Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JP2902525B2 - Composite composition excellent in transparency and method for producing the same - Google Patents
[go: Go Back, main page]

JP2902525B2 - Composite composition excellent in transparency and method for producing the same - Google Patents

Composite composition excellent in transparency and method for producing the same

Info

Publication number
JP2902525B2
JP2902525B2 JP25475092A JP25475092A JP2902525B2 JP 2902525 B2 JP2902525 B2 JP 2902525B2 JP 25475092 A JP25475092 A JP 25475092A JP 25475092 A JP25475092 A JP 25475092A JP 2902525 B2 JP2902525 B2 JP 2902525B2
Authority
JP
Japan
Prior art keywords
parts
silica
carbon atoms
composite composition
added
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP25475092A
Other languages
Japanese (ja)
Other versions
JPH05209027A (en
Inventor
直己 山本
章 中田
宏毅 畠山
博之 渡辺
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP25475092A priority Critical patent/JP2902525B2/en
Publication of JPH05209027A publication Critical patent/JPH05209027A/en
Application granted granted Critical
Publication of JP2902525B2 publication Critical patent/JP2902525B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、優れた透明性、剛性、
靭性および耐熱性を有する複合体組成物に関する。
BACKGROUND OF THE INVENTION The present invention relates to a method for manufacturing
The present invention relates to a composite composition having toughness and heat resistance.

【0002】[0002]

【従来の技術】一般に、有機重合体は剛性、硬度、耐熱
性が低い。このような点を克服する試みの一つとして、
無機物との複合化がこれまで多く検討されている。例え
ば、アクリル系樹脂溶液に、アルコキシシラン類の重縮
合により得られるシリカ系化合物やコロイダルシリカを
分散させたものを表面硬化用の塗膜として用いる方法が
数多く提案されている(特開昭53−11952号、特
開昭53−11989号等)。
2. Description of the Related Art Generally, organic polymers have low rigidity, hardness and heat resistance. As one of the attempts to overcome this point,
Many attempts have been made to combine with inorganic substances. For example, many methods have been proposed in which a silica-based compound or colloidal silica obtained by polycondensation of an alkoxysilane is dispersed in an acrylic resin solution as a coating film for surface hardening (Japanese Patent Application Laid-Open No. 53-53). 11952, JP-A-53-11989, etc.).

【0003】しかしながら、汎用のプラスチック基材に
このようなコーティングを行った場合、高硬度、高耐摩
耗性の塗膜は得られるが、剛性の向上は殆ど望めない。
また、数十μ程度の塗膜厚であれば透明性は良好である
が、それ以上の膜厚とすると、透明性は著しく悪くな
る。
However, when such a coating is applied to a general-purpose plastic substrate, a coating film having high hardness and high wear resistance can be obtained, but improvement in rigidity is hardly expected.
Further, if the coating film thickness is about several tens of μ, the transparency is good, but if the coating film thickness is more than that, the transparency becomes extremely poor.

【0004】一方、J.Mater.Res.,Vo
l.4,p.1018(1989)には、孔径を調節し
た多孔質シリカゲルにメチルメタクリレート単量体を含
浸させた後、重合させることにより透明性に優れたシリ
カゲル−ポリメチルメタクリレート複合体が得られると
いう記載がある。しかしながら、この方法は工程が繁雑
であり、工業的製法としては不向きであり、後加工が困
難であるという問題点を有している。
On the other hand, J. A. Mater. Res. , Vo
l. 4, p. 1018 (1989) describes that a silica gel-polymethyl methacrylate composite having excellent transparency can be obtained by impregnating a methyl methacrylate monomer into porous silica gel having a controlled pore size and then polymerizing the same. However, this method has a problem that the steps are complicated, unsuitable for an industrial production method, and that post-processing is difficult.

【0005】[0005]

【発明が解決しようとする課題】本発明の目的は、アク
リル系樹脂が本来有する優れた透明性、靭性、低比重、
良加工性を損なうことなく、高剛性および耐熱性が付与
された複合体組成物を得ることにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide excellent transparency, toughness, low specific gravity, and the like inherent in acrylic resins.
An object is to obtain a composite composition having high rigidity and heat resistance without impairing good processability.

【0006】[0006]

【課題を解決するための手段】本発明者らは、かかる目
的を達成すべく鋭意検討した結果、ラジカル重合性ビニ
ル化合物と、コロイダルシリカ存在下で特定のシランア
ルコキシドを加水分解、縮重合させて得られるシリカ系
縮重合体とを重合させて複合体組成物とすることによっ
て、所期の目的を達成し得ることを見出し、本発明に到
達した。
Means for Solving the Problems The inventors of the present invention have conducted intensive studies in order to achieve the above object, and as a result, hydrolyzed and polycondensed a radically polymerizable vinyl compound and a specific silane alkoxide in the presence of colloidal silica. The present inventors have found that the intended purpose can be achieved by polymerizing the obtained silica-based polycondensate to form a composite composition, and have reached the present invention.

【0007】すなわち本発明は、ラジカル重合性ビニル
化合物(A)を、コロイド状シリカ分散系中で下記一般
式(1) SiR1 a2 b(OR3c (1) (式中、R1 、R2 はエーテル結合、エステル結合また
は炭素−炭素二重結合を有していてもよい炭素数1〜1
0炭化水素残基、R3 は水素原子またはエーテル結合、
エステル結合もしくは炭素−炭素二重結合を有していて
もよい炭素数1〜10の炭化水素残基、a、bは0〜3
の整数、cは4−a−bであって、1〜4の整数を表わ
す。)で表わされる少なくとも1種のシラン化合物を加
水分解、縮重合させて得られたシリカ系縮重合体(B)
の存在下で重合させてなる複合体組成物であってシリカ
系縮重合体(B)のシリカ骨格と、ラジカル重合性ビニ
ル化合物(A)の重合体とがセミIPN構造を形成して
なる複合体組成物である。
That is, according to the present invention, a radical polymerizable vinyl compound (A) is prepared by dispersing a radical polymerizable vinyl compound (A) in a colloidal silica dispersion represented by the following general formula (1): SiR 1 a R 2 b (OR 3 ) c (1) 1 , R 2 has 1 to 1 carbon atoms which may have an ether bond, an ester bond or a carbon-carbon double bond.
0 hydrocarbon residue, R 3 is a hydrogen atom or an ether bond,
A hydrocarbon residue having 1 to 10 carbon atoms which may have an ester bond or a carbon-carbon double bond;
And c is 4-ab, and represents an integer of 1 to 4. (B) a silica-based condensation polymer obtained by hydrolyzing and condensation-polymerizing at least one silane compound represented by the formula (B):
Silica A composite composition obtained by polymerizing in the presence of
Silica skeleton of polycondensation polymer (B) and radical polymerizable vinyl
To form a semi-IPN structure with the polymer of compound (A)
A composite composition comprising:

【0008】[0008]

【作用】本発明の複合体組成物においては、コロイド状
シリカとその表面において加水分解、縮重合する少なく
とも1種のシラン化合物からなるシリカ系縮重合体のシ
リカ骨格と、ラジカル重合性ビニル化合物の重合体とが
セミIPN(Interpenetrating Network) 構造を形成す
るため、極めて良好な剛性、靭性および耐熱性が発現す
る。更に、本発明によればコロイド状シリカ粒子がシリ
カ骨格中に組み込まれ、均一に分散するため、極めて優
れた透明性を発現することになる。
In the composite composition of the present invention, a silica skeleton of a silica-based condensation polymer comprising colloidal silica and at least one silane compound which hydrolyzes and condensation-polymerizes on the surface thereof, and a radical polymerizable vinyl compound Since the polymer forms a semi-IPN (Interpenetrating Network) structure, very good rigidity, toughness and heat resistance are exhibited. Further, according to the present invention, since the colloidal silica particles are incorporated into the silica skeleton and are uniformly dispersed, extremely excellent transparency is exhibited.

【0009】本発明に用いられるラジカル重合性ビニル
化合物(A)としては、公知のラジカル重合可能な単量
体が使用される。例えばメチルメタクリレート、エチル
メタクリレート、ブチルメタクリレート、2−エチルヘ
キシルメタクリレート等のメタクリル酸エステル;メチ
ルアクリレート、エチルアクリレート、ブチルアクリレ
ート、2−エチルヘキシルアクリレート等のアクリル酸
エステル;アクリル酸、メタクリル酸、マレイン酸、イ
タコン酸等の不飽和カルボン酸;無水マレイン酸、無水
イタコン酸等の酸無水物;N−フェニルマレイミド、N
−シクロヘキシルマレイミド、N−t−ブチルマレイミ
ド等のマレイミド誘導体;2−ヒドロキシエチルアクリ
レート、2−ヒドロキシプロピルアクリレート、2−ヒ
ドロキシエチルメタクリレート、2−ヒドロキシプロピ
ルメタクリレート等のヒドロキシ基含有単量体;アクリ
ルアミド、メタクリルアミド、アクリロニトリル、メタ
クロニトリル、ジアセトンアクリルアミド、ジメチルア
ミノエチルメタクリレート等の窒素含有単量体;アリル
グリシジルエーテル、グリシジルアクリレート、グリシ
ジルメタクリレート等のエポキシ基含有単量体;スチレ
ン、α−メチルスチレン等のスチレン系単量体;エチレ
ングリコールジアクリレート、エチレングリコールジメ
タクリレート、アリルアクリレート、アリルメタクリレ
ート、ジビニルベンゼン、トリメチロールプロパントリ
アクリレート等の架橋剤等が挙げられる。これらのう
ち、好ましいのはメタクリル酸エステルおよびアクリル
酸エステルである。メタアクリル酸エステルおよびアク
リル酸エステルから選ばれた少なくとも一種のモノマー
は、ラジカル重合性ビニル化合物(A)中の50重量%
以上であることが好ましく、70重量%以上であること
がより好ましい。特に好ましいラジカル重合性ビニル化
合物(A)は、メタクリル酸エステルである。
As the radically polymerizable vinyl compound (A) used in the present invention, known radically polymerizable monomers are used. For example, methacrylic acid esters such as methyl methacrylate, ethyl methacrylate, butyl methacrylate, and 2-ethylhexyl methacrylate; acrylic acid esters such as methyl acrylate, ethyl acrylate, butyl acrylate, and 2-ethylhexyl acrylate; acrylic acid, methacrylic acid, maleic acid, and itaconic acid Unsaturated carboxylic acids such as maleic anhydride and itaconic anhydride; N-phenylmaleimide;
Maleimide derivatives such as -cyclohexylmaleimide and Nt-butylmaleimide; hydroxy group-containing monomers such as 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxyethyl methacrylate and 2-hydroxypropyl methacrylate; acrylamide, methacryl Nitrogen-containing monomers such as amide, acrylonitrile, methacrylonitrile, diacetone acrylamide, and dimethylaminoethyl methacrylate; epoxy group-containing monomers such as allyl glycidyl ether, glycidyl acrylate, and glycidyl methacrylate; styrene such as styrene and α-methylstyrene -Based monomers: ethylene glycol diacrylate, ethylene glycol dimethacrylate, allyl acrylate, allyl methacrylate, divinyl Zen, crosslinking agents such as trimethylol propane triacrylate, and the like. Of these, methacrylates and acrylates are preferred. At least one monomer selected from methacrylates and acrylates accounts for 50% by weight of the radically polymerizable vinyl compound (A).
It is preferably at least 70% by weight, more preferably at least 70% by weight. Particularly preferred radically polymerizable vinyl compound (A) is methacrylic acid ester.

【0010】また、シリカ系縮重合体(B)中のシラノ
ール基と反応しうる基、例えばヒドロキシル基、カルボ
キシル基、ハロゲン化シリル基およびアルコキシシリル
基からなる群より選ばれた少なくとも一種の官能基を分
子内に有するビニル化合物は、複合体組成物の剛性、靭
性、耐熱性等の物性をより向上させるよう働くので、ラ
ジカル重合性ビニル化合物(A)成分の一部として含有
されるのは好ましい態様である。
Further, a group capable of reacting with a silanol group in the silica-based condensation polymer (B), for example, at least one functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a silyl halide group and an alkoxysilyl group. Is used as a part of the radically polymerizable vinyl compound (A) component since the vinyl compound having in the molecule functions to further improve physical properties such as rigidity, toughness, and heat resistance of the composite composition. It is an aspect.

【0011】このような反応しうる基を分子内に含有す
るビニル化合物としては、2−ヒドロキシエチル(メ
タ)アクリレート、2−ヒドロキシプロピル(メタ)ア
クリレート、(メタ)アクリル酸、ビニルトリクロルシ
ラン、ビニルトリメトキシシラン、γ−メタクリロイル
オキシプロピルトリメトキシシラン等が挙げられ、2−
ヒドロキシエチルメタクリレート、メタクリル酸、ビニ
ルトリクロルシラン、ビニルトリメトキシシラン、γ−
メタクリロイルオキシプロピルトリメトキシシランが特
に好ましい。
Examples of the vinyl compound containing such a reactive group in the molecule include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, (meth) acrylic acid, vinyltrichlorosilane, vinyl Trimethoxysilane, γ-methacryloyloxypropyltrimethoxysilane, and the like.
Hydroxyethyl methacrylate, methacrylic acid, vinyltrichlorosilane, vinyltrimethoxysilane, γ-
Methacryloyloxypropyltrimethoxysilane is particularly preferred.

【0012】本発明に用いられるシリカ系縮重合体
(B)は、コロイド状シリカ分散系中で下記一般式
(1) SiR1 a2 b(OR3c (1) (式中、R1 、R2 はエーテル結合、エステル結合また
は炭素−炭素二重結合を有していてもよい炭素数1〜1
0炭化水素残基、R3 は水素原子またはエーテル結合、
エステル結合もしくは炭素−炭素二重結合を有していて
もよい炭素数1〜10の炭化水素残基、a、bは0〜3
の整数、cは4−a−bであって、1〜4の整数を表わ
す。)で表わされるシラン化合物の一種以上を、そのO
3 基の大部分を加水分解、縮重合させて得られた縮重
合体であり、その外表面にはOR3 基、またはOR3
とOH基とが存在する。したがって、ラジカル重合性ビ
ニル化合物(A)中に溶解する。
The silica-based polycondensate (B) used in the present invention is represented by the following general formula (1) SiR 1 a R 2 b (OR 3 ) c (1) in a colloidal silica dispersion. 1 , R 2 has 1 to 1 carbon atoms which may have an ether bond, an ester bond or a carbon-carbon double bond.
0 hydrocarbon residue, R 3 is a hydrogen atom or an ether bond,
A hydrocarbon residue having 1 to 10 carbon atoms which may have an ester bond or a carbon-carbon double bond;
And c is 4-ab, and represents an integer of 1 to 4. )) At least one of the silane compounds represented by O
It is a condensation polymer obtained by hydrolyzing and condensation-polymerizing most of the R 3 groups, and has OR 3 groups or OR 3 groups and OH groups on its outer surface. Therefore, it dissolves in the radically polymerizable vinyl compound (A).

