JP2921864B2 - Liquid crystal display - Google Patents
Liquid crystal displayInfo
- Publication number
- JP2921864B2 JP2921864B2 JP18123189A JP18123189A JP2921864B2 JP 2921864 B2 JP2921864 B2 JP 2921864B2 JP 18123189 A JP18123189 A JP 18123189A JP 18123189 A JP18123189 A JP 18123189A JP 2921864 B2 JP2921864 B2 JP 2921864B2
- Authority
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- Japan
- Prior art keywords
- electrode
- liquid crystal
- crystal display
- dummy
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 75
- 239000000758 substrate Substances 0.000 claims description 72
- 238000000034 method Methods 0.000 claims description 8
- 230000015556 catabolic process Effects 0.000 description 10
- 239000010408 film Substances 0.000 description 9
- 239000011159 matrix material Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 5
- 230000005611 electricity Effects 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000010407 anodic oxide Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Liquid Crystal (AREA)
- Liquid Crystal Display Device Control (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、アクティブマトリクス液晶表示装置の構造
に関する。Description: TECHNICAL FIELD The present invention relates to a structure of an active matrix liquid crystal display device.
液晶表示パネルは実用化が進み、現在では高品位な画
質が得られるアクティブマトリクス方式の液晶表示装置
が主流になりつつある。ここでアクティブマトリクス方
式とは画素電極である液晶表示電極毎に非線形な電流−
電圧特性を示す薄膜トランジスタ（TFT）、ダイオー
ド、金属−絶縁膜−金属あるいは金属−絶縁膜−透明導
電体の３層構造からなるいわゆるMIM素子をスイッチン
グ素子として有するものである。Liquid crystal display panels have been put into practical use, and at present, active matrix type liquid crystal display devices that can provide high-quality image quality are becoming mainstream. Here, the active matrix method means that a non-linear current-
As a switching element, a thin film transistor (TFT) exhibiting voltage characteristics, a diode, a so-called MIM element having a three-layer structure of a metal-insulating film-metal or a metal-insulating film-transparent conductor is used.
本発明ではスイッチング素子としてMIM素子を有し、
基板上にICを直搭載したいわゆるチップ・オン・グラス
（Chip-On-Glass）構造（以下C.O.G.と略す）を有する
液晶表示装置を例に説明する。In the present invention, having a MIM element as a switching element,
A liquid crystal display device having a so-called Chip-On-Glass (COG) structure in which an IC is directly mounted on a substrate will be described as an example.
MIM素子とは一般的にはTa-Ta2Ｏ5-CrあるいはTa-Ta2
Ｏ5-ITOからなり、素子の非線形的電流−電圧特性を用
い直列に配した液晶層をスイッチングして表示を行うも
のである。MIM elements are generally Ta-Ta 2 O 5 -Cr or Ta-Ta 2
It is composed of O 5 -ITO and performs display by switching liquid crystal layers arranged in series using the nonlinear current-voltage characteristics of the element.
ここで、前記MIM素子の絶縁膜の厚さは50nm程度に形
成するため静電耐圧が低く液晶パネル製造工程で生ずる
静電気により容易に絶縁破壊を起こし上下電極が短絡し
非線形素子として機能しなくなる。Here, since the thickness of the insulating film of the MIM element is formed to be about 50 nm, the electrostatic breakdown voltage is low and the dielectric breakdown easily occurs due to static electricity generated in the liquid crystal panel manufacturing process, and the upper and lower electrodes are short-circuited and do not function as a nonlinear element.
素子の静電破壊は工程中の配向処理と液晶注入後のハ
ンドリングで起こる確率が高い。第９図は従来法により
作製した液晶パネルを説明する平面図で図上ではアクテ
ィブ基板37、対向基板38、IC39を示す。ここで静電破壊
の発生部位は第９図の破線36で示すように、表示部外周
のような周囲の電極配置が変化する所や、基板上にICを
直接搭載するC.O.G.実装構造の液晶表示装置の場合、異
なるICに接続する配線が隣接する部位に設けられたスイ
ッチング素子の静電破壊が顕著である。Electrostatic breakdown of the device is highly likely to occur during alignment processing during the process and handling after liquid crystal injection. FIG. 9 is a plan view for explaining a liquid crystal panel manufactured by a conventional method. In FIG. 9, an active substrate 37, a counter substrate 38, and an IC 39 are shown. Here, as shown by the broken line 36 in FIG. 9, the location where the electrostatic breakdown occurs is where the peripheral electrode arrangement changes, such as the outer periphery of the display unit, or the liquid crystal display of the COG mounting structure where the IC is directly mounted on the substrate. In the case of the device, the electrostatic breakdown of the switching element provided in a portion adjacent to the wiring connected to the different IC is remarkable.
