JP2971482B2 - Electrochromic device - Google Patents
Electrochromic deviceInfo
- Publication number
- JP2971482B2 JP2971482B2 JP1188841A JP18884189A JP2971482B2 JP 2971482 B2 JP2971482 B2 JP 2971482B2 JP 1188841 A JP1188841 A JP 1188841A JP 18884189 A JP18884189 A JP 18884189A JP 2971482 B2 JP2971482 B2 JP 2971482B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- thin film
- electrode
- metal
- charge injection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 claims description 20
- 238000002347 injection Methods 0.000 claims description 18
- 239000007924 injection Substances 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 12
- 239000010409 thin film Substances 0.000 description 39
- 239000004065 semiconductor Substances 0.000 description 14
- 239000000463 material Substances 0.000 description 12
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- -1 quinone compound Chemical class 0.000 description 11
- 150000004696 coordination complex Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 229910021417 amorphous silicon Inorganic materials 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 150000002894 organic compounds Chemical class 0.000 description 4
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 4
- 229910010271 silicon carbide Inorganic materials 0.000 description 4
- 239000007784 solid electrolyte Substances 0.000 description 4
- 238000000862 absorption spectrum Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000007772 electrode material Substances 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000001771 vacuum deposition Methods 0.000 description 3
- LRFVTYWOQMYALW-UHFFFAOYSA-N 9H-xanthine Chemical compound O=C1NC(=O)NC2=C1NC=N2 LRFVTYWOQMYALW-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical compound C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- DZBUGLKDJFMEHC-UHFFFAOYSA-N acridine Chemical compound C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229920001940 conductive polymer Polymers 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 230000033116 oxidation-reduction process Effects 0.000 description 2
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 2
- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 1
- QKLPIYTUUFFRLV-UHFFFAOYSA-N 1,4-bis[2-(2-methylphenyl)ethenyl]benzene Chemical compound CC1=CC=CC=C1C=CC(C=C1)=CC=C1C=CC1=CC=CC=C1C QKLPIYTUUFFRLV-UHFFFAOYSA-N 0.000 description 1
- XJKSTNDFUHDPQJ-UHFFFAOYSA-N 1,4-diphenylbenzene Chemical group C1=CC=CC=C1C1=CC=C(C=2C=CC=CC=2)C=C1 XJKSTNDFUHDPQJ-UHFFFAOYSA-N 0.000 description 1
- UOFGSWVZMUXXIY-UHFFFAOYSA-N 1,5-Diphenyl-3-thiocarbazone Chemical compound C=1C=CC=CC=1N=NC(=S)NNC1=CC=CC=C1 UOFGSWVZMUXXIY-UHFFFAOYSA-N 0.000 description 1
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 description 1
- CNRNYORZJGVOSY-UHFFFAOYSA-N 2,5-diphenyl-1,3-oxazole Chemical compound C=1N=C(C=2C=CC=CC=2)OC=1C1=CC=CC=C1 CNRNYORZJGVOSY-UHFFFAOYSA-N 0.000 description 1
- ORIHZIZPTZTNCU-VMPITWQZSA-N 2-[(E)-hydroxyiminomethyl]phenol Chemical compound O\N=C\C1=CC=CC=C1O ORIHZIZPTZTNCU-VMPITWQZSA-N 0.000 description 1
- XWNTYHBAQIEAGN-UHFFFAOYSA-N 2-methyl-2h-pyran Chemical compound CC1OC=CC=C1 XWNTYHBAQIEAGN-UHFFFAOYSA-N 0.000 description 1
- GOLORTLGFDVFDW-UHFFFAOYSA-N 3-(1h-benzimidazol-2-yl)-7-(diethylamino)chromen-2-one Chemical compound C1=CC=C2NC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 GOLORTLGFDVFDW-UHFFFAOYSA-N 0.000 description 1
- JEGXLJDYOKKUNM-UHFFFAOYSA-N 3-(2-phenylethenyl)cyclohexa-3,5-diene-1,2-dione Chemical compound O=C1C(=O)C=CC=C1C=CC1=CC=CC=C1 JEGXLJDYOKKUNM-UHFFFAOYSA-N 0.000 description 1
