JP2946396B2 - UV diffuse reflector - Google Patents
UV diffuse reflectorInfo
- Publication number
- JP2946396B2 JP2946396B2 JP7027775A JP2777595A JP2946396B2 JP 2946396 B2 JP2946396 B2 JP 2946396B2 JP 7027775 A JP7027775 A JP 7027775A JP 2777595 A JP2777595 A JP 2777595A JP 2946396 B2 JP2946396 B2 JP 2946396B2
- Authority
- JP
- Japan
- Prior art keywords
- ultraviolet
- rough surface
- substrate
- coating film
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- Optical Elements Other Than Lenses (AREA)
- Surface Treatment Of Optical Elements (AREA)
Description
【０００１】[0001]
【産業上の利用分野】この発明は、たとえば人工日焼け
装置等の健康医療器具や、カビや酵母の品種改良に用い
られるバイオ器機等に使用される紫外線拡散反射板に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ultraviolet diffuse reflection plate used in health medical equipment such as an artificial tanning apparatus, and a bio-instrument used for breeding molds and yeasts.
【０００２】この明細書において、「アルミニウム」と
いう語には、純アルミニウムの他にアルミニウム合金を
含むものとする。[0002] In this specification, the term "aluminum" shall include aluminum alloys in addition to pure aluminum.
【０００３】[0003]
【従来の技術と発明が解決しようとする課題】従来、殺
虫灯や殺菌灯等において、紫外線の反射には多層膜コー
ティングガラスや金メッキ板等が用いられている。しか
しながら、これらはいずれも必要な箇所に紫外線を集中
させるための正反射を利用するものである。2. Description of the Related Art Conventionally, in insecticide lamps, germicidal lamps and the like, a multilayer-coated glass, a gold-plated plate or the like has been used for reflecting ultraviolet light. However, each of these uses specular reflection for concentrating ultraviolet rays at necessary places.
【０００４】そして、紫外線を均一に分散して反射させ
る拡散反射には用いられていないのが現状である。At present, it is not used for diffuse reflection for uniformly dispersing and reflecting ultraviolet rays.
【０００５】この発明は上記実情に鑑み、紫外線を集中
させずに、均一に分散させることができ、これにより人
工日焼け装置等の健康医療器具や、カビや酵母の品種改
良に用いられるバイオ器機等に利用しうる拡散反射板を
提供することを目的とする。In view of the above-mentioned circumstances, the present invention can uniformly disperse ultraviolet rays without concentrating the ultraviolet rays, thereby making it possible to disperse the ultraviolet rays, such as an artificial tanning apparatus, a health and medical instrument, and a bio-instrument used for improving varieties of mold and yeast. It is an object of the present invention to provide a diffuse reflection plate which can be used for the following.
【０００６】[0006]
【課題を解決するための手段】この発明による第１の紫
外線拡散反射板は、アルミニウム製基板の少なくとも片
面が、中心線平均粗さで０．３〜２．０μｍである粗面
となされ、基板の粗面に厚さ１〜３μｍの陽極酸化皮膜
が形成されているものである。According to a first ultraviolet diffuse reflection plate according to the present invention, at least one surface of an aluminum substrate has a rough surface having a center line average roughness of 0.3 to 2.0 μm. An anodic oxide film having a thickness of 1 to 3 μm is formed on the rough surface.
【０００７】上記第１の紫外線拡散反射板において、ア
ルミニウム製基板の少なくとも片面の粗面の表面粗さ
が、中心線平均粗さ(Ra)で０．３〜２．０μｍとなされ
ているのは、下限値未満であると均一な粗面化が困難で
正反射が現れ、上限値を越えると紫外線拡散反射板の拡
散反射率が低下するためである。In the first ultraviolet diffuse reflection plate, the surface roughness of at least one rough surface of the aluminum substrate is 0.3 to 2.0 μm in center line average roughness (Ra). If the ratio is less than the lower limit, uniform surface roughening is difficult and regular reflection appears. If the ratio exceeds the upper limit, the diffuse reflectance of the ultraviolet diffuse reflection plate is reduced.
【０００８】また、陽極酸化皮膜の厚さが１〜３μｍと
されているのは、下限値未満であるとコイル連続処理、
すなわちコイルから巻戻しつつ連続的に陽極酸化処理を
施すことが困難で膜厚が不均一になり、上限値を越える
と拡散反射率が低下するとともにコストが高くなるから
である。なお、陽極酸化皮膜としては、硫酸陽極酸化皮
膜が好ましい。When the thickness of the anodic oxide film is set to 1 to 3 μm, if the thickness is less than the lower limit, the coil is subjected to continuous treatment.
