JP2903991B2 - Semiconductor porcelain composition and method for producing the same - Google Patents
Semiconductor porcelain composition and method for producing the sameInfo
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- JP2903991B2 JP2903991B2 JP6034350A JP3435094A JP2903991B2 JP 2903991 B2 JP2903991 B2 JP 2903991B2 JP 6034350 A JP6034350 A JP 6034350A JP 3435094 A JP3435094 A JP 3435094A JP 2903991 B2 JP2903991 B2 JP 2903991B2
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- grain boundary
- varistor
- semiconductor
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Description
【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION
【0001】[0001]
【産業上の利用分野】本発明はチタン酸ストロンチウム
系の半導体磁器組成物及びその製造方法に関し、より詳
細には通信機器や音響機器等に搭載される電気・電子回
路等のノイズ吸収素子として利用される粒界絶縁型の半
導体磁器組成物及びその製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a strontium titanate-based semiconductor porcelain composition and a method for producing the same, and more particularly, to a strontium titanate-based semiconductor porcelain composition used as a noise absorbing element for an electric / electronic circuit mounted on a communication device, an audio device or the like. And a method of manufacturing the same.
【0002】[0002]
【従来の技術】粒界絶縁型半導体磁器は、半導体化した
磁器焼結体(セラミックス)結晶粒界に金属酸化物など
を熱拡散させて、前記結晶粒界層を絶縁層に変化させた
ものであり、この粒界層絶縁化により得られる粒界絶縁
型半導体磁器は容量素子として用いられる。また前記方
法により形成された半導体磁器の粒界絶縁層は、一般に
数nmと薄いことから、粒界絶縁型半導体磁器からなる
容量素子は、他の型の磁器からなる容量素子と比較した
場合、より小型で大きな静電容量が得られるという特徴
を有する。2. Description of the Related Art A grain boundary insulated semiconductor porcelain is obtained by thermally diffusing a metal oxide or the like into crystal grains of a sintered ceramic (ceramic) made into a semiconductor, thereby changing the crystal grain boundary layer into an insulating layer. The grain boundary insulated semiconductor porcelain obtained by insulating the grain boundary layer is used as a capacitive element. In addition, since the grain boundary insulating layer of the semiconductor porcelain formed by the above method is generally as thin as several nm, the capacitance element made of the grain boundary insulated semiconductor porcelain is compared with the capacitance element made of another type of porcelain. It is characterized in that it is smaller and can provide a larger capacitance.
【0003】特に、チタン酸ストロンチウム(SrTi
O3 )を主成分とした半導体磁器素子は、前記した金属
酸化物等の熱拡散により粒界絶縁型構造をとり易いこ
と、電気的特性が温度や周波数に対して安定しているこ
と、誘電損失が小さいこと等の種々の利点を有し、近年
の電子機器・回路等の高周波化や各種の用途環境に対す
る高信頼化の要求にも対応し易い。このため、セラミッ
クス電子部品メーカー各社ともチタン酸ストロンチウム
を主成分にした容量素子の高機能化、高付加価値化を目
指して開発を進めている。In particular, strontium titanate (SrTi
The semiconductor porcelain element containing O 3 ) as a main component is easy to have a grain boundary insulating structure due to the thermal diffusion of the above-mentioned metal oxide or the like, the electric characteristics are stable with respect to temperature and frequency, It has various advantages such as low loss, and can easily respond to recent demands for higher frequency of electronic devices and circuits and higher reliability in various application environments. For this reason, ceramic electronic component manufacturers are working on the development of high-performance and high-value-added capacitive elements containing strontium titanate as a main component.
【0004】このような公知例として、例えばチタン酸
ストロンチウムを主成分とした半導体磁器の結晶粒界に
Bi、Mn、Cu、Pb、Al等の金属酸化物を熱拡散
させて高い誘電率を有する粒界絶縁型半導体磁器組成物
を製造した例(特公昭62−42368号公報)、チタ
ン酸カルシウムをチタン酸ストロンチウムと固溶させた
半導体磁器の粒界にアルカリ金属を熱拡散させ、バリス
タ機能を付与した粒界絶縁型半導体磁器組成物を製造し
た例(特開昭58−91602号公報)等が挙げられ
る。As such a known example, for example, a metal oxide such as Bi, Mn, Cu, Pb, or Al is thermally diffused into a crystal grain boundary of a semiconductor ceramic mainly composed of strontium titanate to have a high dielectric constant. An example in which a grain boundary insulated semiconductor porcelain composition is manufactured (Japanese Patent Publication No. 62-42368), in which alkali metal is thermally diffused into the grain boundaries of a semiconductor porcelain in which calcium titanate and strontium titanate are dissolved, and a varistor function is obtained. Examples of producing the applied grain boundary insulating semiconductor ceramic composition (JP-A-58-91602) are given.
