JP2884699B2 - Rubber joining method - Google Patents
Rubber joining methodInfo
- Publication number
- JP2884699B2 JP2884699B2 JP11471990A JP11471990A JP2884699B2 JP 2884699 B2 JP2884699 B2 JP 2884699B2 JP 11471990 A JP11471990 A JP 11471990A JP 11471990 A JP11471990 A JP 11471990A JP 2884699 B2 JP2884699 B2 JP 2884699B2
- Authority
- JP
- Japan
- Prior art keywords
- rubber
- thin film
- metal
- bonding
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、スチールコード等の基材に対するゴムの接
合方法の改良に関し、更に詳述すると、基材表面上にド
ライメッキ法等により金属薄膜を形成した後、ゴム組成
物を加硫接着する場合において、金属薄膜の接着力を改
良して基材とゴムとを接着性よく接合する方法に関す
る。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improvement in a method of bonding rubber to a base material such as a steel cord, and more particularly, to forming a metal thin film on a base material surface by a dry plating method or the like. The present invention relates to a method for improving the adhesive strength of a metal thin film and bonding a base material and rubber with good adhesiveness when vulcanizing and bonding a rubber composition.
従来の技術 スチールコードなどの金属基材にゴム組成物を接合す
る場合、金属基材とゴム組成物との密着を改善するた
め、本発明者らは金属基材表面上にドライめっき法によ
り金属又は金属合金薄膜を付着形成し、次いでゴム組成
物を加熱圧着して加硫接着する方法を提案した(特開昭
62−87311号、同62−246278号公報)。2. Description of the Related Art When a rubber composition is bonded to a metal base such as a steel cord, in order to improve the adhesion between the metal base and the rubber composition, the present inventors apply a metal to the surface of the metal base by a dry plating method. Alternatively, a method has been proposed in which a metal alloy thin film is attached and formed, and then the rubber composition is heated and pressed to perform vulcanization bonding (Japanese Patent Application Laid-Open
62-87311 and 62-246278).
上記接合方法は、接着剤を用いずに金属基材とゴムを
強力に接合できるものであるが、金属又は金属合金のド
ライめっき薄膜と金属基材との接着性を更に向上させる
ため、通常金属基材に表面処理を施すことが行なわれ
る。The bonding method can strongly bond the metal substrate and the rubber without using an adhesive.However, in order to further improve the adhesiveness between the dry plating thin film of the metal or the metal alloy and the metal substrate, the bonding method is usually used. The surface treatment is performed on the base material.
即ち、ドライめっきを施す前に金属基材表面を溶剤洗
浄、超音波洗浄、酸、アルカリ洗浄等の湿式法でクリー
ニングする方法、真空中で行なうプラズマクリーニング
(ボンバード)、逆スパッタ法などのドライ法でクリー
ニングする方法などが行なわれている。That is, a method of cleaning the surface of a metal substrate by a wet method such as solvent cleaning, ultrasonic cleaning, acid or alkali cleaning before performing dry plating, a plasma cleaning (bombard) performed in a vacuum, and a dry method such as a reverse sputtering method. Cleaning method is performed.
また、上記公報で提案した方法においては、ドライめ
っき法としてスパッタリング法を採用した場合、真空蒸
着法に比べ、叩き出された金属原子がより高い運動エネ
ルギーを有するため、金属基材に対するドライめっき薄
膜の接着力を向上させることができ、一方、イオンプレ
ーティング法を採用した場合は、蒸発原子の一部がイオ
ン化されるため、基材にバイアス電位を印加して、イオ
ン化した金属原子を電気的に加速させ、高いエネルギー
で基材に叩きつけることにより、基材に対するドライめ
っき薄膜の接着力を向上させることができるなど、ドラ
イめっき法を適宜選択採用して基材に対するドライめっ
き薄膜の接着力を向上させることができる。Further, in the method proposed in the above publication, when a sputtering method is employed as a dry plating method, a metal atom that has been beaten has a higher kinetic energy than a vacuum evaporation method. On the other hand, when the ion plating method is used, a part of the evaporated atoms is ionized, so that a bias potential is applied to the base material to electrically ionize the metal atoms. The dry plating method can be used to improve the adhesive strength of the dry plating thin film to the substrate by, for example, improving the adhesion of the dry plating thin film to the substrate by hitting the substrate with high energy. Can be improved.
