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JP2995993B2 - Circuit connection method - Google Patents
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JP2995993B2 - Circuit connection method - Google Patents

Circuit connection method

Info

Publication number
JP2995993B2
JP2995993B2 JP4055800A JP5580092A JP2995993B2 JP 2995993 B2 JP2995993 B2 JP 2995993B2 JP 4055800 A JP4055800 A JP 4055800A JP 5580092 A JP5580092 A JP 5580092A JP 2995993 B2 JP2995993 B2 JP 2995993B2
Authority
JP
Japan
Prior art keywords
circuit
adhesive
circuits
connection
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP4055800A
Other languages
Japanese (ja)
Other versions
JPH05258830A (en
Inventor
功 塚越
泰史 後藤
直行 塩沢
共久 太田
豊 山口
達夫 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Corp
Original Assignee
Hitachi Chemical Co Ltd
Showa Denko Materials Co Ltd
Resonac Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Showa Denko Materials Co Ltd, Resonac Corp filed Critical Hitachi Chemical Co Ltd
Priority to JP4055800A priority Critical patent/JP2995993B2/en
Publication of JPH05258830A publication Critical patent/JPH05258830A/en
Application granted granted Critical
Publication of JP2995993B2 publication Critical patent/JP2995993B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/325Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by abutting or pinching; Mechanical auxiliary parts therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistors
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits
    • H05K3/328Assembling printed circuits with electric components, e.g. with resistors electrically connecting electric components or wires to printed circuits by welding
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • H05K3/361Assembling flexible printed circuits with other printed circuits

Landscapes

  • Manufacturing Of Electrical Connectors (AREA)
  • Multi-Conductor Connections (AREA)
  • Connections Effected By Soldering, Adhesion, Or Permanent Deformation (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
  • Combinations Of Printed Boards (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、相対峙する回路もしく
は電極を電気的及び機械的に接続する回路の接続方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for electrically and mechanically connecting opposing circuits or electrodes.

【0002】[0002]

【従来の技術】電子部品の小形薄形化に伴い、これらに
用いる回路類は高密度、高精細化している。これら微細
回路の接続は、例えば接着剤中に粒径7〜30μm程度
の導電粒子を1〜10体積%含有した異方導電性接着剤
を用いる方法が知られている。
2. Description of the Related Art As electronic components have become smaller and thinner, circuits used for them have become higher in density and higher in definition. For connection of these fine circuits, for example, a method using an anisotropic conductive adhesive containing conductive particles having a particle size of about 7 to 30 μm in an amount of 1 to 10% by volume is known.

【0003】しかしながら、従来の方法では、導電粒子
が隣接する回路間を覆って存在すると、回路間の短絡
(ショート)が発生し、7本/mm以上といった最近の
高密度回路の接続には対応できなくなっている。
However, in the conventional method, if the conductive particles exist between adjacent circuits, a short circuit (short circuit) between the circuits occurs, and it is difficult to connect a recent high-density circuit such as 7 lines / mm or more. No longer.

【0004】そこで、例えば特開昭60−262430
号公報に示すものでは、紫外線(UV)等による硬化性
の絶縁性接着剤をガラス基板回路上に介在させて、半導
体素子上の突起電極と対向させ、接着剤を加圧下で硬化
するようにしている。
Therefore, for example, Japanese Patent Application Laid-Open No. Sho 60-262430.
In the technique disclosed in Japanese Patent Application Laid-Open Publication No. H10-209, an insulative adhesive curable by ultraviolet rays (UV) or the like is interposed on a glass substrate circuit so as to face a protruding electrode on a semiconductor element, and the adhesive is cured under pressure. ing.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上記特
開昭60−262430号公報に示される方法は、接着
剤中に導電粒子を含有しないので、隣接回路間のリーク
は改良されるものの、接続すべき回路の基板をガラスや
シリコンといった硬質基板同士に限定しないと十分な接
続信頼性が得られない。また、突出電極の接続面形状は
円や正方形などのアスペクト比(長径/短径の比)が1
に近いか、あるいは長方形等の場合でもこの比が3以下
程度であり、長径の大きさも微細化に対応するため20
0μm以下とする必要があるなど電極形状に制約があ
る。
However, the method disclosed in Japanese Patent Application Laid-Open No. 60-262430 does not contain conductive particles in the adhesive, so that the leakage between adjacent circuits is improved, but the connection is not improved. Unless the substrate of the circuit to be formed is limited to hard substrates such as glass and silicon, sufficient connection reliability cannot be obtained. In addition, the connection surface shape of the protruding electrode has an aspect ratio (ratio of major axis / minor axis) of 1 such as a circle or a square.
This ratio is about 3 or less even in the case of a rectangular shape or a rectangular shape.
There is a restriction on the shape of the electrode, for example, it needs to be 0 μm or less.

【0006】すなわち、硬質基板同士に限定される理由
は、多数の突出電極の高さがバラツキを有するため、高
さの大きな電極は容易に接続すべき回路面に接触可能だ
が、高さの低い電極は接触不可能であるため、接続時の
圧力により硬質基板間で突出電極を変形させて、多数の
電極を平担化させて接続する必要があるからである。こ
の時、電極形状は、アスペクト比の小さい方が好まし
い。これは、圧力が極部的に集中出来るので変形が容易
であること、また電極と回路との接触部以外へ接着剤を
流動排除し易いことなどにより接続信頼性の向上が可能
なためである。
[0006] That is, the reason that the rigid substrates are limited to each other is that a large number of protruding electrodes have a variation in height, so that a large electrode can easily contact a circuit surface to be connected, but a small height. This is because the electrodes cannot be contacted, and it is necessary to deform the protruding electrodes between the hard substrates by the pressure at the time of connection and to connect a number of electrodes in a flattened manner. At this time, it is preferable that the electrode shape has a smaller aspect ratio. This is because the pressure can be concentrated locally and the deformation is easy, and the connection reliability can be improved by easily removing the adhesive from flowing to a portion other than the contact portion between the electrode and the circuit. .

