JP3020995B2 - Filler for resin - Google Patents
Filler for resinInfo
- Publication number
- JP3020995B2 JP3020995B2 JP2110200A JP11020090A JP3020995B2 JP 3020995 B2 JP3020995 B2 JP 3020995B2 JP 2110200 A JP2110200 A JP 2110200A JP 11020090 A JP11020090 A JP 11020090A JP 3020995 B2 JP3020995 B2 JP 3020995B2
- Authority
- JP
- Japan
- Prior art keywords
- particle size
- filler
- powder
- resin
- nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000945 filler Substances 0.000 title claims description 38
- 229920005989 resin Polymers 0.000 title claims description 20
- 239000011347 resin Substances 0.000 title claims description 20
- 239000002245 particle Substances 0.000 claims description 56
- 239000000843 powder Substances 0.000 claims description 44
- 150000004767 nitrides Chemical class 0.000 claims description 19
- 238000009826 distribution Methods 0.000 claims description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 34
- 229910052751 metal Inorganic materials 0.000 description 19
- 239000002184 metal Substances 0.000 description 19
- 239000003822 epoxy resin Substances 0.000 description 18
- 229920000647 polyepoxide Polymers 0.000 description 18
- 229910052581 Si3N4 Inorganic materials 0.000 description 15
- 239000011342 resin composition Substances 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 239000000377 silicon dioxide Substances 0.000 description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- -1 polyphenylene Polymers 0.000 description 10
- 229910052710 silicon Inorganic materials 0.000 description 10
- 239000010703 silicon Substances 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 9
- 230000017525 heat dissipation Effects 0.000 description 9
- 239000012535 impurity Substances 0.000 description 9
- 230000035939 shock Effects 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 8
- 238000002441 X-ray diffraction Methods 0.000 description 7
- 238000000465 moulding Methods 0.000 description 7
- 229920003986 novolac Polymers 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 6
- 239000005350 fused silica glass Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 5
- 238000004898 kneading Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000001768 carboxy methyl cellulose Substances 0.000 description 4
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 4
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 4
- 239000011362 coarse particle Substances 0.000 description 4
- 230000001771 impaired effect Effects 0.000 description 4
- 229920000728 polyester Polymers 0.000 description 4
- 238000004062 sedimentation Methods 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 239000011863 silicon-based powder Substances 0.000 description 4
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 229910052906 cristobalite Inorganic materials 0.000 description 3
- 230000001186 cumulative effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 238000007561 laser diffraction method Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 238000005121 nitriding Methods 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 239000003566 sealing material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 2
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 2
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 2
- 150000008065 acid anhydrides Chemical class 0.000 description 2
- 229920000800 acrylic rubber Polymers 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 239000004203 carnauba wax Substances 0.000 description 2
- 235000013869 carnauba wax Nutrition 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 238000001721 transfer moulding Methods 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- XGCDBGRZEKYHNV-UHFFFAOYSA-N 1,1-bis(diphenylphosphino)methane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CP(C=1C=CC=CC=1)C1=CC=CC=C1 XGCDBGRZEKYHNV-UHFFFAOYSA-N 0.000 description 1
- QFMZQPDHXULLKC-UHFFFAOYSA-N 1,2-bis(diphenylphosphino)ethane Chemical compound C=1C=CC=CC=1P(C=1C=CC=CC=1)CCP(C=1C=CC=CC=1)C1=CC=CC=C1 QFMZQPDHXULLKC-UHFFFAOYSA-N 0.000 description 1
- MFEVGQHCNVXMER-UHFFFAOYSA-L 1,3,2$l^{2}-dioxaplumbetan-4-one Chemical compound [Pb+2].[O-]C([O-])=O MFEVGQHCNVXMER-UHFFFAOYSA-L 0.000 description 1
- AHBGXHAWSHTPOM-UHFFFAOYSA-N 1,3,2$l^{4},4$l^{4}-dioxadistibetane 2,4-dioxide Chemical compound O=[Sb]O[Sb](=O)=O AHBGXHAWSHTPOM-UHFFFAOYSA-N 0.000 description 1
- MEZZCSHVIGVWFI-UHFFFAOYSA-N 2,2'-Dihydroxy-4-methoxybenzophenone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1O MEZZCSHVIGVWFI-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- JMMZCWZIJXAGKW-UHFFFAOYSA-N 2-methylpent-2-ene Chemical compound CCC=C(C)C JMMZCWZIJXAGKW-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- VEORPZCZECFIRK-UHFFFAOYSA-N 3,3',5,5'-tetrabromobisphenol A Chemical compound C=1C(Br)=C(O)C(Br)=CC=1C(C)(C)C1=CC(Br)=C(O)C(Br)=C1 VEORPZCZECFIRK-UHFFFAOYSA-N 0.000 description 1
- XYXBMCIMPXOBLB-UHFFFAOYSA-N 3,4,5-tris(dimethylamino)-2-methylphenol Chemical compound CN(C)C1=CC(O)=C(C)C(N(C)C)=C1N(C)C XYXBMCIMPXOBLB-UHFFFAOYSA-N 0.000 description 1
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 description 1
- MTYCXPNDBZCTFX-UHFFFAOYSA-N 4,6-dihydrazinyl-n-methyl-1,3,5-triazin-2-amine Chemical compound CNC1=NC(NN)=NC(NN)=N1 MTYCXPNDBZCTFX-UHFFFAOYSA-N 0.000 description 1
