JP2999883B2 - Masking film - Google Patents
Masking filmInfo
- Publication number
- JP2999883B2 JP2999883B2 JP4205302A JP20530292A JP2999883B2 JP 2999883 B2 JP2999883 B2 JP 2999883B2 JP 4205302 A JP4205302 A JP 4205302A JP 20530292 A JP20530292 A JP 20530292A JP 2999883 B2 JP2999883 B2 JP 2999883B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- water vapor
- light
- transmission rate
- vapor transmission
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000000873 masking effect Effects 0.000 title claims description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 25
- 230000005540 biological transmission Effects 0.000 claims description 21
- 239000002985 plastic film Substances 0.000 claims description 20
- 229920006255 plastic film Polymers 0.000 claims description 20
- 239000000126 substance Substances 0.000 claims description 20
- 239000010408 film Substances 0.000 description 61
- -1 polyethylene terephthalate Polymers 0.000 description 14
- 229920001577 copolymer Polymers 0.000 description 12
- 238000000034 method Methods 0.000 description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 description 10
- 239000005020 polyethylene terephthalate Substances 0.000 description 10
- 229920003002 synthetic resin Polymers 0.000 description 9
- 239000000057 synthetic resin Substances 0.000 description 9
- 230000008602 contraction Effects 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 150000002736 metal compounds Chemical class 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000049 pigment Substances 0.000 description 4
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 230000000903 blocking effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 229920001169 thermoplastic Polymers 0.000 description 3
- 239000004416 thermosoftening plastic Substances 0.000 description 3
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 2
- 239000005062 Polybutadiene Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 208000028659 discharge Diseases 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 2
- 229920002857 polybutadiene Polymers 0.000 description 2
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- ZSLUVFAKFWKJRC-IGMARMGPSA-N 232Th Chemical compound [232Th] ZSLUVFAKFWKJRC-IGMARMGPSA-N 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910052776 Thorium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 229940081735 acetylcellulose Drugs 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 229920000800 acrylic rubber Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000011928 denatured alcohol Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- RAPZEAPATHNIPO-UHFFFAOYSA-N risperidone Chemical compound FC1=CC=C2C(C3CCN(CC3)CCC=3C(=O)N4CCCCC4=NC=3C)=NOC2=C1 RAPZEAPATHNIPO-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、製版用マスキングフィ
ルムに係わり、特に、湿度による寸法変化を少なくした
マスキングフィルムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a masking film for plate making, and more particularly to a masking film in which a dimensional change due to humidity is reduced.
【0002】[0002]
【従来の技術及び発明が解決しようとする課題】従来の
マスキングフィルムは、ポリエチレンテレフタレートフ
ィルムのようなプラスティックフィルムの片面に、熱可
塑性合成樹脂を主体とするバインダー樹脂および染・顔
料を溶媒に溶解または分散させた溶液を塗布乾燥して遮
光性剥離層としており、プラスティックフィルムの片面
に、直接、遮光性剥離層が形成されていた。2. Description of the Related Art In a conventional masking film, a binder resin mainly composed of a thermoplastic synthetic resin and a dye / pigment are dissolved or dissolved in a solvent on one side of a plastic film such as a polyethylene terephthalate film. The dispersed solution was applied and dried to form a light-shielding release layer, and the light-shielding release layer was formed directly on one surface of the plastic film.
【0003】プラスティックフィルムには、光学適性
(透明度)、機械的強度、耐熱性、汎用性があって低価
格であるなどの要素から、ポリエチレンテレフタレート
のようなポリエステルが用いられている。近年では、自
動作図機により精密なパターンのカッティングが行われ
るようになった。高精度の自動作図機によるカッティン
グ作業に伴い、それまでの手作業では問題とならなかっ
たマスキングフィルムの湿度による伸縮が顕在化してき
た。すなわち、作図が長時間に及ぶ場合、その間の作業
環境の湿度が変化すると、マスキングフィルムが伸縮
し、前後でカッティングラインの食い違いが生じ、マス
クとしての用をなさなくなるという現象が往々にして起
きている。[0003] A polyester such as polyethylene terephthalate is used for a plastic film because of factors such as optical suitability (transparency), mechanical strength, heat resistance, versatility and low cost. In recent years, precise pattern cutting has been performed by an automatic drawing machine. Along with the cutting work using a high-precision automatic drawing machine, the expansion and contraction of the masking film due to humidity, which was not a problem in the manual work until then, has become apparent. In other words, when drawing for a long time, if the humidity of the working environment changes during that time, the masking film expands and contracts, the cutting line discrepancy occurs before and after, and the phenomenon that often becomes useless as a mask occurs. I have.