- DDTHMESPCBONDT-UHFFFAOYSA-N 4-(4-oxocyclohexa-2,5-dien-1-ylidene)cyclohexa-2,5-dien-1-one Chemical compound C1=CC(=O)C=CC1=C1C=CC(=O)C=C1 DDTHMESPCBONDT-UHFFFAOYSA-N 0.000 description 1
- ZDASUJMDVPTNTF-UHFFFAOYSA-N 5,7-dibromo-8-quinolinol Chemical compound C1=CN=C2C(O)=C(Br)C=C(Br)C2=C1 ZDASUJMDVPTNTF-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- 229910017115 AlSb Inorganic materials 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910002601 GaN Inorganic materials 0.000 description 1
- 229910005540 GaP Inorganic materials 0.000 description 1
- 229910005542 GaSb Inorganic materials 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- 229910019015 Mg-Ag Inorganic materials 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229930002875 chlorophyll Natural products 0.000 description 1
- 235000019804 chlorophyll Nutrition 0.000 description 1
- ATNHDLDRLWWWCB-AENOIHSZSA-M chlorophyll a Chemical compound C1([C@@H](C(=O)OC)C(=O)C2=C3C)=C2N2C3=CC(C(CC)=C3C)=[N+]4C3=CC3=C(C=C)C(C)=C5N3[Mg-2]42[N+]2=C1[C@@H](CCC(=O)OC\C=C(/C)CCC[C@H](C)CCC[C@H](C)CCCC(C)C)[C@H](C)C2=C5 ATNHDLDRLWWWCB-AENOIHSZSA-M 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002431 hydrogen Chemical group 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 239000003446 ligand Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000001451 molecular beam epitaxy Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000013110 organic ligand Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920001197 polyacetylene Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 125000005575 polycyclic aromatic hydrocarbon group Chemical group 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000123 polythiophene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004151 quinonyl group Chemical group 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229940075420 xanthine Drugs 0.000 description 1
Landscapes
- Electrochromic Elements, Electrophoresis, Or Variable Reflection Or Absorption Elements (AREA)
Description
【発明の詳細な説明】 〔技術分野〕 本発明は、電圧印加により変色する素子(エレクトロ
クロミック(EC)素子)に関し、特に、全固体型のEC素
子に関する。Description: TECHNICAL FIELD The present invention relates to an element (electrochromic (EC) element) that changes color when a voltage is applied, and particularly to an all-solid-state EC element.
EC材料は、酸化還元反応による光の吸収スペクトルの
変化により機能を発現するものであり、色調の変化を利
用して表示素子や調光ガラスに、適度の応答速度を利用
した防眩材料、メモリー性を利用した記憶センサー等に
用いられている。EC materials exhibit their function by changing the absorption spectrum of light due to the oxidation-reduction reaction. It is used for memory sensors and the like that utilize the characteristics.
全固体型のEC材料においては、イオン供給材料とし
て、固体電解質が検討されてきた。しかしながら、従来
の固体電解質を用いたEC材料は、応答速度が低く、また
劣化も大きかった。最近は固体電解質の改良が進んでき
たが、未だ満足のいく性能は得られていない。For all-solid-state EC materials, solid electrolytes have been studied as ion supply materials. However, the conventional EC material using the solid electrolyte has a low response speed and a large deterioration. Recently, improvements in solid electrolytes have been made, but satisfactory performance has not yet been obtained.
本発明者は拡張共役型キノン系化合物の性質を調べて
いたところ、この化合物は可逆的に酸化状態ならびに還
元状態をとることを見出した。さらに、これらの酸化−
還元状態は安定に存在し、かつ光の吸収スペクトルが大
幅に変化することから、新規のEC材料として検討した。The inventors of the present invention have studied the properties of the extended conjugated quinone-based compound, and have found that this compound reversibly assumes an oxidized state and a reduced state. Furthermore, the oxidation of these
Since the reduced state exists stably and the light absorption spectrum changes drastically, it was examined as a new EC material.
