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JP2964597B2 - Correction method of fluctuation of irradiation current in surface analysis - Google Patents
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JP2964597B2 - Correction method of fluctuation of irradiation current in surface analysis - Google Patents

Correction method of fluctuation of irradiation current in surface analysis

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Publication number
JP2964597B2
JP2964597B2 JP2253060A JP25306090A JP2964597B2 JP 2964597 B2 JP2964597 B2 JP 2964597B2 JP 2253060 A JP2253060 A JP 2253060A JP 25306090 A JP25306090 A JP 25306090A JP 2964597 B2 JP2964597 B2 JP 2964597B2
Authority
JP
Japan
Prior art keywords
measurement
analysis
measured value
mapping
sample surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2253060A
Other languages
Japanese (ja)
Other versions
JPH04130257A (en
Inventor
由佳 中川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimazu Seisakusho KK
Original Assignee
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimazu Seisakusho KK filed Critical Shimazu Seisakusho KK
Priority to JP2253060A priority Critical patent/JP2964597B2/en
Publication of JPH04130257A publication Critical patent/JPH04130257A/en
Application granted granted Critical
Publication of JP2964597B2 publication Critical patent/JP2964597B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【産業上の利用分野】 本発明は、試料に電子線を照射し、試料から放射され
るX線を分光して、試料面の元素の濃度分布を求めるマ
ッピング測定における照射電流の時間的な変動に対する
補正方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of irradiating a sample with an electron beam, spectrally analyzing X-rays radiated from the sample, and changing the irradiation current with time in mapping measurement for obtaining the concentration distribution of elements on the sample surface. And a correction method for

【従来の技術】[Prior art]

電子線マイクロアナライザ(EPMA)において、マッピ
ング測定を行うには、長時間を要するので、マッピング
中に照射電流に変動が発生することがあるが、従来、そ
の変動をモニターし、フィードバックする機構はなかっ
た。そのために一定時間照射電流が変動しないことを確
認してから、測定を開始しているのが現状である。しか
し、そのようなチェックを行ったとしても、マッピング
中に照射電流が変動しないと云う保証はなく、測定結果
の信頼性が乏しいと云う問題があった。
In the electron beam microanalyzer (EPMA), it takes a long time to perform mapping measurement, so that the irradiation current may fluctuate during mapping, but there is no mechanism to monitor the fluctuation and provide feedback. Was. For this reason, at present, the measurement is started after confirming that the irradiation current does not fluctuate for a certain period of time. However, even if such a check is performed, there is no guarantee that the irradiation current does not fluctuate during mapping, and there has been a problem that the reliability of the measurement result is poor.

【発明が解決しようとする課題】 本発明は、マッピング中の照射電流の変動をチェック
し、その変動を補正し、測定精度を高めることを目的と
する。
SUMMARY OF THE INVENTION It is an object of the present invention to check a change in irradiation current during mapping, correct the change, and improve measurement accuracy.

【課題を解決するための手段】[Means for Solving the Problems]

マッピングにおける照射電流の変動補正方法として、
試料面分析前に試料面の少なくとも2ケ所の分析点にお
いて分析元素の特性X線強度を初期測定し、その測定値
を記憶装置に記憶し、次いで試料面のマッピング測定を
行い、その測定値を記憶装置に記憶し、初期測定におけ
る分析元素の特性X線強度と、上記初期測定の分析点と
同一地点のマッピング測定における分析元素の特性X線
強度を上記記憶装置から読み出し、両者の差から内挿的
補正関数を求め、同補正関数によりマッピング測定の測
定値を補正するようにした。
As a method of correcting the fluctuation of the irradiation current in mapping,
Before analyzing the sample surface, the characteristic X-ray intensity of the analysis element is initially measured at at least two analysis points on the sample surface, the measured value is stored in a storage device, and then the mapping measurement of the sample surface is performed. The characteristic X-ray intensity of the analysis element in the initial measurement and the characteristic X-ray intensity of the analysis element in the mapping measurement at the same point as the analysis point in the initial measurement are read out from the storage device. An extrapolation correction function was obtained, and the measured value of the mapping measurement was corrected using the correction function.

