JP2897202B2 - Barrel polishing equipment - Google Patents
Barrel polishing equipmentInfo
- Publication number
- JP2897202B2 JP2897202B2 JP4343095A JP4343095A JP2897202B2 JP 2897202 B2 JP2897202 B2 JP 2897202B2 JP 4343095 A JP4343095 A JP 4343095A JP 4343095 A JP4343095 A JP 4343095A JP 2897202 B2 JP2897202 B2 JP 2897202B2
- Authority
- JP
- Japan
- Prior art keywords
- barrel
- polishing
- drum
- curved surface
- spherical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000005498 polishing Methods 0.000 title claims description 68
- 238000000034 method Methods 0.000 description 7
- 239000010453 quartz Substances 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000010586 diagram Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は水晶板、圧電セラミック
板等においてコンベックス加工等の面取り加工を行う場
合において用いるバレル研磨装置に関するものであり、
さらに詳しくはバレルの曲面を用いて面取り加工を行う
バレル研磨装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a barrel polishing apparatus used for chamfering a quartz plate, a piezoelectric ceramic plate, etc., such as a convex process.
More specifically, the present invention relates to a barrel polishing apparatus that performs chamfering using a curved surface of a barrel.
【0002】[0002]
【従来の技術】水晶板、圧電セラミック板等の圧電振動
板は通信機器等の周波数制御、あるいはコンピュータ等
のクロック源として幅広く用いられている。例えば、比
較的高い周波数に対応したATカット水晶板は、厚みす
べり系の振動モードを用いることが多い。しかし、この
振動モードの周波数の近辺に輪郭系振動モード等の不要
な振動モード等も存在し、これらがスプリアスとして所
望の振動モード(周波数)に悪影響を及ぼし、周波数変
動の原因等になっていた。このようなスプリアス抑制の
対策の一つとして圧電振動板の周囲の面取りを行うこと
が考えられており、このような加工装置として、例えば
実開昭60−97247号に示すようにバレルの内壁が
全面にわたって曲面を持つバレル研磨装置が開示されて
いる。ここに開示されている研磨装置により、圧電振動
板はコンベックス加工、あるいはベベル加工され、かつ
圧電振動板のフラット部分を多くとることができるので
電気的特性の安定した圧電振動板を得ることができる。
図6はこのような従来のバレル研磨装置の一例を示した
模式図である。ドラムDAは円柱形状でドラム軸G1,
G1がその両端に接続されており、ドラムDAの内部に
は外部、内部とも球状の球状バレルDC,DCが複数個
設置されている。この球状バレルDC,DCの中に被研
磨物である圧電振動板と研磨材を所定量投入し、所定の
時間、所定の回転数でドラム軸を中心に回転させること
により、球状バレルの内壁の曲率に応じた曲面が圧電振
動板に転写され面取り加工がなされる。すなわち、図7
(a)に示す圧電振動板1が、このようなバレル研磨加
工を行うことにより、図7(b)に示すようにコンベッ
クス面11を有する面取り加工されたフラット部分の多
い圧電振動板を得ることができる。なお、通常は図1に
示すように外装ドラムに前記ドラムを複数個取り付け、
一度に多数個の圧電振動板の加工が行えるようになって
いる。2. Description of the Related Art Piezoelectric vibrating plates such as quartz plates and piezoelectric ceramic plates are widely used as frequency sources for communication devices or clock sources for computers and the like. For example, an AT-cut quartz plate corresponding to a relatively high frequency often uses a thickness-shear vibration mode. However, unnecessary vibration modes such as a contour vibration mode also exist near the frequency of the vibration mode, and these spuriously affect the desired vibration mode (frequency) and cause frequency fluctuation. . As one of the countermeasures for such spurious suppression, it has been considered to perform chamfering around the piezoelectric vibrating plate. As such a processing apparatus, for example, as shown in Japanese Utility Model Application Laid-Open No. 60-97247, the inner wall of a barrel is required. A barrel polishing apparatus having a curved surface over the entire surface is disclosed. With the polishing apparatus disclosed herein, the piezoelectric vibrating plate is subjected to convex processing or bevel processing, and a large flat portion of the piezoelectric vibrating plate can be obtained, so that a piezoelectric vibrating plate having stable electric characteristics can be obtained. .
