JP2874067B2 - Scattering plate for calibration - Google Patents
Scattering plate for calibrationInfo
- Publication number
- JP2874067B2 JP2874067B2 JP3126217A JP12621791A JP2874067B2 JP 2874067 B2 JP2874067 B2 JP 2874067B2 JP 3126217 A JP3126217 A JP 3126217A JP 12621791 A JP12621791 A JP 12621791A JP 2874067 B2 JP2874067 B2 JP 2874067B2
- Authority
- JP
- Japan
- Prior art keywords
- particle size
- size distribution
- calibration
- scattering plate
- scattered light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Investigating Or Analysing Materials By Optical Means (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、校正用散乱板に関す
る。さらに詳しくは、粒度分布測定装置を高精度で容易
に校正することができる校正用散乱板に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a scattering plate for calibration. More specifically, the present invention relates to a scattering plate for calibration capable of easily calibrating a particle size distribution measuring device with high accuracy.
【0002】[0002]
【従来の技術と発明が解決しようとする課題】近年、セ
ラミックス原料、超伝導物質、磁性材料等の製造工程あ
るいは半導体の製造工程において、超微粒子が注目され
ており、光の波長よりも小さなサブミクロン粒子の粒径
を測定する必要性が高まっている。一般に、これらの微
小粒子の径あるいは粒度分布の測定には、光学的粒径分
布測定装置が利用されている。前記光学的粒径分布測定
装置は、被測定粒子群にレーザ光を照射することによっ
て発生した散乱光を、光学レンズによって集光し、レン
ズ焦点面に配置された検出用受光素子によって測定され
た前記散乱光の強度分布から各散乱角度に対する散乱光
強度を求め、その解析から粒径分布を決定する。この粒
径分布は、散乱光の強度分布を測定することで、ミィー
の散乱理論に基づき計算で求められるものである。2. Description of the Related Art In recent years, ultrafine particles have been attracting attention in the process of manufacturing ceramic raw materials, superconducting materials, magnetic materials, etc. or in the process of manufacturing semiconductors. There is a growing need to measure the size of micron particles. Generally, an optical particle size distribution measuring device is used to measure the diameter or particle size distribution of these fine particles. The optical particle size distribution measuring device is configured such that scattered light generated by irradiating a laser beam to a group of particles to be measured is condensed by an optical lens, and is measured by a light receiving element for detection arranged on a lens focal plane. The scattered light intensity for each scattering angle is determined from the scattered light intensity distribution, and the particle size distribution is determined from the analysis. This particle size distribution is obtained by calculation based on Mie's scattering theory by measuring the intensity distribution of scattered light.
【0003】通常、粒度分布測定装置は、ある粒度分布
を有した基準となる粉体(基準粉)の粒度分布を測定す
ることによって校正され、前記粉体は粒度分布が常に安
定していることが必要とされる。しかしながら、基準粉
は粒度分布測定装置の校正を行なう度に消費されてしま
う。また、全く同一の粒度分布を有する粉体を新たに調
製することは工業的には不可能である。したがって、新
しく基準粉を調製した場合には、基準とする粉体の粒度
分布を測定し、粒度分布測定装置を校正するための基準
となる粒度分布を求めなければならず、多くの煩雑な工
程が必要とされると共に、ロット管理上混乱を生じる危
険性が高い。さらに、基準となる粒度分布は、本来その
基準粉で校正されるべき粒度分布測定装置を使用して求
めるので、絶対的な基準とはなり得ず、粒度分布測定装
置と基準粉との相対的な関係づけにすぎない。Usually, a particle size distribution measuring device is calibrated by measuring a particle size distribution of a reference powder having a certain particle size distribution (reference powder), and the powder has a particle size distribution that is always stable. Is required. However, the reference powder is consumed every time the particle size distribution measuring device is calibrated. In addition, it is industrially impossible to newly prepare a powder having exactly the same particle size distribution. Therefore, when a new reference powder is prepared, the particle size distribution of the reference powder must be measured, and the particle size distribution serving as a reference for calibrating the particle size distribution measurement device must be obtained. Is required, and there is a high risk of causing confusion in lot management. Furthermore, since the reference particle size distribution is determined using a particle size distribution measurement device that should be calibrated with the reference powder, it cannot be an absolute reference, and the relative size between the particle size distribution measurement device and the reference powder can be determined. It's just a relationship.