- DBOSBRHMHBENLP-UHFFFAOYSA-N 4-tert-Butylphenyl Salicylate Chemical compound C1=CC(C(C)(C)C)=CC=C1OC(=O)C1=CC=CC=C1O DBOSBRHMHBENLP-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- 229910002020 Aerosil® OX 50 Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- 239000004342 Benzoyl peroxide Substances 0.000 description 1
- OMPJBNCRMGITSC-UHFFFAOYSA-N Benzoylperoxide Chemical compound C=1C=CC=CC=1C(=O)OOC(=O)C1=CC=CC=C1 OMPJBNCRMGITSC-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 239000004641 Diallyl-phthalate Substances 0.000 description 1
- 239000002656 Distearyl thiodipropionate Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229920000181 Ethylene propylene rubber Polymers 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229910000003 Lead carbonate Inorganic materials 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004693 Polybenzimidazole Substances 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 1
- APQHKWPGGHMYKJ-UHFFFAOYSA-N Tributyltin oxide Chemical compound CCCC[Sn](CCCC)(CCCC)O[Sn](CCCC)(CCCC)CCCC APQHKWPGGHMYKJ-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- UMHKOAYRTRADAT-UHFFFAOYSA-N [hydroxy(octoxy)phosphoryl] octyl hydrogen phosphate Chemical compound CCCCCCCCOP(O)(=O)OP(O)(=O)OCCCCCCCC UMHKOAYRTRADAT-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- IBVAQQYNSHJXBV-UHFFFAOYSA-N adipic acid dihydrazide Chemical compound NNC(=O)CCCCC(=O)NN IBVAQQYNSHJXBV-UHFFFAOYSA-N 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000005260 alpha ray Effects 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- JPUHCPXFQIXLMW-UHFFFAOYSA-N aluminium triethoxide Chemical compound CCO[Al](OCC)OCC JPUHCPXFQIXLMW-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910000411 antimony tetroxide Inorganic materials 0.000 description 1
- 229940045985 antineoplastic platinum compound Drugs 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 235000019400 benzoyl peroxide Nutrition 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 description 1
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 1
- HNDAFHXJOOETRX-UHFFFAOYSA-N butane;2-tert-butyl-5-methylbenzene-1,4-diol Chemical compound CCCC.CC1=CC(O)=C(C(C)(C)C)C=C1O HNDAFHXJOOETRX-UHFFFAOYSA-N 0.000 description 1
- 229920005549 butyl rubber Polymers 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 150000001896 cresols Chemical class 0.000 description 1
- WANLJGSQMHAZLK-UHFFFAOYSA-N cyano 3,3-diphenylprop-2-enoate Chemical compound C=1C=CC=CC=1C(=CC(OC#N)=O)C1=CC=CC=C1 WANLJGSQMHAZLK-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 1
- 235000019305 distearyl thiodipropionate Nutrition 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 238000010332 dry classification Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 229940056932 lead sulfide Drugs 0.000 description 1
- 229910052981 lead sulfide Inorganic materials 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- GKTNLYAAZKKMTQ-UHFFFAOYSA-N n-[bis(dimethylamino)phosphinimyl]-n-methylmethanamine Chemical compound CN(C)P(=N)(N(C)C)N(C)C GKTNLYAAZKKMTQ-UHFFFAOYSA-N 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- ZPCVPCZOZOVGBE-UHFFFAOYSA-L oct-2-enoate tin(2+) Chemical compound [Sn+2].CCCCCC=CC([O-])=O.CCCCCC=CC([O-])=O ZPCVPCZOZOVGBE-UHFFFAOYSA-L 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002913 oxalic acids Chemical class 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Chemical class 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- JTJMJGYZQZDUJJ-UHFFFAOYSA-N phencyclidine Chemical class C1CCCCN1C1(C=2C=CC=CC=2)CCCCC1 JTJMJGYZQZDUJJ-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 150000003058 platinum compounds Chemical class 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920002480 polybenzimidazole Polymers 0.000 description 1
- 229920002577 polybenzoxazole Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002685 polymerization catalyst Substances 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- LSZKGNJKKQYFLR-UHFFFAOYSA-J tri(butanoyloxy)stannyl butanoate Chemical compound [Sn+4].CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O.CCCC([O-])=O LSZKGNJKKQYFLR-UHFFFAOYSA-J 0.000 description 1
- WLPUWLXVBWGYMZ-UHFFFAOYSA-N tricyclohexylphosphine Chemical compound C1CCCCC1P(C1CCCCC1)C1CCCCC1 WLPUWLXVBWGYMZ-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- HVYVMSPIJIWUNA-UHFFFAOYSA-N triphenylstibine Chemical compound C1=CC=CC=C1[Sb](C=1C=CC=CC=1)C1=CC=CC=C1 HVYVMSPIJIWUNA-UHFFFAOYSA-N 0.000 description 1
- MGMXGCZJYUCMGY-UHFFFAOYSA-N tris(4-nonylphenyl) phosphite Chemical compound C1=CC(CCCCCCCCC)=CC=C1OP(OC=1C=CC(CCCCCCCCC)=CC=1)OC1=CC=C(CCCCCCCCC)C=C1 MGMXGCZJYUCMGY-UHFFFAOYSA-N 0.000 description 1
- QQBLOZGVRHAYGT-UHFFFAOYSA-N tris-decyl phosphite Chemical compound CCCCCCCCCCOP(OCCCCCCCCCC)OCCCCCCCCCC QQBLOZGVRHAYGT-UHFFFAOYSA-N 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 238000010333 wet classification Methods 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910021489 α-quartz Inorganic materials 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、樹脂用充填材、詳しくはコンデンサー、コ
ネクター、抵抗器、半導体等の電子部品の封止材、絶縁
ペースト、放熱シートなどに有用な樹脂用充填材に関す
るものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention is useful as a filler for resin, in particular, a sealing material for electronic components such as capacitors, connectors, resistors, and semiconductors, an insulating paste, and a heat dissipation sheet. The present invention relates to a simple resin filler.
