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JP2857775B2 - Oxidation resistance treatment method for metal surface - Google Patents
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JP2857775B2 - Oxidation resistance treatment method for metal surface - Google Patents

Oxidation resistance treatment method for metal surface

Info

Publication number
JP2857775B2
JP2857775B2 JP1237888A JP23788889A JP2857775B2 JP 2857775 B2 JP2857775 B2 JP 2857775B2 JP 1237888 A JP1237888 A JP 1237888A JP 23788889 A JP23788889 A JP 23788889A JP 2857775 B2 JP2857775 B2 JP 2857775B2
Authority
JP
Japan
Prior art keywords
plating layer
nickel
copper wire
thickness
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1237888A
Other languages
Japanese (ja)
Other versions
JPH03100195A (en
Inventor
和久 塩見
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Haitetsuku Kk
Original Assignee
Dowa Haitetsuku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Haitetsuku Kk filed Critical Dowa Haitetsuku Kk
Priority to JP1237888A priority Critical patent/JP2857775B2/en
Publication of JPH03100195A publication Critical patent/JPH03100195A/en
Application granted granted Critical
Publication of JP2857775B2 publication Critical patent/JP2857775B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • C25D5/12Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、金属の酸化腐食を防止するための表面処理
方法に関する。
Description: TECHNICAL FIELD The present invention relates to a surface treatment method for preventing oxidative corrosion of a metal.

[従来の技術] 金属に耐酸化腐食性を付与するための処理法として
は、金属表面への有機化合物の吸着により防錆処理やク
ロメート処理、樹脂被覆等の方法が知られている。しか
しながら、これらの方法によっては、500℃のような高
温でも処理された金属が充分な耐酸化腐食効果を示すよ
うにするということは期待できない。
[Prior Art] As a treatment method for imparting oxidation corrosion resistance to a metal, there are known methods such as rust prevention treatment, chromate treatment, and resin coating by adsorption of an organic compound to a metal surface. However, depending on these methods, it cannot be expected that the metal treated at a high temperature such as 500 ° C. will exhibit a sufficient oxidation corrosion resistance.

一方、金属にニッケルメッキをすることによって、処
理された金属が500℃のような高温でも充分な酸化防止
効果を示すようにすることができるということは知られ
ている。しかしながら、この場合、メッキしたニッケル
の表面が酸化して黒色化し、美観が損われるばかりでな
く、これを高温下に長期間保持するとニッケルの酸化が
さらに進行し、遂にはメッキされた金属の折り曲げ等に
より金属表面にクラックが発生し、ニッケルメッキした
表面層が剥離脱落するようになる。
On the other hand, it is known that by plating a metal with nickel, the treated metal can exhibit a sufficient antioxidant effect even at a high temperature such as 500 ° C. However, in this case, the surface of the plated nickel is oxidized and blackened, and not only the appearance is impaired, but also if it is kept at a high temperature for a long time, the oxidation of the nickel further progresses, and finally the plated metal is bent. Cracks occur on the metal surface due to the above-mentioned factors, and the nickel-plated surface layer peels off.

[発明が解決しようとする問題点] そこで、500℃のような高温下においても、目的金属
の酸化腐食を充分に防止できると共に、処理後のものを
折り曲げても表面に形成したメッキ層等が剥離脱落する
ことのない金属表面の耐酸化処理方法を見い出すことが
必要となっていた。
[Problems to be Solved by the Invention] Therefore, even at a high temperature such as 500 ° C., it is possible to sufficiently prevent oxidative corrosion of a target metal, and a plated layer or the like formed on a surface even after bending a treated metal is bent. It has been necessary to find an oxidation-resistant treatment method for a metal surface that does not peel off and fall off.

[問題点を解決するための手段] 金属表面ニッケルメッキ層を形成し、インジウムのメ
ッキ層を形成した後、該インジウムメッキ層の上にニッ
ケルのメッキ層を形成することによって、上記の問題点
を解決することができた。この場合のインジウムメッキ
層の厚さは0.05μm〜5μmとするのが適切である。0.
05μm未満の厚さでは上記2層のメッキの効果が充分で
なはなく、また厚さが5μmに達するとその効果は飽和
し、それ以上厚くすることは単にコストを高くするに過
ぎないからである。また、インジウムメッキ層の上に設
けるニッケルメッキ層の厚さも0.05μm〜5μmとする
のが適切である。理由はインジウムメッキ層の厚さにつ
いて述べた理由と全く同じである。
[Means for Solving the Problems] After forming a nickel plating layer on a metal surface, forming an indium plating layer, and then forming a nickel plating layer on the indium plating layer, the above-mentioned problems are solved. Could be solved. In this case, it is appropriate that the thickness of the indium plating layer is 0.05 μm to 5 μm. 0.
If the thickness is less than 05 μm, the effect of the above two-layer plating is not sufficient, and if the thickness reaches 5 μm, the effect is saturated, and if the thickness exceeds 5 μm, simply increasing the thickness merely increases the cost. is there. It is also appropriate that the thickness of the nickel plating layer provided on the indium plating layer is 0.05 μm to 5 μm. The reason is exactly the same as that described for the thickness of the indium plating layer.