発明が解決しようとする課題 しかしながら、本発明者らが更に検討を行なった結
果、金属基材表面にドライめっき薄膜、特にドライめっ
き薄膜としてコバルト金属薄膜を形成した場合、上述し
た適宜な前処理、ドライめっき法を採用しても、より厳
しい条件下ではゴム層の破壊が生じる前に基材とゴム層
とを接着する役割を果すドライめっき薄膜部分の破壊が
生じることがあり、このためゴム系複合材料の接合強度
の低下が生じる場合があることを見い出した。Problems to be Solved by the Invention However, as a result of further studies by the present inventors, when a dry plating thin film is formed on a metal substrate surface, particularly when a cobalt metal thin film is formed as a dry plating thin film, the above-described appropriate pretreatment, Even when the dry plating method is adopted, under more severe conditions, the dry plating thin film portion that plays a role of bonding the base material and the rubber layer may occur before the rubber layer is destroyed, so that the rubber-based It has been found that the joint strength of the composite material may be reduced.
即ち、金属基材表面にコバルト金属薄膜を形成した
後、ゴム組成物を加熱圧着して硫黄加硫により接着する
場合、硫黄を例えば5〜6部と多量に配合し、通常40分
程度で行なう加硫を例えば400〜600分程度の長時間加硫
し、得られたゴム系複合材料を−60℃程度の低温雰囲気
下で剥離試験を行なうと、コバルト金属薄膜の付着した
基材とコバルト金属薄膜の付着したゴム層とに剥離する
こと、そしてこの剥離はゴム加硫時の該薄膜内の強度低
下が原因であることを見い出した。That is, when a cobalt metal thin film is formed on the surface of a metal base material, and then the rubber composition is bonded by heating and compression and sulfur vulcanization, a large amount of, for example, 5 to 6 parts of sulfur is blended and usually performed in about 40 minutes. For example, vulcanization is carried out for a long time of about 400 to 600 minutes, and the obtained rubber-based composite material is subjected to a peel test in a low-temperature atmosphere of about -60 ° C. It was found that the film was peeled off from the rubber layer to which the thin film adhered, and that this peeling was caused by a decrease in the strength of the film during vulcanization of the rubber.
本発明は上記事情に鑑みなされたもので、金属等の基
材表面にコバルト金属薄膜を形成した後、ゴム組成物を
加熱加硫するゴムの接合方法において、基材とゴム層と
の接着機能を有するコバルト金属薄膜の長時間加硫後の
低温剥離試験におけるコバルト金属薄膜の破壊を防止
し、基材とゴムとを強固に接合する方法を提供すること
を目的とする。The present invention has been made in view of the above circumstances, and in a method of bonding a rubber in which a rubber composition is heated and vulcanized after forming a cobalt metal thin film on a surface of a base material such as a metal, an adhesive function between the base material and the rubber layer is provided. It is an object of the present invention to provide a method for preventing the destruction of a cobalt metal thin film in a low-temperature peeling test after long-time vulcanization of a cobalt metal thin film having the above, and for firmly joining a substrate and rubber.
