JP2964722B2 - Manufacturing method of floating type thin film magnetic head - Google Patents
Manufacturing method of floating type thin film magnetic headInfo
- Publication number
- JP2964722B2 JP2964722B2 JP23140591A JP23140591A JP2964722B2 JP 2964722 B2 JP2964722 B2 JP 2964722B2 JP 23140591 A JP23140591 A JP 23140591A JP 23140591 A JP23140591 A JP 23140591A JP 2964722 B2 JP2964722 B2 JP 2964722B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- cutting
- row
- film surface
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Magnetic Heads (AREA)
- Adjustment Of The Magnetic Head Position Track Following On Tapes (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は磁気記録再生装置に用い
られる浮上型薄膜磁気ヘッドの製造方法に関するもので
ある。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a flying type thin film magnetic head used in a magnetic recording / reproducing apparatus.
【0002】[0002]
【従来の技術】近年、情報機器の普及に伴い薄膜磁気ヘ
ッドが各種開発され、その製造方法も種々改良されてい
る。2. Description of the Related Art In recent years, various types of thin film magnetic heads have been developed with the spread of information equipment, and their manufacturing methods have been variously improved.
【0003】以下に従来の浮上型薄膜磁気ヘッドの製造
方法について説明する。図6は一般的な薄膜磁気ヘッド
の斜視図である。A method of manufacturing a conventional floating type thin film magnetic head will be described below. FIG. 6 is a perspective view of a general thin film magnetic head.
【0004】図6において、1はAl2O3−TiC系セ
ラミック材料により加工されたスライダー本体、2はス
ライダー本体1の一面にスパッタ法により形成された薄
膜面、3は精密に研削、研磨加工された浮上面、4は浮
上面3の端部を浮上面3に対して傾斜角略1度の勾配で
形成されたリーディングテーパー、5は以上の構成要素
からなる浮上型薄膜磁気ヘッドである。In FIG. 6, reference numeral 1 denotes a slider body processed by an Al 2 O 3 —TiC ceramic material, 2 denotes a thin film surface formed on one surface of the slider body 1 by sputtering, and 3 denotes precision grinding and polishing. The flying surface 4 is a leading taper formed by forming an end of the flying surface 3 at an inclination angle of about 1 degree with respect to the flying surface 3, and 5 is a floating type thin film magnetic head composed of the above components.
【0005】以上のように構成された浮上型薄膜磁気ヘ
ッドについて、以下その製造方法を図7乃至図9に基づ
いて説明する。A method of manufacturing the floating type thin film magnetic head configured as described above will be described below with reference to FIGS.
【0006】図7は一般的な基板ブロックからのスライ
ダー本体研削工程図である。工程(a)で鏡面研磨され
たAl2O3−TiC系等のセラミックスからなるウェハ
ー基板上に、スパッタ法や電着法等で薄膜及びパターン
形状を形成した円形の基板を、整列したヘッド素子に沿
って四角形のブロック6に研削加工する。FIG. 7 is a process diagram of grinding a slider body from a general substrate block. A head element in which a circular substrate having a thin film and a pattern formed by a sputtering method, an electrodeposition method, or the like is arranged on a wafer substrate made of an Al 2 O 3 —TiC-based ceramic or the like mirror-polished in the step (a). Is ground to form a square block 6.
【0007】次に工程(b)で加工効率を向上する目的
で、多数個のヘッド素子を一括して加工できるようにヘ
ッド素子に沿って精密に列切断し、さらに精度を上げる
ために研削を行い列状加工物7を作製する。その後、工
程(c)で浮上面3を研削により加工し研摩を行って面
精度を向上させ、工程(d)で同様に研摩によってリー
ディングテーパー4を作製する。最後に工程(e)で列
状加工物7を精密に切断し、スライダー本体1を完成さ
せている。Next, in the step (b), for the purpose of improving the processing efficiency, row cutting is performed precisely along the head elements so that a large number of head elements can be processed collectively, and grinding is performed to further increase the precision. Then, a row-shaped workpiece 7 is manufactured. Then, in the step (c), the flying surface 3 is processed by grinding and polished to improve the surface accuracy, and in the step (d), the leading taper 4 is similarly produced by the polishing. Finally, in step (e), the row-shaped workpieces 7 are precisely cut to complete the slider body 1.