【0004】このような不都合が生じた場合には、作図
を再び初めからやり直すこととなり、多大な作業効率の
低下が生じていた。また、保管方法によっても、環境の
湿度変化によりフィルムの一部が吸湿により伸びて平面
性が保たれず、波を打った状態となるため、自動作図機
による作業に支障をきたすという難点もあった。[0004] When such inconvenience occurs, the drawing must be started again from the beginning, resulting in a great decrease in work efficiency. In addition, depending on the storage method, a part of the film is stretched due to moisture absorption due to a change in environmental humidity, the flatness is not maintained, and the film is in a wavy state. Was.
【0005】湿度による寸法の変化率が少ないプラステ
ィックも存在するが、光学適性(透明度)、機械的強
度、耐熱性、耐溶剤性などの要素から、ポリエステルに
代えて使用することができなかった。湿度の影響を少な
くするために、従来は、高価な空調システムを導入して
作業環境の安定化(湿度の安定化)をはかって対応して
いたが、潜在的に、湿度に安定なマスキングフィルムの
開発が望まれていた。[0005] While a small dimensional change rate due to humidity plastic is also present, optical suitability (transparency), mechanical strength, heat resistance, solvent resistance of any element, could not be used in place of the polyester. Conventionally, to reduce the effects of humidity, expensive air-conditioning systems were introduced to stabilize the work environment (stabilize the humidity). The development of was desired.
【0006】なお、包装材料の分野では、湿気透過防
止、食品の乾燥防止、臭気の進入防止などの目的で、水
蒸気透過率の低い物質の皮膜をプラスティックフィルム
表面に設けることは広く用いられているが、マスキング
フィルムの湿度に対する寸法安定化のために、水蒸気透
過率の低い物質の皮膜をプラスティックフィルムに設け
ることは行われていなかった。[0006] In the field of packaging materials, it is widely used to provide a film of a substance having a low water vapor transmission rate on the surface of a plastic film for the purpose of preventing moisture permeation, preventing food from drying, and preventing odor from entering. However, in order to stabilize the dimensions of the masking film against humidity, a film made of a substance having a low water vapor transmission rate has not been provided on the plastic film.
【0007】[0007]
【目的】本発明はこのような従来の難点に鑑みなされた
もので、湿度の影響が少ないマスキングフィルムを提供
することを目的とする。SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned conventional problems, and has as its object to provide a masking film which is less affected by humidity.
【0008】[0008]
【課題を解決するための手段】このような目的を達成す
るため本発明者は、鋭意研究を進めた結果、プラスティ
ックフィルムの両面を水蒸気透過率の低い物質の皮膜で
覆うことにより、湿度の影響が極めて少なくできること
を見いだし本発明を完成させた。本発明によるマスキン
グフィルムは、プラスティックフィルムの両面に、プラ
スティックフィルムより水蒸気透過率の低い物質の皮膜
を設け、少なくとも一方の皮膜上に遮光性剥離層を設け
たものである。Means for Solving the Problems To achieve such an object, the present inventors have made intensive studies and as a result, by covering both surfaces of a plastic film with a film of a substance having a low water vapor transmission rate, the influence of humidity is reduced. And found that the present invention can be reduced to a very low level, and completed the present invention. The masking film according to the present invention comprises a film of a substance having a lower water vapor permeability than the plastic film provided on both surfaces of the plastic film, and a light-shielding release layer provided on at least one of the films.
