JP2877704B2 - Optical information recording medium - Google Patents
Optical information recording mediumInfo
- Publication number
- JP2877704B2 JP2877704B2 JP6268614A JP26861494A JP2877704B2 JP 2877704 B2 JP2877704 B2 JP 2877704B2 JP 6268614 A JP6268614 A JP 6268614A JP 26861494 A JP26861494 A JP 26861494A JP 2877704 B2 JP2877704 B2 JP 2877704B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- recording
- optical
- recording medium
- optical information
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title claims description 66
- 239000000463 material Substances 0.000 claims description 17
- 239000000758 substrate Substances 0.000 claims description 14
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 229910052720 vanadium Inorganic materials 0.000 claims description 7
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052796 boron Inorganic materials 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 229910052758 niobium Inorganic materials 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 229910052732 germanium Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 99
- 239000011241 protective layer Substances 0.000 description 17
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 3
- 229910052798 chalcogen Inorganic materials 0.000 description 3
- 150000001787 chalcogens Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 229910016027 MoTi Inorganic materials 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 238000010587 phase diagram Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 150000003568 thioethers Chemical class 0.000 description 2
- 229910017150 AlTi Inorganic materials 0.000 description 1
- 229910001245 Sb alloy Inorganic materials 0.000 description 1
- 229910001370 Se alloy Inorganic materials 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052752 metalloid Inorganic materials 0.000 description 1
- 150000002738 metalloids Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000006104 solid solution Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Optical Record Carriers And Manufacture Thereof (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、新規な光情報記録媒
体、さらに詳しくは、繰り返しオーバライト記録におけ
るジッター値の劣化が少なく、良質な再生信号を得るこ
とのできる光情報記録媒体に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a novel optical information recording medium, and more particularly to an optical information recording medium capable of obtaining a high-quality reproduced signal with little deterioration of a jitter value in repeated overwrite recording. is there.
【0002】[0002]
【従来の技術】近年、光情報記録媒体は、膨大な情報量
を記録・再生・消去する手段として盛んに研究開発が行
われている。特に、光学記録層が結晶質と非晶質との二
状態間で可逆的に相変化することを利用して情報の記録
・消去を行ういわゆる相変化型光ディスクは、レーザー
光のパワーを変化させるだけで古い情報を消去しながら
同時に新たな情報を記録する(以下オーバーライトと称
する)ことができるという利点を有していることから、
有望視されている。2. Description of the Related Art In recent years, optical information recording media have been actively researched and developed as means for recording, reproducing, and erasing an enormous amount of information. In particular, a so-called phase-change optical disc that performs recording and erasing of information by utilizing the fact that the optical recording layer reversibly changes phase between two states, crystalline and amorphous, changes the power of laser light. Has the advantage that new information can be simultaneously recorded while erasing old information (hereinafter referred to as overwriting).
Promising.
【0003】このオーバーライト可能な相変化型光ディ
スクの記録材料としては、低融点でかつレーザー光の吸
収効率の高いIn−Se系合金(Appl.Phys.
Lett.第50巻、667ページ、1987年)やI
n−Sb−Te(Appl.Phys.Lett.第5
0巻、16ページ、1987年)、Ge−Te−Sb合
金(特開昭62−53886公報)等のカルコゲン合金
が主として用いられている。As a recording material for the overwriteable phase change type optical disk, an In-Se alloy having a low melting point and high laser beam absorption efficiency (Appl. Phys.
Lett. 50, 667 pages, 1987) and I
n-Sb-Te (Appl. Phys. Lett.
0, page 16, 1987), and a chalcogen alloy such as a Ge-Te-Sb alloy (JP-A-62-53886) is mainly used.
【0004】一方これらカルコゲン合金を用いて実際に
記録・消去を行う場合は、記録・消去時の熱による基板
の変形を防止したり、光学記録層の酸化、案内溝に沿っ
ての物質移動あるいは変形を防止するために、通常光学
記録層の直下と直上のいずれか一方または双方に金属あ
るいは半金属の酸化物、炭化物、フッ化物、硫化物、窒
化物から選ばれた少なくとも一種類からなる保護層を設
けている そして、カルコゲン合金からなる記録層と記録層の直下
及び/または直上に設けた保護層と、記録層の基板側と
は反対側に設けた冷却層を兼ねた反射層(たとえばAl
合金)とからなる3層または4層構造を透明基板上に備
えたものが、記録・消去特性の点で好適であるために相
変化型光ディスクの主流となっている。On the other hand, when recording / erasing is actually performed using these chalcogen alloys, deformation of the substrate due to heat during recording / erasing is prevented, oxidation of the optical recording layer, mass transfer along the guide groove, or In order to prevent deformation, usually, at least one of metal or metalloid oxides, carbides, fluorides, sulfides, and nitrides at least one selected from the group consisting of oxides, carbides, fluorides, sulfides, and nitrides directly under and / or immediately above the optical recording layer. A recording layer made of a chalcogen alloy, a protective layer provided immediately below and / or immediately above the recording layer, and a reflective layer (for example, a cooling layer provided on the opposite side of the recording layer from the substrate side) Al
An alloy having a three-layer or four-layer structure made of an alloy on a transparent substrate has become the mainstream of phase-change optical disks because of its favorable recording and erasing characteristics.
