JP3000679B2 - Method for producing polyene structure-containing polymer - Google Patents
Method for producing polyene structure-containing polymerInfo
- Publication number
- JP3000679B2 JP3000679B2 JP2408790A JP40879090A JP3000679B2 JP 3000679 B2 JP3000679 B2 JP 3000679B2 JP 2408790 A JP2408790 A JP 2408790A JP 40879090 A JP40879090 A JP 40879090A JP 3000679 B2 JP3000679 B2 JP 3000679B2
- Authority
- JP
- Japan
- Prior art keywords
- containing polymer
- halogen
- polyene structure
- vinyl
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229920000642 polymer Polymers 0.000 title claims description 48
- 150000004291 polyenes Polymers 0.000 title claims description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 229910052736 halogen Inorganic materials 0.000 claims description 25
- 150000002367 halogens Chemical class 0.000 claims description 25
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 230000001678 irradiating effect Effects 0.000 claims description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- 239000012298 atmosphere Substances 0.000 claims description 3
- 238000006704 dehydrohalogenation reaction Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 238000006243 chemical reaction Methods 0.000 description 10
- 239000001257 hydrogen Chemical group 0.000 description 9
- 229910052739 hydrogen Chemical group 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 6
- 229920002554 vinyl polymer Polymers 0.000 description 6
- 238000002329 infrared spectrum Methods 0.000 description 5
- 239000004800 polyvinyl chloride Substances 0.000 description 5
- 239000002994 raw material Substances 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- -1 polyacetylene Chemical class 0.000 description 4
- 229920000915 polyvinyl chloride Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229920001197 polyacetylene Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000005865 ionizing radiation Effects 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- QLUXVUVEVXYICG-UHFFFAOYSA-N 1,1-dichloroethene;prop-2-enenitrile Chemical compound C=CC#N.ClC(Cl)=C QLUXVUVEVXYICG-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- SXZSFWHOSHAKMN-UHFFFAOYSA-N 2,3,4,4',5-Pentachlorobiphenyl Chemical compound C1=CC(Cl)=CC=C1C1=CC(Cl)=C(Cl)C(Cl)=C1Cl SXZSFWHOSHAKMN-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- WKHZCXNROIJLKO-UHFFFAOYSA-N C(C(=C)C)(=O)OC.C(=C)Br Chemical compound C(C(=C)C)(=O)OC.C(=C)Br WKHZCXNROIJLKO-UHFFFAOYSA-N 0.000 description 1
- NIMIZJCRAKGEDS-UHFFFAOYSA-N C(C=C)(=O)OC.C(=C)Br Chemical compound C(C=C)(=O)OC.C(=C)Br NIMIZJCRAKGEDS-UHFFFAOYSA-N 0.000 description 1
- KJVKNOSYWPWYLX-UHFFFAOYSA-N C(C=C)(=O)OC.C=CC1=CC=CC=C1.C(=C)Br Chemical compound C(C=C)(=O)OC.C=CC1=CC=CC=C1.C(=C)Br KJVKNOSYWPWYLX-UHFFFAOYSA-N 0.000 description 1
- KYPCEBBTIVAURG-UHFFFAOYSA-N C=C.C=CCl.F.F.F Chemical compound C=C.C=CCl.F.F.F KYPCEBBTIVAURG-UHFFFAOYSA-N 0.000 description 1
- POYVUNJVBYPSSY-UHFFFAOYSA-N C=CC1=CC=CC=C1.C(=C)Br Chemical compound C=CC1=CC=CC=C1.C(=C)Br POYVUNJVBYPSSY-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PYVHTIWHNXTVPF-UHFFFAOYSA-N F.F.F.F.C=C Chemical compound F.F.F.F.C=C PYVHTIWHNXTVPF-UHFFFAOYSA-N 0.000 description 1
- 238000001157 Fourier transform infrared spectrum Methods 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical compound BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 description 1