【0013】かかるシリカ系縮重合体(B)は、コロイ
ド状シリカのみをラジカル重合性ビニル化合物(A)中
に分散させようとした場合にゲル化してしまうようなシ
リカ分濃度においても、ラジカル重合性ビニル化合物
(A)中に均一に分散することが可能である。すなわ
ち、本発明によれば、複合体組成物中にシリカを高濃度
で均一分散することが可能となり、複合体組成物に目的
とする物性を付与することが可能になる。
The silica-based polycondensate (B) is free from radical polymerization even at a silica concentration that would cause gelation when only colloidal silica was dispersed in the radically polymerizable vinyl compound (A). It is possible to disperse uniformly in the functional vinyl compound (A). That is, according to the present invention, it is possible to uniformly disperse silica at a high concentration in a composite composition, and to impart desired physical properties to the composite composition.

【0014】本発明において使用されるコロイド状シリ
カの分散物としては、各種の市販品が使用できる。コロ
イド状シリカの粒径は、通常1nm〜1μmであるが、
特に限定されるものではない。しかし、好ましい粒径は
5nm〜500nmである。コロイド状シリカの分散媒
は、特に限定されないが、通常、水;メタノール、イソ
プロピルアルコールのようなアルコール類;セロソルブ
類;ジメチルアセトアミド等が使用される。特に好まし
い分散媒は、アルコール類、セロソルブ類および水であ
る。
As the colloidal silica dispersion used in the present invention, various commercial products can be used. The particle size of the colloidal silica is usually 1 nm to 1 μm,
There is no particular limitation. However, the preferred particle size is between 5 nm and 500 nm. The dispersion medium of the colloidal silica is not particularly limited, but usually, water; alcohols such as methanol and isopropyl alcohol; cellosolves; dimethylacetamide and the like are used. Particularly preferred dispersion media are alcohols, cellosolves and water.

【0015】本発明で用いる前記一般式(1)で表わさ
れるシラン化合の中でも、下記一般式(2)〜(7)
で表わされるシラン化合物を好ましいものとして挙げる
ことができる。
[0015] Among the silane compounds represented by the general formula (1) used in the present invention, the following general formula (2) to (7)
The silane compound represented by the following can be mentioned as a preferable example.

【0016】 SiR4 a5 b(OR6c (2) SiR4 n(O-CH2CH2-O-CO-(R7)C=CH2)4-n (3) CH2=C(R7)COO(CH2)pSiR8 n(OR6)3-n (4) CH2=CHSiR8 n(OR6)3-n (5) HS(CH2)p-SiR8 n(OR6)3-n (6)SiR 4 a R 5 b (OR 6 ) c (2) SiR 4 n (O—CH 2 CH 2 —O—CO— (R 7 ) C = CH 2 ) 4-n (3) CH 2 = C (R 7 ) COO (CH 2 ) p SiR 8 n (OR 6 ) 3-n (4) CH 2 = CHSiR 8 n (OR 6 ) 3-n (5) HS (CH 2 ) p -SiR 8 n (OR 6 ) 3-n (6)

【0017】[0017]

【化3】 (式中、R4 、R5 はエーテル結合またはエステル結合
を有してもよい炭素数1〜10の炭化水素残基、R6
水素原子または炭素数1〜10の炭化水素残基、R7
水素原子またはメチル基、R8 炭素数1〜3のアルキル
基またはフェニル基、a、bは0〜3の整数、cは4−
a−bであって、1〜4の整数、nは0〜2の整数、p
は1〜6の整数を表わす。) 前記一般式(2)で表わされるシラン化合物としては、
例えばテトラメトキシシラン、テトラエトキシシラン、
テトラプロポキシシラン、テトラブトキシシラン、メチ
ルトリエトキシシラン、エチルトリメトキシシラン、エ
チルトリエトキシシラン、フェニルトリメトキシシラ
ン、フェニルトリエトキシシラン、ジメチルジメトキシ
シラン、ジフェニルジメトキシシラン、メチルエチルジ
エトキシシラン、メチルフェニルジメトキシシラン、ト
リメチルエトキシシラン、メトキシエチルトリエトキシ
シラン、アセトキシエチルトリエトキシシラン、ジエト
キシエチルジエトキシシラン、テトラアセトキシシラ
ン、メチルトリアセトキシシラン、テトラキス(2−メ
トキシエトキシ)シランおよびこれらの部分加水分解物
が挙げられる。
Embedded image (Wherein, R 4 and R 5 are a hydrocarbon residue having 1 to 10 carbon atoms which may have an ether bond or an ester bond; R 6 is a hydrogen atom or a hydrocarbon residue having 1 to 10 carbon atoms; 7 is a hydrogen atom or a methyl group, R 8 is an alkyl group having 1 to 3 carbon atoms or a phenyl group, a and b are integers of 0 to 3, c is 4-
ab, an integer of 1-4, n is an integer of 0-2, p
Represents an integer of 1 to 6. As the silane compound represented by the general formula (2),
For example, tetramethoxysilane, tetraethoxysilane,
Tetrapropoxysilane, tetrabutoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, dimethyldimethoxysilane, diphenyldimethoxysilane, methylethyldiethoxysilane, methylphenyldimethoxysilane Silane, trimethylethoxysilane, methoxyethyltriethoxysilane, acetoxyethyltriethoxysilane, diethoxyethyldiethoxysilane, tetraacetoxysilane, methyltriacetoxysilane, tetrakis (2-methoxyethoxy) silane and their partially hydrolyzed products No.

【0018】前記一般式(3)で表わされるシラン化合
物としては、例えばテトラキス(アクリロイルオキシエ
トキシ)シラン、テトラキス(メタクリロイルオキシエ
トキシ)シラン、メチルトリス(アクリロイルオキシエ
トキシ)シランおよびメチルトリス(メタクリロイルオ
キシエトキシ)シランが挙げられ、中でもテトラキス
(アクリロイルオキシエトキシ)シラン、テトラキス
(メタクリロイルオキシエトキシ)シランが好ましく、
これらは例えばテトラクロルシランと2−ヒドロキシエ
チルアクリレートまたは2−ヒドロキシエチルメタクリ
レートから合成される。
Examples of the silane compound represented by the general formula (3) include tetrakis (acryloyloxyethoxy) silane, tetrakis (methacryloyloxyethoxy) silane, methyltris (acryloyloxyethoxy) silane and methyltris (methacryloyloxyethoxy) silane. Among them, tetrakis (acryloyloxyethoxy) silane and tetrakis (methacryloyloxyethoxy) silane are preferable,
These are synthesized, for example, from tetrachlorosilane and 2-hydroxyethyl acrylate or 2-hydroxyethyl methacrylate.

【0019】前記一般式(4)で表わされるシラン化合
物としては、例えばβ−アクリロイルオキシエチルジメ
トキシメチルシラン、γ−アクリロイルオキシプロピル
メトキシジメチルシラン、γ−アクリロイルオキシプロ
ピルトリメトキシシラン、β−メタクリロイルオキシエ
チルジメトキシメチルシラン、γ−メタクリロイルオキ
シプロピルメトキシジメチルシラン、γ−メタクリロイ
ルオキシプロピルトリメトキシシラン等が挙げられる。
前記一般式(5)で表わされるシラン化合物としては、
例えばビニルメチルジメトキシシラン、ビニルトリメト
キシシラン、ビニルトリエトキシシランが挙げられる。
前記一般式(6)で表わされる化合物としては、例えば
γ−メルカプトプロピルジメトキシメチルシラン、γ−
メルカプトプロピルトリメトキシシランが挙げられる。
前記一般式(7)で表わされる化合物としては、例えば
p−ビニルフェニルメチルジメトキシシラン、p−ビニ
ルフェニルトリメトキシシランが挙げられる。
Examples of the silane compound represented by the general formula (4) include β-acryloyloxyethyldimethoxymethylsilane, γ-acryloyloxypropylmethoxydimethylsilane, γ-acryloyloxypropyltrimethoxysilane, β-methacryloyloxyethyl Dimethoxymethylsilane, γ-methacryloyloxypropylmethoxydimethylsilane, γ-methacryloyloxypropyltrimethoxysilane, and the like.
As the silane compound represented by the general formula (5),
For example, vinyl methyl dimethoxy silane, vinyl trimethoxy silane, vinyl triethoxy silane can be mentioned.
Examples of the compound represented by the general formula (6) include γ-mercaptopropyldimethoxymethylsilane and γ-mercaptopropyldimethoxymethylsilane.
And mercaptopropyltrimethoxysilane.
Examples of the compound represented by the general formula (7) include p-vinylphenylmethyldimethoxysilane and p-vinylphenyltrimethoxysilane.

【0020】本発明において上記一般式(2)〜(7)
で表わされるシラン化合物の好ましい使用法として、以
下の5態様が例示される。
In the present invention, the above general formulas (2) to (7)
The following five embodiments are exemplified as preferred uses of the silane compound represented by

【0021】第1の態様は、前記一般式(2)で表わさ
れるシラン化合物の一種以上を用いる態様である。前記
一般式(2)において、R4 、R5 、R6 が炭素数が1
〜4の炭化水素残基であるシラン化合物を用いるのが好
ましい。R4 、R5 、R6 が炭素数が4以下の炭化水素
残基であると、立体的な障害が小さいため、加水分解、
縮重合速度が速くなり、コロイド状シリカ粒子同士を結
合させ、シリカ骨格を形成させることが容易となる。特
に好ましいシラン化合物は、前記一般式(2)におい
て、cが4であるテトラアルコキシシラン類であり、テ
トラアルコキシシラン単独で、または重合前の安定性を
考慮してテトラアルコキシシランにトリアルコキシシラ
ンもしくはジアルコキシシランを混合したものを使用す
ることが好ましい。
The first embodiment is an embodiment in which one or more silane compounds represented by the general formula (2) are used. In the general formula (2), R 4 , R 5 and R 6 each have 1 carbon atom.
It is preferable to use a silane compound that is a hydrocarbon residue of 4 to 4. When R 4 , R 5 , and R 6 are hydrocarbon residues having 4 or less carbon atoms, steric hindrance is small, so that hydrolysis,
The polycondensation rate is increased, and the colloidal silica particles are easily bonded to each other to form a silica skeleton. Particularly preferred silane compounds are tetraalkoxysilanes in which c is 4 in the above general formula (2). The tetraalkoxysilane is used alone, or a trialkoxysilane or tetraalkoxysilane is used in consideration of stability before polymerization. It is preferable to use a mixture of dialkoxysilane.

【0022】第2の態様は、前記一般式(3)で表わさ
れるシラン化合物の一種以上を用いる態様である。一般
式(3)で表わされるシラン化合物を加水分解、縮重合
した際、加水分解されずにシリカ系縮重合体(B)中に
残ったアクリロイルオキシエトキシ基またはメタクリロ
イルオキシエトキシ基は、重合時にラジカル重合性ビニ
ル化合物(A)と共重合し、化学的に結合する。このた
めラジカル重合性ビニル化合物(A)の重合体とシリカ
系縮重合体(B)との界面の補強に寄与することとな
る。
The second embodiment is an embodiment in which one or more silane compounds represented by the general formula (3) are used. When the silane compound represented by the general formula (3) is hydrolyzed and polycondensed, the acryloyloxyethoxy group or methacryloyloxyethoxy group remaining in the silica-based polycondensate (B) without being hydrolyzed becomes a radical during polymerization. It copolymerizes with the polymerizable vinyl compound (A) and chemically bonds. For this reason, it contributes to reinforcement of the interface between the polymer of the radically polymerizable vinyl compound (A) and the silica-based condensation polymer (B).

【0023】また、加水分解されずに残ったアクリロイ
ルオキシエトキシ基またはメタクリロイルオキシエトキ
シ基が、ラジカル重合性ビニル化合物(A)との重合の
際に更なる縮重合のために脱離した場合でも、脱離基は
ラジカル重合性ビニル化合物(A)と共重合するので揮
発分とはならず、得られる複合体組成物は、発泡、クラ
ック、割れを生じない。第3の態様は、前記一般式
(2)で表わされるシラン化合物の一種以上と前記一般
式(3)で表わされるシラン化合物の一種以上とを併用
する態様である。これら二種のシラン化合物を併用した
場合には、前述のそれぞれのシラン化合物を単独で使用
した場合の効果に加え、一般式(3)で表わされるシラ
ン化合物が、そのケイ素原子の周りが立体的に混み合っ
ているので加水分解されにくく、シリカ系縮重合体
(B)を後述する重合操作まで安定に保つという効果が
発揮される。
Further, even if the acryloyloxyethoxy group or methacryloyloxyethoxy group remaining without hydrolysis is eliminated due to further condensation polymerization during polymerization with the radically polymerizable vinyl compound (A), Since the leaving group is copolymerized with the radically polymerizable vinyl compound (A), it does not become a volatile component, and the resulting composite composition does not cause foaming, cracking, or cracking. In a third embodiment, one or more silane compounds represented by the general formula (2) and one or more silane compounds represented by the general formula (3) are used in combination. When these two types of silane compounds are used in combination, in addition to the effects obtained when each of the above-mentioned silane compounds is used alone, the silane compound represented by the general formula (3) has a three-dimensional structure around its silicon atom. Therefore, the silica-based condensation polymer (B) is stably maintained until the polymerization operation described below.

【0024】第4の態様は、前記一般式(4)〜(7)
で表わされるシラン化合物の一種以上を用いる態様であ
る。これらシラン化合物およびその加水分解生成物は、
ラジカル重合性ビニル化合物(A)の重合時に共重合性
単量体あるいは連鎖移動剤としても働くので、ラジカル
重合性ビニル化合物(A)の重合体とシリカ系縮重合体
(B)との界面の補強に寄与し、本発明の複合体組成物
の物性を良好なものにする。
In a fourth embodiment, the above general formulas (4) to (7)
This is an embodiment in which one or more silane compounds represented by the following formulas are used. These silane compounds and their hydrolysis products are:
Since it also acts as a copolymerizable monomer or a chain transfer agent during the polymerization of the radically polymerizable vinyl compound (A), the interface between the polymer of the radically polymerizable vinyl compound (A) and the silica-based condensation polymer (B) It contributes to reinforcement and improves the physical properties of the composite composition of the present invention.