静電対策としては、従来共通電極の設置等のパターン
レイアウトによる対策及び工程中の湿度管理、作業者の
アース設置、イオンシャワー等のプロセスによる対策が
行われているが素子の静電破壊を完全に防止することは
できていない。As countermeasures against static electricity, measures such as pattern layout such as installation of a common electrode and humidity control during the process, grounding of workers, and measures such as ion shower have been taken. Has not been prevented.
本発明の目的は、このような課題を解決し、アクティ
ブマトリクス方式液晶パネルの液晶表示電極に設けるス
イッチング素子を高歩留で製造することにある。An object of the present invention is to solve such a problem and to manufacture a switching element provided in a liquid crystal display electrode of an active matrix type liquid crystal panel at a high yield.
上記目的を達成するために本発明における液晶表示装
置は下記記載の構造とする。In order to achieve the above object, the liquid crystal display device of the present invention has the following structure.
（イ） 行電極及び非線形な電流−電圧特性を有するス
イッチング素子及びスイッチング素子を介して行電極と
接続する画素電極を設けるアクティブ基板と、列電極及
び対向電極を設ける対向基板と、アクティブ基板上の画
素電極と対向基板上の対向電極を一定間隔で対向させ、
且つアクティブ基板と対向基板との間に充填する液晶物
質と、行電極とICとを接続する接続点と、接続点に対し
て行電極の反対側の領域にダミー電極を設ける。(A) an active substrate on which a row electrode and a switching element having a non-linear current-voltage characteristic and a pixel electrode connected to the row electrode via the switching element; an opposing substrate on which a column electrode and an opposing electrode are provided; The pixel electrode and the opposing electrode on the opposing substrate are opposed at regular intervals,
In addition, a liquid crystal substance to be filled between the active substrate and the counter substrate, a connection point connecting the row electrode and the IC, and a dummy electrode are provided in a region opposite to the connection point with respect to the row electrode.
（ロ） 行電極及び非線形な電流−電圧特性を有するス
イッチング素子及びスイッチング素子を介して行電極と
接続する画素電極を設けるアクティブ基板と、列電極及
び対向電極を設ける対向基板と、アクティブ基板上の画
素電極と対向基板上の対向電極を一定間隔で対向させ、
且つアクティブ基板と対向基板との間に充填する液晶物
質と、列電極とICとを接続する接続点と、接続点に対し
て列電極の反対側の領域にダミー電極を設ける。(B) An active substrate provided with a row electrode and a switching element having a non-linear current-voltage characteristic, and a pixel electrode connected to the row electrode via the switching element; a counter substrate provided with a column electrode and a counter electrode; The pixel electrode and the opposing electrode on the opposing substrate are opposed at regular intervals,
In addition, a liquid crystal substance filled between the active substrate and the counter substrate, a connection point connecting the column electrode and the IC, and a dummy electrode are provided in a region opposite to the column electrode with respect to the connection point.
（ハ） 行電極及び非線形な電流−電圧特性を有するス
イッチング素子及びスイッチング素子を介して行電極と
接続する画素電極を設けるアクティブ基板と、列電極及
び対向電極を設ける対向基板と、アクティブ基板上の画
素電極と対向基板上の対向電極を一定間隔で対向させ、
且つアクティブ基板と対向基板との間に充填する液晶物
質と、行電極とICとを接続する接続点と、接続点に対し
て行電極の反対側の領域にダミー電極と、列電極とICと
を接続する接続点と、接続点に対して前記列電極の反対
側の領域にダミー電極を設ける。(C) an active substrate provided with a row electrode and a switching element having a non-linear current-voltage characteristic, and a pixel electrode connected to the row electrode via the switching element; a counter substrate provided with a column electrode and a counter electrode; The pixel electrode and the opposing electrode on the opposing substrate are opposed at regular intervals,
And a liquid crystal substance filled between the active substrate and the counter substrate, a connection point connecting the row electrode and the IC, a dummy electrode in a region opposite to the connection electrode with respect to the row electrode, a column electrode and the IC. And a dummy electrode is provided in a region opposite to the column electrode with respect to the connection point.
〔実施例１〕 本実施例で作製したMIM素子を有するアクティブマト
リクス方式液晶表示装置を第１図に示す。Example 1 FIG. 1 shows an active matrix type liquid crystal display device having a MIM element manufactured in this example.