- DIONOLVJHWRQMK-UHFFFAOYSA-N bromoethene ethene Chemical group C(=C)Br.C=C DIONOLVJHWRQMK-UHFFFAOYSA-N 0.000 description 1
- OKYFPDYHJCJPFV-UHFFFAOYSA-N bromoethene prop-1-ene Chemical group CC=C.BrC=C OKYFPDYHJCJPFV-UHFFFAOYSA-N 0.000 description 1
- UXYRVRBICOMBRU-UHFFFAOYSA-N bromoethene prop-2-enoic acid Chemical compound C(C=C)(=O)O.C(=C)Br UXYRVRBICOMBRU-UHFFFAOYSA-N 0.000 description 1
- NFNOFAOLYCMCCH-UHFFFAOYSA-N bromoethene;1,1-dichloroethene Chemical compound BrC=C.ClC(Cl)=C NFNOFAOLYCMCCH-UHFFFAOYSA-N 0.000 description 1
- NTFPWSUTCIFADD-UHFFFAOYSA-N bromoethene;ethenyl acetate Chemical compound BrC=C.CC(=O)OC=C NTFPWSUTCIFADD-UHFFFAOYSA-N 0.000 description 1
- RMGATEFMKWDUPT-UHFFFAOYSA-N bromoethene;prop-2-enenitrile Chemical compound BrC=C.C=CC#N RMGATEFMKWDUPT-UHFFFAOYSA-N 0.000 description 1
- CNYKKUJOMHVBKX-UHFFFAOYSA-N buta-1,3-diene;chloroethene Chemical compound ClC=C.C=CC=C CNYKKUJOMHVBKX-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- XONIFTKCGQCNCM-UHFFFAOYSA-N chloroethene 1,1-dichloroethene methyl prop-2-enoate Chemical compound C(=C)Cl.C(C=C)(=O)OC.C(=C)(Cl)Cl XONIFTKCGQCNCM-UHFFFAOYSA-N 0.000 description 1
- DHZSIQDUYCWNSB-UHFFFAOYSA-N chloroethene;1,1-dichloroethene Chemical compound ClC=C.ClC(Cl)=C DHZSIQDUYCWNSB-UHFFFAOYSA-N 0.000 description 1
- WTHVSCQPVSVPGB-UHFFFAOYSA-N chloroethene;2-methylbuta-1,3-diene Chemical compound ClC=C.CC(=C)C=C WTHVSCQPVSVPGB-UHFFFAOYSA-N 0.000 description 1
- KRGNPJFAKZHQPS-UHFFFAOYSA-N chloroethene;ethene Chemical group C=C.ClC=C KRGNPJFAKZHQPS-UHFFFAOYSA-N 0.000 description 1
- HGAZMNJKRQFZKS-UHFFFAOYSA-N chloroethene;ethenyl acetate Chemical compound ClC=C.CC(=O)OC=C HGAZMNJKRQFZKS-UHFFFAOYSA-N 0.000 description 1
- XYOYXSOAFOGJKV-UHFFFAOYSA-N chloroethene;methyl 2-methylprop-2-enoate Chemical compound ClC=C.COC(=O)C(C)=C XYOYXSOAFOGJKV-UHFFFAOYSA-N 0.000 description 1
- BGMUGLZGAAEBFU-UHFFFAOYSA-N chloroethene;methyl prop-2-enoate Chemical compound ClC=C.COC(=O)C=C BGMUGLZGAAEBFU-UHFFFAOYSA-N 0.000 description 1
- NBXMMTVKODTVSL-UHFFFAOYSA-N chloroethene;prop-1-ene Chemical group CC=C.ClC=C NBXMMTVKODTVSL-UHFFFAOYSA-N 0.000 description 1
- GRFFKYTUNTWAGG-UHFFFAOYSA-N chloroethene;prop-2-enenitrile Chemical compound ClC=C.C=CC#N GRFFKYTUNTWAGG-UHFFFAOYSA-N 0.000 description 1
- SQNNHEYXAJPPKH-UHFFFAOYSA-N chloroethene;prop-2-enoic acid Chemical compound ClC=C.OC(=O)C=C SQNNHEYXAJPPKH-UHFFFAOYSA-N 0.000 description 1
- DZMJPYGBKWJZIR-UHFFFAOYSA-N chloroethene;styrene Chemical compound ClC=C.C=CC1=CC=CC=C1 DZMJPYGBKWJZIR-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 229910000039 hydrogen halide Inorganic materials 0.000 description 1
- 239000012433 hydrogen halide Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000128 polypyrrole Polymers 0.000 description 1
- 229920001291 polyvinyl halide Polymers 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はポリエン構造含有重合体
の製造方法に係り、詳しくは、ハロゲン含有重合体を脱
ハロゲン化水素処理することにより、容易にポリエン構
造含有重合体を製造する方法であって、優れた軽量導電
材料の製造に有効なポリエン構造含有重合体の製造方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a polyene structure-containing polymer, and more particularly to a method for easily producing a polyene structure-containing polymer by subjecting a halogen-containing polymer to a dehydrohalogenation treatment. In addition, the present invention relates to a method for producing a polymer having a polyene structure, which is effective for producing an excellent lightweight conductive material.