【0025】第5の態様は、前記一般式(2)で表わさ
れるシラン化合物の一種以上と前記一般式(4)〜
(7)で表わされるシラン化合物の一種以上とを併用す
る態様である。これら二種のシラン化合物を併用した場
合には、第1の態様において説明した一般式(2)で表
されるシラン化合物から生成するシリカ骨格中に一般式
(4)〜(7)で表されるシラン化合物が共に組み込ま
れる形となるので、ラジカル重合性ビニル化合物(A)
の重合体とシリカ系縮重合体(B)との間により強固な
結合を生じさせ、得られる複合体組成物の物性を良好な
ものにする。
In a fifth aspect, one or more of the silane compounds represented by the general formula (2) and the silane compounds represented by the general formulas (4) to (4) are used.
This is an embodiment in which one or more silane compounds represented by (7) are used in combination. When these two silane compounds are used in combination, the silica skeletons formed from the silane compounds represented by the general formula (2) described in the first embodiment are represented by the general formulas (4) to (7). Radical polymerizable vinyl compound (A)
And a silica-based condensation polymer (B) to form a stronger bond, thereby improving the physical properties of the resulting composite composition.

【0026】コロイド状シリカの分散系中でシラン化合
物を加水分解、縮重合させて得られるシリカ系縮重合体
(B)を誘導するには、上記シラン化合物だけを用いて
もよいが、これと共縮合可能な成分を併用してもよい。
上記シラン化合物と共縮合可能な成分としては、例えば
金属アルコキシド、有機金属塩、金属キレート物が挙げ
られる。共縮合可能な成分の使用比率は、シラン化合物
100重量部に対し、0〜100重量部が好ましく、0
〜50重量部がより好ましい。
In order to induce a silica-based condensed polymer (B) obtained by hydrolyzing and condensing a silane compound in a dispersion of colloidal silica, the above-mentioned silane compound alone may be used. Co-condensable components may be used in combination.
Examples of the component capable of co-condensing with the silane compound include metal alkoxides, organic metal salts, and metal chelates. The use ratio of the co-condensable component is preferably 0 to 100 parts by weight with respect to 100 parts by weight of the silane compound.
-50 parts by weight is more preferred.

【0027】共縮合可能な金属アルコキシド、有機金属
塩、金属キレート物としては、例えばチタンテトラエト
キシド、チタンテトライソプロポキド、ジルコニウムテ
トラエトキシド、ジルコニウムテトラ−n−ブトキシ
ド、アルミニウムトリイソプロポキシド、亜鉛アセチル
アセトネート、酢酸鉛、シュウ酸バリウム等が挙げられ
る。
Examples of metal alkoxides, organic metal salts and metal chelates which can be co-condensed include titanium tetraethoxide, titanium tetraisopropoxide, zirconium tetraethoxide, zirconium tetra-n-butoxide, aluminum triisopropoxide, and the like. Examples include zinc acetylacetonate, lead acetate, and barium oxalate.

【0028】シラン化合物の加水分解、縮重合反応に際
しては、反応系中に水を存在させることが必要である。
反応系中における水の存在割合が反応速度に及ぼす影響
は一般には特に著しいものではないが、極端に少ない場
合には加水分解が緩慢すぎて縮重合体が得られない。
In the hydrolysis and polycondensation reaction of the silane compound, water must be present in the reaction system.
In general, the effect of the proportion of water in the reaction system on the reaction rate is not particularly significant. However, when the proportion is extremely small, hydrolysis is too slow to obtain a condensation polymer.

【0029】シラン化合物の加水分解反応を行う際の触
媒として、無機酸または有機酸を使用することが可能で
ある。無機酸としては、例えば塩酸、弗化水素酸、臭化
水素酸等のハロゲン化水素酸や硫酸、硝酸、リン酸等が
用いられる。有機酸としては、蟻酸、酢酸、シュウ酸、
アクリル酸、メタクリル酸等が挙げられる。
As a catalyst for performing the hydrolysis reaction of the silane compound, an inorganic acid or an organic acid can be used. As the inorganic acid, for example, hydrohalic acid such as hydrochloric acid, hydrofluoric acid, hydrobromic acid, sulfuric acid, nitric acid, phosphoric acid and the like are used. Organic acids include formic acid, acetic acid, oxalic acid,
Examples include acrylic acid and methacrylic acid.

【0030】シラン化合物の加水分解反応系には、反応
を温和に、かつ、均一に行うために溶媒を用いることが
できる。溶媒としては、反応物であるシランアルコキシ
ドと水、触媒を相溶させ得るものが望ましい。かかる溶
媒としては、水;メチルアルコール、エチルアルコー
ル、イソプロピルアルコール等のアルコール類;アセト
ン、メチルイソブチルケトン等のケトン類;テトラヒド
ロフラン、ジオキサン等のエーテル類を挙げることがで
きる。これら溶媒は、前述したコロイド状シリカの分散
媒をそのまま用いてもよいし、新たに必要量加えてもよ
い。溶媒の使用量は反応物を均一に溶解できる量であれ
ば特に制限はないが、反応物の濃度が希薄になりすぎる
と、反応速度が著しく遅くなるおそれがある。シラン化
合物の加水分解と縮重合反応は、室温〜120℃程度の
温度で30分〜24時間程度の条件下で、好ましくは室
温〜溶媒の沸点程度の温度で1〜10時間程度の条件下
で行なわれる。
In the hydrolysis reaction system of the silane compound, a solvent can be used to carry out the reaction mildly and uniformly. As the solvent, a solvent capable of dissolving the reactant silane alkoxide, water and a catalyst is desirable. Examples of such a solvent include water; alcohols such as methyl alcohol, ethyl alcohol, and isopropyl alcohol; ketones such as acetone and methyl isobutyl ketone; and ethers such as tetrahydrofuran and dioxane. As the solvent, the above-described dispersion medium of colloidal silica may be used as it is, or a new necessary amount may be added. The amount of the solvent to be used is not particularly limited as long as the reactant can be uniformly dissolved, but if the concentration of the reactant is too low, the reaction rate may be significantly reduced. The hydrolysis and polycondensation reaction of the silane compound is carried out at a temperature of about room temperature to about 120 ° C. for about 30 minutes to about 24 hours, preferably at about room temperature to about the boiling point of the solvent for about 1 to about 10 hours. Done.

【0031】シリカ系縮重合体(B)中のコロイド状シ
リカと、一般式(1)で表わされるシラン化合物の配合
量は特に限定されないが、コロイド状シリカ固形分10
0重量部に対し、シラン化合物0.1〜2000重量部
が好ましく、1〜1000重量部がより好ましい。
The amounts of the colloidal silica in the silica-based condensation polymer (B) and the silane compound represented by the general formula (1) are not particularly limited.
The silane compound is preferably used in an amount of 0.1 to 2,000 parts by weight, more preferably 1 to 1,000 parts by weight, based on 0 parts by weight.

【0032】シラン化合物として一般式(2)で表わさ
れる化合物の一種以上を用いる場合には、コロイド状シ
リカ固形分100重量部に対し、シラン化合物5〜20
00重量部が好ましく、10〜1000重量部がより好
ましい。
When one or more of the compounds represented by the general formula (2) is used as the silane compound, the silane compound is used in an amount of 5 to 20 based on 100 parts by weight of the solid content of the colloidal silica.
00 parts by weight is preferable, and 10 to 1000 parts by weight is more preferable.

【0033】シラン化合物として一般式(3)で表わさ
れる化合物の一種以上を用いる場合には、コロイド状シ
リカ固形分100重量部に対し、シラン化合物1〜20
00重量部が好ましく、5〜1000重量部がより好ま
しい。
When one or more of the compounds represented by the general formula (3) is used as the silane compound, the silane compounds 1 to 20 are added to 100 parts by weight of the solid content of the colloidal silica.
00 parts by weight is preferable, and 5 to 1000 parts by weight is more preferable.

【0034】シラン化合物として一般式(2)で表わさ
れる化合物の一種以上と一般式(3)で表わされる化合
物の一種以上とを併用する場合には、コロイド状シリカ
固形分100重量部に対し、一般式(2)で表わされる
シラン化合物は5〜2000重量部が好ましく、10〜
1000重量部がより好ましく、一般式(3)で表わさ
れるシラン化合物は0.1〜2000重量部が好まし
く、1〜1000重量部がより好ましい。
When one or more of the compounds represented by the general formula (2) and one or more of the compounds represented by the general formula (3) are used in combination as the silane compound, based on 100 parts by weight of the solid content of the colloidal silica, The silane compound represented by the general formula (2) is preferably 5 to 2,000 parts by weight,
1000 parts by weight is more preferable, and the silane compound represented by the general formula (3) is preferably 0.1 to 2000 parts by weight, more preferably 1 to 1000 parts by weight.

【0035】シラン化合物として一般式(4)〜(7)
で表わされる化合物の一種以上を用いる場合には、コロ
イド状シリカ固形分100重量部に対し、シラン化合物
1〜2000重量部が好ましく、5〜1000重量部が
より好ましい。
The silane compounds represented by the general formulas (4) to (7)
When one or more of the compounds represented by formula (1) is used, the silane compound is preferably used in an amount of 1 to 2,000 parts by weight, more preferably 5 to 1,000 parts by weight, based on 100 parts by weight of the solid content of colloidal silica.

【0036】シラン化合物として一般式(2)で表わさ
れる化合物の一種以上と一般式(4)〜(7)で表わさ
れる化合物の一種以上とを併用する場合には、コロイド
状シリカ固形分100重量部に対し、一般式(2)で表
わされるシラン化合物は5〜2000重量部が好まし
く、10〜1000重量部がより好ましく、一般式
(4)〜(7)で表わされるシラン化合物は0.1〜2
000重量部が好ましく、1〜1000重量部がより好
ましい。
When one or more of the compounds represented by the general formula (2) and one or more of the compounds represented by the general formulas (4) to (7) are used in combination, the solid content of colloidal silica is 100% by weight. Parts by weight, the silane compound represented by the general formula (2) is preferably 5 to 2,000 parts by weight, more preferably 10 to 1000 parts by weight, and the silane compound represented by the general formulas (4) to (7) is 0.1 to 0.1 parts by weight. ~ 2
000 parts by weight is preferable, and 1 to 1000 parts by weight is more preferable.

【0037】本発明の複合体組成物は、コロイド状シリ
カの分散系中でシラン化合物を加水分解、縮重合させて
得られたシリカ系縮重合体(B)と、ラジカル重合性ビ
ニル化合物(A)の重合体を含有している。ラジカル重
合性ビニル化合物(A)とシリカ系縮重合体(B)との
含有比率は、(A)1〜99重量%、(B)99〜1重
量%の範囲で含有するように選択されることが好まし
く、(A)10〜90重量%、(B)90〜10重量%
の範囲内で用いられることがより好ましく、更には
(A)20〜80重量%、(B)80〜20重量%が特
に好ましい。シリカ系縮重合体(B)が80〜20重量
%の場合に、本発明の目的とする物性が特に十分発現す
る。
The composite composition of the present invention comprises a silica-based condensed polymer (B) obtained by hydrolyzing and condensing a silane compound in a colloidal silica dispersion, and a radically polymerizable vinyl compound (A). ). The content ratio of the radical polymerizable vinyl compound (A) and the silica-based condensation polymer (B) is selected so as to be contained in the range of (A) 1 to 99% by weight and (B) 99 to 1% by weight. (A) 10 to 90% by weight, (B) 90 to 10% by weight
Is more preferably used, and more preferably (A) 20 to 80% by weight, and (B) 80 to 20% by weight. When the silica-based condensed polymer (B) is 80 to 20% by weight, the physical properties aimed at by the present invention are particularly sufficiently exhibited.

【0038】本発明の複合体組成物は、ラジカル重合性
ビニル化合物(A)とシリカ系縮重合体(B)とを所望
の状態に混合して同時に重合させることにより複合化す
ることが好ましい。また、単量体を予め1〜20重量%
程度部分重合させた重合体を含むラジカル重合性ビニル
化合物(A)とシリカ系縮重合体(B)とを混合して重
合することにより複合化した組成物であってもよい。
The composite composition of the present invention is preferably formed by mixing the radically polymerizable vinyl compound (A) and the silica-based condensed polymer (B) in a desired state and simultaneously polymerizing them. In addition, 1-20% by weight of monomer
The composition may be a composition obtained by mixing and polymerizing a radically polymerizable vinyl compound (A) containing a polymer partially polymerized and a silica-based condensation polymer (B).

【0039】本発明の複合体組成物は、SiO2 分含量
が15重量%以上の場合においても板厚3mmにおける
曇価が5%以下である。電子顕微鏡写真によれば、コロ
イド状シリカ粒子が非常に均一に、凝集することなく分
散していることがわかる。このことは、本発明の複合体
組成物中のコロイド状シリカ粒子がシラン化合物を加水
分解、縮重合させて得られるシリカ骨格中に組み込ま
れ、ラジカル重合性ビニル化合物(A)の重合体と分子
レベルで相溶化していることを意味しており、優れた透
明性の発現を可能にしている。アクリル系樹脂中に単に
シリカ微粒子を分散させたものでは、SiO2 分含量が
15重量%以上の場合には、板厚3mmにおける曇価は
20%を超え透明性の低下が大きい。
The composite composition of the present invention has a haze value of 5% or less at a plate thickness of 3 mm even when the SiO 2 content is 15% by weight or more. Electron micrographs show that the colloidal silica particles are very uniformly dispersed without agglomeration. This indicates that the colloidal silica particles in the composite composition of the present invention are incorporated into a silica skeleton obtained by hydrolyzing and polycondensing a silane compound, and the polymer and molecule of the radically polymerizable vinyl compound (A) It means that they are compatibilized at a level, and enables the expression of excellent transparency. In the case where silica fine particles are simply dispersed in an acrylic resin, when the SiO 2 content is 15% by weight or more, the haze value at a plate thickness of 3 mm exceeds 20%, and the transparency is greatly reduced.

