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JP2875295B2 - Manganese aluminum superlattice magnetic film - Google Patents
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JP2875295B2 - Manganese aluminum superlattice magnetic film - Google Patents

Manganese aluminum superlattice magnetic film

Info

Publication number
JP2875295B2
JP2875295B2 JP22915189A JP22915189A JP2875295B2 JP 2875295 B2 JP2875295 B2 JP 2875295B2 JP 22915189 A JP22915189 A JP 22915189A JP 22915189 A JP22915189 A JP 22915189A JP 2875295 B2 JP2875295 B2 JP 2875295B2
Authority
JP
Japan
Prior art keywords
aluminum
manganese
magnetic film
superlattice
thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP22915189A
Other languages
Japanese (ja)
Other versions
JPH0393207A (en
Inventor
輝明 竹内
正昭 二本
一正 高木
毅夫 藤原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
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Filing date
Publication date
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Priority to JP22915189A priority Critical patent/JP2875295B2/en
Publication of JPH0393207A publication Critical patent/JPH0393207A/en
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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、大きな飽和磁化を有する磁性膜の構造に関
する。
The present invention relates to a structure of a magnetic film having a large saturation magnetization.

〔従来の技術〕[Conventional technology]

磁性デバイスの高性能化のために、従来の磁性体では
得られない大きな飽和磁化を有する磁性体の出現が望ま
れている。大きな飽和磁化をもつ磁性体として、鉄を主
体とする合金が検討されてきたが、合金の場合には、飽
和磁化に限界値があり、その値は鉄の飽和磁化(2.2テ
ラス)と同程度であることがわかってきた。
In order to improve the performance of magnetic devices, the appearance of a magnetic material having a large saturation magnetization that cannot be obtained with a conventional magnetic material has been desired. As a magnetic material having a large saturation magnetization, an alloy mainly composed of iron has been studied, but in the case of an alloy, there is a limit value for the saturation magnetization, and the value is almost the same as the saturation magnetization of iron (2.2 terraces). It turned out to be.

また、近年合金における飽和磁化の限界値を超えるこ
とを目標として、異なる元素からなる層を交互に積層し
た超格子が注目されている。このような超格子は、特開
昭49−131679号公報に記載された技術で形成されうる。
しかし、各所での試みにもかかわらず、合金における飽
和磁化の限界値すなわち鉄の飽和磁化を超えるものは見
つかっていない。
Also, in recent years, superlattices in which layers made of different elements are alternately stacked have been attracting attention with the goal of exceeding the limit value of the saturation magnetization of the alloy. Such a superlattice can be formed by the technique described in JP-A-49-131679.
However, despite attempts at various locations, none have been found to exceed the saturation magnetization limit of the alloy, that is, the saturation magnetization of iron.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

本発明の目的は、従来技術では得られなかった合金に
おける飽和磁化の限界値を超える飽和磁化を有する磁性
薄膜を提供することにある。
An object of the present invention is to provide a magnetic thin film having a saturation magnetization exceeding a limit value of a saturation magnetization of an alloy which cannot be obtained by the conventional technique.

また、超格子薄膜を形成するに際しては、膜厚と基板
表面の原子配列に注目し、所定の結晶方位をもつ薄膜の
形成とその磁性特性の確実な出現をすることを目的とし
た。
Also, when forming a superlattice thin film, the present inventors paid attention to the film thickness and the atomic arrangement on the surface of the substrate, and aimed to form a thin film having a predetermined crystal orientation and to reliably show its magnetic properties.

〔課題を解決するための手段〕[Means for solving the problem]

上記目的は、2原子層乃至10原子層の厚さのマンガン
の層と、アルミニウムの層とを交互に積層したマンガン
・アルミニウム超格子磁性膜により達成できる。
The above object can be achieved by a manganese-aluminum superlattice magnetic film in which a manganese layer having a thickness of 2 to 10 atomic layers and an aluminum layer are alternately stacked.

アルミニウム層の厚さは1原子層乃至10原子層である
ことが望ましい。
The thickness of the aluminum layer is desirably 1 to 10 atomic layers.

マンガン・アルミニウム超格子の結晶構造を正方晶系
とし、その4回回転軸を超格子磁性膜の積層方向に平行
にすることができる。このときの基板面としては、面心
立方格子をもつ単結晶の(001)面またはこれと等価な
面を用いることができる。また、体心立方格子をもつ単
結晶の(001)面またはこれと等価な面を用いることが
できる。
The crystal structure of the manganese-aluminum superlattice can be a tetragonal system, and its four-fold rotation axis can be parallel to the lamination direction of the superlattice magnetic film. As the substrate surface at this time, a (001) plane of a single crystal having a face-centered cubic lattice or a plane equivalent thereto can be used. Alternatively, a (001) plane of a single crystal having a body-centered cubic lattice or a plane equivalent thereto can be used.