【0009】即ち、水蒸気透過率の低い物質は、大気中
からの水蒸気を極わずかしか透過させず、従って中央の
プラスティックフィルムに到達する水蒸気量を制限する
ため、従来より長時間に亘って安定な寸法を保つことが
できることによるものである。本発明に用いられるプラ
スティックフィルムとしては、ポリエチレンテレフタレ
ート、ポリプロピレン、ポリカーボネート、ポリ塩化ビ
ニル、ポリエチレン、ポリメタクリル酸エステルなどが
あるが、特に上記に限られない。That is, a substance having a low water vapor transmission rate transmits only a small amount of water vapor from the atmosphere, and thus limits the amount of water vapor reaching the central plastic film. This is because dimensions can be maintained. Examples of the plastic film used in the present invention include polyethylene terephthalate, polypropylene, polycarbonate, polyvinyl chloride, polyethylene, and polymethacrylate, but are not particularly limited thereto.
【0010】本発明に用いられる水蒸気透過率の低い物
質としては、珪素およびアルミニウム、チタン、セレ
ン、マグネシウム、バリウム、亜鉛、錫、インジウム、
カルシウム、タンタル、ジルコニウム、トリウム、タリ
ウム等の酸化物、またはハロゲン化物の単独または混合
物などの無機金属化合物、ガラスなどのセラミックス、
塩化ビニリデンと塩化ビニル、アクリロニトリルまたは
アクリルとの共重合体、ポリクロロトリフルオロエチレ
ン(PCTFE)、テトラフルオロエチレン・ヘキサフ
ルオロプロピレン共重合体(FEP)、テトラフルオロ
エチレン・パーフルオロアルキルビニルエーテル共重合
体(PFA)などの合成樹脂が好適である。The substance having a low water vapor transmission rate used in the present invention includes silicon and aluminum, titanium, selenium, magnesium, barium, zinc, tin, indium,
Inorganic metal compounds such as calcium, tantalum, zirconium, thorium, thallium, etc., or halides alone or in mixtures, ceramics such as glass,
Copolymer of vinylidene chloride with vinyl chloride, acrylonitrile or acrylic, polychlorotrifluoroethylene (PCTFE), tetrafluoroethylene / hexafluoropropylene copolymer (FEP), tetrafluoroethylene / perfluoroalkylvinyl ether copolymer ( Synthetic resins such as PFA) are preferred.
【0011】これらの物質のうち、無機金属化合物およ
びセラミックスは、合成樹脂に比較して、薄い膜厚でも
水蒸気の透過を制限する効果が高く、また、有機溶剤等
に対する溶解、膨潤がほとんどないため、この皮膜の上
に遮光性剥離層を設けるに際して塗料設計上の制約を受
けない等、水蒸気透過率の低い物質として、特に優れて
いる。Among these substances, inorganic metal compounds and ceramics have a high effect of restricting water vapor permeation even at a thin film thickness as compared with synthetic resins, and hardly dissolve or swell in organic solvents and the like. It is particularly excellent as a substance having a low water vapor transmission rate, for example, there is no restriction on paint design when providing a light-shielding release layer on this film.
【0012】これらの物質の水蒸気透過率は、無機金属
化合物(ポリエチレンテレフタレート12μmにSiO
20.04μmを蒸着したものを一例として)の場合に
は、約1g/m2/24hrsであり、ポリエチレンテ
レフタレートのみの40g/m2/24hrsに比べて
水蒸気透過率は著しく低下し、合成樹脂の場合にも、厚
さ100μmにおいて約0.2〜1.5g/m2/24
hrsであり、ポリエチレンテレフタレートの厚さ10
0μmにおける約6.9g/m2/24hrsに比べて
わずかな水蒸気透過率となっている。The water vapor transmission rate of these substances is determined by using an inorganic metal compound (polyethylene terephthalate 12 µm
If as an example what was deposited 2 0.04 .mu.m) is approximately 1g / m 2 / 24hrs, water vapor transmission rate is significantly reduced as compared to 40g / m 2 / 24hrs only polyethylene terephthalate, synthetic resin in each case, approximately in the thickness 100μm 0.2~1.5g / m 2/24
hrs and the thickness of polyethylene terephthalate is 10
It has become a little water vapor transmission rate as compared with about 6.9g / m 2 / 24hrs at 0 .mu.m.