MIM素子を形成したアクティブ基板１と対向電極を形
成した対向基板２は配向処理を施した後一定間隔を保っ
て貼り合わせ、その隙間に液晶を封入し、液晶封入領域
外に形成した行電極３上にICをハンダ導電ペーストを介
して直接搭載する。The active substrate 1 on which the MIM element is formed and the opposing substrate 2 on which the opposing electrode is formed are subjected to an alignment treatment and then bonded at a constant interval, liquid crystal is sealed in the gap, and the row electrode 3 formed outside the liquid crystal sealing area. The IC is mounted directly on top of it via solder conductive paste.
ここで、Taである行電極３はアクティブ基板１上に24
0本形成し一方はハンダ導電ペーストを介して走査側IC4
と接続し、他方は液晶表示領域５においてMIM素子を介
して画素電極と接続する。６は走査側ICの入力電極であ
る。また、ITOである列電極７は対向基板２上に320本形
成し一方はハンダ導電ペーストを介して信号側IC8と接
続し他方は液晶表示領域５において対向電極とする。Here, the row electrode 3 of Ta is placed on the active substrate 1 for 24 hours.
One is formed, and one is formed on the scanning side IC4 via solder conductive paste.
And the other is connected to a pixel electrode via a MIM element in the liquid crystal display area 5. Reference numeral 6 denotes an input electrode of the scanning IC. Also, 320 column electrodes 7 made of ITO are formed on the counter substrate 2, one of which is connected to the signal side IC 8 via a solder conductive paste, and the other is a counter electrode in the liquid crystal display area 5.
９は信号側ICの入力電極である。ここでアクティブ基
板１上の画素電極とストライプ状に形成された対向基板
２例の対向電極は１対１に対応するように重なってい
る。9 is an input electrode of the signal side IC. Here, the pixel electrodes on the active substrate 1 and the counter electrodes of two examples of the counter substrate formed in a stripe shape are overlapped so as to correspond one-to-one.
本発明によるITOであるダミー電極10及び11は行電極
３及び列電極７に沿ってICに接続する行電極３、走査側
ICの入力電極６、列電極７、信号側ICの入力電極９とは
電気的に接続せずに且つ行電極３と走査側ICの入力電極
６の間及び列電極７と信号側ICの入力電極９の間を通し
て設ける。The dummy electrodes 10 and 11, which are ITO according to the present invention, are connected to the IC along the row electrodes 3 and the column electrodes 7,
The input electrode 6, the column electrode 7 of the IC, and the input electrode 9 of the signal side IC are not electrically connected, but are between the row electrode 3 and the input electrode 6 of the scanning side IC, and between the column electrode 7 and the input of the signal side IC. It is provided between the electrodes 9.
次に第１図の円部101領域の拡大図を第２図に示す。
アクティブ基板上の行電極３にはMIM素子12とITOである
画素電極13が形成され、対向基板上のITOである対向電
極14と一定間隔で重なり合っている。ここで、本発明の
ダミー電極10、11は液晶表示領域５の外周に沿って一辺
当り４本ずつ形成する。またアクティブ基板上の最も外
側のダミー電極19以外にはMIM素子とTaからなるダミー
画素15に設け対向基板側の対向電極14及びダミー電極11
と対応させる。またダミー電極11はアクティブ基板上の
ダミー画素15と対応させる。Next, FIG. 2 shows an enlarged view of the area of the circle portion 101 in FIG.
On the row electrode 3 on the active substrate, a MIM element 12 and a pixel electrode 13 as ITO are formed, and overlap with the counter electrode 14 as ITO on the counter substrate at a constant interval. Here, the dummy electrodes 10 and 11 of the present invention are formed four per side along the outer periphery of the liquid crystal display area 5. In addition to the outermost dummy electrode 19 on the active substrate, a dummy pixel 15 composed of a MIM element and Ta is provided on the counter electrode 14 and the dummy electrode 11 on the counter substrate side.
And correspond. The dummy electrode 11 is made to correspond to the dummy pixel 15 on the active substrate.
次に、MIM素子部について説明する。第３図は第２図
のMIM素子12の拡大平面図である。Taである行電極３は
その表面を陽極酸化膜であるTa2Ｏ5で被われITOである
画素電極13と重なっている。この重なり部がMIM素子で
ある。Next, the MIM element unit will be described. FIG. 3 is an enlarged plan view of the MIM element 12 of FIG. The row electrode 3 made of Ta has its surface covered with Ta 2 O 5 as an anodic oxide film, and overlaps with the pixel electrode 13 made of ITO. This overlapping portion is the MIM element.