課題を解決するための手段及び作用 本発明者らは上記目的を達成するため鋭意検討を重ね
た結果、基材表面にコバルト金属薄膜を形成する際、例
えばドライめっきを酸化性の雰囲気下で行なって、酸化
コバルトが混在するコバルト金属薄膜(以下、部分酸化
コバルト薄膜という)を形成し、次いで該薄膜に加熱処
理を行なった後、該薄膜とゴム層を加硫接着する方法に
より、硫黄を5〜6部といった多量配合したゴム組成物
を400分程度の長時間加熱加圧して加硫接着しても、該
薄膜内の強度低下を防止して接合強度を向上させること
ができること、この場合、後述する実施例で示したよう
に、上記部分酸化コバルト薄膜形成のみでは接合強度向
上効果はほとんどなく、該薄膜の加熱処理と併用するこ
とにより、低温下で剥離試験を行なった場合でも該薄膜
内の破壊を確実に防止し得、従って該薄膜の基材とゴム
とを接着する機能が損なわれず、十分な機能を発揮させ
て基材とゴムとを強固に接合できることを見い出し、本
発明をなすに至った。Means and Action for Solving the Problems The present inventors have conducted intensive studies to achieve the above object, and as a result, when forming a cobalt metal thin film on a substrate surface, for example, dry plating was performed in an oxidizing atmosphere. To form a cobalt metal thin film mixed with cobalt oxide (hereinafter referred to as a partially cobalt oxide thin film), heat-treating the thin film, and vulcanizing and bonding the thin film to a rubber layer. Even if the rubber composition mixed in a large amount such as ~ 6 parts is heated and pressed for about 400 minutes for a long time and vulcanized and bonded, it is possible to prevent the strength from being reduced in the thin film and improve the bonding strength. In this case, As shown in Examples described later, the formation of the above partial cobalt oxide thin film alone has almost no effect of improving the bonding strength, and when used in combination with the heat treatment of the thin film, the peeling test was conducted at a low temperature. Even in this case, it is found that destruction in the thin film can be surely prevented, so that the function of bonding the base material of the thin film and the rubber is not impaired, and that the base material and the rubber can be firmly bonded by exhibiting a sufficient function. The present invention has been accomplished.
従って、本発明は基材表面に酸化コバルトが混在する
コバルト金属薄膜を形成した後、該薄膜に熱処理を施
し、次いで該薄膜上にゴム層を加硫形成することを特徴
とするゴムの接合方法を提供する。Therefore, the present invention provides a method for bonding rubber, comprising forming a cobalt metal thin film containing a mixture of cobalt oxide on the surface of a substrate, heat-treating the thin film, and then vulcanizing and forming a rubber layer on the thin film. I will provide a.
以下、本発明について更に詳しく説明する。 Hereinafter, the present invention will be described in more detail.
本発明のゴムの接合方法において、対象となる基材の
種類は特に制限されず、金属、セラミックス、プラスチ
ック等に適用可能である。この場合、金属基材の種類と
しては、例えば鉄鋼、ステンレススチール、チタン合
金、アルミニウム、アルミニウム合金、銅、銅合金、亜
鉛、亜鉛合金、アモルファス合金などが挙げられるが、
これらに限定されるものではない。また、セラミック
ス、プラスチックとしてもその目的に応じて種々のもの
を選定することができる。In the rubber bonding method of the present invention, the type of the target substrate is not particularly limited, and the present invention is applicable to metals, ceramics, plastics, and the like. In this case, examples of the type of the metal substrate include steel, stainless steel, titanium alloy, aluminum, aluminum alloy, copper, copper alloy, zinc, zinc alloy, and amorphous alloy.
It is not limited to these. Various ceramics and plastics can be selected according to the purpose.
この基材の形状、サイズなどは目的に応じて適宜選定
されるが、例えばスチールワイヤー、スチールコード、
スチールタイヤコード、スチールケーブル、スチールス
トランド、スチールロッド、スチールプレート、スチー
ルフィラメント等(以下、これらをスチールコードと総
称する)、金属板や金属金具などがある。The shape and size of the base material are appropriately selected depending on the purpose, for example, steel wire, steel cord,
Examples include steel tire cords, steel cables, steel strands, steel rods, steel plates, steel filaments, and the like (hereinafter, these are collectively referred to as steel cords), metal plates, metal fittings, and the like.
これらの基材表面に部分酸化コバルト薄膜を形成する
場合、その前処理として上述したクリーニングを基材に
施して部分酸化コバルト薄膜との密着性を高めることが
望ましい。When a partial cobalt oxide thin film is formed on the surface of such a substrate, it is desirable that the above-described cleaning be performed on the substrate as a pre-treatment so as to enhance the adhesion to the partial cobalt oxide thin film.