That is, it is difficult to continuously perform the anodic oxidation treatment while unwinding from the coil, and the film thickness becomes non-uniform. If the upper limit value is exceeded, the diffuse reflectance decreases and the cost increases. The anodic oxide film is preferably a sulfuric acid anodic oxide film.
【０００９】さらに、アルミニウム製基板の少なくとも
片面の粗面の表面粗さが、中心線平均粗さ(Ra)で０．３
〜２．０μｍとなされており、陽極酸化皮膜の厚さが１
〜３μｍとされているのは、これらの範囲内であれば、
紫外線拡散反射板に成形加工を施しても陽極酸化皮膜が
基板から剥離したり、陽極酸化皮膜にクラックが発生し
たりするのを防止することができるからである。Further, at least one rough surface of the aluminum substrate has a center line average roughness (Ra) of 0.3.
２．０2.0 μm, and the thickness of the anodic oxide film is 1
３3 μm is within these ranges,
This is because the anodic oxide film can be prevented from peeling off from the substrate and the occurrence of cracks in the anodic oxide film even when the ultraviolet diffusing reflection plate is formed.
【００１０】この発明による第２の紫外線拡散反射板
は、金属製基板の少なくとも片面が、中心線平均粗さで
０．３〜２．０μｍである粗面となされ、基板の粗面に
厚さ０．１〜２μｍのケイ酸系塗膜が形成されているも
のである。In the second ultraviolet diffuse reflection plate according to the present invention, at least one surface of the metal substrate has a rough surface having a center line average roughness of 0.3 to 2.0 μm. A silicate-based coating film having a thickness of 0.1 to 2 μm is formed.
【００１１】上記第２の紫外線拡散反射板において、金
属製基板としては、たとえばアルミニウム、鉄およびそ
の合金、銅およびその合金からなるものが用いられる。In the second ultraviolet diffuse reflection plate, the metal substrate is made of, for example, aluminum, iron and its alloys, and copper and its alloys.
【００１２】また、ケイ酸系塗膜は、ケイ酸ナトリウム
やケイ酸カリウム等のアルカリケイ酸塩、無機系シリケ
ート、コロイダルシリカ等のケイ酸系無機材料を用い
て、通常は硬化剤を使用せずに形成される。また、ケイ
酸系塗膜は、アクリルシリコン、アクリルウレタンシリ
コン等の有機変性シリコン系材料によっても形成され
る。The silicate-based coating film is usually made of a silicate-based inorganic material such as sodium silicate or potassium silicate, or an inorganic silicate such as inorganic silicate or colloidal silica. Formed without. Further, the silicic acid-based coating film is also formed of an organically modified silicon-based material such as acrylic silicon and acrylic urethane silicon.
【００１３】上記第２の紫外線拡散反射板において、金
属製基板の少なくとも片面の粗面の表面粗さが、中心線
平均粗さ(Ra)で０．３〜２．０μｍとなされているの
は、下限値未満であると均一な粗面化が困難で正反射が
現れ、上限値を越えると紫外線拡散反射板の拡散反射率
が低下するためである。In the second ultraviolet diffusing reflector, at least one rough surface of the metal substrate has a center line average roughness (Ra) of 0.3 to 2.0 μm. If the ratio is less than the lower limit, uniform surface roughening is difficult and regular reflection appears. If the ratio exceeds the upper limit, the diffuse reflectance of the ultraviolet diffuse reflection plate is reduced.
【００１４】また、ケイ酸系塗膜の厚さが０．１〜２μ
ｍとされているのは、下限値未満であると薄すぎて均一
な塗膜を形成することができず、上限値を越えると拡散
反射率が低下するからである。また、ケイ酸系塗膜が、
たとえばケイ酸ナトリウムからなる場合、ナトリウムが
空気中のＣＯ2 や水分と結合し、炭酸ナトリウムや炭酸
水素ナトリウムができて白粉が現れたり、くもりが発生
して反射特性が低下する。したがって、これを防止する
ために希硝酸等で酸洗浄しナトリウムを除去する中和処
理を施す必要がある。ところが、ケイ酸系塗膜の厚さが
上限値を越えると塗膜の基板側に存在するナトリウムが
除去しにくくなり、塗膜全体の中和処理をできないとい
う問題もある。これは、塗膜が他のアルカリケイ酸塩か
らなる場合も同様である。Further, the thickness of the silicic acid-based coating film is 0.1 to 2 μm.
