JP2913796B2 - Vapor phase synthetic diamond - Google Patents
Vapor phase synthetic diamondInfo
- Publication number
- JP2913796B2 JP2913796B2 JP21101590A JP21101590A JP2913796B2 JP 2913796 B2 JP2913796 B2 JP 2913796B2 JP 21101590 A JP21101590 A JP 21101590A JP 21101590 A JP21101590 A JP 21101590A JP 2913796 B2 JP2913796 B2 JP 2913796B2
- Authority
- JP
- Japan
- Prior art keywords
- diamond
- carbon
- content
- thermal conductivity
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010432 diamond Substances 0.000 title claims description 75
- 229910003460 diamond Inorganic materials 0.000 title claims description 74
- 239000012808 vapor phase Substances 0.000 title description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 23
- 229910052799 carbon Inorganic materials 0.000 claims description 23
- 239000007789 gas Substances 0.000 claims description 20
- 229910052757 nitrogen Inorganic materials 0.000 claims description 11
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 8
- 238000001308 synthesis method Methods 0.000 claims description 8
- 239000001257 hydrogen Substances 0.000 claims description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 238000001237 Raman spectrum Methods 0.000 claims description 4
- 239000000470 constituent Substances 0.000 claims description 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 20
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 13
- 239000000758 substrate Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 6
- 239000012071 phase Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000001069 Raman spectroscopy Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- LNSPFAOULBTYBI-UHFFFAOYSA-N [O].C#C Chemical group [O].C#C LNSPFAOULBTYBI-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000004050 hot filament vapor deposition Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、気相合成法により製造される高熱伝導性の
ダイヤモンドに関する。Description: TECHNICAL FIELD The present invention relates to a diamond having high thermal conductivity manufactured by a gas phase synthesis method.
ダイヤモンドは既知の物質中で最も高い熱伝導率を有
する物質であり、この性質を利用した用途として高出力
IC、レーザーダイオード等の高性能ヒートシンクがあ
る。Diamond is the substance with the highest thermal conductivity among known substances, and high power is used for applications that take advantage of this property.
There are high performance heat sinks such as ICs and laser diodes.
かかるダイヤモンドの合成法には、大別して超高圧触
媒法と気相合成法とがある。超高圧触媒法は炭素源と鉄
等の金属溶媒を共存させ、超高圧・高温の条件下でダイ
ヤモンドを合成する方法であるが、得られるダイヤモン
ドが粒状で比較的小さいため、数ミリ角から数センチ角
の大きさが要求されるヒートシンク材料としては限度が
あつた。又、金属溶媒等から不純物元素が不可避的に混
入する為、熱伝導率にも限界があり、II a型天然ダイヤ
モンドと同程度の約22W/cm・Kで、それ以上のものは得
られていない。Such diamond synthesis methods are roughly classified into an ultra-high pressure catalyst method and a gas phase synthesis method. The ultra-high pressure catalytic method is a method in which a carbon source and a metal solvent such as iron coexist to synthesize diamond under the conditions of ultra-high pressure and high temperature. There is a limit as a heat sink material that requires a size of a centimeter square. In addition, since the impurity element is inevitably mixed from the metal solvent and the like, the thermal conductivity is also limited, and about 22 W / cm · K, which is about the same as that of IIa type natural diamond, and more are obtained. Absent.
一方、気相合成法(CVD法)は炭素源と水素を含む原
料ガスを分解、活性化させ、基材上にダイヤモンドを膜
状ないし板状に析出させる方法であり、析出面積を数セ
ンチ角以上に大きくでき、従つて製造コストも安価であ
る等の利点がある。気相合成法には、原料ガスの分解・
活性化手段の違いにより多くの方法が知られており、な
かでも高温加熱した熱フィラメントを用いつ熱フィラメ
ントCVD法、マイクロ波プラズマやDC熱プラズマ等を利
用するプラズマCVD法が代表的な方法である。On the other hand, the vapor phase synthesis method (CVD method) is a method in which a raw material gas containing a carbon source and hydrogen is decomposed and activated, and diamond is deposited on a substrate in the form of a film or a plate. There is an advantage that the size can be increased as described above, and therefore the manufacturing cost is low. The gas phase synthesis method involves the decomposition and
Many methods are known due to the difference in activation means. Among them, the hot filament CVD method using a hot filament heated at a high temperature, and the plasma CVD method using microwave plasma or DC thermal plasma are typical methods. is there.
