JP2892602B2 - Plating method and barrel device for plating - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for electroplating electronic parts such as resistors and capacitors, and a plating barrel apparatus.

[0002]

2. Description of the Related Art As is well known, a barrel device includes a plurality of electronic components (resistors, capacitors, etc.) in a barrel (rotating container).
, And electroplating all parts at once. The barrel has many holes, and the barrel is immersed in a plating solution, and plated while rotating.

FIG. 7 shows a general barrel device. The barrel device 50 includes a barrel 51 having a hexagonal prism shape and a barrel 5.
6, a net 52 made of plastic disposed on each surface, five press plates 53 for pressing the net 52 against each surface of the barrel 51, and a function as a press plate, which can be removed or opened and closed. A flexible lid 54 and a net receiving plate 55 for holding each net 52 at each ridge line (corner) R of the barrel 51 are provided.

[0004] Although not specifically shown in FIG.
Has a large number of holes, and the holding plate 53 also has a rectangular slit 53.
have a. Also, the barrel 5 is provided on both end surfaces thereof.
A hole 5 is provided in a portion through which a rotation axis (not shown) when the 1 rotates.
1a is drilled. When electroplating a work (electronic component) using such a barrel device 50, for example, a work 60 and a dummy (steel shot) 61 are put into a barrel 51 as shown in FIG. In this state, plating is performed on the surface of the work 60 while rotating the barrel 51 in one direction (the direction of the arrow in FIG. 8).

[0005]

When electroplating is performed using the above-described barrel device 50, as shown in FIG. 8, the work 60 and the dummy 61 in the barrel 51 are
Each of them does not flow much in the state of being separated into layers, and the stirring state is very poor. If the growth of the plating film on the work 60 and the dummy 61 proceeds while the stirring state is poor, the work 60 and the dummy 61 are stuck to each other and a lump is easily generated. Work 60 in this lump
Is rejected as a defective product, so that the production yield is considerably reduced. In particular, such clumps are likely to occur at each ridgeline portion in the barrel 51.

Further, in the barrel, each workpiece 60
Therefore, it is difficult to uniformly apply the plating to all the works 60 in the barrel 51, and the plating film thickness is reduced.
It depends on you. Therefore, Japanese Patent Application Laid-Open No. Hei 3-5309
By disposing the shaved plates attached and fixed at equal intervals on the ridgeline of the inner peripheral surface of the barrel as described in Japanese Patent Publication No. 7, the input material in the barrel is uniformly agitated, and the plating film thickness varies. Has been proposed.

However, in this apparatus, since the squid is fixedly mounted on the inner peripheral surface of the barrel, the input material located at the base of the squid with the peripheral surface of the barrel is stirred near the center of the barrel. It is difficult to stir because it is pushed in and clogged by the input material. And this shaved board is
Since it is attached to the ridge of the inner peripheral surface of the barrel where the lump of input material is most likely to occur, it was not possible to eliminate the occurrence of lump between the work and the dummy.

[0008] As described above, when plating a workpiece using a barrel device, a small amount of the inner peripheral surface of the barrel is typified by the root portion of the shaved plate with the peripheral surface of the barrel as described above. However, if there is an uneven portion, a lump between the work and the dummy is generated at that portion. There is a strong demand for improving the production yield by reducing the defects caused by such clumps as much as possible.

Moreover, such a lump is formed by the barrel 5
1 may be stuck inside, so that a process of removing the workpiece 60 from the barrel after the plating process is required, which is very poor in maintainability. In addition, as the removal process is repeated, the life of the barrel 51 itself is likely to be shortened, and there is a problem that the cost is increased, for example, the device needs to be replaced frequently.

The present invention has been conceived under the above-mentioned circumstances, and provides a plating method and a plating method capable of improving a stirring state in a barrel and suppressing variations in plating and sticking of a work. To provide a barrel device.

[0011]

The present inventors have found the following technology to achieve the above object. "A stir plate is provided separately from the peripheral surface of the barrel provided in the barrel, and the stir plate is formed such that a side end of a cross section perpendicular to the longitudinal direction has a vertex angle, and the barrel is rotated. Thus, the plating method is characterized in that plating is performed while stirring the input material using a stirring plate. "The present inventor has found the following apparatus.