【0005】[0005]
【発明が解決しょうとする課題】しかしながらこのよう
な3層または4層構造の相変化光ディスクにおいて、単
一ビームでオーバーライトを行なう場合、結晶質部分に
記録する場合と、非晶質部分に記録する場合とでは、結
晶質部分と非晶質部分の熱伝導率の違い、更には潜熱の
影響によりそれぞれの部分の昇温過程に差が生じてしま
い、結果として照射されたレーザーによるそれぞれの部
分の最高到達温度が異なることになる。このことから記
録ピットの大きさ・形状、即ち記録状態が異なるという
問題を生じ、消去特性に悪影響を及ぼしたり、またピッ
トエッヂ記録などを用いた高密度化の際、情報を正しく
再生できない等の問題点があった。However, in such a three-layer or four-layer phase change optical disk, when performing overwriting with a single beam, recording on a crystalline portion, and recording on an amorphous portion. The difference between the thermal conductivity of the crystalline part and the amorphous part, and the difference in the temperature rise process of each part due to the effect of latent heat, as a result, each part by the irradiated laser Will reach different maximum temperatures. This causes a problem that the size and shape of the recording pits, that is, the recording state is different, adversely affects the erasing characteristics, and a problem that information cannot be reproduced correctly at the time of high density using pit edge recording or the like. There was a point.
【0006】このようなオーバーライト時の消去率改善
及びジッター値(時間軸方向のずれ)の低減に関する提
案としては、特開平1−149238号公報に結晶状態
の光吸収率を非晶質の光吸収率と同等もしくは高くする
ことが開示され、また特開平3−113844号公報に
は光学記録層における光吸収率の差を10%以下にする
ことが開示されている。これらの技術は、初期ジッター
特性の改善には効果が認められるものの記録層上部の層
である保護層が厚膜構造となっていることから、実用上
必要となる繰り返し耐久性を低下させ、繰り返しにより
ジッター値が劣化する欠点がある。Japanese Patent Laid-Open Publication No. 1-149238 discloses a proposal for improving the erasing rate and reducing the jitter value (shift in the time axis direction) during overwriting. It is disclosed that the absorbance is equal to or higher than that of the optical recording medium, and JP-A-3-113844 discloses that the difference in the optical absorption in the optical recording layer is reduced to 10% or less. These techniques are effective in improving the initial jitter characteristics, but since the protective layer, which is the upper layer of the recording layer, has a thick film structure, it reduces the repetition durability required for practical use and repeats. There is a disadvantage that the jitter value is deteriorated due to this.
【0007】さらに、特開平2−196688号公報に
は、Hf、Zr、Nb、Ti、Ta等の光吸収性の補助
層を備えることが開示され、また特開平5−15936
0号広報においては、Ti、Ni、W、Mo、V、N
b、Cr、Fe等の光吸収性層とその上に放熱層を形成
することが開示されている。さらに特願平5−1717
13号公報には、反射層の屈折率nと消衰係数kの関係
をk≦0.76n+1.8とすることが開示されてい
る。Further, Japanese Patent Application Laid-Open No. 2-196688 discloses that a light absorbing auxiliary layer such as Hf, Zr, Nb, Ti, Ta, etc. is provided.
In the No. 0 public information, Ti, Ni, W, Mo, V, N
It is disclosed that a light-absorbing layer of b, Cr, Fe or the like and a heat radiation layer are formed thereon. Furthermore, Japanese Patent Application No. 5-1717
No. 13 discloses that the relationship between the refractive index n of the reflective layer and the extinction coefficient k is k ≦ 0.76n + 1.8.