【0008】ここで、列状加工物7の加工方法について
説明する。図8は従来の列状加工物のみを切断加工する
切削工程図で、(a)は列状加工物の斜視図であり、
(b)はその切断後の斜視図である。図9は切断時の説
明図である。スライダー本体1に切断する時は薄膜面2
は外部に露出した状態にあるため、切断砥石8の回転に
より薄膜面2は砥石8の接触時あるいは切断時の損傷に
よる影響で切断面にクラック等が発生し易いので、薄膜
面2をキズ付けないように細心の注意を払いながら切断
がなされるとともに砥石8の砥粒や切り屑等により薄膜
面2にキズをつけないように防塵等に細心の注意を要
し、生産性が低く、かつ歩留りも低いものであった。Here, a method of processing the row-shaped workpiece 7 will be described. FIG. 8 is a cutting process diagram for cutting only a conventional row-shaped workpiece, and (a) is a perspective view of the row-shaped workpiece;
(B) is a perspective view after the cutting. FIG. 9 is an explanatory view at the time of cutting. When cutting into slider body 1, thin film surface 2
Is in a state of being exposed to the outside, the thin film surface 2 is easily damaged by the rotation of the cutting grindstone 8 at the time of contact with the grindstone 8 or at the time of cutting, so that the thin film surface 2 is scratched. Cutting is performed with great care so as not to damage the thin film surface 2 due to the abrasive grains or chips of the grindstone 8, etc. Yield was low.
【0009】これはスライダー本体1を形成する材料で
あるAl2O3−TiC系セラミックのビッカース硬度
(Hv=2000)が、薄膜面2のビッカース硬度(A
l2O3保護膜はHv=400〜800)と比較して極め
て硬い難加工材であるためである。硬度の異なる複合材
料の切断には、切断砥石・砥粒・砥石の回転速度や切断
送り速度の選定が難しく、スライダー本体1の良好な切
断を行うことは可能であるが、欠け易いAl2O3の薄膜
面2の外観を良好に保つのは容易ではないからである。The Vickers hardness (Hv = 2000) of the Al 2 O 3 —TiC-based ceramic, which is the material forming the slider body 1, is the Vickers hardness (A) of the thin film surface 2.
l 2 O 3 protective film is for compared Hv = 400 to 800) to be very hard hard materials. When cutting composite materials having different hardnesses, it is difficult to select the rotation speed and cutting feed speed of the cutting grindstone, abrasive grains, and the grindstone, and it is possible to perform good cutting of the slider body 1, but Al 2 O, which is liable to chip. This is because it is not easy to keep the appearance of the thin film surface 2 of 3 good.
【0010】図10、図11は図9の切断方法のこれら
の問題を解決するための改良法であって、薄膜面2に当
て材9を配設して切断加工する方法を示す切削工程図
で、図10(a)は当て材を当てた列状加工物の斜視図
であり、(b)はその切断後の斜視図であり、図11は
その切断時の説明図である。この方法は薄膜面2に当て
材9を当接させておき、薄膜面2が露出していることか
ら考えられる上記諸問題を防ぐことを目的としている。
列状加工物7と略同一の寸法にあらかじめ加工した当て
材9を薄膜面2に密着させ次いで、切断砥石8で切断す
るので、薄膜面2が当て材で保護される薄膜面2にキズ
ができるのをある程度防止できる。FIGS. 10 and 11 show an improved method for solving these problems of the cutting method shown in FIG. 9, and a cutting process diagram showing a method of arranging the patch 9 on the thin film surface 2 and performing cutting. 10 (a) is a perspective view of a row-shaped workpiece to which a patch has been applied, FIG. 10 (b) is a perspective view after cutting, and FIG. 11 is an explanatory view at the time of cutting. The purpose of this method is to keep the contact material 9 in contact with the thin film surface 2 so as to prevent the above-mentioned various problems that may be caused by the thin film surface 2 being exposed.