[0012] A plating barrel device comprising: a polygonal column-shaped barrel; and a stirring plate provided in the barrel and separated from a peripheral surface of the barrel, wherein the stirring plate has a cross section perpendicular to the longitudinal direction. A barrel device for plating, characterized in that the side end is formed to have a vertex shape. "

[0013]

According to such a method and apparatus, the apex portion pushes up the input material when the stirring plate moves under the input material by forming the side end portion of the agitator plate into a vertex shape. Without this, the input material can be smoothly dropped obliquely downward along the end face of the apex corner, and the floating of the input material in the barrel is reduced.

Therefore, the charge in the barrel is uniformly stirred and
As a result, the dispersion of plating and the sticking of the work are greatly reduced. When a plurality of the stirring plates of the present invention are provided at a predetermined angle around the center axis of the barrel, the above-described good stirring state can be obtained a plurality of times during one rotation of the barrel.

Further, when the stirring plate of the present invention is provided along the longitudinal direction of the barrel so as to reach both inner end surfaces of the barrel, the input material is favorably stirred over substantially the entire region in the longitudinal direction of the barrel. be able to. In addition, when the stirrer plate of the present invention is provided so that a regular polygonal prism is formed in the barrel by the planes on which the respective stirrer plates are present, the input material pressed obliquely downward along the pressing surface of the stirrer plate The avalanche easily falls, and the stirring state is further improved.

Further, when the stirring plate of the present invention is provided on a plane passing through or near the ridge line of the barrel and in a direction substantially perpendicular to the peripheral surface of the barrel, the stirring plate is charged near the ridge line portion in the barrel. The material can be stirred even better.

[0017]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of the plating method and the barrel apparatus for plating according to the present invention will be described, but the present invention is not limited thereto. As shown in FIG. 1, the barrel device includes a hollow hexagonal column-shaped barrel 1 and three stirring plates 10 provided inside the barrel 1.

These agitating plates 10 are provided so as to extend in the same direction along the longitudinal direction of the barrel 1, and on a plane including one ridge line R on both sides of one ridge line (corner) R of the barrel 1. The barrel 1 is provided at a predetermined angle about the longitudinal center axis M of the barrel 1 so as to be oriented substantially perpendicular to the inner peripheral surface of the barrel 1. In short, the stirring plate 10 is not formed on a plane including the central axis M of the barrel 1 but exists on a plane different from this plane.

Each agitating plate 10 is provided so as to be spaced from the peripheral surface of the barrel 1.
mm. Further, as is clear from FIGS. 2 (a) and 2 (b), the stirring plate 10 has a main body 10A and a vertex at both ends of the main body 10A in a cross-sectional shape perpendicular to the longitudinal direction. The main body 10A has a main surface 10a and a back surface 10b, and each of the vertex corners 10B and 10C has a pair of end surfaces 1B and 10C.
0c, 10d; 10e, 10f, and has a hexagonal shape as a whole.

The stirring plate 10 is provided so as to reach both inner end surfaces 11 and 12 of the barrel 1. Specifically, both ends thereof are connected and fixed to both inner end surfaces 11 and 12. The length a in the direction is substantially equal to the length in the longitudinal direction of the barrel 1, and the thickness b of the main body 10A is about 10 mm in this embodiment. In this embodiment, the net 2 provided around the barrel 1 is a single net, and has a large number of holes 2a. The net 2 corresponds to up to five of the six surfaces of the barrel 1, and a lid (not shown) is arranged on the remaining one surface where the net 2 is not provided. By using only one net 2, it is possible not only to increase the opening ratio of the hole 2a and effectively eliminate the catch of the work,
The net receiving plate (see reference numeral 55 in FIG. 7) becomes unnecessary, and the structure is simplified.

Further, rod-shaped rotating shafts 15 and 16 are inserted into substantially center portions of both end surfaces 11 and 12 of the barrel 1, and the barrel 1 is provided rotatably around these rotating shafts 15 and 16. ing. In addition, these rotating shafts 1
5 and 16 are disposed so as to face each other in the barrel 1 while being separated from each other (these rotation axes do not always coincide with the center axis of the barrel).

FIG. 4 shows a stirring state when plating is performed using such an apparatus. First, a workpiece 20, a ceramic ball 21, and a dummy (steel shot) 22 are charged into the barrel 1, and the barrel 1 is immersed in a plating solution. Next, when the barrel 1 rotates around the rotation shafts 15 and 16, the work 20, the ceramic balls 21, and the dummy 22 are stirred and mixed.
Since the stirring plate 10 is separated from the peripheral surface of the barrel 1 and is provided on a plane different from the plane including the central axis M of the barrel 1, the input material can be stirred as follows.

