JP2970214B2 - Epoxy resin composition for optical semiconductor encapsulation - Google Patents
Epoxy resin composition for optical semiconductor encapsulationInfo
- Publication number
- JP2970214B2 JP2970214B2 JP4130636A JP13063692A JP2970214B2 JP 2970214 B2 JP2970214 B2 JP 2970214B2 JP 4130636 A JP4130636 A JP 4130636A JP 13063692 A JP13063692 A JP 13063692A JP 2970214 B2 JP2970214 B2 JP 2970214B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- optical semiconductor
- resin composition
- bisphenol
- semiconductor encapsulation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000003822 epoxy resin Substances 0.000 title claims description 51
- 229920000647 polyepoxide Polymers 0.000 title claims description 51
- 230000003287 optical effect Effects 0.000 title claims description 20
- 239000000203 mixture Substances 0.000 title claims description 16
- 239000004065 semiconductor Substances 0.000 title claims description 11
- 238000005538 encapsulation Methods 0.000 title claims description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 claims description 28
- 125000002723 alicyclic group Chemical group 0.000 claims description 7
- 125000000623 heterocyclic group Chemical group 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000001721 transfer moulding Methods 0.000 description 3
- 239000006096 absorbing agent Substances 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000012778 molding material Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 229910003475 inorganic filler Inorganic materials 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Landscapes
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Led Device Packages (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は透明性が高く、耐熱性に
優れかつ光学ムラのない硬化体を与える光半導体封止用
エポキシ樹脂組成物に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an epoxy resin composition for encapsulating an optical semiconductor, which provides a cured product having high transparency, excellent heat resistance and free from optical unevenness.
【0002】[0002]
【従来の技術】発光素子および受光素子などの光半導体
素子のトランスファモールド用封止材料として、電気特
性、耐熱性、耐湿性などに優れるという観点から、一般
に酸無水物硬化エポキシ樹脂が使用されている。この
際、エポキシ樹脂としては、透明性、成形性に優れるこ
とから、高分子量ビスフェノールA型エポキシ樹脂が多
用されている。2. Description of the Related Art An acid anhydride-cured epoxy resin is generally used as a sealing material for transfer molding of an optical semiconductor device such as a light-emitting device and a light-receiving device from the viewpoint of excellent electrical properties, heat resistance, moisture resistance and the like. I have. At this time, a high molecular weight bisphenol A type epoxy resin is often used as the epoxy resin because of its excellent transparency and moldability.
【0003】[0003]
【発明が解決しようとする課題】しかしながら、エポキ
シ樹脂としてビスフェノールA型エポキシ樹脂を単独使
用した場合、硬化体の耐熱性が不十分であった。また、
トランスファ成形時に材料の流動跡としての光学ムラが
発生するという問題があった。上記課題に対して特開平
2−189958号公報に開示される手法は、エポキシ
樹脂組成物を有機溶媒中で分散、混合、Bステージ化
し、その後に有機溶媒を除去する方法であるが、製造工
数の問題や残存溶媒による成形性(ボイド)、信頼性な
どに問題があった。また、特開平3−3258号公報に
記載されている成形材料の超微粉砕混合という方法は、
超微粉砕工程の増設、あるいは超微細粉の吸湿対策など
製造工程上の問題があった。さらに上記二種の手法にお
いては、エポキシ樹脂の主成分としてビスフェノールA
型エポキシ樹脂が使用されるが、分子構造中の繰り返し
数nにつては規定されていない。本発明の目的は、透明
性、耐熱性に優れ、かつ光学ムラのない硬化体を与える
光半導体封止用エポキシ樹脂組成物を提供することにあ
る。However, when a bisphenol A type epoxy resin is used alone as the epoxy resin, the heat resistance of the cured product is insufficient. Also,
There has been a problem that optical unevenness occurs as a material flow trace during transfer molding. The method disclosed in JP-A-2-189958 for the above-mentioned problem is a method in which the epoxy resin composition is dispersed in an organic solvent, mixed, B-staged, and then the organic solvent is removed. And the moldability (void) and reliability due to the residual solvent. Also, a method of ultra-fine pulverization and mixing of molding materials described in JP-A-3-3258,
There were problems in the manufacturing process, such as the addition of an ultra-fine pulverizing process or measures against moisture absorption of ultra-fine powder. Further, in the above two methods, bisphenol A is used as a main component of the epoxy resin.