第４図は第３図のＡ−Ｂ断面を表わすもので、行電極
３とMIM素子の下部電極であるTa16はスパッタリング法
により厚さ250nm形成しフォトエッチングによりパター
ニングする。絶縁膜であるTa2Ｏ517はTa16の陽極酸化に
より厚さ50nm形成する。MIM素子の上部電極であるITO18
はスパッタリング法により厚さ200nm形成しフォトエッ
チングによりパターニングする。この時、画素電極13も
同時に形成する。FIG. 4 shows a cross section taken along the line AB in FIG. 3. The row electrode 3 and Ta16, which is the lower electrode of the MIM element, are formed to a thickness of 250 nm by sputtering and patterned by photoetching. Ta 2 O 5 17 which is an insulating film is thick 50nm formed by anodic oxidation of Ta16. ITO18, the upper electrode of the MIM element
Is formed to a thickness of 200 nm by sputtering and patterned by photoetching. At this time, the pixel electrode 13 is also formed at the same time.
本発明により有効液晶表示領域内のMIM素子の絶縁膜T
a2Ｏ517が液晶表示装置の製造工程中で１パネル当り１
個でも静電破壊を起こす率は90％以上から５％以下に減
少する。これは工程中のハンドリング等で発生する静電
気がダミー配線間で放電するため有効液晶表示領域には
及ばないためである。According to the present invention, the insulating film T of the MIM element in the effective liquid crystal display area
a 2 O 5 17 is 1 per panel during the manufacturing process of the liquid crystal display device.
Even in the case of individual devices, the rate of causing electrostatic breakdown is reduced from 90% or more to 5% or less. This is because static electricity generated during handling during the process is discharged between the dummy wirings and does not reach the effective liquid crystal display area.
〔実施例２〕 実施例２で作製した液晶表示装置を第５図に示す。こ
こでは、実施例１のダミー電極の中で最も外側のダミー
電極11、19を、液晶表示領域５を完全に囲むループ電極
とした。これにより有効液晶表示領域内のMIM素子の絶
縁膜が製造工程中で静電破壊を起こす率は０％となる。Example 2 FIG. 5 shows the liquid crystal display device manufactured in Example 2. Here, the outermost dummy electrodes 11 and 19 among the dummy electrodes of Example 1 were loop electrodes completely surrounding the liquid crystal display region 5. As a result, the rate at which the insulating film of the MIM element in the effective liquid crystal display area causes electrostatic breakdown during the manufacturing process becomes 0%.
〔実施例３〕 本実施例で作製したMIM素子を有するアクティブマト
リクス方式液晶表示装置を第６図に示す。Embodiment 3 FIG. 6 shows an active matrix type liquid crystal display device having a MIM element manufactured in this embodiment.
MIM素子を形成したアクティブ基板20と対向電極を形
成した対向基板21は配向処理を施した後一定間隔を保っ
て貼り合わせ、その隙間に液晶を封入し、ICを基板上に
直接搭載する。The active substrate 20 on which the MIM element is formed and the opposing substrate 21 on which the opposing electrode is formed are subjected to an alignment treatment and bonded at a constant interval, liquid crystal is sealed in the gap, and the IC is directly mounted on the substrate.
ここで、Taである行電極群22a、22bはアクティブ基板
20上に各々240本ずつ計480本形成し各電極の一方はハン
ダ導電ペーストを介して走査側IC23a、23bに接続し、他
方は液晶表示領域24においてMIM素子を介して対向電極
と接続する。25は走査側ICの入力電極である。Here, the row electrode groups 22a and 22b of Ta
A total of 480 of 240 electrodes each are formed on 20 and one of the electrodes is connected to the scanning-side ICs 23a and 23b via a solder conductive paste, and the other is connected to a counter electrode in the liquid crystal display area 24 via a MIM element. 25 is an input electrode of the scanning IC.
また、ITOである列電極群26a、26bは対向基板21上に
各々320本ずつ計640本形成し各電極の一方はハンダ導電
ペーストを介して信号側IC27a、27bと接続し他方は液晶
表示領域24において対向電極とする。28は信号側ICの入
力電極である。ここでアクティブ基板20上の液晶表示電
極とストライプ状に形成された対向基板21側の対向電極
は１対１に対応するように重なっている。The column electrode groups 26a and 26b, which are ITO, are formed on the counter substrate 21 in a total of 640 each of 320, and one of the electrodes is connected to the signal side ICs 27a and 27b via a solder conductive paste and the other is a liquid crystal display area. At 24, a counter electrode is used. 28 is an input electrode of the signal side IC. Here, the liquid crystal display electrode on the active substrate 20 and the counter electrode on the counter substrate 21 side formed in a stripe shape overlap so as to correspond one-to-one.
