JP2897485B2 - Soft magnetic thin film and method of manufacturing the same - Google Patents
Soft magnetic thin film and method of manufacturing the sameInfo
- Publication number
- JP2897485B2 JP2897485B2 JP26588591A JP26588591A JP2897485B2 JP 2897485 B2 JP2897485 B2 JP 2897485B2 JP 26588591 A JP26588591 A JP 26588591A JP 26588591 A JP26588591 A JP 26588591A JP 2897485 B2 JP2897485 B2 JP 2897485B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- magnetic
- soft magnetic
- film
- magnetic thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
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- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は高密度記録用薄膜磁気ヘ
ッド用の軟磁性薄膜およびその製造方法に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a soft magnetic thin film for a thin film magnetic head for high density recording and a method for manufacturing the same.
【0002】[0002]
【従来の技術】HDD用の高密度磁気記録薄膜磁気ヘッ
ドの薄膜磁気コア軟磁性層としては従来から電気メッキ
法によるパーマロイ磁性薄膜が最も一般的に用いられて
きたがより線記録密度のより高密度化の技術的要求から
磁気記録媒体の抗磁力(Hc)が大きくなってきた。電気メ
ッキ法による薄膜磁気コアパターンの作成法によればパ
ターニングされたフォトレジスト層の窓を通して下地電
極層より磁性膜を直接所望の形状に成膜させることがで
きる。このことから磁性膜パターンエッジの断面形状
が、蒸着法で磁性膜を基板全体に作成させてエッチング
で磁気コアパターンを作成させた場合と比べて垂直に切
り立った形状を保てることから磁気コアの特にトラック
幅制御等のパターン精度の制御や、磁気コア層の傾斜部
の膜厚を平坦と同様に保てること等のプロセス上の利点
があった。2. Description of the Related Art Permalloy magnetic thin films formed by electroplating have been most commonly used as a soft magnetic layer of a thin film magnetic core of a high-density magnetic recording thin film magnetic head for an HDD. The coercive force (Hc) of magnetic recording media has increased due to the technical demands for density. According to the method of forming a thin-film magnetic core pattern by electroplating, a magnetic film can be formed in a desired shape directly from the underlying electrode layer through the window of the patterned photoresist layer. From this, the cross-sectional shape of the magnetic film pattern edge can maintain a vertically steep shape compared to the case where the magnetic film is formed on the entire substrate by the vapor deposition method and the magnetic core pattern is formed by etching, so that the magnetic core particularly There are process advantages such as control of pattern accuracy such as track width control, and keeping the thickness of the inclined portion of the magnetic core layer as flat.
【0003】さらに基本的には磁性膜に対する熱処理を
必要としないで初透磁率などの軟磁気特性を得ることが
出来るという材料的利点もあった。しかしながらパーマ
ロイ合金材料の飽和磁束密度(Bs)、Bs=0.1Tの特性で
は上記のように高抗磁力媒体の記録能率にたいして不十
分となってきた。また、薄膜ヘッドの出力及びノイズの
安定化のため、磁気コアパターンの磁区構造を安定に制
御させるにはパーマロイ合金膜の異方性磁界(Hk=240〜4
00 A/m)の大きさでは必ずしも適当ではなくなってき
た。Further, there is also a material advantage that soft magnetic characteristics such as initial magnetic permeability can be basically obtained without heat treatment for the magnetic film. However, the characteristics of the saturation magnetic flux density (Bs) of the permalloy alloy material and Bs = 0.1 T have become insufficient for the recording efficiency of the high coercive force medium as described above. In addition, in order to stably control the magnetic domain structure of the magnetic core pattern in order to stabilize the output and noise of the thin film head, the anisotropic magnetic field (Hk = 240 to 4
The size of (00 A / m) is not always appropriate.