A type epoxy resin is used, but the number of repetitions n in the molecular structure is not specified. An object of the present invention is to provide an epoxy resin composition for encapsulating an optical semiconductor that provides a cured product having excellent transparency and heat resistance and having no optical unevenness.
【0004】[0004]
【課題を解決するための手段】本発明は上記問題点を解
決するためになされたものであり、その構成は、エポキ
シ樹脂、硬化剤、硬化促進剤を含有してなる光半導体封
止用エポキシ樹脂組成物において、エポキシ樹脂が下記
一般式で表されるビスフェノールA型エポキシ樹脂を主
体とすることを第一の特徴とする。DISCLOSURE OF THE INVENTION The present invention has been made to solve the above problems, and has a structure comprising an epoxy for encapsulating an optical semiconductor containing an epoxy resin, a curing agent, and a curing accelerator. The first feature of the resin composition is that the epoxy resin is mainly composed of a bisphenol A type epoxy resin represented by the following general formula.
【0005】[0005]
【化2】 (ただし、上記一般式においてn=1〜5である。) さらに、エポキシ樹脂が上記ビスフェノールA型エポキ
シ樹脂と脂環式エポキシ樹脂および/または含複素環エ
ポキシ樹脂との混合物からなり、これらの混合比(重量
比)が90:10〜50:50の範囲になることを第二
の特徴とする。すなわち、本発明者らは上記の目的が達
成された光半導体封止用エポキシ樹脂組成物を得るため
一連の研究を重ねる中で、ビスフェノールA型エポキシ
樹脂が上記組成において、硬化する以前は熱可塑性樹脂
として存在し、分子構造中の繰り返し数nが増加するに
伴い、流動時に配向しやすくなり、光学ムラを生じるの
ではないかと着想し、これを中心に研究を進めた。Embedded image (However, n = 1 to 5 in the above general formula.) Further, the epoxy resin is a mixture of the above bisphenol A type epoxy resin and an alicyclic epoxy resin and / or a heterocyclic epoxy resin, and the mixture thereof The second feature is that the ratio (weight ratio) is in the range of 90:10 to 50:50. That is, the present inventors have conducted a series of studies to obtain an epoxy resin composition for optical semiconductor encapsulation in which the above-mentioned object has been achieved. As the resin exists and the number of repetitions n in the molecular structure increases, it is easy to orient at the time of flow, and the idea was conceived that optical unevenness might occur.
【0006】その結果、ビスフェノールA型エポキシ樹
脂の分子構造中の繰り返し数nがほぼ5を臨界点とし、
これを越えたものを使用すると硬化体に樹脂流動跡が顕
著に発生し、また、これが5以下のものを使用すると、
その硬化体にほとんど光学ムラを生じなくなることを見
出し本発明に到達したのである。従って、本発明に用い
るビスフェノールA型エポキシ樹脂は、その分子構造中
繰り返し数nが1〜5の範囲にあるものが使用される。
nが1未満のものを使用すると成形材料化が困難になっ
たり、またその後のタブレット成形性も悪化するからで
ある。本発明において、上記ビスフェノールA型エポキ
シ樹脂と併用される樹脂は、脂環式エポキシ樹脂および
/または含複素環エポキシ樹脂である。これらの樹脂は
硬化体の耐熱性、透明性を向上するために用いられるも
のであり、各々単独で硬化した場合のガラス転移温度が
150℃以上の値を示すものを選択する必要がある。As a result, the critical point is such that the number of repetitions n in the molecular structure of the bisphenol A type epoxy resin is substantially 5;
If a material exceeding this is used, a trace of resin flow will be remarkably generated in the cured product.