【0013】プラスティックフィルム表面に、上記の水
蒸気透過率の低い物質の均一な皮膜を設ける方法は、無
機金属化合物、セラミックスの場合には、真空蒸着法、
スパッタリング法、イオンプレーティング法などが用い
られる。また合成樹脂の場合には、それらを有機溶剤に
溶解した塗料を塗布乾燥する方法、熱溶融して押し出し
塗工する方法、別途作成した合成樹脂フィルムを接着剤
を用いてラミネート加工する方法、真空蒸着法、スパッ
タリング法などの公知の方法が用いられる。The method of providing a uniform film of the above-mentioned substance having a low water vapor transmission rate on the surface of a plastic film includes an inorganic metal compound and, in the case of ceramics, a vacuum evaporation method.
A sputtering method, an ion plating method, or the like is used. In the case of synthetic resins, a method in which they are dissolved in an organic solvent and applied and dried, a method in which they are hot-melted and extruded, a method in which a separately prepared synthetic resin film is laminated using an adhesive, and a method in which vacuum is applied Known methods such as an evaporation method and a sputtering method are used.
【0014】上述の方法によりプラスティックフィルム
表面に設けられる水蒸気透過率の低い物質の皮膜の厚み
は、特に水蒸気透過率の低い無機金属化合物、セラミッ
クスなどの場合には、水蒸気透過率を十分に低くおさえ
て寸法安定性が得られ、皮膜がプラスティックフィルム
のフレキシビリティに追従できて、クラックの発生によ
る膜の脱落が防げる等の点から、0.01μmから0.
5μmの範囲が好適で、より好ましくは、0.02μm
から0.3μmの範囲である。The thickness of the film of a substance having a low water vapor transmission rate provided on the surface of the plastic film by the above-described method is particularly low in the case of inorganic metal compounds and ceramics having a low water vapor transmission rate. From 0.01 μm to 0.1 μm from the viewpoint that the film can follow the flexibility of the plastic film and the film can be prevented from falling off due to cracks.
The range of 5 μm is suitable, and more preferably 0.02 μm
From 0.3 to 0.3 μm.
【0015】また、合成樹脂の場合には、十分な寸法安
定性が得られ、マスキングフィルムとして厚すぎず取扱
いやすい、1μmから50μmの範囲が好適である。水
蒸気透過率の低い物質のプラスティックフィルムへの密
着性を強くさせるためには、予めフィルム面を接着性向
上のために放電処理、化学処理等の前処理またはアンカ
ー処理を行うことが好ましい。[0015] In the case of a synthetic resin, a range of 1 µm to 50 µm is preferable because sufficient dimensional stability is obtained and the masking film is not too thick and can be easily handled. In order to enhance the adhesion of the substance having a low water vapor transmission rate to the plastic film, it is preferable to perform a pre-treatment such as a discharge treatment or a chemical treatment or an anchor treatment in advance on the film surface in order to improve the adhesion.
【0016】水蒸気透過率の低い物質の皮膜の少なくと
も一方に設けられる遮光性剥離層は、熱可塑性合成樹脂
を主体とするバインダー樹脂および染・顔料を溶媒に溶
解または分散させた溶液を均一に塗布乾燥させてえられ
る。熱可塑性合成樹脂としては、塩化ビニル・酢酸ビニ
ル共重合体、塩化ビニル・塩化ビニリデン共重合体、塩
化ビニル・アクリル酸エステル共重合体、塩化ビニル・
酢酸ビニル・マレイン酸共重合体等の塩化ビニル共重合
体;アクリロニトリル・ブタジエンラバー;ニトロセル
ロース、アセチルセルロース等のセルロース;ポリビニ
ルホルマール、ポリビニルブチラール等のポリビニルア
セタール;アクリル樹脂;ポリ塩化ビニリデン、ポリ酢
酸ビニル;エチレン・酢酸ビニル共重合体;アクリルゴ
ム、アクリロニトリル・ブタジエンゴム;ポリウレタン
等を、場合により2種以上混合して使用することができ
るが、上記に限定されるものではない。The light-shielding release layer provided on at least one of the films of the substance having a low water vapor transmission rate is uniformly coated with a solution in which a binder resin mainly composed of a thermoplastic synthetic resin and a dye / pigment are dissolved or dispersed in a solvent. It can be dried. As thermoplastic synthetic resins, vinyl chloride / vinyl acetate copolymer, vinyl chloride / vinylidene chloride copolymer, vinyl chloride / acrylate copolymer, vinyl chloride / vinyl acetate copolymer
Vinyl chloride copolymer such as vinyl acetate / maleic acid copolymer; acrylonitrile / butadiene rubber; cellulose such as nitrocellulose and acetyl cellulose; polyvinyl acetal such as polyvinyl formal and polyvinyl butyral; acrylic resin; polyvinylidene chloride; An ethylene-vinyl acetate copolymer; an acrylic rubber, an acrylonitrile-butadiene rubber; a polyurethane or the like, if necessary, in a mixture of two or more, but is not limited thereto.