【0004】従って、上記に説明したような利点等をも
つ電気メッキ法によって作成できるパーマロイ以上の高
Bs,高Hk薄膜で、且つパーマロイと同様に飽和磁歪が零
である実用的な初透磁率を有する磁性膜およびその電気
メッキ法による製法が望まれていた。[0004] Accordingly, high permalloy or higher can be produced by the electroplating method having the advantages as described above.
There has been a demand for a magnetic film having a practical initial magnetic permeability, which is a Bs, high Hk thin film and has zero saturation magnetostriction like permalloy, and a method of manufacturing the same by electroplating.
【0005】[0005]
【発明が解決しようとする課題】これらの課題は上記の
様に、磁気コア磁性層として用られる電気メッキ法で作
成できる飽和磁歪が零の実用特性を有した軟磁性膜とし
てはパーマロイ合金しか知られていないため、高保磁力
媒体用の記録能力、狭トラック幅、及び安定な出力等が
要求される高密度記録用薄膜ヘッド用のパーマロイにか
わる高飽和磁束密度の零磁歪の新しい合金軟磁性薄膜を
従来の薄膜ヘッドコア膜の上記のような製法利点を有し
た電気メッキ法で作成することが望まれていた。As described above, only a permalloy alloy is known as a soft magnetic film having practical characteristics of zero saturation magnetostriction which can be formed by an electroplating method used as a magnetic core magnetic layer as described above. A new alloy soft magnetic thin film of zero magnetostriction with a high saturation magnetic flux density replacing permalloy for thin film heads for high density recording, which requires high recording capacity, narrow track width, and stable output for high coercivity media It has been desired to prepare a conventional thin-film head core film by an electroplating method having the above-described manufacturing method advantages.
【0006】[0006]
【課題を解決するための手段 】この目的を達成するた
めの本発明では、電気メッキ法によって鉄、コバルト、
クロムからなる3元合金薄膜で、各原子%でCoxFeyCrz
と表わしたとき、x≧80,19≧y>0, 9≧Z>0 である軟
磁性薄膜材料を薄膜ヘッドコア用の軟磁性薄膜とするこ
と、またその薄膜製法として少なくともFe2+,Co2+,Cr3+
各金属イオンが共存するメッキ浴を用い、欲中の各イ
オン濃度の比率として、 R(Co2+) = [Co2+] / [Fe2+]+[Co2+]+[Cr3+] R(Fe2+) = [Fe2+] / [Fe2+]+[Co2+]+[Cr3+] R(Cr3+) = [Cr3+] / [Fe2+]+[Co2+]+[Cr3+]
と表わして 0.90 ≧ R(Co2+) ≧ 0.55 0.15 ≧ R(Fe2+) ≧ 0.055 0.35 ≧ R(Cr3+) ≧ 0.08 である条件下で直流のメッキ電流で電流密度が50mA/c
m2以上を用いるか、またはパルスメッキ電流で最大メッ
キ電流密度が50mA/cm2以上としてカソードにCoFeCr3
元合金薄膜を得るという軟磁性薄膜作成方法を上記課題
を解決する手段とするものである。According to the present invention, there is provided an electroplating method comprising the steps of:
CoxFeyCrz is a ternary alloy thin film made of chromium.
When a soft magnetic thin film material of x ≧ 80, 19 ≧ y> 0, 9 ≧ Z> 0 is used as a soft magnetic thin film for a thin film head core, at least Fe2 +, Co2 +, Cr3 +
R (Co2 +) = [Co2 +] / [Fe2 +] + [Co2 +] + [Cr3 +] R (Fe2 +) = [Fe2 +] / [Fe2 +] + [Co2 +] + [Cr3 +] R (Cr3 +) = [Cr3 +] / [Fe2 +] + [Co2 +] + [Cr3 +]
Under the condition that 0.90 ≧ R (Co2 +) ≧ 0.55 0.15 ≧ R (Fe2 +) ≧ 0.055 0.35 ≧ R (Cr3 +) ≧ 0.08, the current density is 50 mA / c at the DC plating current.
or using m 2 or more, or up to the plating current density pulse plating current to the cathode as 50 mA / cm 2 or more CoFeCr3
A method for producing a soft magnetic thin film, which is to obtain an original alloy thin film, is a means for solving the above problems.