【0007】以上の理由により、従来技術では例えばT
AB(Tape Automated Bonding)やFPC(Flexible P
rinted Circuit)のような、絶縁された多数の平行電極
(回路)を一括して他の回路と接続する用途に適用する
ことは極めて困難な状況にあった。
For the above reasons, in the prior art, for example, T
AB (Tape Automated Bonding) and FPC (Flexible P
It has been extremely difficult to apply the present invention to applications in which a large number of insulated parallel electrodes (circuits) are collectively connected to other circuits, such as a rinted circuit.

【0008】本発明は、上記の如き従来の課題に鑑みて
なされたもので、その目的とするところは、少なくとも
一方の基板が可撓性であり、かつ突出電極が回路端子部
のように極めてアスペクト比の大きい場合における、絶
縁性接着剤を用いた回路の接続方法を提供することにあ
る。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned conventional problems, and has as its object the purpose of at least one of the substrates being flexible, and the projecting electrodes being extremely similar to the circuit terminal portions. An object of the present invention is to provide a method for connecting circuits using an insulating adhesive when the aspect ratio is large.

【0009】[0009]

【課題を解決するための手段】本発明は、上記目的を達
成するために、絶縁基板に形成された多数の回路と相対
峙する回路とを接着剤によって接続する回路の接続方法
において、少なくとも一方の回路は回路幅70μm以
下、ピッチ150μm以下で、破断伸び率が10%以上
の可撓性基板上に形成され、当該回路と相対峙する回路
との間に絶縁性接着剤を介在させて両回路を位置合せ
し、接続部の長さLと回路幅Wとの比(L/W)を40
以上として、加圧下で両回路を接触させるとともに上記
接着剤を硬化することを特徴とする回路の接続方法。
SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a method of connecting a circuit for connecting a large number of circuits formed on an insulating substrate and opposing circuits by using an adhesive. Is formed on a flexible substrate having a circuit width of 70 μm or less, a pitch of 150 μm or less, and a breaking elongation of 10% or more. An insulating adhesive is interposed between the circuit and the opposing circuit. The circuit is aligned, and the ratio (L / W) of the connection length L to the circuit width W is 40.
As described above, a method of connecting circuits, wherein both circuits are brought into contact with each other under pressure and the adhesive is cured.

【0010】本発明を以下図面を参照しながら説明す
る。
The present invention will be described below with reference to the drawings.

【0011】図1は、本発明の回路接続方法を示す断面
模式図である。可撓性基板1は、破断伸び率(以下伸び
率という)10%以上の膜状物であり、例えばポリイミ
ドやポリエチレンテレフタレート及びその他のプラスチ
ックフィルムである。特にポリイミドは機械的強度が大
きいことや、熱膨脹率が一般的に50×10-6/℃以下
と比較的小さいので、回路接続時の熱膨脹により相対峙
する回路とのズレ(以下回路ズレという)が少ない。こ
れらの可撓性基板1の引張弾性率は、1000kg/m
2 以下が好ましい。
FIG. 1 is a schematic sectional view showing a circuit connection method according to the present invention. The flexible substrate 1 is a film having a breaking elongation (elongation) of 10% or more, such as polyimide, polyethylene terephthalate, and other plastic films. In particular, polyimide has a large mechanical strength and a relatively low coefficient of thermal expansion of generally 50 × 10 −6 / ° C. or less. Therefore, a deviation from a circuit that is opposed by thermal expansion at the time of circuit connection (hereinafter referred to as a circuit deviation). Less is. The tensile modulus of these flexible substrates 1 is 1000 kg / m
m 2 or less is preferred.

【0012】伸び率が10%以上である理由は、接続時
の加圧により多数の回路間の平担性を得るためのクッシ
ョン機的な作用を得るためである。伸び率は大きい方が
可撓性が大きいので好ましいが、伸び率が大きくなると
前述の回路ズレも一般的に大きくなってしまうため、伸
び率15〜150%が好ましく、同様な理由から20〜
〜90%とすることが更に好ましい。ここで本発明の伸
び率や弾性率は、ASTM−D−882によるものとす
る。
The reason why the elongation percentage is 10% or more is to obtain a cushion-like action for obtaining flatness among a large number of circuits by applying pressure during connection. It is preferable that the elongation percentage is large because the flexibility is high. However, when the elongation percentage is large, the above-described circuit deviation generally increases.
More preferably, it is set to 90%. Here, the elongation and the elastic modulus of the present invention are based on ASTM-D-882.

【0013】可撓性基板1の厚みは、20〜130μm
が強度及び価格面から好ましい。
The thickness of the flexible substrate 1 is 20 to 130 μm
Is preferred in terms of strength and cost.

【0014】接着剤2は、可撓性基板1と回路3との接
着を目的とするもので、必要に応じて取捨される。接着
剤2の有る場合は、前記可撓性基板1と同様、接続時の
回路の平坦性が得易いことから好ましく、接着剤2の無
い場合は回路の高密度化や耐熱性の向上が可能となる。
The adhesive 2 is used for bonding the flexible substrate 1 and the circuit 3 and is discarded as required. If the adhesive 2 is provided, it is preferable because the circuit can be easily flattened at the time of connection, as in the case of the flexible substrate 1. If the adhesive 2 is not provided, it is possible to increase the density of the circuit and improve the heat resistance. Becomes

【0015】回路3の材質は特に限定しないが、経済性
の点からCuが好ましい。また、表面が粗化等により凹
凸が形成されたり、Sn,Zn,Au,半田などのメッ
層等の被覆層の存在により、回路の表面が粗さ0.1〜
10μm程度に凹凸化すると、他の接続すべき回路との
接触が容易となり好ましい。
The material of the circuit 3 is not particularly limited, but Cu is preferable in terms of economy. In addition, the surface of the circuit has a roughness of 0.1 to 10 due to the formation of irregularities due to surface roughening or the like, or the presence of a coating layer such as a coating layer of Sn, Zn, Au, solder, or the like.
It is preferable to make the surface uneven to about 10 μm because the contact with another circuit to be connected becomes easy.