【0017】染・顔料としては、波長290〜580n
mの光線を遮光することのできる有機、無機の物質が用
いられる。染・顔料のバインダー樹脂に対する含有量
は、遮光性剥離層の膜厚により決められ、通常、遮光光
線波長域での光線透過率で2.5以上の光学濃度となる
ように添加される。また、遮光性剥離層には、必要に応
じてブロッキング防止のために、マット剤として、無機
あるいは有機のフィラーを添加することができる。更
に、帯電防止剤が添加されることもある。As the dye / pigment, the wavelength is 290-580 n
An organic or inorganic substance capable of blocking light of m is used. The content of the dye / pigment with respect to the binder resin is determined by the thickness of the light-shielding release layer, and is usually added so as to have an optical density of 2.5 or more in light transmittance in the light-shielding light wavelength region. In addition, an inorganic or organic filler can be added to the light-shielding release layer as a matting agent, if necessary, to prevent blocking. Further, an antistatic agent may be added.
【0018】上述の方法により、水蒸気透過率の低い物
質の皮膜の少なくとも一方に設けられる遮光性剥離層の
厚みは、剥離の際、遮光性剥離層の皮膜強度が不足なく
えられ、また、皮膜形成にあたり塗布乾燥効率良く作業
ができる、5μmから60μmの範囲が好適で、より好
ましくは、10μmから40μmの範囲である。水蒸気
透過率の低い物質の皮膜に対する遮光性剥離層の密着強
度を調整するために、予めこの皮膜表面を放電処理、化
学処理などの前処理またはアンカー処理を行うことが好
ましい。According to the above-mentioned method, the thickness of the light-shielding release layer provided on at least one of the films of the substance having a low water vapor transmission rate can ensure that the film strength of the light-shielding release layer upon peeling is not insufficient. In the formation, the range of 5 μm to 60 μm, which allows efficient work of coating and drying, is suitable, and more preferably, it is in the range of 10 μm to 40 μm. In order to adjust the adhesion strength of the light-shielding release layer to a film of a substance having a low water vapor transmission rate, it is preferable to previously perform a pretreatment such as a discharge treatment or a chemical treatment or an anchor treatment on the film surface.
【0019】[0019]
【実施例】以下実例を上げて本発明を更に説明するが、
本発明はこれらの実施例に限定されるものではない。 〔実施例1〕図1に示すように、プラスティックフィル
ム1である厚み100μmのポリエチレンテレフタレー
トフィルムの両面に、スパッタリング法によりそれぞれ
約0.04μmの水蒸気透過率の低い物質皮膜2、2’
としてのSiO2皮膜を均一に設けた。更に、遮光性剥離
層3として、塩化ビニル・酢酸ビニル共重合体64重量
部、アクリロニトリル・ブタジエンラバー27重量部、
ネオザポンオレンジRE(油溶性染料)5重量部を、メ
チルエチルケトン300重量部、トルエン100重量
部、エチルセロソルブ10重量部に溶解させた溶液(遮
光性剥離層形成溶液)を、SiO2皮膜片面2の上に、そ
の乾燥皮膜が25μmとなるように均一に塗布乾燥して
マスキングフィルムを得た。The present invention will be further described with reference to the following examples.
The present invention is not limited to these examples. Example 1 As shown in FIG. 1, on both sides of a 100 μm thick polyethylene terephthalate film which is a plastic film 1, a material film 2, 2 ′ having a low water vapor transmission rate of about 0.04 μm was formed by a sputtering method.
