JP2934862B2 - Silica glass filter - Google Patents
Silica glass filterInfo
- Publication number
- JP2934862B2 JP2934862B2 JP34370189A JP34370189A JP2934862B2 JP 2934862 B2 JP2934862 B2 JP 2934862B2 JP 34370189 A JP34370189 A JP 34370189A JP 34370189 A JP34370189 A JP 34370189A JP 2934862 B2 JP2934862 B2 JP 2934862B2
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- glass filter
- silica
- support
- powder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 91
- 239000000843 powder Substances 0.000 claims description 42
- 238000001914 filtration Methods 0.000 claims description 37
- 239000002245 particle Substances 0.000 description 33
- 239000002002 slurry Substances 0.000 description 19
- 239000011148 porous material Substances 0.000 description 12
- 239000000377 silicon dioxide Substances 0.000 description 12
- 239000012528 membrane Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 229910001873 dinitrogen Inorganic materials 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 239000007789 gas Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 239000000470 constituent Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 238000007569 slipcasting Methods 0.000 description 4
- 239000000428 dust Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000002834 transmittance Methods 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000006063 cullet Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 235000010469 Glycine max Nutrition 0.000 description 1
- 244000068988 Glycine max Species 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 229910002026 crystalline silica Inorganic materials 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000005204 segregation Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000005049 silicon tetrachloride Substances 0.000 description 1
- 239000012798 spherical particle Substances 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
Landscapes
- Filtering Materials (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、半導体製造プロセス等で使用される反応ガ
ス等の気体、薬液等の液体の濾過に使用するシリカガラ
スフィルターに関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a silica glass filter used for filtering a gas such as a reaction gas and a liquid such as a chemical solution used in a semiconductor manufacturing process and the like.
[従来の技術] 従来、この種のフィルターとしては、ニトロセルロー
ス、アセチルセルロース、ポリテトラフロロエチレン等
の合成樹脂からなる樹脂フィルター、アルミナ、炭化け
い素、ムライト等のセラミックスからなるセラミックフ
ィルター、又はバイコール方式のガラスフィルター等が
知られている。[Prior art] Conventionally, as this type of filter, a resin filter made of a synthetic resin such as nitrocellulose, acetylcellulose, polytetrafluoroethylene, a ceramic filter made of ceramics such as alumina, silicon carbide, and mullite, or Vycor A glass filter of a system is known.
[発明が解決しようとする課題] しかしながら、上記従来の樹脂フィルターにおいて
は、耐熱性や耐薬品性に制限があると共に、強度が低
く、循環や送液の際の圧力変動に伴う脈動により、フィ
ルターの目が部分的に広がって捕集物がフィルターを通
ってしまい、完全な濾過を行えない。又、ベーキング等
により再生して使用することができない問題がある。[Problems to be Solved by the Invention] However, in the above-mentioned conventional resin filter, heat resistance and chemical resistance are limited, and the strength is low. The eyes are partially widened and the collected matter passes through the filter, making it impossible to perform complete filtration. In addition, there is a problem that it cannot be reproduced and used by baking or the like.
セラミックフィルターにおいては、上記樹脂フィルタ
ーの問題点を概ね解決できるものの、その構成粒子が結
晶質で多面体で絡み合った構造となるため、濾過流体の
流れが複雑となって圧力損失が大きくなると共に、透過
率が低下する。又、焼結した粒子間の境界に明瞭な粒界
を生じ、この粒界には、粒界偏析により粒子内の不純物
等が集まって粒子間相が形成されやすく、この粒子間相
が薬液等により侵されることによって不純物を溶出する
と共に、強度が低下する問題がある。In the case of the ceramic filter, although the problems of the resin filter can be largely solved, since the constituent particles have a structure in which the particles are crystalline and intertwined with a polyhedron, the flow of the filtration fluid becomes complicated, the pressure loss increases, and the permeability increases. The rate drops. In addition, a clear grain boundary is formed at the boundary between the sintered particles, and impurities and the like in the particles gather at the grain boundary due to segregation of the grain boundary to easily form an intergranular phase. There is a problem that impurities are eluted due to the erosion and strength is reduced.
又、バイコール方式のガラスフィルターにおいては、
その中に含まれるほう素、アルカリイオン等の溶出によ
り、不純物の混入が起こる問題がある。In the Vycor type glass filter,
There is a problem that impurities are mixed in due to elution of boron, alkali ions and the like contained therein.