【0016】回路3の製法は特に問わないが、電解法は
前述の表面粗化を得易く、圧延法やアディティブ法は回
路の高精細品が得易いので、これらの特徴により適宜選
択する。
The method of manufacturing the circuit 3 is not particularly limited, but the electrolytic method is easy to obtain the above-described surface roughening, and the rolling method and the additive method are easy to obtain a high-definition circuit.

【0017】回路3の高さHは、可撓性基板1の厚みT
以下とすることが好ましい。この比(H/T)は、可撓
性基板1の伸び率が大きな程小さく出来るが、0.2〜
0.9、更に好ましくは0.3〜0.8とすることが接
続時の回路ズレと高さの平担性を両立できるので好まし
い。
The height H of the circuit 3 is determined by the thickness T of the flexible substrate 1.
It is preferable to set the following. This ratio (H / T) can be reduced as the elongation percentage of the flexible substrate 1 increases,
0.9, and more preferably 0.3 to 0.8 is preferable because both circuit deviation and height flatness at the time of connection can be achieved.

【0018】Pを回路ピッチ、Wを回路の頂部の幅とす
ると、本発明ではW=70μm以下、P=150μm以
下、より好ましくはW=45μm以下、P=90μmが
適用できる。
Assuming that P is the circuit pitch and W is the width of the top of the circuit, the present invention can apply W = 70 μm or less, P = 150 μm or less, more preferably W = 45 μm or less, and P = 90 μm.

【0019】なお、図1には示していないが、回路頂部
と基板側の底部の幅が等しいものや、頂部の幅が底部よ
り大の場合であっても、本発明は実施可能である。
Although not shown in FIG. 1, the present invention can be practiced even when the width of the top of the circuit is equal to the width of the bottom on the substrate side, or when the width of the top is larger than the width of the bottom.

【0020】Wが70μmより大きいと、接続時の余剰
の接着剤の排除が不十分となり、Pが150μmより大
きいと、スペース部における接着性が不十分となる。
When W is larger than 70 μm, the excess adhesive is not sufficiently removed at the time of connection, and when P is larger than 150 μm, the adhesiveness in the space becomes insufficient.

【0021】本発明は、これらの値がより小さくなって
も適用できる点が特徴である。
The present invention is characterized in that it can be applied even if these values become smaller.

【0022】接続部の長さLは、図2に模式的に示した
ように、回路の長さ方向で接着剤の形成される距離とす
る。すなわち、接続前における接着剤4の形成される長
さか、または接続後における回路の対峙する距離であ
り、両者で異なる場合は距離の短かい方を採用する。こ
こで、回路幅との比、すなわち(L/W)を40以上、
好ましくは60以上とすることが、接続部における接触
点が増加し好ましい。
The length L of the connecting portion is, as schematically shown in FIG. 2, the distance over which the adhesive is formed in the length direction of the circuit. That is, it is the length of the adhesive 4 formed before the connection, or the distance of the circuit after the connection after the connection, and if both are different, the shorter distance is adopted. Here, the ratio to the circuit width, that is, (L / W) is 40 or more,
Preferably, it is set to 60 or more, because the number of contact points at the connection portion increases.

【0023】(L/W)は大きい方が好ましいが、実装
面積が拡大してしまうため、上限は300程度である。
この比は60〜200が好ましく、65〜150とする
ことが更に好ましい。
Although it is preferable that (L / W) is large, the upper limit is about 300 because the mounting area increases.
This ratio is preferably from 60 to 200, and more preferably from 65 to 150.

【0024】絶縁性接着剤4は、回路3,6のどちらか
に塗布すればよく、またフィルム状の場合はどちらかに
貼付けても良い。フィルム状の場合には、図1に示した
ように回路3,6に貼付けずに、位置合わせをしながら
両回路を一度に接続することも可能である。
The insulating adhesive 4 may be applied to one of the circuits 3 and 6, or may be applied to either of the circuits 3 and 6. In the case of a film, it is also possible to connect both circuits at once while positioning them without attaching them to the circuits 3 and 6 as shown in FIG.

【0025】絶縁性接着剤4は、前述のように液状でも
固形でも良いが、フィルム状であると、液状の場合に比
べ塗布工程が不要であり、又一定厚みの連続テープ状で
の入手が可能なことから、製造工程を自動化し易いので
好ましい。
As described above, the insulating adhesive 4 may be liquid or solid, but when it is in the form of a film, an application step is not required as compared with the case of a liquid, and it is necessary to obtain a continuous tape having a constant thickness. Since it is possible, it is preferable because the manufacturing process can be easily automated.

【0026】絶縁性接着剤4の材料としては、接着シー
ト等に用いられる熱可塑性材料や、熱や光により硬化性
を示す材料が広く適用できる。接続後の耐熱性や耐湿性
に優れることから、硬化性材料の適用が好ましい。中で
もエポキシ系接着剤は、短時間での硬化が可能で、接続
作業性が良く、また分子構造上、接着性に優れる等の特
徴から好ましく適用できる。
As the material of the insulating adhesive 4, a thermoplastic material used for an adhesive sheet or the like, or a material which is curable by heat or light can be widely applied. The use of a curable material is preferred because of its excellent heat resistance and moisture resistance after connection. Among them, an epoxy adhesive can be preferably applied because it can be cured in a short time, has good connection workability, and has excellent molecular structure and excellent adhesiveness.

【0027】エポキシ系接着剤は、例えば高分子量エポ
キシ樹脂、固形エポキシ樹脂と液状エポキシ樹脂、及び
ウレタンやポリエステル、NBR等で変性したエポキシ
樹脂などを主成分とし、これに潜在性硬化剤やカップリ
ング剤及び他のポリマーなどの各種変性剤、触媒等を添
加した系から成るものが一般的である。これらの接着剤
は、室温近辺で粘着性を有すると、回路の位置合せ後の
仮固定が簡単で好ましい。
The epoxy-based adhesive mainly comprises, for example, a high-molecular-weight epoxy resin, a solid epoxy resin and a liquid epoxy resin, and an epoxy resin modified with urethane, polyester, NBR, or the like. In general, the system comprises a system to which various modifiers such as an agent and another polymer, a catalyst and the like are added. If these adhesives have tackiness at around room temperature, temporary fixing after circuit alignment is simple and preferable.

