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JP2876445B2 - Centrifugal substrate drying equipment - Google Patents
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JP2876445B2 - Centrifugal substrate drying equipment - Google Patents

Centrifugal substrate drying equipment

Info

Publication number
JP2876445B2
JP2876445B2 JP3247693A JP3247693A JP2876445B2 JP 2876445 B2 JP2876445 B2 JP 2876445B2 JP 3247693 A JP3247693 A JP 3247693A JP 3247693 A JP3247693 A JP 3247693A JP 2876445 B2 JP2876445 B2 JP 2876445B2
Authority
JP
Japan
Prior art keywords
substrate
holding member
movable
carrier
rotor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP3247693A
Other languages
Japanese (ja)
Other versions
JPH06232111A (en
Inventor
均 石浜
隆行 野口
奈美子 飯塚
一夫 竹内
一武 佐藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON TAIPURAITAA KK
Original Assignee
NIPPON TAIPURAITAA KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON TAIPURAITAA KK filed Critical NIPPON TAIPURAITAA KK
Priority to JP3247693A priority Critical patent/JP2876445B2/en
Publication of JPH06232111A publication Critical patent/JPH06232111A/en
Application granted granted Critical
Publication of JP2876445B2 publication Critical patent/JP2876445B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、半導体基板等の被処理
基板の液切り乾燥を行う、遠心式基板乾燥装置に関する
ものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a centrifugal substrate drying apparatus for draining and drying a substrate to be processed such as a semiconductor substrate.

【0002】[0002]

【従来の技術】従来の遠心式基板乾燥装置として、特開
平60−59740号公報が知られている。この遠心式
基板乾燥装置は縦軸心で高速回転するロ−タに複数枚の
基板を収容したキャリアを複数個収容しロータの回転に
よる遠心力で洗浄液を分離させるものである。
2. Description of the Related Art Japanese Patent Application Laid-Open No. 60-59740 is known as a conventional centrifugal substrate drying apparatus. In this centrifugal substrate drying apparatus, a plurality of carriers accommodating a plurality of substrates are accommodated in a rotor that rotates at a high speed about the vertical axis, and the washing liquid is separated by centrifugal force generated by rotation of the rotor.

【0003】又、この縦軸心のロータに変わるものとし
て図6に示す横軸心のロータによる遠心式基板乾燥装置
が提案されている。この基板乾燥装置42は、チャンバ
43内のロータ44をその軸の一端に設けられたモ−タ
によって高速回転させ、このロータ44内に備えられる
基板46の水滴を分離させるものである。
As a substitute for the rotor having the vertical axis, a centrifugal substrate drying apparatus using a rotor having a horizontal axis shown in FIG. 6 has been proposed. In the substrate drying apparatus 42, a rotor 44 in a chamber 43 is rotated at a high speed by a motor provided at one end of a shaft thereof to separate water droplets on a substrate 46 provided in the rotor 44.

【0004】ロータ44は、1対の側板46を複数のシ
ャフト47、48、49、50、51、52によって連
結することで構成されており、シャフト47、48に
は、それぞれ可動基板保持部材53、54が揺動自在に
設けられ、シャフト55には前記可動基板保持部材53
に設けられるピン56と係合することで可動基板保持部
位53を固定するロック部材57が揺動自在に設けられ
ている。
The rotor 44 is constituted by connecting a pair of side plates 46 by a plurality of shafts 47, 48, 49, 50, 51, 52, and the shafts 47, 48 are each provided with a movable substrate holding member 53. , 54 are swingably provided, and the shaft 55 is provided with the movable substrate holding member 53.
A lock member 57 for fixing the movable substrate holding portion 53 by engaging with a pin 56 provided on the base member is swingably provided.