〔作用〕[Action]

磁性体における飽和磁化は、合金、多層膜を問わず、
電子構造で決まる。この電子構造は、状態密度曲線、す
なわち電子のエネルギと状態密度すなわちそのエネルギ
をもちうる電子の許容最大数との関係を示す曲線によっ
て端的に表すことができる。
The saturation magnetization of the magnetic material, regardless of alloy or multilayer film,
Determined by the electronic structure. This electronic structure can be simply represented by a density of states curve, that is, a curve showing the relationship between the energy of electrons and the density of states, that is, the maximum allowable number of electrons capable of having that energy.

この状態密度曲線は、模式的に第7図に示すような曲
線である。図中EFと示したエネルギはフェルミエネルギ
であり材料の組成と構造で決まる。一般に、その材料に
おけるどの電子のエネルギもEF程度より低く、EF程度よ
りエネルギの高い電子は存在しない。強磁性体の特徴
は、このEFにおける状態密度が大きいことであり、状態
密度曲線においてはEFでピークをもつ。そして、一般
に、EFにおける状態密度が大きいほど飽和磁化が大き
い。
This state density curve is a curve schematically shown in FIG. Energy, indicated as E F in the figure is determined by the composition and structure of a Fermi energy material. In general, any electronic energy even lower than about E F in the material, electrons are not present high energy than about E F. Features of the ferromagnetic material is that the state density is high in this E F, in a state density curve having a peak at E F. And, in general, a large saturation magnetization the greater the density of states at E F.

以上の点を考慮し、本発明の検討においては、超格子
に着目し、種々の元素を組合わせたものに関して状態密
度曲線を理論計算によって求めた。そしてこの理論予測
に従い、マンガン層とアルミニウム層を交互に積層した
超格子膜を作製し、その飽和磁化を測定した結果、大き
な値を有することが判明した。
In consideration of the above points, in the study of the present invention, attention was paid to the superlattice, and a state density curve was obtained by theoretical calculation for a combination of various elements. According to this theoretical prediction, a superlattice film in which manganese layers and aluminum layers were alternately laminated was prepared, and the saturation magnetization was measured. As a result, it was found that the film had a large value.

マンガン層とマンガン・アルミニウム層から成る超格
子磁性膜に関する上述の状態密度曲線は、第8図のよう
に求められる。鉄および合金と異なり、フェルミ・エネ
ルギEF近傍における状態密度は他のエネルギでの状態密
度に比べ極端に大きい。すなわち、大きな飽和磁化を有
するための条件を満たしている。
The above-mentioned density-of-states curve for a superlattice magnetic film composed of a manganese layer and a manganese-aluminum layer is obtained as shown in FIG. Unlike iron and alloys, density of states at the Fermi energy E F vicinity extremely large compared to the density of states at the other energy. That is, the condition for having a large saturation magnetization is satisfied.

この状態密度曲線は、電子のスピンの向きを考慮して
いない。これを考慮して求めた状態密度曲線を第9図に
示す。強磁性体において、磁化状態では、一般に、向き
が互いに180度異なる+スピンと−スピンが存在する。
この図は、両スピンの状態密度曲線を分離して示したも
のである。飽和磁化は、フェルミ・エネルギ以下のエネ
ルギ領域に存在する両スピンの電子数の差に比例する。
すなわち図における両スピンの斜線部の面積の差に比例
する。したがって、この状態密度曲線から明らかなよう
に、マンガン・アルミニウム超格子磁性膜においては、
フェルミ・エネルギ以下の全電子の大部分は+スピンを
もつものであり、両スピンの電子数の差は非常に大き
い。このために、この超格子磁性膜は大きな飽和磁化を
もつ。
This state density curve does not take into account the direction of electron spin. FIG. 9 shows a state density curve obtained in consideration of this. In a ferromagnetic material, in a magnetized state, there are generally + spin and -spin whose directions are different from each other by 180 degrees.
This figure shows the state density curves of both spins separately. The saturation magnetization is proportional to the difference between the numbers of electrons of both spins existing in the energy region equal to or lower than the Fermi energy.
That is, it is proportional to the difference between the areas of the hatched portions of both spins in the figure. Therefore, as is clear from this density of state curve, in the manganese-aluminum superlattice magnetic film,
Most of the electrons below the Fermi energy have a + spin, and the difference between the numbers of electrons of both spins is very large. For this reason, this superlattice magnetic film has a large saturation magnetization.