【0028】厚みは、接続すべき相方の回路高さを考慮
して、接続後に回路間のスペース部を充填できる程度に
決定するが、5〜40μmが一般的である。
The thickness is determined so that the space between the circuits can be filled after the connection in consideration of the height of the circuit to be connected, and is generally 5 to 40 μm.

【0029】ここに本発明でいうエポキシ樹脂は、1分
子内に2個以上のエポキシ基を有する化合物であり、各
種の材料が適用できる。
The epoxy resin referred to in the present invention is a compound having two or more epoxy groups in one molecule, and various materials can be applied.

【0030】また、潜在性硬化剤は、エポキシ樹脂の共
存下で30℃以下で1ヶ月以上の保存性を有し、加熱下
で急速硬化するものをいう。
The latent curing agent refers to a latent curing agent having a shelf life of at least one month at 30 ° C. or lower in the coexistence of an epoxy resin and rapidly curing under heating.

【0031】潜在化の手段は特に限定しないが、例えば
室温ではエポキシ樹脂に溶解しないが、融点近辺まで加
熱することで溶解して急激に反応する、例えばホウ素醋
塩,ヒドラジド、3級アミン,イミダゾール,ジシアン
ジアミド等やこれらの誘導体,アミンイミド等の熱分解
型硬化剤,モレキュラーシーブ封入型及びマイクロカプ
セル型等がある。これらは、単独もしくは2種以上混合
して使用することもできる。
The means for latentization is not particularly limited. For example, it does not dissolve in an epoxy resin at room temperature, but dissolves and rapidly reacts when heated to around the melting point. For example, boron acetate, hydrazide, tertiary amine, imidazole , Dicyandiamide and the like, derivatives thereof, thermal decomposition type curing agents such as amine imide, molecular sieve encapsulation type and microcapsule type. These can be used alone or in combination of two or more.

【0032】以上の中では、マイクロカプセル型硬化剤
が好ましく適用できる。マイクロカプセル型硬化剤は、
硬化剤よりなる核材の実質的な全表面が被覆層により覆
われてなる。マイクロカプセル型硬化剤の核材である硬
化剤は、脂肪族アミン、芳香族アミン、カルボン酸無水
物、チオール、アルコール、フェノール、イソシアネー
ト、第三級アミン、ホウ素錯塩、無機酸、ヒドラジド化
合物及びイミダゾール化合物など、及びこれらの変性物
が採用できる。
Among the above, a microcapsule type curing agent can be preferably applied. The microcapsule type curing agent is
Substantially all surfaces of the core material made of the curing agent are covered with the coating layer. The hardening agent which is the core material of the microcapsule type hardening agent includes aliphatic amine, aromatic amine, carboxylic anhydride, thiol, alcohol, phenol, isocyanate, tertiary amine, boron complex salt, inorganic acid, hydrazide compound and imidazole Compounds and the like and modified products thereof can be employed.

【0033】これらの中では、速硬化性で接着作業性に
優れ、またイオン重合型で触媒的に作用するので化学当
量的な考慮の少なくてよい第三級アミン、ホウ素錯塩、
ヒドラジド化合物及びイミダゾール化合物が好ましく、
中でも誘導体の種類により活性化温度を広範囲に制御し
易いイミダゾール化合物及びその変性物がより好ましく
用いられる。これらは単独若しくは2種以上の混合体と
して使用される。
Of these, tertiary amines, boron complex salts, which can be cured quickly and are excellent in bonding workability, and which can act as a catalyst in an ionic polymerization type so that their chemical equivalents can be reduced.
Hydrazide compounds and imidazole compounds are preferred,
Among them, an imidazole compound whose activation temperature is easily controlled in a wide range depending on the type of the derivative and a modified product thereof are more preferably used. These are used alone or as a mixture of two or more.

【0034】絶縁性接着剤4は、可能な限り低温硬化性
の物が好ましく、この時紫外線(UV)を併用すること
も可能である。
The insulating adhesive 4 is preferably a material which is curable at a low temperature as much as possible. At this time, ultraviolet rays (UV) can be used together.

【0035】硬化後の接着剤の伸び率は,10%以下、
より好ましくは1〜5%とすることが接続後の可撓性基
板1の変形による剥離を防止できるので好ましい。
The elongation percentage of the cured adhesive is 10% or less,
More preferably, the content is set to 1 to 5%, because peeling due to deformation of the flexible substrate 1 after connection can be prevented.

【0036】絶縁性接着剤4には、隣接回路との絶縁性
を損わない程度の導電粒子を必要に応じて少量含有する
ことが出来る。
The insulative adhesive 4 may contain a small amount of conductive particles as required, which does not impair the insulation with the adjacent circuit.

【0037】この時、導電粒子の最大粒径は、隣接回路
の間隙未満とする必要があり、平均粒径で10μm以下
が好ましく、0.5〜7μmとすることが更に好まし
い。0.5μm未満では分散性が低下してリークが発生
し易く、10μmをこすと接続部の電極間の距離が増大
し、各々信頼性が低下する傾向にある。
At this time, the maximum particle size of the conductive particles must be smaller than the gap between the adjacent circuits, and the average particle size is preferably 10 μm or less, more preferably 0.5 to 7 μm. If it is less than 0.5 μm, the dispersibility is reduced and leakage is likely to occur. If it is less than 10 μm, the distance between the electrodes of the connection part increases, and the reliability tends to decrease.

【0038】接着剤中への添加量は0.01〜1.0体
積%であり、好ましくは0.8体積%以下、さらに好ま
しくは0.1体積%以下である。
The amount added to the adhesive is 0.01 to 1.0% by volume, preferably 0.8% by volume or less, more preferably 0.1% by volume or less.

【0039】平均粒径や添加量を、従来の異方導電性接
着剤で多用されているものに比べて小径で少量とする理
由は、本発明の導電粒子は回路の凹凸形成材として補助
的に作用すれば良く、更に添加量が少ないと接着剤中へ
の粒子の分散性も向上し、隣接回路間の絶縁性が得易い
為である。
The reason why the average particle diameter and the amount of addition are smaller and smaller than those frequently used in conventional anisotropic conductive adhesives is that the conductive particles of the present invention are used as auxiliary materials for forming unevenness of a circuit. This is because, if the addition amount is small, the dispersibility of the particles in the adhesive is also improved, and insulation between adjacent circuits is easily obtained.