【0005】チタン酸ストロンチウムを主成分とし、バ
リスタ機能を有する前記粒界絶縁型半導体磁器組成物
は、最近ではこれまでの主な用途先であった低周波アナ
ログ回路以外に、電源用ノイズフィルタ、半導体デバイ
スのノイズ吸収素子等にもその用途が広がっており、こ
のような新規な用途の代表例として容量性バリスタが挙
げられる。この容量性バリスタは数kVのノイズあるい
はパルス異常電圧を吸収することが可能であり、従来の
ZnO系バリスタほどの電圧非直線性、サージ耐量には
及ばないものの、チタン酸ストロンチウム系の粒界絶縁
型半導体磁器組成物が有する高い誘電率を活用して、急
速に立ち上がるパルス電圧に対し、対象保護素子(各種
IC、LSI等)を破壊することなくこれを吸収するこ
とができるという利点を有する。The above-mentioned grain boundary insulated semiconductor porcelain composition containing strontium titanate as a main component and having a varistor function has recently been used for a power supply noise filter, Its use is also expanding to noise absorbing elements and the like of semiconductor devices, and a capacitive varistor is a typical example of such a new use. This capacitive varistor is capable of absorbing several kV of noise or abnormal pulse voltage, and does not have the voltage nonlinearity and surge withstand capability of conventional ZnO-based varistors, but has the strontium titanate-based grain boundary insulation. Utilizing the high dielectric constant of the type semiconductor ceramic composition, there is an advantage that a rapidly rising pulse voltage can be absorbed without destroying the target protection element (various ICs, LSIs, etc.).
【0006】[0006]
【発明が解決しようとする課題】しかし、近年のIC、
LSIの駆動電圧はますます低電圧化の傾向にあるのに
対し、これらを保護するために用いられる前記容量性バ
リスタにあっては、高い電圧非直線性を有し、しかも従
来より低電圧でバリスタ機能を発現する素子はいまだに
存在しないという課題があった。However, recent ICs,
While the drive voltage of LSIs tends to be lower, the capacitive varistors used to protect them have higher voltage non-linearity and have lower voltage than conventional ones. There has been a problem that an element exhibiting a varistor function does not yet exist.
【0007】すなわち、前記した容量性バリスタに要求
される電気的特性をより具体的に示すと、以下のように
なる。More specifically, the electrical characteristics required for the above-described capacitive varistor are described below in more detail.
【0008】 高速パルス電圧を吸収できるように静
電容量(C)が十分に大きいこと。 保護素子の駆動電圧に合わせて、バリスタ電圧(V
1mA )の制御が自在に行えること。 パルス電圧に対する応答性を早めるべく、電圧非直
線係数(α)が十分に高いこと。 サージ電圧(数10kV)印加後についても,バリ
スタ電圧(V1mA )と電圧非直線係数(α)の変化率が
小さいこと。The capacitance (C) must be large enough to absorb a high-speed pulse voltage. Varistor voltage (V
1mA ) can be controlled freely. The voltage non-linear coefficient (α) must be sufficiently high to speed up the response to the pulse voltage. Even after a surge voltage (several tens of kV) is applied, the rate of change between the varistor voltage (V 1 mA ) and the voltage nonlinear coefficient (α) is small.
【0009】また、このような電気的特性を有する粒界
絶縁型半導体磁器組成物の開発を目的とした具体例とし
て、例えば特開平2−222502号公報により開示さ
れた粒界酸化型電圧非直線抵抗素子が挙げられるが、こ
の素子はバリスタ電圧(V1mA )が200V前後と大き
く、近年の駆動電圧が低電圧化したIC、LSIに対し
て使用するには適切な素子とは言えないという課題があ
った。Further, as a specific example for the purpose of developing a grain boundary insulating semiconductor ceramic composition having such electrical characteristics, for example, a grain boundary oxidation type voltage nonlinear disclosed in JP-A-2-222502 is disclosed. There is a resistance element, but this element has a varistor voltage (V 1 mA ) as high as about 200 V, and is not suitable for use in ICs and LSIs in which the driving voltage has been reduced in recent years. was there.