しかし、従来の気相合成法で製造されたダイヤモンド
の熱伝導率は全て16W/cm・K以下であり、天然ダイヤモ
ンドや超高圧触媒法で製造したダイヤモンドよりも低い
ものであつた。However, the thermal conductivity of diamonds produced by the conventional gas phase synthesis method is 16 W / cm · K or less, which is lower than that of natural diamond or diamond produced by the ultrahigh pressure catalytic method.
本発明はかかる従来の事情に鑑み、ヒートシンク材料
として必要な大きさと高い熱伝導率、好ましくは25W/cm
・K以上、を備えた気相合成ダイヤモンドを提供するこ
とを目的とする。In view of such conventional circumstances, the present invention has a size and high thermal conductivity required for a heat sink material, preferably 25 W / cm.
The object is to provide a vapor-phase synthetic diamond having K or more.
上記目的を達成するため、本発明の気相合成ダイヤモ
ンドにおいては、構成元素である炭素のうち99.9%以上
が原子量12の炭素か又は原子量13の炭素のいずれかであ
つて、ラマン分光スペクトルにおけるダイヤモンドに対
する非ダイヤモンド成分のピークの強度比が0.07以下で
あり、窒素原子の含有量が5ppm以下であることを特徴と
する。In order to achieve the above object, in the vapor-phase synthetic diamond of the present invention, 99.9% or more of the constituent carbon atoms are either 12 atomic weight carbon or 13 atomic weight carbon, and the diamond The peak intensity ratio of the non-diamond component with respect to is not more than 0.07, and the nitrogen atom content is not more than 5 ppm.
熱伝導は格子振動のフオノンの伝播により説明される
が、原子量の異なる原子が結晶中に存在するとフオノン
の散乱原因となり、熱伝導率の低下につながる。気相合
成ダイヤモンドの組成分析によれば、不純物としては原
料ガス中に含有される窒素の混入が主なものである。
又、原料ガス中の炭素源に含まれる炭素には、通常は原
子量12の炭素(12C)以外に原子量13の炭素(13C)が同
位体として約1.1%含まれるので、通常のメタン等を炭
素源として用いた場合には13Cがそのまゝダイヤモンド
中に取り込まれ、これも熱伝導率を低下させる原因の一
つとなる。Although heat conduction is explained by the propagation of phonons of lattice vibration, the presence of atoms having different atomic weights in the crystal causes scattering of phonons, leading to a decrease in thermal conductivity. According to the composition analysis of the vapor-phase synthetic diamond, nitrogen is mainly contained in the source gas as impurities.
Moreover, the carbon contained in the carbon source in the feed gas, since usually the carbon atom content 13 in addition to carbon atomic weight 12 (12 C) (13 C ) is contained about 1.1% isotopically normal methane When is used as a carbon source, 13 C is taken into the diamond as it is, which is also one of the causes for lowering the thermal conductivity.
そこで本発明では、ダイヤモンド中の炭素の同位体の
割合並びに窒素の含有量を変化させ、熱伝導率との関係
を検討した結果、ダイヤモンドを構成する炭素としては
12C又は13Cのいずれかが99.9%以上であつて、且つ窒素
原子の含有量が5ppm以下であるとき、25W/cm・K以上の
高い熱伝導率のダイヤモンドが得られることが判つた。Therefore, in the present invention, as a result of examining the relationship with the thermal conductivity by changing the ratio of carbon isotopes and the content of nitrogen in diamond, the carbon constituting diamond is
It has been found that when either 12 C or 13 C is 99.9% or more and the nitrogen atom content is 5 ppm or less, diamond having a high thermal conductivity of 25 W / cm · K or more can be obtained.