【0005】 可動基板保持部材53と可動基板保持部
材54とは連結杆58によって連結され、ロック部材5
7と可動基板保持部材54とはテンションバー59によ
って連結されてあるので、ロック部材57を可動基板保
持部材53のピン56に係合させることで可動基板保持
部材53および54を閉じた状態で固定することがで
き、また、ロック部材57を図中方向に回動すれば、
ロック部材57に連動して可動基板保持部材54、55
を開くことができる。
The movable substrate holding member 53 and the movable substrate holding member 54 are connected by a connecting rod 58, and the lock member 5
7 and the movable substrate holding member 54 are connected by a tension bar 59, so that the movable substrate holding members 53 and 54 are fixed in a closed state by engaging the lock member 57 with the pin 56 of the movable substrate holding member 53. If the lock member 57 is rotated rightward in the figure,
The movable substrate holding members 54 and 55 interlock with the lock member 57.
Can be opened.

【0006】このように従来の遠心式基板乾燥装置42
は、可動基板保持部材53、54を閉じ、ロック部材5
7をピン56に係合させ、複数枚の被処理基板46を収
容したキャリア45をロータ44内に確実に保持し、ロ
ータ44を回転して被処理基板46の乾燥をしている。
As described above, the conventional centrifugal substrate drying apparatus 42
Closes the movable substrate holding members 53 and 54 and
7 is engaged with the pin 56, the carrier 45 accommodating a plurality of substrates 46 is securely held in the rotor 44, and the rotor 44 is rotated to dry the substrate 46.

【0007】[0007]

【発明が解決しようとする課題】しかしながら従来の構
成では、ロック部材57の解除をテンションバー59の
みで支えるような構成になっているため、ロータ43が
高速回転中に可動基板保持部材53、54やロック部材
57に遠心力が作用すると、回転中のテンションバー5
9の負担が大きくなり、これによってロック部材57が
解除し、可動基板保持部材53、54が遠心力により開
き、被処理基板46とキャリア45が飛び出し破損する
おそれがあった。
However, in the conventional configuration, the release of the lock member 57 is supported only by the tension bar 59, so that the movable substrate holding members 53 and 54 are rotated while the rotor 43 is rotating at a high speed. When the centrifugal force acts on the lock member 57 and the tension member 5 during rotation,
9, the lock member 57 is released, the movable substrate holding members 53 and 54 are opened by centrifugal force, and the substrate 46 to be processed and the carrier 45 may jump out and be damaged.

【0008】 本発明は遠心式基板乾燥装置の回転中の
遠心力の影響による可動基板保持部材の開放を防止し、
被処理基板とキャリアの破損を防ぐことを課題とする。
[0008] The present invention provides a method for rotating a centrifugal substrate drying apparatus during rotation.
Prevent opening of movable substrate holding member due to centrifugal force,
An object is to prevent damage to a substrate to be processed and a carrier.

【0009】[0009]

【課題を解決するための手段】 上記課題を解決するた
め本発明の遠心式基板乾燥装置は第1の手段として、一
対の側板と、この側板間に架せられ複数の基板を収納す
るキャリアを保持するキャリア保持部材と、前記一対の
側板間において回動自在に架せられ、これを閉じたとき
にキャリアと当接するキャリア保持部と基板と当接する
基板保持部とを有する可動キャリア保持部材とを備えて
なるロータを高速回転させ基板の乾燥を行う遠心式基板
乾燥装置において、前記可動キャリア保持部材を閉じた
ときの可動キャリア保持部材の重心の位置を、ロータの
回転中心と可動キャリア保持部材の回転軸との延長線に
対してキャリア保持部および基板保持部とは逆側とした
ことを特徴とする。
Means for Solving the Problems In order to solve the above problems, a centrifugal substrate drying apparatus according to the present invention comprises, as first means, a pair of side plates and a carrier which is placed between the side plates and stores a plurality of substrates. a carrier holding member for holding, is skein rotatably between the pair of side plates, the movable carrier holding member having a carrier abutting the carrier holding portion and the substrate abutting the substrate holder when closed it With
In a centrifugal substrate drying apparatus that rotates a rotor at a high speed to dry a substrate, the position of the center of gravity of the movable carrier holding member when the movable carrier holding member is closed is set to the rotation center of the rotor and the rotation axis of the movable carrier holding member. The carrier holding portion and the substrate holding portion are on the opposite side to the extension of the above.