上記基材に対する部分酸化コバルト薄膜の形成方法と
しては、ドライめっき法を採用することが好ましく、例
えば真空蒸着法、イオンプレーティング法、DC及び高周
波マグネトロンスパッタリング法、2極スパッタリング
法、高周波スパッタリング法、アーク放電式スパッタリ
ング法、電子サイクロトロン共鳴(ECR)プラズマ法等
が挙げられるが、特にイオンプレーティング法、DC及び
高周波マグネトロンスパッタリング法、高周波スパッタ
リング法が好ましい。As a method of forming the partial cobalt oxide thin film on the substrate, it is preferable to employ a dry plating method, for example, a vacuum evaporation method, an ion plating method, a DC and high frequency magnetron sputtering method, a two-electrode sputtering method, a high frequency sputtering method, Examples thereof include an arc discharge sputtering method and an electron cyclotron resonance (ECR) plasma method, and particularly preferred are an ion plating method, a DC and high-frequency magnetron sputtering method, and a high-frequency sputtering method.
これらの方法により部分酸化コバルト薄膜を形成する
場合、成膜時に酸化性を有するガスと反応させる方法が
好適で、一般には反応性スパッタリング法が採用され
る。また、予め酸化物を含む物質より成膜する方法、例
えば酸化物ターゲットのスパッタリング法などによって
行なうこともできる。上記反応性スパッタリング法を採
用する場合、雰囲気ガス中に空気や酸素ガスを混合し、
その濃度を変えることによって薄膜の酸素含有量(酸化
度)をコントロールすることができる。When a partial cobalt oxide thin film is formed by these methods, a method of reacting with an oxidizing gas at the time of film formation is preferable, and a reactive sputtering method is generally employed. Alternatively, a method in which a film is formed from a substance containing an oxide in advance, such as a sputtering method using an oxide target, can be used. When the above reactive sputtering method is adopted, air or oxygen gas is mixed into the atmosphere gas,
By changing the concentration, the oxygen content (oxidation degree) of the thin film can be controlled.
上記方法で得られる部分酸化コバルト薄膜の酸化度は
5〜35原子%、特に10〜25原子%が好ましく、5%未満
の酸化度では接合強度向上効果が現われない場合があ
り、一方35原子%より酸化度を高くすると接合強度が低
下する場合がある。The degree of oxidation of the partially cobalt oxide thin film obtained by the above method is preferably from 5 to 35 at%, particularly preferably from 10 to 25 at%, and if the oxidation degree is less than 5%, the effect of improving the bonding strength may not be exhibited. If the degree of oxidation is higher, the bonding strength may decrease.
上記部分酸化コバルト薄膜の膜厚は目的に応じ適宜選
定することができるが、通常10Å〜100μmが薄膜の生
産性から好ましく、特に50Å〜1μmが好ましい。The thickness of the above partial cobalt oxide thin film can be appropriately selected according to the purpose, but is usually preferably from 10 to 100 μm from the productivity of the thin film, and particularly preferably from 50 to 1 μm.
本発明方法は、上記部分酸化コバルト薄膜を基材表面
に形成した後、該薄膜を加熱処理することによって本発
明の接合強度向上効果を得るものである。In the method of the present invention, the above-mentioned partial cobalt oxide thin film is formed on the surface of the substrate, and then the thin film is subjected to a heat treatment to obtain the effect of improving the bonding strength of the present invention.
ここで、熱処理の条件は100〜400℃、特に150〜300℃
で1秒〜3時間の範囲で行なうことが好ましいが、処理
時間は処理温度に対応して低い温度では長時間、高温で
は短時間とすることが好ましく、例えば150℃では1時
間、200℃では2〜5分、300℃では30秒程度とすること
ができる。この熱処理方法としては抵抗加熱、オーブン
加熱、赤外線加熱、誘導加熱等の方法を適宜採用でき、
その雰囲気は空気中、真空中、不活性ガス雰囲気等のい
ずれであっても差し支えない。Here, the conditions of the heat treatment are 100 to 400 ° C, particularly 150 to 300 ° C.
