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JP2998623B2 - Method for producing low alpha ray lead - Google Patents
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JP2998623B2 - Method for producing low alpha ray lead - Google Patents

Method for producing low alpha ray lead

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Publication number
JP2998623B2
JP2998623B2 JP34699995A JP34699995A JP2998623B2 JP 2998623 B2 JP2998623 B2 JP 2998623B2 JP 34699995 A JP34699995 A JP 34699995A JP 34699995 A JP34699995 A JP 34699995A JP 2998623 B2 JP2998623 B2 JP 2998623B2
Authority
JP
Japan
Prior art keywords
lead
dose
cph
sulfide
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP34699995A
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Japanese (ja)
Other versions
JPH09165691A (en
Inventor
裕美 持田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
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Mitsubishi Materials Corp
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Priority to JP34699995A priority Critical patent/JP2998623B2/en
Publication of JPH09165691A publication Critical patent/JPH09165691A/en
Application granted granted Critical
Publication of JP2998623B2 publication Critical patent/JP2998623B2/en
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Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、従来品よりも放射
性α粒子のカウント数(α線量)が格段に低く、経時的
にの低いα線量を維持する半導体材料用鉛の製造方法に
関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing lead for semiconductor materials in which the count number (.alpha. Dose) of radioactive .alpha.

【0002】[0002]

【従来技術】鉛は、ハンダの材料として電子機器の回路
の組立てに用いられるほかに、各種LSIのダイボンデ
ィングや装置部材接合用のろう材としてもその合金が多
用されている。またガラス成分としてパッケージの封止
材等にも用いられる。ところで、これらの電子機器で
は、半導体素子の高集積化に伴ない、ソフトエラーが問
題になっており、これは素子のパッケージ材などから放
出されるα線がその主な原因であることから、α線量が
極力少ない低α鉛が求められている。
2. Description of the Related Art Lead is used not only as a solder material for assembling circuits of electronic equipment, but also for its alloy as a brazing material for die bonding of various LSIs and bonding of device members. It is also used as a glass component as a sealing material for packages. By the way, in these electronic devices, a soft error has become a problem with the high integration of the semiconductor element. This is because α-rays emitted from the element packaging material are the main cause. There is a demand for low α lead with as little α dose as possible.

【0003】このようなα線量の少ない鉛を得る方法と
しては、スルファミン酸液を電解液として電解する方法
(特公昭62-47955号)や、鉛鉱石を重量分離してα線の
発生源となる母岩および脈石を除去し、酸素雰囲気下で
アルカリ還元する方法(特開平1-132725号)などが従来
知られている。
[0003] As a method of obtaining such a lead having a small α dose, a method of electrolyzing a sulfamic acid solution as an electrolytic solution (Japanese Patent Publication No. 62-47955) or a method of separating the weight of lead ore to a source of α rays is used. A method of removing host rocks and gangues and subjecting them to alkali reduction in an oxygen atmosphere (Japanese Patent Laid-Open No. 1-132725) and the like are conventionally known.

【0004】[0004]

【発明の解決課題】ここで、前者の電解精製方法によれ
ばフッ化水素酸を電解浴とする通常の電解法よりは格段
にα線量が少ない金属鉛を得ることができるが、電解に
供する鉛地金のα線量に大きく影響される。電解に供す
る鉛地金のα線量が高ければ本電解方法による低α化に
も限界がある。また鉛地金は、従来、方鉛鉱を主体とす
る鉛鉱石を焙焼して酸化鉛に転化して溶融還元するか、
あるいは酸化と同時に空気還元して得られるが、これら
の製錬方法では粗鉛の収率が低く、α線量の少ない鉛を
低コストで得るのが難しい。
According to the former electrolytic refining method, metallic lead having a much smaller α dose can be obtained as compared with a normal electrolytic method using hydrofluoric acid as an electrolytic bath. It is greatly affected by the alpha dose of lead metal. If the α dose of the lead metal used for electrolysis is high, there is a limit to the reduction of α by the present electrolysis method. Conventionally, lead ingots are conventionally roasted and converted to lead oxide, mainly of galena, and reduced by melting or
Alternatively, it is obtained by air reduction at the same time as oxidation. However, in these smelting methods, the yield of crude lead is low, and it is difficult to obtain lead with low α dose at low cost.