【0002】[0002]
【従来の技術】従来、軽量導電材料としては、有機高分
子化合物が非常に好適であることが知られており、既
に、ポリアセチレン、ポリチエニレン、ポリピロールな
どの有機高分子化合物が軽量導電材料として注目を集め
ている。2. Description of the Related Art Conventionally, it has been known that an organic polymer compound is very suitable as a lightweight conductive material, and organic polymer compounds such as polyacetylene, polythienylene, and polypyrrole have already attracted attention as a lightweight conductive material. I am collecting.
【0003】これらのうち、ポリアセチレン等のポリエ
ン構造含有重合体は、ハロゲン含有重合体を脱ハロゲン
化水素反応させることにより製造されている。しかし
て、従来、ハロゲン含有重合体を脱ハロゲン化水素反応
によりポリエン構造含有重合体として軽量導電材料を製
造する方法としては、ハロゲン含有重合体に電離性放射
線を照射する方法(特開昭60-168703 号)、アルカリ水
溶液とテトラブチルアンモニウムブロマイドを用いて加
熱することにより反応させる方法(特開昭58-142905
号)、酸素又は窒素存在下で紫外線照射する方法(Pure
appl.Chem.53,549;1981)などが知られている。Of these, polymers having a polyene structure such as polyacetylene are produced by subjecting a halogen-containing polymer to a dehydrohalogenation reaction. Conventionally, as a method for producing a light-weight conductive material as a polyene structure-containing polymer by subjecting a halogen-containing polymer to a dehydrohalogenation reaction, a method of irradiating the halogen-containing polymer with ionizing radiation (Japanese Patent Application Laid-Open No. 60-1985) 168703), and a method of reacting by heating using an aqueous alkali solution and tetrabutylammonium bromide (Japanese Patent Application Laid-Open No. 58-142905).
No.), UV irradiation in the presence of oxygen or nitrogen (Pure
Appl. Chem. 53, 549; 1981).
【0004】[0004]
【発明が解決しようとする課題】上記従来の方法のう
ち、電離性放射線による方法では、放射線の取り扱い上
の様々な問題があり、しかも、照射量によってはポリマ
ー鎖の分断やイオン化を生じ、プラスチックとしての物
理的性質を阻害する恐れがある上に、経済的にも不利で
ある。Among the above-mentioned conventional methods, the method using ionizing radiation has various problems in handling the radiation, and furthermore, depending on the irradiation amount, the polymer chains may be fragmented or ionized, and plastics may be produced. In addition to the risk of impairing the physical properties as well, it is economically disadvantageous.
