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JP2859972B2 - Particle size distribution measuring device - Google Patents
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JP2859972B2 - Particle size distribution measuring device - Google Patents

Particle size distribution measuring device

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Publication number
JP2859972B2
JP2859972B2 JP3063743A JP6374391A JP2859972B2 JP 2859972 B2 JP2859972 B2 JP 2859972B2 JP 3063743 A JP3063743 A JP 3063743A JP 6374391 A JP6374391 A JP 6374391A JP 2859972 B2 JP2859972 B2 JP 2859972B2
Authority
JP
Japan
Prior art keywords
solid
particle size
size distribution
group
imaging device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3063743A
Other languages
Japanese (ja)
Other versions
JPH04278439A (en
Inventor
左門 大家
孝志 松岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ONO SOTSUKI KK
Original Assignee
ONO SOTSUKI KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ONO SOTSUKI KK filed Critical ONO SOTSUKI KK
Priority to JP3063743A priority Critical patent/JP2859972B2/en
Publication of JPH04278439A publication Critical patent/JPH04278439A/en
Application granted granted Critical
Publication of JP2859972B2 publication Critical patent/JP2859972B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はレーザ光を例えば自動車
の燃料噴霧等の微粒子群に照射し、該微粒子群により回
折されたレーザ光を受光し、この回折パターンに基づい
て該微粒子群の径の分布を測定する粒径分布測定装置に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of irradiating a laser beam to a particle group such as a fuel spray of an automobile, receives a laser beam diffracted by the particle group, and based on the diffraction pattern, the diameter of the particle group. The present invention relates to a particle size distribution measuring device for measuring the distribution of particles.

【0002】[0002]

【従来の技術】所定の径を有する微粒子群にレーザ光を
照射し該微粒子群によるフランホーファー回折像を観察
したときその回折パターンと微粒子群の径とが一対一に
対応することに着目し、種々の径を有する微粒子群から
回折されたレーザ光の複合された回折パターンを所定の
アルゴリズムに基づいて解析することにより、微粒子群
の粒径の分布を知る方法が知られている(例えば「表
面」vol.22 No.2(1984)87(27)
頁〜94(34)頁参照)。この方法では、上記回折パ
ターンが0次光のスポットを中心とした同心的なパター
ンであることから、例えば同心的な15個の円環形状の
光センサを用いてその回折パターンを受光し、この受光
された回折パターンを解析することにより粒径分布を求
めるものである。
2. Description of the Related Art When a group of particles having a predetermined diameter is irradiated with laser light and a Fraunhofer diffraction image of the group of particles is observed, attention is paid to the fact that the diffraction pattern and the diameter of the group of particles correspond one to one. There is known a method of analyzing a composite diffraction pattern of laser light diffracted from a group of fine particles having various diameters based on a predetermined algorithm to know the distribution of the particle size of the group of fine particles (for example, “surface”). Vol.22 No.2 (1984) 87 (27)
Pp. 94-34). In this method, since the diffraction pattern is a concentric pattern centered on the spot of the 0th-order light, the diffraction pattern is received using, for example, 15 concentric ring-shaped optical sensors. The particle size distribution is obtained by analyzing the received diffraction pattern.

【0003】[0003]

【発明が解決しようとする課題】上記多数の円環状の光
センサを用いる方法は、これら多数の円環状光センサか
らなる光検出器の中心が光軸と正確に一致するように厳
密に位置調整をする必要があり、測定の前準備が大変で
あるという問題がある。
In the above-mentioned method using a large number of annular optical sensors, the position is precisely adjusted so that the center of a photodetector composed of the multiple annular optical sensors exactly coincides with the optical axis. Therefore, there is a problem that preparation before measurement is difficult.

【0004】この問題を解決するために上記多数の円環
状の光センサからなる検出器に代えて例えばCCD等の
固体撮像素子を用い、大雑把に位置合わせをして回折光
を受光し、この回折光のパターンが回転対称であること
を利用して演算により光軸中心を求める方法が考えられ
る。
In order to solve this problem, a solid-state image pickup device such as a CCD is used in place of the detector composed of a large number of annular optical sensors, the position is roughly adjusted, and the diffracted light is received. A method is conceivable in which the center of the optical axis is obtained by calculation using the fact that the light pattern is rotationally symmetric.