〔実施例〕〔Example〕

実施例1 以下、本発明の実施例1を第1図により説明する。こ
れは、面心立方格子をもつアルミニウム単結晶を基板と
して、その(001)面上に、マンガン層とアルミニウム
層を、交互に500層ずつ、真空蒸着によりエピタキシャ
ル成長したものである。真空度は10-10Torr,成膜速度は
2Å/s,基板温度は260℃であった。このような積層を行
うと、積層部は正方晶系となり、4回回転軸(c軸)は
積層方向に一致した。膜の厚さは、アルミニウム層に関
しては単原子層の厚さに固定し、マンガン層の厚さを種
々変化させた。
Embodiment 1 Hereinafter, Embodiment 1 of the present invention will be described with reference to FIG. In this method, an aluminum single crystal having a face-centered cubic lattice is used as a substrate, and 500 layers of a manganese layer and an aluminum layer are alternately epitaxially grown by vacuum evaporation on the (001) plane. The degree of vacuum was 10 −10 Torr, the deposition rate was 2 ° / s, and the substrate temperature was 260 ° C. When such lamination was performed, the lamination portion became tetragonal, and the four-fold rotation axis (c-axis) coincided with the lamination direction. The thickness of the film was fixed to the thickness of the monoatomic layer for the aluminum layer, and the thickness of the manganese layer was varied.

このような試料の飽和磁化を測定した結果を第2図に
示す。縦軸が飽和磁化で横軸はマンガン層の厚さ(原子
層数)を表す。図から明らなように、マンガン層の厚さ
が2〜8原子層の間で合金の飽和磁化の限界値(約2.2
テスラ)を越える飽和磁化をもつ。
FIG. 2 shows the result of measuring the saturation magnetization of such a sample. The vertical axis represents the saturation magnetization, and the horizontal axis represents the thickness (the number of atomic layers) of the manganese layer. As is apparent from the figure, the limit value of the saturation magnetization of the alloy (about 2.2
It has a saturation magnetization exceeding Tesla).

実施例2 本発明の実施例2を第3図により説明する。これは、
アルミニウム単結晶の(001)面上に、マンガン層とア
ルミニウム層をエピタキシャル成長により500層ずつ積
層したものである。成長条件は実施例1と同様である。
膜厚はアルミニウム層の厚さを4原子層分に固定し、マ
ンガン層の厚さを変化させた。この場合の飽和磁化とマ
ンガン層厚との関係を第4図に示す。アルミニウム層厚
を単原子層の厚さとした場合と傾向は同じである。しか
し、この場合、合金の飽和磁化の限界値を越える値をも
つのは、マンガン層の厚さが4〜10原子層の間である。
Embodiment 2 Embodiment 2 of the present invention will be described with reference to FIG. this is,
A manganese layer and an aluminum layer are laminated on the (001) plane of aluminum single crystal by epitaxial growth in 500 layers each. The growth conditions are the same as in the first embodiment.
As for the film thickness, the thickness of the aluminum layer was fixed to four atomic layers, and the thickness of the manganese layer was changed. FIG. 4 shows the relationship between the saturation magnetization and the manganese layer thickness in this case. The tendency is the same as the case where the thickness of the aluminum layer is the thickness of the monoatomic layer. However, in this case, the thickness exceeding the limit value of the saturation magnetization of the alloy is between 4 and 10 atomic layers of the manganese layer.

実施例3 本発明の実施例3を第5図により説明する。これは、
体心立方格子をもつモリブデン単結晶の(001)面上に
マンガン層とアルミニウム層をエピタキシャル成長によ
り交互に500層ずる積層したものである。成長条件は実
施例1と同様である。アルミニウム層を単原子層の厚さ
に固定し、マンガン層の厚さを種々変化させた。このよ
うな試料の飽和磁化を測定した結果、第2図に示した特
性と同様の特性が見られた。本実施例は(001)方位の
モリブデン単結晶上にまずマンガンを被着させたもので
あるが、積層順序を変え、先にアルミニウムを被着させ
た場合も同じ結果であった。
Third Embodiment A third embodiment of the present invention will be described with reference to FIG. this is,
A manganese layer and an aluminum layer are alternately stacked on the (001) plane of a molybdenum single crystal having a body-centered cubic lattice by epitaxial growth by 500 layers. The growth conditions are the same as in the first embodiment. The thickness of the manganese layer was variously changed while the thickness of the aluminum layer was fixed to a monoatomic layer. As a result of measuring the saturation magnetization of such a sample, characteristics similar to those shown in FIG. 2 were observed. In this example, manganese was first deposited on a (001) oriented molybdenum single crystal, but the same result was obtained when the stacking order was changed and aluminum was deposited first.