そこで、本発明は、高純度で、耐薬品性に優れ、かつ
高透過率で、大きな濾過面積をもったシリカガラスフィ
ルターの提供を目的とする。Therefore, an object of the present invention is to provide a silica glass filter having high purity, excellent chemical resistance, high transmittance, and a large filtration area.
[課題を解決するための手段] 前記課題を解決するため、本発明のシリカガラスフィ
ルターは、非晶質シリカ粉末の焼結体からなる多孔質の
支持体に、非晶質シリカ粉末の焼結体からなる微細な多
孔質の濾過層を積層して構成され、純度99.9%以上で、
Na、K、Li、Fe、Al、Ca、Mg、Cu,Tiの合計が150ppm以
下であることを特徴とする。[Means for Solving the Problems] In order to solve the above-mentioned problems, the silica glass filter of the present invention comprises a porous support made of a sintered body of an amorphous silica powder. It is composed by laminating a fine porous filtration layer consisting of a body, with a purity of 99.9% or more,
The total of Na, K, Li, Fe, Al, Ca, Mg, Cu and Ti is 150 ppm or less.
上記シリカガラスフィルターにおいて、支持体の気孔
率は、10%以上であることが好ましい。In the above silica glass filter, the porosity of the support is preferably 10% or more.
支持体及び濾過層は、非晶質シリカ粉末の焼結体から
なる。The support and the filtration layer are made of a sintered body of amorphous silica powder.
濾過層の厚みは、濾過層構成粒子径の10〜500倍であ
ることが好ましい。The thickness of the filtration layer is preferably 10 to 500 times the particle diameter constituting the filtration layer.
支持体及び/又は濾過層を構成する粉末の75重量%以
上の粒子の粒径は、それぞれの平均粒径の±50%の範囲
に入るものであることが好ましい。The particle size of the particles constituting 75% by weight or more of the powder constituting the support and / or the filtration layer is preferably within a range of ± 50% of the respective average particle sizes.
又、支持体及び/又は濾過層を構成する粉末の粒子
は、実質的に球状であることが好ましい。The particles of the powder constituting the support and / or the filtration layer are preferably substantially spherical.
[作用] 上記手段においては、支持体と濾過層とにより、いわ
ゆる非対称膜の構造となると共に、構成粒子が非晶質で
あるため、結晶質のもののように粒界に粒子間相が形成
されるようなことはなく、均一な連続構造を有し、かつ
固着粒子が球状に近くなり、その表面が平滑となる。
又、負の静電チャージが非常に大きくなる。[Action] In the above means, the support and the filter layer form a so-called asymmetric membrane structure, and since the constituent particles are amorphous, an intergranular phase is formed at the grain boundary like a crystalline one. This has no uniform continuous structure, and the adhered particles become nearly spherical, and the surface becomes smooth.
Also, the negative electrostatic charge becomes very large.
支持体の気孔率は、60%程度が上限であると思われる
が、強度上問題がなければ高いものでもよい。又、10%
未満であると圧力損失が増大し、かつ透過量が低下す
る。The upper limit of the porosity of the support is considered to be about 60%, but may be high if there is no problem in strength. Also, 10%
If it is less than 1, the pressure loss increases and the amount of permeation decreases.
濾過層の厚みが、濾過層構成粒子径の10倍未満である
とピンホール等が発生し易く、500倍を超えると圧力損
失が大きくなると共に、透過率が小さくなる。If the thickness of the filtration layer is less than 10 times the particle diameter constituting the filtration layer, pinholes and the like are likely to occur, and if it exceeds 500 times, the pressure loss increases and the transmittance decreases.
支持体及び/又は濾過層を構成する粉末の75重量%以
上の粒子の粒径を、それぞれの平均粒径の±50%の範囲
とすることにより、気孔率の高いものが得られ、この範
囲外とすると気孔率が低下して好ましくない。By setting the particle size of the particles constituting 75% by weight or more of the powder constituting the support and / or the filtration layer to be within a range of ± 50% of the respective average particle sizes, a material having a high porosity can be obtained. Outside this is not preferable because the porosity decreases.