【0007】[0007]
【作用】薄膜磁気ヘッドの磁気コアパターンとして高飽
和磁束密度を有し、零磁歪を兼ね備えた軟磁性薄膜材料
が望まれることは上記にも述べたが、従来のパーマロイ
材料以外にこれ近い特性を持つ材料としてCo-Fe合金が
あった。Co-Fe合金はCo90Fe10原子%付近ので面心立方
構造で飽和磁歪が零となりしかも飽和磁束密度値が1.9
Tとパーマロイの2倍近い値をもち、さらに異方性磁界
(Hk)も800 A/m程度の値を有することが知られてきた
が、特に薄膜化させた場合、Co90Fe10組成付近が面心立
方構造と体心立方構造の平衡状態における境界組成付近
でもあることから、作成されたこの組成付近の薄膜が面
心、体心両立方構造の複合されたものができることが多
く、均質な構造に基ずく良好な軟磁気特性を有する高い
初透磁率の薄膜はこれまでえられなかった。熱処理によ
れば全体を面心立方構造に安定化させることが可能であ
るが、薄膜ヘッド用の材料としては素子の信頼性から3
00度C程度の熱処理が上限であることからこれは熱処
理温度としては低すぎて効果が期待できなかった。本発
明の電着法によるCo-Fe-Cr3元合金系軟磁性薄膜ではCr
の添加によってCo90Fe10組成付近での不均質な膜構造が
均質な面心立方の単相構造として得られるため、従来の
Co-Fe2元系以上の高い初透磁率が得られるものと考え
られた。また数%のCrの添加による3元系でもCo-Fe2
元系と同様、零磁歪が実現されていることは零磁歪が面
心立方構造に由来する特性であることによるものとおも
われる。As described above, a soft magnetic thin film material having high saturation magnetic flux density and zero magnetostriction is desired as a magnetic core pattern of a thin film magnetic head, but it has characteristics similar to those of conventional permalloy materials. Co-Fe alloy was one of the materials to have. The Co-Fe alloy has a face-centered cubic structure with a saturation magnetostriction of zero at around 10 atomic% of Co 90 Fe and a saturation magnetic flux density of 1.9.
It has a value nearly twice that of T and Permalloy, and an anisotropic magnetic field
(Hk) has also been known to have a value of about 800 A / m, but especially when thinned, near the Co90Fe10 composition is also near the boundary composition in the equilibrium state of the face-centered cubic structure and the body-centered cubic structure Therefore, a thin film having a composition near this composition is often formed as a composite of a face-centered and body-centered cubic structure, and a thin film having a high initial permeability having good soft magnetic properties based on a homogeneous structure is obtained. I couldn't get it before. According to the heat treatment, the whole can be stabilized to a face-centered cubic structure.
Since the heat treatment at about 00 ° C. is the upper limit, this was too low for the heat treatment temperature and the effect could not be expected. In the Co-Fe-Cr ternary alloy soft magnetic thin film prepared by the electrodeposition method of the present invention, Cr
Can be obtained as a homogeneous face-centered cubic single-phase structure, resulting in a heterogeneous film structure near the Co 90 Fe 10 composition.
It was considered that a high initial magnetic permeability higher than that of the Co-Fe binary system was obtained. Co-Fe2 even in a ternary system with the addition of several percent Cr
As with the original system, the fact that zero magnetostriction is realized is considered to be due to the fact that zero magnetostriction is a characteristic derived from the face-centered cubic structure.
【0008】[0008]
【実施例】以下、具体例について詳細に述べる。DESCRIPTION OF THE PREFERRED EMBODIMENTS Specific examples will be described below in detail.