本発明方法によって表面処理することのできる金属は
インジウムあるいはニッケルのメッキ層を安定に形成で
きるものであれば特に制限はないが、主として、銅、鉄
等である。保護すべき金属の表面に直接インジウムをメ
ッキし、その上にニッケルをメッキすることもできる
が、金属表面にニッケルメッキの下引き層を形成した後
にインジウムメッキ層を形成し、さらにその上にニッケ
ルメッキすると、より改善された効果が得られる。下引
きするニッケルメッキ層の厚さに特に制限はないが、そ
の上にメッキされる層の厚さについて説明したのと同様
の理由で0.05μm〜5μmの範囲の厚さとするのが適切
である。
The metal that can be surface-treated by the method of the present invention is not particularly limited as long as it can form a plated layer of indium or nickel stably, but is mainly copper, iron or the like. Indium can be plated directly on the surface of the metal to be protected and nickel can be plated on it.However, after forming an undercoat layer of nickel plating on the metal surface, an indium plating layer is formed, and nickel is further formed thereon. Plating provides an improved effect. The thickness of the nickel plating layer to be subbed is not particularly limited, but it is appropriate to set the thickness in the range of 0.05 μm to 5 μm for the same reason as described for the thickness of the layer plated thereon. .

[作 用] 本発明に従って、上述の如く、金属表面にニッケルメ
ッキの下引き層を設けその上にインジウムメッキ層を設
け、さらにその上にニッケルメッキ層を設けて3層構成
の保護メッキ層を形成すると、3層構成メッキ層を持つ
金属が500℃というような高温雰囲気にさらされた場合
に、インジウムメッキ層とニッケルメッキ層との間に熱
拡散が生じて両者の界面にインジウムとニッケルとの金
属間化合物が形成され、この金属間化合物が優れた耐酸
化特性を示すために、500℃のような高温でも充分な酸
化防止効果を持つ被覆金属が得られるのであることが理
解される。インジウム単味ではその融点が156.6℃と低
いが、金属間化合物が形成されることにより、550℃で
も溶融しない高い融点をもつ金属間化合物の保護層が形
成されていることが確認された。
[Operation] According to the present invention, as described above, a nickel plating subbing layer is provided on a metal surface, an indium plating layer is provided thereon, and a nickel plating layer is further provided thereon to form a three-layer protective plating layer. When formed, when a metal having a three-layer plating layer is exposed to a high-temperature atmosphere such as 500 ° C., thermal diffusion occurs between the indium plating layer and the nickel plating layer, and indium and nickel are formed at the interface between the two. It is understood that an intermetallic compound of the formula (1) is formed, and since this intermetallic compound exhibits excellent oxidation resistance, a coated metal having a sufficient antioxidant effect can be obtained even at a high temperature such as 500 ° C. The melting point of indium alone was as low as 156.6 ° C., but it was confirmed that the formation of the intermetallic compound formed a protective layer of an intermetallic compound having a high melting point which did not melt even at 550 ° C.

[実施例] 本発明に従って、第3図(a)のように、直径5mmの
銅線の周囲に厚さ2μmのニッケルメッキ層を設けた
後、その上に厚さ0.5μmのインジウムメッキ層を形成
し、さらにその上の厚さ0.5μmのニッケルメッキ層を
設けた。上記各メッキ層は電気メッキ法によって形成し
た。
[Example] According to the present invention, as shown in FIG. 3 (a), after a nickel plating layer having a thickness of 2 μm was provided around a copper wire having a diameter of 5 mm, an indium plating layer having a thickness of 0.5 μm was formed thereon. Then, a nickel plating layer having a thickness of 0.5 μm was further provided thereon. Each of the plating layers was formed by an electroplating method.

一方、比較のため、第3図(b)のように、上記と同
じ直径5mmの銅線の周囲に、厚さ3μmのニッケルメッ
キ層を電気メッキ法によって形成した。
On the other hand, for comparison, as shown in FIG. 3B, a nickel plating layer having a thickness of 3 μm was formed by electroplating around the same copper wire having a diameter of 5 mm as described above.

上記2種の互いに異なる表面処理をした銅線について
耐酸化性評価のための試験を行った結果は第1図に示す
通りであった。すなわち、各銅線試料を大気中550℃の
温度で、それぞれ5日間、10日間、15日間および20日間
保持した後に測定した各銅線試料10cm当りの重量増加量
は図示の通りであり、インジウムメッキの上にニッケル
メッキした本発明の被覆銅線は、ニッケルメッキしただ
けの比較用被覆銅線に比し、重量増加量が小さく、酸化
される速度が小さいことがわかる。また、550℃で20日
間保持した後、銅線試料を折り曲げてみたところ、本発
明の方法で処理したものは剥離が生じなかったが、比較
例の銅線試料は折り曲げにより表面の一部が剥離した。
FIG. 1 shows the results of a test for evaluating the oxidation resistance of the two types of copper wires having different surface treatments. That is, the weight increase per 10 cm of each copper wire sample measured after holding each copper wire sample at 550 ° C. in the air for 5 days, 10 days, 15 days and 20 days, respectively, is as shown in the figure. It can be seen that the coated copper wire of the present invention plated with nickel on the plating has a smaller weight increase and a lower oxidation rate than the comparative coated copper wire simply plated with nickel. After holding at 550 ° C. for 20 days, when the copper wire sample was bent, the one treated by the method of the present invention did not peel off, but the copper wire sample of the comparative example had a part of the surface due to bending. Peeled off.