又、支持体及び/又は濾過層を構成する粉末の粒子
を、実質的に球状にすることにより、その表面が平滑と
なり、濾過流体の流れが滑らかとなって圧力損失が小さ
くなり、かつ高透過率が得られる。Further, by making the particles of the powder constituting the support and / or the filtration layer substantially spherical, the surface becomes smooth, the flow of the filtration fluid becomes smooth, the pressure loss becomes small, and the high permeability is obtained. Rate is obtained.
[実施例] 以下、本発明の実施例を詳細に説明する。[Example] Hereinafter, an example of the present invention will be described in detail.
実施例1 火炎法(四塩化けい素(SiCl4)を酸素−水素炎中で
熱分解してシリカ(SiO2)を得る方法、以下同じ)で合
成した合成シリカガラスカレットをシリカガラス製ボー
ルミル中で乾式粉砕し、平均粒径15μmのシリカ粉末を
得た。この粉末中の不純物濃度を第1表に示す。Example 1 A synthetic silica glass cullet synthesized by a flame method (a method of obtaining silica (SiO 2 ) by pyrolyzing silicon tetrachloride (SiCl 4 ) in an oxygen-hydrogen flame, the same applies hereinafter) in a silica glass ball mill. To obtain a silica powder having an average particle size of 15 μm. Table 1 shows the impurity concentration in this powder.
上記粉末を10〜20μmに分級した後、これに水を添加
し、スリップキャスティングにより直径15mm、厚さ2mm
の円板を成形した。成形体を1500℃の温度で焼成し、非
晶質シリカ粉末の焼結体からなる多孔質の支持体を作製
した。 After classifying the above powder to 10 to 20 μm, water was added thereto, and the diameter was 15 mm and the thickness was 2 mm by slip casting.
Was formed. The compact was fired at a temperature of 1500 ° C. to produce a porous support made of a sintered body of amorphous silica powder.
一方、火炎法で合成した合成シリカガラスカレットを
シリカガラス製ボールミル中で湿式粉砕し、平均粒径3
μmのシリカ粉末を含むスラリーを得た。このスラリー
を前記支持体の上面に流し、シリカ粒子を付着させた
後、1200℃の温度で焼成し、支持体上に非晶質シリカ粉
末の焼結体からなる微細な多孔質の濾過層を積層し、い
わゆる非対称膜の構造を有するシリカガラスフィルター
を得た。On the other hand, a synthetic silica glass cullet synthesized by a flame method was wet-pulverized in a silica glass ball mill to obtain an average particle size of 3%.
A slurry containing μm silica powder was obtained. The slurry is flowed on the upper surface of the support, silica particles are adhered thereto, and the mixture is calcined at a temperature of 1200 ° C. to form a fine porous filtration layer made of a sintered body of amorphous silica powder on the support. They were laminated to obtain a silica glass filter having a so-called asymmetric membrane structure.
このシリカガラスフィルターは、シリカの純度が99.9
%以上で、その不純物濃度は、第2表に示すようになっ
た。This silica glass filter has a silica purity of 99.9
%, The impurity concentrations were as shown in Table 2.
実施例2 実施例1と同様な方法により同様な支持体を作製する
一方、実施例1と同様な方法により平均粒径3μmのシ
リカ粉末を含むスラリーを得た。 Example 2 A similar support was prepared in the same manner as in Example 1, and a slurry containing silica powder having an average particle diameter of 3 μm was obtained in the same manner as in Example 1.
そのスラリーを1〜5μmに湿式分級し、分級スラリ
ーを上記支持体の上面に流し、シリカ粒子を付着させた
後、1200℃の温度で焼成し、支持体上に非晶質シリカ粉
末の支持体からなる微細な濾過層を積層し、いわゆる非
対称膜の構造を有するシリカガラスフィルターを得た。The slurry was wet-classified to 1 to 5 μm, the classified slurry was flowed on the upper surface of the support, and silica particles were attached thereto, and then calcined at a temperature of 1200 ° C. to form a support of amorphous silica powder on the support. Were laminated to obtain a silica glass filter having a so-called asymmetric membrane structure.
実施例3 実施例1と同様な方法により平均粒径15μmのシリカ
粉末を得、分級を行わず、この粉末に水を添加し、実施
例1と同様にスリップキャスティングにより直径15mm、
厚さ2mmの円板を成形した。成形体を1500℃の温度で焼
成し、非晶質シリカ粉末の焼結体からなる多孔質の支持
体を作製した。Example 3 A silica powder having an average particle size of 15 μm was obtained in the same manner as in Example 1, water was added to the powder without classification, and a diameter of 15 mm was obtained by slip casting in the same manner as in Example 1.