It is preferable to perform the treatment in the range of 1 second to 3 hours, but the treatment time is preferably long at a low temperature corresponding to the treatment temperature, and short at a high temperature. For example, 1 hour at 150 ° C. and 1 hour at 200 ° C. It can be about 30 seconds at 300 ° C. for 2 to 5 minutes. As the heat treatment method, a method such as resistance heating, oven heating, infrared heating, induction heating, etc. can be appropriately adopted,
The atmosphere may be any of air, vacuum, inert gas atmosphere and the like.
本発明方法は、このように基材表面に部分酸化コバル
ト薄膜を形成し、該薄膜に熱処理を施した後に、ゴム組
成物を加硫して基材とゴム層を接合するものである。According to the method of the present invention, the partially cobalt oxide thin film is formed on the surface of the base material, and after the thin film is subjected to heat treatment, the rubber composition is vulcanized to join the base material and the rubber layer.
ここで、ゴム組成物中のゴム成分は、天然ゴム(N
R)、および構造式中に炭素−炭素二重結合を有する合
成ゴムを単独あるいは2種以上ブレンドしたものが使用
できる。上記合成ゴムにはイソプレン、ブタジエン、ク
ロロプレン等の共役ジエン化合物の単独重合体であるポ
リイソプレンゴム(IR)、ポリブタジエンゴム(BR)、
ポリクロロプレンゴム等、前記共役ジエン化合物とスチ
レン、アクリロニトリル、ビニルピリジン、アクリル
酸、メタクリル酸、アルキルアクリレート類、アルキル
メタクリレート類等のビニル化合物との共重合体である
スチレンブタジエン共重合ゴム(SBR)、ビニルピリジ
ンブタジエンスチレン共重合ゴム、アクリロニトリルブ
タジエン共重合ゴム、アクリル酸ブタジエン共重合ゴ
ム、メタアクリル酸ブタジエン共重合ゴム、メチルアク
リレートブタジエン共重合ゴム、メチルメタアクリレー
トブタジエン共重合ゴム等、エチレン、プロピレン、イ
ソブチレン等のオレフィン類とジエン化合物との共重合
体〔例えばイソブチレンイソプレン共重合ゴム(II
R)〕、オレフィン類と非共役ジエンとの共重合体(EPD
M)〔例えばエチレン−プロピレン−シクロペンタジエ
ン三元共重合体、エチレンプロピレン−5−エチリデン
−2−ノルボルネン三元共重合体、エチレンプロピレン
−1,4−ヘキサジエン三元共重合体〕、シクロオレフィ
ンを開環重合させて得られるポリアルケナマー〔例えば
ポリペンテナマー〕、オキシラン環の開環重合によって
得られるゴム〔例えば硫黄加硫が可能なポリエピクロロ
ヒドリンゴム〕、ポリプロピレンオキシドゴム等が含ま
れる。また、前記各種ゴムのハロゲン化物、例えば塩素
化イソブチレンイソプレン共重合ゴム(Cl−IIR)、臭
素化イソブチレンイソプレン共重合ゴム(Br−IIR)等
も含まれる。更に、ノルボルネンの開環重合体も用い得
る。また更に、ブレンドゴムとしては上述のゴムにエピ
クロルヒドリンゴム、ポリプロピレンオキシドゴム、ク
ロルスルフォン化ポリエチレン等の飽和弾性体をブレン
ドして用いることもできる。Here, the rubber component in the rubber composition is a natural rubber (N
R) and synthetic rubbers having a carbon-carbon double bond in the structural formula alone or as a blend of two or more thereof can be used. Examples of the synthetic rubber include polyisoprene rubber (IR), polybutadiene rubber (BR), which is a homopolymer of a conjugated diene compound such as isoprene, butadiene, and chloroprene.