That is, with the rotation of the barrel 1, the stirring plate 10 rotates while pressing the input material on the surface facing the rotation direction. At this time, there is a gap between the stirring plate 10 and the peripheral surface of the barrel 1, so that the input material is stirred while passing through the gap, and is stirred in a very good state. The occurrence of clumps is greatly reduced.

Further, the stirring plate 10 allows the input material to pass through the gap with the peripheral surface of the barrel 1 while pressing the input material that does not pass through the gap toward the upper layer of the input material in the barrel 1. Push up. At this time, the stirring plate 10 is inclined such that the main surface 10A pressing the input material is directed downward inside the barrel 1 with the rotation of the barrel 1, so that the input material pressed by the stirring plate 10 is subjected to the stirring. Main surface 1 of plate 10
Because it will fall avalanche downward along 0A,
Lifting of the input material in the barrel 1 is considerably reduced. In addition, the avalanche input material mixes with the input material that passes through the gap portion and wraps around the back surface 10B side of the stirring plate 10, thereby being further stirred well.

Further, the agitating plate 10 is formed with apex corners 10B and 10C at both end portions thereof, so that the agitating plate 10 can move as the barrel 1 rotates under the charged material as the barrel 1 rotates. , Dive into the input with the apex 10B (or 10C) at the top, and the input is the end face 10c or 10d.
(Or 10e or 10f) so that the avalanche falls obliquely downward, so that the floating of the input material in the barrel 1 is considerably reduced.

That is, when the cross section perpendicular to the longitudinal direction is not a hexagon having a vertex as in the present embodiment, for example, when a stirring plate having a flat side end instead of a vertex is used, When the stir plate sneaks between the inputs, this flat side end pushes up the input, and the input thus pushed up tends to become a lump, and when plating growth proceeds in this state, Variations occur in the conduction state during the growth of the plating film, causing unevenness in the plating film thickness.

Therefore, as described above, by providing the apex corners at both end portions of the stirring plate, the apex portion does not push up the input material when the agitating plate dive into the input material.
The input material can be smoothly dropped obliquely downward along the end face of the apex, and this can contribute to uniform plating film thickness. In addition, since a plurality of the stirring plates are provided at a predetermined angle around the center axis M of the barrel 1, the above-described good stirring state can be obtained a plurality of times while the barrel 1 makes one rotation. it can.

Further, since the agitating plate is provided along the longitudinal direction of the barrel so as to reach both inner end surfaces of the barrel, the agitating material is satisfactorily agitated over substantially the entire region in the longitudinal direction of the barrel. be able to. In addition, the stirring plate is
When provided so that a regular polygonal prism is formed in the barrel by the plane in which each exists, the input material pressed against this is likely to fall avalanche diagonally downward along the pressing surface of the stirring plate, The stirring condition becomes even better.

Further, since the agitating plate is provided on a plane passing through or near the ridge line of the barrel and in a direction substantially perpendicular to the peripheral surface of the barrel, the stirring plate is placed near the ridge line portion in the barrel. The material can be stirred even better.
As described above, when the plating method of the present invention is used, the input material in the barrel is substantially uniformly stirred and mixed, and the dispersion of plating,
Work sticking will be greatly reduced.

Next, the results obtained by using the plating method and apparatus of the present invention will be described with reference to differences from comparative examples. FIG.
The distribution of the plating film thickness (μm) and the standard deviation σ when the workpiece is plated with Ni by using the method of the present invention and the conventional method. The numbers in the figure are average values,
000, XX0, etc. represent resistance values, and 000 is 0Ω, XX
0 is 10Ω, XX1 is 100Ω, XX2 is 1kΩ, XX
3 indicates 10 kΩ and XX4 indicates 100 kΩ. From FIG. 5, it can be seen that the barrel apparatus of the present invention has smaller plating variations.

FIG. 6 shows the plating film thickness (μm) and the standard deviation σ of Examples 1 to 6 and Comparative Examples 1 to 6 when Sn / Pb plating was similarly applied. Again, the variability in plating has been significantly reduced. In the present embodiment, the stirring plate is in a state of being separated from the peripheral surface of the barrel by about 12 mm. However, the present invention is not limited to this. It is preferable that the width is smaller than twice the maximum width dimension of the workpiece. If such a spacing dimension is provided, the work is less likely to be clogged in this gap, and a good stirring state can be maintained.