拡張共役型キノン系化合物においては、酸化還元状態
が可逆的に進行し、かつ、酸化還元状態が安定であるう
え、光吸収スペクトルが大きく変化する。これを電極で
挟むことにより、固体電解質を用いることなしで、EC動
作が確認され、本発明を完成するに到ったものである。In the extended conjugated quinone-based compound, the oxidation-reduction state proceeds reversibly, the oxidation-reduction state is stable, and the light absorption spectrum changes significantly. By sandwiching this between electrodes, the EC operation was confirmed without using a solid electrolyte, and the present invention was completed.
すなわち、本発明は、少なくとも、一方の電極が光透
過性である2つの電極層の間に、拡張共役型キノン系化
合物を含み、かつ、電荷注入層で挟まれて存在するかも
しくは電荷注入層に積層されて存在する色調変化層を有
することを特徴とするエレクトロクロミック素子であ
る。That is, the present invention provides an extended conjugated quinone-based compound between at least one of two electrode layers in which one electrode is light-transmitting, and is present between the charge injection layer or the charge injection layer. An electrochromic device having a color tone changing layer that is laminated on the device.
以下、図面を参照しつつ、本発明を詳細に説明する。 Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図は本発明の素子の一つの実施の形態を示すもの
である。すなわち、少なくとも、一方が光透過性である
2つの電極層2,4を備えており、これら2つの電極2,4層
間に、拡張共役型キノン系化合物からなる色調変化層
(以下EC層と略称する)3を設けたEC素子である。ま
た、第2図は本発明の別の実施態様の例であり、電極1
2,14の間にEC層13,電荷注入層15が積層されている。な
お、第2図において、基板に接する電極を第一電極、反
対側の電極を第二電極と称する。また、第3図はさらに
別の実施の形態を示すもので、EC層13が電荷注入層15,1
5′に挟まれて存在するものである。FIG. 1 shows one embodiment of the device of the present invention. That is, at least one is provided with two electrode layers 2 and 4 that are light-transmitting, and between these two electrodes 2 and 4 is a color change layer (hereinafter abbreviated as EC layer) made of an extended conjugated quinone compound. 3) An EC element provided with 3. FIG. 2 is an example of another embodiment of the present invention.
An EC layer 13 and a charge injection layer 15 are stacked between 2 and 14. In FIG. 2, the electrode in contact with the substrate is called a first electrode, and the electrode on the opposite side is called a second electrode. FIG. 3 shows still another embodiment, in which the EC layer 13 has the charge injection layers 15 and 1.
It exists between 5 '.
本発明におけるEC層は、拡張共役型キノン系化合物で
構成される有機化合物薄膜である。拡張共役型キノン系
化合物としてはパラベンゾキノン、ジフェノキノン、ス
チルベンキノン、一般的な構造式1、および構造式2で
示される化合物やこれらの誘導体が有効であり、これら
の一般的な特徴としては、共役しているπ電子系を有
し、容易に励起されやすい有機化合物である。構造式1
において、Χは酸素(O),硫黄(S),セレン(Se)
等の原子を表し、具体的にはジヒドロフランジイリデン
ビスベンゾキノン、ジヒドロチォフェンジイリデンビス
ベンゾキノン、ジヒドロセレノフェンジイリデンビスベ
ンゾキノン等の誘導体である。構造式2はジヒドロチエ
ノチオフェンジイリデンビスベンゾキノンおよびその誘
導体である。これらの構造式において、Rは水素、メチ
ル基、エチル基、プロピル基、ターシャリブチル基、メ
トキシ基、エトキシ基、ハロゲン原子、フェニル基、フ
ェノキシ基、ヒドロキシ(OH)基、メルカプト(SH)
基、アミノ基等を表すものである。nは1,2,3および4
である。The EC layer in the present invention is an organic compound thin film composed of an extended conjugated quinone compound. As the extended conjugated quinone-based compound, parabenzoquinone, diphenoquinone, stilbenequinone, the compounds represented by general structural formulas 1 and 2, and derivatives thereof are effective. Is an organic compound having a π-electron system and easily excited. Structural formula 1
In the formula, Χ represents oxygen (O), sulfur (S), selenium (Se)
And specific examples thereof include derivatives such as dihydrofurandylidenebisbenzoquinone, dihydrothiophendiylidenebisbenzoquinone, and dihydroselenophendiylidenebisbenzoquinone. Structural formula 2 is dihydrothienothiophenediilidenebisbenzoquinone and its derivatives. In these structural formulas, R is hydrogen, methyl, ethyl, propyl, tertiary butyl, methoxy, ethoxy, halogen, phenyl, phenoxy, hydroxy (OH), mercapto (SH)
And an amino group. n is 1,2,3 and 4
It is.
