JP2907345B2 - Source gas excitation method in plasma torch - Google Patents
Source gas excitation method in plasma torchInfo
- Publication number
- JP2907345B2 JP2907345B2 JP2209627A JP20962790A JP2907345B2 JP 2907345 B2 JP2907345 B2 JP 2907345B2 JP 2209627 A JP2209627 A JP 2209627A JP 20962790 A JP20962790 A JP 20962790A JP 2907345 B2 JP2907345 B2 JP 2907345B2
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- source gas
- plasma torch
- gas
- torch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
- C03B37/0142—Reactant deposition burners
- C03B37/01426—Plasma deposition burners or torches
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Plasma Technology (AREA)
- Arc Welding Control (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、プラズマトーチにおける原料ガス励起方法
に関するものである。Description: TECHNICAL FIELD The present invention relates to a method for exciting a source gas in a plasma torch.
[従来の技術] 例えば、アルゴンのようなプラズマ生成用ガス或いは
これと原料との混合ガスをプラズマトーチの一方の端若
しくは途中から注入し、このガス流路に高周波加熱コイ
ル又はマイクロ波キャビティ等のプラズマ生成部を設
け、これらのガスをプラズマ状態にする。生成したプラ
ズマは、プラズマトーチの先端より吹き出し、必要な用
途に供される。[Prior Art] For example, a plasma generating gas such as argon or a mixed gas of the same and a raw material is injected from one end or halfway of a plasma torch, and a high-frequency heating coil or a microwave cavity or the like is injected into this gas flow path. A plasma generation unit is provided to bring these gases into a plasma state. The generated plasma is blown out from the tip of the plasma torch, and is provided for a required use.
従来のプラズマトーチでは、高周波加熱コイル又はマ
イクロ波キャビティ等のプラズマ生成部から発生する高
周波電磁場を直接ガスに印加するが、通常室温のガスは
電気的に中性であって、印加された電磁場のエネルギー
を充分に吸収できるほど電離していない。このため、従
来のプラズマトーチでは、プラズマ生成時に印加される
高周波電磁場エネルギーを吸収できるように、ガス流路
中に電極を設け、該電極でアーク放電させる等の方法で
等めガスを弱電離させていた。In a conventional plasma torch, a high-frequency electromagnetic field generated from a plasma generating unit such as a high-frequency heating coil or a microwave cavity is directly applied to a gas. Normally, a gas at room temperature is electrically neutral and the applied electromagnetic field is Not ionized enough to absorb energy. For this reason, in a conventional plasma torch, an electrode is provided in a gas flow path so that high-frequency electromagnetic field energy applied at the time of plasma generation can be absorbed, and an equalizing gas is weakly ionized by a method such as arc discharge at the electrode. I was
[発明が解決しようとする課題] しかしながら、ガス流路中に電極を設けていると、電
極材料のプラズマ中への混入が避けられない問題点があ
った。[Problems to be Solved by the Invention] However, if an electrode is provided in the gas flow path, there is a problem that the mixing of the electrode material into the plasma is inevitable.
また、従来のプラズマトーチでは、プラズマが持続し
ている場合、ガス流量が大きくなるとプラズマ温度が下
がり、且つプラズマ中で生成された荷電粒子が新たに供
給されて来たガスを充分電離しないうちに流出してしま
い、プラズマ炎が不安定になり消失する問題点があっ
た。これをできる限り防ぐために、ガスを励起しプラズ
マを生成すること以外に、プラズマ持続のために過大な
高周波エネルギーを供給する必要があり、このようにす
ると消費電力が大きくならざるを得ない問題点がある。Further, in the conventional plasma torch, when the plasma is sustained, the plasma temperature decreases when the gas flow rate increases, and the charged particles generated in the plasma are not sufficiently ionized by the newly supplied gas. There is a problem that the plasma flame flows out and becomes unstable and disappears. To prevent this as much as possible, besides exciting the gas and generating plasma, it is necessary to supply an excessive amount of high-frequency energy to maintain the plasma, which inevitably increases power consumption. There is.
本発明の目的は、プラズマ中への電極材料の混入を防
止できると共に安定してプラズマを形成できるプラズマ
トーチにおける原料ガス励起方法を供給することにあ
る。An object of the present invention is to provide a method for exciting a source gas in a plasma torch capable of preventing the electrode material from being mixed into the plasma and stably forming the plasma.
[課題を解決するための手段] 上記の目的を達成するための本発明の手段を説明する
と、本発明に係るプラズマトーチにおける原料ガス励起
方法は、プラズマトーチ内に供給された原料ガスがプラ
ズマ生成部に達する前に、該原料ガスにレーザ光を照射
し予め励起することを特徴とする。[Means for Solving the Problems] The means of the present invention for achieving the above object will be described. The method for exciting a source gas in a plasma torch according to the present invention is characterized in that the source gas supplied into the plasma torch generates plasma. Before arriving at the portion, the material gas is irradiated with laser light to excite it in advance.