【0040】基板5は、前述の可撓性基板1と同様な可
撓性基板でも良いが、可撓性基板1よりも剛性である
と、本発明で得た接続構造体が変形し難く強固となるの
で好ましい。基板5としては、ガラス,セラミック,樹
脂及びこれらの複合体などが例示できる。
The substrate 5 may be a flexible substrate similar to the above-described flexible substrate 1. However, if the substrate 5 is more rigid than the flexible substrate 1, the connection structure obtained according to the present invention is hardly deformed and rigid. Is preferable. Examples of the substrate 5 include glass, ceramic, resin, and a composite thereof.

【0041】また回路6は、回路3と同様なものや、透
明導電膜に多用されるITO,Ni,Cr,Au,T
a,半田など各種材料が適用可能である。
The circuit 6 is the same as the circuit 3 or ITO, Ni, Cr, Au, T
Various materials such as a and solder can be applied.

【0042】次に接続の方法を説明する。Next, a connection method will be described.

【0043】例えば図1のように、回路3,6の間に絶
縁性接着剤4を介在させ、回路3と6を位置合わせし、
可撓性基板1と基板5を加熱加圧する。この時、温度は
50〜200℃程度、圧力は5〜100kgf/cm2 程度で
ある。加熱加圧により、絶縁性接着剤5は粘度が著しく
低下し、回路3と6との一部もしくは全部が接触し、回
路3,6間で導通可能となる。従ってこの時、導通状態
の検査を接着剤が未硬化の状態で行うことも出来る。
For example, as shown in FIG. 1, an insulating adhesive 4 is interposed between the circuits 3 and 6, and the circuits 3 and 6 are aligned.
The flexible substrate 1 and the substrate 5 are heated and pressed. At this time, the temperature is about 50 to 200 ° C., and the pressure is about 5 to 100 kgf / cm 2 . Due to the heating and pressurization, the viscosity of the insulating adhesive 5 is remarkably reduced, and a part or all of the circuits 3 and 6 come into contact with each other, so that the circuits 3 and 6 can be conducted. Therefore, at this time, the inspection of the conduction state can be performed in a state where the adhesive is not cured.

【0044】加圧により、余剰の絶縁性接着剤5は回路
間のスペースを経て、さらに接続部の長さL部分の外側
にはみ出す。
Due to the pressurization, the surplus insulating adhesive 5 passes through the space between the circuits and protrudes outside the length L of the connection portion.

【0045】加熱の継続により、絶縁性接着剤5は硬化
に至り、回路3,6の強固な接続が可能となる。
As the heating is continued, the insulating adhesive 5 is cured, and the circuits 3 and 6 can be firmly connected.

【0046】端部にはみ出した接着剤は、接着の補強や
接続部の防湿材として作用するので、必要に応じて除去
すればよい。
The adhesive that has protruded to the ends acts as reinforcement for bonding and as a moisture-proof material for the connection portion, and may be removed as necessary.

【0047】図3に、上記の如くして得られた構造体の
断面模式図を示す。
FIG. 3 shows a schematic sectional view of the structure obtained as described above.

【0048】[0048]

【作用】本発明で、可撓性基板の伸び率を10%以上と
し、合わせて回路幅70μm以下でその高さを可撓性基
板の厚み以下とすることで、回路高さのバラツキを可撓
性基板の変形により吸収可能となり、接続時の信頼性が
向上する。
According to the present invention, variations in the circuit height can be achieved by setting the elongation percentage of the flexible substrate to 10% or more, the circuit width to 70 μm or less, and the height to the thickness of the flexible substrate or less. Absorption can be achieved by deformation of the flexible substrate, and reliability at the time of connection is improved.

【0049】また、回路幅を70μm以下と微細化する
ことで、接続時における回路接触部以外への接着剤の流
出を促進させて、接続回路の良好な接触を得る。この
時、回路のアスペクト比が40以上と大きいので、回路
の長さ方向での接触確率が増加し、接続信頼性が向上す
る。
Further, by miniaturizing the circuit width to 70 μm or less, it is possible to promote the outflow of the adhesive to portions other than the circuit contact portion at the time of connection, thereby obtaining good contact of the connection circuit. At this time, since the aspect ratio of the circuit is as large as 40 or more, the contact probability in the length direction of the circuit is increased, and the connection reliability is improved.

【0050】更に、本発明においては、接着剤中に隣接
回路との絶縁性を損わない程度に導電粒子を極少量添加
することが可能であり、この場合の導電粒子は回路上の
微小凹凸形成材として作用するので接触確率が向上し、
また回路表面の汚染層を破壊する等により良好な回路の
接触ができるので、更に接続信頼性の向上が可能とな
る。
Further, in the present invention, it is possible to add a very small amount of conductive particles to the adhesive so as not to impair the insulating property with respect to the adjacent circuit. Because it acts as a forming material, the contact probability is improved,
Further, good circuit contact can be made by, for example, destroying a contaminated layer on the circuit surface, so that connection reliability can be further improved.

【0051】また、接着剤はエボキシ樹脂と潜在性硬化
剤を必要成分とするフィルム状であることから、使用ま
での長期保存と、短時間硬化の両立が可能で、微小接続
部の強度や耐環境性が向上する。
Further, since the adhesive is in the form of a film containing an ethoxy resin and a latent curing agent as necessary components, long-term storage until use and curing in a short time can be achieved at the same time, and the strength and resistance of the minute connection portion can be improved. The environment is improved.

【0052】また、接続部外にはみ出して硬化した接着
剤は、機械的補強及び防湿層として作用する。
Further, the adhesive which has protruded out of the connection portion and hardened acts as a mechanical reinforcing and moisture-proof layer.