また、大気雰囲気中550℃でそれぞれ5日間、10日
間、15日間および20日間保持した後に測定した各銅線試
料の抵抗値の変化の模様は第2図に示す通りであり、本
発明の方法で処理した銅線試料は比較用の銅線試料に比
し、抵抗の増加が小さく、銅線の耐酸化性が向上してい
ることが明らかである。尚、第2図において、抵抗値は
550℃の雰囲気に入れる前の抵抗値を100%とする相対値
で示した。また抵抗値は550℃の雰囲気中に保持した
後、25℃中の雰囲気において測定したものである。
The pattern of the change in the resistance value of each copper wire sample measured after holding at 550 ° C. for 5 days, 10 days, 15 days and 20 days in the air atmosphere is as shown in FIG. It is clear that the copper wire sample treated with has a smaller increase in resistance and an improved oxidation resistance of the copper wire as compared with the copper wire sample for comparison. In FIG. 2, the resistance value is
Relative values are shown assuming that the resistance value before entering the atmosphere at 550 ° C is 100%. The resistance value was measured in an atmosphere at 25 ° C. after holding in an atmosphere at 550 ° C.

上記の比較試験の結果は、本発明方法で表面処理した
銅線は抵抗の増加が小さく、銅線に耐酸化性があること
を明らかに示している。
The results of the above comparative test clearly show that the copper wire surface-treated by the method of the present invention has a small increase in resistance and has an oxidation resistance.

【図面の簡単な説明】[Brief description of the drawings]

第1図は、銅線試料を550℃の大気雰囲気中に保持した
日数と、銅線の重量増加との関係を示すグラフである。 第2図は、銅線試料を550℃の大気雰囲気中に保持した
日数と銅線の抵抗値との関係を示すグラフである。 第3図は、本発明の方法によってニッケル、インジウム
およびニッケルの各メッキ層で被覆した銅線の断面図
(a)およびニッケルメッキ層だけで被覆した従来の銅
線の断面図(b)である。
FIG. 1 is a graph showing the relationship between the number of days that a copper wire sample was kept in an air atmosphere at 550 ° C. and the weight increase of the copper wire. FIG. 2 is a graph showing the relationship between the number of days when a copper wire sample was kept in an air atmosphere at 550 ° C. and the resistance value of the copper wire. FIG. 3 is a cross-sectional view of a copper wire covered with nickel, indium and nickel plating layers by the method of the present invention (a) and a conventional copper wire covered with only a nickel plating layer (b). .

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】金属表面にニッケルメッキ層を形成した
後、その上にインジウムメッキ層を形成し、さらにその
上にニッケルメッキ層を形成することからなる金属表面
の耐酸化処理方法。
An oxidation-resistant method for a metal surface, comprising: forming a nickel plating layer on a metal surface, forming an indium plating layer thereon, and further forming a nickel plating layer thereon.
【請求項2】前記インジウムメッキ層の厚みが0.05μm
〜5μmの範囲の厚みであり、かつその上に形成する前
記ニッケルメッキ層の厚みが0.05μm〜5μmの範囲の
厚みである請求項1に記載の金属表面の耐酸化処理方
法。
2. The indium plating layer has a thickness of 0.05 μm.
2. The method according to claim 1, wherein the thickness of the nickel plating layer is in a range of 0.05 μm to 5 μm, and the thickness of the nickel plating layer formed thereon is in a range of 0.05 μm to 5 μm.
JP1237888A 1989-09-13 1989-09-13 Oxidation resistance treatment method for metal surface Expired - Fee Related JP2857775B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1237888A JP2857775B2 (en) 1989-09-13 1989-09-13 Oxidation resistance treatment method for metal surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1237888A JP2857775B2 (en) 1989-09-13 1989-09-13 Oxidation resistance treatment method for metal surface

Publications (2)

Publication Number Publication Date
JPH03100195A JPH03100195A (en) 1991-04-25
JP2857775B2 true JP2857775B2 (en) 1999-02-17

Family

ID=17021911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1237888A Expired - Fee Related JP2857775B2 (en) 1989-09-13 1989-09-13 Oxidation resistance treatment method for metal surface

Country Status (1)

Country Link
JP (1) JP2857775B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017060216A1 (en) * 2015-10-06 2017-04-13 Atotech Deutschland Gmbh Process for indium or indium alloy deposition and article

Also Published As

Publication number Publication date
JPH03100195A (en) 1991-04-25

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