本発明によるITOであるダミー電極29は、アクティブ
基板20上において異なるICである走査側IC23a、23bに接
続する行電極群22a、22bの中で隣合う電極221aと221bに
沿ってICに接続する電極及び画素電極には電気的に接続
せずに、走査側IC23aと走査側ICの入力電極25の間及び
走査側IC23bと走査側ICの入力電極25の間を通して設け
る。また、同様にしてITOであるダミー電極30は、対向
基板上で異なるICである信号側IC27a、27bに接続する列
電極群26aと26bの中で隣合う電極261aと261bに沿ってIC
に接続する配線及び対向電極には電気的に接続せずに、
列電極群26aと信号側ICの入力電極28の間及び列電極群2
6bと信号側ICの入力電極28の間を通して設ける。The dummy electrode 29, which is ITO according to the present invention, is connected to the IC along the adjacent electrodes 221a and 221b in the row electrode groups 22a and 22b connected to the scanning ICs 23a and 23b which are different ICs on the active substrate 20. The electrodes are not electrically connected to the electrodes and the pixel electrodes, but are provided between the scanning-side IC 23a and the scanning-side IC input electrode 25 and between the scanning-side IC 23b and the scanning-side IC input electrode 25. Similarly, the dummy electrode 30, which is ITO, is provided along the adjacent electrodes 261a and 261b in the column electrode groups 26a and 26b connected to the signal-side ICs 27a and 27b, which are different ICs on the opposite substrate.
Without being electrically connected to the wiring and the counter electrode connected to
Between the column electrode group 26a and the input electrode 28 of the signal side IC and the column electrode group 2
It is provided between 6b and the input electrode 28 of the signal side IC.
次に第６図の円部102領域の拡大図を第７図に示す。
アクティブ基板上の行電極22にはMIM素子31とITOである
画素電極32が形成され、対向基板上のITOである対向電
極33と一定間隔で重なり合っている。ここで、本発明の
アクティブ基板上のダミー電極29は液晶表示領域24の２
辺に沿って一辺当り４本ずつ独立に形成し、その最も外
側のダミー電極34以外にはMIM素子とTaからなるダミー
画素35を設け、対向基板側の対向電極33及びダミー電極
30と対応させる。同様にして対向基板上のダミー電極30
は液晶表示領域24の残る２辺に沿って一辺当り４本ずつ
形成し、アクティブ基板側のダミー電極29と対応させ
た。また、MIM素子31は実施例１と同様の方法で作製す
る。Next, FIG. 7 shows an enlarged view of the area of the circle portion 102 in FIG.
On the row electrode 22 on the active substrate, a MIM element 31 and a pixel electrode 32 as ITO are formed, and overlap with the counter electrode 33 as ITO on the counter substrate at a constant interval. Here, the dummy electrode 29 on the active substrate of the present invention is connected to the liquid crystal display
Four pixels are formed independently along one side, and a dummy pixel 35 composed of a MIM element and Ta is provided except for the outermost dummy electrode 34, and a counter electrode 33 and a dummy electrode
Correspond to 30. Similarly, the dummy electrode 30 on the opposite substrate
Were formed along the remaining two sides of the liquid crystal display area 24, four per side, and were made to correspond to the dummy electrodes 29 on the active substrate side. Further, the MIM element 31 is manufactured in the same manner as in the first embodiment.
本発明により有効液晶表示領域内のMIM素子の絶縁膜T
a2Ｏ5が液晶表示装置の製造工程中で１パネル当り１個
でも静電破壊を起こす率は95％以上から５％以下に減少
する。これは工程中のハンドリング等で発生する静電気
がダミー電極間で放電するため有効液晶表示領域には及
ばないためと基板上の異なるICにつながる隣接電極つま
り第６図の隣合う電極221a、221b間または隣合う電極26
1a、261b間で電位差が生じにくくなるためである。According to the present invention, the insulating film T of the MIM element in the effective liquid crystal display area
In the manufacturing process of the liquid crystal display device, the rate at which even one a 2 O 5 causes electrostatic breakdown is reduced from 95% or more to 5% or less. This is because static electricity generated during handling during the process is discharged between the dummy electrodes and does not reach the effective liquid crystal display area. Or adjacent electrode 26
This is because a potential difference hardly occurs between 1a and 261b.