Styrene-butadiene copolymer rubber (SBR), which is a copolymer of the conjugated diene compound and a vinyl compound such as styrene, acrylonitrile, vinylpyridine, acrylic acid, methacrylic acid, alkyl acrylates, and alkyl methacrylates, such as polychloroprene rubber; Vinyl pyridine butadiene styrene copolymer rubber, acrylonitrile butadiene copolymer rubber, acrylate butadiene copolymer rubber, methacrylate butadiene copolymer rubber, methyl acrylate butadiene copolymer rubber, methyl methacrylate butadiene copolymer rubber, ethylene, propylene, isobutylene Copolymers of olefins and diene compounds such as isobutylene-isoprene copolymer rubber (II
R)], copolymers of olefins and non-conjugated dienes (EPD
M) [e.g., an ethylene-propylene-cyclopentadiene terpolymer, an ethylene propylene-5-ethylidene-2-norbornene terpolymer, an ethylene propylene-1,4-hexadiene terpolymer], and a cycloolefin Examples include polyalkenamers (eg, polypentenamers) obtained by ring-opening polymerization, rubbers (eg, sulfur-vulcanizable polyepichlorohydrin rubber) obtained by ring-opening polymerization of oxirane rings, and polypropylene oxide rubbers. Also included are halides of the various rubbers, for example, chlorinated isobutylene isoprene copolymer rubber (Cl-IIR), brominated isobutylene isoprene copolymer rubber (Br-IIR), and the like. Further, a ring-opened polymer of norbornene may be used. Still further, as the blend rubber, a saturated elastic material such as epichlorohydrin rubber, polypropylene oxide rubber, chlorsulfonated polyethylene, or the like may be blended with the above rubber to be used.
上記ゴム成分には、更に常法に従い、目的、用途など
に応じてカーボンブラック、シリカ、炭酸カルシウム、
硫酸カルシウム、クレイ、マイカ等の充填剤、鉱物油、
植物油等の軟化剤、硫黄その他の架橋剤、加硫促進剤、
亜鉛華、ステアリン酸等の加硫促進助剤等を添加してゴ
ム組成物を調製することができる。The rubber component further according to a conventional method, carbon black, silica, calcium carbonate depending on the purpose, use, etc.,
Fillers such as calcium sulfate, clay, mica, mineral oil,
Softeners such as vegetable oils, sulfur and other crosslinking agents, vulcanization accelerators,
A rubber composition can be prepared by adding a vulcanization accelerator such as zinc white and stearic acid.
なお、本発明においては、部分酸化コバルトとゴムと
の加硫接着促進剤として有機コバルト塩類を特に配合す
る必要はない。In the present invention, it is not necessary to particularly add an organic cobalt salt as a vulcanization adhesion promoter between the partially cobalt oxide and the rubber.
上記ゴム組成物と基材表面の部分酸化コバルト薄膜と
の接合は、該薄膜上にゴム組成物を加熱圧着して加硫接
着するものであるが、加硫法は硫黄加硫のほか、ジチオ
モルフォリン、チラウム加硫等の有機硫黄化合物による
有機硫黄加硫などが採用され、常法に従って加熱するこ
とができる。これらの中では特に硫黄加硫による方法が
好ましい。この場合、硫黄や有機硫黄化合物中の硫黄の
配合量はゴム成分100重量部に対して0.5〜7重量部、特
に1〜6重量部とすることが好ましい。The bonding between the rubber composition and the partially cobalt oxide thin film on the surface of the substrate is performed by heating and pressing the rubber composition on the thin film and vulcanizing and bonding the same. The vulcanization method includes sulfur vulcanization and dithiol vulcanization. Organic sulfur vulcanization with an organic sulfur compound such as morpholine or tyrium vulcanization is employed, and heating can be performed according to a conventional method. Among these, the method by sulfur vulcanization is particularly preferred. In this case, the compounding amount of sulfur in the sulfur or the organic sulfur compound is preferably 0.5 to 7 parts by weight, particularly preferably 1 to 6 parts by weight based on 100 parts by weight of the rubber component.