尚、12C又は13Cのいずれかを99.9%以上含む炭素源
は、通常のメタン、エタン、アセチレン、アルコール、
ケトン、一酸化炭素などの炭素源を質量分離することに
よつて得られる。The carbon source containing 99.9% or more of either 12 C or 13 C is usually methane, ethane, acetylene, alcohol,
It is obtained by mass separation of carbon sources such as ketones and carbon monoxide.
又、気相合成ダイヤモンドの熱伝導率は、ダイヤモン
ドに含まれるグラフアイトやアモルフアスカーボン等の
非ダイヤモンド成分によつても左右される。ダイヤモン
ドの結晶性を向上させて非ダイヤモンド成分を減少させ
るためには、原料ガス中に微量の酸素や水を含有させた
り、基材温度等の合成条件を選択する等の方法が有効で
あることは知られている。The thermal conductivity of the vapor-phase synthetic diamond is also affected by non-diamond components such as graphite and amorphous carbon contained in the diamond. In order to improve the crystallinity of diamond and reduce non-diamond components, methods such as adding a small amount of oxygen or water to the raw material gas and selecting synthesis conditions such as substrate temperature should be effective. Is known.
本発明においては、ダイヤモンド中における非ダイヤ
モンド成分の含有量と熱伝導率との関係を検討し、非ダ
イヤモンド成分の含有量をラマン分光スペクトルにより
評価したとき、ダイヤモンドに対する非ダイヤモンド成
分のピークの強度比が0.07以下であれば、ダイヤモンド
の熱伝導率を高めうることが判つた。In the present invention, the relationship between the content of the non-diamond component and the thermal conductivity in diamond is examined, and when the content of the non-diamond component is evaluated by Raman spectroscopy, the intensity ratio of the peak of the non-diamond component to diamond is determined. It has been found that if is less than 0.07, the thermal conductivity of diamond can be increased.
本発明の高熱伝導性のダイヤモンドを製造する方法と
しては、炭素源を選択し且つ窒素の混入を制限する限り
公知の気相合成法を使用できるが、DC熱プラズマトーチ
を利用するプラズマジエツト法や酸素−アセチレン炎を
用いるバーナー法のように空気中で合成する方法は、窒
素量の制御が困難であるため適当ではない。As a method for producing the diamond having high thermal conductivity of the present invention, a known gas-phase synthesis method can be used as long as a carbon source is selected and the contamination of nitrogen is limited, but a plasma jet method using a DC thermal plasma torch can be used. A method of synthesizing in the air, such as a burner method using an oxygen-acetylene flame or the like, is not suitable because it is difficult to control the amount of nitrogen.
実施例1 公知のマイクロ波プラズマCVD法により、炭素が99.95
%の12Cよりなるメタンと水素を原料ガスとし、表面を
#5000のダイヤモンド砥粒で傷つけ処理したシリコンウ
エハー基材(寸法20mm角)上にダイヤモンドを析出させ
た。原料ガス中の窒素原子の含有量は、ガスクロマトグ
ラフで測定したところ20ppmであつた。原料ガス中のメ
タンと水素の比率を1:100とし、反応室内の圧力400tor
r、マイクロ波出力400W及び基材温度950℃の条件下で50
0時間成膜し、基材の全表面上に厚さ約500μmのダイヤ
モンド膜を得た。成膜終了後、弗酸によつて基材を溶解
してダイヤモンドの薄板を回収し、その両表面を研磨加
工して厚さ300μmとした。Example 1 By a known microwave plasma CVD method, carbon was 99.95.