【0005】また、アルカリ水溶液を用いる方法では、
アルカリ水溶液中における反応に、高温高圧下で長時間
を要し、しかも、使用する脱ハロゲン化水素剤は高価で
毒性を有していることから、工業的に不利である。酸素
又は窒素気流下で紫外線を照射する方法は、反応効率が
悪く、十分な収率でポリエン構造含有重合体を得ること
ができない。In the method using an alkaline aqueous solution,
The reaction in an alkaline aqueous solution requires a long time under high temperature and high pressure, and the dehydrohalogenating agent used is expensive and toxic, which is industrially disadvantageous. The method of irradiating ultraviolet rays under an oxygen or nitrogen stream has a low reaction efficiency and cannot obtain a polyene structure-containing polymer in a sufficient yield.
【0006】本発明の目的は、上記従来の問題点を解決
し、ハロゲン含有重合体から脱ハロゲン化水素反応によ
りポリエン構造含有重合体を製造する方法であって、安
価で効率が良く、しかも安全性に優れたポリエン構造含
有重合体の製造方法を提供することにある。An object of the present invention is to solve the above-mentioned conventional problems and to provide a method for producing a polyene structure-containing polymer from a halogen-containing polymer by a dehydrohalogenation reaction, which is inexpensive, efficient and safe. An object of the present invention is to provide a method for producing a polyene structure-containing polymer having excellent properties.
【0007】[0007]
【課題を解決するための手段】本発明のポリエン構造含
有重合体の製造方法は、ハロゲン含有重合体に、水蒸気
及び水素ガス含有雰囲気下、紫外線を照射することによ
り脱ハロゲン化水素して、該ハロゲン含有重合体をポリ
エン構造含有重合体とすることを特徴とする。The process for producing a polyene structure-containing polymer according to the present invention is characterized in that the halogen-containing polymer is dehydrohalogenated by irradiating it with ultraviolet rays in an atmosphere containing water vapor and hydrogen gas. The halogen-containing polymer is a polyene structure-containing polymer.
【0008】以下に本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.
【0009】本発明の方法において、原料となるハロゲ
ン含有重合体は、炭素に結合したハロゲンと水素とを有
する高分子ハロゲン含有重合体又は共重合体であって、
例えば、塩化ビニル、臭化ビニル、フッ化ビニル、塩化
ビニリデン、臭化ビニリデン、フッ化ビニリデンなどの
ハロゲン化ビニル又はハロゲン化ビニリデンの単独重合
体又はこれ等の共重合体、或いは上記ハロゲン化ビニル
若しくはハロゲン化ビニリデンと共重合可能なこれら以
外の単量体との共重合体、具体的には、塩化ビニル−酢
酸ビニル、塩化ビニル−アクリロニトリル、塩化ビニル
−エチレン、塩化ビニル−プロピレン、塩化ビニル−ス
チレン、塩化ビニル−ブタジエン、塩化ビニル−イソプ
レン、塩化ビニル−塩化ビニリデン、塩化ビニル−アク
リル酸、塩化ビニル−アクリル酸メチル、塩化ビニル−
メタクリル酸メチル、塩化ビニル−三フッ化エチレン、
臭化ビニル−酢酸ビニル、臭化ビニル−アクリロニトリ
ル、臭化ビニル−エチレン、臭化ビニル−プロピレン、
臭化ビニル−塩化ビニリデン、臭化ビニル−スチレン、
臭化ビニル−アクリル酸、臭化ビニル−アクリル酸メチ
ル、臭化ビニル−メタクリル酸メチル、塩化ビニル−酢
酸ビニル−ビニルアルコール、塩化ビニル−塩化ビニリ
デン−アクリル酸メチル、塩化ビニル−フッ化ビニル−
四フッ化エチレン、臭化ビニル−スチレン−アクリル酸
メチル、塩化ビニリデン−アクリロニトリル等の共重合
体、或いは、これらの重合体若しくは共重合体をポリエ
ン形成を阻害しない範囲で変性したもの(例えば塩素化
物)などが挙げられる。In the method of the present invention, the halogen-containing polymer as a raw material is a high-molecular-weight halogen-containing polymer or copolymer having halogen and hydrogen bonded to carbon,