【0010】本発明はこのような課題に鑑みてなされた
ものであり、チタン酸ストロンチウム系半導体磁器組成
物に対し、そのセラミックス結晶粒内及び粒界層の化学
組成を制御することにより、高い電圧非直線性を有し、
自在にバリスタ電圧をコントロールすることができる高
誘電率及び低誘電損失の半導体磁器組成物及びその製造
方法を提供することを目的としている。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and it has been proposed to control a strontium titanate-based semiconductor porcelain composition by controlling the chemical composition of the ceramic crystal grains and the grain boundary layer, thereby increasing the voltage. Has non-linearity,
It is an object of the present invention to provide a semiconductor ceramic composition having a high dielectric constant and a low dielectric loss capable of freely controlling a varistor voltage, and a method for manufacturing the same.
【0011】[0011]
【課題を解決するための手段】上記目的を達成するため
に本発明に係る半導体磁器組成物は、結晶粒内が(Sr
1-x-y Bax Cay )a (Ti1-z Nbz )b O3 (式
中、x、y及びzはそれぞれ、0<x≦0.05、0<
y≦0.25、0.001≦z≦0.010の範囲内の
値で、かつaとbは、0.990≦a/b<1.000
の関係を満たす値)で示される組成を有し、結晶粒界層
にさらにNa及びBが偏析していることを特徴としてい
る。(1) また、本発明に係る半導体磁器組成物の製造方法は、上
記(1)記載の半導体磁器組成物の製造方法であって、
チタン酸ストロンチウム系焼結体にNa2 Ti3 O7 及
びB2 O3 を、それぞれ50mol%≦Na2 Ti3 O
7 ≦91mol%、9mol%≦B2 O3 ≦50mol
%の範囲内で含有させて塗布し熱拡散させることを特徴
としている。(2)Means for Solving the Problems To achieve the above object, a semiconductor ceramic composition according to the present invention comprises (Sr)
1-xy Ba x C a y ) a (Ti 1 -z Nb z ) b O 3 (where x, y and z are respectively 0 <x ≦ 0.05, 0 <
y ≦ 0.25, 0.001 ≦ z ≦ 0.010, and a and b are 0.990 ≦ a / b <1.000
), Characterized in that Na and B are further segregated in the crystal grain boundary layer. (1) The method for producing a semiconductor porcelain composition according to the present invention is the method for producing a semiconductor porcelain composition according to the above (1),
The Na 2 Ti 3 O 7 and B 2 O 3 in the strontium titanate-based sintered body, respectively 50mol% ≦ Na 2 Ti 3 O
7 ≦ 91mol%, 9mol% ≦ B 2 O 3 ≦ 50mol
%, And is coated and thermally diffused. (2)
【0012】[0012]
【作用】上記(1)記載の構成を有する半導体磁器組成
物によれば、結晶粒内が(Sr1-x-y Bax Cay )a
(Ti1-z Nbz )b O3 (式中、x、y及びzはそれ
ぞれ、0<x≦0.05、0<y≦0.25、0.00
1≦z≦0.010の範囲内の値で、かつaとbは、
0.990≦a/b<1.000の関係を満たす値)で
示される組成を有し、結晶粒界層にさらにNa及びBが
偏析しているので、高い電圧非直線性を有し、低電圧で
バリスタ機能を発現する高誘電率及び低誘電損失の粒界
絶縁型半導体磁器組成物となる。According to the semiconductor ceramic composition having the constitution described in the above (1), (Sr 1 -xy Ba x C a y ) a
(Ti 1-z Nb z ) b O 3 (where x, y and z are respectively 0 <x ≦ 0.05, 0 <y ≦ 0.25, 0.00
A value in the range of 1 ≦ z ≦ 0.010, and a and b are:
0.990 ≦ a / b <1.000), and Na and B are further segregated in the crystal grain boundary layer. A high dielectric constant and low dielectric loss grain boundary insulated semiconductor ceramic composition exhibiting a varistor function at low voltage.