【0010】 第2の手段として、一対の側板と、この
側板間に架せられ複数の基板を保持する基板保持部材
と、前記一対の側板間において回動自在に架せられ、こ
れを閉じたときに基板と当接する基板保持部を有する可
動基板保持部材とを備えてなるロータを高速回転さ複基
板の乾燥を行う遠心式基板乾燥装置において、前記可動
基板保持部材を閉じたときの可動基板保持部材の重心の
位置を、ロータの回転中心と可動基板保持部材の回転軸
との延長線に対して基板保持部とは逆側としたことを特
徴とする。
As a second means, a pair of side plates, a substrate holding member bridged between the side plates and holding a plurality of substrates, and a pair of side plates rotatably mounted between the pair of side plates and closed. Yes having a substrate holding portion contacting the substrate and those at the time
A rotor comprising a moving substrate holding member and a
In a centrifugal substrate drying apparatus for drying a plate, the position of the center of gravity of the movable substrate holding member when the movable substrate holding member is closed is defined with respect to an extension line between the rotation center of the rotor and the rotation axis of the movable substrate holding member. The substrate holding portion is on the opposite side.

【0011】[0011]

【実施例】 本発明の実施例を図より説明する。図1
遠心式基板乾燥装置のロータの側面の一部断面図、図2
は遠心式基板乾燥装置の正面断面図、図3は遠心式基板
乾燥装置の側断面図であり図4は図1とは異なる状態の
ロータの側断面図である。
Embodiment An embodiment of the present invention will be described with reference to the drawings. Figure 1
Partial sectional view of a side surface of a rotor of a centrifugal substrate drying apparatus, FIG.
Is a front sectional view of a centrifugal substrate drying apparatus, and FIG.
FIG. 4 is a side cross-sectional view of the drying device, and FIG. 4 shows a state different from FIG.
It is a sectional side view of a rotor .

【0012】遠心式基板乾燥装置1のロータ2は、一対
の側板3と、一対の内側板4と、複数のフレ−ム5、
6、7、8と、キャリア保持板9とによって概略の骨格
が構成される。
The rotor 2 of the centrifugal substrate drying apparatus 1 includes a pair of side plates 3, a pair of inner plates 4, a plurality of frames 5,
6, 7, 8 and the carrier holding plate 9 form a schematic skeleton.

【0013】可動キャリア保持部材10は側板3および
内側板4に回動自在に設けられた軸11に固設された一
対の揺動板12と、この揺動板12間に架せられた基板
保持杆13およびキャリア保持杆14と、重り15と、
位置決めピン16とにより構成されている。また可動キ
ャリア保持部材17は側板3および内側板4に回動自在
に設けられた軸18に固設された一対の揺動板19と、
この揺動板19間に架せられた基板保持杆20およびキ
ャリア保持杆21と、重り22と、位置決めピン23と
により構成されている。
The movable carrier holding member 10 includes a pair of swinging plates 12 fixed to a shaft 11 rotatably provided on the side plate 3 and the inner plate 4, and a substrate suspended between the swinging plates 12. Holding rod 13, carrier holding rod 14, weight 15,
It is composed of positioning pins 16. The movable carrier holding member 17 includes a pair of swinging plates 19 fixed to a shaft 18 rotatably provided on the side plate 3 and the inner plate 4,
It is composed of a substrate holding rod 20 and a carrier holding rod 21 which are bridged between the rocking plates 19, a weight 22, and a positioning pin 23.