% Of methane and hydrogen of 12 C as source gas, diamond was deposited on a silicon wafer substrate (20 mm square) whose surface was damaged by # 5000 diamond abrasive grains. The content of nitrogen atoms in the raw material gas was 20 ppm as measured by gas chromatography. The ratio of methane to hydrogen in the source gas was 1: 100, and the pressure in the reaction chamber was 400 torr.
r, 50 at microwave power 400W and substrate temperature 950 ℃
Film formation was performed for 0 hour to obtain a diamond film having a thickness of about 500 μm on the entire surface of the substrate. After the film formation, the base material was dissolved with hydrofluoric acid to recover a diamond thin plate, and both surfaces were polished to a thickness of 300 μm.
得られたダイヤモンドの組成を熱分解ガスクロマトグ
ラフ−マススペクトロスコピー連動分析器で分析したと
ころ、12Cの含有量は99.95%及び窒素原子の含有量は5p
pmであつた。又、ラマン分光分析の結果、ダイヤモンド
に対する非ダイヤモンド成分のピーク強度比は0.03であ
つた。このダイヤモンドの熱伝導率は、定常熱流束下の
温度勾配を測定して既知材料と比較する方法で測定した
ところ、30W/cm・Kであつた。When the composition of the obtained diamond was analyzed by a pyrolysis gas chromatograph-mass spectroscopy coupled analyzer, the content of 12 C was 99.95% and the content of nitrogen atoms was 5 p.
pm. As a result of Raman spectroscopy, the peak intensity ratio of the non-diamond component to diamond was 0.03. The thermal conductivity of the diamond was 30 W / cm · K as measured by a method in which a temperature gradient under a steady heat flux was measured and compared with a known material.
実施例2 メタンと水素の比率及び基板温度を種々変えた以外は
実施例1と同様にして、ダイヤモンドを合成した。Example 2 A diamond was synthesized in the same manner as in Example 1 except that the ratio of methane to hydrogen and the substrate temperature were variously changed.
得られたダイヤモンドについて実施例1と同様に評価
したところ、12Cと窒素の含有量は実施例1と同じであ
つたが、熱伝導率とラマン分光スペクトルの非ダイヤモ
ンド成分/ダイヤモンドのピーク強度比の関係は第1表
の通りであつた。When the obtained diamond was evaluated in the same manner as in Example 1, the content of 12 C and nitrogen was the same as in Example 1, but the thermal conductivity and the ratio of non-diamond component / diamond peak intensity in Raman spectroscopy were measured. Table 1 shows the relationship.
実施例3 メタン中の炭素の12C含有量を種々変えた以外は実施
例1と同様にしてダイヤモンドを合成した。 Example 3 A diamond was synthesized in the same manner as in Example 1 except that the 12 C content of carbon in methane was variously changed.
得られたダイヤモンドについて実施例1と同様に評価
したところ、窒素の含有量及びラマン分光スペクトルの
非ダイヤモンド成分/ダイヤモンドのピーク強度比は実
施例1と同じであつた。ダイヤモンド中の12C含有量は
使用したメタン中の炭素の12C含有量と同じであり、こ
のダイヤモンド中の12C含有量とダイヤモンドの熱伝導
率の関係を第2表に示した。When the obtained diamond was evaluated in the same manner as in Example 1, the content of nitrogen and the peak intensity ratio of the non-diamond component / diamond in the Raman spectrum were the same as in Example 1. The content of 12 C in diamond was the same as the content of 12 C in carbon used in methane. Table 2 shows the relationship between the content of 12 C in the diamond and the thermal conductivity of the diamond.
実施例4 メタン中の炭素の12C含有量を99.9%とし、原料ガス
中の窒素含有量を下記第3表に示す如く変えた以外は実
施例1と同様にしてダイヤモンドを合成した。 Example 4 A diamond was synthesized in the same manner as in Example 1 except that the content of 12 C in carbon in methane was 99.9% and the nitrogen content in the raw material gas was changed as shown in Table 3 below.