【0005】ここで、上記の粒径分布測定においては回
折光パターンを高精度に測定する必要がある。ところ
が、通常CCD等の固体撮像素子にはその受光面に保護
用のガラス板が配置されており、一般的な撮像の場合に
は問題とはならないが、粒径分布測定の場合は単色のレ
ーザ光を用いるため上記ガラス板内の多重反射により干
渉縞が生じこの干渉縞がもとの回折光に重畳されて受光
されて測定精度が低下してしまうという問題があり、こ
のことがCCD等の固体撮像素子を粒径分布測定に用い
ることを難しくしていた。
Here, in the above particle size distribution measurement, it is necessary to measure the diffraction light pattern with high accuracy. However, a solid-state imaging device such as a CCD usually has a glass plate for protection on its light receiving surface, which is not a problem for general imaging, but a monochromatic laser for particle size distribution measurement. Since light is used, interference fringes occur due to multiple reflections in the glass plate, and the interference fringes are superimposed on the original diffracted light and are received, thereby deteriorating the measurement accuracy. It has been difficult to use a solid-state imaging device for particle size distribution measurement.

【0006】本発明は、上記事情に鑑み、固体撮像素子
を用い、ガラス板で固体撮像素子の受光面を保護すると
ともにこのガラス板に起因する測定精度の低下を押えた
構成を備えた粒径分布測定装置を提供することを目的と
する。
In view of the above circumstances, the present invention uses a solid-state image sensor, protects the light receiving surface of the solid-state image sensor with a glass plate, and suppresses a decrease in measurement accuracy caused by the glass plate. It is an object to provide a distribution measuring device.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
の本発明の第一の粒径分布測定装置は、レーザ光を微粒
子群に照射する照射光学系と、該微粒子群による回折像
を受光する固体撮像素子と、該固体撮像素子により受光
された回折像パターンに基づいて前記微粒子群の粒径分
布を求める演算手段とを備えた粒径分布測定装置におい
て、前記撮像素子前面に該撮像素子から離れた側の表面
に反射防止膜が付されたガラス板が配置されてなること
を特徴とするものである。
In order to achieve the above object, a first particle size distribution measuring apparatus according to the present invention comprises: an irradiation optical system for irradiating a group of fine particles with a laser beam; A particle size distribution measuring apparatus, comprising: a solid-state imaging device that performs the measurement; and a calculation unit that calculates a particle size distribution of the fine particle group based on a diffraction image pattern received by the solid-state imaging device. A glass plate provided with an anti-reflection film on the surface on the side away from the glass plate.

【0008】また上記目的を達成するための本発明の第
二の粒径分布測定装置は、レーザ光を微粒子群に照射す
る照射光学系と、該微粒子群による回折像を受光する固
体撮像素子と、該固体撮像素子により受光された回折像
パターンに基づいて前記微粒子群の粒径分布を求める演
算手段とを備えた粒径分布測定装置において、前記固体
撮像素子前面に、表面もしくは裏面のうちのいずれか一
方が他方に対してテーパに形成されたガラス板が配置さ
れてなることを特徴とするものである。
In order to achieve the above object, a second particle size distribution measuring apparatus according to the present invention comprises an irradiation optical system for irradiating a group of particles with a laser beam, a solid-state imaging device for receiving a diffraction image by the group of particles. A particle size distribution measuring device comprising: a calculating means for calculating a particle size distribution of the fine particle group based on a diffraction image pattern received by the solid-state image sensor . Any one
The other is characterized in that a glass plate tapered with respect to the other is disposed.

