JP2950573B2 - Photogrammetric analyzer - Google Patents

Description

Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photogrammetric analyzer for measuring coordinates of measurement points in aerial photography, and more particularly to an improvement in an observation optical system provided therein.

(Prior Art) As an example of a conventional photogrammetric analyzer, Japanese Patent Application Laid-Open
The device disclosed in 85814 is known. This apparatus has, as schematically shown in FIG. 4, one mounting table 501 on which at least two aerial photographs 503 and 504 are mounted. In addition, it has a binocular observation optical system 507 for stereoscopically observing the same measurement points a and a ′ photographed on the photographs 503 and 504, respectively.

The optical system 507 includes, for example, a fixed optical system 5 on the left eye side.
40 and a moving optical system 550 on the right eye side. The fixed optical system 540 consists of an eyepiece lens system 541 and an inclined half mirror.
542 and a first female mark projection system 543 having a first female mark or a first target 544, and a lens system 541.
Is perpendicular to the mounting table 501 by the half mirror 542 and coincides with the optical axis of the first female mark projection system 543. The moving optical system 550 is an eyepiece lens system 551.
, A fixed mirror 559, a movable mirror 558, an inclined half mirror 542, and a second female mark projection system 552 having a second female mark or a second target 553. The measurement line 509 is perpendicular to the mounting table 501 by the half mirror 542 and coincides with the optical axis of the second female mark projection system 552. The second female mark projection system 552 and the movable mirror 558 are fixed to a movable flange 554,
By rotating the knob 555, the feed screw 556 is moved integrally left and right, and the distance between the measurement lines 508 and 509, that is, the parallax P changes. The parallax P is measured by the encoder 557.

At the time of measurement, the image is projected on the photograph 503 on the base line g parallel to the x-axis of the xy coordinate system assumed on the photograph placed on the placing table 501 and at the position where the measurement line 508 intersects. The measurement point a is set. The measurement point a 'taken in the other photograph 504 is usually located on the base line g. The measurement points a and a 'and the first and second female marks 544 and 553 are simultaneously stereoscopically observed by the binocular observation optical system 507, and the knob 555 is rotated so that the first and second female marks 544 and 553 are coincident. The parallax P at that time is measured.

The coordinates (x, y) of the measurement point a measure the amount of movement of the mounting table 501. The coordinates (x ', y') of the measurement point a 'are obtained from the coordinates of the measurement point a and the parallax P as x' = x + P, y '= y. Desired.

(Problems to be Solved by the Invention) In the above-mentioned conventional photogrammetric analysis device, when it is desired to confirm the position on the aerial photograph where the observation point observed through the observation optical system is located, Due to the high observation magnification of the observation optical system and the narrow field of view, it is necessary to release the eyes from the observation optical system and see the photograph with the naked eye.In this case, the measurement points that had been observed through the observation optical system until then There was a drawback that it was difficult to determine which position was above.

In addition, when the coordinate measurement of the current measurement point is completed and the photograph is moved for observation of the next measurement point, when the position between the current measurement point and the next measurement point is significantly different, the observer is once required. The eye is removed from the observation optical system, the photograph is directly observed with the naked eye, and the next measurement point is roughly aligned below the measurement line. However, since the measurement line is the optical axis of the observation optical system and cannot be recognized by the naked eye, there is a drawback that the alignment is difficult in general.

An object of the present invention is to eliminate such conventional disadvantages.

(Means for Solving the Problems) A first configuration of the present invention for solving the above problems is a binocular observation for stereoscopically observing at least two observed stereo photographs mounted on a mounting table. In a photogrammetric analysis device that has optical means and measures the coordinates of the measurement points of the stereo photograph from the movement amount of the placing table, at least one observation optical system of the binocular observation optical means,
This is a photogrammetric analysis device provided with index projection means for projecting the index light for indicating the observation position on the stereo photograph.

According to a second configuration of the present invention for solving the above-mentioned problems, in the first configuration, the observation optical system includes: a collimator unit configured to convert a light beam from the measurement point into a parallel light beam; Imaging optical means for forming an image as an intermediate image; the index projecting means includes an index disposed on the optical axis thereof, and index collimator means for converting a light flux from the index into a parallel light flux. A reflecting member disposed between the collimator means and the imaging photon means of the observation optical system, the reflecting member reflecting at least a part of the light beam from the index, and the reflection optical axis of the reflection member is adjusted to the observation optical system. Is an analysis device for photogrammetry which coincides with the optical axis of the collimator means.

