JP2916512B2 - Falling liquid film type plate evaporator - Google Patents
Falling liquid film type plate evaporatorInfo
- Publication number
- JP2916512B2 JP2916512B2 JP23744990A JP23744990A JP2916512B2 JP 2916512 B2 JP2916512 B2 JP 2916512B2 JP 23744990 A JP23744990 A JP 23744990A JP 23744990 A JP23744990 A JP 23744990A JP 2916512 B2 JP2916512 B2 JP 2916512B2
- Authority
- JP
- Japan
- Prior art keywords
- evaporation
- liquid
- chamber
- preheating chamber
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 title claims description 44
- 238000001704 evaporation Methods 0.000 claims description 53
- 230000008020 evaporation Effects 0.000 claims description 49
- 239000010408 film Substances 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 5
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 238000000034 method Methods 0.000 claims description 2
- 238000009835 boiling Methods 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 7
- 238000007872 degassing Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000012530 fluid Substances 0.000 description 2
- 239000007792 gaseous phase Substances 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 239000000498 cooling water Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Engine Equipment That Uses Special Cycles (AREA)
- Heat-Exchange Devices With Radiators And Conduit Assemblies (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、流下液膜型のプレート式蒸発器に関し、
特に非共沸混合物の蒸発に対応できるようにしたもので
ある。Description: TECHNICAL FIELD The present invention relates to a falling liquid film type plate evaporator,
In particular, the method is adapted to cope with the evaporation of a non-azeotropic mixture.
非共沸混合物は沸点の異なる２以上の流体の混合物で
あって、二成分系または多成分系の非共沸混合物をバイ
ナリーサイクルの作動媒体として用いることは知られて
いる（例えば、溶かし61−79810号公報参照）。A non-azeotropic mixture is a mixture of two or more fluids having different boiling points, and it is known that a binary or multi-component non-azeotropic mixture is used as a working medium for a binary cycle (for example, a melt 61-). No. 79810).
第５図は工場温排水や地熱水等の熱源から熱を回収し
て動力として取り出すようにしたバイナリー発電システ
ムを示す。このシステムにおいて、作動媒体は、蒸発器
（22）、蒸気タービン（24）、凝縮器（26）およびポン
プ（28）を直列に接続して構成される閉ループ内を循環
する。すなわち、液相の作動媒体が蒸発器（22）にて熱
源から熱を奪って蒸発し、発生した蒸気は蒸気タービン
（24）に送られて発電機（30）を駆動するのに利用さ
れ、仕事を終えて蒸気タービン（24）から排出された蒸
気は凝縮器（26）に進み、そこで冷却水に熱を奪われて
凝縮する。凝縮液はポンプ（28）で再び蒸発器（22）へ
送られる。以後、上述のサイクルを反復する。FIG. 5 shows a binary power generation system that recovers heat from a heat source such as factory warm wastewater or geothermal water and extracts it as power. In this system, the working medium circulates in a closed loop consisting of an evaporator (22), a steam turbine (24), a condenser (26) and a pump (28) connected in series. That is, the working fluid in the liquid phase evaporates by removing heat from the heat source in the evaporator (22), and the generated steam is sent to the steam turbine (24) and used to drive the generator (30), After the work is completed, the steam discharged from the steam turbine (24) proceeds to the condenser (26), where heat is taken by the cooling water and condensed. The condensate is sent again to the evaporator (22) by the pump (28). Thereafter, the above cycle is repeated.