【0013】上記化学式において、x及びyはAサイト
のSrに対するBa及びCaの置換量を示し、xが0で
あると誘電率が小さく、またバリスタ電圧は大きくなり
すぎる。他方xが0.05を超えると誘電損失や電圧非
直線性が劣化し、バリスタ電圧は大きくなりすぎる。一
方、yが0である場合も誘電損失や電圧非直線性が劣化
し、バリスタ電圧は大きくなりすぎる。他方yが0.2
5を超えると電圧非直線性が劣化し、誘電率は小さくな
りすぎ、またバリスタ電圧が大きくなりすぎる。さら
に、zが0.001未満では絶縁耐圧が低下してサージ
電流を流すと破壊する。他方、zが0.010を超える
と電圧非直線性が劣化し、誘電率は小さくなりすぎ、ま
たバリスタ電圧が大きくなりすぎる。またa/bは(S
r+Ba+Ca)/(Ti+Nb)のモル比を示すが、
このa/bが0.990未満であると誘電損失や電圧非
直線性が劣化し、誘電率は小さくなりすぎ、またバリス
タ電圧が大きくなりすぎる。他方、a/bが1.000
以上になると、絶縁耐圧が低下してサージ電流を流すと
破壊し易くなる。In the above chemical formula, x and y indicate the amounts of Ba and Ca substituted for Sr at the A site, and when x is 0, the dielectric constant is small and the varistor voltage is too high. On the other hand, when x exceeds 0.05, dielectric loss and voltage non-linearity deteriorate, and the varistor voltage becomes too large. On the other hand, also when y is 0, dielectric loss and voltage non-linearity deteriorate, and the varistor voltage becomes too large. On the other hand, y is 0.2
If it exceeds 5, the voltage nonlinearity deteriorates, the dielectric constant becomes too small, and the varistor voltage becomes too large. Further, when z is less than 0.001, the dielectric strength is reduced, and breakdown occurs when a surge current flows. On the other hand, if z exceeds 0.010, the voltage nonlinearity deteriorates, the dielectric constant becomes too small, and the varistor voltage becomes too large. A / b is (S
The molar ratio of (r + Ba + Ca) / (Ti + Nb) is shown.
If a / b is less than 0.990, dielectric loss and voltage non-linearity deteriorate, the dielectric constant becomes too small, and the varistor voltage becomes too large. On the other hand, a / b is 1.000
Above this, the breakdown voltage is reduced, and the device is easily broken when a surge current flows.
【0014】また上記(2)記載の半導体磁器組成物の
製造方法によれば、上記(1)記載の半導体磁器組成物
の製造方法であって、チタン酸ストロンチウム系焼結体
にNa2 Ti3 O7 及びB2 O3 をそれぞれ50mol
%≦Na2 Ti3 O7 ≦91mol%、9mol%≦B
2 O3 ≦50mol%の範囲内で含有させて塗布し熱拡
散させるので、高い電圧非直線性を有し、その組成によ
り自在にバリスタ電圧のコントロールが可能な高誘電率
及び低誘電損失の粒界絶縁型半導体磁器組成物が製造さ
れる。According to the method for producing a semiconductor porcelain composition according to the above (2), there is provided the method for producing a semiconductor porcelain composition according to the above (1), wherein the strontium titanate-based sintered body is made of Na 2 Ti 3. 50 mol each of O 7 and B 2 O 3
% ≦ Na 2 Ti 3 O 7 ≦ 91 mol%, 9 mol% ≦ B
Since it is contained within the range of 2 O 3 ≦ 50 mol% and applied and thermally diffused, it has a high voltage non-linearity, and a particle having a high dielectric constant and a low dielectric loss capable of freely controlling the varistor voltage by its composition. A field insulating type semiconductor porcelain composition is manufactured.
【0015】前記塗布組成中のNa2 Ti3 O7 の割合
が50mol%未満では電圧非直線性が劣化し、バリス
タ電圧は大きくなりすぎる。他方、Na2 Ti3 O7 の
割合が91mol%を超えると誘電損失が劣化し、誘電
率は小さくなりすぎる。さらに、Na2 Ti3 O7 の割
合が95mol%になると絶縁耐圧が低下してサージ電
流を流すと破壊する。If the proportion of Na 2 Ti 3 O 7 in the coating composition is less than 50 mol%, the voltage non-linearity deteriorates and the varistor voltage becomes too large. On the other hand, when the proportion of Na 2 Ti 3 O 7 exceeds 91 mol%, the dielectric loss deteriorates and the dielectric constant becomes too small. Further, when the ratio of Na 2 Ti 3 O 7 becomes 95 mol%, the dielectric strength decreases, and the device is destroyed when a surge current flows.