According to a third configuration of the present invention for solving the above-described problem, an observation state detection unit that detects whether an observer is in a state of observing a measurement point, and the observation state detection unit detects “no”. The photogrammetric analysis apparatus having the first or second configuration, further comprising a control unit for automatically setting the index projection unit to an operating state when the operation is performed.

According to a fourth configuration of the present invention for solving the above-mentioned problems, in the second configuration, the index emits a light beam in a specific wavelength range, and the reflecting member reflects only the light beam in the specific wavelength range. This is a photogrammetric analysis device configured with a wavelength selective reflection member that transmits light beams in other wavelength ranges.

(Operation) According to the first configuration of the present invention, when it is desired to check the position on the stereo photograph where the observation point magnified and observed through the observation optical system is located, the index projection unit detects the position near the measurement point. Since the index is projected on the image, even if the photograph is viewed with the naked eye, the position of the measurement point that has been observed can be easily determined. Also, when the coordinate measurement of the current measurement point is completed and the next measurement point is roughly aligned below the measurement line while directly observing the photograph with the naked eye, the index from the index projection unit is displayed on the stereo photograph near the measurement line. Since the light is projected, the above-described alignment can be performed very easily.

According to the second configuration, when a photograph is viewed with the naked eye, the index light from the index projection unit is projected onto the measurement point that has been observed through the observation optical system. It is easy and accurate to determine the measurement point position. Also, for the next observation of the measurement point,
When the eye is removed from the observation optical system and the next measurement point is roughly aligned below the survey line with the naked eye, since the index light from the index projection unit is projected on the aerial photograph coincident with the measurement line, the approximate position The alignment can be performed very easily and accurately.

Further, according to the third configuration, the index light from the index projection unit is projected onto the aerial photograph only when the user separates his / her eyes from the observation optical system. Has the advantage of not having.

Further, according to the fourth configuration, even if the index light is constantly projected on the aerial photograph, the index light reflected from the photograph is reflected again on the index side by the wavelength selective reflection member, and that of the observation optical system. Since it does not enter the subsequent optical system, it has the advantage that it is not affected by the projection index light at the time of observation at the measurement point.

(Example) First Example FIG. 1 is an optical layout diagram showing a first example of a photogrammetric analyzer of the present invention.

An aerial photograph 2 constituting a stereo photograph is mounted on a mounting table T that can move in a plane and can measure the amount of movement as a coordinate value, similarly to a conventional photogrammetric analyzer.

The optical system shown in FIG. 1 shows the fixed optical system 1 on the left eye side of the binocular observation optical system. The fixed optical system 1 includes a mirror 11 that reflects a light beam L (shown by a broken line) from a reference point a of the aerial photograph 2 that coincides with the optical axis O ₁ (measuring line N), and a mirror 11.
A collimator lens 12 having a focal point at a reference point a for converting a reflected light beam from the light beam into a parallel light beam L, light beam deflecting mirrors 13, 14, 15, and a parallel light beam L reflected by the mirror 15 are
A fixed observation optical system 10 including an imaging lens 16 for forming an intermediate image Q of the reference point a via a reflecting prism 17 and an eyepiece 18 for observing the intermediate image Q; ing.

The fixed observation optical system 10 also has a female mark projection system 30. The female mark projection system 30 includes a light source 31, a female mark plate 32 having a female mark S, a mirror 33 and a half mirror 34 for reflecting a light beam from the female mark S. The reflected optical axis O ₃ of the half mirror 34 and the optical axis O ₁ (measurement line N) of the observation optical system 10 match. Further, the distance e from the half mirror 34 to the reference point a and the half mirror 34
The distance h from the mirror 33 to the female mark S via the mirror 33 is equal. With this configuration, the light beam from the female mark S is reflected by the half mirror 34, then superimposed on the light beam L from the reference point a, propagates through the observation optical system 10, and forms an imaging lens.
At 16, an image is formed as an intermediate image S ′ of the female mark S at the position of the intermediate image Q at the reference point a.

Thereby, the observer OB can observe the reference point a and the female mark S via the eyepiece 18 at the same time.