【0014】可動キャリア保持部材10と可動キャリア
保持部材17にそれぞれ設けられた重り15と重り22
は、可動キャリア保持部材10の重心の位置Gと可動キ
ャリア保持部材17の重心の位置G’とがそれぞれロー
タ2の回転中心Xと軸11および軸18とを結ぶ延長線
D、Eに対して基板保持杆13、20およびキャリア保
持杆14、21の位置とは反対側の位置(図中において
この線D、Eの下方側)となるようにその重さと位置が
決められている。
Weights 15 and 22 provided on the movable carrier holding member 10 and the movable carrier holding member 17, respectively.
Is that the position G of the center of gravity of the movable carrier holding member 10 and the position G ′ of the center of gravity of the movable carrier holding member 17 are with respect to extension lines D and E connecting the rotation center X of the rotor 2 and the shafts 11 and 18, respectively. The weights and positions are determined so as to be opposite to the positions of the substrate holding rods 13 and 20 and the carrier holding rods 14 and 21 (below the lines D and E in the figure).

【0015】キャリア24、および、キャリア24に収
納された被処理基板25は、キャリア保持板9と、可動
キャリア保持部材10、17に設けられた基板保持杆1
3、20およびキャリア保持杆14、21によって保持
される。
The carrier 24 and the substrate 25 accommodated in the carrier 24 include a carrier holding plate 9 and a substrate holding rod 1 provided on movable carrier holding members 10 and 17.
3 and 20 and carrier holding rods 14 and 21.

【0016】 前記基板保持杆13、20の位置決め
は、可動キャリア保持部材10、17に設けられた位置
決めピン16、23を内側板4の上面部に突き当てるこ
とで行い、この状態は可動キャリア保持部材10と可動
キャリア保持部材17との間に架せられたテンションバ
ー26の張力により保たれている。
The positioning of the substrate holding rods 13 and 20 is performed by abutting positioning pins 16 and 23 provided on the movable carrier holding members 10 and 17 against the upper surface of the inner plate 4. It is maintained by the tension of a tension bar 26 bridged between the member 10 and the movable carrier holding member 17.

【0017】 モータ27はロータを回転させる駆動
源であり、開閉蓋28は遠心式基板乾燥装置1の外周に
沿って摺動自在に設けられており、基板の搬入搬出時は
開かれ、ロータ2の回転時は閉じられている。また、排
出口29は、ロータ2の回転により被処理基板25から
分離された液体を排出するためのものである。
A motor 27 is a drive source for rotating the rotor 2 , and an opening / closing lid 28 is slidably provided along the outer periphery of the centrifugal substrate drying apparatus 1, and is opened when a substrate is loaded and unloaded. It is closed during the rotation of 2. The discharge port 29 is for discharging the liquid separated from the substrate 25 by the rotation of the rotor 2.

【0018】次に、本実施例の作動を説明する。キャリ
アのロータ2への搬入は、図示しないロボットハンドに
よって行われ、このとき可動キャリア保持部材10、1
7は図に示すように開かれた状態にある。
Next, the operation of this embodiment will be described. The carrier is carried into the rotor 2 by a robot hand (not shown).
7 is in a state of open, as shown in FIG.

【0019】キャリア24がキャリア保持板9に載置さ
れたら、図示しない駆動源により、軸11を回転させる
(図3中の矢印A方向)。これで可動キャリア保持部材
10が閉じる方向に回転し、テンションバー26を介し
て可動キャリア保持部材17も閉じる方向に回転する。
そして、先ずこの可動キャリア保持部材17の位置決め
ピン23が内側板4の上面と接し、可動キャリア保持部
材17その位置が規制される。
When the carrier 24 is placed on the carrier holding plate 9, the shaft 11 is rotated by a drive source (not shown) (in the direction of arrow A in FIG. 3). Thus, the movable carrier holding member 10 rotates in the closing direction, and the movable carrier holding member 17 also rotates in the closing direction via the tension bar 26.
Then, first, the positioning pin 23 of the movable carrier holding member 17 comes into contact with the upper surface of the inner plate 4, and the position of the movable carrier holding member 17 is regulated.