The contact material 9 pre-processed to the same size as the row-shaped workpiece 7 is brought into close contact with the thin film surface 2 and then cut by the cutting whetstone 8, so that the thin film surface 2 where the thin film surface 2 is protected by the contact material is scratched. Can be prevented to some extent.
【0011】[0011]
【発明が解決しようとする課題】しかしながら上記従来
の浮上型薄膜磁気ヘッドの製造方法では、薄膜面2と当
て材9との材質の違い等により切断条件が異なるため、
薄膜面2のキズや欠けを完全に防止することが不可能で
あった。また、当て材9という他の材料がさらに必要な
ためコストが上がり、かつ当て材9をその都度、完全に
密着させて当接させねばならず工数が増え、著しく生産
性を落とすという問題点を有していた。However, in the above-described conventional method of manufacturing a flying type thin film magnetic head, cutting conditions are different due to a difference in material between the thin film surface 2 and the backing material 9, and the like.
It was impossible to completely prevent the thin film surface 2 from being scratched or chipped. Further, there is a problem in that the cost is increased because another material called the patch 9 is further required, and the patch 9 must be brought into complete contact with the patch 9 each time, which increases the number of steps and significantly lowers productivity. Had.
【0012】本発明は上記従来の問題点を解決するもの
で、薄膜面のキズや欠けの発生を防止し、品質の良好な
浮上型薄膜磁気ヘッドを高い生産性でかつ、高歩留りで
量産できる浮上型薄膜磁気ヘッドの製造方法を提供する
ことを目的とする。SUMMARY OF THE INVENTION The present invention solves the above-mentioned conventional problems, and prevents the occurrence of scratches or chipping on the thin film surface and enables mass production of a high quality floating type thin film magnetic head with high productivity and high yield. It is an object of the present invention to provide a method of manufacturing a flying type thin film magnetic head.
【0013】[0013]
【課題を解決するための手段】この目的を達成するため
に本発明の浮上型薄膜磁気ヘッドの製造方法は、スパッ
タ法等により形成された薄膜面を有する基板を切断・研
削・研磨等の機械加工を施してスライダーを形成する浮
上型薄膜磁気ヘッドの製造方法であって、ウェハー基板
から切断されたブロック基板を整列したヘッド素子に沿
って列状加工物に切断する工程と、前記工程で得られた
列状加工物の薄膜面を当接させ、次いで切断・研削・研
磨等の機械加工を施す工程と、を有する構成からなる。In order to achieve this object, a method of manufacturing a floating type thin film magnetic head according to the present invention comprises a machine for cutting, grinding, polishing, etc., a substrate having a thin film surface formed by a sputtering method or the like. What is claimed is: 1. A method for manufacturing a floating type thin-film magnetic head which forms a slider by performing processing, comprising: a step of cutting a block substrate cut from a wafer substrate into a row of workpieces along a head element aligned; A step of bringing the thin film surfaces of the row-shaped workpieces into contact with each other, and then performing mechanical processing such as cutting, grinding, and polishing.
【0014】[0014]
【作用】この構成によって、被加工物の加工時に機械的
物性の同一のもの同士が当接され薄膜面等が拘束される
ことにより、加工砥石の回転等によるキズや欠け等の発
生を著しく軽減し、生産性を高め、かつ歩留りを上げる
ことができる。With this configuration, when processing the workpiece, the same mechanical properties are brought into contact with each other to restrict the thin film surface and the like, thereby significantly reducing the occurrence of scratches and chipping due to the rotation of the processing grindstone and the like. In addition, the productivity and the yield can be increased.
【0015】[0015]
【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。An embodiment of the present invention will be described below with reference to the drawings.