FIG. 6 is a schematic view showing an example of such a conventional barrel polishing apparatus. The drum DA has a cylindrical shape and a drum shaft G1,
G1 is connected to both ends thereof, and inside the drum DA, a plurality of spherical barrels DC, DC having a spherical shape both inside and outside are provided. A predetermined amount of a piezoelectric vibrating plate and an abrasive to be polished are charged into the spherical barrels DC, DC, and rotated around a drum shaft at a predetermined rotation speed for a predetermined time, thereby forming an inner wall of the spherical barrel. A curved surface corresponding to the curvature is transferred to the piezoelectric diaphragm and chamfering is performed. That is, FIG.
By subjecting the piezoelectric vibration plate 1 shown in FIG. 7A to such barrel polishing, a piezoelectric vibration plate having a convex surface 11 and having many chamfered flat portions as shown in FIG. Can be. Usually, as shown in FIG.
A large number of piezoelectric diaphragms can be processed at one time.
【0003】しかしながら、発明者が図6に示すような
球状バレルを用いたバレル研磨装置の使用後バレル内壁
を観察すると、研磨に寄与している部分(バレル内壁の
圧電振動板と接触している部分)は縦線Lで示す部分に
限定されており、球状バレルのうち回転軸方向の両端は
研磨に寄与していないことが分かった。よって、バレル
の単位体積当たりの処理量が低いという問題点があっ
た。[0003] However, when the inventor observes the inner wall of the barrel after using the barrel polishing apparatus using a spherical barrel as shown in FIG. 6, the portion contributing to polishing (contact with the piezoelectric vibration plate on the inner wall of the barrel). Portion) is limited to the portion indicated by the vertical line L, and it was found that both ends in the rotation axis direction of the spherical barrel did not contribute to polishing. Therefore, there is a problem that the throughput per unit volume of the barrel is low.
【0004】[0004]
【発明が解決しようとする課題】本発明は上記問題点を
解決するためになされたもので、バレル研磨工程におい
て、加工効率を向上させることのできるバレル研磨装置
を提供することを目的とするものである。SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and has as its object to provide a barrel polishing apparatus capable of improving processing efficiency in a barrel polishing step. It is.
【0005】[0005]
【課題を解決するための手段】上記問題点を解決するた
めに、請求項1によるバレル研磨装置は、圧電振動板と
研磨材を曲面を有するバレルに投入し、このバレルを回
転軸を中心に回転させ、前記曲面の曲率に対応した圧電
振動板の面取り加工を行うバレル研磨装置であって、前
記バレルの内壁は主として研磨に寄与する一つの球状曲
面と、当該一つの球状曲面の両側に対向して形成され
た、主として研磨に寄与しない曲面あるいは平面とから
なる構成であることを特徴とするものである。In order to solve the above-mentioned problems, a barrel polishing apparatus according to the first aspect of the present invention supplies a piezoelectric vibrating plate and an abrasive to a barrel having a curved surface, and places the barrel around a rotating shaft. A barrel polishing apparatus for rotating and chamfering a piezoelectric vibrating plate corresponding to the curvature of the curved surface, wherein an inner wall of the barrel faces one spherical curved surface mainly contributing to polishing and both sides of the one spherical curved surface. And a curved surface or a flat surface that does not mainly contribute to polishing.
【0006】また、請求項2によるバレル研磨装置は、
前記バレルの内壁が主として研磨に寄与する一つの球状
曲面と、当該一つの球状曲面の両側に対向して形成され
た、主として研磨に寄与しない曲面あるいは平面とから
なる構成のバレルを、ドラム内に複数並べて配置し、こ
のドラムをその回転軸を中心に回転させることにより、
前記球状曲面の曲率に対応した圧電振動板の面取り加工
を行うことを特徴とするものである。A barrel polishing apparatus according to claim 2 is
A barrel having an inner wall of the barrel mainly contributing to polishing, and a barrel having a curved surface or a flat surface formed on both sides of the one spherical curved surface and mainly not contributing to polishing, in the drum. By arranging multiple drums side by side and rotating this drum around its rotation axis,
The method is characterized in that chamfering of the piezoelectric diaphragm corresponding to the curvature of the spherical curved surface is performed.