A 2 mm thick disk was formed. The compact was fired at a temperature of 1500 ° C. to produce a porous support made of a sintered body of amorphous silica powder.
支持体上に、実施例1と同様な方法により非晶質シリ
カ粉末の焼結体からなる微細な濾過層を積層し、いわゆ
る非対称膜の構造を有するシリカガラスフィルターを得
た。A fine filtration layer made of a sintered body of amorphous silica powder was laminated on the support in the same manner as in Example 1 to obtain a silica glass filter having a so-called asymmetric membrane structure.
ここで、実施例2及び実施例3で作製した支持体の気
孔を測定したところ、気孔径と気孔容積の関係は、第1
図において曲線A及びBで示すようになった。Here, when the pores of the supports prepared in Example 2 and Example 3 were measured, the relationship between the pore diameter and the pore volume was 1st.
In the figure, curves A and B are shown.
従って、分級粉末及び分級スラリーを使用した方が気
孔容積が大きく、かつ気孔の大きさも揃ったものが得ら
れることがわかる。Therefore, it can be seen that the use of the classified powder and the classified slurry provides a larger pore volume and a uniform pore size.
又、窒素ガス透過量を測定したところ、圧力損失0.5k
gf・cm-2のとき、実施例2のもので100m3・hr-1・m-2、
実施例3のもので30m3・hr-1・m-2となった。When the nitrogen gas permeation amount was measured, the pressure loss was 0.5k.
When gf · cm -2 , 100 m 3 · hr -1 · m -2 in Example 2 ;
It was 30 m 3 · hr -1 · m -2 in Example 3.
従って、分級粉末及び分級スラリーを用いることによ
り、透過量を大きくし得ることがわかる。Therefore, it is understood that the permeation amount can be increased by using the classified powder and the classified slurry.
実施例4 実施例1と同様な方法により得た平均粒径15μmのシ
リカ粉末の粒子を火災中で球状化した後、10〜20μm及
び1〜5μmに分級した。Example 4 Silica powder particles having an average particle diameter of 15 μm obtained in the same manner as in Example 1 were spheroidized in a fire, and then classified into 10 to 20 μm and 1 to 5 μm.
10〜20μmの球状分級粉末に水を添加し、実施例1と
同様にスリップキャスティングにより直径15mm、厚さ2m
mの円板に成形した。成形体を1500℃の温度で焼成し、
非晶質シリカ粉末の焼結体からなる支持体を作製した。Water is added to the spherical powder having a particle size of 10 to 20 μm, and the diameter is 15 mm and the thickness is 2 m by slip casting in the same manner as in Example 1.
m disks. Firing the molded body at a temperature of 1500 ° C,
A support made of a sintered body of amorphous silica powder was prepared.
一方、1〜5μmの球状分級粉末に水を添加してスラ
リーとし、このスラリーを上記支持体の上面に流し、シ
リカ粒子を付着させた後、1200℃の温度で焼成し、支持
体上に非晶質シリカ粉末の焼結体からなる微細な多孔質
の濾過層を積層し、いわゆる非対称膜の構造を有するシ
リカガラスフィルターを得た。On the other hand, water is added to the 1 to 5 μm spherical classified powder to form a slurry. The slurry is flowed on the upper surface of the support, silica particles are adhered to the slurry, and baked at a temperature of 1200 ° C. A fine porous filtration layer made of a sintered body of crystalline silica powder was laminated to obtain a silica glass filter having a so-called asymmetric membrane structure.
実施例5 実施例4と同様な方法により同様な支持体を作製する
一方、非晶質シリカの1〜5μm破砕分級粉末に水を添
加してスラリーとし、このスラリーを上記支持体の上面
に流してシリカ粒子を付着させた後、1200℃の温度で焼
成し、支持体上に非晶質シリカ粉末の焼結体からなる微
細な多孔質の濾過層を形成し、いわゆる非対称膜の構造
を有するシリカガラスフィルターを得た。Example 5 A similar support was prepared in the same manner as in Example 4, while water was added to a 1 to 5 μm crushed classified powder of amorphous silica to form a slurry, and the slurry was poured on the upper surface of the support. After adhering silica particles, it is fired at a temperature of 1200 ° C. to form a fine porous filtration layer composed of a sintered body of amorphous silica powder on a support, having a so-called asymmetric membrane structure. A silica glass filter was obtained.