In the present invention, the term "barrel ridge" refers to a line segment including a vertex of a portion forming a vertex on the barrel peripheral surface, that is, a corner line. In addition, the central axis in the longitudinal direction of the barrel in the present invention refers to a line segment passing through each center point on both end surfaces of the barrel. Further, in this embodiment, a hexagonal column-shaped barrel is used, but the present invention is not limited to this, and the present invention is also applicable to an octagonal column-shaped barrel.

[0033]

As described above, according to the plating method of the present invention, the agitating plate provided in the barrel is formed to have a vertex at the side end, and the agitating plate is rotated by rotating the barrel. When submerging, the apex does not push up the input,
Since the input material smoothly drops obliquely downward along the end surface of the apex, the input material (work, dummy, etc.) can be stirred more uniformly in a lump without individually floating in the barrel. Since the occurrence of clumps due to sticking between the workpieces and the workpiece and the dummy in the barrel is reduced, variations in plating film thickness are reduced,
A highly reliable plated product can be obtained.

Further, in the plating barrel apparatus of the present invention, since the input material can be satisfactorily stirred in the barrel, plating can be performed efficiently. Moreover, since the above-mentioned lump is hardly generated,
In addition to requiring little work such as removal of the lump and excellent in maintainability, there is also an effect that the life of the barrel itself is greatly extended.

[Brief description of the drawings]

FIG. 1 is a perspective view showing a barrel in a barrel device of the present invention.

FIG. 2 is a plan view and a side view of a stirring plate provided inside the barrel shown in FIG.

FIG. 3 is a perspective view showing a state in which a net is provided around a barrel.

FIG. 4 is a vertical cross-sectional view showing a state when a charge in a barrel is stirred using the plating apparatus of the present invention.

FIG. 5 is a diagram showing a relationship between a plating film thickness and a standard deviation when Ni plating is performed using the present invention and a conventional plating apparatus.

FIG. 6 shows the results of the Sn / Sn method using the present invention and the conventional plating apparatus.
It is a figure which shows the relationship between the plating film thickness at the time of plating when performing Pb plating, and a standard deviation.

FIG. 7 is a partially omitted perspective view of a plating apparatus according to a conventional example.

FIG. 8 is a cross-sectional view showing a state in which an input material in a barrel is agitated using the plating apparatus shown in FIG. 7;

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Barrel 2 hole 3 Net 10 Stir plate 11 and 12 Bottom of barrel 15 and 16 Rotation axis 20 Work 21 Ceramic ball 22 Dummy M Center axis of barrel R Ridge of barrel

Claims (8)

(57) [Claims] 1. A stirring plate is provided at a distance from a peripheral surface of the barrel provided in the barrel, and the stirring plate is formed so that a side end portion of a cross section perpendicular to a longitudinal direction has a vertex angle. A plating method characterized in that plating is performed while rotating a barrel to stir an input material using a stirring plate. 2. The plating method according to claim 1, wherein the stirring plate is provided on a plane different from a plane including a central axis in a longitudinal direction of the barrel. 3. The plating method according to claim 1, wherein a plurality of agitating plates provided at a predetermined angle from each other about a center axis of the barrel are used to perform plating while agitating the input material. Plating method. 4. The method according to claim 1, wherein the plurality of agitating plates are provided such that a regular polygonal prism is formed in the barrel by the planes on which the plurality of agitating plates are present, and the agitating plate is used to perform plating while agitating the input material. The plating method according to claim 3, wherein 5. The plating while agitating the charge using the stirring plate provided along the longitudinal direction of the barrel so as to reach both inner end surfaces of the barrel. Item 6. The plating method according to any one of Items 4 to 10. 6. A plating barrel device comprising: a polygonal column-shaped barrel; and a stirring plate provided in the barrel and separated from a peripheral surface of the barrel, wherein the stirring plate has a cross section perpendicular to a longitudinal direction. Characterized in that a side end of the plating barrel is formed to have a vertex angle. 7. The plating barrel device according to claim 6, wherein the stirring plate is provided on a plane different from a plane including a central axis in a longitudinal direction of the barrel. 8. The stirring plate is provided in a longitudinal direction of the barrel.
Provided on a plane including the ridge line near the neighboring across a certain one ridge, claim 6 or 7, characterized in that it is provided a plurality spaced a predetermined angle about a longitudinal central axis of the barrel The barrel device for plating according to 1.