【0004】また、前述のように、粒度分布測定装置の
校正は、基準粉の粒度分布が安定しており、常に一定の
粒度分布が測定されることを前提として行なわれてい
る。したがって、基準粉の変質によって基準となる粒度
分布が変化することのないよう、前記基準粉の保管には
細心の配慮が必要とされる。本発明は、前記事情に基ず
いてなされたものである。すなわち、本発明の目的は、
多くの設備や工程を必要とせず、常に高い精度で粒度分
布測定装置の校正を行なうことができる、絶対的な基準
としての校正用散乱板を提供することにある。Further, as described above, the calibration of the particle size distribution measuring apparatus is performed on the assumption that the particle size distribution of the reference powder is stable and a constant particle size distribution is always measured. Therefore, careful storage of the reference powder is required so that the reference particle size distribution does not change due to deterioration of the reference powder. The present invention has been made based on the above circumstances. That is, the object of the present invention is:
An object of the present invention is to provide a scattering plate for calibration as an absolute standard, which does not require many facilities and processes and can always calibrate a particle size distribution measuring device with high accuracy.
【0005】[0005]
【前記課題を解決するための手段】前記目的を達成する
ための本発明は、透明な支持体と、前記支持体表面に形
成された金属被膜とで構成され、前記金属被膜が、細孔
径に基ずく一定の個数分布で穿孔された複数個の細孔を
有していることを特徴とする校正用散乱板。Means for Solving the Problems The present invention for attaining the above object comprises a transparent support and a metal film formed on the surface of the support, wherein the metal film has a fine pore diameter. A scattering plate for calibration, comprising a plurality of pores perforated with a constant number distribution.
【0006】[0006]
【作用】粒度分布測定装置を校正するための基準となる
粒度分布は、基準粉にレーザ光を照射した時の散乱光強
度を測定することで求められる。本発明では、透明な支
持体表面に金属被膜を形成した後、前記金属被膜に数μ
m〜数十μmの細孔を複数個あけた校正用散乱板を、レ
ーザ光照射手段から出力された光路中に配置すること
で、ある粒度分布を有する粒子による散乱光と同等の散
乱光を常時測定することが可能である。The particle size distribution serving as a reference for calibrating the particle size distribution measuring device can be determined by measuring the scattered light intensity when the reference powder is irradiated with laser light. In the present invention, after forming a metal coating on the surface of the transparent support, several μm
By disposing a calibration scattering plate having a plurality of pores of m to several tens of μm in the optical path output from the laser light irradiation means, scattered light equivalent to scattered light by particles having a certain particle size distribution is obtained. It is always possible to measure.
【0007】[0007]
【実施例】以下、図面を参照しながら本発明を詳細に説
明する。図1は本発明の校正用散乱板を配備した、粒度
分布測定装置の一実施例を上方から見た平面概略図であ
り、本発明の校正用散乱板は図1の実施例に限定される
ものではない。図1に示すように、粒度分布測定装置1
の校正を行なう場合、レーザ光照射手段2から照射され
るレーザ光の進行光路中、散乱光測定用セルの代わりに
校正用散乱板4を配備する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic plan view of one embodiment of a particle size distribution measuring apparatus provided with a calibration scattering plate of the present invention, as viewed from above. The calibration scattering plate of the present invention is limited to the embodiment of FIG. Not something. As shown in FIG. 1, a particle size distribution measuring device 1
Is performed, a calibration scattering plate 4 is provided instead of the scattered light measurement cell in the traveling optical path of the laser light irradiated from the laser light irradiation means 2.
【0008】(1)校正用散乱板 本発明の校正用散乱板4は、基本的に、透明な支持体5
と前記支持体表面に形成された複数の細孔を有する金属
被膜6とで構成されている。支持体5は、透明で支持能
力を有する限り特に限定されるものではなく、例えばガ
ラス等を挙げることができる。支持体表面に被膜を形成
する金属は、特に限定されるものではなく、各種金属単
体もしくは二種以上の金属からなる合金を用いることが
できる。(1) Scattering Plate for Calibration The scattering plate for calibration 4 of the present invention basically comprises a transparent support 5
And a metal coating 6 having a plurality of pores formed on the surface of the support. The support 5 is not particularly limited as long as it is transparent and has a supporting ability, and examples thereof include glass. The metal for forming a coating on the surface of the support is not particularly limited, and various kinds of metals or alloys composed of two or more metals can be used.