実施例4 本発明の実施例4を第6図により説明する。これは、
上記実施例3と同様にモリブデン単結晶の(001)面上
にマンガンとアルミニウムをエピタキシャルに500層ず
つ積層したものである。アルミニウム層の厚さを4原子
層の厚さに固定し、マンガン層の厚さを変化させた。こ
のような試料の飽和磁化を測定した結果、第4図と同様
の特性が見られた。さらに本実施例と積層順序を変え、
(001)方位のモリブデン基板上にまずアルミニウムの
層を被着した場合も同様の結果であった。
Embodiment 4 Embodiment 4 of the present invention will be described with reference to FIG. this is,
As in Example 3, 500 layers of manganese and aluminum were epitaxially laminated on the (001) plane of molybdenum single crystal. The thickness of the aluminum layer was fixed at a thickness of 4 atomic layers, and the thickness of the manganese layer was changed. As a result of measuring the saturation magnetization of such a sample, characteristics similar to those in FIG. 4 were observed. Further, by changing the lamination order from the present embodiment,
Similar results were obtained when an aluminum layer was first deposited on a (001) oriented molybdenum substrate.

さらに、種々の基板の上に、マンガン層とアルミニウ
ム層を層厚を変えて交互に積層した試料の飽和磁化を調
べたが、合金の飽和磁化の限界値を越える値を示したの
は、マンガン層の厚さが2原子層〜10原子層の場合であ
った。
Furthermore, the saturation magnetization of a sample in which a manganese layer and an aluminum layer were alternately stacked on various substrates with different layer thicknesses was examined, and it was found that the value exceeding the limit value of the saturation magnetization of the alloy was found. The thickness of the layer was 2 to 10 atomic layers.

マンガン層の厚さが2〜10原子層でない場合には、飽
和磁化が減少するだけであり、強磁性体であることには
変わりはなかった。また、アルミニウム層の厚さを変化
させた場合、マンガン層の厚さによって飽和磁化の値は
変化するが、一般に10原子層以下の場合に大きな飽和磁
化が得られた。アルミニウム層の厚さがこれより厚い場
合には、厚さに伴って飽和磁化は減少するが、強磁性は
保たれていた。
When the thickness of the manganese layer was not 2 to 10 atomic layers, only the saturation magnetization was reduced, and it was still a ferromagnetic material. When the thickness of the aluminum layer was changed, the value of the saturation magnetization changed depending on the thickness of the manganese layer. In general, when the thickness was 10 atomic layers or less, a large saturation magnetization was obtained. When the thickness of the aluminum layer was larger, the saturation magnetization decreased with the thickness, but the ferromagnetism was maintained.

比較例 アルミニウム単結晶の(111)面上およびモリブデン
単結晶の(111)面上にマンガン・アルミニウム超格子
を形成した場合、実施例と同じ層厚で積層を行なって
も、飽和磁化は実施例の1/10以下であった。
Comparative Example In the case where a manganese-aluminum superlattice was formed on the (111) plane of aluminum single crystal and the (111) plane of molybdenum single crystal, even when the layers were laminated with the same layer thickness as in the example, the saturation magnetization was the same as in the example. Was 1/10 or less.

さらに、アルミニウムおよびモリブデンの多結晶およ
び非晶質であるガラスを基板に用いた場合の飽和磁化
は、同じ層厚で比較して実施例の約1/5であった。
Further, the saturation magnetization in the case of using polycrystalline and amorphous glass of aluminum and molybdenum for the substrate was about 1/5 of that of the example compared with the same layer thickness.