EC層は溶液塗布、真空蒸着等の方法で薄膜とすること
ができる。EC層の厚みは特に限定されるものではない
が、通常50〜5000Å程度で用いられる。勿論、この外の
範囲も使用することは可能である。 The EC layer can be formed into a thin film by a method such as solution coating or vacuum deposition. The thickness of the EC layer is not particularly limited, but is usually about 50 to 5000 °. Of course, other ranges can be used.
本発明において、EC層は電極で挟まれて存在するが、
さらに好ましい構造は、EC層が電荷注入層で挟まれても
しくはEC層に電荷注入層が積層されて存在するものであ
る。電荷注入層を構成する材料として、金属錯体薄膜、
芳香族アミン系化合物薄膜、半導体薄膜等が有効に用い
られる。電子の良導体として金属錯体薄膜は効果的であ
り、電荷注入層に加えてEC層に混合して使用することも
でき、さらに効果的である。また、芳香族アミン系化合
物薄膜は正孔の注入層、また半導体薄膜層を不純物ドー
ピングにより、電子または正孔の注入層として有効に用
いることができる。In the present invention, the EC layer exists between the electrodes,
A more preferred structure is one in which the EC layer is sandwiched between the charge injection layers or the charge injection layer is stacked on the EC layer. As a material constituting the charge injection layer, a metal complex thin film,
An aromatic amine compound thin film, a semiconductor thin film and the like are effectively used. The metal complex thin film is effective as a good conductor of electrons, and can be used by being mixed with the EC layer in addition to the charge injection layer. The aromatic amine compound thin film can be effectively used as a hole injection layer and the semiconductor thin film layer can be effectively used as an electron or hole injection layer by doping impurities.
まず、当該金属錯体について説明するに、金属と有機
物の配位子とから形成される錯化合物である。具体的に
例示すると、錯体を形成する金属としては、Al,Ga,Ir,Z
n,Cd,Mg,Pb,Ta,Tb,Eu等であり、特に限定されるもので
はない。また、有機物の配位子としては、ポリフィリ
ン、クロロフィル、8−ヒドロキシキノリン(オキシン
(Ox))、5,7−ジブロムオキシン、5,7−ジヨードオキ
シン、チオオキシン、セレノオキシン、メチルオキシ
ン、フタロシアニン、サリチルアルデヒドオキシム、1
−ニトロソ−2−ナフトール、クフェロン、ジチゾン、
アセチルアセトンなどが用いられる。First, the metal complex is described as a complex compound formed from a metal and a ligand of an organic substance. Specifically, as a metal forming a complex, Al, Ga, Ir, Z
n, Cd, Mg, Pb, Ta, Tb, Eu, etc., and are not particularly limited. Organic ligands include porphyrin, chlorophyll, 8-hydroxyquinoline (oxin (Ox)), 5,7-dibromooxine, 5,7-diiodoxin, thiooxin, selenooxin, methyloxin, and phthalocyanine. , Salicylaldehyde oxime, 1
-Nitroso-2-naphthol, kuferon, dithizone,
Acetyl acetone or the like is used.