【0009】また上記目的を達成するための本発明の第
三の粒径分布測定装置は、レーザ光を微粒子群に照射す
る照射光学系と、該微粒子群による回折像を受光する固
体撮像素子と、該固体撮像素子により受光された回折像
パターンに基づいて前記微粒子群の粒径分布を求める演
算手段とを備えた粒径分布測定装置において、前記固体
撮像素子前面に、該固体撮像素子から離れた側の表面に
反射防止膜が付されるとともに該表面もしくは裏面のう
ちのいずれか一方が他方に対してテーパに形成されたガ
ラス板が配置されてなることを特徴とするものである。
According to a third aspect of the present invention, there is provided a particle size distribution measuring apparatus comprising: an irradiation optical system for irradiating a group of particles with a laser beam; and a solid-state imaging device for receiving a diffraction image by the group of particles. A calculating means for calculating a particle size distribution of the fine particle group based on a diffraction image pattern received by the solid-state imaging device; surface or the back surface with the antireflective film on the surface side is attached has
A glass plate, one of which is tapered with respect to the other, is disposed.

【0010】[0010]

【作用】本発明の第一の粒径分布測定装置は、ガラス板
に反射防止膜を付したため多重反射のほとんどが防止さ
れ、したがって、回折パターンが高精度に測定される。
According to the first particle size distribution measuring apparatus of the present invention, since the glass plate is provided with the antireflection film, most of the multiple reflection is prevented, and therefore, the diffraction pattern is measured with high precision.

【0011】また、本発明の第二の粒径分布測定装置
は、ガラス板がテーパに形成されているため、ガラス板
の1カ所で多重に反射を繰り返すことがなくなり、した
がって余計な干渉縞が生じる余地が少なく、回折パター
ンが高精度と測定される。
Further, in the second particle size distribution measuring apparatus of the present invention, since the glass plate is formed to be tapered, it does not repeatedly reflect at one place of the glass plate, so that unnecessary interference fringes are generated. There is little room to create and the diffraction pattern is measured with high accuracy.

【0012】また、本発明の第三の粒径分布測定装置
は、テーパに形成されたガラス板に反射防止膜を付した
ため、上記第一の粒径分布測定装置と第二の粒径分布測
定装置の双方の作用が重畳され、回折パターンの一層高
精度の測定が可能となる。
Further, the third particle size distribution measuring apparatus of the present invention has an anti-reflection film attached to a tapered glass plate. Both actions of the device are superimposed, allowing a more accurate measurement of the diffraction pattern.

【0013】[0013]

【実施例】以下、図面を参照して、本発明の実施例につ
いて説明する。図1は、本発明の一実施例に係る粒径分
布測定装置の概略構成図である。レーザ光源1から射出
されたレーザ光2は、ビームイクスパンダー(beam
expander)3により所定の範囲に広がった平行
光とされ、例えば自動車の燃料噴霧等に含まれる微粒子
群4に照射される。この微粒子群4に照射されたレーザ
光はこの一部がこの微粒子群4により回折された後レン
ズ5により集光され、ガラス板8を透過してCCD6の
前面に照射され、この回折像がCCD6により受光され
る。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a schematic configuration diagram of a particle size distribution measuring apparatus according to one embodiment of the present invention. The laser light 2 emitted from the laser light source 1 is applied to a beam expander (beam).
The light is made into a parallel light spread in a predetermined range by an expander 3, and is applied to a fine particle group 4 contained in, for example, a fuel spray of an automobile. A part of the laser light applied to the particle group 4 is diffracted by the particle group 4 and then condensed by the lens 5, transmitted through the glass plate 8 and irradiated on the front surface of the CCD 6. Is received by the

【0014】図2はこのCCD6の前面における回折像
パターンの一例を表わした図である。微粒子群4がある
所定の径の微粒子のみから構成されている場合は、CC
D6上には例えば図2に破線で示す回折パターン11が
生じ、微粒子群4が他の所定の径の微粒子群のみから構
成されている場合は図2に一点鎖線で示す回折パターン
12を生じるが、ここでは微粒子群4は種々の径を有す
る微粒子から構成されているためこの微粒子群4により
形成される回折パターン10は種々の径の微粒子による
回折パターン(回折パターン11、12等)が重畳され
たものとなる。
FIG. 2 is a diagram showing an example of a diffraction image pattern on the front surface of the CCD 6. When the particle group 4 is composed of only particles having a predetermined diameter, CC
For example, a diffraction pattern 11 indicated by a broken line in FIG. 2 is generated on D6, and a diffraction pattern 12 indicated by a chain line in FIG. Here, since the particle group 4 is composed of particles having various diameters, the diffraction pattern 10 formed by the particle group 4 is superimposed with the diffraction patterns (diffraction patterns 11, 12, etc.) of the particles having various diameters. It will be.