【0020】もう一方の可動キャリア保持部材10はテ
ンションバー26の張力に抗してさらに回転し、テンシ
ョンバー26の上死点を越えると位置決めピン16が内
側板4の上面と接しその位置が規制される。そして、テ
ンションバー26の張力により可動キャリア保持部材1
0、17は図4に示す閉じた状態が維持される。
The other movable carrier holding member 10 further rotates against the tension of the tension bar 26, and when it exceeds the top dead center of the tension bar 26, the positioning pin 16 contacts the upper surface of the inner plate 4 and its position is regulated. Is done. Then, the movable carrier holding member 1 is moved by the tension of the tension bar 26.
0 and 17 maintain the closed state shown in FIG.

【0021】このときキャリア保持杆14、21はキャ
リア24と当接し、キャリア保持板9と合わせてこのキ
ャリア24をロータ2内に保持し、基板保持杆13、2
0は被処理基板25と当接し被処理基板25をロータ2
内に保持する。
At this time, the carrier holding rods 14 and 21 are in contact with the carrier 24 and hold the carrier 24 in the rotor 2 together with the carrier holding plate 9.
0 abuts on the substrate 25 to be processed, and
Hold within.

【0022】次に、モータ27が駆動され、ロータ2が
回転する。この回転により可動キャリア保持部材10、
17に遠心力が働く。遠心力は可動キャリア保持部材1
0、17のそれぞれ重心Gと重心G’に働き、可動キャ
リア保持部材10は軸11を中心とし図3中矢印B右方
向に向け回転しようとし、可動キャリア保持部材17は
軸18を中心とし図3中矢印C方向に向け回転しようと
する。
Next, the motor 27 is driven, and the rotor 2 rotates. With this rotation, the movable carrier holding member 10,
A centrifugal force acts on 17. The centrifugal force is applied to the movable carrier holding member 1
Acting on the centers of gravity G and G ′ of 0 and 17, respectively, the movable carrier holding member 10 is about to rotate around the shaft 11 in the right direction of the arrow B in FIG. 3, and the movable carrier holding member 17 is around the shaft 18. 3 Try to rotate in the direction of arrow C.

【0023】したがってロータ2が、高速回転すればす
るほど遠心力は可動キャリア保持部材10、17の基板
保持杆13、20およびキャリア保持杆14、21を閉
じるように働くので、回転中にキャリア24および基板
25がばたついて破損することがなくなり、また、ロッ
ク部材を除くことができ、構成部品を少なくすることが
できる。
Therefore, as the rotor 2 rotates at a higher speed, the centrifugal force acts to close the substrate holding rods 13 and 20 and the carrier holding rods 14 and 21 of the movable carrier holding members 10 and 17, so that the carrier 24 rotates during rotation. In addition, it is possible to prevent the substrate 25 from flapping and being damaged, and to eliminate the lock member, thereby reducing the number of components.

【0024】図5は第2の実施例における遠心式基板乾
燥装置のロータ2の側面図であり、この図をもとに第2
の実施例について説明する。第2の実施例では、被処理
基板25を複数の基板保持部材30と可動基板保持部材
31、36により直接ロータ2内に保持するものであ
る。
FIG. 5 is a side view of the rotor 2 of the centrifugal substrate drying apparatus according to the second embodiment.
An example will be described. In the second embodiment, the substrate 25 to be processed is directly held in the rotor 2 by a plurality of substrate holding members 30 and movable substrate holding members 31, 36.

【0025】可動基板保持部材31は側板3および内側
板4に可動自在に設けられた軸32に固設された一対の
揺動板33と、この揺動板33に架せられた基板保持杆
34と重り35とにより構成され、また可動基板保持部
材36は側板3および内側板4に可動自在に設けられた
軸37に固設された一対の揺動板38と、この揺動板3
8に架せられた基板保持杆39と図示しない重り(可動
基板保持部材31の重り35と同様の構成)とにより構
成されている。
The movable substrate holding member 31 includes a pair of swinging plates 33 fixed to a shaft 32 movably provided on the side plate 3 and the inner plate 4, and a substrate holding rod bridged over the swinging plate 33. The movable board holding member 36 is composed of a pair of swinging plates 38 fixed to a shaft 37 movably provided on the side plate 3 and the inner plate 4, and a pair of swinging plates 38.
8 and a weight (not shown) having the same configuration as the weight 35 of the movable substrate holding member 31.