[作用] プラズマトーチ内でレーザを照射された原料ガスは、
励起されて一部電離する。この原料ガスがプラズマ生成
部に達すると、一部電離状態となっている電子或いはイ
オンがエネルギーを吸収し、周囲の中性ガスを励起して
プラズマを生成する。[Operation] The raw material gas irradiated with the laser in the plasma torch is
It is excited and partially ionized. When the raw material gas reaches the plasma generation part, the partially ionized electrons or ions absorb energy and excite the surrounding neutral gas to generate plasma.
[実施例] 以下、本発明の実施例を第1図を参照して詳細に説明
する。図において、1は内径約35mm,長さ約130mmのハウ
ジングが水冷できるように二重構造となっている石英製
のプラズマトーチ、2Aは該プラズマトーチ1のハウジン
グ内に冷却水を供給する冷却水入口、2Bは該プラズマト
ーチ1のハウジンクからの冷却水の出口、3はプラズマ
トーチ1に酸素,SiCl4等の原料ガスを供給する原料ガス
供給管、4はプラズマトーチ1内で原料ガス供給管3の
先端から原料ガスを放出するキャップ状の原料ガス放出
部、5はプラズマトーチ1内にプラズマガスを供給する
プラズマガス供給管、6は原料ガス放出部4内の原料ガ
ス中にCO2レーザ光を照射する中空円筒状のレーザ光入
射ポート、7はレーザ光入射ポート6内に外部から大気
中の不純物が入って来ないようにシールガスが供給され
るシール部、8はプラズマトーチ1の先端外周に設けら
れた高周波加熱コイル9によりプラズマトーチ1内に形
成されているプラズマ生成部、10は原料ガス放出部4内
に形成された弱電離ガス、11はプラズマ生成部8で形成
されたプラズマ炎である。Hereinafter, an embodiment of the present invention will be described in detail with reference to FIG. In the drawing, reference numeral 1 denotes a quartz plasma torch having a double structure so that a housing having an inner diameter of about 35 mm and a length of about 130 mm can be water-cooled, and 2A denotes cooling water for supplying cooling water into the housing of the plasma torch 1. An inlet, 2B is an outlet of cooling water from the housing of the plasma torch 1, 3 is a source gas supply pipe for supplying a source gas such as oxygen and SiCl 4 to the plasma torch 4, and 4 is a source gas supply pipe in the plasma torch 1. 3 is a cap-shaped source gas discharge section for discharging a source gas from the tip, 5 is a plasma gas supply pipe for supplying plasma gas into the plasma torch 1, 6 is a CO 2 laser in the source gas in the source gas discharge section 4. A hollow cylindrical laser light input port for irradiating light, 7 is a seal portion to which a sealing gas is supplied so that impurities in the atmosphere do not enter the laser light input port 6 from the outside, and 8 is a plasma torch. A plasma generation unit formed in the plasma torch 1 by a high-frequency heating coil 9 provided on the outer periphery of the tip of the plasma generator 1, 10 is a weakly ionized gas formed in the source gas discharge unit 4, and 11 is a plasma generation unit 8. Plasma flame.
プラズマトーチ1内の原料ガス放出部4に原料ガス供
給管3からO2,SiCl4等の原料ガスを供給する。これら原
料ガスは、原料ガス放出部4から放出された直後にレー
ザ光入射ポート6からCO2レーザ光の照射を連続的に受
けて、そのエネルギーを吸収し、一部が電離され、弱電
離ガス10となる。原料ガス放出部4にレーザ光を照射す
るレーザ光入射ポート6は、中空円筒状をしているの
で、原料ガスに照射される前に該レーザ光が吸収,散乱
されるのを防止できる。弱電離ガスは、プラズマ生成部
8に流れ込む。A source gas such as O 2 or SiCl 4 is supplied from a source gas supply pipe 3 to a source gas discharge unit 4 in the plasma torch 1. Immediately after being emitted from the source gas emission unit 4, these source gases are continuously irradiated with CO 2 laser light from the laser light incidence port 6, absorb the energy thereof, are partially ionized, and are partially ionized. It becomes 10. Since the laser beam input port 6 for irradiating the source gas emission section 4 with laser light has a hollow cylindrical shape, it is possible to prevent the laser beam from being absorbed and scattered before the source gas is irradiated. The weakly ionized gas flows into the plasma generation unit 8.
一方、プラズマガス(例えばAr,O2或いはこれらの混
合ガス)はプラズマガス供給管5からプラズマトーチ1
内に供給され、原料ガス放出部4の壁面を冷却した後、
レーザ光照射領域の真下で弱電離ガス10と一部混合す
る。プラズマガス及び弱電離状態の原料ガスは、プラズ
マ生成部8で高周波加熱コイル9から供給された高周波
電磁場のエネルギーによりプラズマ炎11となり、プラズ
マトーチ1から吹き出し、該プラズマトーチ1の下流に
ある試料上に反応生成物を堆積する。例えば、平面上の
基本表面に不純物の少ないガラス膜を長時間に亘って形
成することができる。On the other hand, a plasma gas (for example, Ar, O 2 or a mixed gas thereof) is supplied from a plasma gas supply pipe 5 to a plasma torch 1.