【0005】後者の上記アルカリ還元法は、α線の発生
源となる母岩や脈石を重量分離処理によって除去し、さ
らに鉛鉱石として出来るだけ粗く分散したものを用いて
いるが、原料鉱石の産出場所によってα線量が大幅に異
なり、産出場所の影響が大きいため、安定な品位の保つ
のが難しい。また、選鉱後の製錬方法は一般的な上記還
元法に従っており、このため粗鉛の収率が低く製造コス
トが嵩む問題がある。さらに低α化にも限界があり、得
られる粗鉛のα線量は電解直後は約0.01〜0.05
CPH/cm2 程度であるが、1〜2年経過後には上記値の約
10倍程度のα線量となる問題がある。
[0005] In the latter alkali reduction method, host rocks and gangues, which are sources of α-rays, are removed by weight separation, and lead ore is used as coarsely dispersed as possible. The α dose varies greatly depending on the place of production, and the influence of the place of production is large, so that it is difficult to maintain stable quality. In addition, the smelting method after the beneficiation follows the above-mentioned general reduction method, and therefore, there is a problem that the yield of crude lead is low and the production cost increases. Furthermore, there is a limit to the reduction of α, and the α dose of the obtained crude lead is about 0.01 to 0.05 immediately after electrolysis.
Although it is about CPH / cm 2 , there is a problem that after 1 to 2 years, the α dose becomes about 10 times the above value.

【0006】本発明は、従来の低α鉛における上記問題
を解決したものであって、従来品に比べて格段にα線量
が低く、しかも経時的に低α線量を維持する半導体材料
用鉛を収率よく製造する方法を提供することを目的とす
る。
The present invention solves the above-mentioned problems in the conventional low α lead, and provides a lead for semiconductor materials which has a significantly lower α dose than conventional products and which maintains a low α dose over time. It is an object of the present invention to provide a method for producing with high yield.

【0007】[0007]

【課題の解決手段】本発明によれば、請求項1、2に記
載される以下の半導体材料用低α線量鉛の製造方法が提
供される。 (1) 硫化鉛を、α線量が1CPH/cm2以下のアルミニ
ウムおよびフラックスと共に非酸化性雰囲気下で加熱溶
融することにより硫化鉛を脱硫還元して得た粗鉛をアノ
ードとし、実質的に放射性同位元素を含有しないスルフ
ァミン酸を電解液として電解精製することにより、4ナ
イン以上の品位を有し、放射性α粒子のカウント数が
0.05CPH/cm2以下の半導体材料用鉛を製造することを
特徴とする低α線鉛の製造方法。 (2) フラックスとしてα線量が1CPH/cm2以下の塩
化ナトリウムを用い、電解液中の鉛濃度30〜150g/
l、スルファミン酸濃度30〜150g/l、カソード電流
密度0.5〜2.0Amp/dm2で電解精製する請求項1に記
載の製造方法。
According to the present invention, there is provided the following method for producing low-alpha dose lead for semiconductor materials according to claims 1 and 2. (1) Lead sulfide is heated and melted in a non-oxidizing atmosphere together with aluminum and flux having an α dose of 1 CPH / cm 2 or less, and the lead is desulfurized and reduced. By electrolytically refining sulfamic acid containing no isotope as an electrolytic solution, it is possible to produce lead for semiconductor materials having a quality of 4 nines or more and a radioactive α particle count of 0.05 CPH / cm 2 or less. Characteristic method for producing low α-ray lead. (2) Using sodium chloride having an α dose of 1 CPH / cm 2 or less as a flux and a lead concentration of 30 to 150 g /
2. The method according to claim 1, wherein the electrolytic purification is carried out at a sulfamic acid concentration of 30 to 150 g / l and a cathode current density of 0.5 to 2.0 Amp / dm2.