本発明方法では、上記硫黄を例えば5〜6部といった
多量配合したゴム組成物で、長時間加硫接着を行なった
後、例えば−60℃程度の低温雰囲気下で剥離試験を行な
った場合でも、部分酸化コバルト薄膜内の破壊が生じ
ず、基材とゴムとを強固に接合でき、このため、本発明
方法は金属等の基材とゴムとの接合強度を必要とするタ
イヤ、動力伝達ベルト、コンベアベルト、ホース等の繊
維状金属を芯材に用いたゴム系複合材料や防振ゴム、免
振材、ゴムクローラ、ラバースクリーン、ゴムロールな
どの各種ゴム製品や部品類の製造に広く応用できる。In the method of the present invention, a rubber composition containing a large amount of the above-mentioned sulfur, for example, 5 to 6 parts, after performing vulcanization bonding for a long time, for example, even when a peel test is performed in a low-temperature atmosphere of about −60 ° C. The substrate and the rubber can be firmly bonded without destruction in the partially cobalt oxide thin film. Therefore, the method of the present invention requires a tire, a power transmission belt, It can be widely applied to the manufacture of various rubber products and parts such as a rubber-based composite material using a fibrous metal as a core material such as a conveyor belt and a hose, a vibration isolating rubber, a vibration isolator, a rubber crawler, a rubber screen, and a rubber roll.
発明の効果 以上説明したように、本発明方法は基材表面に部分酸
化コバルト薄膜を形成した後、該薄膜に熱処理を施し、
次いで該薄膜上にゴム層を加硫形成することにより、ゴ
ムの加硫剤である硫黄の配合量や加硫接着時間に影響さ
れないで基材とゴム層とを強固に接合できるものであ
る。Effect of the Invention As described above, the method of the present invention forms a partially cobalt oxide thin film on the substrate surface, and then performs a heat treatment on the thin film,
Then, by vulcanizing and forming a rubber layer on the thin film, the base material and the rubber layer can be firmly joined without being affected by the amount of sulfur as a rubber vulcanizing agent or the vulcanization adhesion time.
以下、実施例と比較例を示し、本発明を更に具体的に
示すが、本発明は下記の実施例に限定されるものではな
い。Hereinafter, the present invention will be described more specifically by showing Examples and Comparative Examples, but the present invention is not limited to the following Examples.
基材として黄銅メッキを施したスチールコード(径:
0.18mm,撚構造:3+9)を用い、このスチールコード表
面を高周波13.56MHz、パワー100Wで5分間アルゴンプラ
ズマ処理した。Brass plated steel cord (diameter:
Using 0.18 mm, twist structure: 3 + 9), the surface of the steel cord was subjected to argon plasma treatment at a high frequency of 13.56 MHz and a power of 100 W for 5 minutes.
上記処理を施したスチールコードにDCマグネトロンス
パッタリング法により異なる酸化度のコバルト薄膜を0.
05μmの厚さで形成した。ここで、スパッタ条件は、反
応ガスとしてアルゴンガスを90〜95%、酸素ガスを10〜
5%の容積比率〔ガス流量計(マスフローメータ)で測
定〕で用い、ガス圧力5mTorr、パワー0.5A×400V、時間
30秒で行なった。A cobalt thin film having a different degree of oxidation was applied to the steel cord subjected to the above treatment by DC magnetron sputtering.
It was formed with a thickness of 05 μm. Here, the sputtering conditions are such that argon gas is 90 to 95% as a reaction gas and oxygen gas is 10 to 95%.
5% volume ratio [measured with gas flow meter (mass flow meter)], gas pressure 5mTorr, power 0.5A × 400V, time
Performed in 30 seconds.
次に、上記ドライメッキを形成したスチールコードを
空気中において200℃のオーブン中で5分間熱処理し
た。Next, the steel cord on which the dry plating was formed was heat-treated in an oven at 200 ° C. for 5 minutes in the air.
次いで、熱処理を施したコードを第1表に示す組成の
未加硫ゴム組成物と貼り合せた後、145℃で400分間加硫
接着した。Next, the heat-treated cord was bonded to an unvulcanized rubber composition having the composition shown in Table 1 and then vulcanized at 145 ° C. for 400 minutes.
このようにして得られた加硫接着試料について、引張
り試験機により−60℃の低温雰囲気下で剥離試験して接
着力を測定すると共に、破断面の観察をして、下記基準
で接着性能を評価した。 The vulcanized adhesive sample thus obtained was subjected to a peel test using a tensile tester in a low-temperature atmosphere at −60 ° C. to measure the adhesive strength, and the fracture surface was observed, and the adhesive performance was evaluated based on the following criteria. evaluated.