【作 用】[Operation]

本発明は、分析領域内の複数点において、分析元素の
特性X線強度を予め初期測定しておき、マッピング測定
時に得られたその地点の測定結果と、基準測定で得られ
た測定結果とによって、補正関数を求め、同補正関数に
よりマッピング測定値を補正することで、マッピング中
の照射電流の変動補正を行おうとするものである。 初期測定は、数点で行うのみであるから、時間を余り
要せず、その間の照射電流は一定とみなせる。また、通
常、照射電流の変動は、マッピングに要する時間の範囲
内では、なだらかなものとみなせるので、初期測定と同
じ地点の初期測定値とマッピング時の測定値の比を内挿
式で滑らか接続したものは、測定値の経時的変化を示す
ものとなる。従って、これを用いれば、照射電流の変動
の影響が補正できる。
In the present invention, at a plurality of points in the analysis area, the characteristic X-ray intensity of the analysis element is initially measured in advance, and the measurement result at that point obtained at the time of mapping measurement and the measurement result obtained at the reference measurement are used. , A correction function, and the mapping measurement value is corrected by the correction function to correct the variation of the irradiation current during the mapping. Since the initial measurement is performed only at several points, it does not take much time, and the irradiation current during that time can be regarded as constant. In general, the fluctuation of the irradiation current can be considered to be smooth within the time required for mapping, so the ratio of the initial measurement value at the same point as the initial measurement and the measurement value at the time of mapping is smoothly connected by interpolation. The result indicates a change over time in the measured value. Therefore, by using this, it is possible to correct the influence of the fluctuation of the irradiation current.

【実施例】【Example】

第1図に本発明の一実施例のフローチャートを示す。
第1図において、試料をステージに、試料面が水平に位
置するようにセットし、まず最初に、マッピング測定を
する分析領域及び分析元素を指定する(ア)。分析元素
について、少なくとも2ケ所(Xa,Xb)で特性X線強度
を初期測定し、測定値Ic(Xi)を記憶装置に記憶してお
く(イ)。例えば、初期測定の分析点は、第3図に示す
ように、方形の分析点で、開始点近くAと、終点近くB
に設定する。分析領域のマッピング測定を行い、測定値
Im(Xi)[但し、i=a或はb]を記憶装置に記憶する
(ウ)。マッピング測定において得られた測定値から、
初期測定で測定した同一分析地点でのX線強度Im(Xi)
と、初期測定の測定値Ic(Xi)を呼びだし、演算装置で
補正関数Y(Xi)を作成する(エ)。例えば、補正関数
を、第2図に示すような、1次関数で表すとすれば、次
式(1)のように設定できる。 但し、Xiは分析ポイント(測定順)、補正関数Y(X
i)は、点iにおける初期測定における照射電流によっ
て得られるであろう測定値と測定値Im(Xi)との比を表
すものであり、測定値にこの値を掛けることで、初期測
定における照射電流によって得られるであろう測定値
(補正値)が求められる値である。従って、Y(Xa)は
a点における初期測定値Ic(Xa)とマッピング時の測定
値Im(Xa)との比Ic(Xa)/Im(Xa)を示し、Y(Xb)
は、Ic(Xb)/Im(Xb)を示している。補正関数は、経
時的になだらかに変化するから、簡易的に直線的に変化
するものと考え、補正関数Y(Xi)を、点a,bにおける
補正関数の座標[Xa,Y(Xa)]と[Xb,Y(Xb)]を結ん
だ直線式として、次式(1)のように表すことができ
る。 Y(Xi) =[(Y(Xb)−Y(Xa))/(Xb−Xa)] ×(Xi−Xa)+Y(Xa) ……(1) 演算装置において、分析ポイントXiにおける測定値Im
(Xi)に上記補正関数Y(Xi)を、次式(2)のよう
に、 I′(Xi)=Im(Xi)×Y(Xi) ……(2) 掛けることにより、基準測定時の照射電流に対応する測
定値I′(Xi)に補正する(オ)。補正値I′(Xi)を
用いて、マッピング表示を行う(カ)。 上記実施例では、補正関数として、2点測定による一
次式を用いているが、2点測定ではなく、基準測定にお
いて、多数の分析点を測定すれば、多次式の補正関数に
よりより正確な補正を行うことができる。
FIG. 1 shows a flowchart of one embodiment of the present invention.
In FIG. 1, a sample is set on a stage so that the sample surface is positioned horizontally, and first, an analysis region and an analysis element to be subjected to mapping measurement are designated (A). Initially, the characteristic X-ray intensity is measured at least at two locations (Xa, Xb) for the analysis element, and the measured value Ic (Xi) is stored in a storage device (a). For example, as shown in FIG. 3, the analysis points of the initial measurement are square analysis points, and A near the start point and B near the end point.
Set to. Perform mapping measurement of the analysis area, and
Im (Xi) [where i = a or b] is stored in the storage device (c). From the measurement values obtained in the mapping measurement,
X-ray intensity Im (Xi) at the same analysis point measured in the initial measurement
Then, the measurement value Ic (Xi) of the initial measurement is called out, and a correction function Y (Xi) is created by the arithmetic unit (D). For example, if the correction function is represented by a linear function as shown in FIG. 2, it can be set as in the following equation (1). Where Xi is the analysis point (in the order of measurement), and the correction function Y (X
i) represents the ratio between the measured value that would be obtained by the irradiation current in the initial measurement at the point i and the measured value Im (Xi), and by multiplying the measured value by this value, the irradiation in the initial measurement is performed. The measured value (correction value) that will be obtained by the current is a value obtained. Therefore, Y (Xa) indicates the ratio Ic (Xa) / Im (Xa) between the initial measured value Ic (Xa) at the point a and the measured value Im (Xa) at the time of mapping, and Y (Xb)
Indicates Ic (Xb) / Im (Xb). Since the correction function changes gradually with time, it is considered that the correction function changes linearly in a simple manner, and the correction function Y (Xi) is changed to the coordinates [Xa, Y (Xa)] of the correction function at points a and b. And [Xb, Y (Xb)] can be expressed as the following equation (1). Y (Xi) = [(Y (Xb) −Y (Xa)) / (Xb−Xa)] × (Xi−Xa) + Y (Xa) (1) In the arithmetic unit, the measured value Im at the analysis point Xi
By multiplying (Xi) by the above correction function Y (Xi) as in the following equation (2), I ′ (Xi) = Im (Xi) × Y (Xi) (2) The measured value is corrected to the measured value I '(Xi) corresponding to the irradiation current (e). Mapping display is performed using the correction value I '(Xi) (f). In the above embodiment, a linear equation based on two-point measurement is used as the correction function. However, if a large number of analysis points are measured in the reference measurement instead of the two-point measurement, a more accurate correction function using a multi-dimensional equation can be used. Corrections can be made.