【0007】また、請求項3によるバレル研磨装置は、
請求項1または請求項2記載のバレル研磨装置におい
て、前記バレルまたは前記ドラムの回転軸を水平軸に対
して5度から20度傾けて設置したことを特徴とするも
のである。Further, a barrel polishing apparatus according to claim 3 is
3. The barrel polishing apparatus according to claim 1, wherein a rotation axis of the barrel or the drum is inclined at 5 to 20 degrees with respect to a horizontal axis.
【0008】[0008]
【作用】前述のとおり、図6に示すような球状バレルを
用いたバレル研磨装置では、研磨に寄与している部分
(バレル内壁の圧電振動板と接触している部分)は縦線
Lで示す部分に限定されており、球状バレルのうち回転
軸方向の両端は研磨に寄与していない。請求項1のよう
に、バレル内壁の形状を主として研磨に寄与する一つの
球状曲面と、当該一つの球状曲面の両側に対向して形成
された、主として研磨に寄与しない曲面あるいは平面と
からなる構成形状とすることにより、従来の球状バレル
を用いた場合の利点である、圧電振動板の8つの各角は
コンベックス加工され、かつ圧電振動板のフラット部分
を多くとることができる。また、球状バレルのように回
転軸方向に突出した部分がないので、バレルの体積を小
さくすることができ、全体として一度の圧電振動板の処
理量を多くすることができる。As described above, in the barrel polishing apparatus using a spherical barrel as shown in FIG. 6, a portion contributing to polishing (a portion of the inner wall of the barrel that is in contact with the piezoelectric vibration plate) is indicated by a vertical line L. It is limited to a portion, and both ends of the spherical barrel in the rotation axis direction do not contribute to polishing. As described in claim 1, a configuration in which the shape of the barrel inner wall mainly comprises one spherical curved surface which mainly contributes to polishing, and a curved surface or a flat surface formed on both sides of the one spherical curved surface so as not to mainly contribute to polishing. By adopting the shape, each of the eight corners of the piezoelectric vibrating plate can be convex-processed, which is an advantage when a conventional spherical barrel is used, and more flat portions of the piezoelectric vibrating plate can be obtained. Further, since there is no portion that protrudes in the direction of the rotation axis as in the case of a spherical barrel, the volume of the barrel can be reduced, and the throughput of a single piezoelectric vibration plate as a whole can be increased.
【0009】請求項2により、前記請求項1記載の構成
形状のバレルを複数並べてドラム内に配置し、このドラ
ムの回転軸を中心に回転させバレル研磨加工を行うの
で、ドラム内に収納するバレルの数を増やすことがで
き、全体として一度の圧電振動板の処理量を多くするこ
とができる。According to a second aspect of the present invention, a plurality of barrels each having the configuration described in the first aspect are arranged in a drum, and the barrel is polished by rotating the drum about a rotation axis thereof. Can be increased, and the processing amount of the piezoelectric vibrating plate at one time can be increased as a whole.
【0010】請求項3により、請求項1または請求項2
に記載の前記バレルあるいは前記ドラムを水平軸に対し
て5度から20度傾けて設置したことにより、被研磨物
である圧電振動板の研磨面が反転し易くなり、面取り加
工が均一になる。なお、この傾ける角度は、実験による
と水平軸に対して5度程度から反転作用により面取り加
工の均一化される効果が顕著になり、20度以上になる
と被研磨物並びに研磨材が一部(下部)に偏りすぎ、全
体としての研磨効率が低下することが確かめられた。According to claim 3, claim 1 or claim 2
By mounting the barrel or the drum at an angle of 5 ° to 20 ° with respect to the horizontal axis, the polished surface of the piezoelectric vibration plate, which is the object to be polished, is easily inverted, and the chamfering process becomes uniform. According to experiments, the angle of inclination is about 5 degrees with respect to the horizontal axis, and the effect of making the chamfering process uniform by reversing action becomes remarkable. It was confirmed that the polishing efficiency was too low and the overall polishing efficiency was lowered.