【0008】しかし、これらの公報で開示されているい
ずれの光吸収性層を用いた場合においても、実用上十分
なジッター特性を満たす層構造またはその層構成材料と
はなっておらず、また繰り返しによるジッター値劣化に
ついても十分な解決とはなっていない。本発明は、単一
ビームでオーバーライトを行なう場合に生ずる、ジッタ
ーを低減しかつ良好な繰り返し特性が得られる新規な光
情報記録媒体を提供することを課題とする。However, even when any of the light absorbing layers disclosed in these publications is used, the layer structure or the material constituting the layer structure does not satisfy practically sufficient jitter characteristics. However, the deterioration of the jitter value due to this has not been sufficiently solved. SUMMARY OF THE INVENTION It is an object of the present invention to provide a novel optical information recording medium capable of reducing jitter and achieving good repetition characteristics when overwriting is performed with a single beam.
【0009】[0009]
【課題を解決するための手段】本発明者らは、上記の課
題を解決すべく鋭意研究を重ねた結果、記録層の結晶状
態での光吸収率をAc、非晶質状態での光吸収率をAa
とし、記録層と反射層の間に形成する保護層の膜厚d
(nm)とした時、次式(a)及び(b) Ac/Aa≧1.1 (a) d≦50 (b) を満足することが上記の課題を解決するための条件であ
ることを見いだし、その知見に基づき、本発明を完成す
るに至った。The inventors of the present invention have conducted intensive studies to solve the above-mentioned problems. As a result, the recording layer has a light absorption rate of Ac in a crystalline state and a light absorption rate in an amorphous state. Aa
And the thickness d of the protective layer formed between the recording layer and the reflective layer
When (nm) is satisfied, satisfying the following expressions (a) and (b) Ac / Aa ≧ 1.1 (a) d ≦ 50 (b) is a condition for solving the above problem. The present inventors have found and completed the present invention based on the findings.
【0010】[0010]
【0011】すなわち本発明の請求項1は、光学的特性
の変化により情報を記録する光情報記録媒体において、
記録層と誘電体層と反射層が透明基板上に順次形成さ
れ、前記誘電体層の膜厚d(nm)がd≦50を満た
し、かつ、前記反射層が、下記一般式で表される材料か
らなることを特徴とする光情報記録媒体である。 AxB(100−x) ただし、50≦x≦95 ここで、AはGe及びSiからなる群から選ばれる少な
くとも一種類であり、BはAl、Au、Ag、Ti及び
Vからなる群から選ばれる少なくとも一種類である。That is, claim 1 of the present invention relates to an optical information recording medium for recording information by changing optical characteristics,
A recording layer, a dielectric layer, and a reflective layer are sequentially formed on a transparent substrate, the thickness d (nm) of the dielectric layer satisfies d ≦ 50, and the reflective layer is represented by the following general formula. An optical information recording medium comprising a material. AxB (100-x) where 50 ≦ x ≦ 95 where A is at least one selected from the group consisting of Ge and Si, and B is selected from the group consisting of Al, Au, Ag, Ti and V At least one type.
【0012】また、請求項2は、光学的特性の変化によ
り情報を記録する光情報記録媒体において、記録層と誘
電体層と反射層が透明基板上に順次形成され、前記誘電
体層の膜厚d(nm)がd≦50を満たし、かつ、前記
反射層が、下記一般式で表される材料からなることを特
徴とする光情報記録媒体である。 AxB(100−x) ただし、20≦x≦80 ここで、AはMo及びWからなる群から選ばれる少なく
とも一種類であり、BはV、Nb及びTiからなる群か
ら選ばれる少なくとも一種類である。According to a second aspect of the present invention, in an optical information recording medium for recording information by changing optical characteristics, a recording layer, a dielectric layer and a reflective layer are sequentially formed on a transparent substrate, and the film of the dielectric layer is formed. An optical information recording medium characterized in that the thickness d (nm) satisfies d ≦ 50 and the reflective layer is made of a material represented by the following general formula. AxB (100-x) where 20 ≦ x ≦ 80 where A is at least one member selected from the group consisting of Mo and W, and B is at least one member selected from the group consisting of V, Nb and Ti. is there.
【0013】本発明における光情報記録媒体は、記録
層、誘電体層、反射層を透明基板上に順次形成すること
ができ、好ましくは記録層と基板との間に誘電体層が形
成された4層構造とすることができる。また、反射層の
上部に熱的な物性を調整するための第5の層を形成する
ことも可能である。この場合、第5の層としてAu、A
l、またそれらを基とする合金など高反射性の材料が好
ましい。In the optical information recording medium of the present invention, a recording layer, a dielectric layer, and a reflection layer can be sequentially formed on a transparent substrate. Preferably, a dielectric layer is formed between the recording layer and the substrate. It can have a four-layer structure. Further, it is possible to form a fifth layer for adjusting thermal properties on the reflective layer. In this case, as the fifth layer, Au, A
and highly reflective materials such as alloys based on them.