【0009】支持体表面に金属被膜を形成する方法も従
来から公知の方法で良く、例えば金属蒸着法、電気的堆
積法、陽極酸化法、非電解析出法、スパッタリング法、
金属溶射法などを挙げることができる。前記支持体の厚
みは1〜5mm程度、好ましくは2〜3mm程度であ
り、前記金属被膜の厚みは数μm〜数十μm程度であ
る。支持体表面に形成された金属被膜は、細孔径が数μ
m〜数十μmの細孔を複数個有し、前記細孔の個数、大
きさなどを調整することで、任意の粒度分布を有した粒
子の散乱光と同等の散乱光を得ることができる。金属被
膜に穿孔する方法は、従来から公知の方法で良く、例え
ばフォトエッチングなどを挙げることができる。The method of forming a metal film on the surface of the support may be a conventionally known method, for example, a metal deposition method, an electric deposition method, an anodic oxidation method, an electroless deposition method, a sputtering method, or the like.
A metal spraying method can be used. The thickness of the support is about 1 to 5 mm, preferably about 2 to 3 mm, and the thickness of the metal coating is about several μm to several tens μm. The metal coating formed on the surface of the support has a pore diameter of several microns.
By having a plurality of pores of m to several tens of μm and adjusting the number, size, etc. of the pores, it is possible to obtain scattered light equivalent to scattered light of particles having an arbitrary particle size distribution. . The method for perforating the metal film may be a conventionally known method, and examples thereof include photoetching.
【0010】(2)レーザ光照射手段 レーザ光照射手段2は、図示しないレーザ光源と、図示
しないレーザ光発振装置と、出力されたレーザを平行に
するコリメータレンズ3とを備えてなる。前記レーザ光
源およびレーザ光発振装置は従来から公知のものでよ
く、レーザ光発振装置で出力することのできるレーザ光
として、例えばHe−Neガスレーザによる632.8
nmのレーザ光、半導体レーザによる680〜780n
mのレーザ光などを挙げることができる。コリメータレ
ンズ3は、図示しない複数のレンズ群から構成され、前
記レーザ光発信装置により出力されたレーザ光を平行光
束にする。(2) Laser Light Irradiating Means The laser light irradiating means 2 includes a laser light source (not shown), a laser light oscillating device (not shown), and a collimator lens 3 for collimating the output laser. The laser light source and the laser light oscillating device may be conventionally known ones. As the laser light that can be output by the laser light oscillating device, for example, 632.8 by a He—Ne gas laser
nm laser light, 680-780n by semiconductor laser
m laser light and the like. The collimator lens 3 includes a plurality of lens groups (not shown), and converts the laser light output from the laser light transmitting device into a parallel light beam.
【0011】(3)散乱光測定用セル 図示しない散乱光測定用セルは、粒度分布測定装置の校
正終了後、粒子の粒度分布を測定する際に本発明の校正
用散乱板4の位置に配備される。散乱光測定用セルは、
媒体中に被測定粒子を分散させてなる懸濁液が、図示し
ない貯留槽から、図示しない配管を介して流入すること
ができるフローセルとして構成される。散乱光測定用セ
ルを形成する素材は、従来から公知のガラス、パイレッ
クスガラス、石英ガラスなどを挙げることができる。(3) Scattered Light Measurement Cell A scattered light measurement cell (not shown) is provided at the position of the calibration scattering plate 4 of the present invention when measuring the particle size distribution of the particles after the completion of the calibration of the particle size distribution measuring device. Is done. The scattered light measurement cell is
The suspension is formed as a flow cell into which a suspension obtained by dispersing the particles to be measured in a medium can flow from a storage tank (not shown) through a pipe (not shown). As a material forming the scattered light measurement cell, conventionally known glass, Pyrex glass, quartz glass and the like can be mentioned.