【0053】[0053]

【実施例】以下、本発明の実施例を比較例と対比しなが
ら説明するが、本発明はこれらの実施例に限定されるも
のではない。 [実施例1〜3及び比較例1]ユーピレックスS(宇部
興産(株)製ポリイミドフィルム,厚み25μm,伸び
率30%,引張弾性率900kg/cm2 )上に、接着剤層を介
して高さ18μmのCu回路(W=30μm、P=70
μm、表面に0.5μmのSnめっき)を有するFPC
と、この回路と相対峙する厚み2000AのITO回路
を形成したガラス基板(厚み1.1mm)を準備した。
EXAMPLES Examples of the present invention will be described below in comparison with comparative examples, but the present invention is not limited to these examples. [Examples 1 to 3 and Comparative Example 1] The height of UPILEX S (polyimide film manufactured by Ube Industries, Ltd., thickness 25 μm, elongation 30%, tensile modulus 900 kg / cm 2 ) via an adhesive layer 18 μm Cu circuit (W = 30 μm, P = 70
FPC with 0.5 μm Sn plating on the surface
Then, a glass substrate (thickness: 1.1 mm) on which an ITO circuit having a thickness of 2000 A facing the circuit was formed was prepared.

【0054】ビスフェノールA型固形エポキシ樹脂(エ
ポキシ当量4.000)/液状エポキシノボラック樹脂
(エポキシ当量178)/マイクロカプセル型硬化剤
(旭化成工業(株)製HX−3721:イミダゾール系
硬化剤を核とし、表面をポリウレタン系材料で被覆した
硬化剤を液状ビスフェノール系エポキシ中に分散したマ
スターバッチ)の比を、30/50/20とした絶縁性
接着剤中に、ニッケル287(インターナショナルニッ
ケル社製,平均粒径2〜4μm)の含有量を、0(実施
例1),0.09体積%(実施例2),0.4体積%
(実施例3)及び2.0体積%(比較例1)と変化させ
て、剥離処理したポリエチレンテレフタレート(PE
T)フィルム上に形成した、厚み15μmの接着フィル
ムを用意した。
Bisphenol A type solid epoxy resin (epoxy equivalent: 4.000) / liquid epoxy novolak resin (epoxy equivalent: 178) / microcapsule type curing agent (HX-3721: manufactured by Asahi Kasei Kogyo Co., Ltd.) Nickel 287 (manufactured by International Nickel Co., Ltd., average) in an insulating adhesive having a ratio of 30/50/20, a masterbatch in which a curing agent having a surface coated with a polyurethane material dispersed in a liquid bisphenol epoxy. Content (particle size of 2 to 4 μm) is 0 (Example 1), 0.09% by volume (Example 2), 0.4% by volume.
(Example 3) and 2.0% by volume (Comparative Example 1) were changed to release-treated polyethylene terephthalate (PE).
T) An adhesive film having a thickness of 15 μm formed on the film was prepared.

【0055】この接着フィルムの硬化(200℃−10
分)後の伸び率は2.6〜3.5%であった。
Curing of the adhesive film (200 ° C.-10
Min), the elongation percentage was 2.6 to 3.5%.

【0056】上記接着フィルムを、ガラス基板上に幅2
mmで回路と直交するように仮接着し、PETフィルム
を除去し、次いで前記FPCの回路とガラス回路とを顕
微鏡下で位置合わせした。接着フィルムの粘着性によ
り、位置合わせ後の仮固定が容易であった。
The above adhesive film was placed on a glass substrate with a width of 2.
The film was provisionally adhered so as to be orthogonal to the circuit in mm, the PET film was removed, and then the FPC circuit and the glass circuit were aligned under a microscope. Temporary fixation after alignment was easy due to the tackiness of the adhesive film.

【0057】その後、170℃、30kgf/cm2 、30秒
間の加熱加圧により、両回路を接続部の長さ2mmで接
続し、熱衝撃試験後の接続部の抵抗を評価した。
Thereafter, both circuits were connected to each other with a connection length of 2 mm by heating and pressing at 170 ° C., 30 kgf / cm 2 for 30 seconds, and the resistance of the connection after the thermal shock test was evaluated.

【0058】結果を表1に示したが、接続抵抗は接続体
のガラス基板回路をコモンとし、可撓性基板の回路を他
の端子として、60℃の加熱下でマルチメータにより測
定した。1接続体中の200電極のなかに、3kΩ(配
線抵抗を含む)以上のある場合をオープン(×)とし、
3kΩ未満を良好(○)とした。
The results are shown in Table 1. The connection resistance was measured by a multimeter under heating at 60 ° C. using the glass substrate circuit of the connection body as a common terminal and the circuit of the flexible substrate as another terminal. If there are more than 3 kΩ (including wiring resistance) among 200 electrodes in one connection, it is regarded as open (x),
Less than 3 kΩ was regarded as good (○).

【0059】また、絶縁抵抗は、隣接回路間をハイメグ
オームメータで測定し、10MΩ未満をショートとして
(×)で示し、10MΩ以上は(○)で示した。
The insulation resistance between adjacent circuits was measured with a high-megohm meter, and less than 10 MΩ was indicated by (x) as a short circuit, and 10 MΩ or more was indicated by (○).

【0060】同表に示す如く、各実施例とも信頼性試験
後においても良好な接続抵抗と絶縁性を示した。
As shown in the table, each of the examples exhibited good connection resistance and insulation even after the reliability test.

【0061】しかし、比較例1は、従来の異方導電フィ
ルムによる接続のため、回路間のショートが発生した。
However, in Comparative Example 1, a short circuit occurred between the circuits due to the connection using the conventional anisotropic conductive film.

【0062】[0062]

【表1】 [実施例4〜6]実施例1のFPCを、カプトンK(ト
ーレ・デュポン(株)製,ポリイミドフィルム,厚み7
5μm,伸び85%、引長弾性率400kg/mm2
を用い、接着剤を介して高さ25μmのCu回路(W=
30μm,P=90μm,表面にZnベースの防錆処
理)を形成した。相対峙する回路として、厚さ1.1m
mのガラス基板上にCrを下地とし、その上にITO回
路を構成した回路板を用意した。
[Table 1] [Examples 4 to 6] The FPC of Example 1 was manufactured using Kapton K (manufactured by Torre Dupont, polyimide film, thickness 7).
5 μm, elongation 85%, elongation modulus 400 kg / mm 2 )
And a 25 μm-high Cu circuit (W =
30 μm, P = 90 μm, and a Zn-based rust preventive treatment) was formed on the surface. 1.1m thick as facing circuit
A circuit board was prepared in which a Cr substrate was formed on a m glass substrate and an ITO circuit was formed thereon.