溶融シリカ、生シリカ等の充填材とエポキシ樹脂やポ
リフェニレン樹脂からなる樹脂封止材は、信頼性が著し
く向上した上に成形性、量産性に優れるため、封止材の
約90%が樹脂封止材として使用されている。Resin encapsulants consisting of fillers such as fused silica and raw silica and epoxy resin or polyphenylene resin have significantly improved reliability and excellent moldability and mass productivity, so about 90% of the encapsulant is resin-encapsulated. Used as a stopping material.
しかしながら、近年、電気・電子機器業界において
は、小形・軽量化を促進するため、電気・電子部品の高
集積化が要求されており、電気・電子部品用の封止材、
絶縁ペースト、放熱シート等にはより一層の放熱性の向
上が必要となってきた。そこで、溶融シリカや生シリカ
に比較して放熱性に優れる充填材として、窒化硅素、窒
化アルミニウム等の窒化物粉末が提案されている(特開
昭60−4522号公報、同61−101522号公報、同62−43415
号公報)。However, in recent years, in the electric and electronic equipment industry, high integration of electric and electronic parts has been required in order to promote miniaturization and weight reduction, and encapsulants for electric and electronic parts,
Insulating pastes, heat dissipation sheets, and the like have been required to further improve heat dissipation. Accordingly, nitride powders such as silicon nitride and aluminum nitride have been proposed as fillers having better heat dissipation properties than fused silica or raw silica (Japanese Patent Application Laid-Open Nos. 60-4522 and 61-101522). , 62-43415
No.).
これら窒化物粉末を充填材として使用した樹脂組成物
は、確かに放熱性は改善されているものの、トランスフ
ァー成形及び射出成形した場合、従来の溶融シリカ、生
シリカを充填材とした場合に比較して、スパイラルフロ
ーの低下が著しく、金型摩耗の原因となったり、高充填
化ができない為、これら窒化物粉末の持つ放熱性を十分
に生かせないという欠点があった。Although the resin composition using these nitride powders as a filler has certainly improved heat dissipation, the transfer molding and the injection molding are more effective than the conventional fused silica and raw silica as fillers. As a result, the spiral flow is remarkably reduced, which causes abrasion of the mold and high filling cannot be attained. Therefore, there is a disadvantage that the heat radiation properties of these nitride powders cannot be sufficiently utilized.
本発明者らは、上記の欠点を改良すべく窒化物粉末及
び/又は酸窒化物粉末の粒度がフロー特性に及ぼす効果
を詳細に鋭意検討した結果、ある特定の粒度分布を有す
る窒化物粉末及び/又は酸窒化物粉末を充填材とした場
合において、特異的にフロー特性が良好になることを見
い出し、本発明を完成したものである。The present inventors have studied in detail the effect of the particle size of the nitride powder and / or the oxynitride powder on the flow characteristics in order to improve the above-described drawbacks. As a result, the nitride powder having a specific particle size distribution and The present invention has been completed by finding that the flow characteristics are specifically improved when oxynitride powder is used as the filler.
すなわち、本発明は、次の粒度特性を有する窒化物粉
末及び/又は酸窒化物粉末を含有してなる無機粉末から
なることを特徴とする樹脂用充填材である。That is, the present invention is a resin filler characterized by comprising an inorganic powder containing a nitride powder and / or an oxynitride powder having the following particle size characteristics.
(粒度分布) −1μ 5〜10% −2μ 6〜12% −3μ 10〜16% −8μ 35〜47% −24μ 51〜63% −48μ 67〜75% −96μ 88〜92% (平均粒径) 9〜22μm (RRS−n値) ≦0.80 以下、さらに詳しく本発明について説明する。(Particle size distribution) -1μ 5-10% -2μ 6-12% -3μ 10-16% -8μ 35-47% -24μ 51-63% -48μ 67-75% -96μ 88-92% 9 to 22 μm (RRS-n value) ≦ 0.80 Hereinafter, the present invention will be described in more detail.