The reason for the value of m is that if it is less than the lower limit, it is too thin to form a uniform coating film, and if it exceeds the upper limit, the diffuse reflectance decreases. In addition, silicic acid based coating film,
For example, in the case of sodium silicate, sodium combines with CO 2 and moisture in the air to form sodium carbonate and sodium hydrogen carbonate, white powder appears or cloudiness occurs, and the reflection characteristics deteriorate. Therefore, in order to prevent this, it is necessary to perform a neutralization treatment for removing sodium by acid washing with dilute nitric acid or the like. However, if the thickness of the silicic acid-based coating film exceeds the upper limit, it is difficult to remove sodium present on the substrate side of the coating film, and there is a problem that the neutralization treatment of the entire coating film cannot be performed. This is the same when the coating film is made of another alkali silicate.
【００１５】さらに、金属製基板の少なくとも片面の粗
面の表面粗さが、中心線平均粗さ(Ra)で０．３〜２．０
μｍとなされており、ケイ酸系塗膜の厚さが０．１〜２
μｍとされているのは、これらの範囲内であれば、紫外
線拡散反射板に成形加工を施してもケイ酸系塗膜が基板
から剥離したり、ケイ酸系塗膜にクラックが発生したり
するのを防止することができるからである。Further, the surface roughness of at least one rough surface of the metal substrate is 0.3 to 2.0 in terms of center line average roughness (Ra).
μm, and the thickness of the silicic acid-based coating film is 0.1 to 2 μm.
If the thickness is within these ranges, the silicate-based coating film may be peeled from the substrate or cracks may occur in the silicate-based coating film even when the ultraviolet diffusion reflector is formed. This is because it is possible to prevent that.
【００１６】上記第１および第２の紫外線拡散反射板に
おいて、アルミニウム製基板や金属製基板の粗面化は、
ステンレス鋼製ワイヤブラシの回転や摺動、砂目立、シ
ョットブラストにより行なわれたり、あるいは酸梨地剤
（たとえば親和化成社製フルサテン（商品名））を用い
て行なわれる。In the first and second ultraviolet diffusion reflectors, the surface of the aluminum or metal substrate is roughened.
This is performed by rotating or sliding a stainless steel wire brush, graining, shot blasting, or using an acid-pear finish (for example, Full Satin (trade name) manufactured by Affinity Chemicals).
【００１７】[0017]
【作用】アルミニウム製基板の少なくとも片面が、中心
線平均粗さで０．３〜２．０μｍである粗面となされ、
基板の粗面に厚さ１〜３μｍの陽極酸化皮膜が形成され
ているか、あるいは金属製基板の少なくとも片面が、中
心線平均粗さで０．３〜２．０μｍである粗面となさ
れ、基板の粗面に厚さ０．１〜２μｍのケイ酸系塗膜が
形成されていると、紫外線の拡散反射率が優れたものと
なる。しかも、紫外線拡散反射板に成形加工を施したと
しても、陽極酸化皮膜および塗膜の剥離やクラックの発
生を防止することができる。At least one surface of the aluminum substrate has a rough surface having a center line average roughness of 0.3 to 2.0 μm,
An anodic oxide film having a thickness of 1 to 3 μm is formed on the rough surface of the substrate, or at least one surface of the metal substrate is formed into a rough surface having a center line average roughness of 0.3 to 2.0 μm. When a silicate-based coating film having a thickness of 0.1 to 2 μm is formed on the rough surface, the diffuse reflectance of ultraviolet rays becomes excellent. In addition, even if the ultraviolet diffusing reflection plate is formed, the anodic oxide film and the coating film can be prevented from peeling and cracking.
【００１８】[0018]
実施例１〜５および比較例１ JIS Ａ１０５０合金からなる６つの基板の片面を、それ
ぞれ０．３μｍ、０．５μｍ、１．０μｍ、１．５μ
ｍ、２．０μｍおよび２．５μｍの中心線平均粗さ(Ra)
を有する粗面とし、この粗面に、脱脂、水洗、苛性エッ
チング、水洗、中和、水洗、硫酸による陽極酸化、水
洗、湯洗、封孔および乾燥の各処理を上記順序で施し、
基板の粗面に膜厚２μｍの陽極酸化皮膜を形成した。こ
うして６つの紫外線拡散反射板を製造した。Examples 1 to 5 and Comparative Example 1 One side of each of six substrates made of JIS A1050 alloy was 0.3 μm, 0.5 μm, 1.0 μm, and 1.5 μm, respectively.
m, 2.0 μm and 2.5 μm center line average roughness (Ra)
The rough surface having, the degreasing, washing with water, caustic etching, washing with water, neutralization, washing with water, anodic oxidation with sulfuric acid, washing with water, washing with hot water, sealing and drying are performed in the above order,
An anodized film having a thickness of 2 μm was formed on the rough surface of the substrate. Thus, six ultraviolet diffuse reflection plates were manufactured.