【0016】[0016]
【実施例及び比較例】以下、本発明に係る半導体磁器組
成物及びその製造方法の実施例及び比較例について説明
する。Examples and Comparative Examples Examples and comparative examples of the semiconductor porcelain composition according to the present invention and the method for producing the same will be described below.
【0017】まず、本発明の実施例に係るチタン酸スト
ロンチウム系半導体磁器組成物の製造方法を説明する。First, a method for producing a strontium titanate-based semiconductor ceramic composition according to an embodiment of the present invention will be described.
【0018】セラミックス合成のための原料として、S
rCO3 、BaCO3 、CaCO3、TiO2 、Nb2
O5 を用意し、下記の表1〜3に示した主成分組成とな
るように各原料を正確に秤量する。次に、秤量した各原
料を適量の玉石、分散剤、純水とともにポットミル内に
投入し、24時間の湿式混合を行なう。その後、前記工
程で混合されたスラリー状の原料を脱水乾燥させ、解砕
する。次に、解砕された粉末を、例えばジルコニア製の
焼成ルツボ内に移し、1170℃程度の温度で仮焼する
ことにより、主成分組成を有するセラミックス粉末を仮
焼合成する。そして、この仮焼合成により所定の固溶体
が合成されていることを、X線回折や組成分析等で確認
した。As a raw material for synthesizing ceramics, S
rCO 3 , BaCO 3 , CaCO 3 , TiO 2 , Nb 2
O 5 was prepared, accurately weighed each raw material so that the main component composition shown in Tables 1-3 below. Next, the weighed raw materials are put into a pot mill together with appropriate amounts of cobblestone, a dispersant, and pure water, and wet-mixed for 24 hours. After that, the slurry-like raw material mixed in the above step is dehydrated and dried, and crushed. Next, the crushed powder is transferred into a firing crucible made of, for example, zirconia and calcined at a temperature of about 1170 ° C., thereby calcining and synthesizing a ceramic powder having a main component composition. Then, it was confirmed by X-ray diffraction and composition analysis that a predetermined solid solution was synthesized by the calcining synthesis.
【0019】次に、前記工程で仮焼合成された粉末を解
砕して、1.0μm前後の均一粉に整粒し、この整粒さ
れた粉末に有機バインダー等を添加して、直径が8m
m、厚みが600μmの円板状成形体を作製する。Next, the powder calcined and synthesized in the above step is crushed, sized to a uniform powder of about 1.0 μm, and an organic binder or the like is added to the sized powder to reduce the diameter. 8m
m, a disk-shaped molded body having a thickness of 600 μm is prepared.
【0020】さらに、この円板状成形体を約1000℃
で脱脂し、該脱脂体を例えばアルミナ製の焼成ルツボに
充填し、水素濃度が1〜15vol%、窒素濃度が85
〜99vol%の還元雰囲気中、1380〜1550℃
で、2.0〜8.0時間焼成し、セラミックスの焼結と
半導体化とを進める。Further, the disc-shaped molded body is heated to about 1000 ° C.
The degreased body is filled into a baked crucible made of, for example, alumina, and the hydrogen concentration is 1 to 15 vol% and the nitrogen concentration is 85.
1380-1550 ° C in a reducing atmosphere of ~ 99 vol%
Then, firing is performed for 2.0 to 8.0 hours, and sintering of ceramics and conversion to a semiconductor are advanced.
【0021】次に、得られた焼結体を有機溶剤及び熱水
中で十分洗浄した後、セラミックス結晶粒界を絶縁化す
るため、Na2 Ti3 O7 及びB2 O3 を表1〜3の絶
縁化剤組成になるように秤量し、これらと有機ビヒクル
材とをあわせて混練することによりペースト状とし、こ
のペーストを焼結体1g当たりに換算して20〜50m
g程度の割合で焼結体表面に塗布する。次に、このペー
ストが塗布された焼結体を大気中、1000〜1350
℃で、0.5〜4.0時間焼成することにより粒界層を
絶縁化する。なお、絶縁化ペーストは、Na、Bを含有
するものであれば、前記以外の化合物が使用されていて
も構わない。Next, after sufficiently washing the obtained sintered body in an organic solvent and hot water, Na 2 Ti 3 O 7 and B 2 O 3 were added to Tables 1 to 3 to insulate the ceramic crystal grain boundaries. 3 is weighed so that the composition of the insulating agent is obtained, and these are combined with an organic vehicle material and kneaded to form a paste. The paste is converted to 20 to 50 m per 1 g of a sintered body.