【0040】本発明の複合体組成物を得る方法は、特に
限定されるものではないが、従来より知られている鋳込
み重合法によって製造するのが好ましい。鋳込み重合法
を例示すると、まず、単量体または部分重合体としての
ラジカル重合性ビニル化合物(A)とシリカ系縮重合体
(B)とを混合して、この混合液中に残存する溶媒や水
を留去して成分(B)が成分(A)中に溶解した混合溶
液を調製した後、ラジカル重合開始剤を添加し、これを
鋳込み原料とする。両成分の混合の具体的手法として
は、シリカ系縮重合体(B)を溶媒に溶解した溶液に成
分(A)を直接混合した後、成分(B)の溶媒および水
を除去する方法、あるいはシリカ系縮重合体(B)の溶
液から成分(B)の溶媒および水を除去しつつ(A)成
分を添加する方法等によって行われる。すなわち、成分
(B)を固体として析出させない状態で両成分の混合溶
液を調製することが重要である。なお、ここでいう混合
溶液とはり、成分(B)が成分(A)中に均一に溶解し
ている状態であればその粘度は問題とされず、ゲル状物
のような状態を定するものであってもよい。
The method for obtaining the composite composition of the present invention is not particularly limited, but it is preferable to produce the composite composition by a conventionally known casting polymerization method. As an example of the casting polymerization method, first, a radical polymerizable vinyl compound (A) as a monomer or a partial polymer is mixed with a silica-based polycondensate (B), and a solvent remaining in the mixed solution or After distilling off water to prepare a mixed solution in which the component (B) is dissolved in the component (A), a radical polymerization initiator is added, and this is used as a casting raw material. As a specific method of mixing both components, a method in which the component (A) is directly mixed with a solution in which the silica-based condensation polymer (B) is dissolved in a solvent, and then the solvent and water of the component (B) are removed, or It is carried out by a method of adding the component (A) while removing the solvent of the component (B) and water from the solution of the silica-based condensation polymer (B). That is, it is important to prepare a mixed solution of both components in a state where the component (B) is not precipitated as a solid. It should be noted that the viscosity of the mixed solution used here is not a problem as long as the component (B) is uniformly dissolved in the component (A), and the mixed solution defines a gel-like state. It may be.

【0041】ここで使用されるラジカル重合開始剤とし
ては、2,2’−アゾビス(イソブチロニトリル)、
2,2’−アゾビス(2,4−ジメチルバレロニトリ
ル)、2,2’−アゾビス(2,4−ジメチル−4−メ
トキシバレロニトリル)等のアゾ化合物、過酸化ベンゾ
イル、過酸化ラウロイル等の有機過酸化物、及びレドッ
クス系の重合開始剤を挙げることができる。
The radical polymerization initiator used here includes 2,2'-azobis (isobutyronitrile),
Azo compounds such as 2,2'-azobis (2,4-dimethylvaleronitrile) and 2,2'-azobis (2,4-dimethyl-4-methoxyvaleronitrile), and organic compounds such as benzoyl peroxide and lauroyl peroxide Peroxides and redox-based polymerization initiators can be mentioned.

【0042】この鋳込み原料を、周辺をガスケットでシ
ールした対向させた2枚の表面処理された無機ガラス板
または金属板の間に注入して加熱する方法(セルキャス
ト法)や同一方向に同一速度で進行する片面鏡面研摩さ
れた2枚のステンレス鋼製エンドレスベルトとガスケッ
トとでシールされた空間の上流から連続的に上記の鋳込
原料を注入して加熱する方法(連続キャスト法)などに
よって鋳込み重合することができる。
The casting material is injected between two opposed surface-treated inorganic glass plates or metal plates whose periphery is sealed with a gasket and heated (cell casting method) or proceeds at the same speed in the same direction. Casting polymerization is carried out by a method of continuously injecting the above-mentioned casting raw material from the upstream of a space sealed by two stainless steel endless belts polished to one side mirror surface and a gasket and heating (continuous casting method) or the like. be able to.

【0043】本発明の複合体組成物を製造する際の重合
硬化温度は、一般には10〜150℃であるが、40〜
150℃の常温以上の温度下でラジカル重合性ビニル化
合物(A)の重合とシリカ系縮重合体(B)の更なる縮
重合とを同時に進めることにより複合化することが好ま
しい。
The polymerization curing temperature for producing the composite composition of the present invention is generally from 10 to 150 ° C.,
It is preferable that the polymerization is performed by simultaneously proceeding the polymerization of the radically polymerizable vinyl compound (A) and the further polycondensation of the silica-based polycondensate (B) at a temperature of 150 ° C. or higher at ordinary temperature.

【0044】さらに本発明の好都合な工程のいずれかに
おいて、本発明の効果を損なわない範囲で、着色剤、紫
外線吸収剤、熱安定剤、離型剤等の添加剤を混合して用
いることができる。
Further, in any of the convenient steps of the present invention, it is possible to use a mixture of additives such as a coloring agent, an ultraviolet absorber, a heat stabilizer and a release agent as long as the effects of the present invention are not impaired. it can.

【0045】以下、実施例により本発明をさらに具体的
に説明するが、本発明はこれらにより何ら制限されるも
のではない。以下の実施例において「部」は特記のない
限り「重量部」を意味する。
Hereinafter, the present invention will be described more specifically with reference to Examples, but the present invention is not limited thereto. In the following examples, "parts" means "parts by weight" unless otherwise specified.

【0046】なお、透明性は、積分球式ヘーズメーター
(日本精密光学製、SEP−H−SS)を使用してAS
TMD1003に準じて全光線透過率および曇価を測定
した。耐熱性は、試料を130℃で60時間アニール
後、ASTM D648に準じて熱変形温度(HDT)
を測定した。強度は、試料を130℃で60時間アニー
ル後、ASTM D790に準じて曲げ試験を行い、曲
げ破壊強度および曲げ弾性係数を測定した。
The transparency was measured using an integrating sphere haze meter (SEP-H-SS, manufactured by Nippon Seimitsu Kogaku).
Total light transmittance and haze were measured according to TMD1003. The heat resistance is determined by annealing a sample at 130 ° C. for 60 hours and then subjecting the sample to a heat distortion temperature (HDT) according to ASTM D648.
Was measured. As for the strength, after the sample was annealed at 130 ° C. for 60 hours, a bending test was performed according to ASTM D790, and the bending fracture strength and the flexural modulus were measured.

【0047】実施例1 撹拌羽根付きガラス製フラスコに、テトラエトキシシラ
ン(以下、TESと略)98.8部およびイソプロピル
アルコール分散コロイド状シリカ(シリカ含量30重量
%、触媒化成工業 (株) 製、商品名OSCAL−143
2、以下S−1と略)100部を入れ、撹拌しながら脱
イオン水18部、36重量%塩酸0.5部を加えて、7
0℃に昇温した。2時間後、ロータリーエバポレータで
減圧下40℃で揮発分を留去しながらメチルメタクリレ
ート(以下、MMAと略)を揮発分の留去と同じ速度で
加え、最後に溶媒をMMAで完全に置換し、濃縮して全
量を150部とした。これをるつぼ中で焼いた後の灰分
から算出した固形分(SiO2 分)は40重量%であっ
た。
Example 1 In a glass flask equipped with stirring blades, 98.8 parts of tetraethoxysilane (hereinafter abbreviated as TES) and colloidal silica dispersed with isopropyl alcohol (silica content: 30% by weight, manufactured by Catalyst Chemical Industry Co., Ltd.) Brand name OSCAL-143
2, hereinafter abbreviated as S-1) 100 parts, and while stirring, 18 parts of deionized water and 0.5 part of 36% by weight hydrochloric acid were added, and
The temperature was raised to 0 ° C. After 2 hours, methyl methacrylate (hereinafter abbreviated as MMA) was added at the same rate as the evaporation of volatiles while removing the volatiles at 40 ° C. under reduced pressure using a rotary evaporator, and finally the solvent was completely replaced with MMA. And concentrated to a total of 150 parts. The solid content (SiO 2 content) calculated from the ash content after baking this in a crucible was 40% by weight.

【0048】この混合溶液150部に、重合開始剤とし
て2,2’−アゾビスイソブチロニトリル(以下、AI
BNと略)0.15部を溶解させた後、減圧にして溶存
空気を除去し、ガスケットおよび2枚のステンレス製鋼
板により形成され、あらかじめ厚さ3mmになるよう設
定されたセル中に注いだ。その後80℃において5時
間、130℃において2時間重合を行い、キャスト板を
得た。得られたキャスト板の物性の評価結果を表1に示
した。
To 150 parts of this mixed solution, 2,2′-azobisisobutyronitrile (hereinafter referred to as AI) was used as a polymerization initiator.
After dissolving 0.15 parts (abbreviated as BN), dissolved air was removed by reducing the pressure, and the mixture was poured into a cell formed of a gasket and two stainless steel plates and set in advance to a thickness of 3 mm. . Thereafter, polymerization was carried out at 80 ° C. for 5 hours and at 130 ° C. for 2 hours to obtain a cast plate. Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0049】実施例2 撹拌羽根付きガラス製フラスコに、TES98.8部、
メチルトリエトキシシラン(以下、MTESと略)4.
5部およびコロイド状シリカS−1 100部およびエ
タノール80部を入れ、撹拌しながら脱イオン水18部
および36%塩酸0.5部を加えて、70℃に昇温し
た。2時間後、ロータリーエバポレータで減圧下40℃
で揮発分を留去しながらMMAを揮発分の留去と同じ速
度で加え、最後に溶媒をMMAで完全に置換し、濃縮し
て全量を150部とした(SiO2分40重量%)。
Example 2 In a glass flask equipped with a stirring blade, 98.8 parts of TES,
3. Methyltriethoxysilane (hereinafter abbreviated as MTES)
5 parts, 100 parts of colloidal silica S-1 and 80 parts of ethanol were added, and while stirring, 18 parts of deionized water and 0.5 part of 36% hydrochloric acid were added, and the mixture was heated to 70 ° C. After 2 hours, use a rotary evaporator under reduced pressure at 40 ° C.
MMA was added at the same rate as the evaporation of the volatile components while distilling off the volatile components, and finally the solvent was completely replaced with MMA and concentrated to a total amount of 150 parts (SiO 2 content 40% by weight).

【0050】この混合溶液150部に、AIBNを0.
15部加え、実施例1と全く同様の方法で重合させキャ
スト板を得た。得られたキャスト板の物性の評価結果を
表1に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 1 to obtain a cast plate. Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0051】実施例3 撹拌羽根付きガラス製フラスコに、TES98.8部、
MTES4.5部およびメチルアルコール分散コロイド
状シリカ(シリカ含量30重量%、触媒化成工業 (株)
製、商品名OSCAL−1132、以下S−2と略)1
00部を入れ、撹拌しながら脱イオン水36部および3
6重量%塩酸0.5部を加えて、加熱還流した。2時間
後、混合物を冷却し、2−ヒドロキシエチルメタクリレ
ート(以下、HEMAと略)100部を加えてロータリ
ーエバポレータで減圧下40%で揮発分を留去し、さら
に真空ポンプで揮発分を完全に留去し、全量を170部
とした(SiO2 分36重量%)。
Example 3 A glass flask equipped with a stirring blade was charged with 98.8 parts of TES,
4.5 parts of MTES and colloidal silica dispersed in methyl alcohol (silica content: 30% by weight, Catalyst Chemical Industry Co., Ltd.)
OSCAL-1132 (trade name, hereinafter abbreviated as S-2) 1
Add 00 parts and, with stirring, 36 parts of deionized water and 3 parts
0.5 parts of 6% by weight hydrochloric acid was added, and the mixture was heated under reflux. After 2 hours, the mixture was cooled, 100 parts of 2-hydroxyethyl methacrylate (hereinafter abbreviated as HEMA) was added, volatiles were distilled off at 40% under reduced pressure by a rotary evaporator, and the volatiles were completely removed by a vacuum pump. The solvent was distilled off to make the total amount 170 parts (SiO 2 content 36% by weight).

【0052】この混合溶液150部に、AIBNを0.
15部加え、実施例1と全く同様の方法で重合させキャ
スト板を得た。得られたキャスト板の物性の評価結果を
表1に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 1 to obtain a cast plate. Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0053】実施例4 撹拌羽根付きガラス製フラスコに、MTES22.3部
およびコロイド状シリカS−1 200部を入れ、撹拌
しながら脱イオン水14部、36重量%塩酸0.5部を
加えて、70℃に昇温した。2時間後、HEMA10部
を加え、ロータリーエバポレータで減圧下40℃で揮発
分を留去しながらMMAを揮発分の留去と同じ速度で加
え、最後に溶媒をMMAで完全に置換し、濃縮して全量
を135部とした(SiO2 分50重量%)。
Example 4 A glass flask equipped with stirring blades was charged with 22.3 parts of MTES and 200 parts of colloidal silica S-1, and 14 parts of deionized water and 0.5 part of 36% by weight hydrochloric acid were added with stirring. The temperature was raised to 70 ° C. Two hours later, 10 parts of HEMA was added, and MMA was added at 40 ° C. under reduced pressure at a reduced pressure using a rotary evaporator at the same rate as the evaporation of volatiles. Finally, the solvent was completely replaced with MMA and concentrated. The total amount was 135 parts (50% by weight of SiO 2 ).

【0054】この混合溶液135部に、AIBNを0.
13部加え、実施例1と全く同様の方法で重合させキャ
スト板を得た。得られたキャスト板の物性の評価結果を
表1に示した。
AIBN was added to 135 parts of this mixed solution in 0.1 part.
13 parts were added and polymerization was carried out in exactly the same manner as in Example 1 to obtain a cast plate. Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0055】実施例5 撹拌羽根付きガラス製フラスコに、TES98.8部、
MTES4.5部およびコロイド状シリカS−1 10
0部を入れ、撹拌しながら脱イオン水18部および36
重量%塩酸0.5部を加えて、70℃に加熱した。2時
間後、混合物を0℃まで冷却し、予め0℃に冷やしてお
いたチタンテトライソプロポキシド(以下、TTIPと
略)5.0部をイソプロピルアルコール50部に解かし
た溶液中に撹拌しながらゆっくりと加えた。その後ロー
タリーエバポレータで減圧下40℃で揮発分を留去しな
がら、ながらMMAを揮発分の留去と同じ速度で加え、
最後に溶媒をMMAで完全に置換し、濃縮して全量を1
50部とした(SiO2 分40重量%)。
Example 5 98.8 parts of TES was placed in a glass flask equipped with stirring blades.
4.5 parts of MTES and colloidal silica S-1 10
0 parts, and with stirring, 18 parts of deionized water and 36 parts
0.5 parts by weight of hydrochloric acid was added, and the mixture was heated to 70 ° C. After 2 hours, the mixture is cooled to 0 ° C., and while stirring 5.0 parts of titanium tetraisopropoxide (hereinafter abbreviated as TTIP) previously cooled to 0 ° C. in 50 parts of isopropyl alcohol while stirring. Added slowly. Thereafter, MMA was added at the same rate as the evaporation of the volatile components while distilling off the volatile components at 40 ° C. under reduced pressure using a rotary evaporator.
Finally, the solvent was completely replaced with MMA and concentrated to a total volume of 1%.
50 parts (40% by weight of SiO 2 ).