【0015】図1に示すCCD6により受光され電気信
号に変換された回折パターンは、演算回路7に入力さ
れ、この演算回路7では、この回折パターンを表わす信
号に基づいて、例えば図3に一例を示すように各粒径d
を有する粒子群の粒径分布Nが求められる。
The diffraction pattern received by the CCD 6 shown in FIG. 1 and converted into an electric signal is input to an arithmetic circuit 7, and the arithmetic circuit 7 uses, for example, an example shown in FIG. As shown, each particle size d
Is obtained from the particle group having the following formula.

【0016】図4は、0次光をカットするためのマスク
と回折光を減衰させるためのフィルタを施したガラス板
が表面に貼付されたCCDの一例を表わした正面図であ
る。本実施例ではCCD6は図4の左上端に0次光が照
射されるようにその概略の光軸調整が行われることが予
定されており、したがって0次光をカットするマスク2
0がCCD6の表面の左上端に貼付されている。また回
折パターンは、図2に示すように平均的には光軸中心
(0次光の照射位置)に近い領域ほどその光量が大き
く、光軸中心から離れるにしたがってその光量は減衰す
る。そこで本実施例ではマスク20に隣接する、図4の
左上の領域に一様な濃度のNDフィルタ21が貼付され
ている。
FIG. 4 is a front view showing an example of a CCD having a glass plate provided with a mask for cutting zero-order light and a filter for attenuating diffracted light on the surface. In this embodiment, it is expected that the CCD 6 will roughly adjust its optical axis so that the zero-order light is irradiated to the upper left end of FIG.
0 is affixed to the upper left corner of the surface of the CCD 6. On the other hand, as shown in FIG. 2, the light amount of the diffraction pattern is larger in the region closer to the center of the optical axis (the irradiation position of the zero-order light) on average, and the light amount decreases as the distance from the center of the optical axis increases. Therefore, in this embodiment, an ND filter 21 having a uniform density is attached to an upper left area of FIG.

【0017】ここで、CCD6の左上端はマスク20で
覆われており0次光は受光されないため、本実施例では
回折光パターンが光軸中心を中心とした回転対称である
ことを利用し、演算手段7(図1参照)において、CC
D6で受光された回折パターンを所定のしきい値で2値
化処理することにより、例えば図4に破線で示す円弧3
0が求められ、この円弧30の中心点0が求められ、こ
れによりその中心点が光軸中心0とされる。演算手段7
では、上記のように光軸中心0を求めた後、回折パター
ンのうちNDフィルタ21により減衰された分が補正さ
れ、この補正された回折パターンに基づいて微粒子群4
の粒径分布が求められる。
Here, since the upper left end of the CCD 6 is covered with the mask 20 and the zero-order light is not received, this embodiment utilizes the fact that the diffracted light pattern is rotationally symmetric about the optical axis center. In the calculating means 7 (see FIG. 1),
By binarizing the diffraction pattern received at D6 with a predetermined threshold value, for example, an arc 3 shown by a broken line in FIG.
0 is obtained, and the center point 0 of the arc 30 is obtained, and the center point is set as the optical axis center 0. Calculation means 7
Then, after the optical axis center 0 is obtained as described above, the portion of the diffraction pattern attenuated by the ND filter 21 is corrected, and the fine particle group 4 is determined based on the corrected diffraction pattern.
Is determined.