For example, vinyl chloride, vinyl bromide, vinyl fluoride, vinylidene chloride, vinylidene bromide, vinylidene fluoride or the like, or a homopolymer of vinylidene halide or a copolymer thereof, or the above vinyl halide or Copolymers with other monomers copolymerizable with vinylidene halide, specifically, vinyl chloride-vinyl acetate, vinyl chloride-acrylonitrile, vinyl chloride-ethylene, vinyl chloride-propylene, vinyl chloride-styrene , Vinyl chloride-butadiene, vinyl chloride-isoprene, vinyl chloride-vinylidene chloride, vinyl chloride-acrylic acid, vinyl chloride-methyl acrylate, vinyl chloride-
Methyl methacrylate, vinyl chloride-ethylene trifluoride,
Vinyl bromide-vinyl acetate, vinyl bromide-acrylonitrile, vinyl bromide-ethylene, vinyl bromide-propylene,
Vinyl bromide-vinylidene chloride, vinyl bromide-styrene,
Vinyl bromide-acrylic acid, vinyl bromide-methyl acrylate, vinyl bromide-methyl methacrylate, vinyl chloride-vinyl acetate-vinyl alcohol, vinyl chloride-vinylidene chloride-methyl acrylate, vinyl chloride-vinyl fluoride-
Copolymers such as ethylene tetrafluoride, vinyl bromide-styrene-methyl acrylate, vinylidene chloride-acrylonitrile, or those obtained by modifying these polymers or copolymers within a range that does not inhibit polyene formation (eg, chlorinated products) ).
【0010】これらの重合体又は共重合体は、各々単独
で使用しても、2種以上の混合物として使用しても良
い。また、これらのハロゲン含有重合体には、必要に応
じて可塑剤、安定剤、滑剤、着色剤等の各種添加剤を添
加使用することもできる。[0010] These polymers or copolymers may be used alone or as a mixture of two or more. In addition, various additives such as a plasticizer, a stabilizer, a lubricant, and a coloring agent can be added to these halogen-containing polymers as needed.
【0011】本発明において、ハロゲン含有重合体の形
状には特に制限はなく、粉末状、フィルム状、繊維状、
板状とのいずれの形状であっても良く、またハロゲン含
有重合体は適当な溶媒に溶解して用いることもできる。
この場合、溶媒としては、テトラヒドロフラン、ジオキ
サン、メチルエチルケトン、シクロヘキサノン、アセト
ン、ジメチルホルムアミド、ジメチルアセトアミド、ジ
エチルホルムアミド、ジメチルスルホキシド、ジクロロ
エタン、メチレンジクロライド、トリクロロエタン等が
挙げられ、これらは1種を単独で、或いは2種以上の混
合溶媒として使用される。In the present invention, the shape of the halogen-containing polymer is not particularly limited, and may be in the form of powder, film, fiber, or the like.
The shape may be any of a plate shape and the halogen-containing polymer may be used after being dissolved in an appropriate solvent.
In this case, examples of the solvent include tetrahydrofuran, dioxane, methyl ethyl ketone, cyclohexanone, acetone, dimethylformamide, dimethylacetamide, diethylformamide, dimethylsulfoxide, dichloroethane, methylene dichloride, trichloroethane, and the like. Used as a mixed solvent of more than one species.
【0012】本発明における脱ハロゲン化水素反応は水
蒸気及び水素気流中において、低圧水銀ランプ等により
紫外線を照射することにより実施される。ここで、水蒸
気及び水素の使用量には特に制限はないが、脱ハロゲン
化水素されるハロゲン化水素量に対して、水蒸気は20
〜70℃の蒸気圧量、好ましくは20〜30℃の蒸気圧
量、水素は0.01〜1グラム当量、好ましくは0.1
〜0.5グラム当量とするのが好ましい。The dehydrohalogenation reaction in the present invention is carried out by irradiating ultraviolet rays with a low-pressure mercury lamp or the like in a stream of steam and hydrogen. Here, the amount of steam and hydrogen used is not particularly limited, but the amount of steam is 20% with respect to the amount of hydrogen halide to be dehydrohalogenated.