本発明における窒化物、酸窒化物の例としては、窒化
硅素、窒化アルミニウムのような窒化物、シリコンオキ
シナイトライド、アルミニウムオキシナイトライド、サ
イアロン等の酸窒化物が挙げられる。より高熱伝導性を
樹脂組成物に付与したい場合には、窒化アルミニウム、
窒化硅素、サイアロンを、より耐熱衝撃性を付与したい
場合には、シリコンオキシナイトライド、アルミニウム
オキシナイトライドを選択する。なお、窒化硅素、サイ
アロンには、α型及びβ型の2種類の結晶形が存在する
がどちらでもよく、勿論両者の混合物であってもよい。
また、シリコンオキシナイトライドやアルミニウムオキ
シナイトライドの酸窒化物の場合、結晶物だけでなく非
晶質のものも共存してもよい。Examples of the nitride and oxynitride in the present invention include nitrides such as silicon nitride and aluminum nitride, and oxynitrides such as silicon oxynitride, aluminum oxynitride, and sialon. When it is desired to impart higher thermal conductivity to the resin composition, aluminum nitride,
If silicon nitride or sialon is to be given more thermal shock resistance, silicon oxynitride or aluminum oxynitride is selected. Note that silicon nitride and sialon have two types of crystal forms, α-type and β-type, either of which may be used, or a mixture of both.
In the case of silicon oxynitride or aluminum oxynitride oxynitride, not only a crystalline substance but also an amorphous substance may coexist.
本発明に係る窒化物粉末、酸窒化物粉末は、(1)金
属シリコン、金属アルミニウムやシリコン−アルミニウ
ム合金等の金属を直接窒化する方法、(2)シリカ、ア
ルミナ、カオリン、ムライト等の金属酸化物を還元窒化
する方法、(3)前述の金属と酸窒化物、窒化物及び/
又は金属酸化物を(還元)窒化する方法、(4)金属酸
化物と窒化物とを(還元)窒化する方法、(5)4塩化
硅素、塩化アルミニウム等の金属ハロゲン化物及び/又
は硅酸メチル、トリエトキシアルミニウム等の有機金属
化合物とアンモニアから直接気相合成もしくは金属イミ
ド、金属アミドを経由して製造する方法等により得るこ
とができる。The nitride powder and oxynitride powder according to the present invention can be obtained by (1) a method of directly nitriding a metal such as metallic silicon, metallic aluminum or a silicon-aluminum alloy, and (2) a metal oxide such as silica, alumina, kaolin or mullite. (3) the above-mentioned metal and oxynitride, nitride and / or
(4) a method of (reducing) nitriding a metal oxide and a nitride, (5) a metal halide such as silicon chloride and aluminum chloride, and / or methyl silicate. And a method of producing directly from an organometallic compound such as triethoxy aluminum and ammonia and ammonia via a metal imide or a metal amide.
以上の製造のうち、粒度や比表面積を調節しやすく、
樹脂組成物の放熱性、耐熱衝撃性、成形性をより改良で
きる点では(1)や(3)の方法が好ましく、一方、低
α線化された充填材を得やすい点では、(5)の方法が
好ましい。なお、上記(1)〜(5)の方法により窒化
物及び/又は酸窒化物を得る際に、必要ならば、カーボ
ンやCa、Mg、Mn、Y及びランタニド金属の酸化物、炭酸
塩及び蓚酸塩等から選ばれた少くとも1種を配合しても
よい。Of the above production, it is easy to adjust the particle size and specific surface area,
The methods (1) and (3) are preferable in that the heat dissipation, thermal shock resistance, and moldability of the resin composition can be further improved. On the other hand, (5) in that a filler having a reduced α ray can be easily obtained. Is preferred. When obtaining nitrides and / or oxynitrides by the above methods (1) to (5), if necessary, carbon, Ca, Mg, Mn, Y and lanthanide metal oxides, carbonates and oxalic acids At least one selected from salts and the like may be blended.
本発明の充填材である窒化物粉末及び/又は酸窒化物
粉末の純度は、70%以上好ましくは80%以上特に好まし
くは90%以上である。純度が90%未満であると得られる
樹脂組成物の電気絶縁性、熱伝導性、耐熱衝撃性の少く
とも1つが損われる。The purity of the nitride powder and / or oxynitride powder as the filler of the present invention is 70% or more, preferably 80% or more, and particularly preferably 90% or more. If the purity is less than 90%, at least one of the resulting resin composition has impaired electrical insulation, thermal conductivity, and thermal shock resistance.
本発明の充填材を前述の(1)もしくは(3)の方法
で得る場合、良好な電気絶縁性や耐熱衝撃性を確保する
ためには、未反応金属の残存率が1%以下好ましくは0.
5%以下特に好ましくは0.3%以下になるように窒化条件
を決めることが重要である。When the filler of the present invention is obtained by the above-mentioned method (1) or (3), in order to ensure good electrical insulation and thermal shock resistance, the residual ratio of the unreacted metal is 1% or less, preferably 0%. .
It is important to determine the nitriding conditions so as to be 5% or less, particularly preferably 0.3% or less.