【0012】(4)検出用受光素子 検出用受光素子8は、集光レンズ7に対して校正用散乱
板4とは反対側に配置される。前記検出用受光素子8
は、レーザ光の偏光面内であって、集光レンズ7の光軸
に直交する方向に配列された、複数の受光面を有する光
電変換素子群(例えば、フォトダイオード等)から形成
されている。(4) Light-receiving element for detection The light-receiving element 8 for detection is arranged on the opposite side of the converging lens 7 from the scattering plate 4 for calibration. The light receiving element for detection 8
Are formed from a group of photoelectric conversion elements (for example, photodiodes or the like) having a plurality of light receiving surfaces arranged in a direction orthogonal to the optical axis of the condenser lens 7 in the polarization plane of the laser light. .
【0013】校正用散乱板4または散乱光測定用セル中
の被測定粒子により生じた散乱光の強度は、散乱光の光
軸中心に対して対称である。よって、前記検出用受光素
子8は、散乱光の中心光軸を受光する中心光電変換素子
と、前記中心光電変換素子から一方向に一列に配列され
た他の光電変換素子群とで構成される。通常、半導体ウ
ェハ上に、検出用受光素子を半導体技術によって区分形
成した後、半導体ウェハを切断し、粒度分布測定装置の
散乱光強度測定用ディテクタとして使用する。The intensity of the scattered light generated by the particles to be measured in the calibration scattering plate 4 or the scattered light measurement cell is symmetric with respect to the optical axis center of the scattered light. Therefore, the detection light-receiving element 8 includes a central photoelectric conversion element that receives the central optical axis of the scattered light, and another group of photoelectric conversion elements that are arranged in a line in one direction from the central photoelectric conversion element. . Normally, after a light receiving element for detection is formed on a semiconductor wafer by division using a semiconductor technique, the semiconductor wafer is cut and used as a scattered light intensity measuring detector of a particle size distribution measuring device.
【0014】(5)粒度分布解析系 粒度分布測定装置における粒度分布解析系は、何れも図
示しない、マルチプレクサ、増幅アンプ、A/D変換
器、演算制御装置、出力装置などで構成される。マルチ
プレクサは、検出用受光素子を構成する各光電変換素子
群から出力される電気信号を切り替えるスイッチであ
る。前記マルチプレクサから出力される検出信号は、増
幅アンプにより増幅され、A/D変換器でデジタル信号
に変換された後、演算制御装置に出力される。前記演算
制御装置は、測定された散乱光強度および散乱角を示す
データを、周知であるフラウンホーファ回折理論、ミィ
ーの散乱理論に基づき粒度分布を演算する。前記演算制
御装置で演算された粒度分布データを、例えばCRT、
XYプロッターなどの出力装置に出力する。(5) Particle Size Distribution Analysis System The particle size distribution analysis system in the particle size distribution measuring device includes a multiplexer, an amplifier, an A / D converter, an arithmetic control unit, an output device, etc., all of which are not shown. The multiplexer is a switch for switching an electric signal output from each photoelectric conversion element group constituting the light receiving element for detection. The detection signal output from the multiplexer is amplified by an amplification amplifier, converted into a digital signal by an A / D converter, and output to an arithmetic and control unit. The arithmetic and control unit calculates the particle size distribution of the data indicating the measured scattered light intensity and scattering angle based on the well-known Fraunhofer diffraction theory and Mie scattering theory. The particle size distribution data calculated by the arithmetic and control unit is, for example, CRT,
Output to an output device such as an XY plotter.
【0015】(6)粒度分布測定装置の校正方法 本発明の校正用散乱板4を用いた、粒度分布測定装置1
の校正方法について説明する。レーザ光照射手段2から
出力されるレーザ光路中に、本発明の校正用散乱板4を
配備する。レーザ光照射手段2により発振されたレーザ
光をコリメータレンズ3で平行光束にし、前記校正用散
乱板4に照射する。校正用散乱板4により擬似的に生じ
た散乱光は、集光レンズ7により収束されて検出用受光
素子8に照射される。検出用受光素子8の各光電変換素
子から出力される電気信号は散乱光強度を示し、また、
光電変換素子の位置により散乱角が判別される。さら
に、演算制御部にて散乱光強度および散乱角から測定さ
れた粒度分布を演算し、基準となる粒度分布を基に粒度
分布測定装置の校正を行なう。(6) Calibration method of particle size distribution measuring device Particle size distribution measuring device 1 using the scattering plate for calibration 4 of the present invention.