【0008】[0008]

【発明の実施形態】以下に本発明を実施例と共に詳細に
説明する。(I)製錬工程 本発明の製造方法では、原料鉱石(硫化鉱)から鉛地金
を得る製錬工程において、従来の硫化鉛を焙焼して酸化
鉛に転じた後に還元する焙焼還元法、あるいは還元剤と
して炭酸ナトリウムを単独に用いる上記アルカリ還元剤
と異なり、硫化鉛をアルミニウムおよびフラックスと共
に加熱溶融し、酸化焙焼を行わず直接に還元脱硫して鉛
地金を得る。原料の硫化鉛(硫化鉛)は少量の銅や亜鉛
を含むものでも良い。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to embodiments. (I) Smelting Step In the manufacturing method of the present invention, in the smelting step of obtaining lead metal from raw material ore (sulfide ore), roasting reduction in which conventional lead sulfide is roasted and converted into lead oxide and then reduced. Unlike the alkaline reducing agent using sodium carbonate alone as a reducing agent or the method described above, lead sulfide is heated and melted together with aluminum and flux, and directly reduced and desulfurized without oxidizing and roasting to obtain a lead metal. Lead sulfide (lead sulfide) as a raw material may contain a small amount of copper or zinc.

【0009】アルミニウムを用いて金属酸化物を高温還
元する方法は一般にテルミット法として知られている
が、本発明はこれを硫化鉛の脱硫に用いる。この方法を
利用することにより原料の硫化鉛をアルミニウムによっ
て直接還元し、収率よく金属鉛を回収することができ
る。低α線鉛を得るには、このアルミニウムもα線源が
少ないものを用いる必要があり、具体的にはα線量が1
CPH/cm2 以下のものが用いられる。なお、金、銀の分析
において、鉄粉によって酸化鉛を直接還元する方法(鉄
釘法)が知られているが、アルミニウムに代え、鉄粉を
用いて硫化鉛を還元脱硫する方法では1300℃程度の
高温を必要とし、また粗鉛の回収歩留りが大幅に低い欠
点がある。
The method of reducing a metal oxide at a high temperature using aluminum is generally known as a thermite method, but the present invention uses it for desulfurization of lead sulfide. By using this method, lead sulfide as a raw material can be directly reduced by aluminum, and metallic lead can be recovered with a high yield. In order to obtain low α-ray lead, it is necessary to use aluminum having a small amount of α-ray source.
CPH / cm 2 or less is used. In the analysis of gold and silver, a method of directly reducing lead oxide with iron powder (iron nail method) is known. However, in the method of reducing and desulfurizing lead sulfide using iron powder instead of aluminum, 1300 ° C. However, there is a disadvantage that a relatively high temperature is required and the recovery yield of crude lead is significantly low.

【0010】アルミニウムと共に用いるフラックスは、
脱硫によって生じる硫化アルミや鉱石中の不純物を吸収
してスラグを形成すると共にアルミニウムの添加による
テルミット反応において発生する過剰な反応熱を緩和す
るものであり、このフラックスとしてはホウ酸ナトリウ
ム(Na2 B4 O7 )や塩化カルシウム(CaCl2 )などを
用いることができる。なお、低融点であって、しかもα
線量の少ないものとしては市販品では塩化ナトリウムが
最適である。
The flux used with aluminum is
It absorbs impurities in aluminum sulfide and ore generated by desulfurization to form slag and moderates excessive reaction heat generated in the thermite reaction due to the addition of aluminum. The flux is sodium borate (Na 2 B 4 O 7 ) or calcium chloride (CaCl 2 ) can be used. In addition, it has a low melting point and α
Sodium chloride is the best commercial product for low doses.