【0026】この可動基板保持部材31の重り35と可
動基板保持部材36の図示しない重りは、可動基板保持
部材31の重心gと可動基板保持部材36の重心g’と
がそれぞれロータ2の回転中心xと軸32および軸37
とを結ぶ延長線H、Iに対して基板保持杆34、39の
位置とは反対側の位置(図中においてこの線H、Iの下
方側)となるようにその重さと位置が決められている
The weight 35 of the movable substrate holding member 31 and the weight (not shown) of the movable substrate holding member 36 are such that the center of gravity g of the movable substrate holding member 31 and the center of gravity g ′ of the movable substrate holding member 36 are the rotation centers of the rotor 2 respectively. x and axis 32 and axis 37
The weight and position of the extension lines H and I are determined so as to be opposite to the positions of the substrate holding rods 34 and 39 (below the lines H and I in the figure). Is

【0027】この可動基板保持部材31、36が基板保
持のため閉じられた状態で、可動基板保持部材31の位
置決め部40と可動基板保持部材36の図示しない位置
決め部とはそれぞれフレーム7、8と接し、可動基板保
持部材31、36の位置を規制している。またテンショ
ンバー41はその張力により可動基板保持部材31、3
6を閉じた位置に維持している。
With the movable substrate holding members 31 and 36 closed for holding the substrate, the positioning portion 40 of the movable substrate holding member 31 and the positioning portion (not shown) of the movable substrate holding member 36 are connected to the frames 7 and 8 respectively. In contact therewith, the positions of the movable substrate holding members 31, 36 are regulated. Also, the tension bar 41 causes the movable substrate holding members 31, 3
6 is maintained in the closed position.

【0028】従って第2の実施例によれば、キャリアレ
スのライン工程に遠心式基板乾燥装置を提供することが
でき、キャリアレスとすることで半導体基板の製造の効
率を上げることがでる。また、ロータ2が高速回転すれ
ばするほど基板保持部材31、35が閉じるように遠心
力が働くので被処理基板ががたつくことがなく第1の実
施例と同様の効果が得られる。
Therefore, according to the second embodiment, it is possible to provide a centrifugal substrate drying apparatus in a carrier-less line process, and it is possible to increase the efficiency of manufacturing a semiconductor substrate by eliminating the carrier. Further, the higher the speed of the rotation of the rotor 2, the more the centrifugal force acts to close the substrate holding members 31 and 35, so that the substrate to be processed does not rattle and the same effect as in the first embodiment can be obtained.

【0029】なお、第1の実施例では可動キャリア保持
部材を、第2の実施例では可動基板保持部材を固定する
ロック部材を無くした構成としているが、これを設けて
も良く、こうすることでより確実に可動キャリア保持部
材または可動基板保持部材を閉じた状態に固定すること
ができる。
Although the movable carrier holding member is eliminated in the first embodiment and the lock member for fixing the movable substrate holding member is eliminated in the second embodiment, this may be provided. Thus, the movable carrier holding member or the movable substrate holding member can be more securely fixed in the closed state.

【0030】[0030]