The fixed observation optical system 10 further has an index projection optical system 20. The index projection optical system 20 is a light source composed of a self-heating bulb.
21, an index plate 22 having an index M having a circular aperture, a collimator lens 23 for converting a light flux m (indicated by a solid line) from the index M into a parallel light flux, and a collimator lens 12 for converting the light flux m from the collimator lens 23 to a collimator lens 12 Half mirror that reflects toward
24. The optical axis O ₂ of the half mirror 24 is coincident with the optical axis O ₁ of the observation optical system 10.

With this configuration, the light beam m from the index M is reflected by the half mirror 24 and then collected by the collimator lens 12,
The light is reflected by the mirror 11 and transmitted through the half mirror 34 to form an image on the reference point a of the aerial photograph 2 as a projection index M '.

When the light source 21 for illuminating the index M is constantly turned on, the projection index M 'is always projected on the reference point a, and the image of the projection index M' is observed by the observation optical system 10 to observe the reference point a and the female mark S. In this embodiment, in order to avoid obstruction of the observation point, an observation state detection device 50 for detecting whether or not the observer is observing the measurement point, as shown in FIG. A control circuit 40 for controlling the projection of M is provided.
The control circuit 40 is composed of a thyristor, and includes a light source 21 and a DC power supply.
The gate terminal is connected to a light receiving element 51 of an observation state detection device 50 described later.

The observation state detection device 50 uses a spring when the forehead of the observer OB touches.
A forehead 53 that is moved against the resilience of 52, a light-shielding plate 54 provided at the tip of the forehead 53, and a light-emitting element for detecting the movement of the light-shielding plate 54 accompanying the movement of the forehead 53. 55 and a photo interrupter including a light receiving element 51.

With this configuration, when the observer is observing and magnifying the eyepiece 18 to observe the measurement point a, the observer OB
Because the forehead touches and moves the forehead rest 53, the light flux from the light emitting element 55 of the photo interrupter is blocked by the light shielding plate 54, the light receiving element 51 stops outputting the light receiving signal, and the thyristor 40 is turned off. Therefore, the light source 21 is turned off and the index M is not projected.

Conversely, when it is desired to confirm the position of the measurement point a which has been enlarged and observed, or when the coordinate measurement of the current measurement point is completed and the next measurement point is located below the measurement line N for observation of the next measurement point. When roughly aligning, when the user moves his / her eye away from the eyepiece 18 to observe the photograph 2 with the naked eye, the observer's OB moves away from the forehead rest 53 accordingly. As a result, as the forehead rest 53 returns to the initial position by the elastic force of the spring 52, the light shielding plate 54 moves. Then, the shielding of the light beam from the light emitting element 55 by the light shielding plate 54 is released, the light receiving element 51 outputs the light receiving signal, and the thyristor 40 is turned on, so that the light source 21 is turned on and the index M is projected. .

Thereby, the observer OB can confirm the position of the measurement point a by the projection index M ', and if the photograph is moved so that the projection index M' comes to the next measurement point position, the measurement line N can be accurately positioned in the next time. It can be adjusted to the measurement point position.

Second Embodiment In the first embodiment, between the light source 21 and the index plate 22,
A band-pass filter 61 (shown by a broken line in FIG. 1) that transmits only a specific wavelength range, for example, only red light, is arranged, and the half mirror 24 is a dichroic mirror that reflects red light and transmits other wavelength ranges. It is composed. Therefore, even if the light source 21 which is red light is always turned on, the projection index M ′ that is reflected in the photograph 2 and enters the observation optical system 10.
Reflected light from the light source is again emitted by the dichroic mirror 24
The light is reflected to the 21 side and is not transmitted to the eyepiece 18 side. For this reason, when observing through the eyepiece 18, the image of the projection index M ′ does not hinder the observation of the measurement point a. By observing, the projection index M 'can be confirmed. Further, in this configuration of the present embodiment, the control circuit 40 and the observation state detecting device 50 of the first embodiment can be omitted.

Third Embodiment FIG. 2 shows a third embodiment of the present invention.
Only parts different from the first embodiment in configuration are shown.