【0011】原料鉱石の硫化鉛にアルミニウムと共に塩
化ナトリウムを加え、非酸化性雰囲気下で加熱溶融する
と、次式に従い硫化鉛がアルミニウムにより脱硫還元さ
れて粗鉛が得られる。脱硫によって生成した硫化アルミ
は塩化ナトリウムに吸収されてスラグとなる。 PbS + NaCl + 2/3Al→ Pb + 1/3(Al2 S 3 ・2NaCl)
When sodium chloride is added to lead sulfide of a raw material ore together with aluminum and heated and melted in a non-oxidizing atmosphere, lead sulfide is desulfurized and reduced by aluminum according to the following formula to obtain crude lead. Aluminum sulfide generated by desulfurization is absorbed by sodium chloride to form slag. PbS + NaCl + 2 / 3Al → Pb + 1/3 (Al 2 S 3 · 2NaCl)

【0012】各原料の量は概ね上記反応式の当量比より
やや過剰に用いるのが好ましい。具体的には、硫化鉛1
00重量部に対し、アルミニウム10〜30重量部およ
び塩化ナトリウム20〜50重量部を用いるのが適当で
ある。これらの原料を溶融炉ないしルツボに装入し、非
酸化性雰囲気下、700〜1200℃の温度範囲で加熱
溶融する。この反応により、溶融炉ないしルツボの底部
に鉛地金が溜り、その上に硫化ナトリウムのスラグが堆
積する。この硫化ナトリウムのスラグには原料硫化鉛中
の他の不純物元素や鉱石中のシリカ分も併せて吸収さ
れ、鉛地金から除去される。
It is preferable that the amounts of the respective raw materials are used slightly in excess of the equivalent ratio in the above reaction formula. Specifically, lead sulfide 1
It is appropriate to use 10 to 30 parts by weight of aluminum and 20 to 50 parts by weight of sodium chloride with respect to 00 parts by weight. These raw materials are charged into a melting furnace or crucible, and are heated and melted in a non-oxidizing atmosphere at a temperature of 700 to 1200 ° C. By this reaction, lead metal accumulates at the bottom of the melting furnace or crucible, and slag of sodium sulfide is deposited thereon. This slag of sodium sulfide also absorbs other impurity elements in the raw material lead sulfide and silica in the ore, and is removed from the lead metal.

【0013】上記製錬方法における金属鉛の回収率は、
後述の実施例に示すように90%以上であり、従来の製
錬法の回収率に比較して格段に高い回収率が達成され
る。また、上記製錬方法においては、低α線量のアルミ
ニウムおよび塩化ナトリウムを用いることにより、α線
量が0.02CPH/cm2 以下の極めてα線量が低い鉛が得
られる。
The recovery rate of metallic lead in the above smelting method is as follows:
As shown in the examples described later, it is 90% or more, and a remarkably high recovery rate is achieved as compared with the recovery rate of the conventional smelting method. In addition, in the above-mentioned smelting method, by using aluminum and sodium chloride with a low α dose, lead having an α dose of 0.02 CPH / cm 2 or less and an extremely low α dose can be obtained.

【0014】(II)電解精製工程 上記製錬工程で得た低α線量の鉛地金を電解精製するこ
とにより、高品位の極低α線量の精製金属鉛を得る。電
解精製は、上記製錬工程で得た鉛地金をアノードとし、
実質的に放射性同位元素を含有しないスルファミン酸を
電解液として行う。液組成および電解条件は以下の範囲
が適当である。 電解液組成:鉛濃度30〜150 g/l、スルファミン酸
濃度30〜150 g/l、 液温:15〜50℃ カソード電流密度:0.5〜2.0Amp/dm2
(II) Electrolytic Refining Step The lead metal with a low α dose obtained in the smelting step is electrorefined to obtain a high-quality ultra-low α dose purified metal lead. Electrolytic refining, the lead metal obtained in the smelting process as an anode,
Sulfamic acid containing substantially no radioisotope is used as the electrolyte. The following ranges are suitable for the liquid composition and the electrolysis conditions. Electrolyte composition: lead concentration 30 to 150 g / l, sulfamic acid concentration 30 to 150 g / l, liquid temperature: 15 to 50 ° C. cathode current density: 0.5 to 2.0 Amp / dm 2