【0011】[0011]
【実施例】第1の実施例 本発明による実施例を、遠心バレル研磨装置を例にと
り、図面とともに説明する。図1は本発明の第1の実施
例による遠心バレル研磨装置の一部を示す模式的内部断
面図であり、図2は図1の一部を構成するドラム内を示
す模式的内部断面図、図3はバレル単体の斜視図であ
る。DESCRIPTION OF THE PREFERRED EMBODIMENTS First Embodiment An embodiment according to the present invention will be described with reference to the drawings, taking a centrifugal barrel polishing apparatus as an example. FIG. 1 is a schematic internal sectional view showing a part of a centrifugal barrel polishing apparatus according to a first embodiment of the present invention, FIG. 2 is a schematic internal sectional view showing the inside of a drum constituting a part of FIG. FIG. 3 is a perspective view of the barrel alone.
【0012】遠心バレル研磨装置は、主回転軸Gを軸と
して高速回転を行う筒状の外装ドラムDと、外装ドラム
Dの所定の位置に設けられたドラム軸G1,G2,G
3,G4を軸として回転を行う、筒状のドラムD1,D
2,D3,D4とを具備してなり、各ドラムはその回転
軸が水平方向に対して約14度傾いて設置されている。
これら各ドラム内には、タイコ形状のバレルB1,B
2,B3が、斜めに傾けて収納設置されている。タイコ
形状のバレルB1,B2,B3は図3に示すように、主
として研磨に寄与する一部球状曲面Baと、主として研
磨に寄与しない平面Bbとからなる。The centrifugal barrel polishing apparatus includes a cylindrical outer drum D that rotates at high speed about a main rotation axis G, and drum shafts G1, G2, and G provided at predetermined positions on the outer drum D.
Cylindrical drums D1 and D rotating about G3 and G4
2, D3, and D4, and each drum is installed with its rotation axis inclined at about 14 degrees with respect to the horizontal direction.
Inside each of these drums, there are barrels B1, B of a Tyco shape.
2, B3 are stored and installed obliquely. As shown in FIG. 3, each of the barrels B1, B2, and B3 has a partially spherical curved surface Ba that mainly contributes to polishing and a plane Bb that does not mainly contribute to polishing.
【0013】図2に示すように、所定数量の矩形形状の
圧電振動板1と研磨材Cを投入した(一部のみに記載)
バレルB1,B2,B3を収納設置したドラムD1,D
2,D3,D4を外装ドラムDに設置し、この外装ドラ
ムDを図1に示すように矢印A1方向に高速回転させ
る。これにより各ドラムは遊星回転を行い、矢印A2方
向に自転するとともに、各ドラムに設置されたタイコ形
バレル内の圧電振動板1と研磨材Cが遠心力の作用によ
ってバレルの内壁に押しつけられる。これにより圧電振
動板1は研磨材Cによりバレルの内壁の曲率に対応し
て、その8つの角が研磨される。外装ドラムの回転方向
を反転させることにより、圧電振動板の研磨面を反転さ
せる機会を設け、面取り加工を均一にすることができ
る。また、この実施例では各ドラムはその回転軸が水平
方向に対して約14度傾いて設置されており、これによ
り圧電振動板の研磨面が反転し易くなり、面取り加工を
より均一にすることができる。As shown in FIG. 2, a predetermined number of rectangular-shaped piezoelectric vibrating plates 1 and an abrasive C are charged (only a part is shown).