ここで、実施例4及び実施例5のシリカガラスフィル
ターの窒素ガス透過量を測定したところ、圧力損失0.5k
gf・cm-2のとき、実施例4のもので600m3・hr-1・m-2、
実施例5のもので400m3・hr-1・m-2となった。Here, when the nitrogen gas permeation amount of the silica glass filters of Examples 4 and 5 was measured, the pressure loss was 0.5 k.
When gf · cm -2 , 600 m 3 · hr -1 · m -2 in Example 4;
It was 400 m 3 · hr -1 · m -2 in the case of Example 5.
従って、球状化した粒子からなる分級粉末及び分級ス
ラリーを用いることにより、透過量を一段と大きくし得
ることがわかる。Therefore, it is understood that the permeation amount can be further increased by using the classified powder and the classified slurry composed of the spherical particles.
実施例6 実施例4と同様な方法により同様な支持体を作製し
た。Example 6 A similar support was produced in the same manner as in Example 4.
一方、撹拌機付きのシリカガラス製反応容器に、エタ
ノール1500ml、29%アンモニア水200mlを加えて混合
し、反応溶液とした。又、エタノール1000mlとテトラエ
トキシシラン250mlを混合して原料溶液とし、これを20
℃の温度に調整した反応溶液中に滴下し、8時間撹拌す
ると、粒径0.4μmの球状単分散シリカ粉末を含むスラ
リーが得られた。On the other hand, 1500 ml of ethanol and 200 ml of 29% aqueous ammonia were added to a silica glass reaction vessel equipped with a stirrer and mixed to obtain a reaction solution. Also, 1000 ml of ethanol and 250 ml of tetraethoxysilane were mixed to prepare a raw material solution, and
The mixture was dropped into the reaction solution adjusted to a temperature of ° C., and stirred for 8 hours to obtain a slurry containing spherical monodispersed silica powder having a particle diameter of 0.4 μm.
このスラリーを上記支持体の上面に流して球状単分散
シリカ粒子を付着させた後、1150℃の温度で焼成し、支
持体上に非晶質シリカ粉末の焼結体からなる微細な多孔
質の濾過層を積層し、いわゆる非対称膜の構造を有する
シリカガラスフィルターを得た。This slurry is flowed on the upper surface of the support to adhere spherical monodisperse silica particles, and then calcined at a temperature of 1150 ° C. to form a fine porous silica powder comprising a sintered body of amorphous silica powder on the support. The filtration layer was laminated to obtain a silica glass filter having a so-called asymmetric membrane structure.
このシリカガラスフィルターの濾過層の気孔径は、0.
2μmであった。The pore size of the filtration layer of this silica glass filter is 0.
It was 2 μm.
又、上記シリカガラスフィルター1を、第2図に示す
ように、シリカガラスからなるケーシング2内に装着し
てサイズ分離ユニットとし、シリカガラスフィルター1
の下流に6インチシリコンウエハ(図示せず)を置いて
窒素ガスの濾過を行い、濾過した窒素ガスからシリコン
ウエハに付着したパーティクル(0.1μmのダスト)の
数を表面ダストカウンターで測定したところ、アルミナ
質セラミックフィルターのそれと濾過層の気孔径を併記
する第3表に示すようになった。As shown in FIG. 2, the silica glass filter 1 is mounted in a casing 2 made of silica glass to form a size separation unit.
A 6-inch silicon wafer (not shown) was placed downstream of the filter and nitrogen gas was filtered. The number of particles (0.1 μm dust) attached to the silicon wafer from the filtered nitrogen gas was measured by a surface dust counter. Table 3 shows the alumina ceramic filter and the pore size of the filtration layer together.
第2図において3,4は供給口、排出口である。 In FIG. 2, reference numerals 3 and 4 are a supply port and a discharge port.
従って、シリカガラスフィルターは、アルミナ質セラ
ミックフィルターより大きな捕集率を示すことがわか
る。 Therefore, it can be seen that the silica glass filter exhibits a higher collection rate than the alumina ceramic filter.