【0015】電解液として、実質的に放射性同位元素を
含有しないスルファミン酸を用いるが、これは市販のス
ルファミン酸で良い。スルファミン酸に代えて一般の鉛
電解精製で常用される珪フッ酸を電解液に用いるのは好
ましくない。市販の珪フッ酸にはトリウムの含有量が高
いので精製鉛のα線量が粗鉛よりも高くなる。
As the electrolytic solution, sulfamic acid containing substantially no radioisotope is used, and commercially available sulfamic acid may be used. It is not preferable to use silicic hydrofluoric acid, which is commonly used in general lead electrolytic refining, for the electrolytic solution instead of sulfamic acid. Since commercially available silicic hydrofluoric acid has a high thorium content, the α dose of purified lead is higher than that of crude lead.

【0016】電解液中の鉛濃度は30〜150g/l が適
当である。鉛濃度がこの範囲よりも低いと鉛以外の元素
も析出するのでこれが不純物となり品位が下がる。一
方、鉛濃度が上記範囲を越えると電解効率が低下する。
電解液中のスルファミン酸濃度は同様に30〜150g/
l が適当である。これよりスルファミン酸濃度が低いと
鉛の溶解が円滑に進まず、また、この濃度が上記範囲を
上回るとスルファミンの析出を生じるので好ましくな
い。
The lead concentration in the electrolyte is suitably from 30 to 150 g / l. If the lead concentration is lower than this range, elements other than lead are also precipitated, which become impurities and lower the quality. On the other hand, when the lead concentration exceeds the above range, the electrolytic efficiency decreases.
The concentration of sulfamic acid in the electrolytic solution is also 30 to 150 g /
l is appropriate. If the sulfamic acid concentration is lower than this, dissolution of lead does not proceed smoothly, and if the concentration exceeds the above range, precipitation of sulfamine occurs, which is not preferable.

【0017】電解液の液温は15〜50℃が適当であ
る。15未満では電解液の電気抵抗が大きくなるため電
解効率が低下し、50℃を越えると電解液の蒸発による
損失が大きななる。カソードの電流密度は0.5〜2.0
Amp/dm2が適当である。電流密度がこれよりも低いと電
解時間が長引き、また電流密度が上記範囲よりも高いと
鉛以外の元素が析出して不純物混入の原因となる。
The temperature of the electrolytic solution is suitably from 15 to 50 ° C. If it is less than 15, the electric resistance of the electrolytic solution becomes large, so that the electrolytic efficiency is lowered. The current density of the cathode is 0.5 to 2.0
Amp / dm 2 is appropriate. If the current density is lower than this, the electrolysis time will be prolonged, and if the current density is higher than the above range, elements other than lead will precipitate and cause impurity contamination.

【0018】(III) 精製鉛のα線量、品位 上記製造方法によって得られる精製鉛は、4ナイン以上
の品位を有し、放射性α粒子のカウント数が0.05CPH
/cm2以下である。従来の製造方法によって得られる精製
鉛のα線量は0.1CPH/cm2程度が限界であり、従って上
記製造方法によれば、α線量が従来品の1/2以下であ
り、長期間この低いα線量を維持する極低α線量の精製
鉛が得られる。
(III) α dose and quality of purified lead The purified lead obtained by the above-mentioned production method has a quality of 4 nines or more and a count of radioactive α particles of 0.05 CPH.
/ cm 2 or less. The α dose of purified lead obtained by the conventional manufacturing method is limited to about 0.1 CPH / cm 2. Therefore, according to the above manufacturing method, the α dose is less than half of that of the conventional product, and is low for a long time. An extremely low α dose of purified lead that maintains the α dose can be obtained.