【0056】この混合溶液150部に、AIBNを0.
15部加え、実施例1と全く同様の方法で重合させキャ
スト板を得た。得られたキャスト板の物性の評価結果を
表1に示した。
AIBN was added to 150 parts of the mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 1 to obtain a cast plate. Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0057】実施例6 撹拌羽根付きガラス製フラスコに、MTES22.3部
および水分散コロイド状シリカ(シリカ含量20重量
%、日産化学工業(株)製、商品名スノーテックス−
0、以下S−3と略)300部を入れ、撹拌しながら3
6重量%塩酸0.5部を加えて、70℃に加熱した。2
時間後、混合物を冷却し、HEMA100部を加えた。
水を共沸させるため、エチルセロソルブ100部を加え
てロータリーエバポレータで揮発分を完全に留去し、全
量を170部とした(SiO2 分40重量%)。
Example 6 In a glass flask equipped with stirring blades, 22.3 parts of MTES and water-dispersed colloidal silica (silica content: 20% by weight, manufactured by Nissan Chemical Industry Co., Ltd., trade name: Snowtex-
0, hereafter abbreviated as S-3) 300 parts were added, and 3
0.5 parts of 6% by weight hydrochloric acid was added, and the mixture was heated to 70 ° C. 2
After time, the mixture was cooled and 100 parts of HEMA was added.
In order to azeotrope water, 100 parts of ethyl cellosolve was added, and volatile components were completely distilled off by a rotary evaporator to make the total amount 170 parts (SiO 2 content 40% by weight).

【0058】この混合溶液150部に、AIBNを0.
15部加え、実施例1と全く同様の方法で重合させキャ
スト板を得た。得られたキャスト板の物性の評価結果を
表1に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 1 to obtain a cast plate. Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0059】実施例7〜9 ラジカル重合性ビニル化合物、コロイド状シリカ、シラ
ン化合物の種類と量を表1に示したように変えたことを
除いては実施例1と全く同様にしてキャスト板を得た。
得られたキャスト板の物性の評価結果を表1に示した。
Examples 7 to 9 Cast plates were prepared in exactly the same manner as in Example 1 except that the types and amounts of the radically polymerizable vinyl compound, colloidal silica and silane compound were changed as shown in Table 1. Obtained.
Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0060】比較例1 MMA150重量部にAIBNを0.15部溶解させ、
実施例1と同様な方法で重合を行い、キャスト板を得
た。得られたキャスト板の物性の評価結果を表1に示し
た。
Comparative Example 1 0.15 parts of AIBN was dissolved in 150 parts by weight of MMA.
Polymerization was carried out in the same manner as in Example 1 to obtain a cast plate. Table 1 shows the evaluation results of the physical properties of the obtained cast plate.

【0061】比較例2 コロイド状シリカS−1 100部を、ロータリーエバ
ポレータで減圧下40℃で揮発分を留去しながらMMA
を揮発分の留去と同じ速度で加え、溶媒をMMAで完全
に置換して固形分30重量%の溶液を得よう試みたが、
完全に置換する前に急に溶液粘度が上がってゲル化し、
重合操作ができなくなった。
Comparative Example 2 100 parts of colloidal silica S-1 was subjected to MMA while removing volatile components at 40 ° C. under reduced pressure using a rotary evaporator.
Was added at the same rate as the evaporation of volatiles, and the solvent was completely replaced with MMA to obtain a solution having a solid content of 30% by weight.
Before completely replacing, the solution viscosity suddenly rises and gels,
The polymerization operation could not be performed.

【0062】[0062]

【表1】 合成例 HEMA208部に、テトラクロルシラン68部を、撹
拌しながら室温で4時間かけて滴下した。滴下終了後
0.5時間撹拌を続け、その後50℃に昇温した。1時
間後、ロータリーエバポレーターを用いて揮発成分を完
全に除き、テトラキス(メタクリロイルオキシエトキ
シ)シラン(以下、TMESと略)得た。
[Table 1] Synthesis Example 68 parts of tetrachlorosilane was added dropwise to 208 parts of HEMA at room temperature over 4 hours with stirring. After completion of the dropwise addition, stirring was continued for 0.5 hour, and then the temperature was raised to 50 ° C. One hour later, a volatile component was completely removed using a rotary evaporator to obtain tetrakis (methacryloyloxyethoxy) silane (hereinafter abbreviated as TMES).

【0063】また、HEMA208部の代りに2−ヒド
ロキシエチルアクリレート186部を用いた他同様にし
て、テトラキス(アクリロイルオキシエトキシ)シラン
(以下、TAESと略)得た。
Further, tetrakis (acryloyloxyethoxy) silane (hereinafter abbreviated as TAES) was obtained in the same manner except that 186 parts of 2-hydroxyethyl acrylate was used instead of 208 parts of HEMA.

【0064】実施例10 撹拌羽根付きガラス製フラスコに、合成例で得たTME
S32.6部およびコロイド状シリカS−1 240部
を入れ、撹拌しながら脱イオン水8.6部および36重
量%塩酸0.1部を加えて、70℃に昇温した。2時間
後、ロータリーエバポレータで減圧下40℃で揮発分を
留去しながらMMAを揮発分の留去と同じ速度で加え、
最後に溶媒をMMAで完全に置換し、全量を150部と
した(SiO2 分50重量%)。
Example 10 The TME obtained in Synthesis Example was placed in a glass flask equipped with stirring blades.
S32.6 parts and colloidal silica S-1 240 parts were added, and while stirring, 8.6 parts of deionized water and 0.1 part of 36% by weight hydrochloric acid were added, and the temperature was raised to 70 ° C. After 2 hours, MMA was added at the same rate as the evaporation of volatiles while removing the volatiles at 40 ° C. under reduced pressure using a rotary evaporator.
Finally, the solvent was completely replaced by MMA to make the total amount 150 parts (SiO 2 content 50% by weight).

【0065】この混合液150部に、AIBN0.15
部を溶解させた後、減圧にして溶存空気を除去し、ガス
ケットおよび2枚のステンレス鋼製板により形成され、
あらかじめ厚さ3mmになるよう設定されたセル中に注
いだ。その後80℃において2時間、130℃において
2時間重合を行い、キャスト板を得た。得られたキャス
ト板の物性の評価結果を表2に示した。
AIBN 0.15 was added to 150 parts of the mixture.
After dissolving the part, the pressure is reduced to remove the dissolved air, formed by a gasket and two stainless steel plates,
The mixture was poured into a cell which was previously set to have a thickness of 3 mm. Thereafter, polymerization was carried out at 80 ° C. for 2 hours and at 130 ° C. for 2 hours to obtain a cast plate. Table 2 shows the evaluation results of the physical properties of the obtained cast plate.

【0066】実施例11 撹拌羽根付きガラス製フラスコに、TMES32.6部
およびコロイド状シリカS−1 240部を入れ、撹拌
しながら、脱イオン水4.3部、36重量%塩酸0.1
部を加えて、70℃に昇温した。2時間後、混合物を冷
却し、HEMA75部を加えてロータリーエバポレータ
ーで減圧下40℃で揮発分を留去し、更に真空ポンプで
揮発分を完全に留去し、全量を150部とした(SiO
2 分50重量%)。
Example 11 A glass flask equipped with stirring blades was charged with 32.6 parts of TMES and 240 parts of colloidal silica S-1. While stirring, 4.3 parts of deionized water and 0.1% of 36% by weight hydrochloric acid were added.
Then, the temperature was raised to 70 ° C. After 2 hours, the mixture was cooled, 75 parts of HEMA was added, the volatiles were distilled off at 40 ° C. under reduced pressure by a rotary evaporator, and the volatiles were completely distilled off with a vacuum pump to make the total amount 150 parts (SiO 2).
50% by weight for 2 minutes).

【0067】この混合溶液150部に、AIBNを0.
15部加え、実施例10と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表2に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 10 to obtain a cast plate. Table 2 shows the evaluation results of the physical properties of the obtained cast plate.

【0068】実施例12 撹拌羽根付きガラス製フラスコに、TMES32.6部
およびコロイド状シリカS−2 240部を入れ、撹拌
しながら脱イオン水4.3部、36重量%塩酸0.1部
を加えて、加熱還流した。2時間後、ロータリーエバポ
レーターで減圧下40℃で揮発分を留去しながらMMA
を揮発分の留去と同じ速度で加え、最後に溶媒をMMA
で完全に置換し、濃縮して全量を150部とした(Si
2 分50重量%)。
Example 12 A glass flask equipped with stirring blades was charged with 32.6 parts of TMES and 240 parts of colloidal silica S-2. While stirring, 4.3 parts of deionized water and 0.1 part of 36% by weight hydrochloric acid were added. In addition, the mixture was heated to reflux. After 2 hours, the MMA was distilled off at 40 ° C. under reduced pressure using a rotary evaporator.
At the same rate as the volatiles are distilled off.
And completely concentrated to 150 parts by weight (Si
O 2 minute 50% by weight).

【0069】この混合溶液150部に、AIBNを0.
15部加え、実施例10と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表2に示した。
AIBN was added to 0.1 part of 150 parts of the mixed solution.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 10 to obtain a cast plate. Table 2 shows the evaluation results of the physical properties of the obtained cast plate.

【0070】実施例13 撹拌羽根付きガラス製フラスコに、TMES27.2部
およびコロイド状シリカS−3 300部を入れ、撹拌
しながら36重量%塩酸0.5部を加えて、70℃に加
熱した。2時間後、混合物を冷却し、HEMA95部を
加えた。水を共沸させるため、エチルセロソルブ100
部を加えてロータリーエバポレータで減圧下40℃で揮
発分を留去し、更に、真空ポンプで揮発分を完全に留去
し、全量を157部とした(SiO2 分40重量%)。
Example 13 27.2 parts of TMES and 300 parts of colloidal silica S-3 were placed in a glass flask equipped with stirring blades, and 0.5 part of 36% by weight hydrochloric acid was added with stirring, followed by heating to 70 ° C. . After 2 hours, the mixture was cooled and 95 parts of HEMA were added. Ethyl cellosolve 100 to azeotrope water
The volatile components were distilled off at 40 ° C. under reduced pressure by a rotary evaporator, and the volatile components were completely distilled off by a vacuum pump to make the total amount 157 parts (SiO 2 content: 40% by weight).

【0071】この混合溶液150部に、AIBNを0.
15部加え、実施例10と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表2に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 10 to obtain a cast plate. Table 2 shows the evaluation results of the physical properties of the obtained cast plate.

【0072】実施例14〜16 ラジカル重合性ビニル化合物、コロイド状シリカ、シラ
ン化合物の種類と量および混合溶液中の固形分を表2に
示したように変えたことを除いては、実施例10と全く
同様にしてキャスト板を得た。得られたキャスト板の物
性の評価結果を表2に示した。
Examples 14 to 16 Example 10 was repeated except that the types and amounts of the radically polymerizable vinyl compound, colloidal silica and silane compound and the solid content in the mixed solution were changed as shown in Table 2. A cast plate was obtained in exactly the same manner as described above. Table 2 shows the evaluation results of the physical properties of the obtained cast plate.

【0073】[0073]

【表2】 実施例17 撹拌羽根付きガラス製フラスコに、TES41.6部、
TMES27.2部およびコロイド状シリカS−1 2
00部を入れ、撹拌しながら脱イオン水9部および36
重量%塩酸0.2部を加えて、70℃に昇温した。
[Table 2] Example 17 A glass flask with a stirring blade was charged with 41.6 parts of TES,
27.2 parts of TMES and colloidal silica S-12
Add 00 parts and, with stirring, 9 parts of deionized water and 36 parts.
0.2% by weight of hydrochloric acid was added, and the temperature was raised to 70 ° C.

【0074】2時間後、ロータリーエバポレータで減圧
下40℃で揮発分を留去しながらMMAを揮発分の留去
と同じ速度で加え、最後に溶媒をMMAで完全に置換
し、濃縮して全量を150部とした(SiO2 分50重
量%)。
After 2 hours, MMA was added at the same rate as the evaporation of volatiles while distilling off volatiles at 40 ° C. under reduced pressure using a rotary evaporator. Finally, the solvent was completely replaced with MMA and concentrated to obtain a total amount. Was 150 parts (50% by weight of SiO 2 ).

【0075】この混合溶液150部に、AIBN0.1
5部を溶解させた後、減圧にして溶存空気を除去し、ガ
スケットおよび2枚のステンレス製鋼板により形成さ
れ、あらかじめ厚さ3mmになるよう設定されたセル中
に注いだ。その後80℃において5時間、130℃にお
いて2時間重合を行い、キャスト板を得た。得られたキ
ャスト板の物性の評価結果を表3に示した。
In 150 parts of this mixed solution, 0.1 parts of AIBN were added.
After dissolving 5 parts, the dissolved air was removed under reduced pressure, and the mixture was poured into a cell formed of a gasket and two stainless steel plates and set in advance to a thickness of 3 mm. Thereafter, polymerization was carried out at 80 ° C. for 5 hours and at 130 ° C. for 2 hours to obtain a cast plate. Table 3 shows the evaluation results of the physical properties of the obtained cast plate.

【0076】実施例18 撹拌羽根付きガラス製フラスコに、TES41.6部、
TMES27.2部およびコロイド状シリカS−2 2
00部を入れ、撹拌しながら脱イオン水36部および3
6重量%塩酸0.5部を加えて、加熱還流した。
Example 18 A glass flask equipped with a stirring blade was charged with 41.6 parts of TES,
27.2 parts of TMES and colloidal silica S-22
Add 00 parts and, with stirring, 36 parts of deionized water and 3 parts
0.5 parts of 6% by weight hydrochloric acid was added, and the mixture was heated under reflux.