To 70 ° C., preferably 20 to 30 ° C., hydrogen is 0.01 to 1 gram equivalent, preferably 0.1
Preferably it is ~ 0.5 gram equivalent.
【0013】反応時間は、原料とするハロゲン含有重合
体の種類やその脱ハロゲン化水素化度及び照射する紫外
線の強度等によっても異なるが、通常の場合、20〜1
00W程度の紫外光源であれば、10分〜3時間、好ま
しくは30〜120分程度とする。また、反応温度は一
般に20〜120℃、好ましくは90〜100℃の範囲
で行なわれる。The reaction time varies depending on the type of the halogen-containing polymer used as a raw material, the degree of dehydrohalogenation thereof, the intensity of ultraviolet rays to be irradiated, and the like.
In the case of an ultraviolet light source of about 00 W, the duration is 10 minutes to 3 hours, preferably about 30 to 120 minutes. In addition, the reaction temperature is generally in the range of 20 to 120 ° C, preferably 90 to 100 ° C.
【0014】なお、ハロゲン含有重合体の脱ハロゲン化
水素化の度合いは、得られるポリエン構造含有重合体の
使用目的等に応じて適宜決定される。[0014] The degree of dehydrohalogenation of the halogen-containing polymer is appropriately determined according to the intended use of the resulting polyene structure-containing polymer.
【0015】このようにしてハロゲン含有重合体を脱ハ
ロゲン化水素反応させることにより、対応するハロゲン
含有構造骨格が-(CH=CH)- に変換されてなるポリエン構
造を含有するポリエン構造含有重合体が得られる。例え
ば、ポリハロゲン化ビニルを脱ハロゲン化水素化反応に
よりポリエン構造含有重合体とした場合には、-(CH=CH)
n-からなるポリアセチレンの重合体を得ることができ
る。かかるポリエン結合を有する重合体は、共役結合の
連続により、導電性を有し、導電性ポリマー、電極、半
導体素子等の導電材料として有効に利用することができ
る。By subjecting the halogen-containing polymer to a dehydrohalogenation reaction in this manner, a polyene-structure-containing polymer having a polyene structure in which the corresponding halogen-containing structural skeleton is converted into-(CH = CH)- Is obtained. For example, when polyvinyl halide is converted to a polyene structure-containing polymer by a dehydrohalogenation reaction,-(CH = CH)
A polyacetylene polymer consisting of n- can be obtained. Such a polymer having a polyene bond has conductivity due to continuation of conjugate bonds, and can be effectively used as a conductive material for a conductive polymer, an electrode, a semiconductor element, or the like.
【0016】本発明において、ハロゲン含有重合体を脱
ハロゲン化水素化反応させる際、ハロゲン含有重合体を
フィルム状にして処理することは、後処理を容易にする
ことができ、極めて有利である。即ち、フィルム状ハロ
ゲン含有重合体から製造されたフィルム状ポリエン構造
含有重合体であれば、後工程の成形処理を容易にするこ
とができる。例えば、フィルム状ポリエン構造含有重合
体を一方向に延伸することにより、偏光フィルムを容易
に製造することができる。このようにして得られる偏光
フィルムは、反射防止板、サングラス、液晶表示装置、
各種光学機器、窓ガラス等に有効に使用できる。なお、
ハロゲン含有重合体をフィルム状とするには、例えばハ
ロゲン含有重合体を前述の適当な溶媒に溶解し、ガラス
板等の基板上に流して成膜すれば良い。In the present invention, when the halogen-containing polymer is subjected to a dehydrohalogenation reaction, it is extremely advantageous to treat the halogen-containing polymer in the form of a film, since the post-treatment can be facilitated. That is, a film-like polyene structure-containing polymer produced from a film-like halogen-containing polymer can facilitate the molding process in the subsequent step. For example, a polarizing film can be easily manufactured by stretching a film-like polyene structure-containing polymer in one direction. The polarizing film thus obtained is an anti-reflection plate, sunglasses, a liquid crystal display,
It can be effectively used for various optical devices and window glass. In addition,
In order to form the halogen-containing polymer into a film, for example, the halogen-containing polymer may be dissolved in the above-mentioned appropriate solvent, and then flown onto a substrate such as a glass plate to form a film.