流下液膜型プレート式蒸発器は、第４図に例示される
ように、多数のプレート（１）によって蒸発通路（２）
と加熱通路（３）が交互に形成されている。隣り合うプ
レート（１）間に形成された蒸発通路（２）は、上部で
給液口（４）と連通して、下部で排出口（５）と連通し
ている。排出口（４）には気液分離器（６）を設けてあ
る。加熱媒体は、プレート群を囲繞するシェル（７）の
下部の供給口（８）からシェル（７）内に流入し、加熱
通路（３）を経て、シェル（７）の上部の排出口（９）
から器外に排出されるようになっている。給液口（４）
から供給された液体は各蒸発通路（２）に流入し、蒸発
通路（２）を構成するプレート（１）の蒸発伝熱面上を
薄膜状に流下する間に、加熱通路（３）内の加熱媒体か
ら熱を奪って蒸発する。発生した蒸気は蒸発伝熱面上の
流下液膜から離れて蒸発通路（２）内にたまり、排出口
（５）から気液分離器（６）に導かれる。気液分離器
（６）により蒸気と未蒸発液とが分離され、それぞれ別
々に取り出される。そして、第５図のバイナリーサイク
ルにおける蒸発器（22）の場合、蒸気は蒸気タービン
（24）に送られ、未蒸発液は液供給ライン（31）を通じ
て給液口（４）に戻され、循環する。As shown in FIG. 4, the falling liquid film type plate evaporator is composed of a plurality of plates (1) and an evaporation passage (2).
And the heating passage (3) are formed alternately. The evaporation passage (2) formed between the adjacent plates (1) communicates with the liquid supply port (4) at the upper part and communicates with the discharge port (5) at the lower part. The outlet (4) is provided with a gas-liquid separator (6). The heating medium flows into the shell (7) from the supply port (8) at the lower part of the shell (7) surrounding the plate group, passes through the heating passage (3), and passes through the outlet (9) at the upper part of the shell (7). )
From the outside. Supply port (4)
Liquid supplied from the heating passage (2) flows into each of the evaporation passages (2) and flows down in a thin film on the evaporation heat transfer surface of the plate (1) constituting the evaporation passage (2). Evaporates by removing heat from the heating medium. The generated vapor separates from the falling liquid film on the evaporation heat transfer surface, accumulates in the evaporation passage (2), and is guided from the discharge port (5) to the gas-liquid separator (6). The vapor and the non-evaporated liquid are separated by the gas-liquid separator (6) and are separately taken out. Then, in the case of the evaporator (22) in the binary cycle of FIG. 5, the steam is sent to the steam turbine (24), and the non-evaporated liquid is returned to the liquid supply port (4) through the liquid supply line (31) and circulated. I do.
非共沸混合物では沸点の異なる系が混在しているた
め、第６図に示される気液平衡線図からわかるように、
蒸発器入口に供給された温度（T1）で既に低沸成分が一
部蒸発することができる。蒸発器入口点から低沸成分蒸
気が発生すると、蒸発器内における液体中の高沸成分濃
度が増加し、その結果高沸成分の蒸発開始温度がT2から
T3に上がってしまって所期の蒸発器性能が達成されなく
なるという問題が生ずる。また、予熱部や高温循環液と
の混合物にて発生した低沸成分の蒸気は蒸発器上部にた
まり、予熱障害や液流れ障害を引き起こす。In the non-azeotropic mixture, since systems having different boiling points are mixed, as can be seen from the vapor-liquid equilibrium diagram shown in FIG.
At the temperature (T 1 ) supplied to the evaporator inlet, some of the low-boiling components can already be evaporated. If the evaporator inlet point low boilers steam is generated, the high boiling component concentration in the liquid in the evaporator is increased, the evaporation initiation temperature of the resulting high boiling components from T 2
Gone up to T 3 problem of the expected evaporator performance can not be achieved it occurs. Further, the low-boiling component vapor generated in the preheating section or in the mixture with the high-temperature circulating liquid accumulates in the upper part of the evaporator, causing a preheating obstacle or a liquid flow obstacle.
そこで、この発明の目的は、蒸発器入口点における低
沸成分の蒸発を抑えつつ液体の予熱を行うことができる
ようにするとともに、予熱室内で蒸気が発生してもこれ
を排除することができるようにすることである。Therefore, an object of the present invention is to make it possible to perform preheating of a liquid while suppressing evaporation of low-boiling components at an evaporator inlet point, and to eliminate vapor generated in a preheating chamber. Is to do so.