〔発明の効果〕〔The invention's effect〕

本発明によれば、合金における飽和磁化の限界値を越
える飽和磁化を有する強磁性体を提供することができる
ので種々の磁性デバイスの高性能化を図ることができ
る。
According to the present invention, it is possible to provide a ferromagnetic material having a saturation magnetization exceeding the limit value of the saturation magnetization of the alloy, so that it is possible to improve the performance of various magnetic devices.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の実施例1の〔100〕方向から見た断面
図、第2図は実施例1の特性図、第3図は本発明の実施
例2の〔100〕方向から見た断面図、第4図は実施例2
の特性図、第5図および第6図はそれぞれ本発明の実施
例3および実施例4の〔100〕方向から見た断面図、第
7図は一般的な電子の状態密度曲線を示す図、第8図は
マンガン・アルミニウム超格子における電子の状態密度
曲線を示す図、第9図はスピン分極を考慮した場合のマ
ンガン・アルミニウム超格子における電子の状態密度曲
線を示す図である。 1……アルミニウム原子、2……マンガン原子、3……
モリブデン原子。
FIG. 1 is a sectional view of Embodiment 1 of the present invention as viewed from the [100] direction, FIG. 2 is a characteristic diagram of Embodiment 1 of the present invention, and FIG. 3 is a view of Embodiment 2 of the present invention as viewed from the [100] direction. FIG. 4 is a cross-sectional view, and FIG.
5 and 6 are cross-sectional views of Example 3 and Example 4 of the present invention, respectively, as viewed from the [100] direction. FIG. 7 is a diagram showing a state density curve of a general electron. FIG. 8 is a diagram showing a state density curve of electrons in a manganese-aluminum superlattice, and FIG. 9 is a diagram showing a state density curve of electrons in a manganese-aluminum superlattice in consideration of spin polarization. 1 ... Aluminum atom, 2 ... Manganese atom, 3 ...
Molybdenum atom.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01F 10/12 ──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 6 , DB name) H01F 10/12

Claims (7)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】2原子層乃至10原子層の厚さのマンガンの
層とアルミニウムの層とを交互に積層したことを特徴と
するマンガン・アルミニウム超格子磁性膜。
1. A manganese-aluminum superlattice magnetic film, wherein manganese layers and aluminum layers each having a thickness of 2 to 10 atomic layers are alternately laminated.
【請求項2】第1項記載のマンガン・アルミニウム超格
子磁性膜において、上記アルミニウム層の厚さは1原子
層乃至10原子層であるマンガン・アルミニウム超格子磁
性膜。
2. The manganese-aluminum superlattice magnetic film according to claim 1, wherein said aluminum layer has a thickness of 1 to 10 atomic layers.
【請求項3】第1項記載のマンガン・アルミニウム超格
子磁性膜において、結晶構造が正方晶系であり、その4
回回転軸が積層方向に平行であるマンガン・アルミニウ
ム超格子磁性膜。
3. The manganese-aluminum superlattice magnetic film according to claim 1, wherein the crystal structure is tetragonal.
A manganese-aluminum superlattice magnetic film whose rotation axis is parallel to the lamination direction.
【請求項4】第3項記載のマンガン・アルミニウム超格
子磁性膜において、基板として面心立方格子をもつ単結
晶の(001)面またはこれと等価な面を用いるマンガン
・アルミニウム超格子磁性膜。
4. A manganese-aluminum superlattice magnetic film according to claim 3, wherein a (001) plane of a single crystal having a face-centered cubic lattice or a plane equivalent thereto is used as the substrate.
【請求項5】第4項記載のマンガン・アルミニウム超格
子磁性膜において、上記基板はアルミニウム単結晶であ
るマンガン・アルミニウム超格子磁性膜。
5. A manganese-aluminum superlattice magnetic film according to claim 4, wherein said substrate is an aluminum single crystal.
【請求項6】第3項記載のマンガン・アルミニウム超格
子磁性膜において、基板として体心立方格子をもつ単結
晶の(001)面またはこれと等価な面を用いるマンガン
・アルミニウム超格子磁性膜。
6. A manganese-aluminum superlattice magnetic film according to claim 3, wherein a (001) plane of a single crystal having a body-centered cubic lattice or a plane equivalent thereto is used as the substrate.
【請求項7】第6項記載のマンガン・アルミニウム超格
子磁性膜において、上記基板はモリブデン単結晶である
マンガン・アルミニウム超格子磁性膜。
7. A manganese-aluminum superlattice magnetic film according to claim 6, wherein said substrate is a single crystal of molybdenum.
JP22915189A 1989-09-06 1989-09-06 Manganese aluminum superlattice magnetic film Expired - Lifetime JP2875295B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22915189A JP2875295B2 (en) 1989-09-06 1989-09-06 Manganese aluminum superlattice magnetic film

Publications (2)

Publication Number Publication Date
JPH0393207A JPH0393207A (en) 1991-04-18
JP2875295B2 true JP2875295B2 (en) 1999-03-31

Family

ID=16887576

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Application Number Title Priority Date Filing Date
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Country Link
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