【００１９】比較例２ JIS Ａ１０５０合金からなる１つの基板の粗面の中心線
平均粗さ(Ra)を０．５μｍとし、陽極酸化皮膜の膜厚を
４μｍとしたことの他は、上記実施例１〜６および比較
例１と同様にして１つの紫外線拡散反射板を製造した。Comparative Example 2 The same procedure as in the above Example was conducted except that the center line average roughness (Ra) of the rough surface of one substrate made of JIS A1050 alloy was 0.5 μm and the thickness of the anodic oxide film was 4 μm. In the same manner as in Examples 1 to 6 and Comparative Example 1, one ultraviolet diffuse reflection plate was manufactured.
【００２０】実施例６〜１０および比較例３ JIS Ａ１０５０合金からなる６つの基板の片面を、それ
ぞれ０．３μｍ、０．５μｍ、１．０μｍ、１．５μ
ｍ、２．０μｍおよび２．５μｍの中心線平均粗さを有
する粗面とし、この粗面に、アルカリ脱脂、水洗、湯
洗、塗装、焼付、硝酸洗浄、水洗および乾燥の各処理を
上記順序で施し、基板の粗面に膜厚０．１５μｍのケイ
酸ソーダからなる塗膜を形成した。こうして６つの紫外
線拡散反射板を製造した。Examples 6 to 10 and Comparative Example 3 One side of each of six substrates made of JIS A1050 alloy was 0.3 μm, 0.5 μm, 1.0 μm and 1.5 μm, respectively.
m, 2.0 μm, and 2.5 μm center line average roughness. The rough surface was subjected to alkali degreasing, water washing, hot water washing, painting, baking, nitric acid washing, water washing and drying in the above order. To form a 0.15 μm-thick sodium silicate coating film on the rough surface of the substrate. Thus, six ultraviolet diffuse reflection plates were manufactured.
【００２１】実施例１１ JIS Ａ１０５０合金からなる１つの基板の粗面の中心線
平均粗さ(Ra)を０．５μｍとし、塗膜の膜厚を２μｍと
したことの他は、上記実施例６〜１０および比較例３と
同様にして１つの紫外線拡散反射板を製造した。Example 11 The same procedure as in Example 6 was carried out except that the center line average roughness (Ra) of the rough surface of one substrate made of JIS A1050 alloy was 0.5 μm and the thickness of the coating film was 2 μm. In the same manner as in Comparative Example 3 and Comparative Example 3, one ultraviolet diffuse reflection plate was manufactured.
【００２２】比較例４ JIS Ａ１０５０合金からなる１つの基板の粗面の中心線
平均粗さ(Ra)を０．５μｍとし、塗膜の膜厚を３μｍと
したことの他は、上記実施例６〜１０および比較例３と
同様にして１つの紫外線拡散反射板を製造した。Comparative Example 4 The same procedure as in Example 6 was carried out except that the center line average roughness (Ra) of the rough surface of one substrate made of JIS A1050 alloy was 0.5 μm and the thickness of the coating film was 3 μm. In the same manner as in Comparative Example 3 and Comparative Example 3, one ultraviolet diffuse reflection plate was manufactured.
【００２３】評価試験 実施例１〜１１および比較例１〜４の紫外線拡散反射板
の拡散反射率を日立製作所社製３３０型自記分光光度計
を用いて測定した。すなわち、紫外線拡散反射板からの
反射光を直径６０ｍｍの積分球を経てモノクロメータに
導いて拡散反射率を測定した。なお、紫外線拡散反射板
への紫外線の入射方向は板圧延方向に直角となるように
しておいた。評価試験の結果を表１にまとめて示す。拡
散反射率（％）は、波長２５０ｎｍの測定値を示す。Evaluation Test The diffuse reflectance of the ultraviolet diffuse reflection plates of Examples 1 to 11 and Comparative Examples 1 to 4 was measured using a 330 type self-recording spectrophotometer manufactured by Hitachi, Ltd. That is, the light reflected from the ultraviolet diffuse reflection plate was guided to a monochromator through an integrating sphere having a diameter of 60 mm, and the diffuse reflectance was measured. The direction of incidence of the ultraviolet rays on the ultraviolet diffuse reflection plate was set to be perpendicular to the sheet rolling direction. Table 1 summarizes the results of the evaluation test. The diffuse reflectance (%) indicates a measured value at a wavelength of 250 nm.
