JP2903754B2 - Heating furnace for thermal analyzer and temperature control method - Google Patents
Heating furnace for thermal analyzer and temperature control methodInfo
- Publication number
- JP2903754B2 JP2903754B2 JP9123791A JP9123791A JP2903754B2 JP 2903754 B2 JP2903754 B2 JP 2903754B2 JP 9123791 A JP9123791 A JP 9123791A JP 9123791 A JP9123791 A JP 9123791A JP 2903754 B2 JP2903754 B2 JP 2903754B2
- Authority
- JP
- Japan
- Prior art keywords
- refrigerant
- heater
- liquid level
- siphon
- heating furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Investigating Or Analyzing Materials Using Thermal Means (AREA)
- Devices For Use In Laboratory Experiments (AREA)
Description
【0001】[0001]
【産業上の利用分野】この発明は、一定の温度条件下、
試料に適当な荷重を加えてその熱的変化に伴う効果を測
定する熱機械分析装置や試料を加熱し試料重量の変化に
伴う熱的効果を測定する熱重量測定装置等で用いられる
熱分析装置用の加熱炉とその温度制御方法に関する。BACKGROUND OF THE INVENTION The present invention relates to
A thermomechanical analyzer used in thermomechanical analyzers that measure the effects of thermal changes by applying an appropriate load to a sample or a thermogravimeter that measures the thermal effects associated with changes in sample weight by heating the sample Heating furnace and its temperature control method.
【0002】[0002]
【従来の技術】熱分析装置では加熱炉周囲を低温領域
(−100°C以下)まで冷却し、炉心管に設置した試
料をヒ−タで一定温度に保持しながら測定することがあ
る。従来このように加熱炉を冷却する場合、炉心管全体
を冷媒槽で覆い液体窒素(N2 )で冷却したり、気化し
た冷媒の低温気体を加熱炉に吹き付けて冷却するような
ものもあった。しかし近時は経済的コスト或いは冷却効
率を考慮して加熱炉本体の下部のみを冷却するような冷
媒を入れた冷媒槽を配置し、冷媒液面が一定レベルにな
るよう液面センサを設置して制御するようにしたものも
ある(平成2年特許願第259889号)。2. Description of the Related Art In a thermal analyzer, the temperature around a heating furnace is cooled to a low temperature range (-100 ° C. or lower), and measurement may be performed while a sample placed in a furnace tube is kept at a constant temperature by a heater. Conventionally, when the heating furnace is cooled in this way, there is a method in which the entire furnace tube is covered with a refrigerant tank and cooled with liquid nitrogen (N 2 ), or a low-temperature gas of a vaporized refrigerant is blown into the heating furnace to cool the furnace. . However, recently, in consideration of economic cost or cooling efficiency, a refrigerant tank containing a refrigerant that cools only the lower part of the heating furnace main body is arranged, and a liquid level sensor is installed so that the refrigerant liquid level becomes a constant level. In some cases, such control is performed (Japanese Patent Application No. 259889, 1990).
【0003】[0003]
【発明が解決しようとする課題】加熱炉の下部に冷媒槽
を設置し液面センサにより液面レベルを制御するように
したものは効率的で且つ経済的であるが、液面センサに
より液面レベルを制御するだけでは、分析時の温度、昇
降温度等のパラメ−タによって液面レベルのゆらぎが異
なり、この「ゆらぎ」に起因するベ−スラインノイズが
高感度分析時の障害となっているという問題がある。こ
の発明はかかる課題に鑑みてなされたものであり、その
目的とする所は色々な低温領域に設定しても、また昇降
温度の速度等が異なっても安定した液面レベルを確保す
ることの出来る熱分析装置用加熱炉とその温度制御方法
を提供することにある。The one in which a refrigerant tank is provided below the heating furnace and the liquid level is controlled by a liquid level sensor is efficient and economical, but the liquid level is controlled by the liquid level sensor. By simply controlling the level, the fluctuation of the liquid level differs depending on parameters such as the temperature during the analysis and the elevating temperature, and the base line noise caused by this "fluctuation" becomes an obstacle to the high sensitivity analysis. There is a problem that there is. The present invention has been made in view of such a problem, and an object thereof is to secure a stable liquid level even when the temperature is set in various low-temperature regions and the speed of the elevating temperature is different. An object of the present invention is to provide a heating furnace for a thermal analyzer and a method for controlling the temperature thereof.