Drums D1, D containing barrels B1, B2, B3
2, D3 and D4 are installed on the exterior drum D, and this exterior drum D is rotated at high speed in the direction of arrow A1 as shown in FIG. As a result, each drum performs planetary rotation, rotates in the direction of arrow A2, and the piezoelectric vibrating plate 1 and the abrasive C in the Tyco-shaped barrel installed on each drum are pressed against the inner wall of the barrel by the action of centrifugal force. As a result, the piezoelectric vibrating plate 1 is polished at its eight corners by the abrasive C in accordance with the curvature of the inner wall of the barrel. By inverting the rotation direction of the exterior drum, an opportunity to invert the polished surface of the piezoelectric vibrating plate is provided, and the chamfering process can be made uniform. Further, in this embodiment, each drum is installed with its rotation axis inclined at about 14 degrees with respect to the horizontal direction, whereby the polished surface of the piezoelectric vibrating plate is easily inverted and the chamfering process is made more uniform. Can be.
【0014】第2の実施例 本発明による実施例を、遠心バレル研磨装置を例にと
り、図面とともに説明する。図4は本発明の第2の実施
例のドラム内を示す模式的内部断面図である。なお、第
1の実施例と同じ構成部分はその説明を省略する。ドラ
ムD1内には、バレルE1,E2,E3が、直立して収
納設置されている。各バレルは、主として研磨に寄与す
る一部球状曲面Eaと、主として研磨に寄与しない低曲
面Ebとからなる。第1の実施例と同じように、所定量
の圧電振動板1と研磨材Cを投入したバレルを収納設置
したドラムを外装ドラムに設置し、この外装ドラムを図
1に示すように矢印A1方向に高速回転させる。これに
より各ドラムは遊星回転を行い、矢印A2方向に自転す
るとともに、各ドラムに設置されたタイコ形バレル内の
圧電振動板1と研磨材Cが遠心力の作用によってバレル
の内壁に押しつけられ、滑動させられる。これにより圧
電振動板1は研磨材Cによりバレルの内壁の曲率に対応
して、その8つの角が研磨される。なお、第1の実施例
と同じく、外装ドラムの回転方向を反転させることによ
り、面取り加工を均一にすることができる。Second Embodiment An embodiment according to the present invention will be described with reference to the drawings, taking a centrifugal barrel polishing apparatus as an example. FIG. 4 is a schematic internal sectional view showing the inside of the drum according to the second embodiment of the present invention. The description of the same components as those of the first embodiment is omitted. In the drum D1, barrels E1, E2, E3 are stored and installed upright. Each barrel is composed of a partially spherical curved surface Ea mainly contributing to polishing and a low curved surface Eb mainly not contributing to polishing. As in the first embodiment, a drum containing a predetermined amount of the piezoelectric vibrating plate 1 and a barrel in which the abrasive C is charged is installed on the outer drum, and the outer drum is moved in the direction of arrow A1 as shown in FIG. Rotate at high speed. As a result, each drum performs planetary rotation, rotates in the direction of arrow A2, and the piezoelectric vibrating plate 1 and the abrasive C in the Tyco-shaped barrel installed on each drum are pressed against the inner wall of the barrel by the action of centrifugal force. Be slid. As a result, the piezoelectric vibrating plate 1 is polished at its eight corners by the abrasive C in accordance with the curvature of the inner wall of the barrel. Incidentally, as in the first embodiment, the chamfering can be made uniform by reversing the rotation direction of the exterior drum.
【0015】第3の実施例 本発明による実施例を、遠心バレル研磨装置を例にと
り、図面とともに説明する。図5は本発明の第3の実施
例のドラム内を示す模式的内部断面図である。ドラムD
1内には、バレルF1,F2,F3が、斜めに傾けて収
納設置されている。各バレルは、主として研磨に寄与す
る一部球状曲面Faと、主として研磨に寄与しない曲面
Fbとからなり、全体としてその断面が略ヒョウタン形
を有している。なお、第2,第3の実施例において、回
転軸を水平から5度ないし20度傾けて回転させる構成
をとることも可能である。Third Embodiment An embodiment according to the present invention will be described with reference to the drawings, taking a centrifugal barrel polishing apparatus as an example. FIG. 5 is a schematic internal sectional view showing the inside of the drum according to the third embodiment of the present invention. Drum D
Inside 1, barrels F1, F2, and F3 are stored and installed obliquely. Each barrel is composed of a partially spherical curved surface Fa mainly contributing to polishing and a curved surface Fb mainly not contributing to polishing, and has a substantially gourd-shaped cross section as a whole. In the second and third embodiments, it is also possible to adopt a configuration in which the rotation axis is rotated at an angle of 5 to 20 degrees from the horizontal.