【００２４】[0024]
【表１】 [Table 1]
【００２５】[0025]
【発明の効果】この発明の紫外線拡散反射板は、上述の
ように優れた拡散反射率を有しているので、健康医療器
具、バイオ器機等の反射部材に適用した場合、反射光を
全体的に照射することができる。また、紫外線拡散反射
板に成形加工を施したとしても、陽極酸化皮膜および塗
膜の剥離やクラックの発生を防止することができるの
で、この紫外線拡散反射板を用いて、所定の形状を有す
る健康医療器具、バイオ器機等の反射部材を簡単にかつ
安いコストで製造することができる。なお、成形加工を
施した後に陽極酸化皮膜またはケイ酸系塗膜を形成する
方法もあるが、製造が面倒であるとともにコストが高く
なる。As described above, the ultraviolet diffuse reflection plate of the present invention has an excellent diffuse reflectance as described above. Therefore, when applied to a reflection member of a health care device, a bio-instrument, or the like, the reflected light can be totally reflected. Can be irradiated. Further, even if the ultraviolet diffuse reflection plate is formed, the anodic oxide film and the coating film can be prevented from peeling and cracking. Reflective members such as medical instruments and bio-instruments can be manufactured easily and at low cost. In addition, there is a method of forming an anodic oxide film or a silicic acid-based coating film after the forming process, but the production is troublesome and the cost increases.
フロントページの続き (58)調査した分野(Int.Cl.6，ＤＢ名) C25D 11/04 304 C25D 11/04 Continuation of the front page (58) Field surveyed (Int.Cl. 6 , DB name) C25D 11/04 304 C25D 11/04
Claims (2)
が、中心線平均粗さで０．３〜２．０μｍである粗面と
なされ、基板の粗面に厚さ１〜３μｍの陽極酸化皮膜が
形成されている紫外線拡散反射板。At least one surface of an aluminum substrate has a rough surface having a center line average roughness of 0.3 to 2.0 μm, and an anodized film having a thickness of 1 to 3 μm is formed on the rough surface of the substrate. UV diffuse reflector.
平均粗さで０．３〜２．０μｍである粗面となされ、基
板の粗面に厚さ０．１〜２μｍのケイ酸系塗膜が形成さ
れている紫外線拡散反射板。At least one surface of the metal substrate has a rough surface having a center line average roughness of 0.3 to 2.0 μm, and a 0.1 to 2 μm-thick silicate-based coating is formed on the rough surface of the substrate. An ultraviolet diffuse reflection plate on which a film is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7027775A JP2946396B2 (en) | 1995-02-16 | 1995-02-16 | UV diffuse reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7027775A JP2946396B2 (en) | 1995-02-16 | 1995-02-16 | UV diffuse reflector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH08225992A JPH08225992A (en) | 1996-09-03 |
| JP2946396B2 true JP2946396B2 (en) | 1999-09-06 |
Family
ID=12230358
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7027775A Expired - Fee Related JP2946396B2 (en) | 1995-02-16 | 1995-02-16 | UV diffuse reflector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2946396B2 (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG93245A1 (en) * | 1999-07-13 | 2002-12-17 | Johnson & Johnson Vision Care | Reflectors for uv radiation source |
| JP6098426B2 (en) * | 2013-08-05 | 2017-03-22 | 日本軽金属株式会社 | Surface-treated aluminum material, ultraviolet reflecting member using the same, and method for producing ultraviolet reflecting member |
| CN109553157A (en) * | 2018-05-11 | 2019-04-02 | 深圳市微纳科学技术有限公司 | UVC fluid purification sterilization component |
| CN109557608A (en) * | 2018-05-11 | 2019-04-02 | 深圳市微纳科学技术有限公司 | Improve the light guide glass and preparation method thereof of UVC contact area |
| CN109553156A (en) * | 2018-05-11 | 2019-04-02 | 深圳市微纳科学技术有限公司 | Ultraviolet purifier |
| JP2023118353A (en) * | 2022-02-15 | 2023-08-25 | 日本軽金属株式会社 | UV irradiation member, enclosure for UV irradiation device, and UV irradiation device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3111340U (en) | 2005-04-14 | 2005-07-14 | 有限会社刃物屋トギノン | Acupuncture and heel fingers |
-
1995
- 1995-02-16 JP JP7027775A patent/JP2946396B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3111340U (en) | 2005-04-14 | 2005-07-14 | 有限会社刃物屋トギノン | Acupuncture and heel fingers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH08225992A (en) | 1996-09-03 |
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