また、本発明においては、外部摂動を受けやすいπ電
子系を有し、容易に励起されやすい有機化合物を金属錯
体と混合して用いることを妨げるものではない。該有機
化合物としては、例えば縮合多環芳香族炭化水素、p−
ターフェニル、2,5−ジフェニルオキサゾール、1,4−bi
s−(2−メチルスチリル)−ベンゼン、キサンチン、
クマリン、アクリジン、シアニン色素、ベンゾフェノ
ン、フタロシアニン、芳香族アミン、芳香族ポリアミ
ン、キノン構造を有し励起状態で錯体を形成する化合
物、ポリアセチレン、ポリシランなどを用いる。Further, the present invention does not prevent the use of an organic compound having a π-electron system which is easily subjected to external perturbation and which is easily excited with a metal complex. As the organic compound, for example, condensed polycyclic aromatic hydrocarbon, p-
Terphenyl, 2,5-diphenyloxazole, 1,4-bi
s- (2-methylstyryl) -benzene, xanthine,
Coumarin, acridine, cyanine dye, benzophenone, phthalocyanine, aromatic amine, aromatic polyamine, a compound having a quinone structure and forming a complex in an excited state, polyacetylene, polysilane, or the like is used.
これらは、混合あるいは積層して用いられる。また、
その厚みは特に限定されるものではないが、通常500Å
以下で十分な機能を発揮する。These are used by mixing or laminating. Also,
Although the thickness is not particularly limited, it is usually 500 mm.
The following works well.
薄膜の形成法としては、真空蒸着、イオンプレーティ
ング、昇華、塗布等の各種の方法が有効に用いられる。Various methods such as vacuum deposition, ion plating, sublimation, and coating can be effectively used as a method for forming a thin film.
半導体薄膜としては、1種類、または2種類以上の無
機半導体薄膜が効果的に用いられる。これらは、非晶
質、微結晶、多結晶、単結晶、または非晶質と微結晶が
交じり合った薄膜、またこれらの積層薄膜や人工格子薄
膜等も有用である。As the semiconductor thin film, one kind or two or more kinds of inorganic semiconductor thin films are effectively used. These are also useful as amorphous, microcrystalline, polycrystalline, single crystal, or thin films in which amorphous and microcrystals are intermingled, as well as laminated thin films and artificial lattice thin films.
これらの薄膜形成に有用な半導体材料は、C,Ge,Si,Sn
などの一元系の半導体、SiCなどの二元系IV−IV族半導
体,AlSb,BN,BP,GaN,GaSb,GaAs,GaP,InSb,InAs,InPなど
のIII−V族半導体、CdS,CdSe,CdTe,ZnO,ZnS,ZnSeなど
のII−VI族半導体材料など、さらに多元系の化合物半導
体材料などである。好ましい材料であるSi(シリコン)
について具体的に例をあげると、非晶質シリコン(a−
Si)、水素化非晶質シリコン(a−Si:H)、微結晶シリ
コン(μc−Si)、多結晶シリコン、単結晶シリコン、
水素化非晶質炭化珪素(Si1-XCX:H)、微結晶炭化珪素
(μc−SiC)、単結晶炭化珪素、非晶質窒化珪素、水
素化非晶質窒化珪素、微結晶窒化珪素等が好適に用いら
れる。Semiconductor materials useful for forming these thin films include C, Ge, Si, Sn
Primary semiconductor such as, binary IV-IV semiconductor such as SiC, III-V semiconductor such as AlSb, BN, BP, GaN, GaSb, GaAs, GaP, InSb, InAs, InP, CdS, CdSe, Examples thereof include II-VI group semiconductor materials such as CdTe, ZnO, ZnS, and ZnSe, and multi-component compound semiconductor materials. Preferred material is Si (silicon)
To give a specific example, amorphous silicon (a-
Si), hydrogenated amorphous silicon (a-Si: H), microcrystalline silicon (μc-Si), polycrystalline silicon, single crystal silicon,
Hydrogenated amorphous silicon carbide (Si 1-X C X : H), microcrystalline silicon carbide (μc-SiC), single crystal silicon carbide, amorphous silicon nitride, hydrogenated amorphous silicon nitride, microcrystalline nitride Silicon or the like is preferably used.