That is, in this embodiment, a light-emitting diode 210 that is constantly lit is used instead of the light source 21 of the first embodiment. Further, instead of the half mirror 24 of the first embodiment, a total reflection flip-up mirror 240 is used. The mirror 240 is moved by the rotating device 71 composed of, for example, a rotary solenoid, as indicated by the arrow 24.
It is turned in the direction of 1. The light receiving element 51 is connected to the rotation device 71, and the mirror 240 is flipped up to a position 240 'indicated by a two-dot chain line by an ON output signal (at the time of visual observation) from the light receiving element 51, and the output from the light receiving element 51 is output. When the signal is OFF (at the time of magnification observation by the observation optical system), the mirror 240 is returned to the initial position indicated by the solid line.

With the above configuration, the same observation as in the above-described embodiment can be performed in this embodiment.

Fourth Embodiment FIGS. 3A and 3B show a fourth embodiment of the present invention, and show only those parts which are different in configuration from the first embodiment.

That is, in the present embodiment, the female mark projection system 30 and the index projection optical system are shared. Female mark projection system 30
The light source 31 is connected to a first secondary coil 302 having a small number of windings and a second secondary coil 303 having a large number of windings of an AC power supply 301 via a dual-contact relay 304. I have. Relay 3
04 is a normally closed contact 305 on the secondary coil 303 side and the secondary coil 30
And two normally open contacts 306.

The observation state detection device 50 of the present embodiment is a light detection type, and a light emitting element 352 and a collimator lens 309 are provided on one side of the forehead pad 53, and a condenser lens 308 and a light receiving element 351 are provided on the other side. I have. The light receiving element 351 is connected to the gate terminal of the first thyristor 310 of the optical unit moving device 340 described later, and the relay 304 and the optical unit moving device 340 via the NOT circuit 307.
And the gate terminal of the second thyristor 311. In the optical unit 320, a projection lens 322 disposed between the mirror 11 (see FIG. 1) and the half mirror 34, and a mirror 321 disposed between the female mark plate 32 and the mirror 33 are integrated by a lens barrel 323. It is configured so that it can be inserted into and removed from the optical path.

The optical unit moving device 340 has a guide 312 as shown in FIG. 3B, and the optical unit 320 is movable in the direction of arrow 324 along the guide 312. Optical unit 3
20 is provided with an iron rod 331. The optical unit moving device 340 is connected to the DC power supply 335 by the first thyristor 31.
It has a first electromagnetic coil 333 connected via the first thyristor 311 and a second electromagnetic coil 334 connected via the second thyristor 311.

With the above configuration, in the illustrated example, when the observer OB is in a state of observing the measurement point a with the naked eye, the light receiving element 351 is the light emitting element 352 because the forehead of the observer OB is apart from the forehead rest 53.
And outputs a signal. First thyristor 31
0 receives this signal, energizes the first coil 333, sucks the rod 331 by the magnetic force of the first coil 333, and
Into the observation optical path. At the same time, the light receiving element 351
Is output to the NOT circuit 307, and the output of the NOT circuit 307 becomes low, so that the second thyristor 311 does not operate. At this time, since the input to the relay 304 from the NOT circuit 307 is also low, the relay 304 remains in the initial connection state shown in the figure, the light source 31 is energized with a high voltage from the secondary coil 303, and the female mark S Bright light from the optical unit 32
By 0, it is projected on photograph 2 as index S '.

On the contrary, in a state where the observer OB looks at the observation optical system 10 (see FIG. 1) and magnifies and observes the measurement point, the forehead of the observer OB comes into contact with the forehead rest 53, so that the light emitting element 352 Is blocked by the forehead of the observer OB, and the light receiving element 351 is the light emitting element 3
Does not receive light from 52 and does not output signals. For this reason,
The first thyristor 310 does not operate and stops energizing the first coil 333. On the other hand, the output of the NOT circuit 307 becomes High, the second thyristor 311 operates, and the second coil 334 is energized.
By sucking the rod 331 with the magnetic force, the optical unit 320 escapes from the observation optical path. At the same time, NOT
Since the input to the relay 304 from the circuit 307 also becomes High, the relay 304 is activated, the contact 305 is opened, the contact 306 is closed, and the light source 31 is supplied with a low voltage from the secondary coil 302, A light beam having a normal light amount from the female mark S is projected onto the observation optical system 10 via the female mark projection system 30.

In each of the embodiments described above, the index projection optical system 20
Although an example in which only one observation optical system of the observation optical system is arranged is exemplified, the present invention is not limited to this, and the index projection optical system 20 may be arranged in each of both observation optical systems. Good.