【0063】実施例1〜3と同様な評価を行い、結果を
表1に示した。
The same evaluation as in Examples 1 to 3 was performed, and the results are shown in Table 1.

【0064】本実施例においても、良好な接続体がえら
れた。 [実施例7〜9]実施例1のFPC基材を、MCF−5
000I(日立化成工業(株)製,ポリイミド/Cuの
2層構造体,ポリイミドの伸び率20%,引張弾性率8
00kg/mm2 ,厚み25μm,Cu高さ18μm)と
し、その他の構成及び評価は実施例4〜6と同様とし
た。可撓性基板とCu間に接着剤のない、いわゆる2層
FPCの場合も良好な接続特性を示した。 [実施例10]ユーピレックスR(宇部興産(株)製ポ
リイミドフィルム,厚み25μm,伸び率130%,引
張弾性率380kg/mm2 )を可撓性基板とし、接着剤
層を介してCu高さ18μmの回路(W=60μm,P
=140μm)を用意した。接着フィルムとして、エポ
キシ樹脂(エポキシ当量470)とポリビニルブチラー
ル樹脂(酢酸ビニル成分2.0重量%,平均重合度50
0)およびHX−3721(前出)との比を60:2
0:20とし、ポリテトラフルオロエチレン基材上に厚
みが20μmの接着フィルムを形成した。このフィルム
の硬化後(200℃−10分)の伸び率は4.5%であ
った。相対峙する回路は、ガラス基板上にITOで構成
し、接続幅を3mmとした以外は、実施例1と同様に回
路の接続と評価を行った。結果を表1に示した。各実施
例とも良好な接続特性であった。 [比較例2]実施例10の回路を、W=90μm,P=2
00μmと変更した以外は、実施例10と同様な接続及
び評価を行った。結果を表1に示した。本例は回路幅が
広く、回路の接触部以外に接着剤が十分排除されなかっ
たので、評価時の加熱により接着剤が熱膨脹し、回路オ
ープンとなった。 [実施例11]実施例10の可撓性基板同士を、実施例
10と同様に接続評価した。表1に示したように、可撓
性基板同士でも、良好な接続特性を得た。
Also in this example, a good connection was obtained. [Examples 7 to 9] The FPC base material of Example 1 was replaced with MCF-5.
000I (manufactured by Hitachi Chemical Co., Ltd., polyimide / Cu two-layer structure, polyimide elongation 20%, tensile modulus 8)
(00 kg / mm 2 , thickness 25 μm, Cu height 18 μm), and other configurations and evaluations were the same as in Examples 4 to 6. Good connection characteristics were also exhibited in the case of a so-called two-layer FPC having no adhesive between the flexible substrate and Cu. Example 10 Upilex R (a polyimide film manufactured by Ube Industries, Ltd., thickness 25 μm, elongation 130%, tensile modulus 380 kg / mm 2 ) was used as a flexible substrate, and the Cu height was 18 μm via an adhesive layer. Circuit (W = 60 μm, P
= 140 μm). As an adhesive film, an epoxy resin (epoxy equivalent 470) and a polyvinyl butyral resin (vinyl acetate component 2.0% by weight, average polymerization degree 50)
0) and HX-3721 (supra) at a ratio of 60: 2
At 0:20, an adhesive film having a thickness of 20 μm was formed on the polytetrafluoroethylene substrate. The elongation of this film after curing (200 ° C. for 10 minutes) was 4.5%. The circuits facing each other were made of ITO on a glass substrate, and connection and evaluation of the circuits were performed in the same manner as in Example 1 except that the connection width was 3 mm. The results are shown in Table 1. Each of the examples had good connection characteristics. [Comparative Example 2] The circuit of Example 10 was replaced with W = 90 μm, P = 2
The same connection and evaluation as in Example 10 were performed, except that the thickness was changed to 00 μm. The results are shown in Table 1. In this example, since the circuit width was large and the adhesive was not sufficiently removed except for the contact portion of the circuit, the adhesive was thermally expanded by heating at the time of evaluation, and the circuit was opened. Example 11 The connection of the flexible substrates of Example 10 was evaluated in the same manner as in Example 10. As shown in Table 1, good connection characteristics were obtained between the flexible substrates.

【0065】[0065]

【発明の効果】以上詳述したように、絶縁された多数の
平行回路を一括して他の回路と接続する超微細回路の接
続が可能となった。
As described in detail above, it is possible to connect an ultrafine circuit for connecting a large number of insulated parallel circuits to other circuits at once.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明になる回路接続方法を示す断面模式図。FIG. 1 is a schematic sectional view showing a circuit connection method according to the present invention.

【図2】本発明になる回路接続方法を示す平面透視によ
る模式図。
FIG. 2 is a schematic plan perspective view showing a circuit connection method according to the present invention.

【図3】本発明になる回路接続方法により得られた構造
体の断面模式図。
FIG. 3 is a schematic cross-sectional view of a structure obtained by a circuit connection method according to the present invention.