〔実施例４〕 実施例４で作製した液晶表示装置を第８図に示す。こ
こでは、実施例３のダミー電極の中で最も外側のダミー
電極30、34を、液晶表示領域５を完全に囲むループ電極
とする。これにより有効液晶表示領域内のMIM素子の絶
縁膜が製造工程中で静電破壊を起こす率は０％となる。Example 4 The liquid crystal display device manufactured in Example 4 is shown in FIG. Here, the outermost dummy electrodes 30 and 34 of the dummy electrodes of the third embodiment are loop electrodes completely surrounding the liquid crystal display region 5. As a result, the rate at which the insulating film of the MIM element in the effective liquid crystal display area causes electrostatic breakdown during the manufacturing process becomes 0%.
〔実施例５〕 本発明ではスイッチング素子としてMIM素子を代表例
として上げたが、薄膜トランジスタ素子のゲート絶縁膜
の静電破壊あるいはダイオード素子の半導体膜の静電破
壊にも有効である。また基板上に３個以上のICを搭載す
る場合にも有効である。またフレキシブル・プリンテッ
ド・サーキット（Flexible Printed Circuit）（F.P.
C.）等を用いたC.O.G.以外の実装方式でも有効である。
本発明によるF.P.C.実装の液晶表示装置を第10図に示
す。図中ではアクティブ基板40、対向基板41、ダミー電
極42、F.P.C.43、IC44を表わしている。[Embodiment 5] In the present invention, a MIM element is used as a switching element as a representative example. However, the present invention is also effective for electrostatic breakdown of a gate insulating film of a thin film transistor element or a semiconductor film of a diode element. It is also effective when three or more ICs are mounted on a substrate. In addition, Flexible Printed Circuit (FP)
C.) is also effective for mounting methods other than COG.
FIG. 10 shows an FPC-mounted liquid crystal display device according to the present invention. In the drawing, an active substrate 40, a counter substrate 41, a dummy electrode 42, an FPC 43, and an IC 44 are shown.
本発明のダミー電極により、アクティブマトリクス方
式液晶表示装置に設けるスイッチング素子の静電破壊を
防止し高歩留な液晶表示装置を得ることが可能となる。With the dummy electrode of the present invention, it is possible to prevent a switching element provided in an active matrix type liquid crystal display device from being damaged by electrostatic discharge and to obtain a liquid crystal display device having a high yield.
第１図および第２図はいずれも本発明の第１の実施例に
おける液晶表示装置を示す平面図、第３図および第４図
はいずれもMIM素子を示し第３図は平面図、第４図は第
３図のＡ−Ｂ断面を示す断面図、第５図は本発明の第２
の実施例における液晶表示装置を示す平面図、第６図お
よび第７図はいずれも本発明の第３の実施例における液
晶表示装置を示す平面図、第８図は本発明の第４の実施
例における液晶表示装置を示す平面図、第９図は従来例
の液晶表示装置における課題を説明するための平面図、
第10図は本発明の第５の実施例における液晶表示装置を
示す平面図である。 １……アクティブ基板、２……対向基板、３……行電
極、７……列電極、10、11……ダミー電極。1 and 2 are plan views showing a liquid crystal display device according to a first embodiment of the present invention, FIGS. 3 and 4 are all MIM elements, FIG. 3 is a plan view, and FIG. FIG. 5 is a cross-sectional view showing a cross section taken along a line AB in FIG. 3, and FIG.
FIGS. 6 and 7 are plan views showing a liquid crystal display device according to a third embodiment of the present invention, and FIG. 8 is a fourth embodiment of the present invention. FIG. 9 is a plan view illustrating a liquid crystal display device according to an example, FIG. 9 is a plan view illustrating a problem in a conventional liquid crystal display device,
FIG. 10 is a plan view showing a liquid crystal display device according to a fifth embodiment of the present invention. 1 ... active substrate, 2 ... counter substrate, 3 ... row electrode, 7 ... column electrode, 10, 11 ... dummy electrode.