【0014】このような層構造の光情報記録媒体の反射
層の複素屈折率n’=n+ikにおける消衰係数kが
1.0n−0.8(nは屈折率)より大きい場合は、反
射層の光反射率が高くなり、非晶質状態の記録層からの
透過光に対する吸収効率が低下し、前述のAcとAaの
比が1.1未満になり繰り返し耐久性に関して良好な結
果を得ることができない。When the extinction coefficient k at the complex refractive index n '= n + ik of the reflective layer of the optical information recording medium having such a layer structure is larger than 1.0n-0.8 (n is the refractive index), the reflective layer Has a higher light reflectance, lowers the absorption efficiency with respect to the transmitted light from the recording layer in the amorphous state, and the ratio of Ac to Aa is less than 1.1, thereby obtaining a good result with respect to the repetition durability. Can not.
【0015】またkが1以下の場合、作成された光情報
記録媒体からの透過光量が多くなるため、記録感度の低
下、ノイズの上昇などの問題が発生することがある。こ
の場合、本発明における反射層の上部に光反射性の高い
金属、例えばAu、Al、またそれらを基とする合金な
どを形成することで透過光を遮断する層構成とすること
が望ましい。[0015] When k is 1 or less, the amount of light transmitted from the optical information recording medium thus produced increases, and thus problems such as a decrease in recording sensitivity and an increase in noise may occur. In this case, it is desirable to form a layer structure that blocks transmitted light by forming a metal with high light reflectivity, for example, Au, Al, or an alloy based thereon, on the reflective layer in the present invention.
【0016】また、記録層と反射層の間に形成される誘
電体層の膜厚が50nmより厚くなるとレーザにより加
熱された記録層を冷却する速度が低下することから、繰
り返し耐久性を劣化する原因となりやすい。さらに反射
層は、特にGe−Te−Sb系相変化型光記録媒体に用
いることにより、より良好な繰り返し耐久性を実現する
ことができる。Further, if the thickness of the dielectric layer formed between the recording layer and the reflective layer is more than 50 nm, the rate of cooling the recording layer heated by the laser is reduced, so that the repetitive durability is deteriorated. Easy to cause. Further, by using the reflective layer particularly for a Ge—Te—Sb phase change type optical recording medium, better repetition durability can be realized.
【0017】繰り返し耐久性のよい光学定数を満たすこ
とのできる新規な材料は、次式で表される。 AxB(100−x) (3) AはGe、Siから選ばれる少なくとも一種類であり、
BはAl、Au、Ag、Ti、Vから選ばれる少なくと
も一種類である。ここでxが50未満の場合、繰り返し
耐久性の改良に大きな効果が見られず、95より大きい
場合は、光学的コントラストを低下させるため50以上
95以下が好ましい。また、この材料系の多くは、相図
によると共晶系に属することから、組成比による光学定
数、また熱物性の制御が可能であり、従って様々な光記
録条件に応じて材料の選定を容易に行なうことができ
る。A novel material that can satisfy the optical constant with good repetition durability is represented by the following equation. AxB (100-x) (3) A is at least one selected from Ge and Si;
B is at least one selected from Al, Au, Ag, Ti, and V. Here, when x is less than 50, no great effect is obtained in the improvement of the repetition durability, and when x is more than 95, the value is preferably 50 or more and 95 or less in order to lower the optical contrast. In addition, since many of these material systems belong to the eutectic system according to the phase diagram, the optical constants and thermophysical properties can be controlled by the composition ratio, and therefore, the selection of the material according to various optical recording conditions is possible. It can be done easily.
【0018】さらに繰り返し耐久性のよい光学定数を満
たすことのできる新規な材料は次式で表される。 AxB(100−x) (4) AはMo、Wから選ばれる少なくとも一種類であり、B
はV、Nb、Tiから選ばれる少なくとも一種類であ
る。ここでxが20未満の場合、繰り返し耐久性の改良
に大きな効果が見られず、80より大きい場合は、記録
感度を低下させるため、20以上80以下が好ましい。
また、この材料系の多くは、全率固溶体の相図に属し、
組成比による光学定数、また熱物性の制御が比較的容易
にでき、従って様々な光記録条件に応じて材料の選定が
可能となる。Further, a novel material which can satisfy the optical constant having good repetition durability is represented by the following formula. AxB (100-x) (4) A is at least one selected from Mo and W;
Is at least one selected from V, Nb, and Ti. Here, when x is less than 20, there is no significant effect on improvement of the repetition durability, and when x is more than 80, the recording sensitivity is lowered.
Many of these material systems belong to the solid solution phase diagram,
Control of the optical constants and thermophysical properties by the composition ratio can be relatively easily performed, so that the material can be selected according to various optical recording conditions.