【0019】[0019]

【実施例および比較例】以下に本発明の実施例を比較例
と共に示す。実施例1 表1に示す品位を有する原料鉛鉱石(方鉛鉱)500g
に塩化ナトリウム(純度97%、α線量 0.3CPH/cm2 )1
50gおよびアルミニウム粉(純度99%、α線量 0.1CP
H/cm2 )75gをグラファイトルツボにて混合し、ルツ
ボごと窒素雰囲気下の加熱炉内に装入し、200℃に加
熱して水分および酸素を除いた後、さらに1000℃で
2時間加熱して原料を溶融した。徐冷後、スラグとメタ
ル分を分離し、鉛地金を得た。アルカリ金属塩の種類お
よび添加量と共に粗鉛のα線量、品位および回収率を表
2に示した。この鉛地金を陽極とし、表2に示す電解液
組成および電解条件に従って鉛精製を行い精製金属鉛を
得た。この精製鉛の品位とα線量および収率を表2に併
せて示した。
Examples and Comparative Examples Examples of the present invention are shown below together with comparative examples. Example 1 500 g of raw lead ore (galena) having the grades shown in Table 1
Sodium chloride (purity 97%, α dose 0.3CPH / cm 2 )
50g and aluminum powder (99% purity, α dose 0.1CP
H / cm 2 ) 75 g were mixed in a graphite crucible, and the crucible was charged into a heating furnace under a nitrogen atmosphere, heated to 200 ° C. to remove moisture and oxygen, and further heated at 1000 ° C. for 2 hours. To melt the raw material. After slow cooling, the slag and the metal were separated to obtain a lead metal. Table 2 shows the α-ray dose, quality, and recovery of crude lead along with the type and amount of the alkali metal salt. Using this lead metal as an anode, lead was refined according to the electrolytic solution composition and electrolytic conditions shown in Table 2 to obtain purified metallic lead. Table 2 also shows the quality, α dose and yield of this purified lead.

【0020】実施例2 塩化ナトリウムに代えて炭酸ナトリウム(Na2 Co3 :純
度98%)200gを用いた他は実施例1と同様にして鉛
地金を得た。この鉛地金を陽極とし、表2に示す電解液
組成および電解条件に従って鉛精製を行い精製金属鉛を
得た。この結果を表2に間まとめて示した。
Example 2 A lead metal was obtained in the same manner as in Example 1 except that 200 g of sodium carbonate (Na 2 Co 3 : 98% purity) was used instead of sodium chloride. Using this lead metal as an anode, lead purification was carried out according to the electrolytic solution composition and electrolytic conditions shown in Table 2 to obtain purified metallic lead. The results are summarized in Table 2.

【0021】比較例1(酸化脱硫) 実施例1のアルミニウムと塩化ナトリウムに代えて炭酸
ナトリウム200gと塩化ナトリウム100gを用い、
空気を吹き込みながら800〜1000℃の温度に6時
間加熱して鉛地金を得た。この鉛地金を陽極とし、表2
に示す電解液組成および電解条件に従って鉛精製を行い
精製金属鉛を得た。この結果を表2にまとめて示した。
Comparative Example 1 (Oxidative Desulfurization) In place of aluminum and sodium chloride in Example 1, 200 g of sodium carbonate and 100 g of sodium chloride were used.
The lead metal was obtained by heating to a temperature of 800 to 1000 ° C. for 6 hours while blowing air. Using this lead metal as the anode, Table 2
In accordance with the electrolytic solution composition and the electrolytic conditions shown in Table 1, lead purification was performed to obtain purified metal lead. The results are summarized in Table 2.

【0022】比較例2(鉄釘法) 還元剤として鉄粉加え、炭酸ナトリウムおよびホウ酸ナ
トリウムと共に原料の硫化鉛を用いた他は実施例1と同
一条件で原料を加熱溶融し粗鉛を得た。この鉛地金を陽
極とし、表2に示す電解液組成および電解条件に従って
鉛精製を行い精製金属鉛を得た。この結果を表2にまと
めて示した。
Comparative Example 2 ( Iron nailing method) The raw material was heated and melted under the same conditions as in Example 1 except that iron powder was used as a reducing agent, and lead sulfide was used together with sodium carbonate and sodium borate. Was. Using this lead metal as an anode, lead purification was carried out according to the electrolytic solution composition and electrolytic conditions shown in Table 2 to obtain purified metallic lead. The results are summarized in Table 2.