本発明の充填材の純度はX線回折チャートから得られ
る種々の不純物結晶性粉末と本発明の充填材との所定位
置のピークの高さの和に対する本発明の充填材のピーク
の比で代表させるものとする。シリコンオキシナイトラ
イドやアルミニウムオキシナイトライドの場合、結晶化
物のみでなく非晶質のものも存在しうるが、非晶質に起
因するブロードなピークは、純度算出の際に計算から除
外するものとする。The purity of the filler of the present invention is represented by the ratio of the peak of the filler of the present invention to the sum of the heights of the peaks at predetermined positions of various impurity crystalline powders obtained from the X-ray diffraction chart and the filler of the present invention. Shall be allowed. In the case of silicon oxynitride or aluminum oxynitride, not only crystallized substances but also amorphous ones may exist, but broad peaks due to the amorphous ones should be excluded from the calculation when calculating the purity. I do.
本発明における未反応金属の残存率はX線回折チャー
トから得られる金属粉末と窒化物粉末及び/又は酸窒化
物粉末との所定位置のピークの高さの和に対する未反応
金属の金属粉末のピークの比で代表させるものとする。
具体的なピークは以下のとおりである。In the present invention, the residual ratio of the unreacted metal is defined as the peak of the metal powder of the unreacted metal with respect to the sum of the heights of the peaks at predetermined positions of the metal powder and the nitride powder and / or the oxynitride powder obtained from the X-ray diffraction chart. It is assumed to be represented by the ratio of
Specific peaks are as follows.
本発明の充填材 α−サイアロンの (210)面 本発明の充填材 β−サイアロンの (101)面 本発明の充填材 シリコンオキシナイトライドの (110)面 本発明の充填材 アルミニウムオキシナイトライドの
(440)面 本発明の充填材 α−窒化硅素の (210)面 本発明の充填材 β−窒化硅素の (101)面 本発明の充填材 窒化アルミニウムの (101)面 不純物 クリストバライトの (101)面 不純物 α−クウオーツ の (101)面 不純物 α−アルミナ の (113)面 不純物 ムライト の (120)面 不純物 金属シリコン の (111)面 不純物 金属アルミニウムの (111)面 不純物 β−SiC の (111)面 本発明の充填材に含まれるイオン性不純物としては、
Fe++5000ppm以下、Na+100ppm以下、Cl-50ppm以下であ
り、好ましくはFe++1000ppm以下、Na+30ppm以下、Cl-20
ppm以下、特に好ましくはFe++100ppm以下、Na+10ppm以
下、Cl-10ppm以下である。特にNa+が100ppmを超えたりC
l-が50ppmを超えたりすると耐湿信頼性が劣る。Filler of the present invention (210) face of α-sialon Filler of the present invention (101) face of β-sialon Filler of the present invention (110) face of silicon oxynitride Filler of the present invention Aluminum oxynitride (440) face Filler of the present invention (210) face of α-silicon nitride Filler of the present invention (101) face of β-silicon nitride Filler of the present invention (101) face of aluminum nitride Impurity (101) of cristobalite Plane (101) plane of impurity α-quartz (113) plane of impurity α-alumina (120) plane of impurity mullite (111) plane of metallic silicon impurity (111) plane of metallic aluminum impurity (111) of β-SiC impurity Surface As the ionic impurities contained in the filler of the present invention,
Fe ++ 5000 ppm or less, Na + 100 ppm or less, Cl - 50 ppm or less, preferably Fe ++ 1000 ppm or less, Na + 30 ppm or less, Cl - 20
ppm or less, particularly preferably Fe ++ 100 ppm or less, Na + 10 ppm or less, and Cl - 10 ppm or less. Especially when Na + exceeds 100 ppm or C
l - is moisture-proof reliability is inferior or exceed 50ppm.
本発明の充填材は、表−1に示す粒度分布、平均粒
径、RRS−n値を有することが必要であり、好ましく
は、同表に示すとおりである。The filler of the present invention needs to have a particle size distribution, an average particle size, and an RRS-n value shown in Table 1, and is preferably as shown in the table.
粒度分布及び平均粒径が表−1の本発明の範囲をこえ
て微粉粒度になると、微粒子含有率が大きすぎて樹脂粘
度が上昇し、その結果フローが低下したり、また混練不
足を招いてバリの発生を抑制できなくなる。一方、粒度
分布及び平均粒径が表−1の本発明の範囲をこえて粗粉
粒度になったり、また例え粒度分布及び平均粒径が表−
1の本発明の範囲内にあっても、RRS−n値が0.80をこ
えるとダイラタンシー性が強くなり、フローが低下す
る。When the particle size distribution and the average particle size are beyond the range of the present invention in Table 1, the fine particle content is too large, the content of the fine particles is too large, the resin viscosity increases, and as a result, the flow is reduced or the kneading is insufficient. Burrs cannot be suppressed. On the other hand, the particle size distribution and the average particle size become coarse powder particle sizes beyond the range of the present invention in Table 1, and even if the particle size distribution and the average particle size are
Even within the range of the present invention, when the RRS-n value exceeds 0.80, the dilatancy is increased and the flow is reduced.