Further, the application of the index projection device of the present invention is not limited only to the photogrammetric analysis device shown in the embodiment,
The present invention can also be used for optical measuring machines such as factory microscopes, precision coordinate measuring machines and coordinate projectors for inspecting / measuring circuit patterns of semiconductors such as minute metal parts, ICs and LSIs, and PC boards.

(Effects of the Invention) As described above, according to the first configuration of the present invention, when it is desired to confirm where on the aerial photograph the measurement point that has been enlarged and observed through the observation optical system is, the target projection is performed. Since the index is projected from the means to the vicinity of the measurement point, the position of the measurement point that has been observed up to that point can be easily determined even when the photograph is viewed with the naked eye. Also, the coordinate measurement of this survey point is completed,
Even when directly observing the photograph with the naked eye, when the next measurement point is roughly aligned below the survey line, since the index light from the index projection unit is projected on the aerial photograph near the survey line, the above-described approximate alignment is performed. It can be done very easily.

Further, according to the second configuration of the present invention, since the index light from the index projecting means is projected on the measurement point, it is visually determined through the observation optical system where the observation has been made. This makes it easy to know which measuring point was being observed. Also, when the next measurement point is positioned below the survey line with the naked eye, the index light from the index projection unit is projected on the aerial photograph that matches the measurement line,
The positioning can be performed very easily and accurately.

Furthermore, according to the third configuration of the present invention, the index light from the index projection unit is projected onto the aerial photograph only when the eye is separated from the observation optical system. Has the advantage of not receiving.

According to the fourth configuration of the present invention, even if the index light is constantly projected on the aerial photograph, the index light reflected from the photograph is reflected again on the index side by the wavelength selective reflection member, and the observation optical system Since it does not enter the optical system thereafter, there is an advantage that it is not affected by the projection index light at the time of observation at the measurement point.

[Brief description of the drawings]

FIG. 1 is an optical arrangement diagram showing one observation optical system of a binocular observation optical system for explaining first and second embodiments of a photogrammetric analysis device according to the present invention. FIG. FIG. 3A is an essential part optical layout diagram for explaining a third embodiment of the photogrammetric analysis device according to the present invention. FIG. 3A is a diagram for explaining the fourth embodiment of the photogrammetric analyzer according to the present invention. FIG. 3B is an optical layout diagram showing one observation optical system of the binocular observation optical system, FIG. 3B is a plan view schematically showing a moving device section of the index projection optical system of the fourth embodiment, FIG. It is a perspective view showing typically composition of a photogrammetry analysis device. T: mounting table, M: index, m: index beam, 2: aerial photography, 10: observation optical system, 12: collimator lens, 16: imaging lens, 20: index projection optical System, 24: Half mirror, 40: Thyristor, 50: Observation state detection device.

Claims (4)

(57) [Claims] At least two components mounted on a mounting table are provided.
A binocular observation optical system for stereoscopically observing one stereo photograph, a photogrammetry analysis device for measuring coordinates of measurement points of the stereo photograph from a movement amount of the placing table, wherein the binocular observation optical means An analysis apparatus for photogrammetry, wherein at least one of the observation optical systems is provided with index projection means for projecting an index light for indicating an observation position on the stereo photograph. 2. The observation optical system comprises: a collimator means for converting a light beam from the measurement into a parallel light beam; and an image forming optical means for forming the parallel light beam as an intermediate image. The projection means includes an index arranged on the optical axis,
Index collimator means for converting the light flux from the index into a parallel light flux, and a reflecting member disposed between the collimator means and the imaging optical means of the observation optical system and reflecting at least a part of the light flux from the index, The analysis device for photogrammetry according to claim 1, wherein the reflection optical axis of the reflection member coincides with the optical axis of the collimator means of the observation optical system. 3. An observation state detecting means for detecting whether or not an observer is in a state of observing a measurement point, and automatically displaying the index projecting means when the observation state detecting means detects "No". The analysis device for photogrammetry according to claim 1 or 2, further comprising control means for setting an operation state. 4. The indicator emits a light beam in a specific wavelength range,
The photometric analysis apparatus according to claim (2), wherein the reflection member is configured by a wavelength selective reflection member that reflects only the light beam in the specific wavelength region and transmits light beams in other wavelength regions. .