【0077】2時間後、混合物を冷却し、HEMA75
部を加えてロータリーエバポレータで減圧下40℃で揮
発分を留去し、更に真空ポンプで揮発分を完全に留去
し、全量を150部とした(SiO2 分50重量%)。
After 2 hours, the mixture is cooled and HEMA 75
The volatile components were distilled off at 40 ° C. under reduced pressure by a rotary evaporator, and the volatile components were completely distilled off by a vacuum pump to make the total amount 150 parts (50% by weight of SiO 2 ).

【0078】この混合溶液150部に、AIBNを0.
15部加え、実施例17と全く同様の方法で、重合させ
キャスト板を得た。得られたキャスト板の物性の評価結
果を表3に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was carried out in exactly the same manner as in Example 17 to obtain a cast plate. Table 3 shows the evaluation results of the physical properties of the obtained cast plate.

【0079】実施例19 撹拌羽根付きガラス製フラスコに、MTES26.7
部、TMES27.2部およびコロイド状シリカS−1
200部を入れ、撹拌しながら脱イオン水14部およ
び36重量%塩酸0.5部を加えて、70℃に昇温し
た。
Example 19 MTES 26.7 was placed in a glass flask with stirring blades.
Parts, 27.2 parts of TMES and colloidal silica S-1
200 parts were added, and 14 parts of deionized water and 0.5 part of 36% by weight hydrochloric acid were added with stirring, and the temperature was raised to 70 ° C.

【0080】2時間後、ロータリーエバポレータで減圧
下40℃で揮発分を留去しながらMMAを揮発分の留去
と同じ速度で加え、最後に溶媒をMMAで完全に置換
し、全量を144部とした(SiO2 分50重量%)。
After 2 hours, MMA was added at the same rate as the evaporation of volatiles while distilling off volatiles at 40 ° C. under reduced pressure using a rotary evaporator. Finally, the solvent was completely replaced with MMA. (SiO 2 content 50% by weight).

【0081】この混合溶液135部に、AIBNを0.
13部加え、実施例17と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表3に示した。
AIBN was added to 135 parts of this mixed solution in 0.1 part.
13 parts were added and polymerized in the same manner as in Example 17 to obtain a cast plate. Table 3 shows the evaluation results of the physical properties of the obtained cast plate.

【0082】実施例20 撹拌羽根付きガラス製フラスコに、TES41.6部、
TMES27.2部およびコロイド状シリカS−1 2
00部を入れ、撹拌しながら脱イオン水18部および3
6重量%塩酸0.5部を加えて、70℃に昇温した。
Example 20 A glass flask equipped with a stirring blade was charged with 41.6 parts of TES,
27.2 parts of TMES and colloidal silica S-12
Add 00 parts and, with stirring, 18 parts of deionized water and 3 parts.
0.5 parts of 6% by weight hydrochloric acid was added, and the temperature was raised to 70 ° C.

【0083】2時間後、混合物を0℃まで冷却し、予め
0℃に冷やしておいたTTIP5.0部をイソプロピル
アルコール50部に解かした容液中に、撹拌しながらゆ
っくりと加えた。その後ロータリーエバポレータで減圧
下40℃で揮発分を留去しながらMMAを揮発分の留去
と同じ速度で加え、最後に溶媒をMMAで完全に置換
し、濃縮して全量を190部とした(SiO2 分40重
量%)。
After 2 hours, the mixture was cooled to 0 ° C. and 5.0 parts of TTIP, previously cooled to 0 ° C., were slowly added with stirring to a solution of 50 parts of isopropyl alcohol. Thereafter, MMA was added at the same rate as the evaporation of the volatile components while distilling off the volatile components at 40 ° C. under reduced pressure using a rotary evaporator. Finally, the solvent was completely replaced with MMA and concentrated to a total amount of 190 parts ( SiO 2 content 40% by weight).

【0084】この混合溶液150部に、AIBNを0.
15部加え、実施例17と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表3に示した。
AIBN was added to 150 parts of the mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 17 to obtain a cast plate. Table 3 shows the evaluation results of the physical properties of the obtained cast plate.

【0085】実施例21 撹拌羽根付きガラス製フラスコに、MTES26.7
部、TMES27.2部およびコロイド状シリカS−3
300部を入れ、撹拌しながら36重量%塩酸0.5
部を加えて、70℃に加熱した。
Example 21 A glass flask equipped with stirring blades was charged with MTES 26.7.
Parts, 27.2 parts of TMES and colloidal silica S-3
Add 300 parts and add 0.5% of 36% by weight hydrochloric acid while stirring.
And heated to 70 ° C.

【0086】2時間後、混合物を冷却し、HEMA10
0部を加えた。水を共沸させるため、エチルセロソルブ
100部を加えてロータリーエバポレータで減圧下40
℃で揮発分を留去し、更に真空ポンプで揮発分を完全に
留去し、全量を180部とした(SiO2 分40重量
%)。
After 2 hours, the mixture was cooled and HEMA 10
0 parts were added. To azeotrope water, add 100 parts of ethyl cellosolve and reduce the pressure by a rotary evaporator under reduced pressure.
Volatile components were distilled off at ℃, and the volatile components were further completely removed by a vacuum pump to make the total amount 180 parts (SiO 2 content 40% by weight).

【0087】この混合溶液150部に、AIBNを0.
15部加え、実施例17と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表3に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 17 to obtain a cast plate. Table 3 shows the evaluation results of the physical properties of the obtained cast plate.

【0088】実施例22〜24 ラジカル重合性ビニル化合物、コロイド状シリカ、シラ
ン化合物の種類と量を表3に示したように変えたことを
除いては実施例17と全く同様にしてキャスト板を得
た。得られたキャスト板の物性の評価結果を表3に示し
た。
Examples 22 to 24 Except that the types and amounts of the radically polymerizable vinyl compound, colloidal silica, and silane compound were changed as shown in Table 3, a cast plate was prepared in the same manner as in Example 17. Obtained. Table 3 shows the evaluation results of the physical properties of the obtained cast plate.

【0089】[0089]

【表3】 実施例25 撹拌羽根付きガラス製フラスコに、γ−メタクリロイル
オキシプロピルトリメトキシシラン(以下、MPTMS
と略)29.8部、コロイド状シリカS−1240部を
入れ、撹拌しながら脱イオン水6.5部および36重量
%塩酸0.1部を加えて、70℃に昇温した。2時間
後、ロータリーエバポレータで減圧下40℃で揮発分を
留去しながらMMAを揮発分の留去と同じ速度で加え、
最後に溶媒をMMAで完全に置換し、濃縮して全量を1
58部とした(SiO2 分50重量%)。
[Table 3] Example 25 A glass flask equipped with stirring blades was charged with γ-methacryloyloxypropyltrimethoxysilane (hereinafter referred to as MPTMS).
29.8 parts) and 6.5 parts of deionized water and 0.1 part of 36% by weight hydrochloric acid were added with stirring, and the temperature was raised to 70 ° C. After 2 hours, MMA was added at the same rate as the evaporation of volatiles while removing the volatiles at 40 ° C. under reduced pressure using a rotary evaporator.
Finally, the solvent was completely replaced with MMA and concentrated to a total volume of 1%.
58 parts (50% by weight of SiO 2 ).

【0090】この混合溶液150部に、AIBN0.1
5部を溶解させた後、減圧にして溶存空気を除去し、ガ
スケットおよび2枚のステンレス製鋼板により形成さ
れ、あらかじめ厚さ3mmになるよう設定されたセル中
に注いだ。その後80℃において2時間、130℃にお
いて2時間重合を行い、キャスト板を得た。得られたキ
ャスト板の物性の評価結果を表4に示した。
To 150 parts of this mixed solution was added 0.1 parts of AIBN.
After dissolving 5 parts, the dissolved air was removed under reduced pressure, and the mixture was poured into a cell formed of a gasket and two stainless steel plates and set in advance to a thickness of 3 mm. Thereafter, polymerization was carried out at 80 ° C. for 2 hours and at 130 ° C. for 2 hours to obtain a cast plate. Table 4 shows the evaluation results of the physical properties of the obtained cast plate.

【0091】実施例26 撹拌羽根付きガラス製フラスコに、ビニルトリメトキシ
シラン(以下、VTMSと略)17.8部およびコロイ
ド状シリカS−1 240部を入れ、撹拌しながら脱イ
オン水6.5部および36重量%塩酸0.1部を加え
て、70℃に加熱した。2時間後、混合物を冷却し、H
EMA10部を加えてロータリーエバポレータで減圧下
40℃で揮発分を留去しながらMMAを揮発分の留去と
同じ速度で加え、最後に溶媒をMMAで完全に置換し、
濃縮して全量を158部とした(SiO2 分50重量
%)。
Example 26 17.8 parts of vinyltrimethoxysilane (hereinafter abbreviated as VTMS) and 240 parts of colloidal silica S-1 were placed in a glass flask equipped with stirring blades, and 6.5 parts of deionized water was stirred. And 0.1 part of 36% by weight hydrochloric acid were added, and the mixture was heated to 70 ° C. After 2 hours, the mixture was cooled and H
10 parts of EMA was added, and MMA was added at the same rate as the evaporation of volatiles while removing volatiles at 40 ° C. under reduced pressure using a rotary evaporator. Finally, the solvent was completely replaced with MMA.
It was concentrated to a total amount of 158 parts (SiO 2 content: 50% by weight).

【0092】この混合溶液150部に、AIBN0.1
5部を加え、実施例25と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表4に示した。
To 150 parts of this mixed solution was added AIBN 0.1
Five parts were added and polymerization was carried out in exactly the same manner as in Example 25 to obtain a cast plate. Table 4 shows the evaluation results of the physical properties of the obtained cast plate.

【0093】実施例27 撹拌羽根付きガラス製フラスコに、MPTMS29.8
部およびコロイド状シリカS−2 240部を入れ、撹
拌しながら脱イオン水6.5部および36重量%塩酸
0.1部を加えて、70℃に昇温した。2時間後、混合
物を冷却し、HEMA75部を加え、ロータリーエバポ
レータで減圧下40℃で揮発分を留去し、更に真空ポン
プで揮発分を完全に留去して全量を158部とした(S
iO2 分50重量%)。
Example 27 MPTMS 29.8 was added to a glass flask equipped with stirring blades.
Parts and 240 parts of colloidal silica S-2, 6.5 parts of deionized water and 0.1 part of 36% by weight hydrochloric acid were added with stirring, and the temperature was raised to 70 ° C. After 2 hours, the mixture was cooled, 75 parts of HEMA was added, the volatiles were distilled off at 40 ° C. under reduced pressure using a rotary evaporator, and the volatiles were completely distilled off with a vacuum pump to a total amount of 158 parts (S
iO 2 50% by weight).

【0094】この混合溶液150部に、AIBNを0.
15部加え、実施例25と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表4に示した。
AIBN was added to 0.1 part of the mixed solution in 150 parts.
Fifteen parts were added and polymerization was carried out in exactly the same manner as in Example 25 to obtain a cast plate. Table 4 shows the evaluation results of the physical properties of the obtained cast plate.

【0095】実施例28〜32 ラジカル重合性ビニル化合物、コロイド状シリカ、シラ
ン化合物の種類と量、および混合溶液中の固形分の割合
を表4に示したように変えたことを除いては、実施例2
5と全く同様にしてキャスト板を得た。得られたキャス
ト板の物性の評価結果を表4に示した。
Examples 28-32 The radical polymerizable vinyl compound, colloidal silica, the type and amount of the silane compound, and the proportion of solids in the mixed solution were changed as shown in Table 4, except that: Example 2
A cast plate was obtained in exactly the same manner as in No. 5. Table 4 shows the evaluation results of the physical properties of the obtained cast plate.

【0096】[0096]

【表4】 表中の略称は、以下の通りである。 MCTMS:γ−メルカプトプロピルトリメトキシシラ
ン MPDMS:γ−メタクリロイルオキシプロピルジメト
キシメチルシラン VPTMS:p−ビニルフェニルメチルジメトキシシラ
ン 実施例33 撹拌羽根付きガラス製フラスコに、TES98.8部、
MPTMS6.2部、コロイド状シリカS−1 100
部およびエタノール80部を入れ、撹拌しながら脱イオ
ン水18部および36重量%塩酸0.5部を加えて、7
0℃に昇温した。
[Table 4] Abbreviations in the table are as follows. MCTMS: γ-mercaptopropyltrimethoxysilane MPDMS: γ-methacryloyloxypropyldimethoxymethylsilane VPTMS: p-vinylphenylmethyldimethoxysilane Example 33 98.8 parts of TES was placed in a glass flask with stirring blades.
6.2 parts of MPTMS, colloidal silica S-1 100
And 80 parts of ethanol, 18 parts of deionized water and 0.5 part of 36% by weight hydrochloric acid were added while stirring, and
The temperature was raised to 0 ° C.

【0097】2時間後、ロータリーエバポレータで減圧
下40℃で揮発分を留去しながらMMAを揮発分の留去
と同じ速度で加え、最後に溶媒をMMAで完全に置換
し、濃縮して全量を150部とした(SiO2 分40重
量%)。
After 2 hours, MMA was added at the same rate as the evaporation of volatiles while distilling off volatiles at 40 ° C. under reduced pressure using a rotary evaporator. Finally, the solvent was completely replaced with MMA and concentrated to obtain a total amount. Was set to 150 parts (SiO 2 content: 40% by weight).

【0098】この混合溶液150部に、AIBN0.1
5部を溶解させた後、減圧にして溶存空気を除去し、ガ
スケットおよび2枚のステンレス製鋼板により形成さ
れ、あらかじめ厚さ3mmになるよう設定されたセル中
に注いだ。その後80℃において2時間、130℃にお
いて2時間重合を行い、キャスト板を得た。得られたキ
ャスト板の物性の評価結果を表5に示した。
In 150 parts of this mixed solution, 0.1 parts of AIBN were added.
After dissolving 5 parts, the dissolved air was removed under reduced pressure, and the mixture was poured into a cell formed of a gasket and two stainless steel plates and set in advance to a thickness of 3 mm. Thereafter, polymerization was carried out at 80 ° C. for 2 hours and at 130 ° C. for 2 hours to obtain a cast plate. Table 5 shows the evaluation results of the physical properties of the obtained cast plate.

【0099】実施例34 撹拌羽根付きガラス製フラスコに、TES98.8部、
MPTMS6.2部およびコロイド状シリカS−2 1
00部を入れ、撹拌しながら脱イオン水36部および3
6重量%塩酸0.5部を加えて、加熱還流した。
Example 34 A glass flask equipped with a stirring blade was charged with 98.8 parts of TES,
6.2 parts of MPTMS and colloidal silica S-21
Add 00 parts and, with stirring, 36 parts of deionized water and 3 parts
0.5 parts of 6% by weight hydrochloric acid was added, and the mixture was heated under reflux.