【0016】(実施例1)図1及び図2は本実施例の切
断加工方法を説明する説明図であり、図1はブロック基
板からヘッド素子に沿って列切断された列状加工物の切
断工程図であり、(a)は列状加工物の薄膜面を対面さ
せたときの斜視図、(b)は薄膜面を当接させたときの
斜視図、(c)は列状加工物をスライダー本体の大きさ
に切断したときの斜視図、(d)はスライダー本体の斜
視図であり、図2はその切断時の説明図である。(Embodiment 1) FIGS. 1 and 2 are explanatory views for explaining a cutting method according to the present embodiment. FIG. 1 is a diagram showing cutting of a row-shaped workpiece cut from a block substrate along a head element. It is process drawing, (a) is a perspective view when the thin film surface of the row-shaped workpiece faces each other, (b) is a perspective view when the thin film face is brought into contact, and (c) is a perspective view of the row-shaped workpiece. FIG. 2D is a perspective view of the slider body when cut to the size of the slider body, FIG. 2D is a perspective view of the slider body, and FIG.
【0017】2は薄膜面、7,7′は列状加工物、8は
切断砥石である。列状加工物7と7′の薄膜面2を当接
させ、次いで切断砥石8で二つの列状加工物7,7′を
同時に切削し、一回の切削作業で2個のスライダー本体
1を得ることができた。その薄膜面2を倍率100で顕
微鏡写真を取り観察した。その結果を図3(a)に示
す。2 is a thin film surface, 7 and 7 'are row-shaped workpieces, and 8 is a cutting grindstone. The thin film surfaces 2 of the row-shaped workpieces 7 and 7 'are brought into contact with each other, and then the two row-shaped workpieces 7 and 7' are simultaneously cut by the cutting whetstone 8, and the two slider bodies 1 are cut by one cutting operation. I got it. A microphotograph of the thin film surface 2 was taken at a magnification of 100 and observed. The result is shown in FIG.
【0018】(比較例1,2)比較例1として、従来例
の図8及び図9で示した方法で、列状加工物のみを切断
加工した。その薄膜面2を実施例1と同一の条件で観察
した。その結果を図3(b)に示す。(Comparative Examples 1 and 2) As Comparative Example 1, only row-shaped workpieces were cut by the method shown in FIGS. The thin film surface 2 was observed under the same conditions as in Example 1. The result is shown in FIG.
【0019】比較例2として、従来例の図10、図11
で示した方法で、列状加工物の薄膜面2に当て材9を密
着当接させ切削加工した。その薄膜面2を実施例1と同
一の条件で観察した。その結果を図3(c)に示す。As Comparative Example 2, FIG. 10 and FIG.
The contact material 9 was brought into close contact with the thin film surface 2 of the row-shaped workpiece and cut by the method shown in FIG. The thin film surface 2 was observed under the same conditions as in Example 1. The result is shown in FIG.
【0020】図3からも明らかなように、本実施例によ
れば、薄膜面2の同種材料が密接しているために、この
部分は連続した単一材料と考えることができ、従って薄
膜面2に対して最適な加工条件での加工が可能なことか
ら、キズや欠けのない最も良好な外観を有しているのが
わかる。As is clear from FIG. 3, according to this embodiment, since the same kind of material on the thin film surface 2 is in close contact, this portion can be considered as a continuous single material. Since it is possible to perform processing under optimum processing conditions for No. 2, it can be seen that it has the best appearance without any scratches or chippings.
【0021】これに対し、比較例1はキズや欠けが他の
加工法と比べ最も多く、特に薄膜面2は自由面であった
ために欠けが発生すると、それが伝搬し、欠け深さが3
0μmにまで及びかなりの寸法にまで成長する傾向にあ
ることがわかった。また、比較例2は、キズや欠けの発
生に幾分改善が見られ欠け深さも5μmのものが認めら
れた程度であった。しかし薄膜面2と当て材9は材質が
異なるために複合材料の加工として考えられ、各々の材
料を同時に最適な条件で加工することが難しく、その結
果、種々の小さなキズや欠け等が生じ外観の品質に問題
が残るといえる。On the other hand, in Comparative Example 1, the number of scratches and chips was larger than those of the other processing methods. In particular, when the chip was generated because the thin film surface 2 was a free surface, it propagated and the chip depth became 3.
It has been found that it tends to grow to 0 μm and to considerable dimensions. In Comparative Example 2, the occurrence of scratches and chipping was somewhat improved, and the chipping depth was 5 μm. However, the thin film surface 2 and the backing material 9 are considered as a composite material processing because the materials are different, and it is difficult to simultaneously process each material under optimum conditions, and as a result, various small scratches and chippings occur and the appearance is reduced. It can be said that there remains a problem with the quality of the product.