【0019】[0019]
【作用】本発明によれば、非晶質状態の記録層から透過
した光を反射層もしくは本発明による新規な層において
吸収させる作用がある。その結果、非晶質状態の記録層
における光吸収率を低下させ、記録層と反射層の間に形
成された誘電体層の膜厚が50nm以下の構造におい
て、AcとAaの比を1.1以上に制御することが可能
となり良好な繰り返し耐久性を得ることができる。According to the present invention, the light transmitted from the recording layer in the amorphous state is absorbed by the reflective layer or the novel layer according to the present invention. As a result, the light absorptance of the recording layer in the amorphous state is reduced, and the ratio of Ac to Aa is set to 1 in a structure in which the thickness of the dielectric layer formed between the recording layer and the reflective layer is 50 nm or less. It can be controlled to one or more, and good repetition durability can be obtained.
【0020】[0020]
【実施例】以下本発明を実施例に基づいて詳細に説明す
る。なお、実施例では相変化型記録材料を例として説明
するが、本発明はこれに限定されるものではない。ま
た、以下の実施例における光情報記録媒体の特性評価方
法としては、ディスクを3600rpm回転させ、半径
39mmの位置において測定を行なった。光学系として
はレーザ波長680nmを用い、1−7変調信号を用い
ピットエッジ記録を行なった。ジッターの測定は、2T
w信号(記録周波数:12.3MHz)を記録し、7T
w信号(記録周波数:3.5MHz)をオーバーライト
した時のジッターをジッターアナライザーにより解析し
標準偏差σにより評価した。また、耐久性を評価するた
め、初回オーバライト時のσ及び1万回後のσをそれぞ
れ測定した。DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail based on embodiments. In the examples, a phase change type recording material will be described as an example, but the present invention is not limited to this. Further, as a method for evaluating the characteristics of the optical information recording medium in the following examples, the disk was rotated at 3600 rpm and the measurement was performed at a position with a radius of 39 mm. Pit edge recording was performed using a laser wavelength of 680 nm as an optical system and a 1-7 modulation signal. Jitter measurement is 2T
w signal (recording frequency: 12.3 MHz) is recorded, and 7T
The jitter when the w signal (recording frequency: 3.5 MHz) was overwritten was analyzed by a jitter analyzer and evaluated by the standard deviation σ. Further, in order to evaluate the durability, σ at the time of initial overwriting and σ after 10,000 times were respectively measured.
【0021】図1に本発明の光情報記録媒体の構成例を
示す。1は中心穴を有する直径3.5inch、厚さ
0.6mmの円盤上の透明樹脂材料で、あらかじめ1.
0μmのピッチの溝が設けられている基板である。この
透明基板1上に例えばスッパッタ法によって保護層(誘
電体)2、光学記録層3、保護層(誘電体)4、反射層
5が順次積層される。光学記録層としては、Ge−Te
−Sb系合金を用いた。また誘電体としては、ZnS−
SiO2 混合物を用いた。FIG. 1 shows a configuration example of the optical information recording medium of the present invention. Reference numeral 1 denotes a transparent resin material on a disk having a center hole and having a diameter of 3.5 inches and a thickness of 0.6 mm.
This is a substrate provided with grooves having a pitch of 0 μm. On this transparent substrate 1, for example, a protective layer (dielectric) 2, an optical recording layer 3, a protective layer (dielectric) 4, and a reflective layer 5 are sequentially laminated by a sputtering method. Ge-Te as the optical recording layer
-An Sb-based alloy was used. As the dielectric, ZnS-
An SiO 2 mixture was used.
【0022】この構成における各層の膜厚ならびに反射
層の屈折率n、消衰係数kを変化させた時の光学計算の
計算結果を図2に示す。なお、この計算は、光学的変調
度を高くするため、変調度(変調度=(Rc−Ra)/
(Rc+Ra)*100、ここでRcは結晶状態の反射
率、Raは非晶質状態の反射率)を70%以上とした条
件のもとで行なった。この計算に用いた各層の光学定
数、ならびに膜厚範囲を表1に示す。図2から反射層の
光学定数としてk≦1.0n−0.8の場合、Ac/A
a≧1.1を満たすことがわかる。FIG. 2 shows the results of optical calculations when the thickness of each layer, the refractive index n of the reflective layer, and the extinction coefficient k are changed in this configuration. In this calculation, the modulation degree (modulation degree = (Rc−Ra) /
(Rc + Ra) * 100, where Rc is a reflectance in a crystalline state, and Ra is a reflectance in an amorphous state, and the conditions were set to 70% or more. Table 1 shows the optical constants and the thickness ranges of the respective layers used in this calculation. As shown in FIG. 2, when the optical constant of the reflective layer is k ≦ 1.0n−0.8, Ac / A
It can be seen that a ≧ 1.1 is satisfied.
