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JP2995755B2 - Manufacturing method of stamper - Google Patents
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JP2995755B2 - Manufacturing method of stamper - Google Patents

Manufacturing method of stamper

Info

Publication number
JP2995755B2
JP2995755B2 JP1201686A JP20168689A JP2995755B2 JP 2995755 B2 JP2995755 B2 JP 2995755B2 JP 1201686 A JP1201686 A JP 1201686A JP 20168689 A JP20168689 A JP 20168689A JP 2995755 B2 JP2995755 B2 JP 2995755B2
Authority
JP
Japan
Prior art keywords
stamper
glass master
manufacturing
sol
master
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1201686A
Other languages
Japanese (ja)
Other versions
JPH0365327A (en
Inventor
文武 渡辺
美紀子 齋藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP1201686A priority Critical patent/JP2995755B2/en
Publication of JPH0365327A publication Critical patent/JPH0365327A/en
Application granted granted Critical
Publication of JP2995755B2 publication Critical patent/JP2995755B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C15/00Surface treatment of glass, not in the form of fibres or filaments, by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Optical Record Carriers (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は光ディスク用スタンパの製造方法に関し、特
にゾルゲル法を用いた光ディスク用ガラス基板作製のた
めのワークスタンパの製造方法に関する。
Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a stamper for an optical disk, and more particularly to a method for manufacturing a work stamper for manufacturing a glass substrate for an optical disk using a sol-gel method.

〔従来の技術〕[Conventional technology]

従来のゾルゲル法を用いた光ディスク用ガラス基板の
作製プロセスについて説明する。
A manufacturing process of a glass substrate for an optical disk using a conventional sol-gel method will be described.

まず、所望のデータに基づきガラス原盤にマスタライ
ティングを行う。次に、ガラス原盤にNiのスパッタ及び
電鋳処理を施すことにより、Niスタンパ(マスタ)をお
こす。次いで、Niスタンパ(マスタ)を型にして再度電
鋳処理を行い、Niスタンパ(マザー)を作成する。この
様にして作成したNiスタンパ(マザー)を用いて、射出
成形あるいは2P成形により樹脂製のゾルゲル用ワークス
タンパを得る。
First, master writing is performed on a glass master based on desired data. Next, a Ni stamper (master) is formed by subjecting the glass master to Ni sputtering and electroforming. Next, the Ni stamper (master) is used as a mold and electroforming is performed again to create a Ni stamper (mother). Using the Ni stamper (mother) thus prepared, a resin stamper for sol-gel is obtained by injection molding or 2P molding.

次に、ガラス基板上に、スピンコート法により金属ア
ルコレート、ポリエチレングリコール、塩酸を含むアル
コール溶液(ゾルゲル溶液)を塗布し、ゾルゲル層を形
成する。先程のワークスタンパをこのゾルゲル面に押し
当て、微細なパターンを転写する。重ね合わせたまま一
次焼成を行った後、ワークスタンパから離型した微細パ
ターン付きガラス基板を更に二次焼成する。このような
プロセスを経て、光ディスク用ガラス基板を作製してい
た。
Next, an alcohol solution (sol-gel solution) containing metal alcoholate, polyethylene glycol, and hydrochloric acid is applied to the glass substrate by spin coating to form a sol-gel layer. The work stamper is pressed against the sol-gel surface to transfer a fine pattern. After the primary firing while being superposed, the glass substrate with the fine pattern released from the work stamper is further secondary fired. Through such a process, a glass substrate for an optical disk has been manufactured.

〔発明が解決しようとする課題〕[Problems to be solved by the invention]

先述したように、ゾルゲル用ワークスタンパを作製す
るには、現状ではかなりのプロセスを必要とする。これ
は、ゾルゲル用ワークスタンパとして、直接Niスタンパ
(マスタ)が使用できないことによる。すなわち、ゾル
ゲル層とNiスタンパをそのまま密着させて一次焼成を行
うと、離型の際、ゾルゲル層の一部がNiスタンパ面に付
着し、正確なパターン転写ができない。
As described above, manufacturing a sol-gel work stamper currently requires a considerable process. This is because a Ni stamper (master) cannot be used directly as a work stamper for sol-gel. That is, if the primary firing is performed while the sol-gel layer and the Ni stamper are in close contact with each other, a part of the sol-gel layer adheres to the Ni stamper surface during mold release, and accurate pattern transfer cannot be performed.