実施例7 実施例6と同様な方法によって得たシリカガラスフィ
ルターの濾過層の上面に、実施例6と同様な方法によっ
て得た粒径0.4μmの球状単分散シリカ粉末を含むスラ
リーを流して球状単分散シリカ粒子を付着させた後、11
50℃の温度で焼成する工程を繰り返し、濾過層の厚さを
第4表に示すように順次厚くしていったシリカガラスフ
ィルターの窒素ガスの透過量(圧力損失0.5kgf・cm-2)
は、第4表に示すようになった。Example 7 A slurry containing a spherical monodisperse silica powder having a particle diameter of 0.4 μm obtained by a method similar to that of Example 6 was flowed on the upper surface of the filtration layer of a silica glass filter obtained by a method similar to that of Example 6, and a spherical shape was obtained. After attaching the monodisperse silica particles, 11
The process of baking at a temperature of 50 ° C. was repeated, and the permeation amount of nitrogen gas through the silica glass filter (pressure loss 0.5 kgf · cm −2 ) in which the thickness of the filtration layer was gradually increased as shown in Table 4
Was as shown in Table 4.
従って、濾過層の厚さは、構成粒子径の10〜500倍が
よく、10倍未満であるとピンホールが発生しやすく、50
0倍を超えると透過量が低減することがわかる。 Therefore, the thickness of the filtration layer is preferably 10 to 500 times the constituent particle diameter, and if it is less than 10 times, pinholes are likely to occur,
It can be seen that when it exceeds 0 times, the transmission amount decreases.
実施例8 実施例1と同様な方法により各種平均粒径のシリカ粉
末を得、それぞれの粉末に水を添加し、実施例1と同様
にスリップキャスティングにより直径15mm、厚さ2mmの
円板を成形した。各成形体を1500℃の温度で焼成し、非
晶質シリカ粉末の焼成体からなり、第5表に示すよう
に、気孔率の異なる多孔質の各支持体を作製した。Example 8 A silica powder having various average particle diameters was obtained by the same method as in Example 1, water was added to each powder, and a disk having a diameter of 15 mm and a thickness of 2 mm was formed by slip casting as in Example 1. did. Each molded body was fired at a temperature of 1500 ° C. to form a sintered body of amorphous silica powder, and as shown in Table 5, porous supports having different porosity were produced.
各支持体の上面に、実施例6と同様な方法によって得
た粒径0.4μmの球状単分散シリカ粉末を含むスラリー
を流して球状単分散シリカ粒子を付着させた後、1150℃
の温度で焼成し、支持体上に非晶質シリカ粉末の焼結体
からなる微細な多孔質の濾過層を積層し、各シリカガラ
スフィルターを得た。A slurry containing a spherical monodisperse silica powder having a particle diameter of 0.4 μm obtained by the same method as in Example 6 was flowed on the upper surface of each support, and the spherical monodisperse silica particles were attached.
, And a fine porous filtration layer made of a sintered body of amorphous silica powder was laminated on the support to obtain each silica glass filter.
それぞれのシリカガラスフィルターの窒素ガスの透過
量(圧力損失0.5kgf・cm-2)は、第5表に示すようにな
った。Table 5 shows the nitrogen gas permeation amount (pressure loss 0.5 kgf · cm −2 ) of each silica glass filter.
従って、支持体の気孔率は、10%以上とすればよいこ
とがわかる。 Therefore, it is understood that the porosity of the support should be 10% or more.
実施例9 実施例4と同様な方法により同様な支持体を作製し
た。Example 9 A similar support was produced in the same manner as in Example 4.
一方、撹拌機付きのシリカガラス製反応容器に、エタ
ノール1500ml、29%アンモニア水100mlを加えて混合
し、反応溶液とした。又、エタノール1000mlとテトラエ
トキシシラン200mlを混合して原料溶液とし、これを20
℃の温度で調整した反応溶液中に滴下し、8時間撹拌す
ると、粒径0.2μmの球状単分散シリカ粉末を含むスラ
リーが得られた。On the other hand, 1500 ml of ethanol and 100 ml of 29% aqueous ammonia were added to a silica glass reaction vessel equipped with a stirrer and mixed to obtain a reaction solution. Also, 1000 ml of ethanol and 200 ml of tetraethoxysilane were mixed to prepare a raw material solution, and
The solution was dropped into the reaction solution adjusted at a temperature of ° C. and stirred for 8 hours to obtain a slurry containing a spherical monodispersed silica powder having a particle size of 0.2 μm.