【0100】2時間後、混合物を冷却し、HEMA10
0部を加えてロータリーエバポレータで減圧下40℃で
揮発分を留去し、更に真空ポンプで揮発分を完全に留去
し、全量を170部とした(SiO2 分36重量%)。
After 2 hours, the mixture was cooled and HEMA 10
0 parts were added and volatile components were distilled off at 40 ° C. under reduced pressure by a rotary evaporator, and then the volatile components were completely distilled off by a vacuum pump to make the total amount 170 parts (SiO 2 content 36% by weight).

【0101】この混合溶液150部に、AIBNを0.
15部加え、実施例33と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表5に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 33 to obtain a cast plate. Table 5 shows the evaluation results of the physical properties of the obtained cast plate.

【0102】実施例35 撹拌羽根付きガラス製フラスコに、TES22.9部、
VTMS16.3部およびコロイド状シリカS−1 2
20部を入れ、撹拌しながら脱イオン水6部、36重量
%塩酸0.1部を加えて、70℃に昇温した。
Example 35 A glass flask equipped with a stirring blade was charged with 22.9 parts of TES,
16.3 parts of VTMS and colloidal silica S-12
20 parts were added, and while stirring, 6 parts of deionized water and 0.1 part of 36% by weight hydrochloric acid were added, and the temperature was raised to 70 ° C.

【0103】2時間後、HEMA10部を加え、ロータ
リーエバポレータで減圧下40℃で揮発分を留去しなが
らMMAを揮発分の留去と同じ速度で加え、最後に溶媒
をMMAで完全に置換し、濃縮して全量を160部とし
た(SiO2 分50重量%)。
Two hours later, 10 parts of HEMA was added, and MMA was added at the same rate as the evaporation of volatiles while removing volatiles at 40 ° C. under reduced pressure using a rotary evaporator. Finally, the solvent was completely replaced with MMA. And concentrated to a total amount of 160 parts (SiO 2 content 50% by weight).

【0104】この混合溶液130部に、AIBNを0.
13部加え、実施例33と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表5に示した。
AIBN was added to 130 parts of this mixed solution in 0.1 part.
13 parts were added and polymerized in the same manner as in Example 33 to obtain a cast plate. Table 5 shows the evaluation results of the physical properties of the obtained cast plate.

【0105】実施例36 撹拌羽根付きガラス製フラスコに、TES98.8部、
MPTMS6.2部およびコロイド状シリカS−1 1
00部を入れ、撹拌しながら脱イオン水18部および3
6重量%塩酸0.5部を加えて、70℃に昇温した。
Example 36 A glass flask equipped with a stirring blade was charged with 98.8 parts of TES,
6.2 parts of MPTMS and colloidal silica S-11
Add 00 parts and, with stirring, 18 parts of deionized water and 3 parts.
0.5 parts of 6% by weight hydrochloric acid was added, and the temperature was raised to 70 ° C.

【0106】2時間後、混合物を0℃まで冷却し、予め
0℃に冷しておいたTTIP5.0部をイソプロピルア
ルコール50部に解かした溶液中に、撹拌しながらゆっ
くりと加えた。その後ロータリーエバポレータで減圧下
40℃で揮発分を留去しながらMMAを揮発分の留去と
同じ速度で加え、最後に溶媒をMMAで完全に置換し、
濃縮して全量を150部とした(SiO2 分40重量
%)。
After 2 hours, the mixture was cooled to 0 ° C. and slowly added with stirring to a solution of 5.0 parts of TTIP, previously cooled to 0 ° C., dissolved in 50 parts of isopropyl alcohol. Thereafter, MMA was added at the same rate as the evaporation of volatiles while distilling off volatiles at 40 ° C. under reduced pressure using a rotary evaporator. Finally, the solvent was completely replaced with MMA.
It was concentrated to a total amount of 150 parts (SiO 2 content: 40% by weight).

【0107】この混合溶液150部に、AIBNを0.
15部加え、実施例33と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表5に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 33 to obtain a cast plate. Table 5 shows the evaluation results of the physical properties of the obtained cast plate.

【0108】実施例37 撹拌羽根付きガラス製フラスコに、MTES22.3
部、MPTMS6.2部およびコロイド状シリカS−3
300部を入れ、撹拌しながら36重量%塩酸0.5
部を加えて70℃に加熱した。
Example 37 MTES 22.3 was placed in a glass flask with stirring blades.
Parts, 6.2 parts MPTMS and colloidal silica S-3
Add 300 parts and add 0.5% of 36% by weight hydrochloric acid while stirring.
And heated to 70 ° C.

【0109】2時間後、混合物を冷却し、HEMA10
0部を加えた。水を共沸させるため、エチルセロソルブ
100部を加えてロータリーエバポレータで減圧下40
℃で揮発分を留去し、更に真空ポンプで揮発分を完全に
留去し、全量を172部とした(SiO2 分40重量
%)。
After 2 hours, the mixture was cooled and HEMA 10
0 parts were added. To azeotrope water, add 100 parts of ethyl cellosolve and reduce the pressure by a rotary evaporator under reduced pressure.
Volatile components were distilled off at ℃, and the volatile components were further completely removed by a vacuum pump to make the total amount 172 parts (SiO 2 content 40% by weight).

【0110】この混合溶液150部に、AIBNを0.
15部加え、実施例33と全く同様の方法で重合させキ
ャスト板を得た。得られたキャスト板の物性の評価結果
を表5に示した。
AIBN was added to 150 parts of this mixed solution in 0.1 part.
Fifteen parts were added, and polymerization was performed in the same manner as in Example 33 to obtain a cast plate. Table 5 shows the evaluation results of the physical properties of the obtained cast plate.

【0111】実施例38〜42 ラジカル重合性ビニル化合物、コロイド状シリカ、シラ
ン化合物の種類と量を表1に示したように変えたことを
除いては実施例1と全く同様にしてキャスト板を得た。
得られたキャスト板の物性の評価結果を表5に示した。
Examples 38 to 42 Cast plates were prepared in exactly the same manner as in Example 1 except that the types and amounts of the radically polymerizable vinyl compound, colloidal silica, and silane compound were changed as shown in Table 1. Obtained.
Table 5 shows the evaluation results of the physical properties of the obtained cast plate.

【0112】[0112]

【表5】 表中の略称は、以下の通りである。 VPDMS:p−ビニルフェニルメチルジメトキシシラ
ン MCTMS:γ−メルカプトプロピルトリメトキシシラ
[Table 5] Abbreviations in the table are as follows. VPDMS: p-vinylphenylmethyldimethoxysilane MCTMS: γ-mercaptopropyltrimethoxysilane

【0113】[0113]

【発明の効果】本発明により、優れた透明性、耐熱性、
剛性および靭性を有する複合体組成物が提供された。こ
の複合体組成物は、従来無機ガラスが使われていた用
途、すなわち家屋や車輌の窓ガラスなど種々の用途に有
用である。
According to the present invention, excellent transparency, heat resistance,
A composite composition having stiffness and toughness has been provided. The composite composition is useful for various applications in which inorganic glass has been used conventionally, that is, for various applications such as window glasses for houses and vehicles.

フロントページの続き (31)優先権主張番号 特願平3−243402 (32)優先日 平3(1991)9月24日 (33)優先権主張国 日本(JP) (31)優先権主張番号 特願平3−243403 (32)優先日 平3(1991)9月24日 (33)優先権主張国 日本(JP) (72)発明者 渡辺 博之 広島県大竹市御幸町20番1号 三菱レイ ヨン株式会社中央研究所内 (56)参考文献 特開 昭63−312311(JP,A) 特開 平4−270710(JP,A) 「Journal of Appli ed Polymer Scienc e」,Vol.27,p2921−2931,1989 (58)調査した分野(Int.Cl.6,DB名) C08F 283/12 C08F 2/44 C08K 3/36 C08L 83/04 - 83/08 CA(STN)Continued on the front page (31) Priority claim number Japanese Patent Application No. 3-243402 (32) Priority date Heisei 3 (1991) September 24 (33) Priority claim country Japan (JP) (31) Priority claim number Special Ganpei 3-243403 (32) Priority Date Hei 3 (1991) September 24 (33) Priority Country Japan (JP) (72) Inventor Hiroyuki Watanabe 20-1 Miyukicho, Otake City, Hiroshima Prefecture Mitsubishi Rayon (56) References JP-A-63-312311 (JP, A) JP-A-4-270710 (JP, A) "Journal of Applied Polymer Science", Vol. 27, p2921-2931, 1989 (58) Fields investigated (Int. Cl. 6 , DB name) C08F 283/12 C08F 2/44 C08K 3/36 C08L 83/04-83/08 CA (STN)