この発明は、蒸発すべき液体がプレートの蒸発伝熱面
上を薄膜状に流下するようにした流下液膜型プレート式
蒸発器において、隣り合うプレート間に形成される蒸発
通路に絞り部を設けて絞り部より上流側を予熱室とする
とともに絞り部より下流側を蒸発室とし、かつ、予熱室
の上部と蒸発室の下部の気相とをガス抜き管で接続した
ことを特徴とする。According to the present invention, in a falling liquid film type plate evaporator in which a liquid to be evaporated flows down in a thin film on an evaporation heat transfer surface of a plate, a throttle portion is provided in an evaporation passage formed between adjacent plates. The upstream side of the throttle section is used as a preheating chamber, the downstream side of the throttle section is used as an evaporation chamber, and the upper part of the preheating chamber and the gaseous phase below the evaporation chamber are connected by a degassing pipe.
絞り部が存在することにより、この絞り部より上流側
に位置する予熱室では、絞り部より下流側の位置する蒸
発室よりも圧力が高くなる。したがって、予熱室では低
沸成分の蒸発が抑制されるので非共沸混合物き予熱を効
率的に行うことができる。また、予熱室内や液供給ライ
ン中で蒸気が発生しても、これらの蒸気は予熱室の上部
にたまるので、予熱室と蒸発室との圧力差を利用して、
ガス抜き管で容易に蒸発室側へ排出することができる。Due to the presence of the throttle, the preheating chamber located upstream of the throttle has a higher pressure than the evaporation chamber located downstream of the throttle. Therefore, in the preheating chamber, the evaporation of the low-boiling components is suppressed, so that the non-azeotropic mixture can be efficiently preheated. In addition, even if steam is generated in the preheating chamber or the liquid supply line, these steams accumulate in the upper part of the preheating chamber, and thus, utilizing the pressure difference between the preheating chamber and the evaporation chamber,
The gas can be easily discharged to the evaporation chamber side by the gas vent tube.
第１図に示されるように、蒸発通路（２）は隣り合う
一対のプレート（１）間に形成される。なお、図示例で
はプレート（１）の周囲を溶接して蒸発通路（２）を構
成するようにしているが、これに限らず、例えば周囲ガ
スケットでシールするようにしてもよい。蒸発通路
（２）は絞り部（10）を持っている。絞り部（10）はプ
レート（１）を局部的に蒸発通路（２）側に突出させる
ことによって形成されるが、その形態は実施に際して種
々のものを選択することができる。例えば、蒸気通路
（２）を構成する一対のプレート（１）のうち一方だけ
に突部（11）を設ける（第２図（Ａ））、両方のプレー
ト（１）にそのような突部（11）を設ける（第２図
（Ｂ））、あるいはまた，一方は段差状の突部（12）と
する（第２図（Ｃ））ことなどが可能である。これらの
突部（11、12）はいずれもプレート（１）の幅方向すな
わち図の紙面と直交する方向に連続的に延びており、そ
の結果、突部（11、12）のところでは蒸発通路（２）を
構成するプレート（１）の対向面間が狭められて微小な
すきま乃至オリフィスを残すだけとなっている。As shown in FIG. 1, the evaporation passage (2) is formed between a pair of adjacent plates (1). In the illustrated example, the periphery of the plate (1) is welded to form the evaporation passage (2). However, the present invention is not limited to this. For example, the gas passage may be sealed with a surrounding gasket. The evaporation passage (2) has a throttle (10). The throttle portion (10) is formed by locally projecting the plate (1) toward the evaporation passage (2), and various forms can be selected for the embodiment. For example, a protrusion (11) is provided on only one of a pair of plates (1) constituting a steam passage (2) (FIG. 2 (A)), and such a protrusion ( 11) can be provided (FIG. 2 (B)), or one of them can be a step-shaped projection (12) (FIG. 2 (C)). Each of these projections (11, 12) continuously extends in the width direction of the plate (1), that is, in a direction perpendicular to the plane of the drawing, and as a result, at the projections (11, 12), the evaporation passage The distance between the opposing surfaces of the plate (1) constituting (2) is narrowed, leaving only a small gap or orifice.