The inventors have found that almost no optical unevenness occurs in the cured product, and have reached the present invention. Therefore, the bisphenol A type epoxy resin used in the present invention has a molecular structure in which the repeating number n is in the range of 1 to 5.
If n is less than 1, it becomes difficult to form a molding material, and the subsequent tablet moldability also deteriorates. In the present invention, the resin used in combination with the bisphenol A type epoxy resin is an alicyclic epoxy resin and / or a heterocyclic epoxy resin. These resins are used to improve the heat resistance and transparency of the cured product, and it is necessary to select a resin having a glass transition temperature of 150 ° C. or more when each is cured alone.
【0007】それらの例として、脂環式エポキシ樹脂と
してはCY175、CY179(以上チバガイギー社
製)EHPE3150、セロキサイド2021P、エポ
リードGT300(以上ダイセル化学社製)などが挙げ
られ、また含複素環エポキシ樹脂としてはTEPIC
(日産化学社製)などが挙げられる。ビスフェノールA
型エポキシ樹脂と脂環式エポキシ樹脂および/または含
複素環エポキシ樹脂との混合比率は90:10〜50:
50(重量%)が好ましく、ビスフェノールA型エポキ
シ樹脂が多い場合には、耐熱性、透明性の低下が大きく
なる。脂環式エポキシ樹脂および/または含複素環エポ
キシ樹脂が多い場合には、耐熱性、透明性が向上する反
面、硬化体の機械的強度が著しく低下する。Examples of the alicyclic epoxy resin include CY175, CY179 (above, manufactured by Ciba-Geigy) EHPE3150, Celloxide 2021P, Eporide GT300 (above, manufactured by Daicel Chemical), and heterocyclic epoxy resin. Is TEPIC
(Manufactured by Nissan Chemical Industries, Ltd.). Bisphenol A
The mixing ratio of the epoxy resin to the alicyclic epoxy resin and / or the heterocyclic epoxy resin is 90:10 to 50:
50 (% by weight) is preferable, and when the amount of bisphenol A type epoxy resin is large, the heat resistance and the transparency are greatly reduced. When the amount of the alicyclic epoxy resin and / or the heterocyclic epoxy resin is large, the heat resistance and the transparency are improved, but the mechanical strength of the cured product is significantly reduced.
【0008】上記硬化剤としては、特に制限されない
が、硬化体の光学特性を考慮すると酸無水物が好まし
い。例えば、無水フタル酸、テトラ無水フタル酸、ヘキ
サヒドロ無水フタル酸、無水トリメリット酸、ポリアゼ
ライン酸無水物などが挙げられ、単独でもしくは併せて
使用される。酸無水物の使用量はエポキシ樹脂に対して
0.7〜1.2当量、好ましくは0.8〜1.1当量と
なるように配合する必要がある。この範囲を越えた場
合、反応が不十分となり硬化体の物性が低下するためで
ある。上記硬化促進剤としては従来公知のものでよく、
例えばイミダゾール類、DBUおよびその塩、三級アミ
ン、四級アンモニウム塩、四級ホスホニウム塩などが例
示されるが、この量はエポキシ樹脂と酸無水物との合計
量に対して0.05〜10%、より好ましくは0.1〜
5%にすればよい。なお、上記光半導体封止用エポキシ
樹脂組成物には、上記各成分以外に必要に応じて離型
剤、酸化防止剤、着色剤、紫外線吸収剤、可視光吸収
剤、赤外線吸収剤、変性剤、無機充填材等の従来公知の
添加剤が用いられる。The curing agent is not particularly limited, but is preferably an acid anhydride in consideration of the optical properties of the cured product. For example, phthalic anhydride, tetraphthalic anhydride, hexahydrophthalic anhydride, trimellitic anhydride, polyazeleic anhydride and the like can be mentioned, and these are used alone or in combination. It is necessary to add the acid anhydride in an amount of 0.7 to 1.2 equivalents, preferably 0.8 to 1.1 equivalents, based on the epoxy resin. If it exceeds this range, the reaction will be insufficient and the physical properties of the cured product will be reduced. Conventionally known curing accelerators may be used,
For example, imidazoles, DBU and salts thereof, tertiary amines, quaternary ammonium salts, quaternary phosphonium salts and the like are exemplified, and this amount is 0.05 to 10% based on the total amount of the epoxy resin and the acid anhydride. %, More preferably 0.1 to
What is necessary is just to make it 5%. The epoxy resin composition for encapsulating an optical semiconductor may further include a releasing agent, an antioxidant, a coloring agent, an ultraviolet absorber, a visible light absorber, an infrared absorber, a modifier, in addition to the above components, as required. Conventionally known additives such as inorganic fillers are used.