【0022】(実施例2)列状加工物7の薄膜面2を当
接させた列状加工物群を図4に示すように複数段並設し
て切削加工をしてみたところ実施例1と同様に薄膜面2
の損傷のないスライダー本体1を1回の切削作業で4個
得ることができた。このことから、本実施例によれば高
品質のスライダー本体を高い生産性で製造できることが
わかった。(Embodiment 2) As shown in FIG. 4, a group of row-shaped workpieces in contact with the thin film surface 2 of the row-shaped workpiece 7 were arranged in a plurality of stages as shown in FIG. Thin film surface 2 as in
In this way, four slider bodies 1 with no damage were obtained by one cutting operation. From this, it was found that according to the present embodiment, a slider body of high quality can be manufactured with high productivity.
【0023】(実施例3)次に、図5に示す溝入れ加工
を2個の列状加工物7,7′の薄膜面2を当接させ行っ
たが、薄膜面2をほとんど損傷させないで溝入れを行う
ことができた。(Embodiment 3) Next, the grooving shown in FIG. 5 was performed by bringing the thin film surfaces 2 of the two row-shaped workpieces 7, 7 'into contact with each other, but the thin film surface 2 was hardly damaged. Grooving could be performed.
【0024】[0024]
【発明の効果】以上のように本発明は、浮上型薄膜磁気
ヘッドの製造工程において、2個の被加工物の薄膜面同
志を当接させ多数個を同時に加工することで、薄膜面に
生じるキズや欠け等を減少させるとともに、外観品質が
向上し磁気特性の向上した高品質の浮上型薄膜磁気ヘッ
ドを高い歩留りで、かつ低原価で量産することができる
優れた浮上型薄膜磁気ヘッドの製造方法を実現できるも
のである。As described above, according to the present invention, in the process of manufacturing a floating type thin film magnetic head, a thin film surface is generated by abutting two thin film surfaces of two workpieces and processing a plurality of thin film surfaces simultaneously. Manufacture of excellent floating thin-film magnetic heads that can be mass-produced at high yield and at low cost with high yield and low cost while reducing scratches and chipping, improving appearance quality and improving magnetic characteristics The method can be realized.
【図1】本発明の一実施例における浮上型薄膜磁気ヘッ
ドの製造時におけるブロック基板からヘッド素子に沿っ
て列切断された列状加工物の切断工程図 (a)列状加工物の薄膜面を対面させたときの斜視図 (b)薄膜面を当接させたときの斜視図 (c)列状加工物をスライダー本体の大きさに切断した
ときの斜視図 (d)スライダー本体の斜視図FIG. 1 is a cutting process diagram of a row-shaped workpiece cut along a head element from a block substrate at the time of manufacturing a floating type thin-film magnetic head according to an embodiment of the present invention; (B) Perspective view when the thin film surface is brought into contact (c) Perspective view when the row of workpieces is cut to the size of the slider body (d) Perspective view of the slider body
【図2】本発明の一実施例における列状加工物の切断時
の概略図FIG. 2 is a schematic view of a row of workpieces according to an embodiment of the present invention when cutting.
【図3】(a)本実施例で製造したスライダー本体の薄
膜面の顕微鏡観察図 (b)従来例の列状加工物を直接加工した場合の薄膜面
の顕微鏡観察図 (c)従来例の当て材を用いて加工した場合の薄膜面の
顕微鏡観察図FIG. 3A is a microscopic view of a thin film surface of a slider body manufactured in the present embodiment. FIG. 3B is a microscopic view of a thin film surface obtained by directly processing a conventional row-shaped workpiece. Microscopic view of the thin film surface when processed using the patch
【図4】本発明の第2実施例における切削状態を示す概
略図FIG. 4 is a schematic diagram showing a cutting state according to a second embodiment of the present invention.
【図5】本発明を溝加工に応用した場合のスライダー本
体の斜視図FIG. 5 is a perspective view of a slider body when the present invention is applied to groove processing.