突部（11、12）はこのようにして蒸発通路（２）に絞
り部（10）を形成させる。絞り部（10）により蒸発通路
（２）の上部に予熱部（2b）が画成され、絞り部（10）
より下部が蒸発室（2a）となる。そして、蒸発室（2a）
の圧力をPeとすると、予熱室（2b）の圧力Poは絞り部
（10）があるためにPe＋αとなる。ここで、絞り部（1
0）の位置を蒸発通路（２）の上端に近づけると、予熱
室（2b）の容積が小さくなって十分な予熱効果が得られ
ず、単にプレート（１）の幅方向に液体を均一に拡散さ
せるためのヘッダーとしての役割を果たすにすぎないも
のとなってしまう。したがって、必要にして十分な予熱
効果が得られる程度の伝熱面積を予熱室（2b）に持たせ
るべく絞り部（10）の位置が決められる。The projections (11, 12) thus form a throttle (10) in the evaporation passage (2). A preheating section (2b) is defined above the evaporation passage (2) by the throttle section (10), and the throttle section (10)
The lower part becomes the evaporation chamber (2a). And the evaporation chamber (2a)
Is Pe, the pressure Po of the preheating chamber (2b) is Pe + α because of the restriction (10). Here, the aperture (1
When the position (0) is closer to the upper end of the evaporating passage (2), the volume of the preheating chamber (2b) becomes small and a sufficient preheating effect cannot be obtained, and the liquid is simply diffused uniformly in the width direction of the plate (1). It simply serves as a header to make it work. Therefore, the position of the throttle portion (10) is determined so that the preheating chamber (2b) has a heat transfer area enough to obtain a necessary and sufficient preheating effect.
給液口（４）（第４図参照）から供給された液は、ま
ず予熱室（2b）内に流入し、絞り部（10）でせき止めら
れることによりプレート（１）の幅方向に拡散して予熱
室（2b）内に充満する。そして、予熱室（2b）内の液
は、プレート（１）を介して、加熱通路（３）内を流れ
る加熱媒体によって予熱される。このようにして予熱さ
れた液は、絞り部（10）のすきま乃至オリフィスから蒸
発室（2a）に流れ出す。このとき、液は突部（11、12）
の下側に沿って、または突部（11）と対向しているプレ
ート（１）の表面を伝って、薄膜状に流下し、蒸発室
（2a）に面するプレート（１）の表面つまり蒸発伝熱面
（1a）上に流下液膜を形成する。なお、表面張力の小さ
い液の場合は、突部（11、12）の下側をなだらかな曲線
で蒸発伝熱面（1a）に連続させることにより、蒸発伝熱
面（1a）上に連続させることにより、蒸発伝熱面（1a）
上に流下液膜を形成させやすくすることができる。ま
た、プレート（１）の蒸発通路（２）側の表面に金属溶
射などでポーラス層を設けることにより、表面張力の小
さい液でもプレートへの付着性が一層向上する。The liquid supplied from the liquid supply port (4) (see FIG. 4) first flows into the preheating chamber (2b), and is diffused in the width direction of the plate (1) by being dammed by the throttle (10). To fill the preheating chamber (2b). Then, the liquid in the preheating chamber (2b) is preheated by the heating medium flowing in the heating passage (3) via the plate (1). The liquid preheated in this manner flows from the gap or the orifice of the throttle (10) into the evaporation chamber (2a). At this time, the liquid is projected (11, 12)
Along the lower side or along the surface of the plate (1) facing the projection (11), flows down in a thin film form, and the surface of the plate (1) facing the evaporation chamber (2a), that is, evaporation A falling liquid film is formed on the heat transfer surface (1a). In the case of a liquid having a small surface tension, the lower side of the projections (11, 12) is connected to the evaporative heat transfer surface (1a) by a gentle curve and is connected to the evaporative heat transfer surface (1a). By evaporating heat transfer surface (1a)
A falling liquid film can be easily formed thereon. Further, by providing a porous layer on the surface of the plate (1) on the side of the evaporation passage (2) by metal spraying or the like, even a liquid having a small surface tension can further improve the adhesion to the plate.