このため、上述したような長いプロセスを採り入れて
いるが、特に微細なパターンを比較的大面積に渡って何
度も転写するので、歩留り、コストの面で問題となる。
For this reason, although the long process as described above is adopted, in particular, since a fine pattern is transferred many times over a relatively large area, there is a problem in terms of yield and cost.

本発明は、いわゆる2P成形により、ガラス原盤から直
接ゾルゲル用ワークスタンパを製作することができるス
タンパの容易な製造方法を提供するものである。
The present invention provides an easy stamper manufacturing method capable of manufacturing a sol-gel work stamper directly from a glass master by so-called 2P molding.

〔課題を解決するための手段〕[Means for solving the problem]

本発明によるスタンパの製造方法は、ガラス原盤上に
レジストを塗布する工程、レーザービームを用いて所望
のパターンを露光する工程、微細なパターンを有するレ
ジスト層を形成するための現像工程、残存するレジスト
層をマスクとしてガラス原盤をエッチングする工程、残
存するレジスト層を除去する工程、微細なパターンを有
する前記ガラス原盤に透光性基板を押し当てこのガラス
原盤と透光性基板との間に紫外線硬化樹脂を充填する工
程、前記透光性基板を通して紫外線を照射する工程、前
記ガラス原盤から微細な凹凸を有する紫外線硬化樹脂層
を設けた前記透光性基板を離型する工程とを有する。
The method for manufacturing a stamper according to the present invention includes a step of applying a resist on a glass master, a step of exposing a desired pattern using a laser beam, a developing step of forming a resist layer having a fine pattern, Etching the glass master using the layer as a mask, removing the remaining resist layer, pressing a light-transmitting substrate against the glass master having a fine pattern, and curing the ultraviolet light between the glass master and the light-transmitting substrate. A step of filling with a resin, a step of irradiating ultraviolet rays through the light-transmitting substrate, and a step of releasing the light-transmitting substrate provided with an ultraviolet-curable resin layer having fine irregularities from the glass master.

〔実施例〕 まず、鏡面に磨かれているガラス原盤上にホトレジス
トをスピンコート法により1000〜3000Å塗布する。次い
で、マスタライタでレーザービーム露光を行い、専用の
現像液を用いて現像する。次に、ホトレジストをマスク
として、CF4などのガスを用いた反応性イオンエッチン
グ法によりガラス原盤をエッチングする。その後、アッ
シング装置を用いてレジスト層を除去する。このように
して微細なパターンを有するガラス原盤が作製できる。
Example First, a photoresist is applied to a glass master polished to a mirror surface by a spin coating method at 1000 to 3000 °. Next, laser beam exposure is performed by a master writer, and development is performed using a dedicated developer. Then, a photoresist as a mask, to etch the glass master by reactive ion etching using a gas such as CF 4. After that, the resist layer is removed using an ashing device. In this way, a glass master having a fine pattern can be manufactured.

このガラス原盤の上に、ディスペンサを用いて紫外線
硬化樹脂をリング状に吐出させる。次に、透光性のエポ
キシ基板を、紫外線硬化樹脂がエポキシ基板とガラス原
盤との間に充分展開するように、ガラス原盤に押し当て
る。その後、エポキシ基板側からUV照射を行い、紫外線
硬化樹脂を硬化させる。硬化した紫外線硬化樹脂層をガ
ラス原盤から離型することにより、微細な凹凸を有する
紫外線硬化樹脂層をエポキシ基板上に形成することがで
きる。このようにしてゾルゲル用ワークスタンパが作製
できる。
An ultraviolet curable resin is discharged in a ring shape on the glass master using a dispenser. Next, the translucent epoxy substrate is pressed against the glass master so that the ultraviolet curable resin spreads sufficiently between the epoxy substrate and the glass master. Thereafter, UV irradiation is performed from the epoxy substrate side to cure the ultraviolet curable resin. By releasing the cured ultraviolet curable resin layer from the glass master, an ultraviolet curable resin layer having fine irregularities can be formed on the epoxy substrate. Thus, a sol-gel work stamper can be manufactured.