ここで、上記の半導体薄膜は、その薄膜自体がp型ま
たはn型の性質を有するものであるか、またはドーピン
グを行い、p型またはn型にして用いられる。なお、厚
みは特に限定されず、500Å以下で十分に機能を発揮で
きる。当該半導体薄膜は、光CVD法、プラズマCVD法、熱
CVD法,モレキュラービームエピタキシー(MBE)法,有
機金属分解法(MOCVD),蒸着法、スパッタ法、などの
各種の物理的または化学的な薄膜形成法で堆積される。Here, the above-mentioned semiconductor thin film has a p-type or n-type property, or is doped to be p-type or n-type. The thickness is not particularly limited, and a sufficient function can be exhibited at 500 mm or less. The semiconductor thin film is formed by a photo CVD method, a plasma CVD method,
It is deposited by various physical or chemical thin film forming methods such as a CVD method, a molecular beam epitaxy (MBE) method, an organic metal decomposition method (MOCVD), an evaporation method, a sputtering method, and the like.
本発明における二つの電極層としては、金属、合金、
金属酸化物、金属シリサイド、導電性高分子材料など、
またはそれらの1種類または2種類以上の積層薄膜が用
いられる。より好ましくは、接触している薄膜への電子
または正孔の注入効率のよい材料が選択される。As the two electrode layers in the present invention, metal, alloy,
Metal oxide, metal silicide, conductive polymer materials, etc.
Alternatively, one or two or more of these stacked thin films are used. More preferably, a material having a high efficiency of injecting electrons or holes into the contacting thin film is selected.
以下、一例として具体的に、第一電極層,p型a−SiC:
H薄膜層および金属錯体からなる電荷注入層、拡張共役
型キノン系化合物からなるEC層、金属錯体からなる電荷
注入層、第二電極層の順序で形成された素子に関し具体
的に例示して説明することにする。Hereinafter, specifically, as an example, the first electrode layer, p-type a-SiC:
The element formed in the order of the H thin film layer and the charge injection layer composed of the metal complex, the EC layer composed of the extended conjugated quinone-based compound, the charge injection layer composed of the metal complex, and the second electrode layer are specifically exemplified and described. I will do it.
第一電極層は、p型a−SiC:H半導体薄膜へ正孔注入
効率のよい電極材料をもちいるとよい。この電極材料と
して、より具体的に説明すると、一般的に電子の仕事関
数の大きな金属、合金、金属酸化物などの金属化合物薄
膜や、それらの積層された薄膜などが用いられる。ま
た、この第一電極を光透過性にすることにより、EC層の
変色を外部から認識できる構造となる。光透過性の電極
材料を、具体的に示すと、スズ酸化物(SnO2)、インジ
ウム酸化物、インジウム−スズ酸化物(ITO)等の金属
酸化物の薄膜、またそれらの積層膜や、Pt,Au,Se,Pd,N
i,W,Ta,Te等の金属や合金薄膜、またそれらの積層膜、C
uIなどの金属塩薄膜、またそれらの積層膜などが、好適
なものとして挙げられる。第二の電極層は、拡張共役型
キノン系化合物からなるEC層に電子を注入するため、一
般的に電子の仕事関数の小さな金属や合金薄膜、それら
の積層薄膜などが用いられる。さらにより具体的には、
Mg,Li,Na,K,Ca,Rb,Sr,Ceなどのアルカリ金属、アルカリ
土類金属、希土類元素、Mg−Ag等の合金、Cs−O−Ag、
Cs3Sb、Na2KSb、(Cs)Na2KSb、等の薄膜、またそれら
の積層薄膜などが好適である。The first electrode layer is preferably made of an electrode material having a good hole injection efficiency into the p-type a-SiC: H semiconductor thin film. More specifically, as the electrode material, a metal compound thin film such as a metal, an alloy, or a metal oxide having a large electron work function, or a thin film obtained by laminating them is used. In addition, by making the first electrode light-transmissive, a structure is provided in which the discoloration of the EC layer can be recognized from the outside. Specific examples of the light-transmitting electrode material include thin films of metal oxides such as tin oxide (SnO 2 ), indium oxide, and indium-tin oxide (ITO); , Au, Se, Pd, N
Metals and alloy thin films such as i, W, Ta, Te, and their laminated films, C
Suitable examples thereof include metal salt thin films such as uI, and laminated films thereof. Since the second electrode layer injects electrons into the EC layer made of an extended conjugated quinone-based compound, a metal or alloy thin film having a small electron work function, a laminated thin film thereof, or the like is generally used. Even more specifically,
Alkali metals such as Mg, Li, Na, K, Ca, Rb, Sr, Ce, alkaline earth metals, rare earth elements, alloys such as Mg-Ag, Cs-O-Ag,
A thin film such as Cs 3 Sb, Na 2 KSb, (Cs) Na 2 KSb, or a laminated thin film thereof is suitable.