【0023】[0023]

【表1】 [Table 1]

【0024】[0024]

【表2】 [Table 2]

【0025】表2の結果に示すように、本実施例の精製
鉛のα線量は電解直後0.005〜0.01CPH/cm2であ
り、これは2年経過後にはやや高くなるが0.03〜0.
05程度である。一方、比較例の精製鉛のα線量は、電
解直後は0.03〜0.05CPH/cm2であるが、2年経過
後には0.1〜0.15CPH/cm2となり、本発明の約2倍
以上である。
As shown in the results in Table 2, the α dose of the purified lead of this example is 0.005 to 0.01 CPH / cm 2 immediately after the electrolysis, and this becomes slightly higher after two years, but is increased to 0.1 CPH / cm 2 . 03-0.
It is about 05. On the other hand, the α dose of the purified lead of the comparative example is 0.03 to 0.05 CPH / cm 2 immediately after electrolysis, but is 0.1 to 0.15 CPH / cm 2 after 2 years. More than twice.

【0026】[0026]

【発明の効果】本発明によれば、従来は製造困難であっ
たα線量が0.05CPH/cm2以下の精製鉛を高収率で得る
ことができる。本発明によって得られる精製鉛は高品位
であり、かつα線量が極めて低く、長期間この低いα線
量を維持するので半導体材料用として最適であり、半導
体機器におけるメモリーのソフトエラーの防止に有利で
ある。
According to the present invention, purified lead having an α dose of 0.05 CPH / cm 2 or less, which was conventionally difficult to produce, can be obtained in high yield. The refined lead obtained by the present invention is of high quality and has an extremely low α-dose, and is suitable for semiconductor materials because it maintains this low α-dose for a long period of time, and is advantageous in preventing soft errors in memories in semiconductor devices. is there.

Claims (2)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 硫化鉛を、α線量が1CPH/cm2以下のア
ルミニウムおよびフラックスと共に非酸化性雰囲気下で
加熱溶融することにより硫化鉛を脱硫還元して得た粗鉛
をアノードとし、実質的に放射性同位元素を含有しない
スルファミン酸を電解液として電解精製することによ
り、4ナイン以上の品位を有し、放射性α粒子のカウン
ト数が0.05CPH/cm2以下の半導体材料用鉛を製造する
ことを特徴とする低α線鉛の製造方法。
1. Crude lead obtained by desulfurizing and reducing lead sulfide by heating and melting lead sulfide together with aluminum and a flux having an α dose of 1 CPH / cm 2 or less in a non-oxidizing atmosphere is used as an anode. Electrolytically refining sulfamic acid containing no radioisotope as an electrolytic solution to produce lead for semiconductor materials having a quality of 4 nines or more and a count of radioactive α particles of 0.05 CPH / cm 2 or less. A method for producing low α-ray lead, comprising:
【請求項2】 フラックスとしてα線量が1CPH/cm2
下の塩化ナトリウムを用い、電解液中の鉛濃度30〜1
50g/l、スルファミン酸濃度30〜150g/l、カソー
ド電流密度0.5〜2.0Amp/dm2で電解精製する請求項
1に記載の製造方法。
2. A sodium chloride having an α dose of 1 CPH / cm 2 or less as a flux, and a lead concentration of 30 to 1 in an electrolytic solution.
50 g / l, the production method according to claim 1, sulfamic acid concentration 30 to 150 g / l, the cathode current density 0.5~2.0Amp / dm 2 to electrorefining.
JP34699995A 1995-12-14 1995-12-14 Method for producing low alpha ray lead Expired - Lifetime JP2998623B2 (en)

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Application Number Priority Date Filing Date Title
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JPH09165691A JPH09165691A (en) 1997-06-24
JP2998623B2 true JP2998623B2 (en) 2000-01-11

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Publication number Priority date Publication date Assignee Title
JP5163988B2 (en) * 2009-03-23 2013-03-13 Jx日鉱日石金属株式会社 Electrolysis method of lead
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