【0004】[0004]
【課題を解決するための手段】即ち、この考案は上記す
る課題を解決するために、熱分析装置用加熱炉が、試
料を設置する炉心管と、該炉心管下部に設置され液面セ
ンサを配置した冷媒槽と、ヒ−タ付サイフォンを配置し
前記冷媒槽への管路と電磁バルブとを配管した冷媒入タ
ンクと、前記液面センサとヒ−タ付サイフォンと電磁バ
ルブを制御するコントロ−ラとより成ることを特徴とす
る。また、上記構成から成る熱分析装置用加熱炉の温
度制御方法が、前記冷媒槽へ供給する冷媒の割合を各設
定温度において、前記コントロ−ラを介して時間的に一
定間隔とすることを特徴とする。That is, in order to solve the above-mentioned problems, the present invention provides a heating furnace for a thermal analyzer, which comprises a furnace tube for installing a sample, and a liquid level sensor installed below the furnace tube. A refrigerant tank arranged therein, a refrigerant tank in which a siphon with heater is arranged and a pipe to the refrigerant tank and an electromagnetic valve are piped, and a controller for controlling the liquid level sensor, the siphon with heater and the electromagnetic valve -Characterized by comprising: In the method for controlling the temperature of a heating furnace for a thermal analyzer configured as described above, the ratio of the refrigerant to be supplied to the refrigerant tank may be set to a constant time interval via the controller at each set temperature. And
【0005】[0005]
【作用】上記手段としたこの発明にかかる熱分析装置用
加熱炉の作用を添付図の符号を用いて説明する。The operation of the heating furnace for a thermal analyzer according to the present invention as described above will be described with reference to the accompanying drawings.
【0006】熱分析測定の際、冷媒槽3の周囲温度、加
熱或いは冷却速度等の影響で冷媒4の液面が一定レベル
以下になると液面センサ5が作動してコントロ−ラ10
を介して冷媒貯蔵タンクのヒ−タ付サイフォン9のヒ−
タ9aに通電する。すると、該ヒ−タ付サイフォンのヒ
−タ9aの加熱により貯蔵タンク6内の液体窒素の一部
が蒸発しタンク内が加圧され大気圧との差圧により液体
窒素が冷媒槽3に送られる。また、冷媒槽3の冷媒が液
面センサ5の設置されているレベルに達するとコントロ
−ラ10はヒ−タサイフォン9のヒ−タ9aへの通電を
停止し、同時に前記電磁弁8を作動させ「開」として冷
媒4を冷媒槽3へ供給するのを停止する。このように冷
媒の送液と送液停止との繰り返しにより冷媒槽3の冷媒
は一定レベルに保たれる。また、ヒ−タ付サイフォン9
のヒ−タ9aに通電する時間を長くし、通電停止時間を
短くすることにより液体窒素の流量を増やし図2の冷媒
送液時間と送液停止との周期を短くして「ゆらぎ」を小
さくすることが出来る。In the thermal analysis measurement, when the liquid level of the refrigerant 4 falls below a certain level due to the influence of the ambient temperature of the refrigerant tank 3, the heating or cooling rate, etc., the liquid level sensor 5 is activated and the controller 10 is operated.
Of the siphon 9 with heater of the refrigerant storage tank through the
Power to the terminal 9a. Then, by heating the heater 9a of the heater-equipped siphon, a part of the liquid nitrogen in the storage tank 6 evaporates and the inside of the tank is pressurized, and the liquid nitrogen is sent to the refrigerant tank 3 by a pressure difference from the atmospheric pressure. Can be When the refrigerant in the refrigerant tank 3 reaches the level at which the liquid level sensor 5 is installed, the controller 10 stops supplying electricity to the heater 9a of the heater siphon 9 and simultaneously activates the solenoid valve 8. Then, the supply of the refrigerant 4 to the refrigerant tank 3 is stopped as “open”. As described above, the refrigerant in the refrigerant tank 3 is maintained at a constant level by repeating the supply of the refrigerant and the stop of the liquid supply. In addition, siphon 9 with heater
The flow rate of liquid nitrogen is increased by increasing the time for energizing the heater 9a and shortening the energizing stop time, thereby shortening the cycle of the refrigerant sending time and the stopping of the liquid sending shown in FIG. You can do it.