Claims (10)
クティブ基板と対向基板とのあいだに封入する液晶とを
備え、 上記アクティブ基板は、複数の行電極と、その行電極に
スイッチング素子を介して接続する画素電極と、入力電
極と、その入力電極と上記行電極とに接続するICとを有
し、 上記対向基板は、複数の列電極と、対向電極とを有し、 上記画素電極と上記対向電極とが上記液晶を介して対向
する領域を液晶表示領域とし、 上記アクティブ基板には、上記行電極の外側にあって上
記行電極と平行であるダミー電極と、上記ICの接続領域
である上記入力電極と上記行電極とのあいだにあるダミ
ー電極とを、上記液晶表示領域の外側の３辺に連続する
ように形成する ことを特徴とする液晶表示装置。An active substrate, a counter substrate, and a liquid crystal sealed between the active substrate and the counter substrate. The active substrate includes a plurality of row electrodes and a switching element connected to the row electrodes. A pixel electrode to be connected; an input electrode; and an IC connected to the input electrode and the row electrode. The counter substrate has a plurality of column electrodes and a counter electrode. A region where the counter electrode is opposed to the counter electrode via the liquid crystal is a liquid crystal display region. The active substrate is a connection region between the dummy electrode outside the row electrode and parallel to the row electrode and the IC. A liquid crystal display device, wherein a dummy electrode between the input electrode and the row electrode is formed so as to be continuous with three sides outside the liquid crystal display area.
ってダミー電極を形成することを特徴とする請求項１に
記載の液晶表示装置。2. The method according to claim 1, wherein a plurality of the ICs are provided on the active substrate, the row electrodes are connected to the ICs, and a dummy electrode is formed along the outside of the adjacent row electrodes connected to different ICs. The liquid crystal display device according to claim 1, wherein:
クティブ基板と対向基板とのあいだに封入する液晶とを
備え、 上記アクティブ基板は、複数の行電極と、その行電極に
スイッチング素子を介して接続する画素電極とを有し、 上記対向基板は、複数の列電極と、対向電極と、入力電
極と、その入力電極と上記列電極とに接続するICとを有
し、 上記画素電極と上記対向電極とが上記液晶を介して対向
する領域を液晶表示領域とし、 上記対向基板には、上記列電極の外側にあって上記列電
極と平行であるダミー電極と、上記ICの接続領域である
上記入力電極と上記列電極とのあいだにあるダミー電極
とを、上記液晶表示領域の外側の３辺に連続するように
形成する ことを特徴とする液晶表示装置。3. An active substrate, a counter substrate, and a liquid crystal sealed between the active substrate and the counter substrate. The active substrate includes a plurality of row electrodes and a switching element connected to the row electrodes. A pixel electrode connected to the pixel electrode, the counter substrate includes a plurality of column electrodes, a counter electrode, an input electrode, and an IC connected to the input electrode and the column electrode. A region where the counter electrode is opposed to the liquid crystal display region via the liquid crystal is a liquid crystal display region, and the counter substrate is a connection region between the dummy electrode outside the column electrode and parallel to the column electrode and the IC. A liquid crystal display device, wherein a dummy electrode between the input electrode and the column electrode is formed so as to be continuous with three sides outside the liquid crystal display area.
ってダミー電極を形成することを特徴とする請求項３に
記載の液晶表示装置。4. The method according to claim 1, wherein a plurality of the ICs are provided on the counter substrate, the column electrodes are connected to the ICs, and dummy electrodes are formed along the outer sides of the adjacent column electrodes connected to different ICs. The liquid crystal display device according to claim 3, wherein:
表示装置。5. The liquid crystal display device according to claim 1, wherein the dummy electrode is formed so as to surround four sides outside the liquid crystal display area.
表示装置。6. The liquid crystal display device according to claim 1, wherein the dummy electrode comprises a plurality of dummy electrodes.