本発明の充填材の粒度の測定は、レーザー回折法によ
るが、他の測定原理による粒度測定、例えば、光透過式
自然沈降・遠心沈降、電子顕微鏡、ガスケードインパク
ター法、コールターカウンター法等による粒度測定を使
用しても、レーザー回折式との補正を行なう限り何ら支
障はないことは勿論である。なお、現在市販されている
レーザー回折式粒度測定計は、使用している波長のた
め、0.1μm以下の粒子は検出できない。したがって、
本発明の充填材に含まれる0.1μm以下の粒子の含有量
はいくらでもよいが、0.1μm以下の粒子の含有量が多
いと非常に嵩ばり作業性に劣り粉じんが発生しやすい等
の欠点が場合によってあらわれるので、それが問題とな
る場合は、0.1μm以下の粒子の含有量が制限されるこ
とがある。 Although the particle size of the filler of the present invention is measured by a laser diffraction method, the particle size is measured by another measurement principle, for example, by a light transmission type natural sedimentation / centrifugal sedimentation, an electron microscope, a gascade impactor method, a Coulter counter method, or the like. It goes without saying that there is no problem in using the particle size measurement as long as the correction with the laser diffraction method is performed. It should be noted that currently commercially available laser diffraction particle size analyzers cannot detect particles of 0.1 μm or less due to the wavelength used. Therefore,
The content of the particles of 0.1 μm or less contained in the filler of the present invention may be any amount.However, if the content of the particles of 0.1 μm or less is large, defects such as very bulky workability and easy generation of dust may occur. If this is a problem, the content of particles of 0.1 μm or less may be limited.
RRS−n値とは、RRS粒度線図の最大粒径からの累積重
量%が10〜30重量%の1点と70〜90重量%の1点とを結
んだ直線で代表されるRosin−Rammlerの式のn値のこと
をいう。なお、実際の粒度測定において、最大粒径から
の累積重量%の10〜30重量%の範囲の1点と70〜90重量
%の範囲の1点を結ぶ直線が2本以上引き得る場合に
は、これらの直線のうちで最小の勾配で代表させること
とする。The RRS-n value is a Rosin-Rammler represented by a straight line connecting one point of 10 to 30% by weight and one point of 70 to 90% by weight of the cumulative weight% from the maximum particle size in the RRS particle size diagram. Means the value of n. In the actual particle size measurement, if two or more straight lines connecting one point in the range of 10 to 30% by weight of the cumulative weight% from the maximum particle size and one point in the range of 70 to 90% by weight can be drawn. , A straight line with the smallest gradient.
ここでRRS粒度線図とは、Rosin−Rammlerの次式に従
う粒度分布を表わす粒度線図のことである。Here, the RRS particle size diagram is a particle size diagram representing a particle size distribution according to the following Rosin-Rammler equation.
R(Dp)=100exp(−b Dpn) (但し、式中R(Dp)は最大粒径から粒径Dpまでの累積
重量%、Dpは粒径、b及びnは定数である) 本発明の充填材の粒度調整は、粉砕条件の制御する方
法のみでも可能であるが、必要ならば、風篩、サイクロ
ン等の重力沈降式、遠心式、慣性力式等の乾式分級、水
篩、沈降分級、液体サイクロン、デカンター等の湿式分
級、篩分け等により微粉を除去させることもできる。R (Dp) = 100exp (-b Dp n) ( where cumulative weight percent of wherein R (Dp) from maximum particle size to the particle size Dp, Dp is the particle diameter, b and n are constants) invention The particle size of the filler can be adjusted only by controlling the pulverization conditions.However, if necessary, dry classification such as gravity sedimentation such as wind sieves and cyclones, centrifugal type, inertia type, water sieve, sedimentation Fine powder can also be removed by classification, wet classification using a hydrocyclone, a decanter or the like, sieving, or the like.
本発明の窒化物粉末及び/又は酸窒化物粉末の合計重
量に対して、10倍重量以下好ましくは3倍重量以下特に
好ましくは1倍重量以下(いずれも0を含む)の形状が
粉砕状、球状、ウイスカー状、繊維状又は鱗片状である
溶融シリカ、生シリカ、シリカチタニアガラス、クリス
トバライト化シリカ、珪酸アルミニウム、アルミナ、窒
化チタン、窒化ホウ素等の他の充填材を併用してもよ
い。10倍重量を超えると放熱性、耐熱衝撃性、耐湿信頼
性の少くとも1つの特性が損われる。なお、窒化物粉末
及び/又は酸窒化物粉末以外の充填材を使用する場合、
要求される封止材の特性に応じて充填材を使いわけるこ
とが大切である。すなわち、耐熱衝撃性及び耐湿信頼性
を重視する場合は溶融シリカやシリカチタニアガラスを
選び、熱伝導性を重視する場合は窒化チタン、窒化ホウ
素、アルミナを選び、金型等の摩耗抑制とほどほどの熱
伝導性及びコスト低減のためには生シリカ、クリストバ
ライト化シリカ、珪酸アルミニウム等を選ぶ。10 times by weight or less, preferably 3 times by weight or less, particularly preferably 1 time by weight or less (including 0) with respect to the total weight of the nitride powder and / or oxynitride powder of the present invention, the shape of which is pulverized; Spherical, whisker-like, fibrous or flaky fused silica, raw silica, silica titania glass, cristobalite silica, aluminum silicate, alumina, titanium nitride, boron nitride and the like may be used in combination. If it exceeds 10 times the weight, at least one of the properties of heat dissipation, thermal shock resistance and humidity resistance is impaired. When using a filler other than nitride powder and / or oxynitride powder,
It is important to use different fillers according to the required properties of the sealing material. In other words, when importance is placed on thermal shock resistance and moisture resistance reliability, fused silica or silica titania glass is selected, and when importance is placed on thermal conductivity, titanium nitride, boron nitride, or alumina is selected. Raw silica, cristobalite silica, aluminum silicate, etc. are selected for thermal conductivity and cost reduction.