The calibration method will be described. The calibration scattering plate 4 of the present invention is provided in the laser beam path output from the laser beam irradiation means 2. The laser light oscillated by the laser light irradiating means 2 is converted into a parallel light beam by the collimator lens 3 and is irradiated on the calibration scattering plate 4. The scattered light simulated by the calibration scattering plate 4 is converged by the condenser lens 7 and irradiated to the light receiving element 8 for detection. The electric signal output from each photoelectric conversion element of the detection light receiving element 8 indicates the scattered light intensity, and
The scattering angle is determined based on the position of the photoelectric conversion element. Further, the arithmetic control unit calculates the particle size distribution measured from the scattered light intensity and the scattering angle, and calibrates the particle size distribution measuring device based on the reference particle size distribution.
【0016】(7)粒度分布の測定方法 校正された粒度分布測定装置による粒度分布測定につい
て説明する。まず散乱光測定用セル中に、被測定粒子を
水中に懸濁した試料液を充填する。次いで、レーザ光照
射手段により発振されたレーザ光をコリメータレンズで
平行光束にし、前記散乱光測定用セルに照射する。(7) Method of Measuring Particle Size Distribution Measurement of particle size distribution by a calibrated particle size distribution measuring device will be described. First, a sample liquid in which particles to be measured are suspended in water is filled in a scattered light measurement cell. Next, the laser light oscillated by the laser light irradiating means is converted into a parallel light flux by a collimator lens, and is irradiated on the scattered light measuring cell.
【0017】散乱光測定用セルに照射されたレーザ光
は、散乱光測定用セル中の懸濁している被測定粒子によ
り散乱される。被測定粒子により散乱して生じた散乱光
は、集光レンズにより収束されて検出用受光素子に照射
される。検出用受光素子においては、複数の光電変換素
子が、レーザ光の偏光面内であって、集光レンズの光軸
に直交する方向に一列に配列されているので、各光電変
換素子から出力される電気信号は散乱光強度を示し、ま
た、光電変換素子の位置により散乱角が判別される。The laser beam applied to the scattered light measuring cell is scattered by the particles to be measured suspended in the scattered light measuring cell. The scattered light generated by being scattered by the particles to be measured is converged by the condenser lens and irradiated to the light receiving element for detection. In the light receiving element for detection, a plurality of photoelectric conversion elements are arranged in a line in a direction perpendicular to the optical axis of the condensing lens within the plane of polarization of the laser light. The electric signal indicates the scattered light intensity, and the scattering angle is determined based on the position of the photoelectric conversion element.
【0018】検出用受光素子における各光電変換素子か
ら出力された電気信号は、マルチプレクサを介して増幅
アンプで増幅され、次いでA/D変換器でデジタル信号
に変換される。さらに、演算制御部にて散乱光の強度お
よび散乱角からその粒子の粒度分布を演算し、計算され
た粒度分布は出力装置から出力される。The electric signal output from each photoelectric conversion element in the light receiving element for detection is amplified by an amplification amplifier via a multiplexer, and then converted into a digital signal by an A / D converter. Further, the arithmetic control unit calculates the particle size distribution of the particles from the intensity and scattering angle of the scattered light, and the calculated particle size distribution is output from the output device.
【0019】[0019]
【発明の効果】本発明の、透明な支持体と前記支持体表
面に形成された金属被膜とで構成され、前記金属被膜
が、細孔径に基づく一定の個数分布で穿孔された複数個
の細孔を有している校正用散乱板によると、基準粉を使
用して粒度分布測定装置の校正を行なう場合と比較して
煩雑な工程が不要になると共に、基準粉のように消耗さ
れることがなく、工業的に同一のものが複数製造可能な
ので、常に一定の校正基準となる粒度分布を測定するこ
とができる。As described above, the present invention comprises a transparent support and a metal film formed on the surface of the support, wherein the metal film is formed by a plurality of fine holes perforated with a constant number distribution based on the pore diameter. According to the calibration scattering plate having holes, complicated steps are not required as compared with the case where the particle size distribution measuring device is calibrated using the reference powder, and it is consumed like the reference powder. Since a plurality of identical products can be manufactured industrially, the particle size distribution serving as a constant calibration standard can always be measured.