【0009】(図1)は、本発明の第1の実施例とし
て、(表1)に示した電着浴および条件を用い、電流密
度条件をかえてえられた電着膜組成と電着電流密度条件
との関係を示したものである。(表1)で示した同一の
浴を用いて少なくとも50mA/cm2以上の電流密度におい
て、(図1)のように広い範囲の組成のCo-Fe-Cr3元合
金膜がえられることがわかる。逆に50mA/cm2以下ではCr
は全く合金化しなかった。FIG. 1 shows an electrodeposition film composition and electrodeposition obtained by changing the current density conditions using the electrodeposition baths and conditions shown in Table 1 as a first embodiment of the present invention. 9 shows a relationship with a current density condition. It can be seen that a Co—Fe—Cr ternary alloy film having a wide range of composition as shown in FIG. 1 can be obtained at a current density of at least 50 mA / cm 2 using the same bath shown in Table 1. . Conversely, Cr at 50 mA / cm 2 or less
Did not alloy at all.
【0010】[0010]
【表1】 [Table 1]
【0011】また(表2)に示したようにCo2+,Fe2+,Cr
3+イオンの比率Rをそれぞれ R(Co2+) = [Co2+] / [Fe2+]+[Co2+]+[Cr3+] R(Fe2+) = [Fe2+] / [Fe2+]+[Co2+]+[Cr3+] R(Cr3+) = [Cr3+] / [Fe2+]+[Co2+]+[Cr3+]
と表わして 0.90 ≧ R(Co2+) ≧ 0.55 0.15 ≧ R(Fe2+) ≧ 0.055 0.35 ≧ R(Cr3+) ≧ 0.088 であるときに、直流またはパルス状の電着電流密度を10
0mA/cm2の一定条件でえられた薄膜の組成が各原子%でC
oxFeyCrzで表わして、x≧80, 19≧y>0, 9≧Z>0であ
る3元合金薄膜がえられることがわかった。(パルス電
流を用いた場合は全て周波数10Hzで 1:1の Duty比
のものを用いた。)As shown in Table 2, Co2 +, Fe2 +, Cr
R (Co2 +) = [Co2 +] / [Fe2 +] + [Co2 +] + [Cr3 +] R (Fe2 +) = [Fe2 +] / [Fe2 +] + [Co2 +] + [Cr3 +] R ( (Cr3 +) = [Cr3 +] / [Fe2 +] + [Co2 +] + [Cr3 +]
When 0.90 ≥ R (Co2 +) ≥ 0.55 0.15 ≥ R (Fe2 +) ≥ 0.055 0.35 ≥ R (Cr3 +) ≥ 0.088, the DC or pulsed electrodeposition current density is 10
The composition of the thin film obtained under a constant condition of 0 mA / cm 2 is C
It was found that a ternary alloy thin film satisfying x ≧ 80, 19 ≧ y> 0, and 9 ≧ Z> 0 was obtained as represented by oxFeyCrz. (In the case of using a pulse current, a pulse current having a frequency of 10 Hz and a duty ratio of 1: 1 was used.)
【0012】[0012]
【表2】 [Table 2]
【0013】このときの合金電着膜は静磁界中の成膜に
よって一軸磁気異方性を付与させることで、(表2)中
にも示したように磁化困難軸方向の抗磁力(Hc)が3
00A/m以下のものも含む軟磁気特性に優れた膜がえら
れた。また(表2)中にも示した様に飽和磁歪が零に近
いものもえられた。At this time, the alloy electrodeposited film is given a uniaxial magnetic anisotropy by being formed in a static magnetic field, so that the coercive force (Hc) in the direction of the hard axis as shown in (Table 2). Is 3
Films having excellent soft magnetic properties including those having a thickness of not more than 00 A / m were obtained. Further, as shown in (Table 2), one having a saturation magnetostriction close to zero was obtained.