【0017】[0017]
【作用】水蒸気及び水素雰囲気下において、ハロゲン含
有重合体に紫外線を照射することにより、高価で有害な
脱ハロゲン化剤を使用することなく、温和な条件下で、
対応するポリエン構造含有重合体を高い収率で得ること
ができる。By irradiating a halogen-containing polymer with ultraviolet rays in a steam and hydrogen atmosphere, under mild conditions without using an expensive and harmful dehalogenating agent,
The corresponding polyene structure-containing polymer can be obtained in high yield.
【0018】[0018]
【実施例】以下に実施例及び比較例を挙げて本発明をよ
り具体的に説明するが、本発明はその要旨を超えない限
り、以下の実施例に限定されるものではない。The present invention will be described more specifically with reference to examples and comparative examples, but the present invention is not limited to the following examples unless it exceeds the gist.
【0019】実施例1 ポリ塩化ビニル(PVC)粉末2gをテトラヒドロフラ
ン100mgに溶解し、ガラス板上に流してフィルム
(厚み5μ)を作成した。このガラス板(8)を図1に
示すパイレックス管からなる直径90mm、長さ900
mmの密閉式反応管(7)にセットし、100W低圧水
銀ランプ(内径10mm、長さ1000mm)(3)を
光源として用いた。脱気した後、水素注入口(1)から
の水素を水(2)中に通じて7ml・min-1の速度で
反応管に導入した。蒸気圧量の水が常に反応管に存在し
た。温度は反応管に巻いたリボンヒータによって制御し
た。例えば、90℃、1時間反応させた。なお、図1に
おいて、4は温度計、5は発生するHClを捕捉するた
めの水タンク、6は廃水素の貯蔵タンクである。Example 1 A polyvinyl chloride (PVC) powder (2 g) was dissolved in tetrahydrofuran (100 mg) and allowed to flow on a glass plate to form a film (5 μm in thickness). This glass plate (8) is made of a Pyrex tube shown in FIG.
and a 100 W low-pressure mercury lamp (inner diameter 10 mm, length 1000 mm) (3) was used as a light source. After degassing, hydrogen from the hydrogen inlet (1) was introduced into the reaction tube at a rate of 7 ml · min −1 through water (2). A vapor pressure of water was always present in the reaction tube. The temperature was controlled by a ribbon heater wound around the reaction tube. For example, the reaction was performed at 90 ° C. for 1 hour. In FIG. 1, reference numeral 4 denotes a thermometer, 5 denotes a water tank for capturing generated HCl, and 6 denotes a waste hydrogen storage tank.
【0020】反応終了後、フィルムを精製メタノールを
用いて数回洗浄した後、減圧乾燥した。このものの赤外
線スペクトル(FT−IRスペクトル,ATR法)を測
定したところ、980〜1010cmと1550〜16
00cmの位置にそれぞれC=Cに基づく吸収を認め
た。また、X線回析測定したところ、明らかにポリエン
構造による結晶化パターンを認めた。After the completion of the reaction, the film was washed several times with purified methanol and dried under reduced pressure. When the infrared spectrum (FT-IR spectrum, ATR method) of this product was measured, it was 980 to 1010 cm and 1550 to 16 cm.
The absorption based on C = C was recognized at the position of 00 cm. X-ray diffraction measurement clearly showed a crystallization pattern due to the polyene structure.
【0021】原料PVC及び生成ポリエンの赤外線スペ
クトルチャートを図2及び図3に、X線回析チャートを
図4にそれぞれ示す。FIGS. 2 and 3 show infrared spectrum charts of the raw material PVC and the produced polyene, and FIG. 4 shows an X-ray diffraction chart.