本発明の充填材の最大粒径としては、小さいほど成型
時における素子表面の配線、パッシベーション膜、ボン
ディングワイヤ等に傷をつけたり破損をさせたりするこ
とが少なくなるが、トランスファー成形時のゲート詰り
を考慮した最大粒径は、500μm以下好ましくは149μm
以下特に好ましくは74μm以下である。As the maximum particle size of the filler of the present invention, the smaller the particle size, the less the wiring, passivation film, bonding wire, etc. on the element surface are damaged or damaged during molding, but the gate clogging during transfer molding is reduced. The maximum particle size considered is 500 μm or less, preferably 149 μm.
It is particularly preferably 74 μm or less.
本発明の充填材の樹脂組成物中の含有率は、20〜97重
量%好ましくは30〜95重量%特に好ましくは40〜90重量
%である。充填材の含有率が20重量%未満であると、樹
脂組成物の成形性は優れるが、熱応力が大きく耐熱衝熱
性や耐湿信頼性が低下する。一方、97重量%を超える
と、樹脂組成物の成形性が損われ、未充填部やボイドが
多発し、電気絶縁性や信頼性が損われる。The content of the filler of the present invention in the resin composition is 20 to 97% by weight, preferably 30 to 95% by weight, and particularly preferably 40 to 90% by weight. When the content of the filler is less than 20% by weight, the moldability of the resin composition is excellent, but the thermal stress is large, and the heat shock resistance and the moisture resistance reliability are reduced. On the other hand, if the content exceeds 97% by weight, the moldability of the resin composition is impaired, unfilled portions and voids occur frequently, and the electric insulation and reliability are impaired.
本発明の充填材が使用される樹脂としては、ビスフェ
ノール型エポキシ樹脂、フェノールノボラック型エポキ
シ樹脂、脂環型エポキシ樹脂、複素環型エポキシ樹脂、
グリシジルエステル型エポキシ樹脂、グリシジルアミン
型エポキシ樹脂、ハロゲン化エポキシ樹脂などのエポキ
シ樹脂、ポリベンズイミダゾール、ポリベンズオキサゾ
ール、ポリベンズチアゾール、ポリオキサジアゾール、
ポリピラゾール、ポリキノキサリン、ポリキナゾリンジ
オン、ポリベンズオキサジノン、ポリインドロン、ポリ
キナゾロン、ポリインドキシル、シリコン樹脂、シリコ
ン−エポキシ樹脂、フェノール樹脂、メラミン樹脂、ユ
リア樹脂、不飽和ポリエステル、ポリアミノビスマレイ
ミド、ジアリルフタレート樹脂、フッ素樹脂、TPX樹脂
(メチルペンテンポリマー「三井石油化学社製商品
名」)、ポリイミド、ポリアミドイミド、ポリエーテル
イミド、66−ナイロン及びMXD−ナイロン、アモルファ
スナイロン等のポリアミド、ポリブチレンテレフタレー
ト及びポリエチレンテレフタレート等のポリエステル、
ポリフェニレンスルフィド、変性ポリフェニレンエーテ
ル、ポリアリレート、全芳香族ポリエステル、ポリスル
ホン、液晶ポリマー、ポリエーテルエーテルケトン、ポ
リエーテルスルホン、ポリカーボネート、マレイミド変
性樹脂、ABS樹脂、AAS(アクリロニトリル・アクリルゴ
ム・スチレン)樹脂、AES(アクリロニトリル−エチレ
ン・プロピレン・ジエンゴム−スチレン)樹脂等が挙げ
られるが、封止材、電気絶縁ペースト等には、通常、エ
ポキシ樹脂やシリコン−エポキシ樹脂、より高温下での
金属との接着強度や曲げ強度等の保持のためには、ケル
イミド(三井石油化学社製商品名)、BT樹脂(三菱瓦斯
化学社製商品名)等のポリアミノビスマレイミド系樹
脂、ゲートやランナーを再利用できる封止用樹脂として
は、ポリフェニレンスルフィド、ポリフェニレンスルフ
ィドと液晶ポリマー及び/又はエポキシ基含有ポリマー
とアロイ等が好ましい。As the resin in which the filler of the present invention is used, bisphenol epoxy resin, phenol novolak epoxy resin, alicyclic epoxy resin, heterocyclic epoxy resin,
Glycidyl ester type epoxy resin, glycidylamine type epoxy resin, epoxy resin such as halogenated epoxy resin, polybenzimidazole, polybenzoxazole, polybenzthiazole, polyoxadiazole,
Polypyrazole, polyquinoxaline, polyquinazolinedione, polybenzoxazinone, polyindolone, polyquinazolone, polyindoxyl, silicone resin, silicone-epoxy resin, phenolic resin, melamine resin, urea resin, unsaturated polyester, polyaminobismaleimide, diallyl phthalate Resin, fluorine resin, TPX resin (methylpentene polymer "trade name of Mitsui Petrochemical Company"), polyimide, polyamideimide, polyetherimide, 66-nylon, MXD-nylon, polyamide such as amorphous nylon, polybutylene terephthalate and polyethylene Polyester such as terephthalate,
Polyphenylene sulfide, modified polyphenylene ether, polyarylate, wholly aromatic polyester, polysulfone, liquid crystal polymer, polyetheretherketone, polyethersulfone, polycarbonate, maleimide-modified resin, ABS resin, AAS (acrylonitrile, acrylic rubber, styrene) resin, AES (Acrylonitrile-ethylene-propylene-diene rubber-styrene) resin and the like, and the sealing material, the electric insulating paste and the like are usually epoxy resin, silicon-epoxy resin, and the adhesive strength to metal at higher temperature. For maintaining bending strength, etc., polyaminobismaleimide-based resins such as Kelimide (trade name of Mitsui Petrochemical Co., Ltd.) and BT resin (trade name of Mitsubishi Gas Chemical Co., Ltd.), sealing for reusing gates and runners Polyphenylenesul resin I de, polyphenylene sulfide and liquid crystal polymers and / or epoxy group-containing polymer and alloy, etc. are preferable.