【0007】従って、上記手段を用いる方法によれば、
液面センサ5からの信号により常に一定周期となるよう
コントロ−ラ10を介してヒ−タ付サイフォン9のヒ−
タ9aへの通電と通電停止時間の比(デュ−ティ比)を
制御すれば液面レベルの「ゆらぎ」を最小となるように
することが出来る。Therefore, according to the method using the above means,
The heater of the siphon 9 with the heater is controlled via the controller 10 so as to always have a constant cycle according to the signal from the liquid level sensor 5.
By controlling the ratio (duty ratio) between the current supply to the heater 9a and the current supply stop time (duty ratio), the "fluctuation" of the liquid level can be minimized.
【0008】[0008]
【実施例】以下、この発明の具体的実施例について図面
を参照して説明する。Embodiments of the present invention will be described below with reference to the drawings.
【0009】図1はこの発明にかかる熱分析装置用加熱
炉の構成を示す図である。1は試料を置くための炉心管
であり周囲にはヒ−タ2が配置され所定温度に設定出来
るようにしてある。該炉心管1の下部には液体窒素等の
冷媒4を入れた冷媒槽3が設けられ、該冷媒槽3には一
定レベル位置に液面センサ5が設置されている。即ち、
炉心管内の試料部温度は冷媒槽3の冷媒により炉心管1
を冷却すると共にヒ−タ2で加熱することにより所定の
冷却温度に設定することが出来るようになっている。FIG. 1 is a diagram showing a configuration of a heating furnace for a thermal analyzer according to the present invention. Reference numeral 1 denotes a furnace tube for placing a sample, and a heater 2 is arranged around the tube so that a predetermined temperature can be set. A refrigerant tank 3 containing a refrigerant 4 such as liquid nitrogen is provided below the furnace tube 1, and a liquid level sensor 5 is installed at a predetermined level in the refrigerant tank 3. That is,
The temperature of the sample portion in the core tube is controlled by the refrigerant in the refrigerant tank 3.
Is cooled and heated by the heater 2 so that a predetermined cooling temperature can be set.
【0010】6は冷媒貯蔵タンクであって内部には液体
窒素等の冷媒4が入れてある。該冷媒貯蔵タンク6には
管路7が前記冷媒槽3へ配管され冷媒を供給するように
すると共に、他方に電磁弁8が設置されている。また、
該貯蔵タンク6にはヒ−タ付サイフォン9が配置されて
おり、前記冷媒槽3の冷媒4が蒸発等により少なくなる
と後述するように液面センサ5により電源が入るような
仕組みになっている。次に、10はコントロ−ラであっ
て前記液面センサ5とヒ−タ付サイフォン9のヒ−タ9
aと電磁弁8に接続されている。Reference numeral 6 denotes a refrigerant storage tank in which a refrigerant 4 such as liquid nitrogen is stored. In the refrigerant storage tank 6, a pipe 7 is connected to the refrigerant tank 3 to supply the refrigerant, and an electromagnetic valve 8 is installed on the other side. Also,
The storage tank 6 is provided with a siphon 9 with a heater. When the amount of the refrigerant 4 in the refrigerant tank 3 decreases due to evaporation or the like, the power is turned on by the liquid level sensor 5 as described later. . Next, reference numeral 10 denotes a controller, which is the heater 9 of the liquid level sensor 5 and the siphon 9 with a heater.
a and the solenoid valve 8.