After cooling the wall surface of the raw material gas discharging portion 4
It is partially mixed with the weakly ionized gas 10 just below the laser beam irradiation area. The plasma gas and the source gas in a weakly ionized state are turned into a plasma flame 11 by the energy of the high-frequency electromagnetic field supplied from the high-frequency heating coil 9 in the plasma generation unit 8, blown out from the plasma torch 1, and discharged on the sample downstream of the plasma torch 1. The reaction product is deposited on the substrate. For example, a glass film with few impurities can be formed over a long time on a basic surface on a plane.
[発明の効果] 以上説明したように本発明に係るプラズマトーチにお
ける原料ガス励起方法は、プラズマトーチ内に供給され
た原料ガスがプラズマ生成部に達する前に、該原料ガス
にレーザ光を照射して予め励起するので、ガス流路中に
電極を配置する必要がなく、電極材料がプラズマ中に混
入されなくなり、反応生成物中の金属不純物の濃度を従
来に比べて低い水準に抑えたまま、プラズマ炎を長時間
安定に保つことができる。また、本発明によれば、高周
波エネルギーも所望の反応を起こさせるに必要な分だけ
印加すればよく、消費電力を低減することができる。[Effects of the Invention] As described above, in the method of exciting a source gas in a plasma torch according to the present invention, before the source gas supplied into the plasma torch reaches the plasma generation unit, the source gas is irradiated with laser light. Since it is excited in advance, there is no need to arrange an electrode in the gas flow path, the electrode material is not mixed into the plasma, and the concentration of metal impurities in the reaction product is kept at a lower level than before, Plasma flame can be kept stable for a long time. Further, according to the present invention, high-frequency energy may be applied only in an amount necessary for causing a desired reaction, and power consumption can be reduced.
第1図は本発明に係るプラズマトーチの一実施例の縦断
面図である。 1……プラズマトーチ、3……原料ガス供給管、4……
原料ガス放出部、5……プラズマガス供給管、6……レ
ーザ光入射ポート、7……シール部、8……プラズマ生
成部、9……高周波加熱コイル、10……弱電離ガス、11
……プラズマ炎。FIG. 1 is a longitudinal sectional view of one embodiment of a plasma torch according to the present invention. 1 ... plasma torch, 3 ... source gas supply pipe, 4 ...
Source gas discharge section, 5: Plasma gas supply pipe, 6: Laser beam input port, 7: Seal section, 8: Plasma generation section, 9: High frequency heating coil, 10: Weakly ionized gas, 11
...... Plasma flame.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H05H 1/26 B23K 10/00 ──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 6 , DB name) H05H 1/26 B23K 10/00
Claims (1)
プラズマ生成部に達する前に、該原料ガスにレーザ光を
照射し予め励起することを特徴とするプラズマトーチに
おける原料ガス励起方法。1. A method of exciting a source gas in a plasma torch, wherein the source gas supplied to the plasma torch is irradiated with a laser beam to excite the source gas before the source gas reaches a plasma generation unit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2209627A JP2907345B2 (en) | 1990-08-08 | 1990-08-08 | Source gas excitation method in plasma torch |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2209627A JP2907345B2 (en) | 1990-08-08 | 1990-08-08 | Source gas excitation method in plasma torch |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0492398A JPH0492398A (en) | 1992-03-25 |
| JP2907345B2 true JP2907345B2 (en) | 1999-06-21 |
Family
ID=16575931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2209627A Expired - Lifetime JP2907345B2 (en) | 1990-08-08 | 1990-08-08 | Source gas excitation method in plasma torch |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2907345B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06293950A (en) * | 1993-04-06 | 1994-10-21 | Sansha Electric Mfg Co Ltd | Method for surface-modifying metallic substrate |
| FR2714371B1 (en) * | 1993-12-24 | 1996-02-16 | Cabloptic Sa | Method for recharging an optical fiber preform, device for implementing this method and optical fiber by this method. |
| JP5651843B2 (en) * | 2007-09-10 | 2015-01-14 | イマジニアリング株式会社 | Measuring method and measuring device |
| US8430436B2 (en) | 2009-01-29 | 2013-04-30 | Steven J. Shilts | Anti-ligative doorknob with tri-beveled latchbolt |
| TW201416536A (en) | 2012-06-05 | 2014-05-01 | Sargent Mfg Co | Anti-ligature handle and escutcheon for operating a lock |
-
1990
- 1990-08-08 JP JP2209627A patent/JP2907345B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0492398A (en) | 1992-03-25 |
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