【0022】実施例2 反応時間を4時間としたこと以外は実施例1と同様にし
て脱ハロゲン化水素化反応を行なったところ、実施例1
と全く同様の結果が得られた。に、X線回析チャートを
図4に示す。Example 2 A dehydrohalogenation reaction was carried out in the same manner as in Example 1 except that the reaction time was changed to 4 hours.
And the same result was obtained. FIG. 4 shows an X-ray diffraction chart.
【0023】比較例1 窒素気流下、90℃にて4時間紫外線照射したこと以外
は、実施例1と同様にした行なったところ、赤外線スペ
クトル及びX線回析パターンは、原料として用いたポリ
塩化ビニルと同じで、変化は認められなかった。X線回
析チャートを図4に示す。Comparative Example 1 The procedure of Example 1 was repeated, except that UV irradiation was performed at 90 ° C. for 4 hours under a nitrogen stream. The infrared spectrum and the X-ray diffraction pattern were as follows. Same as vinyl, no change was observed. An X-ray diffraction chart is shown in FIG.
【0024】[0024]
【発明の効果】以上詳述した通り、本発明のポリエン構
造含有重合体の製造方法によれば、軽量導電材料として
有用なポリエン構造含有重合体を容易かつ効率的に、安
価に、しかも優れた安全性のもとに製造することが可能
とされる。As described in detail above, according to the method for producing a polyene structure-containing polymer of the present invention, a polyene structure-containing polymer useful as a lightweight conductive material can be easily, efficiently, inexpensively, and excellently manufactured. It can be manufactured with safety.
【図1】実施例1で用いた反応装置を示す系統図であ
る。FIG. 1 is a system diagram showing a reaction apparatus used in Example 1.
【図2】原料PVCの赤外線スペクトルチャートであ
る。FIG. 2 is an infrared spectrum chart of raw material PVC.
【図3】実施例1における生成ポリエンの赤外線スペク
トルチャートである。FIG. 3 is an infrared spectrum chart of a produced polyene in Example 1.
【図4】原料PVCと実施例1、2及び比較例3の生成
物のX線回析チャートである。FIG. 4 is an X-ray diffraction chart of a raw material PVC and products of Examples 1, 2 and Comparative Example 3.
1 水素注入口 2 水 3 低圧水銀ランプ 4 温度計 6 ガス溜 7 反応管 8 PVCを塗布したガラス板 Reference Signs List 1 hydrogen inlet 2 water 3 low-pressure mercury lamp 4 thermometer 6 gas reservoir 7 reaction tube 8 glass plate coated with PVC
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C08F 8/26 WPI(DIALOG)──────────────────────────────────────────────────の Continued on the front page (58) Field surveyed (Int.Cl. 7 , DB name) C08F 8/26 WPI (DIALOG)
Claims (1)
ガス含有雰囲気下、紫外線を照射することにより脱ハロ
ゲン化水素して、該ハロゲン含有重合体をポリエン構造
含有重合体とすることを特徴とするポリエン構造含有重
合体の製造方法。1. A halogen-containing polymer is dehydrohalogenated by irradiating it with ultraviolet rays in an atmosphere containing water vapor and hydrogen gas, whereby the halogen-containing polymer is converted into a polyene structure-containing polymer. A method for producing a polyene structure-containing polymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2408790A JP3000679B2 (en) | 1990-12-28 | 1990-12-28 | Method for producing polyene structure-containing polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2408790A JP3000679B2 (en) | 1990-12-28 | 1990-12-28 | Method for producing polyene structure-containing polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04233917A JPH04233917A (en) | 1992-08-21 |
| JP3000679B2 true JP3000679B2 (en) | 2000-01-17 |
Family
ID=18518202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2408790A Expired - Fee Related JP3000679B2 (en) | 1990-12-28 | 1990-12-28 | Method for producing polyene structure-containing polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3000679B2 (en) |
-
1990
- 1990-12-28 JP JP2408790A patent/JP3000679B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04233917A (en) | 1992-08-21 |
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