得られたダイヤモンドについて実施例1と同様に評価
したところ、ダイヤモンド中の12C含有量は99.9%であ
り、ラマン分光スペクトルの非ダイヤモンド成分/ダイ
ヤモンドのピーク強度比は実施例1と同じであつた。原
料ガス中及びダイヤモンド中の窒素原子含有量とダイヤ
モンドの熱伝導率の関係を第3表に示した。When the obtained diamond was evaluated in the same manner as in Example 1, the content of 12 C in the diamond was 99.9%, and the peak intensity ratio of the non-diamond component / diamond in the Raman spectrum was the same as that in Example 1. . Table 3 shows the relationship between the nitrogen atom content in the source gas and diamond and the thermal conductivity of diamond.
実施例5 公知の熱フイラメントCVD法により、炭素が99.92%の
13Cよりなるメタンと水素を原料ガスとして、実施例1
と同様に処理したシリコンウエハー基材(寸法4インチ
角)上にダイヤモンドを析出させた。原料ガス中の窒素
原子の含有量は、ガスクロマトグラフで測定したところ
50ppmであつた。原料ガス中のメタンと水素の比率は1.
2:100とし、反応室内の圧力40torr、直径0.2mmのWフイ
ラメントの温度2080℃及び基材温度950℃の条件下で600
時間成膜し、基材全表面上に厚さ約450μmのダイヤモ
ンド膜を得た。成膜終了後、回収したダイヤモンドを研
磨加工して厚さ300μmとした。 Example 5 By a known thermal filament CVD method, carbon was 99.92%.
Example 1 Using methane composed of 13 C and hydrogen as raw material gases
Diamond was deposited on a silicon wafer substrate (dimensions of 4 inch square) treated in the same manner as in Example 1. The content of nitrogen atoms in the raw material gas was measured by gas chromatography.
It was 50 ppm. The ratio of methane and hydrogen in the source gas is 1.
2: 100, the pressure in the reaction chamber was 40 torr, the temperature of a W filament having a diameter of 0.2 mm was 2080 ° C, and the temperature was 600
A diamond film having a thickness of about 450 μm was obtained over the entire surface of the substrate. After the film formation, the collected diamond was polished to a thickness of 300 μm.
得られたダイヤモンドを実施例1と同様に評価したと
ころ、ダイヤモンド中の13C含有量は99.92%及び窒素原
子の含有量は3ppmであつた。又、ラマン分光スペクトル
の非ダイヤモンド成分/ダイヤモンドのピーク強度比は
0.03であつた。このダイヤモンドの熱伝導率は25W/cm・
Kであつた。When the obtained diamond was evaluated in the same manner as in Example 1, the content of 13 C in the diamond was 99.92% and the content of nitrogen atoms was 3 ppm. The peak intensity ratio of the non-diamond component / diamond in the Raman spectrum is
It was 0.03. The thermal conductivity of this diamond is 25W / cm
It was K.
本発明によれば、ヒートシンク材料として必要な大き
さと高い熱伝導率とを備えた気相合成ダイヤモンドを提
供することが出来る。ADVANTAGE OF THE INVENTION According to this invention, the vapor phase synthetic | combination diamond provided with the magnitude | size required as a heat sink material and a high thermal conductivity can be provided.
本発明の気相合成ダイヤモンドをヒートシンクとして
使用する場合、基材を除去して使用し、高放熱性の
金属やセラミツクス上に形成して使用し、又はダイヤ
モンド単結晶上に形成して使用することが考えられる。
特にの場合には従来のダイヤモンドより薄い厚さで高
放熱が実現でき、やの場合も従来よりダイヤモンド
の厚さを節約できる。又、からのいずれの場合も、
ダイヤモンドの厚さを調節することにより、求められる
放熱性を確保することが可能である。When using the vapor-phase synthetic diamond of the present invention as a heat sink, use it after removing the base material, use it by forming it on a metal or ceramics having high heat dissipation, or use it by forming it on a diamond single crystal. Can be considered.