【0016】次に本発明によるバレル研磨装置と従来品
のそれによる研磨効率を示す実験データを示す。従来品
として、曲率半径R=65mmの球状バレルを所定のドラ
ムに2個搭載し、このドラムを水平軸から約14度傾け
て設置したもの、本発明品1として、曲率半径R=65
mmの球状バレルの回転軸方向両端をそれぞれ25mmづつ
切除した、第1の実施例に示すようなタイコ形状のバレ
ルを同じドラムに3個搭載し、このドラムを水平軸から
約14度傾けて設置したもの、そして本発明品2として
本発明品1と同じ構成のバレル、ドラムの構成でドラム
を傾けず設置したものを用いた。これら各ドラムを図1
に示すように複数個外装ドラムに設置した構成の遠心バ
レル研磨装置を用いて、遠心バレル研磨を行った。それ
ぞれのバレルには長辺8.0mm、短辺2.0mm、厚さ
0.47mmの矩形水晶板を1,000枚と、研磨材とし
てGC#320の研磨材を20g投入し、所定の面取り
量になる時間を計測した。なお、外装ドラムの回転数は
180/rpm、で10分間隔で回転方向を反転させ
た。実験の結果、従来品によれば、研磨時間が12時間
かかったものが、本発明品1では9時間に、本発明品2
では10時間にそれぞれ短縮された。各本発明品では1
つのドラムに搭載することのできるバレルの数量が従来
の2つから3つに増えたことと相まって、研磨効率が約
1.8倍〜2倍に向上した。また、本発明品1によれ
ば、本発明品2によるものに比較して、表裏両面の研磨
量の均一性が増し、高品質の面取り加工が行われてい
た。なお、研磨時間が短縮された理由は判明していない
が、従来品の球状バレルの場合、研磨に寄与しない回転
軸方向の余分な空間に被研磨物が留まる機会が多く、逆
に本発明品によればそのような状態になる空間が少ない
ので、研磨時間が短縮されたためではないかと考えられ
る。Next, experimental data showing the polishing efficiency of the barrel polishing apparatus according to the present invention and that of the conventional product are shown. As a conventional product, two spherical barrels having a radius of curvature R = 65 mm are mounted on a predetermined drum, and this drum is installed at an angle of about 14 degrees from the horizontal axis.
The same drum as shown in the first embodiment is mounted on three drums each having a 25 mm spherical barrel with both ends in the rotation axis direction cut off by 25 mm, and the drum is installed at an inclination of about 14 degrees from the horizontal axis. As the product 2 of the present invention, a product having the same barrel and drum configuration as the product 1 of the present invention and having the drum installed without tilting was used. Fig. 1 shows each of these drums.
, Centrifugal barrel polishing was performed using a centrifugal barrel polishing apparatus having a plurality of outer drums. To each barrel, 1,000 rectangular quartz plates having a long side of 8.0 mm, a short side of 2.0 mm, and a thickness of 0.47 mm, and a polishing material of GC # 320 as a polishing material of 20 g were added. The amount of time was measured. The rotation direction of the exterior drum was 180 / rpm, and the rotation direction was reversed at 10 minute intervals. As a result of the experiment, the polishing time was 12 hours according to the conventional product, but the polishing time was 12 hours in the product 1 of the present invention, and the polishing time of
In each case, it was reduced to 10 hours. 1 for each invention
The number of barrels that can be mounted on one drum has been increased from two to three in the past, and polishing efficiency has been improved by about 1.8 to 2 times. Further, according to the product 1 of the present invention, compared to the product 2 of the present invention, the uniformity of the polishing amount on both the front and back surfaces was increased, and high-quality chamfering was performed. Although the reason why the polishing time has been shortened is not clear, in the case of the conventional spherical barrel, there are many chances that the object to be polished stays in an extra space in the direction of the rotation axis which does not contribute to the polishing. According to this, it is considered that the polishing time was shortened because the space in which such a state was obtained was small.