The SiO 2 film as uniformly provided. Further, as the light-shielding release layer 3, 64 parts by weight of vinyl chloride / vinyl acetate copolymer, 27 parts by weight of acrylonitrile / butadiene rubber,
The Neozapon Orange RE (oil soluble dye) 5 parts by weight, 300 parts by weight of methyl ethyl ketone, 100 parts by weight of toluene, a solution dissolved in ethyl cellosolve 10 parts by weight (light blocking release layer forming solution), SiO 2 film sided 2 Was uniformly applied and dried so that the dried film became 25 μm to obtain a masking film.
【0020】このマスキングフィルムの湿度伸縮率を、
J−TAPPI.No28mの測定法により測定したと
ころ、0.2×10-5であり、後述の比較例のマスキン
グフィルムに比べて約1/5の伸縮率であった。 〔実施例2〕プラスティックフィルム1としての厚み1
00μmのポリエチレンテレフタレートフィルムの両面
に、水蒸気透過率の低い物質皮膜2、2’としてメチル
エチルケトンに10重量%に溶解した塩化ビニリデン・
アクリロニトリル共重合体を塗布乾燥し、それぞれ約5
μmの均一な皮膜を設けた。更に、遮光性剥離層3とし
て、アルコール可溶性ナイロン82重量部、スピロンレ
ッドGEH9重量部を、変性アルコール730重量部に
溶解した塗布溶液を、塩化ビニリデン・アクリロニトリ
ル共重合体皮膜の片面2の上に、乾燥膜厚が25μmと
なるように均一に塗布乾燥してマスキングフィルムを得
た。The humidity expansion and contraction rate of this masking film is
J-TAPPI. It was 0.2 × 10 -5 as measured by the measurement method of No. 28 m, and the expansion and contraction ratio was about 1/5 as compared with the masking film of the comparative example described later. Example 2 Thickness 1 as Plastic Film 1
On both sides of a polyethylene terephthalate film of 00 μm, vinylidene chloride dissolved in methyl ethyl ketone at 10% by weight as material films 2 and 2 ′ having a low water vapor transmission rate.
The acrylonitrile copolymer is applied and dried, and about 5
A uniform coating of μm was provided. Further, as the light-shielding release layer 3, a coating solution in which 82 parts by weight of alcohol-soluble nylon and 9 parts by weight of Spiron Red GEH are dissolved in 730 parts by weight of denatured alcohol is dried on one surface 2 of a vinylidene chloride-acrylonitrile copolymer film. A masking film was obtained by uniformly coating and drying so that the film thickness became 25 μm.
【0021】このマスキングフィルムの湿度伸縮率は
0.3×10-5であり、後述の比較例のマスキングフィ
ルムに比べて約1/3の伸縮率であった。 〔実施例3〕プラスティックフィルム1としての厚み1
00μmのポリエチレンテレフタレートフィルムの両面
に、水蒸気透過率の低い物質皮膜2、2’として石英ガ
ラスをスパッタリングし、それぞれ約0.05μmの均
一な皮膜を設けた。更に、遮光性剥離層3として、実施
例1で用いた遮光性剥離層形成溶液を片面の石英ガラス
皮膜2の上に、乾燥膜厚が25μmとなるように均一に
塗布乾燥してマスキングフィルムを得た。The humidity expansion and contraction rate of this masking film was 0.3 × 10 -5 , which was about 1/3 that of the masking film of the comparative example described later. Example 3 Thickness 1 as Plastic Film 1
Quartz glass was sputtered on both surfaces of the 00 μm polyethylene terephthalate film as the material films 2 and 2 ′ having a low water vapor transmission rate, and a uniform film of about 0.05 μm was provided. Further, as the light-shielding release layer 3, the solution for forming a light-shielding release layer used in Example 1 was uniformly applied onto one surface of the quartz glass film 2 so as to have a dry film thickness of 25 μm and dried to form a masking film. Obtained.