In particular, high heat radiation can be realized with a thickness smaller than that of the conventional diamond, and in other cases, the thickness of the diamond can be saved more than before. Also, in any case from
By adjusting the thickness of the diamond, it is possible to secure the required heat dissipation.
Claims (1)
法により製造されたダイヤモンドであつて、構成元素で
ある炭素のうち99.9%以上が原子量12の炭素か又は原子
量13の炭素のいずれかであつて、ラマン分光スペクトル
におけるダイヤモンドに対する非ダイヤモンド成分のピ
ークの強度比が0.07以下であり、窒素原子の含有量が5p
pm以下であることを特徴とする気相合成ダイヤモンド。Claims 1. A diamond produced by a gas phase synthesis method from a source gas containing a carbon source and hydrogen, wherein 99.9% or more of carbon as a constituent element is either carbon having an atomic weight of 12 or carbon having an atomic weight of 13. The intensity ratio of the peak of the non-diamond component to diamond in the Raman spectrum is 0.07 or less, and the nitrogen atom content is 5 p.
Gas phase synthetic diamond characterized by being less than pm.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21101590A JP2913796B2 (en) | 1990-08-09 | 1990-08-09 | Vapor phase synthetic diamond |
| DE1991629314 DE69129314T2 (en) | 1990-08-03 | 1991-08-02 | CVD process for the production of diamond |
| EP19910113034 EP0469626B1 (en) | 1990-08-03 | 1991-08-02 | Chemical vapor deposition method of high quality diamond |
| US08/115,783 US6162412A (en) | 1990-08-03 | 1993-09-03 | Chemical vapor deposition method of high quality diamond |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21101590A JP2913796B2 (en) | 1990-08-09 | 1990-08-09 | Vapor phase synthetic diamond |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0492896A JPH0492896A (en) | 1992-03-25 |
| JP2913796B2 true JP2913796B2 (en) | 1999-06-28 |
Family
ID=16598933
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21101590A Expired - Lifetime JP2913796B2 (en) | 1990-08-03 | 1990-08-09 | Vapor phase synthetic diamond |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2913796B2 (en) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6582513B1 (en) | 1998-05-15 | 2003-06-24 | Apollo Diamond, Inc. | System and method for producing synthetic diamond |
| AU2001281404B2 (en) * | 2001-08-08 | 2008-07-03 | Apollo Diamond, Inc. | System and method for producing synthetic diamond |
| JP4623356B2 (en) * | 2003-12-02 | 2011-02-02 | 住友電気工業株式会社 | Single crystal diamond |
| WO2006048957A1 (en) | 2004-11-05 | 2006-05-11 | Sumitomo Electric Industries, Ltd. | Single-crystal diamond |
| GB2476478A (en) * | 2009-12-22 | 2011-06-29 | Element Six Ltd | Chemical vapour deposition diamond synthesis |
| JP5880200B2 (en) * | 2012-03-27 | 2016-03-08 | 住友電気工業株式会社 | Single crystal diamond and method for producing the same |
| EP2752506B1 (en) * | 2011-09-02 | 2017-04-05 | Sumitomo Electric Industries, Ltd. | Single crystal diamond and method for producing same |
| JP2012176889A (en) * | 2012-05-10 | 2012-09-13 | Apollo Diamond Inc | System and method for producing synthetic diamond |
| GB201214370D0 (en) | 2012-08-13 | 2012-09-26 | Element Six Ltd | Thick polycrystalline synthetic diamond wafers for heat spreading applications and microwave plasma chemical vapour deposition synthesis techniques |
| GB201610053D0 (en) | 2016-06-09 | 2016-07-27 | Element Six Tech Ltd | Synthetic diamond heat spreaders |
-
1990
- 1990-08-09 JP JP21101590A patent/JP2913796B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0492896A (en) | 1992-03-25 |
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