【0014】[0014]
【発明の効果】以上の様に本発明の軟磁性膜およびその
製造方法によって高抗磁力媒体に対応した薄膜磁気ヘッ
ドが従来なみの精度で作成でき、高密度記録が高い出力
が安定した状態で得られる効果が見込まれる。As described above, the thin film magnetic head corresponding to the high coercive force medium can be manufactured with the same accuracy as the conventional one by the soft magnetic film and the method of manufacturing the same according to the present invention. The obtained effect is expected.
【図1】(表1)の電着浴および電着条件をもちいたと
きの電着膜の膜組成と電着に用いた電着電流密度との関
係を示した図である。FIG. 1 is a diagram showing the relationship between the film composition of an electrodeposited film and the electrodeposition current density used for electrodeposition when using the electrodeposition bath and electrodeposition conditions shown in Table 1.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01F 10/16 H01F 41/26 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) H01F 10/16 H01F 41/26
Claims (2)
て、コバルト、鉄、クロムからなる3元合金で、各原子
%でCoxFeyCrzと表わしたとき、x≧80, 19≧y>0, 9≧
Z>0 であることを特徴とする軟磁性薄膜。1. A thin film produced by an electroplating method, which is a ternary alloy composed of cobalt, iron and chromium, where x ≧ 80, 19 ≧ y> 0, 9 when represented by CoxFeyCrz in each atomic%. ≧
A soft magnetic thin film, wherein Z> 0.
オンが共存するメッキ浴を用い、浴中の各イオン濃度の
比率として R(Co2+) = [Co2+] / [Fe2+]+[Co2+]+[Cr3+] R(Fe2+) = [Fe2+] / [Fe2+]+[Co2+]+[Cr3+] R(Cr3+) = [Cr3+] / [Fe2+]+[Co2+]+[Cr3+]
と表わして 0.90 ≧ R(Co2+) ≧ 0.55 0.15 ≧ R(Fe2+) ≧ 0.055 0.35 ≧ R(Cr3+) ≧ 0.08 において直流のメッキ電流で電流密度が50mA/cm2以上
を用いるか、またはパルスメッキ電流でメッキ電流密度
が50mA/cm2以上としてカソードにCoFeCr3元合金薄膜
を得ることを特徴とする軟磁性薄膜の製造方法。2. A plating bath in which at least each metal ion of Fe2 +, Co2 +, and Cr3 + coexists, and the ratio of each ion concentration in the bath is R (Co2 +) = [Co2 +] / [Fe2 +] + [Co2 +] + [ Cr3 +] R (Fe2 +) = [Fe2 +] / [Fe2 +] + [Co2 +] + [Cr3 +] R (Cr3 +) = [Cr3 +] / [Fe2 +] + [Co2 +] + [Cr3 +]
When 0.90 ≧ R (Co2 +) ≧ 0.55 0.15 ≧ R (Fe2 +) ≧ 0.055 0.35 ≧ R (Cr3 +) ≧ 0.08, use a DC plating current with a current density of 50 mA / cm 2 or more, or use a pulse plating current A method for producing a soft magnetic thin film, wherein a CoFeCr ternary alloy thin film is obtained on a cathode with a plating current density of 50 mA / cm 2 or more.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26588591A JP2897485B2 (en) | 1991-10-15 | 1991-10-15 | Soft magnetic thin film and method of manufacturing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26588591A JP2897485B2 (en) | 1991-10-15 | 1991-10-15 | Soft magnetic thin film and method of manufacturing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05109532A JPH05109532A (en) | 1993-04-30 |
| JP2897485B2 true JP2897485B2 (en) | 1999-05-31 |
Family
ID=17423455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26588591A Expired - Fee Related JP2897485B2 (en) | 1991-10-15 | 1991-10-15 | Soft magnetic thin film and method of manufacturing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2897485B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6776891B2 (en) * | 2001-05-18 | 2004-08-17 | Headway Technologies, Inc. | Method of manufacturing an ultra high saturation moment soft magnetic thin film |
-
1991
- 1991-10-15 JP JP26588591A patent/JP2897485B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05109532A (en) | 1993-04-30 |
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