an initiator.
実施例1〜6までの結果をまとめて表1に示す。 Table 1 summarizes the results of Examples 1 to 6.
実施例7 開始剤としてビスペンタメチルシクロペンタジエニル
イッテルビウムメチルを用い、モノマーとしてアクリル
酸メチルを用いる以外は、実施例1と同様に行なった。
収量 57mg。 Example 7 It carried out like Example 1 except using bispentamethylcyclopentadienyl ytterbium methyl as an initiator and using methyl acrylate as a monomer.
Yield 57mg.
実施例8 開始剤としてビスペンタメチルシクロペンタジエニル
ルテチウムメチルモノエーテラートを用い、ポリエチレ
ンの重合時間を10分とする以外は実施例1と同様に行っ
た。Example 8 Example 8 was repeated except that bispentamethylcyclopentadienyl lutetium methyl monoetherate was used as the initiator and the polymerization time of polyethylene was changed to 10 minutes.
実施例9 ビスペンタメチルシクロペンタジエニルイットリウム
メチルモノエーテラートを用い、ポリエチレンの重合時
間を5分とした以外は実施例1と同様に行った。Example 9 The same operation as in Example 1 was carried out except that bispentamethylcyclopentadienyl yttrium methyl monoetherate was used and the polymerization time of polyethylene was changed to 5 minutes.
実施例8と9の結果を表2に示す。 Table 2 shows the results of Examples 8 and 9.
[発明の効果] 本発明の上記共重合体をポリオレフィン等の熱可塑性
樹脂に配合することにより,該樹脂の種々の性質を改良
することができる。 [Effects of the Invention] By blending the copolymer of the present invention with a thermoplastic resin such as polyolefin, various properties of the resin can be improved.
【図面の簡単な説明】 図1は実施例1で得られたポリエチレン−PMMA共重合体
のIRスペクトルである。(実施例2〜6で得られたもの
も同様のスペクトルを示した。)BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is an IR spectrum of the polyethylene-PMMA copolymer obtained in Example 1. (Those obtained in Examples 2 to 6 also showed similar spectra.)
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) C08F 297/06 - 297/08 C08F 4/52 C08F 4/60 - 4/70 C08F 10/00 - 10/14 C08F 110/00 - 110/14 C08F 210/00 - 210/18 C08F 20/00 - 20/40 C08F 120/00 - 120/40 C08F 220/00 - 220/40 CAS ONLINE──────────────────────────────────────────────────の Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) C08F 297/06-297/08 C08F 4/52 C08F 4/60-4/70 C08F 10/00-10 / 14 C08F 110/00-110/14 C08F 210/00-210/18 C08F 20/00-20/40 C08F 120/00-120/40 C08F 220/00-220/40 CAS ONLINE
Claims (2)
ブロック共重合するに際し、2つの(置換)シクロペン
タジエニル基を有する三価のイットリウム化合物又は三
価のランタニド化合物を開始剤として用いることを特徴
とするエチレンと不飽和カルボン酸エステルのブロック
共重合体の製造方法。(1) When block copolymerizing ethylene and an unsaturated carboxylic acid ester, a trivalent yttrium compound or a trivalent lanthanide compound having two (substituted) cyclopentadienyl groups is used as an initiator. A method for producing a block copolymer of ethylene and an unsaturated carboxylic acid ester, which is a feature of the present invention.
ブロック共重合するに際し、2つの(置換)シクロペン
タジエニル基を有する三価のイットリウム化合物又は三
価のランタニド化合物と有機アルミニウム化合物とを開
始剤として用いることを特徴とするエチレンと不飽和カ
ルボン酸エステルのブロック共重合体の製造方法。2. A block copolymer of ethylene and an unsaturated carboxylic acid ester is started with a trivalent yttrium compound or trivalent lanthanide compound having two (substituted) cyclopentadienyl groups and an organoaluminum compound. A method for producing a block copolymer of ethylene and an unsaturated carboxylic acid ester, which is used as an agent.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5433790A JP2850152B2 (en) | 1990-03-06 | 1990-03-06 | Method for producing ethylene copolymer |
| CA002035650A CA2035650C (en) | 1990-02-14 | 1991-02-04 | Process of preparing polymer or copolymer of unsaturated carboxylic acid ester |
| KR1019910002348A KR0155998B1 (en) | 1990-02-14 | 1991-02-12 | Process for preparing polymers or copolymers of unsaturated carboxylic esters |
| DE69110490T DE69110490T2 (en) | 1990-02-14 | 1991-02-13 | Process for the preparation of a polymer or copolymer of an ester of an unsaturated carboxylic acid. |
| EP91102031A EP0442476B1 (en) | 1990-02-14 | 1991-02-13 | Process for preparing polymer or copolymer of unsaturated carboxylic acid ester |
| US07/655,491 US5132369A (en) | 1990-02-14 | 1991-02-14 | Process for preparing narrow molecular weight distribution syndiotactic block copolymers of unsaturated carboxylic acid esters with α-olefins |
| US07/875,330 US5218064A (en) | 1990-02-14 | 1992-04-29 | Process for preparing narrow molecular weight distribution syndiotactic polymers or copolymers of unsaturated carboxylic acid esters |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5433790A JP2850152B2 (en) | 1990-03-06 | 1990-03-06 | Method for producing ethylene copolymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03255116A JPH03255116A (en) | 1991-11-14 |
| JP2850152B2 true JP2850152B2 (en) | 1999-01-27 |
Family
ID=12967790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5433790A Expired - Fee Related JP2850152B2 (en) | 1990-02-14 | 1990-03-06 | Method for producing ethylene copolymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2850152B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3426699B2 (en) * | 1994-04-27 | 2003-07-14 | 住友化学工業株式会社 | Process for producing polymer comprising unsaturated carboxylic acid and derivative thereof |
| JP5207777B2 (en) | 2008-03-06 | 2013-06-12 | パナソニック株式会社 | Solid-state imaging device and manufacturing method thereof |
-
1990
- 1990-03-06 JP JP5433790A patent/JP2850152B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03255116A (en) | 1991-11-14 |
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