次に、ゾルゲル法を用いたガラス基板の作製方法につ
いて述べる。
Next, a method for manufacturing a glass substrate using a sol-gel method will be described.

ガラス基板上にテトラエトキシシラン、ポリエチレン
グリコール、塩酸を含むエチルアルコール溶液をスピン
コート法により塗布し、ゾルゲル層を2000〜3000Å形成
した。次いで、先程のワークスタンパを減圧下で重ね合
わせて押圧する。そのままの状態で、100℃、10minの一
次焼成を行った。その後、ガラス基板をワークスタンパ
より離型し、350℃、10minの二次焼成を行い、所望の微
細パターンを有するガラス基板を得た。
An ethyl alcohol solution containing tetraethoxysilane, polyethylene glycol, and hydrochloric acid was applied on a glass substrate by spin coating to form a sol-gel layer in a thickness of 2000 to 3000 Å. Next, the work stampers are overlapped and pressed under reduced pressure. In that state, primary calcination was performed at 100 ° C. for 10 minutes. Thereafter, the glass substrate was released from the work stamper and subjected to secondary firing at 350 ° C. for 10 minutes to obtain a glass substrate having a desired fine pattern.

〔発明の効果〕〔The invention's effect〕

以上述べてきたように、本発明によるスタンパの製造
方法は、従来の方法に比べて短い工程で済み、又、ゾル
ゲル用スタンパとしてNiスタンパを使用しないで済むた
め、ゾルゲル層がスタンパに付着することもなくなり、
その工業上の意義は大きい。
As described above, the method of manufacturing a stamper according to the present invention requires less steps than the conventional method, and does not require the use of a Ni stamper as a sol-gel stamper, so that the sol-gel layer adheres to the stamper. Disappears,
Its industrial significance is great.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) G11B 7/26 ──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int.Cl. 6 , DB name) G11B 7/26

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】ガラス原盤上にレジストを塗布する工程、
レーザービームを用いて所望のパターンを露光する工
程、微細なパターンを有するレジスト層を形成するため
の現像工程、残存するレジスト層をマスクとしてガラス
原盤をエッチングする工程、残存するレジスト層を除去
する工程、微細なパターンを有する前記ガラス原盤に透
光性基板を押し当てこのガラス原盤と透光性基板との間
に紫外線硬化樹脂を充填する工程、前記透光性基板を通
して紫外線を照射する工程、前記ガラス原盤から微細な
凹凸を有する紫外線硬化樹脂層を設けた前記透光性基板
を離型する工程からなるスタンパの製造方法。
A step of applying a resist on a glass master;
Exposing a desired pattern using a laser beam, developing a resist layer having a fine pattern, etching a glass master using the remaining resist layer as a mask, and removing the remaining resist layer Pressing a translucent substrate against the glass master having a fine pattern, filling an ultraviolet curable resin between the glass master and the translucent substrate, irradiating ultraviolet rays through the translucent substrate, A method for manufacturing a stamper, comprising a step of releasing the translucent substrate provided with an ultraviolet curable resin layer having fine irregularities from a glass master.
JP1201686A 1989-08-02 1989-08-02 Manufacturing method of stamper Expired - Lifetime JP2995755B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1201686A JP2995755B2 (en) 1989-08-02 1989-08-02 Manufacturing method of stamper

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1201686A JP2995755B2 (en) 1989-08-02 1989-08-02 Manufacturing method of stamper

Publications (2)

Publication Number Publication Date
JPH0365327A JPH0365327A (en) 1991-03-20
JP2995755B2 true JP2995755B2 (en) 1999-12-27

Family

ID=16445222

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1201686A Expired - Lifetime JP2995755B2 (en) 1989-08-02 1989-08-02 Manufacturing method of stamper

Country Status (1)

Country Link
JP (1) JP2995755B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101367662B1 (en) 2006-11-22 2014-03-03 엘아이지에이디피 주식회사 Manufacturing process for imprint-stamp

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101367662B1 (en) 2006-11-22 2014-03-03 엘아이지에이디피 주식회사 Manufacturing process for imprint-stamp

Also Published As

Publication number Publication date
JPH0365327A (en) 1991-03-20

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