第３図（Ａ）〜（Ｃ）は、第２図の実施例では突部
（11、12）がプレート（１）の幅方向に連続しているの
に対し、互いに独立した複数の突部（13）をプレート
（１）の幅方向に所定の間隔で配置した実施例を示して
いる。この場合、第３図（Ｂ）（Ｃ）に示されるよう
に、隣り合う一対のプレート（１）のうちの一方のプレ
ートの突部（13）と他方のプレートの突部（13）は互い
に接触し、予熱室（2b）から蒸発室（2a）へ向かう液
は、突部（13）間の谷部（14）を通って第３図（Ａ）に
示されるように扇状に広がりながら流れ出る。3 (A) to 3 (C) show that in the embodiment of FIG. 2, the projections (11, 12) are continuous in the width direction of the plate (1), whereas the projections (11, 12) are independent of each other. (13) shows an embodiment in which plates (1) are arranged at predetermined intervals in the width direction of the plate (1). In this case, as shown in FIGS. 3 (B) and 3 (C), the protruding portion (13) of one of the pair of adjacent plates (1) and the protruding portion (13) of the other plate are mutually connected. The liquid that comes into contact and flows from the preheating chamber (2b) to the evaporation chamber (2a) flows out while spreading in a fan shape as shown in FIG. 3 (A) through the valley (14) between the protrusions (13). .
予熱室（2b）の上部と蒸発室（2a）の下部とはガス抜
き管（32）を通じて互いに連絡する。このガス抜き管
（32）は、予熱室（2b）内にたまったガスを蒸発室（2
a）の下部の気相に導くためのものである。すなわち、
予熱室（2b）内で非共沸混合物の低沸成分が一部蒸発し
たり、高温の未蒸発液を液供給ライン（31）（第４図）
通じて循環させるときに、液供給ライン（31）中に低沸
成分の蒸気が巻き込まれたりすると、その蒸気は蒸発通
路（２）の上部つまり予熱室（2b）にたまることにな
る。したがって、予熱室（2b）の上部と蒸発室（2a）の
下部とをガス抜き管（32）で接続しておくことにより、
予熱室（2b）と蒸発室（2a）との圧力差（Po−Pe）を利
用して、予熱室（2b）内の蒸気を蒸発室（2a）に導くこ
とができる。ガス抜き管（32）にバルブ（33）を取り付
けて予熱室（2b）の加圧力（Po−Pe）以上の圧力差を創
出することにより一層容易にガス抜きを行うことができ
る。また、ガス抜き管（32）は、予熱室（2b）と連通す
る給液口（４）と、蒸発室（2a）の下部と連通する気液
分離器（６）の気相との間を接続するようにしてもよ
い。The upper part of the preheating chamber (2b) and the lower part of the evaporating chamber (2a) communicate with each other through a vent pipe (32). The gas vent pipe (32) removes gas accumulated in the preheating chamber (2b) to the evaporation chamber (2b).
This is for guiding to the lower gas phase of a). That is,
The low-boiling components of the non-azeotropic mixture partially evaporate in the preheating chamber (2b), or the high-temperature unevaporated liquid is supplied to the liquid supply line (31) (Fig. 4)
When a low-boiling component vapor is entrained in the liquid supply line (31) during circulation through the passage, the vapor accumulates in the upper part of the evaporation passage (2), that is, in the preheating chamber (2b). Therefore, by connecting the upper part of the preheating chamber (2b) and the lower part of the evaporation chamber (2a) with the degassing pipe (32),
By utilizing the pressure difference (Po-Pe) between the preheating chamber (2b) and the evaporation chamber (2a), the steam in the preheating chamber (2b) can be guided to the evaporation chamber (2a). By attaching a valve (33) to the degassing pipe (32) and creating a pressure difference greater than the pressure (Po-Pe) of the preheating chamber (2b), degassing can be performed more easily. The gas vent pipe (32) is provided between the liquid supply port (4) communicating with the preheating chamber (2b) and the gas phase of the gas-liquid separator (6) communicating with the lower part of the evaporation chamber (2a). You may make it connect.