【図6】一般的な浮上型磁気ヘッドの斜視図FIG. 6 is a perspective view of a general floating magnetic head.
【図7】一般的な基板ブロックからのスライダー本体の
切削工程図 (a)ウェハー基板から切削されたブロック基板の斜視
図 (b)列状加工物の斜視図 (c)浮上面を研削形成した列状加工物の斜視図 (d)リーディングテーパーを研削形成した列状加工物
の斜視図 (e)スライダー本体の斜視図FIG. 7 is a process diagram of cutting a slider main body from a general substrate block. (A) A perspective view of a block substrate cut from a wafer substrate. (B) A perspective view of an array of workpieces. (C) A floating surface is formed by grinding. (D) Perspective view of a row-shaped workpiece formed by grinding and forming a leading taper (e) Perspective view of a slider body
【図8】従来の列状加工物のみを切断加工する場合の切
削工程図 (a)列状加工物の斜視図 (b)その切断後の斜視図FIG. 8 is a cutting process diagram in the case of cutting only a conventional row-shaped workpiece, (a) a perspective view of the row-shaped workpiece, and (b) a perspective view after cutting.
【図9】切断時の説明図FIG. 9 is an explanatory view at the time of cutting.
【図10】従来の薄膜面に当て材を配設して切断加工す
る場合の切削工程図 (a)当て材を当てた列状加工物の斜視図 (b)その切断後の斜視図FIG. 10 is a cutting process diagram in a case where a patch is disposed on a thin film surface in the related art and a cutting process is performed. (A) A perspective view of a row of workpieces to which a patch has been applied (b) A perspective view after the cutting
【図11】切断時の説明図FIG. 11 is an explanatory view at the time of cutting.
1,1′ スライダー本体 2 薄膜面 3 浮上面 4 リーディングテーパー 5 浮上型薄膜磁気ヘッド 6 ブロック 7 列状加工物 8 切断砥石 9 当て材 1, 1 'slider body 2 thin film surface 3 air bearing surface 4 leading taper 5 floating type thin film magnetic head 6 block 7 row work 8 cutting whetstone 9 patch
Claims (1)
する基板を切断・研削・研磨等の機械加工を施してスラ
イダーを形成する浮上型薄膜磁気ヘッドの製造方法であ
って、ウェハー基板から切断されたブロック基板を整列
したヘッド素子に沿って列状加工物に切断する工程と、
前記工程で得られた列状加工物の薄膜面を当接させ、次
いで切断・研削・研磨等の機械加工を施す工程と、を有
することを特徴とする浮上型薄膜磁気ヘッドの製造方
法。1. A method of manufacturing a floating type thin film magnetic head for forming a slider by subjecting a substrate having a thin film surface formed by a sputtering method or the like to machining such as cutting, grinding and polishing, wherein the cutting is performed from a wafer substrate. Cutting the block substrate into row-shaped workpieces along the aligned head elements,
Contacting the thin film surfaces of the row-shaped workpieces obtained in the above steps, and then performing mechanical processing such as cutting, grinding, polishing, etc., a method of manufacturing a floating type thin film magnetic head.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23140591A JP2964722B2 (en) | 1991-09-11 | 1991-09-11 | Manufacturing method of floating type thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23140591A JP2964722B2 (en) | 1991-09-11 | 1991-09-11 | Manufacturing method of floating type thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0573848A JPH0573848A (en) | 1993-03-26 |
| JP2964722B2 true JP2964722B2 (en) | 1999-10-18 |
Family
ID=16923091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23140591A Expired - Lifetime JP2964722B2 (en) | 1991-09-11 | 1991-09-11 | Manufacturing method of floating type thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2964722B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4749905B2 (en) * | 2006-03-24 | 2011-08-17 | 新科實業有限公司 | Manufacturing method of slider |
| US9165573B1 (en) * | 2009-11-12 | 2015-10-20 | Western Digital (Fremont), Llc | Method for controlling camber on air bearing surface of a slider |
-
1991
- 1991-09-11 JP JP23140591A patent/JP2964722B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0573848A (en) | 1993-03-26 |
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