クティブ基板と対向基板とのあいだに封入する液晶とを
備え、 上記アクティブ基板は、複数の行電極と、その行電極に
スイッチング素子を介して接続する画素電極と、第１の
入力電極と、その第１の入力電極と上記行電極とに接続
する第１のICとを有し、 上記対向基板は、複数の列電極と、対向電極と、第２の
入力電極と、その第２の入力電極と上記列電極とに接続
する第２のICとを有し、 上記画素電極と上記対向電極とが上記液晶を介して対向
する領域を液晶表示領域とし、 上記アクティブ基板には、上記行電極の外側にあって上
記行電極と平行である第１のダミー電極と、上記第１の
ICの接続領域である上記第１の入力電極と上記行電極と
のあいだにある第１のダミー電極とを、上記液晶表示領
域の外側の３辺に連続するように形成し、 上記対向基板には、上記列電極の外側にあって上記列電
極と平行である第２のダミー電極と、上記第２のICの接
続領域である上記第２の入力電極と上記列電極とのあい
だにある第２のダミー電極とを、上記液晶表示領域の外
側の３辺に連続するように形成する ことを特徴とする液晶表示装置。7. An active substrate, a counter substrate, and a liquid crystal sealed between the active substrate and the counter substrate. The active substrate includes a plurality of row electrodes and a switching element connected to the row electrodes. A pixel electrode to be connected, a first input electrode, and a first IC connected to the first input electrode and the row electrode. The counter substrate has a plurality of column electrodes, a counter electrode, , A second input electrode, and a second IC connected to the second input electrode and the column electrode. A region where the pixel electrode and the counter electrode face each other via the liquid crystal is a liquid crystal. A first dummy electrode outside the row electrode and parallel to the row electrode;
Forming a first dummy electrode between the first input electrode and the row electrode, which is a connection area of the IC, so as to be continuous with three sides outside the liquid crystal display area; Is a second dummy electrode outside the column electrode and parallel to the column electrode, and a second dummy electrode between the second input electrode and the column electrode, which is a connection region of the second IC. 2. A liquid crystal display device, wherein two dummy electrodes are formed so as to be continuous with three sides outside the liquid crystal display area.
設け、 上記第１のICに上記行電極を接続し、 上記第２のICに上記列電極を接続し、 異なる上記第１のICに接続する隣り合う上記行電極の外
側に沿って第１のダミー電極を形成し、 異なる上記第２のICに接続する隣り合う上記列電極の外
側に沿って第２のダミー電極を形成する ことを特徴とする請求項７に記載の液晶表示装置。8. The first IC and the second IC are provided in a plurality on the active substrate and the counter substrate, respectively, and the row electrodes are connected to the first IC. Connecting the column electrodes to an IC; forming a first dummy electrode along the outside of an adjacent row electrode connected to a different first IC; and forming an adjacent column connected to a different second IC. The liquid crystal display device according to claim 7, wherein a second dummy electrode is formed along the outside of the electrode.
電極とは、 それぞれ上記液晶表示領域の外側の４辺を囲むように形
成する ことを特徴とする請求項７に記載の液晶表示装置。9. The liquid crystal display according to claim 7, wherein each of the first dummy electrode and the second dummy electrode is formed so as to surround four sides outside the liquid crystal display area. apparatus.
ー電極とは、 それぞれ複数本で構成する ことを特徴とする請求項７に記載の液晶表示装置。10. The liquid crystal display device according to claim 7, wherein each of said first dummy electrode and said second dummy electrode comprises a plurality of lines.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18123189A JP2921864B2 (en) | 1989-07-13 | 1989-07-13 | Liquid crystal display |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18123189A JP2921864B2 (en) | 1989-07-13 | 1989-07-13 | Liquid crystal display |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0345934A JPH0345934A (en) | 1991-02-27 |
| JP2921864B2 true JP2921864B2 (en) | 1999-07-19 |
Family
ID=16097097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18123189A Expired - Lifetime JP2921864B2 (en) | 1989-07-13 | 1989-07-13 | Liquid crystal display |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2921864B2 (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2916824B2 (en) * | 1991-05-31 | 1999-07-05 | アルプス電気株式会社 | Liquid crystal display |
| JP2697626B2 (en) * | 1994-09-07 | 1998-01-14 | 日本電気株式会社 | Lock detector for phase locked loop |
| JP3085633B2 (en) * | 1994-11-08 | 2000-09-11 | シャープ株式会社 | Reflective liquid crystal display |
| JP5043072B2 (en) * | 1997-10-14 | 2012-10-10 | 三星電子株式会社 | Substrate for liquid crystal display device, liquid crystal display device and method for manufacturing the same |
| CN101251986B (en) * | 2004-07-26 | 2012-01-04 | 精工爱普生株式会社 | Light-emitting device |
| JP4639167B2 (en) * | 2006-06-02 | 2011-02-23 | シャープ株式会社 | Display device |
| JP2007108790A (en) * | 2007-01-10 | 2007-04-26 | Sharp Corp | Display device |
| JP6503721B2 (en) | 2014-12-12 | 2019-04-24 | 三菱電機株式会社 | Array substrate and display device using the same |
| JP7320407B2 (en) * | 2019-08-26 | 2023-08-03 | 株式会社ジャパンディスプレイ | Display device |
-
1989
- 1989-07-13 JP JP18123189A patent/JP2921864B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0345934A (en) | 1991-02-27 |
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