【0018】図5は、図4に示すCCDの受光面前面に
フィルタを施したガラス板が付された状態を表わした側
面図である。通常CCDの前面には、このCCDの受光
面を保護するため、この図に示すようにガラス板が配置
されるが、この図に示すガラス板8は前面8aがテーパ
に形成されており、さらにこの前面8aにはこの粒径分
布測定装置で用いられるレーザ光2(図1参照)の波長
に対応して反射防止膜9が蒸着されている。
FIG. 5 is a side view showing a state in which a glass plate with a filter is attached to the front surface of the light receiving surface of the CCD shown in FIG. Normally, a glass plate is arranged on the front surface of the CCD as shown in FIG. 1 in order to protect the light receiving surface of the CCD. The glass plate 8 shown in FIG. On the front surface 8a, an antireflection film 9 is deposited corresponding to the wavelength of the laser beam 2 (see FIG. 1) used in the particle size distribution measuring device.

【0019】したがって、この反射防止膜9によりレー
ザ光の反射が減り、またわずかな反射光についてもガラ
ス板8がテーパに形成されていることから図5に一点鎖
線で示すように同じ位置で反射を繰り返さずに徐々にず
れていき、したがって回折パターンの高精度の測定の邪
魔になる干渉は生じにくい。
Therefore, the reflection of the laser beam is reduced by the antireflection film 9, and even the slight reflected light is reflected at the same position as shown by the dashed line in FIG. Therefore, the interference that hinders high-precision measurement of the diffraction pattern hardly occurs.

【0020】なお、上記実施例ではガラス板8はテーパ
に形成されいるとともに反射防止膜9も付されている例
であるが、ガラス板をテーパに形成すること、ガラス板
に反射防止膜を付すことのいずれか一方であっても有害
な干渉光の発生を押えることができる。
In the above embodiment, the glass plate 8 is formed to be tapered and the antireflection film 9 is also provided. However, the glass plate is formed to be tapered, and the glass plate is provided with the antireflection film. In either case, the generation of harmful interference light can be suppressed.

【0021】[0021]

【発明の効果】以上詳細に説明したように、本発明の粒
径分布測定装置は、固体撮像素子前面にテーパに形成さ
れたガラス板及び/又は反射防止膜を付したガラス板を
配置したため、回折パターンの測定に有害となる干渉光
を減らすことができ、高精度の測定が可能となる。
As described above in detail, in the particle size distribution measuring apparatus of the present invention, a glass plate tapered and / or a glass plate provided with an anti-reflection film is disposed on the front surface of the solid-state imaging device. Interference light that is harmful to the measurement of the diffraction pattern can be reduced, and highly accurate measurement can be performed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例に係る粒径分布測定装置の概
略構成図である。
FIG. 1 is a schematic configuration diagram of a particle size distribution measuring device according to one embodiment of the present invention.

【図2】CCD前面における回折像パターンの一例を表
わした図である。
FIG. 2 is a diagram illustrating an example of a diffraction image pattern on a front surface of a CCD.

【図3】測定された粒径分布の一例を表わした図であ
る。
FIG. 3 is a diagram illustrating an example of a measured particle size distribution.

【図4】0次光をカットするためのマスクと回折光を減
衰させるためのフィルタが表面に貼付されたCCDの一
例を表わした正面図である。
FIG. 4 is a front view showing an example of a CCD in which a mask for cutting zero-order light and a filter for attenuating diffracted light are attached to the surface.

【図5】図4に示すCCDの受光前面にフィルタを施し
たガラス板が付された状態を表わした側面図である。
5 is a side view showing a state in which a glass plate with a filter is attached to a light receiving front surface of the CCD shown in FIG. 4;

【符号の説明】[Explanation of symbols]

1 レーザ光源 2 レーザ光 3、5 レンズ 4、微粒子群 6 CCD 7 演算回路 8 ガラス板 9 反射防止膜 10 複合された回折パターン 20 マスク 21 NDフィルタ REFERENCE SIGNS LIST 1 laser light source 2 laser light 3, 5 lens 4, particle group 6 CCD 7 arithmetic circuit 8 glass plate 9 anti-reflection film 10 composite diffraction pattern 20 mask 21 ND filter