【0022】このマスキングフィルムの湿度伸縮率は
0.2×10-5であり、後述の比較例のマスキングフィ
ルムに比べ約1/5の伸縮率であった。 〔比較例〕プラスティックフィルム1として厚み100
μmのポリエチレンテレフタレートフィルムの片面に、
遮光性剥離層として、実施例1で用いた遮光性剥離層形
成溶液を、その乾燥皮膜が25μmとなるように均一に
塗布乾燥してマスキングフィルムを得た。The humidity expansion and contraction rate of this masking film was 0.2 × 10 -5 , which was about 1/5 that of the masking film of the comparative example described later. [Comparative Example] Thickness 100 as plastic film 1
μm polyethylene terephthalate film on one side,
As a light-shielding release layer, the solution for forming a light-shielding release layer used in Example 1 was uniformly applied and dried so that the dried film had a thickness of 25 μm to obtain a masking film.
【0023】このマスキングフィルムの湿度伸縮率は、
1.0×10-5であった。The humidity expansion and contraction rate of this masking film is as follows:
It was 1.0 × 10 −5 .
【0024】[0024]
【表1】 [Table 1]
【0025】表1からも明らかなように、本発明のマス
キングフィルムは、従来のマスキングフィルムに比べて
湿度伸縮率が小さので、製版作業中はもちろん、保管中
も湿度の影響を受けにくく安定した平面性を保つことが
できる。As is clear from Table 1, the masking film of the present invention has a smaller humidity expansion / contraction ratio than the conventional masking film, and thus is not easily affected by humidity not only during plate making but also during storage. Flatness can be maintained.
【0026】[0026]
【発明の効果】以上の実施例からも明らかなように、本
発明のマスキングフィルムによれば、従来使用されてい
たマスキングフィルムに比べて湿度の影響を受けにくい
ために、寸法変化および平面性異常などが起こらず、高
い寸法精度が要求される製版作業を通常の作業環境下で
実施することができる。As is clear from the above examples, the masking film of the present invention is less susceptible to humidity than the conventionally used masking film, so that the dimensional change and the irregularity of the flatness are unclear. Such a process does not occur, and a plate making operation requiring high dimensional accuracy can be performed under a normal working environment.
【図1】本発明によるマスキングフィルムの構成を示す
断面図である。FIG. 1 is a cross-sectional view illustrating a configuration of a masking film according to the present invention.
1…プラスティックフィルム 2、2’…水蒸気透過率の低い物質の皮膜 3…遮光性剥離層 DESCRIPTION OF SYMBOLS 1 ... Plastic film 2, 2 '... Coating of the substance with low water vapor transmission rate 3 ... Light-shielding release layer
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI C08J 7/04 C08J 7/04 Z ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification code FI C08J 7/04 C08J 7/04 Z
Claims (1)
スティックフィルムより水蒸気透過率の低い物質の皮膜
を設け、少なくとも一方の該皮膜上に遮光性剥離層を設
けたことを特徴とするマスキングフィルム。1. A masking film comprising: a film of a substance having a lower water vapor transmission rate than said plastic film; and a light-shielding release layer provided on at least one of said films.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4205302A JP2999883B2 (en) | 1992-07-31 | 1992-07-31 | Masking film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4205302A JP2999883B2 (en) | 1992-07-31 | 1992-07-31 | Masking film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0651488A JPH0651488A (en) | 1994-02-25 |
| JP2999883B2 true JP2999883B2 (en) | 2000-01-17 |
Family
ID=16504709
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4205302A Expired - Lifetime JP2999883B2 (en) | 1992-07-31 | 1992-07-31 | Masking film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2999883B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3150772B2 (en) | 1992-07-31 | 2001-03-26 | 株式会社きもと | Drafting film |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001051403A (en) * | 1999-06-01 | 2001-02-23 | Kimoto & Co Ltd | Manufacture of photomask and photomask |
| JP4979189B2 (en) * | 2004-10-27 | 2012-07-18 | クボタシーアイ株式会社 | sleeve |
| JP4942929B2 (en) * | 2004-12-27 | 2012-05-30 | クボタシーアイ株式会社 | Branch pipe and construction method of branch pipe |
| JP2011043242A (en) * | 2010-11-29 | 2011-03-03 | Kubota-Ci Co | Sleeve |
-
1992
- 1992-07-31 JP JP4205302A patent/JP2999883B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3150772B2 (en) | 1992-07-31 | 2001-03-26 | 株式会社きもと | Drafting film |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0651488A (en) | 1994-02-25 |
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