接着性能 F(%):ドライめっき薄膜の破壊面積 R(%):ゴムの破壊面積 F+R=100% なお、比較のため上記の熱処理を施さない以外は同様
に作製した加硫接着試料について同様に引張り試験を行
なった。Adhesive performance F (%): Fracture area of dry plating thin film R (%): Fracture area of rubber F + R = 100% For comparison, vulcanized adhesion samples prepared in the same manner except that the above heat treatment was not performed A tensile test was performed.
また、ドライメッキ薄膜の酸化度をX線光電子分光
(XPS)法によりコバルトの2S、酸化コバルト(CoO)の
0の1Sピークを用いてドライメッキ薄膜全体の平均値と
して求めた。The degree of oxidation of the dry plated thin film was determined as an average value of the entire dry plated thin film by X-ray photoelectron spectroscopy (XPS) using the 2S peak of cobalt and the 1S peak of 0 of cobalt oxide (CoO).
以上の結果を第2表に示す。 Table 2 shows the above results.
第2表の結果より、部分酸化コバルトであっても熱処
理しないもの(比較例1〜3)は接着力及び接着性能が
劣る。これに対し、本発明に係るもの(実施例1〜3)
は接着力及び接着性能に優れ、部分酸化コバルト薄膜に
熱処理を施すことにより、長時間加硫を行なった場合の
接合力向上に著しく効果的であることが認められる。 As can be seen from the results in Table 2, the adhesive strength and the adhesive performance of the partial cobalt oxides without heat treatment (Comparative Examples 1 to 3) are inferior. On the other hand, according to the present invention (Examples 1 to 3)
Is excellent in adhesive strength and adhesive performance, and it is recognized that heat treatment of the partially cobalt oxide thin film is remarkably effective in improving bonding strength when vulcanization is performed for a long time.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭62−189117(JP,A) 特開 昭62−87310(JP,A) (58)調査した分野(Int.Cl.6,DB名) C08J 5/00 - 5/02 C08J 5/12 - 5/22 C09J 5/00 B32B 1/00 - 35/00 ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-62-189117 (JP, A) JP-A-62-87310 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) C08J 5/00-5/02 C08J 5/12-5/22 C09J 5/00 B32B 1/00-35/00
Claims (1)
ト金属薄膜を形成した後、該薄膜に熱処理を施し、次い
で該薄膜上にゴム層を加硫形成することを特徴とするゴ
ムの接合方法。1. A method of bonding rubber, comprising forming a cobalt metal thin film containing cobalt oxide on a surface of a substrate, subjecting the thin film to heat treatment, and then vulcanizing and forming a rubber layer on the thin film. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11471990A JP2884699B2 (en) | 1989-11-07 | 1990-04-27 | Rubber joining method |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1-290342 | 1989-11-07 | ||
| JP29034289 | 1989-11-07 | ||
| JP11471990A JP2884699B2 (en) | 1989-11-07 | 1990-04-27 | Rubber joining method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03220241A JPH03220241A (en) | 1991-09-27 |
| JP2884699B2 true JP2884699B2 (en) | 1999-04-19 |
Family
ID=26453402
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11471990A Expired - Fee Related JP2884699B2 (en) | 1989-11-07 | 1990-04-27 | Rubber joining method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2884699B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6468401B1 (en) * | 1995-04-24 | 2002-10-22 | Bridgestone Corporation | Formation of metal compound thin film and preparation of rubber composite material |
| JP3582557B2 (en) * | 1997-04-15 | 2004-10-27 | 株式会社ブリヂストン | Method for producing rubber-based composite material |
| JP3555643B2 (en) | 1997-04-15 | 2004-08-18 | 株式会社ブリヂストン | Method for producing rubber-based composite material and method for designing rubber-based composite material |
| JP4841732B2 (en) * | 2001-01-26 | 2011-12-21 | 株式会社ブリヂストン | Rubber composite material and rubber article using the same |
| JP5219904B2 (en) * | 2009-04-06 | 2013-06-26 | キヤノン株式会社 | Elastic roller and manufacturing method thereof |
-
1990
- 1990-04-27 JP JP11471990A patent/JP2884699B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03220241A (en) | 1991-09-27 |
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