このスラリーを上記支持体の上面に流して球状単分散
シリカ粒子を付着させた後、1050℃の温度で焼成し、支
持体上に非晶質シリカ粉末の焼結体からなる微細な多孔
質の濾過層を積層し、いわゆる非対称膜の構造を有する
シリカガラスフィルターを得た。This slurry is allowed to flow on the upper surface of the support to adhere spherical monodisperse silica particles, and then calcined at a temperature of 1050 ° C. to form a fine porous material comprising a sintered body of amorphous silica powder on the support. The filtration layer was laminated to obtain a silica glass filter having a so-called asymmetric membrane structure.
このシリカガラスフィルターの濾過層の気孔径は、0.
1μmであった。The pore size of the filtration layer of this silica glass filter is 0.
It was 1 μm.
又、上記シリカガラスフィルターによって窒素ガスを
濾過した際のガス透過量、純水を濾過した際の液体透過
量、並びに気孔率は、アルミナ質セラミックフィルタ
ー、バイコール方式のガラスフィルターのそれらと濾過
層の気孔径を併記する第6表、第7表並びに第8表に示
すようになった。In addition, the gas permeation amount when filtering nitrogen gas by the silica glass filter, the liquid permeation amount when filtering pure water, and the porosity are those of alumina ceramic filters and those of the Vycor type glass filter and the filtration layer. The results are shown in Tables 6, 7 and 8, which also show the pore diameter.
なお、ガラスフィルターは、バイコール方式で作製さ
れた多孔質のものである。 Note that the glass filter is a porous filter manufactured by Vycor method.
従って、実施例9のシリカガラスフィルターは、気体
透過量、流体透過量及び気孔率を、アルミナ質セラミッ
クフィルター等と同等若しくは同等以上にし得ることが
わかる。Therefore, it can be seen that the silica glass filter of Example 9 can make the gas permeation amount, the fluid permeation amount and the porosity equal to or more than the alumina ceramic filter or the like.
更に、実施例9のシリカガラスフィルターを用いて第
2図に示すサイズ分離ユニットを構成し、各種のガス、
液体を濾過し、耐薬品性を調べたところ、アルミナ質セ
ラミックフィルターのそれを併記する第9表に示すよう
になった。Further, the size separation unit shown in FIG. 2 was constructed using the silica glass filter of Example 9, and various gases,
The liquid was filtered and the chemical resistance was examined. The results were as shown in Table 9 together with those of the alumina ceramic filter.
表中○は良、△は可、×は不可を意味する。 In the table, ○ means good, Δ means good, × means bad.
従って、シリカガラスフィルターは、ふっ酸以外の酸
に対して安定であることがわかる。 Therefore, it is understood that the silica glass filter is stable against acids other than hydrofluoric acid.
更に又、実施例9のシリカガラスフィルターを用いて
20%H2SO4の濾過を行い、濾過後の20%H2SO4中の不純物
濃度を測定したところ、アルミナ質セラミックフィルタ
ーのそれを併記する第10表に示すようになった。Furthermore, using the silica glass filter of Example 9
20% H 2 SO 4 was filtered, and the impurity concentration in the 20% H 2 SO 4 after the filtration was measured. The results were as shown in Table 10 together with those of the alumina ceramic filter.
従って、シリカガラスフィルターは、濾過液の純度を
非常に高く保つことがわかる。 Therefore, it can be seen that the silica glass filter keeps the purity of the filtrate extremely high.
[発明の効果] 以上のように本発明によれば、支持体と濾過層とによ
り、いわゆる非対称膜の構造となるので、濾過面積を大
きくすることができる。[Effects of the Invention] As described above, according to the present invention, since a so-called asymmetric membrane structure is formed by the support and the filtration layer, the filtration area can be increased.
又、シリカガラスフィルターが特定の不純物を特定量
しか含まず高純度であり、かつ、構成粒子が非晶質であ
って、セラミックフィルターのように粒界に偏析不純物
を含む粒子間相が形成されるようなことはなく、均一な
連続構造を有するので、耐薬品性を向上することができ
ると共に、支持体及び濾過層が、非晶質シリカ粉末の焼
結体からなることも相俟って強度を向上することができ
る。In addition, the silica glass filter is high purity containing only a specific amount of a specific impurity, and the constituent particles are amorphous, and an intergranular phase containing segregated impurities is formed at a grain boundary like a ceramic filter. And a uniform continuous structure, so that the chemical resistance can be improved, and the support and the filter layer are formed of a sintered body of amorphous silica powder. Strength can be improved.