It is applied to the surface of the sintered body at a ratio of about g. Next, the sintered body to which this paste has been applied is placed in the air at 1000 to 1350.
The grain boundary layer is insulated by baking at 0.5 ° C. for 0.5 to 4.0 hours. As the insulating paste, a compound other than the above may be used as long as it contains Na and B.
【0022】次に、前記工程により粒界層が絶縁化され
た半導体磁器組成物の両面に市販の電極用Agペースト
を印刷し、約650℃でこの電極を焼き付けることによ
り素子を完成させる。Next, a commercially available Ag paste for an electrode is printed on both surfaces of the semiconductor ceramic composition in which the grain boundary layer has been insulated by the above-described process, and the electrode is baked at about 650 ° C. to complete the device.
【0023】このようにして得られるチタン酸ストロン
チウム系の粒界絶縁型半導体磁器組成物の電気的特性を
評価する方法について、以下に説明する。評価を行なう
電気的特性は、静電容量(C値;nF)、誘電損失(D
F値;%)、バリスタ電圧(V1mA ;V)、電圧非直線
係数(α;−)、サージ電流を流した前後のV1mA とα
の変化率(%)である。A method for evaluating the electrical characteristics of the thus obtained strontium titanate-based grain boundary insulating semiconductor ceramic composition will be described below. The electrical characteristics to be evaluated include capacitance (C value; nF), dielectric loss (D
F value;%), varistor voltage (V 1 mA ; V), voltage nonlinear coefficient (α;-), V 1 mA before and after the surge current flows and α
Is the rate of change (%).
【0024】まず、静電容量と誘電損失はインピーダン
スアナライザ(YHP製 4192A)を用い、周波数
1KHz、測定電圧1V、測定温度20℃の条件で測定
を行なう。バリスタ電圧はサンプル素子に直流電圧を0
〜150Vまで直流定電圧電源装置(YHP製 414
0B)を用いて連続印加し、素子に1mAの電流が流れ
たときの端子間電圧(V1mA )で表示する。電圧非直線
係数は、10mAの電流が流れたときの端子間電圧(V
10mA)を測定し、下記の数1式から算出する。First, the capacitance and the dielectric loss are measured using an impedance analyzer (4192A manufactured by YHP) at a frequency of 1 KHz, a measurement voltage of 1 V and a measurement temperature of 20 ° C. The varistor voltage is 0 V DC to the sample element.
DC constant voltage power supply up to 150V (YHP 414
0B), and a voltage between terminals (V 1 mA ) when a current of 1 mA flows through the element is displayed. The voltage nonlinear coefficient is a voltage between terminals (V) when a current of 10 mA flows.
10 mA ) and calculate from the following equation (1).
【0025】[0025]
【数1】 (Equation 1)
【0026】バリスタ電圧と電圧非直線係数を測定後、
端子間にサージ電流(8/20μsec、3000A/
cm2 )を数回流し、再度、バリスタ電圧と電圧非直線
係数を測定し、サージ電流を流した前後における両値の
変化率を求める。上記した製造方法によりサンプルを各
組成毎に30個製造し、これらの全てについて上記した
評価方法で電気的特性を求め、得られた値を平均して各
電気的特性値とした。After measuring the varistor voltage and the voltage nonlinear coefficient,
Surge current between terminals (8 / 20μsec, 3000A /
cm 2 ) several times, the varistor voltage and the voltage nonlinearity coefficient are measured again, and the rate of change of both values before and after the surge current is applied is determined. Thirty samples were manufactured for each composition by the above-described manufacturing method, and the electrical characteristics of all of them were determined by the above-described evaluation method, and the obtained values were averaged to obtain respective electrical characteristic values.