【0009】[0009]
【実施例】本発明を実施例により、さらに詳細に説明す
るが、本発明はこれに限定されるものではない。なお、
以下の実施例における試験法を下記に示す。 (1)光透過率 分光光度計(日立製U−2000型)を使用し、厚さ2
mmの成形品について波長570nmにおける光透過率
を測定した。 (2)ガラス転移温度 直径4mm、長さ20mmの成形品についてTMA(理
学社製PTC−10A型)を用い、5℃/分で昇温した
ときの成形品の伸び率が急変する温度とした。 (3)光学ムラ 直径50mm、厚さ2mmの成形品について光学顕微鏡
(倍率:100倍)により成形品内部の樹脂流動跡の有
無を観察した。樹脂流動跡のないものを〇、有るものを
×で表示した。EXAMPLES The present invention will be described in more detail with reference to Examples, but the present invention is not limited thereto. In addition,
The test method in the following examples is shown below . (1) Light transmittance Using a spectrophotometer (Hitachi U-2000 type), thickness 2
The light transmittance at a wavelength of 570 nm was measured for the molded product of mm. (2) Glass transition temperature For a molded product having a diameter of 4 mm and a length of 20 mm, TMA (PTC-10A type manufactured by Rigaku Corp.) was used as the temperature at which the elongation of the molded product suddenly changes when the temperature is increased at 5 ° C./min. . (3) Optical Unevenness A molded product having a diameter of 50 mm and a thickness of 2 mm was observed with an optical microscope (magnification: 100 times) for the presence of resin flow traces inside the molded product. Those with no resin flow trace were indicated by Δ, and those with resin flow were indicated by X.
【0010】実施例1〜3、比較例1〜3 表1に示す配合に従って、各原料を配合し、80℃〜9
0℃の熱ロールにて10分間〜15分間混練後、冷却粉
砕し目的とする粉末状のエポキシ樹脂組成物を得た。次
にこれらの樹脂組成物を各試験用金型を用い、成形温度
150℃でトランスファ成形(成形時間4分間)し、さ
らに150℃で4時間アフターキュアした。得られた各
種成形品の特性結果を表1に併せて示す。Examples 1 to 3 and Comparative Examples 1 to 3 Each raw material was blended in accordance with the formulation shown in Table 1 and
After kneading with a hot roll at 0 ° C. for 10 to 15 minutes, the mixture was cooled and pulverized to obtain a desired powdery epoxy resin composition. Next, these resin compositions were subjected to transfer molding (molding time: 4 minutes) at a molding temperature of 150 ° C. using each test die, and further after-cured at 150 ° C. for 4 hours. Table 1 also shows the characteristic results of the obtained molded products.