Claims (3)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 レーザ光を微粒子群に照射する照射光学
系と、該微粒子群による回折像を受光する固体撮像素子
と、該固体撮像素子により受光された回折像パターンに
基づいて前記微粒子群の粒径分布を求める演算手段とを
備えた粒径分布測定装置において、前記固体撮像素子前
面に、該固体撮像素子から離れた側の表面に反射防止膜
が付されたガラス板が配置されてなることを特徴とする
粒径分布測定装置。
An irradiation optical system for irradiating a group of particles with a laser beam, a solid-state imaging device for receiving a diffraction image of the group of particles, and a solid-state imaging device for receiving the diffraction image of the group of particles based on a diffraction image pattern received by the solid-state imaging device. In a particle size distribution measuring apparatus provided with arithmetic means for obtaining a particle size distribution, a glass plate having an antireflection film on a surface on a side remote from the solid-state image sensor is arranged on a front surface of the solid-state image sensor. A particle size distribution measuring device characterized by the above-mentioned.
【請求項2】 レーザ光を微粒子群に照射する照射光学
系と、該微粒子群による回折像を受光する固体撮像素子
と、該固体撮像素子により受光された回折像パターンに
基づいて前記微粒子群の粒径分布を求める演算手段とを
備えた粒径分布測定装置において、 前記固体撮像素子前面に、表面もしくは裏面のうちのい
ずれか一方が他方に対してテーパに形成されたガラス板
が配置されてなることを特徴とする粒径分布測定装置。
2. An irradiation optical system for irradiating a group of particles with a laser beam, a solid-state imaging device for receiving a diffraction image of the group of particles, and a solid-state imaging device for receiving the diffraction image of the group of particles based on a diffraction image pattern received by the solid-state imaging device. in the particle size distribution measuring apparatus and an arithmetic means for calculating the particle size distribution, the solid-state imaging device front, surface or have one of the back surface
A particle size distribution measuring device, wherein a glass plate having one of them tapered with respect to the other is arranged.
【請求項3】 レーザ光を微粒子群に照射する照射光学
系と、該微粒子群による回折像を受光する固体撮像素子
と、該固体撮像素子により受光された回折像パターンに
基づいて前記微粒子群の粒径分布を求める演算手段とを
備えた粒径分布測定装置において、 前記固体撮像素子前面に、該固体撮像素子から離れた側
の表面に反射防止膜が付されるとともに該表面もしくは
裏面のうちのいずれか一方が他方に対してテーパに形成
されたガラス板が配置されてなることを特徴とする粒径
分布測定装置。
3. An irradiation optical system for irradiating a group of particles with laser light, a solid-state imaging device for receiving a diffraction image by the group of particles, and a solid-state imaging device for receiving the diffraction image of the group of particles based on a diffraction image pattern received by the solid-state imaging device. in the particle size distribution measuring apparatus and an arithmetic means for calculating the particle size distribution, in the solid-front of the surface or the back surface with anti-reflection film is subjected to a surface on the side remote from the solid-state image capturing device A particle size distribution measuring device, wherein a glass plate having one of them tapered with respect to the other is arranged.
JP3063743A 1991-03-06 1991-03-06 Particle size distribution measuring device Expired - Fee Related JP2859972B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3063743A JP2859972B2 (en) 1991-03-06 1991-03-06 Particle size distribution measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3063743A JP2859972B2 (en) 1991-03-06 1991-03-06 Particle size distribution measuring device

Publications (2)

Publication Number Publication Date
JPH04278439A JPH04278439A (en) 1992-10-05
JP2859972B2 true JP2859972B2 (en) 1999-02-24

Family

ID=13238194

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3063743A Expired - Fee Related JP2859972B2 (en) 1991-03-06 1991-03-06 Particle size distribution measuring device

Country Status (1)

Country Link
JP (1) JP2859972B2 (en)

Also Published As

Publication number Publication date
JPH04278439A (en) 1992-10-05

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