【0011】この発明にかかる熱分析装置用加熱炉は以
上のような構成から成り、通常、或る低温領域での熱分
析の際は冷媒槽3の冷媒により炉心管1を冷却しつつ回
りのヒ−タ2により測定試料を所定の一定温度として熱
分析測定を行う。The heating furnace for a thermal analyzer according to the present invention has the above-described configuration. Usually, during thermal analysis in a certain low-temperature region, the core tube 1 is cooled while the core tube 1 is cooled by the refrigerant in the refrigerant tank 3. The heat analysis is performed by the heater 2 with the measurement sample at a predetermined constant temperature.
【0012】次に、熱分析測定の際には冷媒槽3の周囲
温度、加熱或いは冷却速度等の影響で冷媒4の液面が一
定レベル以下になると液面センサ5が作動してコントロ
−ラ10を介して冷媒貯蔵タンクのヒ−タ付サイフォン
9のヒ−タ9aに通電する。すると、該ヒ−タ付サイフ
ォン9のヒ−タ9aの加熱により貯蔵タンク6内の液体
窒素の一部が蒸発しタンク内が加圧され大気圧との差圧
により液体窒素が冷媒槽3に送られる。また、冷媒槽3
の冷媒が液面センサ5の設置されているレベルに達する
とコントロ−ラ10はヒ−タサイフォン9のヒ−タ9a
への通電を停止し、同時に前記電磁弁8を作動させ
「開」として冷媒4を冷媒槽3へ供給するのを停止す
る。このように冷媒の送液と送液停止との繰り返しによ
り冷媒槽3の冷媒は一定レベルに保たれる。Next, at the time of thermal analysis measurement, when the liquid level of the refrigerant 4 falls below a certain level due to the influence of the ambient temperature of the refrigerant tank 3, the heating or cooling rate, etc., the liquid level sensor 5 is activated to activate the controller. The heater 9a of the siphon 9 with a heater in the refrigerant storage tank is energized via 10. Then, a portion of the liquid nitrogen in the storage tank 6 evaporates due to the heating of the heater 9a of the siphon 9 with the heater, the inside of the tank is pressurized, and the liquid nitrogen enters the refrigerant tank 3 due to a pressure difference from the atmospheric pressure. Sent. In addition, refrigerant tank 3
When the refrigerant reaches the level at which the liquid level sensor 5 is installed, the controller 10 turns the heater 9a of the heater siphon 9 on.
The supply of the refrigerant 4 to the refrigerant tank 3 is stopped when the power supply to the refrigerant tank 3 is stopped. As described above, the refrigerant in the refrigerant tank 3 is maintained at a constant level by repeating the supply of the refrigerant and the stop of the liquid supply.
【0013】図2は上記構成からなる前記コントロ−ラ
10による送液の停止と供給の時間関係を示した図であ
るが、この場合の周期は熱分析装置の測定温度、加熱・
冷却速度等により変化する。図3は図2のP部に示す冷
媒供給時間帯におけるヒ−タ付サイフォン9のヒ−タ9
aに通電(通常は交流電源)する時間と通電停止時間の
関係を示した図である。この図3からも分かるように、
液体窒素を供給する時にはコントロ−ラ10は間欠的に
ヒ−タに通電して冷媒の流量を制御している。FIG. 2 is a diagram showing the time relationship between the stop of the liquid supply and the supply of the liquid by the controller 10 having the above-mentioned configuration.
It changes depending on the cooling rate and the like. FIG. 3 shows the heater 9 of the siphon 9 with the heater in the refrigerant supply time period shown in the part P of FIG.
FIG. 4 is a diagram showing a relationship between a time for energizing (normally an AC power supply) and an energizing stop time. As can be seen from FIG.
When supplying liquid nitrogen, the controller 10 intermittently supplies current to the heater to control the flow rate of the refrigerant.