【0011】[0011]
【表1】 ※1:油化シェル(株)社製ビスフェノールA型エポキ
シ樹脂 ※2:三井石油化学(株)社製ビスフェノールA型エポ
キシ樹脂 ※3:チバガイギー(株)社製脂環式エポキシ樹脂 ※4:日産化学(株)社製含複素環エポキシ樹脂 ※5:新日本理化(株)社製酸無水物リカシッドTH
(商品名) ※6:四国化成(株)社製イミダゾール2E4MZ(商
品名)[Table 1] * 1: Bisphenol A type epoxy resin manufactured by Yuka Shell Co., Ltd. * 2: Bisphenol A type epoxy resin manufactured by Mitsui Petrochemical Co., Ltd. * 3: Alicyclic epoxy resin manufactured by Ciba Geigy Co., Ltd. * 4: Nissan Heterocyclic epoxy resin manufactured by Chemical Co., Ltd. * 5: Acid anhydride TH, manufactured by Shin Nippon Rika Co., Ltd.
(Trade name) * 6: Imidazole 2E4MZ (trade name) manufactured by Shikoku Chemicals Co., Ltd.
【0012】[0012]
【発明の効果】表1に示す結果から明らかなように、本
発明によれば透明性、耐熱性に優れ、かつ光学ムラのな
い硬化体を与える光半導体封止用エポキシ樹脂組成物を
得ることができ、特に固体映像素子等の受光素子の封止
材料に好適である。As is evident from the results shown in Table 1, according to the present invention, an epoxy resin composition for encapsulating an optical semiconductor which is excellent in transparency and heat resistance and gives a cured product without optical unevenness is obtained. It is particularly suitable as a sealing material for light-receiving elements such as solid-state image elements.
フロントページの続き (58)調査した分野(Int.Cl.6,DB名) H01L 23/28 - 23/30 H01L 21/56 C08G 59/24 H01L 33/00 Continuation of the front page (58) Field surveyed (Int.Cl. 6 , DB name) H01L 23/28-23/30 H01L 21/56 C08G 59/24 H01L 33/00
Claims (2)
有してなる光半導体封止用エポキシ樹脂組成物におい
て、エポキシ樹脂が下記一般式で表されるビスフェノー
ルA型エポキシ樹脂を主体とすることを特徴とする光半
導体封止用エポキシ樹脂組成物。 【化1】 (ただし、上記一般式においてn=1〜5である。)1. An epoxy resin composition for encapsulating an optical semiconductor comprising an epoxy resin, a curing agent, and a curing accelerator, wherein the epoxy resin is mainly a bisphenol A type epoxy resin represented by the following general formula. An epoxy resin composition for encapsulating an optical semiconductor, comprising: Embedded image (However, in the above general formula, n = 1 to 5.)
エポキシ樹脂と脂環式エポキシ樹脂および/または含複
素環エポキシ樹脂との混合物からなり、これらの混合比
(重量比)が90:10〜50:50の範囲である請求
項1記載の光半導体封止用エポキシ樹脂組成物。2. An epoxy resin comprising a mixture of the above-mentioned bisphenol A type epoxy resin and an alicyclic epoxy resin and / or a heterocyclic epoxy resin, and the mixing ratio (weight ratio) thereof is 90:10 to 50:50. The epoxy resin composition for optical semiconductor encapsulation according to claim 1, wherein
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4130636A JP2970214B2 (en) | 1992-05-22 | 1992-05-22 | Epoxy resin composition for optical semiconductor encapsulation |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4130636A JP2970214B2 (en) | 1992-05-22 | 1992-05-22 | Epoxy resin composition for optical semiconductor encapsulation |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH05326756A JPH05326756A (en) | 1993-12-10 |
| JP2970214B2 true JP2970214B2 (en) | 1999-11-02 |
Family
ID=15038996
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4130636A Expired - Lifetime JP2970214B2 (en) | 1992-05-22 | 1992-05-22 | Epoxy resin composition for optical semiconductor encapsulation |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2970214B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005306952A (en) * | 2004-04-20 | 2005-11-04 | Japan Epoxy Resin Kk | Epoxy resin composition for light emitting device sealing material |
-
1992
- 1992-05-22 JP JP4130636A patent/JP2970214B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH05326756A (en) | 1993-12-10 |
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