【0027】実施例に係る半導体磁器組成物の主成分の
組成、絶縁化剤組成、得られた粒界絶縁型半導体磁器組
成物の電気的特性の測定結果を下記の表1〜3に示して
いる。The compositions of the main components of the semiconductor porcelain composition according to the examples, the composition of the insulating agent, and the measurement results of the electrical characteristics of the obtained grain boundary insulating semiconductor porcelain composition are shown in Tables 1 to 3 below. I have.
【0028】[0028]
【表1】 [Table 1]
【0029】[0029]
【表2】 [Table 2]
【0030】[0030]
【表3】 [Table 3]
【0031】上記表1〜3に示した電気的特性の測定結
果から分かるように、備考欄に*印で示した比較例に相
当するものを除いて、実施例に係る半導体磁器組成物は
以下のような良好な電気的特性を示した。As can be seen from the measurement results of the electrical characteristics shown in Tables 1 to 3, except for those corresponding to the comparative examples indicated by * in the remarks column, the semiconductor ceramic compositions according to the examples are as follows. And good electrical characteristics such as
【0032】すなわち、表1〜3に示した絶縁化剤とし
てNa2 Ti3 O7 及びB2 O3 を用い、直径が6mm
で、その厚みが500μmの素子とした場合の静電容量
(C)が30nF以上、その誘電損失(DF)が1.0
%以下、バリスタ電圧(V1mA )が20V以下、電圧非
直線係数(α)が15以上という優れた電気特性値を示
した。なお、サージ電流(3000A/cm2 )を流し
た後のバリスタ電圧(V1mA )と電圧非直線係数(α)
の変化率はいずれも−10%以下に抑えられた。 これ
ら実施例により得られた半導体磁器組成物の電気的特性
は、従来の半導体磁器組成物にない優れた誘電特性と電
圧非直線性(バリスタ特性)とを両有しており、かつ低
電圧化の目的に沿う20V以下の範囲でバリスタ電圧を
コントロールすることができ、特定組成のチタン酸スト
ロンチウム系半導体磁器組成物として他の半導体磁器組
成物から十分に差別化し得るものである。That is, Na 2 Ti 3 O 7 and B 2 O 3 were used as the insulating agents shown in Tables 1 to 3 and the diameter was 6 mm.
When the element has a thickness of 500 μm, the capacitance (C) is 30 nF or more, and the dielectric loss (DF) is 1.0.
%, The varistor voltage (V 1 mA ) was 20 V or less, and the voltage non-linear coefficient (α) was 15 or more. The varistor voltage (V 1mA ) after the surge current (3000 A / cm 2 ) was applied and the voltage nonlinear coefficient (α)
Were suppressed to -10% or less. The electrical characteristics of the semiconductor porcelain composition obtained by these examples have both excellent dielectric characteristics and voltage non-linearity (varistor characteristics) which are not present in the conventional semiconductor porcelain composition, and lower voltage. The varistor voltage can be controlled within the range of 20 V or less according to the purpose of the above, and the strontium titanate-based semiconductor ceramic composition of a specific composition can be sufficiently differentiated from other semiconductor ceramic compositions.
【0033】一方、表1〜3の備考欄に*印で示した比
較例に相当するものについては、誘電特性、バリスタ特
性のいずれかが劣化する等、要求される電気的特性を十
分に満足しないものである。On the other hand, those corresponding to Comparative Examples indicated by * in the remarks column of Tables 1 to 3 sufficiently satisfy required electric characteristics such as deterioration of either dielectric characteristics or varistor characteristics. It does not.
【0034】なお、上記実施例においては電極剤として
Agペーストを用いているが、電極剤は前記Agペース
トに限られず、電極を形成することができる材料であれ
ば他のものであっても構わない。In the above embodiment, an Ag paste is used as an electrode material. However, the electrode material is not limited to the Ag paste, and any other material that can form an electrode may be used. Absent.