【0023】[0023]
【実施例1】次に、上述の実施例と同様、図1に示すよ
うに、透明基板1上にZnS−SiO2 (SiO2 :2
0mol%)からなるターゲットからRFスパッタリン
グ法により膜厚70nmの保護層2を形成した。次にG
e−Te−Sb系合金からなる膜厚15nmの光学記録
層3、ZnS−SiO2 (SiO2 :20mol%)か
らなる膜厚15nmの保護層4、さらにGeAl(G
e:90mol%)からなる反射層5を150nm順次
スパッタ法により形成した。その後、反射層5の上にU
V硬化樹脂層6をスピンコート法により形成し光情報記
録媒体を作成した。[Embodiment 1] Next, as shown in FIG. 1, ZnS-SiO 2 (SiO 2 : 2
A protective layer 2 having a thickness of 70 nm was formed from a target consisting of (0 mol%) by RF sputtering. Then G
An optical recording layer 3 having a thickness of 15 nm made of an e-Te-Sb-based alloy, a protective layer 4 having a thickness of 15 nm made of ZnS-SiO 2 (SiO 2 : 20 mol%), and a GeAl (G
e: 90 mol%) was formed by sputtering successively at 150 nm. After that, U
An optical information recording medium was formed by forming a V-cured resin layer 6 by spin coating.
【0024】この時の反射層材料の光学定数、初期ジッ
ター値と1万回繰り返し後のジッター値、および反射層
単層の光学定数を表2の実施例1に示す。At this time, the optical constants of the reflective layer material, the initial jitter value, the jitter value after 10,000 repetitions, and the optical constants of the reflective layer single layer are shown in Example 1 of Table 2.
【0025】[0025]
【実施例2〜8】反射層にそれぞれSiAu(Si:8
0mol%)、GeAg(Ge:65mol%)、Si
Ti(Si:78mol%)、SiV(Si:73mo
l%)、WV(W:50mol%)、MoNb(Mo:
50mol%)、MoTi(Mo:50mol%)を用
いた以外は、実施例1と同様の方法でかつ同じ膜厚構造
で光情報記録媒体を作成した。その結果を表2の実施例
3に示す。Embodiments 2 to 8 Each of the reflection layers was made of SiAu (Si: 8).
0 mol%), GeAg (Ge: 65 mol%), Si
Ti (Si: 78 mol%), SiV (Si: 73 mo)
1%), WV (W: 50 mol%), MoNb (Mo:
An optical information recording medium was manufactured in the same manner as in Example 1 except that MoTi (Mo: 50 mol%) and MoTi (Mo: 50 mol%) were used and had the same film thickness structure. The results are shown in Example 3 of Table 2.
【0026】[0026]
【実施例9】図3に示すように、実施例1と同様にし
て、透明基板11上に膜厚70nmの保護層12、膜厚
15nmの光学記録層13、膜厚15nmの保護層1
4、膜厚150nmの反射層15(GeAl:Ge95
mol%)を作成し、さらにその反射層15の上部に放
熱層16としてAl層を100nm形成した。その後実
施例1の同様の方法によりUV硬化樹脂層17をスピン
コート法により形成し光情報記録媒体を作成した。結果
を表2の実施例2に示す。Ninth Embodiment As shown in FIG. 3, in the same manner as in the first embodiment, a protective layer 12 having a thickness of 70 nm, an optical recording layer 13 having a thickness of 15 nm, and a protective layer 1 having a thickness of 15 nm are formed on a transparent substrate 11.
4. 150 nm thick reflective layer 15 (GeAl: Ge95
mol%), and an Al layer having a thickness of 100 nm was formed as a heat radiation layer 16 on the reflective layer 15. Thereafter, a UV curable resin layer 17 was formed by a spin coating method in the same manner as in Example 1 to produce an optical information recording medium. The results are shown in Example 2 of Table 2.
【0027】[0027]
【実施例10】図3の構造の光記録媒体を、実施例9と
同様の方法により透明基板上11に膜厚70nmの保護
層12、膜厚15nmの光学記録層13、膜厚15nm
の保護層14、膜厚150nmの反射層15(WV:W
50mol%)を作成し、さらにその反射層15の上部
に放熱層16としてAlTi合金層を100nm形成し
た。その後、実施例1の同様の方法によりUV硬化樹脂
層17をスピンコート法により形成し光情報記録媒体を
作成した。結果を表2の実施例10に示す。Embodiment 10 An optical recording medium having the structure shown in FIG. 3 was formed on a transparent substrate 11 in the same manner as in Embodiment 9 by forming a protective layer 12 having a thickness of 70 nm, an optical recording layer 13 having a thickness of 15 nm, and a film thickness of 15 nm.