以上のように、この発明は、蒸発すべき液体がプレー
トの蒸発伝熱面上を薄膜状に流下する流下液膜型プレー
ト式蒸発器において、隣り合うプレート間に形成される
蒸発通路に絞り部を設けて、この絞り部より上流側を予
熱室とするとともに下流側を蒸発室とし、かつ、予熱室
の上部と蒸発室の下部の気相とをガス抜き管で接続した
から、予熱室内にたまった蒸気を容易に排出することが
できる。したがって、ガス溜りによる予熱障害や液流れ
障害を防止して、効率的な予熱が達成され、性能のよい
非共沸混合物用蒸発器が得られる。As described above, the present invention relates to a falling liquid film type plate evaporator in which a liquid to be evaporated flows down on an evaporation heat transfer surface of a plate in a thin film form. The upstream side of the throttle section is used as a preheating chamber and the downstream side is used as an evaporation chamber, and the upper part of the preheating chamber and the gaseous phase below the evaporation chamber are connected by a degassing pipe. The accumulated steam can be easily discharged. Therefore, the preheating obstacle and the liquid flow obstacle due to the gas pool are prevented, the efficient preheating is achieved, and the non-azeotropic mixture evaporator with good performance is obtained.
第１図はこの発明の実施例を示す蒸発通路の断面略図、 第２図（Ａ）〜（Ｃ）は予熱室の諸形態を例示する拡大
断面図、 第３図（Ａ）〜（Ｃ）は予熱室の別の形態を示すもの
で、第３図（Ａ）は蒸発通路から見た正面図、第３図
（Ｂ）（Ｃ）は第３図（Ａ）におけるＢ−Ｂ線およびＣ
−Ｃ線断面図、 第４図は流下液膜型プレート式蒸発器の概略図、 第５図はバイナリー発電システムのブロック図、 第６図は二成分系非共沸混合物の気液平衡線図である。 1:プレート 1a:蒸発伝熱面 2:蒸発通路 2a:蒸発室 2b:予熱室 10:絞り部 32:ガス抜き管FIG. 1 is a schematic sectional view of an evaporating passage showing an embodiment of the present invention, FIGS. 2 (A) to 2 (C) are enlarged sectional views illustrating various forms of a preheating chamber, and FIGS. 3 (A) to 3 (C). Shows another form of the preheating chamber, FIG. 3 (A) is a front view viewed from the evaporation passage, and FIGS. 3 (B) and (C) are lines BB and C in FIG. 3 (A).
Fig. 4 is a schematic diagram of a falling liquid plate type evaporator, Fig. 5 is a block diagram of a binary power generation system, and Fig. 6 is a vapor-liquid equilibrium diagram of a binary non-azeotropic mixture. It is. 1: Plate 1a: Evaporation heat transfer surface 2: Evaporation passage 2a: Evaporation chamber 2b: Preheating chamber 10: Restrictor 32: Degassing pipe
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) F28D 1/00 - 9/02 ──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 6 , DB name) F28D 1/00-9/02
Claims (1)
を薄膜状に流下するようにしたものにおいて、隣り合う
プレート間に形成される蒸発通路に絞り部を設けてこの
絞り部より上流側を予熱室とするとともに絞り部より下
流側を蒸発室とし、かつ、予熱室の上部と蒸発室の下部
の気相とをガス抜き管で接続したことを特徴とする流下
液膜型プレー式蒸発器。1. A method in which a liquid to be evaporated flows down on an evaporation heat transfer surface of a plate in the form of a thin film. A throttle portion is provided in an evaporation passage formed between adjacent plates, and a throttle portion is provided upstream of the throttle portion. A falling liquid film type play type characterized in that the side is a preheating chamber, the downstream side of the throttle section is an evaporation chamber, and the upper part of the preheating chamber and the gas phase at the lower part of the evaporation chamber are connected by a gas vent pipe. Evaporator.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23744990A JP2916512B2 (en) | 1990-09-06 | 1990-09-06 | Falling liquid film type plate evaporator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23744990A JP2916512B2 (en) | 1990-09-06 | 1990-09-06 | Falling liquid film type plate evaporator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04116388A JPH04116388A (en) | 1992-04-16 |
| JP2916512B2 true JP2916512B2 (en) | 1999-07-05 |
Family
ID=17015510
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23744990A Expired - Fee Related JP2916512B2 (en) | 1990-09-06 | 1990-09-06 | Falling liquid film type plate evaporator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2916512B2 (en) |
-
1990
- 1990-09-06 JP JP23744990A patent/JP2916512B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04116388A (en) | 1992-04-16 |
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