Claims (13)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 ラジカル重合性ビニル化合物(A)を、
コロイド状シリカ分散系中で下記一般式(1) SiR1 a2 b(OR3c (1) (式中、R1 、R2 はエーテル結合、エステル結合また
は炭素−炭素二重結合を有していてもよい炭素数1〜1
0炭化水素残基、R3 は水素原子またはエーテル結合、
エステル結合もしくは炭素−炭素二重結合を有していて
もよい炭素数1〜10の炭化水素残基、a、bは0〜3
の整数、cは4−a−bであって、1〜4の整数を表わ
す。)で表わされる少なくとも1種のシラン化合物を加
水分解、縮重合させて得られたシリカ系縮重合体(B)
の存在下で重合させてなる複合体組成物であって、シリ
カ系縮重合体(B)のシリカ骨格と、ラジカル重合性ビ
ニル化合物(A)の重合体とがセミIPN構造を形成し
てなる複合体組成物。
1. A radically polymerizable vinyl compound (A),
In a colloidal silica dispersion, the following general formula (1): SiR 1 a R 2 b (OR 3 ) c (1) (wherein R 1 and R 2 represent an ether bond, an ester bond or a carbon-carbon double bond) 1 to 1 carbon atoms that may be present
0 hydrocarbon residue, R 3 is a hydrogen atom or an ether bond,
A hydrocarbon residue having 1 to 10 carbon atoms which may have an ester bond or a carbon-carbon double bond;
And c is 4-ab, and represents an integer of 1 to 4. (B) a silica-based condensation polymer obtained by hydrolyzing and condensation-polymerizing at least one silane compound represented by the formula (B):
A complex composition obtained by polymerizing in the presence, Siri
The silica skeleton of the polycondensate (B) and the radical polymerizable polymer
Forms a semi-IPN structure with a polymer of the benzyl compound (A)
A composite composition comprising:
【請求項2】 ラジカル重合性ビニル化合物(A)が、
メタクリル酸エステルである請求項1記載の複合体組成
物。
2. The radically polymerizable vinyl compound (A) is
The composite composition according to claim 1, which is a methacrylate ester.
【請求項3】 SiO2 分含量が15重量%以上で、か
つ板厚3mmにおいて測定した曇価が5%以下である請
求項1または2記載の複合体組成物。
3. The composite composition according to claim 1, wherein the content of SiO 2 is 15% by weight or more, and the haze value measured at a plate thickness of 3 mm is 5% or less.
【請求項4】 シラン化合物が、下記一般式(2) SiR4 a5 b(OR6c (2) (式中、R4 、R5 はエーテル結合またはエステル結合
を有してもよい炭素数1〜10の炭化水素残基、R6
水素原子または炭素数1〜10の炭化水素残基、a、b
は0〜3の整数、cは4−a−bであって、1〜4の整
数を表わす。)で表わされるものの一種以上である請求
項1または2記載の複合体組成物。
4. A silane compound represented by the following general formula (2): SiR 4 a R 5 b (OR 6 ) c (2) wherein R 4 and R 5 may have an ether bond or an ester bond. A hydrocarbon residue having 1 to 10 carbon atoms, R 6 is a hydrogen atom or a hydrocarbon residue having 1 to 10 carbon atoms, a, b
Is an integer of 0 to 3, c is 4-ab, and represents an integer of 1 to 4. 3. The composite composition according to claim 1, which is one or more of the compounds represented by the formula (1).
【請求項5】 シラン化合物が、下記一般式(3) SiR4 n(O-CH2CH2-O-CO-(R7)C=CH2)4-n (3) (式中、R4 はエーテル結合またはエステル結合を有し
てもよい炭素数1〜10の炭化水素残基、R7 は水素原
子またはメチル基、nは0〜2の整数を表わす。)で表
わされるものの一種以上である請求項1または2記載の
複合体組成物。
5. A silane compound represented by the following general formula (3): SiR 4 n (O—CH 2 CH 2 —O—CO— (R 7 ) C = CH 2 ) 4-n (3) 4 is a hydrocarbon residue having 1 to 10 carbon atoms which may have an ether bond or an ester bond, R 7 is a hydrogen atom or a methyl group, and n is an integer of 0 to 2). The composite composition according to claim 1 or 2, wherein
【請求項6】 シラン化合物が、下記一般式(2)で表
わされるものの一種以上と下記一般式(3)で表わされ
るものの一種以上 SiR4 a5 b(OR6c (2) SiR4 n(O-CH2CH2-O-CO-(R7)C=CH2)4-n (3) (式中、R4 、R5 はエーテル結合またはエステル結合
を有してもよい炭素数1〜10の炭化水素残基、R6
水素原子または炭素数1〜10の炭化水素残基、R7
水素原子またはメチル基、a、bは0〜3の整数、cは
4−a−bであって、1〜4の整数、nは0〜2の整数
を表わす。)との混合物である請求項1または2記載の
複合体組成物。
6. The silane compound is at least one of those represented by the following general formula (2) and at least one of those represented by the following general formula (3): SiR 4 a R 5 b (OR 6 ) c (2) SiR 4 n (O—CH 2 CH 2 —O—CO— (R 7 ) C = CH 2 ) 4-n (3) (wherein R 4 and R 5 are carbon atoms which may have an ether bond or an ester bond) A hydrocarbon residue of the number 1 to 10, R 6 is a hydrogen atom or a hydrocarbon residue of 1 to 10 carbon atoms, R 7 is a hydrogen atom or a methyl group, a and b are integers of 0 to 3, c is 4- a-b, wherein n is an integer of 1 to 4 and n is an integer of 0 to 2).
【請求項7】 シラン化合物が、下記一般式(4)〜
(7) CH2=C(R7)COO(CH2)pSiR8 n(OR6)3-n (4) CH2=CHSiR8 n(OR6)3-n (5) HS(CH2)p-SiR8 n(OR6)3-n (6) 【化1】 (式中、R6 は水素原子または炭素数1〜10の炭化水
素残基、R7 は水素原子またはメチル基、R8 炭素数1
〜3のアルキル基またはフェニル基、nは0〜2の整
数、pは1〜6の整数を表わす。)で表わされるものの
一種以上である請求項1または2記載の複合体組成物。
7. The silane compound represented by the following general formula (4)
(7) CH 2 = C (R 7 ) COO (CH 2 ) p SiR 8 n (OR 6 ) 3-n (4) CH 2 = CHSiR 8 n (OR 6 ) 3-n (5) HS (CH 2 ) p -SiR 8 n (OR 6 ) 3-n (6) (Wherein, R 6 is a hydrogen atom or a hydrocarbon residue having 1 to 10 carbon atoms, R 7 is a hydrogen atom or a methyl group, R 8 carbon atoms 1
To 3 alkyl groups or phenyl groups, n represents an integer of 0 to 2, and p represents an integer of 1 to 6. 3. The composite composition according to claim 1, which is one or more of the compounds represented by the formula (1).
【請求項8】 シラン化合物が、下記一般式(2)で表
わされるものの一種以上と下記一般式(4)〜(7)で
表わされるものの一種以上 SiR4 a5 b(OR6c (2) CH2=C(R7)COO(CH2)pSiR8 n(OR6)3-n (4) CH2=CHSiR8 n(OR6)3-n (5) HS(CH2)p-SiR8 n(OR6)3-n (6) 【化2】 (式中、R4 、R5 はエーテル結合またはエステル結合
を有してもよい炭素数1〜10の炭化水素残基、R6
水素原子または炭素数1〜10の炭化水素残基、R7
水素原子またはメチル基、R8 炭素数1〜3のアルキル
基またはフェニル基、a、bは0〜3の整数、cは4−
a−bであって、1〜4の整数、nは0〜2の整数、p
は1〜6の整数を表わす。)との混合物である請求項1
または2記載の複合体組成物。
8. The silane compound is one or more of those represented by the following general formula (2) and one or more of those represented by the following general formulas (4) to (7): SiR 4 a R 5 b (OR 6 ) c ( 2) CH 2 = C (R 7 ) COO (CH 2 ) p SiR 8 n (OR 6 ) 3-n (4) CH 2 = CHSiR 8 n (OR 6 ) 3-n (5) HS (CH 2 ) p- SiR 8 n (OR 6 ) 3-n (6) (Wherein, R 4 and R 5 are a hydrocarbon residue having 1 to 10 carbon atoms which may have an ether bond or an ester bond; R 6 is a hydrogen atom or a hydrocarbon residue having 1 to 10 carbon atoms; 7 is a hydrogen atom or a methyl group, R 8 is an alkyl group having 1 to 3 carbon atoms or a phenyl group, a and b are integers of 0 to 3, c is 4-
ab, an integer of 1-4, n is an integer of 0-2, p
Represents an integer of 1 to 6. ).
Or the composite composition according to 2.
【請求項9】 ラジカル重合性ビニル化合物(A)また
はその部分重合体中に、コロイド状シリカ分散系中で下
記一般式(1) SiR1 a2 b(OR3c (1) (式中、R1 、R2 はエーテル結合、エステル結合また
は炭素−炭素二重結合を有していてもよい炭素数1〜1
0炭化水素残基、R3 は水素原子またはエーテル結合、
エステル結合もしく炭素−炭素二重結合を有していても
よい炭素数1〜10の炭化水素残基、a、bは0〜3の
整数、cは4−a−bであって、1〜4の整数を表わ
す。)で表わされるシラン化合物を加水分解、縮重合さ
せて得られたシリカ系縮重合体(B)を溶解した混合溶
液を調製し、次いでこの混合溶液のラジカル重合を実施
する工程を有することを特徴とするシリカ系縮重合体
(B)のシリカ骨格と、ラジカル重合性ビニル化合物
(A)の重合体とがセミIPN構造を形成してなる複合
体組成物の製造方法。
9. In a radically polymerizable vinyl compound (A) or a partial polymer thereof, in a colloidal silica dispersion, the following general formula (1): SiR 1 a R 2 b (OR 3 ) c (1) Wherein R 1 and R 2 each have 1 to 1 carbon atoms which may have an ether bond, an ester bond or a carbon-carbon double bond.
0 hydrocarbon residue, R 3 is a hydrogen atom or an ether bond,
A hydrocarbon residue having 1 to 10 carbon atoms which may have an ester bond or a carbon-carbon double bond, a and b are integers of 0 to 3, c is 4-ab, Represents an integer of 44. ), A step of preparing a mixed solution in which a silica-based condensed polymer (B) obtained by hydrolyzing and condensing a silane compound represented by formula (1) is dissolved, and then performing a radical polymerization of the mixed solution. Silica-based condensation polymer
(B) Silica skeleton and radically polymerizable vinyl compound
A method for producing a composite composition comprising the polymer (A) and a semi-IPN structure .
【請求項10】 前記混合溶液のラジカル重合と、混合
溶液中のシリカ系縮重合体(B)の更なる縮重合を同時
に実施する請求項9記載の複合体組成物の製造方法。
10. The method for producing a composite composition according to claim 9, wherein the radical polymerization of the mixed solution and the further polycondensation of the silica-based polycondensate (B) in the mixed solution are simultaneously carried out.
【請求項11】 前記混合溶液のラジカル重合と、シリ
カ系縮重合体(B)の更なる縮重合を、40〜150℃
の温度下に実施する請求項10記載の複合体組成物の製
造方法。
11. The radical polymerization of the mixed solution and the further condensation polymerization of the silica-based condensation polymer (B) are carried out at 40 to 150 ° C.
The method for producing a composite composition according to claim 10, which is carried out at a temperature of:
【請求項12】 シリカ系縮重合体(B)を溶媒に溶解
した溶液に成分(A)を混合した後、この混合液から成
分(B)の溶媒および水を留去して前記混合液を調製す
る請求項9記載の複合体組成物の製造方法。
12. After the component (A) is mixed with a solution in which the silica-based condensation polymer (B) is dissolved in a solvent, the solvent and water of the component (B) are distilled off from the mixed solution to obtain the mixed solution. The method for producing the composite composition according to claim 9, which is prepared.
【請求項13】 シリカ系縮重合体(B)を溶媒に溶解
した溶液から該溶媒および水を除去しつつ(A)成分を
添加して前記混合液を調製する請求項9記載の複合体組
成物の製造方法。
13. The composite composition according to claim 9, wherein the mixed solution is prepared by adding the component (A) while removing the solvent and water from a solution in which the silica-based condensation polymer (B) is dissolved in the solvent. Method of manufacturing a product.
JP25475092A 1991-09-24 1992-09-24 Composite composition excellent in transparency and method for producing the same Expired - Lifetime JP2902525B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25475092A JP2902525B2 (en) 1991-09-24 1992-09-24 Composite composition excellent in transparency and method for producing the same

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP3-243398 1991-09-24
JP24340291 1991-09-24
JP3-243402 1991-09-24
JP3-243401 1991-09-24
JP24339791 1991-09-24
JP3-243397 1991-09-24
JP3-243403 1991-09-24
JP24340191 1991-09-24
JP24339891 1991-09-24
JP24340391 1991-09-24
JP25475092A JP2902525B2 (en) 1991-09-24 1992-09-24 Composite composition excellent in transparency and method for producing the same

Publications (2)

Publication Number Publication Date
JPH05209027A JPH05209027A (en) 1993-08-20
JP2902525B2 true JP2902525B2 (en) 1999-06-07

Family

ID=27554154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25475092A Expired - Lifetime JP2902525B2 (en) 1991-09-24 1992-09-24 Composite composition excellent in transparency and method for producing the same

Country Status (1)

Country Link
JP (1) JP2902525B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013118713A1 (en) 2012-02-10 2013-08-15 昭和電工株式会社 Curable composition and application therefor

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6063830A (en) * 1996-12-06 2000-05-16 Kabushiki Kaisha Shofu Dental curable composition and artificial tooth
WO2002014433A1 (en) 2000-08-11 2002-02-21 Sun Medical Co., Ltd. Polymerizable composition, cured object obtained therefrom, and composite material
JP2004331883A (en) * 2003-05-09 2004-11-25 Nissan Motor Co Ltd Composite resin composition intermediate, composite resin composition, method for producing composite resin composition intermediate, and method for producing composite resin composition
DE102005000824A1 (en) * 2005-01-05 2006-07-13 Consortium für elektrochemische Industrie GmbH Nanoparticle-containing organocopolymers
EP2110389A1 (en) * 2008-04-18 2009-10-21 Nanoresins AG Polymerisable substance with connected nanoparticles
EP2298822B1 (en) 2008-07-03 2013-02-27 Showa Denko K.K. Hardening composition and resultant hardened material
SG178391A1 (en) 2009-08-13 2012-04-27 Fujifilm Corp Wafer level, lens, production method of wafer level lens, and imaging unit
JP5352392B2 (en) 2009-09-14 2013-11-27 富士フイルム株式会社 Wafer level lens array manufacturing method, wafer level lens array, lens module, and imaging unit
JP5401227B2 (en) 2009-09-16 2014-01-29 富士フイルム株式会社 Wafer level lens array manufacturing method, wafer level lens array, lens module, and imaging unit
JP2011084060A (en) 2009-09-17 2011-04-28 Fujifilm Corp Master model of lens array and method of manufacturing the same
JP5572355B2 (en) 2009-09-30 2014-08-13 富士フイルム株式会社 Lens array and lens array laminate
JP2011098487A (en) 2009-11-05 2011-05-19 Fujifilm Corp Element array mold and element array molded using the mold
JP2011161727A (en) 2010-02-08 2011-08-25 Fujifilm Corp Molding die of optical molded product, method of molding optical molded product, and lens array
JP2011180293A (en) 2010-02-26 2011-09-15 Fujifilm Corp Lens array
JP2011180292A (en) 2010-02-26 2011-09-15 Fujifilm Corp Lens array
JP2011209699A (en) 2010-03-10 2011-10-20 Fujifilm Corp Wafer lens array and method for manufacturing the same
JP2011186306A (en) 2010-03-10 2011-09-22 Fujifilm Corp Wafer lens unit and method for manufacturing the same
EP2369371A3 (en) 2010-03-10 2013-05-01 Fujifilm Corporation Wafer lens array and method for manufacturing the same
JP2011197480A (en) 2010-03-19 2011-10-06 Fujifilm Corp Lens array, method for manufacturing the same,and lens and method for manufacturing the same
JP2011197479A (en) 2010-03-19 2011-10-06 Fujifilm Corp Lens, lens array, and manufacturing method thereof
JP5647808B2 (en) 2010-03-30 2015-01-07 富士フイルム株式会社 Lens array master manufacturing method
KR20160147707A (en) * 2014-04-18 2016-12-23 닛산 가가쿠 고교 가부시키 가이샤 Polymerizable resin composition comprising reactive silicone compound
JP7406313B2 (en) * 2018-10-18 2023-12-27 株式会社アドマテックス Transparent resin composition for melt-kneading and molding processing, method for producing the same, and transparent resin molded product

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
「Journal of Applied Polymer Science」,Vol.27,p2921−2931,1989

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013118713A1 (en) 2012-02-10 2013-08-15 昭和電工株式会社 Curable composition and application therefor
KR20140120939A (en) 2012-02-10 2014-10-14 쇼와 덴코 가부시키가이샤 Curable composition and application therefor
US9109072B2 (en) 2012-02-10 2015-08-18 Showa Denko K.K. Curable composition and uses thereof

Also Published As

Publication number Publication date
JPH05209027A (en) 1993-08-20

Similar Documents

Publication Publication Date Title
JP2902525B2 (en) Composite composition excellent in transparency and method for producing the same
EP0534753B1 (en) Composite composition having high transparency and process for producing same
JP3382939B2 (en) Casting polymer with excellent transparency and its manufacturing method
JPWO1992012204A1 (en) Cast polymer with excellent transparency and its manufacturing method
JPH08253708A (en) Radiation-curable composition and production thereof
WO1995029196A1 (en) Water-base silicone-modified acrylate polymer emulsion
JPH10279886A (en) Coating composition, hydrophilic film, and coated article having hydrophilic film
JPH10298265A (en) Method for producing curable composite composition
CN109666111B (en) Nano SiO2Organosilicon modified acrylate emulsion
JP5048395B2 (en) Inorganic organic composite coating composition
JP2002212503A (en) Composition for forming film, method for producing the same, method for forming porous film, and porous film
US5464901A (en) Curable resin composition comprising a silicone resin having epoxy and phenyl groups in the molecule and a vinyl polymer having a group reactive with the epoxy group
JP4809993B2 (en) Core-shell type fine particles and method for producing the same
JP3513985B2 (en) Method for producing curable polymer aqueous dispersion and aqueous curable polymer dispersion
CN1832972A (en) Shelf-stable silane-modified aqueous dispersion polymers
JPH04214747A (en) Self-crosslinking type polymer latex composition
KR20090046810A (en) Thermoplastic Organic-Inorganic Hybrid Materials and Manufacturing Methods Thereof
JPH10330488A (en) Production of silica-coated resin particle
JPH07291817A (en) Dental composite material
JP3045471B2 (en) Reactive organic-inorganic composite particles
EP0534751B1 (en) Composite composition having high transparency and process for producing the same
CN1934139A (en) Curable composition containing surface-modified particles
JP2020530520A (en) A coating film containing a coating resin composition and a cured product thereof as a coating layer.
CN100478363C (en) Curable composition containing surface-modified particles
JPH04254406A (en) Polymerizable silica sol and its admantane derivative and hardened resin thereof

Legal Events

Date Code Title Description
FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 9

Free format text: PAYMENT UNTIL: 20080319

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20090319

Year of fee payment: 10

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 10

Free format text: PAYMENT UNTIL: 20090319

FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 11

Free format text: PAYMENT UNTIL: 20100319

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20100319

Year of fee payment: 11

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20110319

Year of fee payment: 12

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120319

Year of fee payment: 13

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120319

Year of fee payment: 13

FPAY Renewal fee payment (prs date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130319

Year of fee payment: 14

EXPY Cancellation because of completion of term
FPAY Renewal fee payment (prs date is renewal date of database)

Year of fee payment: 14

Free format text: PAYMENT UNTIL: 20130319