【発明の効果】以上、説明したように、第1にキャリア
を介して被処理基板を保持する遠心式可動基板乾燥装置
において、可動キャリア保持部材を閉じた状態での可動
キャリア保持部材の重心の位置が、ロータの回転中心と
可動キャリア保持部材の回転軸との延長線に対してキャ
リア保持部および基板保持部の位置とは反対側にあるの
で、ロータの回転中に可動キャリア保持部材に働く遠心
力は可動キャリア保持部材の基板保持部とキャリア保持
部を閉じるように働き、従来の基板保持部材の浮き上が
りによる被処理基板のばたつきやそれによる被処理基板
の破損を解消することができる。第2にキャリアを使用
せず直接被処理基板を保持する遠心式基板乾燥装置にお
いて、可動基板保持部材を閉じた状態での可動基板保持
部材の重心の位置が、ロータの回転中心と可動基板保持
部材の回転軸との延長線に対して基板保持部の位置とは
反対側にあるので、ロータの回転中に可動基板保持部材
に働く遠心力は可動基板保持部材の基板保持部を閉じる
ように働くため、従来の基板保持部材の浮き上がりによ
る基板のばたつきやそれによる被処理基板の破損を解消
することができる、
As described above, first, in the centrifugal movable substrate drying apparatus for holding a substrate to be processed via a carrier, the center of gravity of the movable carrier holding member in a state where the movable carrier holding member is closed is described. Since the position is on the side opposite to the positions of the carrier holding portion and the substrate holding portion with respect to the extension line between the rotation center of the rotor and the rotation axis of the movable carrier holding member, it acts on the movable carrier holding member during rotation of the rotor. The centrifugal force acts to close the substrate holding portion and the carrier holding portion of the movable carrier holding member, and can eliminate the conventional fluttering of the target substrate due to the lifting of the substrate holding member and the damage of the target substrate due to the floating. Second, in a centrifugal substrate drying apparatus that directly holds a substrate to be processed without using a carrier, the position of the center of gravity of the movable substrate holding member in a state where the movable substrate holding member is closed is determined by the rotation center of the rotor and the movable substrate holding member. Since it is on the opposite side of the position of the substrate holding part with respect to the extension line with the rotation axis of the member, the centrifugal force acting on the movable substrate holding member during rotation of the rotor closes the substrate holding part of the movable substrate holding member. Because it works, it is possible to eliminate the fluttering of the substrate due to the lifting of the conventional substrate holding member and the damage of the substrate to be processed thereby,

【図面の簡単な説明】[Brief description of the drawings]

【図1】 本発明における遠心式基板乾燥装置のロータ
の側面の一部断面図
FIG. 1 is a rotor of a centrifugal substrate drying apparatus according to the present invention.
Partial sectional view of the side

【図2】 本発明における遠心式基板乾燥装置の正面断
面図
FIG. 2 is a front view of a centrifugal substrate drying apparatus according to the present invention.
Front view

【図3】 本発明における遠心式基板乾燥装置の側断面
FIG. 3 is a side sectional view of a centrifugal substrate drying apparatus according to the present invention.
Figure

【図4】 図1とは異なる状態のロータの側断面図 FIG. 4 is a side sectional view of the rotor in a state different from FIG . 1;

【図5】本発明の第2の実施例における遠心式基板乾燥
装置のロータの側断面図
FIG. 5 is a side sectional view of a rotor of a centrifugal substrate drying apparatus according to a second embodiment of the present invention.

【図6】従来の遠心式基板乾燥装置の側断面図FIG. 6 is a side sectional view of a conventional centrifugal substrate drying apparatus.

【符号の説明】[Explanation of symbols]

1 遠心式基板乾燥装置 2 ロータ 5、6、7、8 フレーム 9 キャリア保持板 10、17 可動キャリア保持部材 11、18 軸 12、19 揺動板 13、20 基板保持杆 14、21 キャリア保持杆 15、22 重り 16、23 位置決めピン 24 キャリア 25 被処理基板 26 テンションバー 27 モータ 28 開閉蓋 30 基板保持部材 31、36 可動基板保持部材 34、39 基板保持杆 REFERENCE SIGNS LIST 1 centrifugal substrate drying device 2 rotor 5, 6, 7, 8 frame 9 carrier holding plate 10, 17 movable carrier holding member 11, 18 shaft 12, 19 rocking plate 13, 20 substrate holding rod 14, 21 carrier holding rod 15 , 22 weight 16, 23 positioning pin 24 carrier 25 substrate to be processed 26 tension bar 27 motor 28 opening / closing lid 30 substrate holding member 31, 36 movable substrate holding member 34, 39 substrate holding rod