Protective layer 14 and a 150 nm-thick reflective layer 15 (WV: W
Then, an AlTi alloy layer having a thickness of 100 nm was formed as a heat radiation layer 16 on the reflective layer 15. Thereafter, a UV curable resin layer 17 was formed by a spin coating method in the same manner as in Example 1 to produce an optical information recording medium. The results are shown in Example 10 of Table 2.
【0028】[0028]
【比較例1〜2】反射層にそれぞれHf、GeAl(G
e:90mol%)を用い、各層の膜厚構造として膜厚
70nmの保護層2、膜厚15nmの光学記録層3、膜
厚160nmの保護層4、膜厚150nmの反射層5を
形成した以外は実施例1と同様の方法で光情報記録媒体
を作成した。結果を表2の比較例1〜2に示す。Comparative Examples 1-2 Hf and GeAl (G
e: 90 mol%), except that a protective layer 2 having a thickness of 70 nm, an optical recording layer 3 having a thickness of 15 nm, a protective layer 4 having a thickness of 160 nm, and a reflective layer 5 having a thickness of 150 nm were formed as the thickness structure of each layer. Produced an optical information recording medium in the same manner as in Example 1. The results are shown in Comparative Examples 1 and 2 of Table 2.
【0029】[0029]
【比較例3〜9】反射層にそれぞれCr、GeAl(G
e:40mol%)、Ge、W、SiAu(Si:45
mol%)、Si、WV(W:10mol%)を用い、
各層の膜厚構造として第1の保護層厚を70nm、記録
層厚を15nm、第2の保護層厚を15nm、反射層厚
を150nmとした以外は実施例1と同様の方法で光情
報記録媒体を作成した。結果を表2の比較例3〜9に示
す。Comparative Examples 3 to 9 Cr and GeAl (G
e: 40 mol%), Ge, W, SiAu (Si: 45
mol%), Si, WV (W: 10 mol%)
Optical information recording was performed in the same manner as in Example 1, except that the first protective layer thickness was 70 nm, the recording layer thickness was 15 nm, the second protective layer thickness was 15 nm, and the reflective layer thickness was 150 nm. Created media. The results are shown in Comparative Examples 3 to 9 in Table 2.
【0030】表2から実施例1〜10については、ジッ
ターに関して良好な繰り返し耐久性を有することがわか
る。次に、実用的に必要となるジッターの範囲を表すσ
/Tw<11.3%(σ:標準偏差、Tw:ウインドウ
幅)と、本発明で得られる光情報記録媒体の性能を図4
に示す。図4から本発明による光情報記録媒体は、実用
的に十分な性能を達成できていることがわかる。すなわ
ち、本発明による材料を用いることにより、単一ビーム
を用いたオーバーライト記録における初期のジッターを
低減できると共にジッターの繰り返し耐久性に優れる光
情報記録媒体を得ることができる。From Table 2, it can be seen that Examples 1 to 10 have good repetition durability with respect to jitter. Next, σ representing the range of jitter necessary for practical use
/Tw<11.3% (σ: standard deviation, Tw: window width) and the performance of the optical information recording medium obtained by the present invention are shown in FIG.
Shown in FIG. 4 shows that the optical information recording medium according to the present invention has achieved practically sufficient performance. That is, by using the material according to the present invention, it is possible to reduce the initial jitter in overwrite recording using a single beam and to obtain an optical information recording medium having excellent jitter repetition durability.
【0031】[0031]
【表1】 [Table 1]
【0032】[0032]
【表2】 [Table 2]
【0033】[0033]
【発明の効果】以上説明したように、本発明によれば、
単一ビームを用いたオーバーライト記録における初期の
ジッターを低減できると共にジッターの繰り返し耐久性
に優れる光情報記録媒体を得ることができる。As described above, according to the present invention,
An optical information recording medium that can reduce initial jitter in overwrite recording using a single beam and has excellent jitter repetition durability can be obtained.
【図1】本発明の光情報記録媒体の実施例の層構造を示
す断面図である。FIG. 1 is a sectional view showing a layer structure of an optical information recording medium according to an embodiment of the present invention.
【図2】反射層の光学定数と、記録層の結晶状態におけ
る光吸収率と非晶質状態における光吸収率との比(Ac
/Aa)との関係を示す図である。FIG. 2 shows the ratio (Ac) between the optical constant of a reflective layer and the light absorptivity in a crystalline state and an amorphous state of a recording layer.