本発明の素子は、電極層/EC層/電極層/EC層/電極層
/EC層/電極・・・と多段かさねてもよい。この素子構
造により、色調の調整や多色化なども可能である。ま
た、この素子を、平面上に多数ならべてもよい。この平
面上に並べられた素子では、それぞれの素子の色調を変
えることにより、多彩なカラー表示用部材としての機能
も発現できる。The device of the present invention comprises an electrode layer / EC layer / electrode layer / EC layer / electrode layer
/ EC layer / electrode ... may be multi-tiered. With this element structure, it is also possible to adjust the color tone and make the color multi-colored. Also, a large number of such elements may be arranged on a plane. The elements arranged on this plane can also exhibit various functions as color display members by changing the color tone of each element.
〔実施例1〕 ガラス基板上にITO膜を膜厚800Å、さらにその上にSn
O2膜を膜厚200Å形成し、透明導電膜(TCO)を形成し、
第一の電極層とした。抵抗加熱真空蒸着法を用いて、ア
ルミニウムトリスオキシナート(Al(Ox)3)薄膜、ビ
スジヒドロチォフェンジイリデンビスジターシャリブチ
ルベンゾキノン(構造式1において、(X=S,R=t−
ブチル基、n=2)薄膜(ビスチエニリデン薄膜と称す
る)、アルミニウムトリスオキシナート(Al(Ox)3)
薄膜の順序でそれぞれ、膜厚100Å、200Å、100Åで堆
積して、電荷注入層で挟んだEC層を形成した。さらに、
この層の上に、電子ビーム蒸着法によりMg薄膜を堆積
し、第二電極層として、第3図に示すところの本発明の
EC素子を得た。なおMg金属の蒸着膜の面積は3mm角であ
る。[Example 1] An ITO film was formed on a glass substrate to a thickness of 800 S
O 2 film is formed to a thickness of 200 mm, a transparent conductive film (TCO) is formed,
This was the first electrode layer. Using a resistance heating vacuum evaporation method, an aluminum trisoxynate (Al (Ox) 3 ) thin film, bisdihydrothiophenedylidenebisditertiarybutylbenzoquinone (in the structural formula 1, (X = S, R = t−
Butyl group, n = 2) thin film (referred to as bisthienylidene thin film), aluminum trisoxynate (Al (Ox) 3 )
An EC layer sandwiched between charge injection layers was formed by depositing the thin films in the order of 100 °, 200 °, and 100 °, respectively. further,
On this layer, a Mg thin film was deposited by an electron beam evaporation method, and a second electrode layer of the present invention as shown in FIG.
An EC element was obtained. The area of the deposited Mg metal film is 3 mm square.
この発光素子に、1Hzの繰り返し周波数で電圧を0→
1.5V,次いで、1.5→0Vへと掃引した。1V以上で薄い緑色
から極薄い紫がかった白色へと変化し、この色調の変化
は1万回以上の繰り返しにおいても再現性良く得られ、
本発明のEC素子が安定性、応答性において優れているこ
とが確認された。A voltage is applied to this light emitting element at a repetition frequency of 1 Hz from 0 →
The voltage was swept from 1.5V and then from 1.5 to 0V. It changes from pale green to very pale purple white at 1V or more, and this change in color tone can be obtained with good reproducibility even after 10,000 or more repetitions.
It was confirmed that the EC device of the present invention was excellent in stability and responsiveness.