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 一対の側板と、 この側板間に架せられ複数の基板を収納するキャリアを
保持するキャリア保持部材と、 前記一対の側板間において回動自在に架せられ、これを
閉じたときにキャリアと当接するキャリア保持部と基板
と当接する基板保持部とを有する可動キャリア保持部材
とを備えてなるロータを高速回転させ基板の乾燥を行う
遠心式基板乾燥装置において、 前記可動キャリア保持部材を閉じたときの可動キャリア
保持部材の重心の位置を、ロータの回転中心と可動キャ
リア保持部材の回転軸との延長線に対してキャリア保持
部および基板保持部の位置とは反対側としたことを特徴
とする遠心式基板乾燥装置
1. A pair of side plates, a carrier holding member that is mounted between the side plates and holds a carrier that stores a plurality of substrates, and is rotatably mounted between the pair of side plates and closed. A movable carrier holding member having a carrier holding portion that sometimes comes into contact with a carrier and a substrate holding portion that comes into contact with a substrate
A centrifugal substrate drying apparatus that rotates a rotor having high speed to dry a substrate.The centrifugal substrate drying apparatus, wherein the position of the center of gravity of the movable carrier holding member when the movable carrier holding member is closed is set to the rotation center of the rotor. A centrifugal substrate drying apparatus characterized in that the carrier holding section and the substrate holding section are on the opposite side to the extension of the rotation axis of the movable carrier holding member and the movable carrier holding member.
【請求項2】 一対の側板と、 この側板間に架せられ複数の基板を保持する基板保持部
材と、 前記一対の側板間において回動自在に架せられ、これを
閉じたときに基板と当接する基板保持部を有する可動基
板保持部材とを備えてなるロータを高速回転させ基板の
乾燥を行う遠心式基板乾燥装置において、 前記可動基板保持部材を閉じたときの可動基板保持部材
の重心の位置を、ロータの回転中心と可動基板保持部材
の回転軸との延長線に対して基板保持部の位置とは反対
側としたことを特徴とする遠心式基板乾燥装置
2. A pair of side plates, a substrate holding member bridged between the side plates to hold a plurality of substrates, and a pair of side plates rotatably bridged between the pair of side plates. A movable base having a substrate holding part to abut
The high-speed rotation of the rotor comprising the plate holding member
In a centrifugal substrate drying apparatus that performs drying, the position of the center of gravity of the movable substrate holding member when the movable substrate holding member is closed is set such that the substrate is positioned with respect to an extension line between the rotation center of the rotor and the rotation axis of the movable substrate holding member. A centrifugal substrate drying apparatus characterized in that it is on the side opposite to the position of the holding unit.
JP3247693A 1993-01-29 1993-01-29 Centrifugal substrate drying equipment Expired - Fee Related JP2876445B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3247693A JP2876445B2 (en) 1993-01-29 1993-01-29 Centrifugal substrate drying equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3247693A JP2876445B2 (en) 1993-01-29 1993-01-29 Centrifugal substrate drying equipment

Publications (2)

Publication Number Publication Date
JPH06232111A JPH06232111A (en) 1994-08-19
JP2876445B2 true JP2876445B2 (en) 1999-03-31

Family

ID=12360038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3247693A Expired - Fee Related JP2876445B2 (en) 1993-01-29 1993-01-29 Centrifugal substrate drying equipment

Country Status (1)

Country Link
JP (1) JP2876445B2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6370791B1 (en) * 2000-03-10 2002-04-16 Semitool, Inc. Processing machine with lockdown rotor
JP3980941B2 (en) 2002-06-04 2007-09-26 東京エレクトロン株式会社 Substrate processing equipment
CN111750639A (en) * 2020-06-12 2020-10-09 深圳市伊乐农贸有限公司 Effectual wheat drying equipment

Also Published As

Publication number Publication date
JPH06232111A (en) 1994-08-19

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