【0035】[0035]
【発明の効果】以上詳述したように本発明に係る半導体
磁器組成物にあっては、結晶粒内が(Sr1-x-y Bax
Cay )a (Ti1-z Nbz )b O3 (式中、x、y及
びzはそれぞれ、0<x≦0.05、0<y≦0.2
5、0.001≦z≦0.010の範囲内の値で、かつ
aとbは、0.990≦a/b<1.000の関係を満
たす値)で示される組成を有し、結晶粒界層にさらにN
a及びBが偏析しているので、高い電圧非直線性を有
し、低電圧でバリスタ機能を発現する高誘電率及び低誘
電損失の粒界絶縁型半導体磁器組成物を提供することが
できる。As described above in detail, in the semiconductor ceramic composition according to the present invention, (Sr 1-xy Ba x)
Ca y) a (Ti in 1-z Nb z) b O 3 ( wherein, x, y and z are, 0 <x ≦ 0.05,0 <y ≦ 0.2
5, a value within the range of 0.001 ≦ z ≦ 0.010, and a and b have a composition represented by the following relationship: 0.990 ≦ a / b <1.000) Further N in the grain boundary layer
Since a and B are segregated, it is possible to provide a grain boundary insulating semiconductor ceramic composition having high voltage non-linearity and exhibiting a varistor function at a low voltage and having a high dielectric constant and a low dielectric loss.
【0036】また本発明に係る半導体磁器組成物の製造
方法にあっては、上記(1)記載の半導体磁器組成物の
製造方法であって、チタン酸ストロンチウム系焼結体に
Na2 Ti3 O7 及びB2 O3 を、それぞれ50mol
%≦Na2 Ti3 O7 ≦91mol%、9mol%≦B
2 O3 ≦50mol%の範囲内で含有させて塗布し熱拡
散させるので、高い電圧非直線性を有し、自在にバリス
タ電圧をコントロールすることができる高誘電率及び低
誘電損失の粒界絶縁型半導体磁器組成物を製造すること
ができる。The method for producing a semiconductor porcelain composition according to the present invention is the method for producing a semiconductor porcelain composition according to the above (1), wherein the strontium titanate-based sintered body is made of Na 2 Ti 3 O. 7 and B 2 O 3 each in 50 mol
% ≦ Na 2 Ti 3 O 7 ≦ 91 mol%, 9 mol% ≦ B
Since it is contained within the range of 2 O 3 ≦ 50 mol% and coated and thermally diffused, it has high voltage non-linearity and can control the varistor voltage freely, and has a high dielectric constant and low dielectric loss grain boundary insulation. Type semiconductor porcelain composition can be manufactured.
Claims (2)
a (Ti1-z Nbz)b O3 (式中、x、y及びzはそ
れぞれ、0<x≦0.05、0<y≦0.25、0.0
01≦z≦0.010の範囲内の値で、かつaとbは、
0.990≦a/b<1.000の関係を満たす値)で
示される組成を有し、結晶粒界層にさらにNa及びBが
偏析していることを特徴とする半導体磁器組成物。(1) The inside of a crystal grain is (Sr 1-xy Ba x C ay )
a (Ti 1-z Nb z ) b O 3 (where x, y and z are respectively 0 <x ≦ 0.05, 0 <y ≦ 0.25, 0.0
A value within the range of 01 ≦ z ≦ 0.010, and a and b are:
0.990 ≦ a / b <1.000), wherein Na and B are further segregated in the grain boundary layer.
2 Ti3 O7 及びB2 O3 を、それぞれ50mol%≦
Na2 Ti3 O7 ≦91mol%、9mol%≦B2 O
3 ≦50mol%の範囲内で含有させて塗布し熱拡散さ
せることを特徴とする請求項1記載の半導体磁器組成物
の製造方法。2. A strontium titanate-based sintered body containing Na
2 Ti 3 O 7 and B 2 O 3 each in an amount of 50 mol% ≦
Na 2 Ti 3 O 7 ≦ 91 mol%, 9 mol% ≦ B 2 O
The method for producing a semiconductor ceramic composition according to claim 1, wherein the composition is applied within a range of 3 ≦ 50 mol% and applied and thermally diffused.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6034350A JP2903991B2 (en) | 1994-03-04 | 1994-03-04 | Semiconductor porcelain composition and method for producing the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6034350A JP2903991B2 (en) | 1994-03-04 | 1994-03-04 | Semiconductor porcelain composition and method for producing the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07245202A JPH07245202A (en) | 1995-09-19 |
| JP2903991B2 true JP2903991B2 (en) | 1999-06-14 |
Family
ID=12411711
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6034350A Expired - Lifetime JP2903991B2 (en) | 1994-03-04 | 1994-03-04 | Semiconductor porcelain composition and method for producing the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2903991B2 (en) |
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1994
- 1994-03-04 JP JP6034350A patent/JP2903991B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07245202A (en) | 1995-09-19 |
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