〔実施例2〕 第一の電極として金電極上にチオフェンを電解重合し
て得たポリチオフェンを用い、その上にビスチエニリデ
ン薄膜、Al(Ox)3薄膜の順序でそれぞれ、膜厚200
Å、100Åで堆積して、EC層および電荷注入層を形成
し、第二の電極としてITO1000Åを形成した以外は実施
例1と同様に形成して、第2図に示すEC素子を得た。[Example 2] Polythiophene obtained by electrolytic polymerization of thiophene on a gold electrode was used as a first electrode, and a bisthienylidene thin film and an Al (Ox) 3 thin film were formed thereon in a thickness of 200 in this order.
An EC element as shown in FIG. 2 was obtained by forming in the same manner as in Example 1 except that an EC layer and a charge injection layer were formed by depositing {100} to form an EC layer, and an ITO layer was formed as a second electrode.
本EC素子においても、実施例1と同様に1万回以上の
繰り返しにおいても変色は再現性良く得られ、安定性の
良好な、応答速度に優れた結果が確認された。Also in the present EC device, discoloration was obtained with good reproducibility even after 10,000 or more repetitions as in Example 1, and it was confirmed that results were excellent in stability and excellent in response speed.
本発明は、EC層に拡張共役系キノン化合物からなる色
調変化材料を用いることにより、安定性の良い、かつ応
答速度に優れた全固体型のEC素子と成しえたものであ
る。実施例からも明らかな如く、本発明のかかるEC素子
は、従来技術においては到底到達できなかった高性能の
EC素子であり、表示用部材等として工業的にきわめて有
用なものである。The present invention provides an all-solid-state EC device having good stability and excellent response speed by using a color tone changing material composed of an extended conjugated quinone compound in the EC layer. As is clear from the embodiment, such an EC device according to the present invention has a high performance which could not be reached in the prior art.
An EC element, which is industrially extremely useful as a display member or the like.
第1図乃至第3図は本発明の素子の層構成の一例を示す
説明図である。 図において、 1,11……ガラス板等の基板、2,12,……TCO、金属、導電
性高分子材料等よりなる第一電極層、3,13……拡張共役
型キノン系化合物からなるEC層、4,14……TCO,金属材料
等よりなる第二電極層、15,15′……金属錯体、半導体
薄膜層からなる電荷注入層である。1 to 3 are explanatory views showing an example of the layer configuration of the device of the present invention. In the figure, 1,11 ... a substrate such as a glass plate, 2,12, ... a first electrode layer made of TCO, metal, conductive polymer material, etc., 3,13 ... made of an extended conjugated quinone compound EC layer, 4,14..., Second electrode layer made of TCO, metal material, etc., 15, 15 ′... Metal complex, charge injection layer made of semiconductor thin film layer.
Claims (1)
2つの電極層の間に、拡張共役型キノン系化合物を含
み、かつ、電荷注入層で挟まれて存在するかもしくは電
荷注入層に積層されて存在する色調変化層を有すること
を特徴とするエレクトロクロミック素子。At least one electrode contains an extended conjugated quinone-based compound between two electrode layers, each of which is light-transmissive, and is sandwiched by a charge injection layer or is present in a charge injection layer. An electrochromic device having a color tone changing layer that is stacked.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1188841A JP2971482B2 (en) | 1989-07-24 | 1989-07-24 | Electrochromic device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1188841A JP2971482B2 (en) | 1989-07-24 | 1989-07-24 | Electrochromic device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0354528A JPH0354528A (en) | 1991-03-08 |
| JP2971482B2 true JP2971482B2 (en) | 1999-11-08 |
Family
ID=16230779
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1188841A Expired - Fee Related JP2971482B2 (en) | 1989-07-24 | 1989-07-24 | Electrochromic device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2971482B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002082360A (en) * | 2000-09-11 | 2002-03-22 | Fuji Photo Film Co Ltd | Optical writing type recording material |
| US6806453B1 (en) * | 2002-01-17 | 2004-10-19 | Hewlett-Packard Development Company, L.P. | Scanning, copying, and printing with rewritable media |
| JP5678405B2 (en) | 2006-07-12 | 2015-03-04 | コニカミノルタ株式会社 | Electrochromic display element |
-
1989
- 1989-07-24 JP JP1188841A patent/JP2971482B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0354528A (en) | 1991-03-08 |
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