【図1】本発明の校正用散乱板を配備した、粒度分布測
定装置の一実施例を示す概略図である。FIG. 1 is a schematic view showing one embodiment of a particle size distribution measuring device provided with a scattering plate for calibration of the present invention.
1 粒度分布測定装置 2 レーザ光照射手段 3 コリメータレンズ 4 校正用散乱板 5 支持体 6 金属被膜 7 集光レンズ 8 検出用受光素子 DESCRIPTION OF SYMBOLS 1 Particle size distribution measuring device 2 Laser beam irradiation means 3 Collimator lens 4 Calibration scattering plate 5 Support body 6 Metal film 7 Condensing lens 8 Light receiving element for detection
Claims (1)
された金属被膜とで構成され、前記金属被膜が、細孔径
に基ずく一定の個数分布で穿孔された複数個の細孔を有
していることを特徴とする校正用散乱板。1. A method comprising: a transparent support; and a metal film formed on the surface of the support, wherein the metal film comprises a plurality of pores perforated with a constant number distribution based on the pore diameter. A scattering plate for calibration, which is provided.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3126217A JP2874067B2 (en) | 1991-05-29 | 1991-05-29 | Scattering plate for calibration |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3126217A JP2874067B2 (en) | 1991-05-29 | 1991-05-29 | Scattering plate for calibration |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04351939A JPH04351939A (en) | 1992-12-07 |
| JP2874067B2 true JP2874067B2 (en) | 1999-03-24 |
Family
ID=14929639
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3126217A Expired - Fee Related JP2874067B2 (en) | 1991-05-29 | 1991-05-29 | Scattering plate for calibration |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2874067B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007322206A (en) * | 2006-05-31 | 2007-12-13 | Yokogawa Electric Corp | Turbidity / turbidity measuring instrument |
-
1991
- 1991-05-29 JP JP3126217A patent/JP2874067B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007322206A (en) * | 2006-05-31 | 2007-12-13 | Yokogawa Electric Corp | Turbidity / turbidity measuring instrument |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04351939A (en) | 1992-12-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0106684B1 (en) | Particle diameter measuring device | |
| US5007737A (en) | Programmable detector configuration for Fraunhofer diffraction particle sizing instruments | |
| EP0424934A2 (en) | Apparatus for counting particles suspended in a fluid | |
| JPS6311838A (en) | Granular size detector | |
| JP3889851B2 (en) | Film thickness measurement method | |
| JP2910596B2 (en) | Particle size distribution analyzer | |
| JPH0237536B2 (en) | ||
| JP2874067B2 (en) | Scattering plate for calibration | |
| US6104491A (en) | System for determining small particle size distribution in high particle concentrations | |
| JP3371816B2 (en) | Particle concentration measuring method and device and particle measuring device | |
| US6034769A (en) | Method and device for counting and measuring particles | |
| JP2000230901A (en) | Optical unit | |
| EP0374607A1 (en) | Apparatuses for the determination of movement of an airborne vehicle in the atmosphere | |
| JP3301658B2 (en) | Method and apparatus for measuring particle size of fine particles in fluid | |
| JPH09126984A (en) | Particle size distribution analyzer | |
| JP3566840B2 (en) | Concentration measuring device | |
| JPH02203246A (en) | Grain size distribution measuring instrument | |
| Lettieri et al. | Certification of SRM1960: nominal 10 μm diameter polystyrene spheres (“space beads”) | |
| JPH0534259A (en) | Device for measuring particle size distribution | |
| JP3025051B2 (en) | Scattered light measurement cell | |
| JPH07117483B2 (en) | Particle size distribution measuring device | |
| JPH07260669A (en) | Particle size distribution measuring device | |
| JP2003329569A (en) | Laser diffraction / scattering particle size distribution analyzer | |
| JP3258904B2 (en) | Scattered light detector | |
| JP2004271187A (en) | Particle measuring device and its use |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 19981208 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080114 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110114 Year of fee payment: 12 |
|
| LAPS | Cancellation because of no payment of annual fees |