【0014】また、図4は、図3において示す冷媒供給
中の「通電」と「通電停止」との間隔を変えた場合を示
す図であって通電時間を長くした場合の図であり、図5
は通電時間を短くした場合の図である。前記加熱炉を構
成する炉心管1に設置した冷媒槽3の液面のレベルの
「ゆらぎ」は炉心管1内にある試料部温度の「ゆらぎ」
の原因となり、図2に示す送液時間と送液停止時間の周
期が短いほどこの「ゆらぎ」は小さく、周期が長くなっ
た場合は「ゆらぎ」も大きくなる。故に、図3の通電時
間と通電停止の時間間隔を図4で示すように、ヒ−タ付
サイフォン9のヒ−タ9aに通電する時間を長くし、通
電停止時間を短くすることにより液体窒素の流量を増や
し図2の冷媒送液時間と送液停止との周期を短くして
「ゆらぎ」を小さくすることが出来る。従って、液面セ
ンサ5からの信号により、その時の測定温度を考慮し
て、常に一定周期となるようコントロ−ラ10を介して
ヒ−タ付サイフォン9のヒ−タ9aへの通電と通電停止
時間の比(デュ−ティ比)を制御すれば液面レベルの
「ゆらぎ」を最小となるようにすることが出来るのであ
る。FIG. 4 is a diagram showing a case where the interval between the "energization" and "energization stop" during the supply of the refrigerant shown in FIG. 3 is changed, in which the energization time is extended. 5
FIG. 4 is a diagram when the energization time is shortened. The “fluctuation” of the liquid level of the refrigerant tank 3 installed in the furnace tube 1 constituting the heating furnace is the “fluctuation” of the sample temperature in the furnace tube 1.
This "fluctuation" becomes smaller as the cycle of the liquid sending time and the liquid feeding stop time shown in FIG. 2 becomes shorter, and the "fluctuation" becomes larger when the cycle becomes longer. Therefore, as shown in FIG. 4, the time interval between the energizing time and the energizing stop in FIG. 3 is extended by energizing the heater 9a of the heater-attached siphon 9, and the energizing interrupting time is shortened. By increasing the flow rate of the refrigerant and shortening the cycle of the refrigerant supply time and the stop of the liquid supply shown in FIG. Therefore, the signal from the liquid level sensor 5 is supplied to the heater 9a of the siphon 9 with the heater via the controller 10 so as to always have a constant period in consideration of the measured temperature at that time, and the power supply is stopped. By controlling the time ratio (duty ratio), the "fluctuation" of the liquid level can be minimized.
【0015】尚、上記実施例ではヒ−タ付サイフォンの
ヒ−タは交流電源により通電する時間間隔を制御するこ
とにより送液を制御したが、交流電圧値を変化させて制
御するようにしても良い。In the above-described embodiment, the heater of the siphon with a heater controls the liquid feeding by controlling the time interval of energization by the AC power supply. However, the heater is controlled by changing the AC voltage value. Is also good.
【0016】[0016]
【発明の効果】この発明にかかる熱分析装置用加熱炉及
び温度制御方法は以上詳述したような構成としたので、
炉心管に設置する試料温度を所定の低温に設定する場
合、精密な液面レベルの制御を行いどの設定温度でも
「ゆらぎ」を最小にして温度を安定させることが出来
る。従って極めて低い温度での熱分析を正確に行うこと
が出来る。As described above, the heating furnace and the temperature control method for the thermal analyzer according to the present invention are configured as described above in detail.
When the temperature of the sample installed in the furnace tube is set to a predetermined low temperature, precise control of the liquid level can be performed to minimize the "fluctuation" at any set temperature and stabilize the temperature. Therefore, thermal analysis at an extremely low temperature can be accurately performed.
【0017】[0017]
【図1】 この発明にかかる熱分析装置用加熱炉の構成
を示す図である。FIG. 1 is a diagram showing a configuration of a heating furnace for a thermal analyzer according to the present invention.
【図2】 この発明にかかる熱分析装置用加熱炉のコン
トロ−ラによる送液の停止と供給の時間関係を示した図
である。FIG. 2 is a diagram showing a time relationship between stoppage of liquid supply and supply by a controller of a heating furnace for a thermal analyzer according to the present invention.
【図3】 図2のP部に示す冷媒供給中にヒ−タ付サイ
フォンのヒ−タに通電する時間と通電停止時間の関係を
示した図である。FIG. 3 is a diagram showing a relationship between a time during which power is supplied to a heater of a siphon with a heater and a power supply stop time during supply of a refrigerant shown in a part P of FIG. 2;
【図4】 図3において示す冷媒供給中の「通電」と
「通電停止」との間隔を変えた場合を示す図であって通
電時間を長くした場合の図である。4 is a diagram showing a case where the interval between “energization” and “energization stop” during the supply of the refrigerant shown in FIG. 3 is changed, and is a diagram showing a case where the energization time is lengthened.