【効 果】[Effect]

本発明によれば、照射電流の変動によるマッピング測
定値の補正を行うことができるようになり、測定精度が
一段と向上した。
ADVANTAGE OF THE INVENTION According to this invention, it became possible to correct | amend the mapping measurement value by the fluctuation | variation of an irradiation current, and the measurement accuracy improved further.

【図面の簡単な説明】[Brief description of the drawings]

第1図は本発明の一実施例のフローチャート、第2図は
補正関数図、第3図は分析点の説明図である。
FIG. 1 is a flowchart of one embodiment of the present invention, FIG. 2 is a correction function diagram, and FIG. 3 is an explanatory diagram of analysis points.

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】試料面に電子線を照射し、試料から放射さ
れるX線を分光して試料面の元素の濃度分布を求めるマ
ッピング測定において、試料面分析前に試料面の少なく
とも2ケ所の分析点において分析元素の特性X線強度を
初期測定し、その測定値を記憶装置に記憶し、次いで試
料面のマッピング測定を行い、その測定値を記憶装置に
記憶し、初期測定における分析元素の特性X線強度と、
上記初期測定の分析点と同一地点のマッピング測定にお
ける分析元素の特性X線強度を上記記憶装置から読み出
し、両者の差から内挿的補正関数を求め、同補正関数に
よりマッピング測定の測定値を補正するようにしたこと
を特徴とする面分析における照射電流の変動補正法。
In a mapping measurement for irradiating a sample surface with an electron beam and dispersing X-rays emitted from the sample to obtain a concentration distribution of elements on the sample surface, at least two points on the sample surface are analyzed before the sample surface analysis. Initially measure the characteristic X-ray intensity of the analyzed element at the analysis point, store the measured value in the storage device, then perform mapping measurement of the sample surface, store the measured value in the storage device, and store the measured value in the initial measurement. Characteristic X-ray intensity,
The characteristic X-ray intensity of the analysis element in the mapping measurement at the same point as the analysis point of the initial measurement is read from the storage device, an interpolative correction function is obtained from the difference between the two, and the measured value of the mapping measurement is corrected by the correction function. A method for correcting a variation in irradiation current in a plane analysis, characterized in that:
JP2253060A 1990-09-21 1990-09-21 Correction method of fluctuation of irradiation current in surface analysis Expired - Lifetime JP2964597B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2253060A JP2964597B2 (en) 1990-09-21 1990-09-21 Correction method of fluctuation of irradiation current in surface analysis

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2253060A JP2964597B2 (en) 1990-09-21 1990-09-21 Correction method of fluctuation of irradiation current in surface analysis

Publications (2)

Publication Number Publication Date
JPH04130257A JPH04130257A (en) 1992-05-01
JP2964597B2 true JP2964597B2 (en) 1999-10-18

Family

ID=17245933

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2253060A Expired - Lifetime JP2964597B2 (en) 1990-09-21 1990-09-21 Correction method of fluctuation of irradiation current in surface analysis

Country Status (1)

Country Link
JP (1) JP2964597B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4822826B2 (en) * 2005-12-06 2011-11-24 日本電子株式会社 Particle analysis method and apparatus

Also Published As

Publication number Publication date
JPH04130257A (en) 1992-05-01

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