【0017】[0017]
【発明の効果】請求項1によれば、主として研磨に寄与
する一部球状曲面により、圧電振動板のコンベックス加
工等の面取り加工がなされ、かつ圧電振動板のフラット
部分を多くとることができるとともに、球状バレルのよ
うに回転軸方向に突出した部分がないので、バレルの体
積を小さくすることができる。よって、全体として一度
の圧電振動板の処理量を多くすることができる。また、
実験データからも明らかなように、研磨効率が向上し、
全体として生産性を向上させることができる。According to the first aspect of the present invention, the partially spherical curved surface mainly contributing to the polishing enables chamfering such as convex processing of the piezoelectric vibrating plate, and can increase the flat portion of the piezoelectric vibrating plate. Since there is no portion protruding in the direction of the rotation axis unlike a spherical barrel, the volume of the barrel can be reduced. Therefore, the processing amount of the piezoelectric vibrating plate at one time can be increased as a whole. Also,
As is clear from the experimental data, the polishing efficiency has been improved,
Productivity can be improved as a whole.
【0018】請求項2によれば、前記請求項1記載の構
成形状のバレルを複数並べてドラム内に配置し、このド
ラムの回転軸を中心に回転させバレル研磨加工を行うの
で、ドラム内に収納するバレルの数を増やすことがで
き、全体として一度の圧電振動板の研磨処理量を多くす
ることができる。According to the second aspect, a plurality of barrels having the configuration described in the first aspect are arranged in a drum, and the barrel is polished by rotating the drum around its rotation axis. The number of barrels to be processed can be increased, and the polishing processing amount of the piezoelectric vibrating plate at one time can be increased as a whole.
【0019】請求項3により、被研磨物である圧電振動
板の研磨面が反転し易くなり、面取り加工が均一にな
る。短時間で高品質の面取り加工がなされた圧電振動板
を得ることができる。According to the third aspect, the polished surface of the piezoelectric vibration plate, which is the object to be polished, is easily inverted, and the chamfering process becomes uniform. A high-quality chamfered piezoelectric vibration plate can be obtained in a short time.
【図1】図1は第1の実施例による遠心バレル研磨装置
の一部を示す模式的内部断面図。FIG. 1 is a schematic internal sectional view showing a part of a centrifugal barrel polishing apparatus according to a first embodiment.
【図2】図2は図1の一部を構成するドラム内を示す模
式的内部断面図。FIG. 2 is a schematic internal sectional view showing the inside of a drum constituting a part of FIG. 1;
【図3】図3はバレル単体の斜視図。FIG. 3 is a perspective view of a barrel alone.
【図4】第2の実施例を示す模式的内部断面図。FIG. 4 is a schematic internal cross-sectional view showing a second embodiment.
【図5】第3の実施例を示す模式的内部断面図。FIG. 5 is a schematic internal cross-sectional view showing a third embodiment.
【図6】従来例を示す図。FIG. 6 is a diagram showing a conventional example.
【図7】(a)はバレル研磨前の水晶板の構成を示す
図、(b)はバレル研磨後の水晶板の構成を示す図。7A is a diagram illustrating a configuration of a quartz plate before barrel polishing, and FIG. 7B is a diagram illustrating a configuration of a quartz plate after barrel polishing.