更に、固着粒子が球状に近くなり、その表面が平滑と
なるので、濾過流体の流れが滑らかとなり、圧力損失を
小さくし得、かつ透過率を高めることができる。Furthermore, since the adhered particles become nearly spherical and the surface becomes smooth, the flow of the filtration fluid becomes smooth, the pressure loss can be reduced, and the transmittance can be increased.
更に又、気体の濾過に際し、フィルターの負の静電チ
ャージが非常に大きくなるので、小さなダスト、特に正
に帯電した粒子を捕獲することができる。Furthermore, when filtering the gas, the negative electrostatic charge of the filter becomes very large, so that small dust, especially positively charged particles, can be captured.
第1図は本発明の実施例2、実施例3に係るシリカガラ
スフィルターの気孔径と気孔容積の関係を示す説明図、
第2図は実施例6に係るシリカガラスフィルターを用い
たサイズ分離ユニットの概念図である。 1…シリカガラスフィルター、2…ケーシング 3…供給口、4…排出口FIG. 1 is an explanatory diagram showing the relationship between the pore diameter and the pore volume of the silica glass filters according to Embodiments 2 and 3 of the present invention,
FIG. 2 is a conceptual diagram of a size separation unit using a silica glass filter according to Embodiment 6. 1. Silica glass filter 2. Casing 3. Supply port 4. Discharge port
───────────────────────────────────────────────────── フロントページの続き (72)発明者 島井 駿蔵 神奈川県秦野市曽屋30 東芝セラミック ス株式会社中央研究所内 (56)参考文献 特公 平1−23162(JP,B2) (58)調査した分野(Int.Cl.6,DB名) B01D 39/20 ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Junzo Shimai 30 Soya, Hadano-shi, Kanagawa Prefecture, Central Research Laboratory, Toshiba Ceramics Co., Ltd. Field (Int.Cl. 6 , DB name) B01D 39/20
Claims (1)
の支持体に、非晶質シリカ粉末の焼結体からなる微細な
多孔質の濾過層を積層して構成され、純度99.9%以上
で、Na、K、Li、Fe、Al、Ca、Mg、Cu、Tiの合計が150p
pm以下であることを特徴とするシリカガラスフィルタ
ー。A fine porous filtration layer made of a sintered body of amorphous silica powder is laminated on a porous support made of a sintered body of amorphous silica powder, and has a purity of 99.9%. %, The total of Na, K, Li, Fe, Al, Ca, Mg, Cu and Ti is 150p
A silica glass filter characterized by being at most pm.
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34370189A JP2934862B2 (en) | 1989-12-28 | 1989-12-28 | Silica glass filter |
| US07/633,624 US5089134A (en) | 1989-12-28 | 1990-12-26 | Silica glass filter |
| FR9016298A FR2656542B1 (en) | 1989-12-28 | 1990-12-27 | SILICA GLASS FILTER AND FILTERING DEVICE USING SUCH A FILTER. |
| GB9028175A GB2239404B (en) | 1989-12-28 | 1990-12-28 | Silica glass filter |
| DE4042134A DE4042134C2 (en) | 1989-12-28 | 1990-12-28 | quartz glass filters |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP34370189A JP2934862B2 (en) | 1989-12-28 | 1989-12-28 | Silica glass filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03202109A JPH03202109A (en) | 1991-09-03 |
| JP2934862B2 true JP2934862B2 (en) | 1999-08-16 |
Family
ID=18363585
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP34370189A Expired - Fee Related JP2934862B2 (en) | 1989-12-28 | 1989-12-28 | Silica glass filter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2934862B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3113713B2 (en) | 1991-11-30 | 2000-12-04 | 東芝セラミックス株式会社 | Method for producing silica glass filter unit |
-
1989
- 1989-12-28 JP JP34370189A patent/JP2934862B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3113713B2 (en) | 1991-11-30 | 2000-12-04 | 東芝セラミックス株式会社 | Method for producing silica glass filter unit |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03202109A (en) | 1991-09-03 |
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