【図5】 図3において示す冷媒供給中の「通電」と
「通電停止」との間隔を変えた場合を示す図であって通
電時間を短くした場合の図である。5 is a diagram showing a case where the interval between “energization” and “energization stop” during supply of the refrigerant shown in FIG. 3 is changed, and is a diagram showing a case where the energization time is shortened.
1 炉心管 2 ヒ−タ 3 冷媒槽
4 冷媒 5 液面センサ 6 冷媒貯蔵タンク 8
電磁弁 9 ヒ−タ付サイフォン 9a ヒ−タ
10 コントロ−ラDESCRIPTION OF SYMBOLS 1 Furnace tube 2 Heater 3 Refrigerant tank 4 Refrigerant 5 Liquid level sensor 6 Refrigerant storage tank 8
Solenoid valve 9 Siphon with heater 9a Heater
10 Controller
Claims (2)
設置され液面センサを配置した冷媒槽と、ヒ−タ付サイ
フォンを配置し前記冷媒槽への管路と電磁バルブとを配
管した冷媒入タンクと、前記液面センサとヒ−タ付サイ
フォンと電磁バルブを制御するコントロ−ラとより成る
ことを特徴とする熱分析装置用加熱炉。1. A furnace tube in which a sample is placed, a refrigerant tank disposed below the furnace tube and having a liquid level sensor disposed therein, a siphon with a heater disposed therein and a conduit to the refrigerant tank and an electromagnetic valve. A heating furnace for a thermal analysis apparatus, comprising: a refrigerant storage tank provided with a pipe; a liquid level sensor, a siphon with a heater, and a controller for controlling an electromagnetic valve.
置され液面センサを配置した冷媒槽と、ヒ−タ付サイフ
ォンを配置し前記冷媒槽への管路と電磁バルブとを配管
した冷媒入タンクと、前記液面センサとヒ−タ付サイフ
ォンと電磁バルブを制御するコントロ−ラとより成る熱
分析装置用加熱炉において、前記冷媒槽へ供給する冷媒
の割合を、各設定温度において、前記コントロ−ラを介
して時間的に一定間隔とすることを特徴とする温度制御
方法。2. A furnace tube for installing a sample, a refrigerant tank disposed below the furnace tube and having a liquid level sensor disposed therein, a siphon with a heater disposed therein, and a pipe line to the refrigerant tank and an electromagnetic valve piped. In a heating furnace for a thermal analysis apparatus comprising a cooled refrigerant tank, a liquid level sensor, a siphon with a heater, and a controller for controlling an electromagnetic valve, the ratio of the refrigerant to be supplied to the refrigerant tank is determined at each set temperature. The temperature control method according to any one of claims 1 to 3, wherein the predetermined time interval is set via the controller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9123791A JP2903754B2 (en) | 1991-03-28 | 1991-03-28 | Heating furnace for thermal analyzer and temperature control method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9123791A JP2903754B2 (en) | 1991-03-28 | 1991-03-28 | Heating furnace for thermal analyzer and temperature control method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04301552A JPH04301552A (en) | 1992-10-26 |
| JP2903754B2 true JP2903754B2 (en) | 1999-06-14 |
Family
ID=14020815
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9123791A Expired - Fee Related JP2903754B2 (en) | 1991-03-28 | 1991-03-28 | Heating furnace for thermal analyzer and temperature control method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2903754B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110763855A (en) * | 2019-12-03 | 2020-02-07 | 贝士德仪器科技(北京)有限公司 | Full-automatic physical adsorption instrument |
| WO2024201614A1 (en) * | 2023-03-24 | 2024-10-03 | 株式会社日立ハイテク | Ion milling device |
-
1991
- 1991-03-28 JP JP9123791A patent/JP2903754B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04301552A (en) | 1992-10-26 |
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