/ Aa).
【図3】本発明の光情報記録媒体の実施例の層構造を示
す断面図である。FIG. 3 is a sectional view showing a layer structure of an embodiment of the optical information recording medium of the present invention.
【図4】実用性能を満たすために必要となるσ/Tw<1
1.3%と、本発明における光情報記録媒体のジッター特性
領域を示す図である。FIG. 4: σ / Tw <1 required to satisfy practical performance
FIG. 3 is a diagram showing 1.3% and a jitter characteristic region of the optical information recording medium according to the present invention.
1、11 透明基板 2、12 保護層(誘電体) 3、13 光学記録層 4、14 保護層(誘電体) 5、15 反射層5 6、17 UV硬化樹脂層 16 放熱層 DESCRIPTION OF SYMBOLS 1, 11 Transparent substrate 2, 12 Protective layer (dielectric) 3, 13 Optical recording layer 4, 14 Protective layer (dielectric) 5, 15 Reflective layer 5, 6, 17 UV curing resin layer 16 Heat dissipation layer
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平1−149238(JP,A) 特開 平5−282704(JP,A) 特開 平3−113844(JP,A) 特開 平2−54443(JP,A) 特開 平2−289934(JP,A) 特開 平3−178031(JP,A) (58)調査した分野(Int.Cl.6,DB名) G11B 7/24 538 ──────────────────────────────────────────────────続 き Continuation of front page (56) References JP-A-1-149238 (JP, A) JP-A-5-282704 (JP, A) JP-A-3-113844 (JP, A) JP-A-2- 54443 (JP, A) JP-A-2-289934 (JP, A) JP-A-3-178031 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) G11B 7/24 538
Claims (2)
光情報記録媒体において、記録層と誘電体層と反射層が
透明基板上に順次形成され、前記誘電体層の膜厚d(n
m)がd≦50を満たし、かつ、前記反射層が、下記一
般式で表される材料からなることを特徴とする光情報記
録媒体。 AxB(100−x) ただし、50≦x≦95 ここで、AはGe及びSiからなる群から選ばれる少な
くとも一種類であり、BはAl、Au、Ag、Ti及び
Vからなる群から選ばれる少なくとも一種類である。 In an optical information recording medium for recording information by changing optical characteristics, a recording layer, a dielectric layer, and a reflective layer are sequentially formed on a transparent substrate, and a film thickness d (n
m) satisfies d ≦ 50, and the reflective layer is made of a material represented by the following general formula. AxB (100-x) where 50 ≦ x ≦ 95 where A is at least one selected from the group consisting of Ge and Si, and B is selected from the group consisting of Al, Au, Ag, Ti and V At least one type.
光情報記録媒体において、記録層と誘電体層と反射層が
透明基板上に順次形成され、前記誘電体層の膜厚d(n
m)がd≦50を満たし、かつ、前記反射層が、下記一
般式で表される材料からなることを特徴とする光情報記
録媒体。 AxB(100−x) ただし、20≦x≦80 ここで、AはMo及びWからなる群から選ばれる少なく
とも一種類であり、BはV、Nb及びTiからなる群か
ら選ばれる少なくとも一種類である。 2. In an optical information recording medium for recording information by changing optical characteristics, a recording layer, a dielectric layer and a reflective layer are sequentially formed on a transparent substrate, and the thickness d (n) of the dielectric layer
m) satisfies d ≦ 50, and the reflective layer is made of a material represented by the following general formula. AxB (100-x) where 20 ≦ x ≦ 80 where A is at least one member selected from the group consisting of Mo and W, and B is at least one member selected from the group consisting of V, Nb and Ti. is there.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6268614A JP2877704B2 (en) | 1994-11-01 | 1994-11-01 | Optical information recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6268614A JP2877704B2 (en) | 1994-11-01 | 1994-11-01 | Optical information recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08129779A JPH08129779A (en) | 1996-05-21 |
| JP2877704B2 true JP2877704B2 (en) | 1999-03-31 |
Family
ID=17460996
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6268614A Expired - Fee Related JP2877704B2 (en) | 1994-11-01 | 1994-11-01 | Optical information recording medium |
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| Country | Link |
|---|---|
| JP (1) | JP2877704B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1553577A4 (en) * | 2002-10-16 | 2007-11-21 | Matsushita Electric Industrial Co Ltd | INFORMATION RECORDING MEDIUM, METHOD FOR PRODUCING THE SAME, AND OPTICAL INFORMATION RECORDING AND REPRODUCING DEVICE |
-
1994
- 1994-11-01 JP JP6268614A patent/JP2877704B2/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| JPH08129779A (en) | 1996-05-21 |
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