D 外装ドラム G 回転軸 D1,D2,D3,D4,DA ドラム G1,G2,G3,G4 ドラム回転軸 B1,B2,B3,E1,E2,E3,F1,F2,F
3 バレル DC 球状バレル 1 水晶板(圧電振動板) 11 コンベックス面D Exterior drum G Rotation axis D1, D2, D3, D4, DA drum G1, G2, G3, G4 Drum rotation axis B1, B2, B3, E1, E2, E3, F1, F2, F
3 barrel DC spherical barrel 1 quartz plate (piezoelectric vibration plate) 11 convex surface
Claims (3)
ルに投入し、このバレルを回転軸を中心に回転させ、前
記曲面の曲率に対応した圧電振動板の面取り加工を行う
バレル研磨装置であって、 前記バレルの内壁は主として研磨に寄与する一つの球状
曲面と、当該一つの球状曲面の両側に対向して形成され
た、主として研磨に寄与しない曲面あるいは平面とから
なる構成であることを特徴とするバレル研磨装置。1. A barrel polishing apparatus for feeding a piezoelectric vibrating plate and an abrasive into a barrel having a curved surface, rotating the barrel about a rotation axis, and chamfering the piezoelectric vibrating plate corresponding to the curvature of the curved surface. The inner wall of the barrel is one spherical shape that mainly contributes to polishing
The curved surface is formed to face both sides of the one spherical curved surface.
Further, a barrel polishing apparatus characterized in that the barrel polishing apparatus has a configuration mainly including a curved surface or a flat surface that does not contribute to polishing.
する一つの球状曲面と、当該一つの球状曲面の両側に対
向して形成された、主として研磨に寄与しない曲面ある
いは平面とからなる構成のバレルを、ドラム内に複数並
べて配置し、このドラムをその回転軸を中心に回転させ
ることにより、前記球状曲面の曲率に対応した圧電振動
板の面取り加工を行うことを特徴とするバレル研磨装
置。 2. A spherical surface whose inner wall mainly contributes to polishing and a pair of spherical surfaces on both sides of the spherical surface.
A plurality of barrels, each of which has a curved surface or a flat surface that does not mainly contribute to polishing , are formed side by side in the drum.
And rotate the drum about its axis of rotation.
The piezoelectric vibration corresponding to the curvature of the spherical curved surface
Barrel polishing apparatus characterized by performing chamfering of a plate
Place.
水平軸に対して5度から20度傾けて設置したことを特
徴とする請求項1または請求項2記載のバレル研磨装
置。Wherein the barrel or barrel polishing apparatus according to claim 1 or claim 2, wherein in that the rotation axis of the drum set up at an angle 20 degrees from 5 degrees to the horizontal axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4343095A JP2897202B2 (en) | 1995-02-07 | 1995-02-07 | Barrel polishing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4343095A JP2897202B2 (en) | 1995-02-07 | 1995-02-07 | Barrel polishing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08216014A JPH08216014A (en) | 1996-08-27 |
| JP2897202B2 true JP2897202B2 (en) | 1999-05-31 |
Family
ID=12663489
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4343095A Expired - Lifetime JP2897202B2 (en) | 1995-02-07 | 1995-02-07 | Barrel polishing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2897202B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4305542B2 (en) | 2006-08-09 | 2009-07-29 | エプソントヨコム株式会社 | AT cut quartz crystal resonator element and manufacturing method thereof |
| JP4623321B2 (en) * | 2007-12-03 | 2011-02-02 | セイコーエプソン株式会社 | Crystal blank manufacturing method and crystal resonator manufacturing method using crystal blank |
| CN108356691A (en) * | 2018-02-02 | 2018-08-03 | 中国工程物理研究院激光聚变研究中心 | A kind of rotation burr remover |
| CN108161687B (en) * | 2018-02-02 | 2024-01-26 | 中国工程物理研究院激光聚变研究中心 | A rolling deburring device |
| JP2018141560A (en) * | 2018-04-27 | 2018-09-13 | 昭和電工株式会社 | Method of manufacturing high-pressure gas container |
| KR102911812B1 (en) * | 2025-07-10 | 2026-01-13 | (주)상일테프론 | Small rotary barrel tumbler |
-
1995
- 1995-02-07 JP JP4343095A patent/JP2897202B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08216014A (en) | 1996-08-27 |
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