【符号の説明】[Explanation of symbols]

1 可撓性基板 2 接着剤 3 回路 4 絶縁性接着剤 5 基板 6 回路 DESCRIPTION OF SYMBOLS 1 Flexible board 2 Adhesive 3 Circuit 4 Insulating adhesive 5 Substrate 6 Circuit

───────────────────────────────────────────────────── フロントページの続き (72)発明者 太田 共久 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (72)発明者 山口 豊 茨城県下館市大字小川1500番地 日立化 成工業株式会社 下館研究所内 (72)発明者 伊藤 達夫 茨城県下館市大字五所宮1150番地 日立 化成工業株式会社 五所宮工場内 (56)参考文献 特開 昭53−57481(JP,A) 特開 昭51−119732(JP,A) 特開 昭62−22383(JP,A) 特開 昭60−35595(JP,A) 特開 昭61−161793(JP,A) 特開 平4−109569(JP,A) 特開 昭62−254372(JP,A) 特開 平4−163992(JP,A) 特開 平6−85422(JP,A) (58)調査した分野(Int.Cl.6,DB名) H01R 43/00 H01R 43/02 H01R 9/09 H01R 4/00 - 4/22 H05K 3/36 ──────────────────────────────────────────────────の Continuing on the front page (72) Inventor, Kyohisa Ota, 1500, Oji, Oji, Shimodate-shi, Ibaraki Hitachi Chemical Co., Ltd. (72) Inventor: Tatsuo Ito, 1150 Goshomiya, Oaza, Shimodate, Ibaraki Pref. Hitachi Chemical Co., Ltd., Goshomiya Plant (56) References JP-A-53-57481 (JP, A) 51-119732 (JP, A) JP-A-62-22383 (JP, A) JP-A-60-35595 (JP, A) JP-A-61-161793 (JP, A) JP-A-4-109569 (JP, A A) JP-A-62-254372 (JP, A) JP-A-4-163992 (JP, A) JP-A-6-85422 (JP, A) (58) Fields investigated (Int. Cl. 6 , DB name) ) H01R 43/00 H01R 43/02 H01R 9/09 H01R 4/00- 4/22 H05K 3/36

Claims (4)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 絶縁基板に形成された多数の回路と相対
峙する回路とを接着剤によって接続する回路の接続方法
において、少なくとも一方の回路は回路幅70μm以
下、ピッチ150μm以下で、破断伸び率が10%以上
の可撓性基板上に形成され、当該回路と相対峙する回路
との間に絶縁性接着剤を介在させて両回路を位置合せ
し、接続部の長さLと回路幅Wとの比(L/W)を40
以上として、加圧下で両回路を接触させるとともに上記
接着剤を硬化することを特徴とする回路の接続方法。
1. A method for connecting a plurality of circuits formed on an insulating substrate and an opposing circuit by an adhesive, wherein at least one of the circuits has a circuit width of 70 μm or less, a pitch of 150 μm or less, and an elongation at break. Is formed on a flexible substrate of 10% or more, and the two circuits are aligned by interposing an insulating adhesive between the circuit and the opposing circuit, and the length L of the connection portion and the circuit width W Ratio (L / W) to 40
As described above, a method of connecting circuits, wherein both circuits are brought into contact with each other under pressure and the adhesive is cured.
【請求項2】 上記可撓性基板上に形成される上記回路
高さが可撓性基板の厚み以下であることを特徴とする請
求項1に記載の回路の接続方法。
2. The method according to claim 1, wherein the height of the circuit formed on the flexible substrate is equal to or less than the thickness of the flexible substrate.
【請求項3】 上記絶縁性接着剤がエポキシ樹脂と潜在
性硬化剤を主成分とするフィルム状であることを特徴と
する請求項1または2に記載の回路の接続方法。
3. The circuit connecting method according to claim 1, wherein the insulating adhesive is a film containing an epoxy resin and a latent curing agent as main components.
【請求項4】 上記絶縁性接着剤がエポキシ樹脂と潜在
性硬化剤を主成分とし、さらに導電粒子を0.01〜
1.0体積%含有してなるフィルム状であることを特徴
とする請求項1または2に記載の回路の接続方法。
4. The method according to claim 1, wherein the insulating adhesive comprises an epoxy resin and a latent curing agent as main components, and further comprises conductive particles of 0.01 to
3. The circuit connecting method according to claim 1, wherein the circuit is in the form of a film containing 1.0% by volume.
JP4055800A 1992-03-16 1992-03-16 Circuit connection method Expired - Lifetime JP2995993B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4055800A JP2995993B2 (en) 1992-03-16 1992-03-16 Circuit connection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4055800A JP2995993B2 (en) 1992-03-16 1992-03-16 Circuit connection method

Publications (2)

Publication Number Publication Date
JPH05258830A JPH05258830A (en) 1993-10-08
JP2995993B2 true JP2995993B2 (en) 1999-12-27

Family

ID=13008996

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4055800A Expired - Lifetime JP2995993B2 (en) 1992-03-16 1992-03-16 Circuit connection method

Country Status (1)

Country Link
JP (1) JP2995993B2 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000049432A (en) * 1998-07-30 2000-02-18 Hitachi Chem Co Ltd Connection member
JP3365367B2 (en) * 1999-09-14 2003-01-08 ソニーケミカル株式会社 COG mounting products and connection materials
JP2001081438A (en) * 1999-09-14 2001-03-27 Sony Chem Corp Connecting material
JP2002129127A (en) * 2000-10-20 2002-05-09 Shin Etsu Polymer Co Ltd Insulating adhesive, anisotropically electroconductive adhesive, heat sealing connector, and manufacturing method for heat sealing connctor
KR100491179B1 (en) 2001-11-21 2005-05-24 마츠시타 덴끼 산교 가부시키가이샤 Thinned circuit substrate and its manufacturing method
KR100637429B1 (en) 2003-10-24 2006-10-20 삼성에스디아이 주식회사 Plasma display device
JP4207838B2 (en) * 2004-04-30 2009-01-14 ソニーケミカル&インフォメーションデバイス株式会社 Connecting material
JP2006140052A (en) * 2004-11-12 2006-06-01 Three M Innovative Properties Co Connector with thermosetting adhesive film and method of connection using it
KR100718963B1 (en) * 2005-02-17 2007-05-16 엘지전자 주식회사 COF / TC package of plasma display panel
JP2006245453A (en) * 2005-03-07 2006-09-14 Three M Innovative Properties Co Method of connecting flexible printed circuit board to other circuit board
JP2012199262A (en) * 2011-03-18 2012-10-18 Seiko Epson Corp Circuit board, connection structure and method for connecting circuit board

Also Published As

Publication number Publication date
JPH05258830A (en) 1993-10-08

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