本発明の充填材を使用した樹脂組成物には、耐熱衝撃
性を高めるために、ブチルゴム、アクリルゴム、エチレ
ンプロピレンゴム、シリコーンゴム、ポリエステルエラ
ストマー、ポリブタジエン等のゴム成分をこれら樹脂中
に含有させることもできる。さらに必要に応じて、ベン
ゾグアナミン、2,4−ジヒドラジノ−6−メチルアミノ
−S−トリアジン、2−メチルイミダゾール、2−エチ
ル−4−メチルイミダゾール、1−シアノエチル−2−
エチル−4−メチルイミダゾール等のイミダゾール誘導
体、弗化ホウ素の各種アミン錯体、トリスジメチルアミ
ノメチルフェノール、1,8−ジアザ・ビシクロ(5,4,0)
−ウンデセン−7,ベンジルジメチルアミン等の第3級ア
ミン化合物、ジシアンジアミド、ビスフェノール型エポ
キシ樹脂もしくはクレゾールノボラック型エポキシ樹脂
とアンモニアとの反応により得られるアミノアルコール
化合物、アジピン酸ヒドラジド等の含窒素硬化(促進)
剤、フェノールノボラック、クレゾールノボラック等の
フェノール系硬化剤、無水テトラヒドロフタル酸、無水
ヘキサヒドロフタル酸、無水メチルヘキサヒドロフタル
酸等の酸無水物系硬化剤、トリフェニルホスフィン、ト
リシクロヘキシルホスフィン、メチルジフェニルホスフ
ィン、トリトリルオスフィン、1,2−ビス(ジフェニル
ホスフィノ)エタン、ビス(ジフェニルホスフィノ)メ
タン等の有機ホスフィン系硬化(促進)剤、ビス−(ト
リブチル錫)オキシド、ジオクテン酸錫、オクタン酸ア
ンチモン、酪酸錫、一酸化鉛、硫化鉛、炭酸鉛等の硬化
触媒、白金化合物等の重合触媒、ベンゾイルペルオキシ
ド、ジクミルペルオキシド等の加硫剤、カルナバワック
ス、モンタナワックス、ポリエステルオリゴマー、シリ
コン油、低分子量ポリエチレン、パラフィン、直鎖脂肪
酸の金属塩、酸アミド、エステル等の滑剤・離型剤、2,
6−ジ−t−ブチル−4−メチルフェノール、1,3,5−ト
リス(2−メチル−4−ヒドロキシ−5−t−ブチルフ
ェノール)ブタン、ジステアリルチオジプロピオネー
ト、トリノニルフェニルホスファイト、トリデシルホス
ファイト等の安定剤、2,2′−ジヒドロキシ−4−メト
キシベンゾフェノン、2(2′−ヒドロキシ−5−メチ
ルフェニル)ベンゾトリアゾール、4−t−ブチルフェ
ニルサリチレート、エチル−2−シアノ−3,3−ジフェ
ニルアクリレート等の光安定剤、ベンガラ、カーボンブ
ラック等の着色剤、三酸化アンチモン、四酸化アンチモ
ン、トリフェニルスチビン、水和アルミナ、フェロセ
ン、ホスファゼン、ヘキサブロモベンゼン、テトラブロ
モフタル酸無水物、トリクレジルホスフェート、テトラ
ブロモビスフェノールA、臭素化エポキシ誘導体等の難
燃剤、ビニルトリメトキシシラン、γ−グリシドキシプ
ロピルトリメトキシシラン、γ−ウレイドプロピルトリ
エトキシシラン、N−β−(アミノエチル)−γ−アミ
ノプロピルトリメトキシシラン、β−(3,4−エポキシ
シクロヘキシル)エチルトリメトキシシラン等のシラン
系カップリング剤、イソプロピルトリインステアロイル
チタネート、ジクミルフェニルオキシアセテートチタネ
ート、ビス(ジオクチルパイロホスフェート)オキシア
セテートチタネート、イソプロピルトリデシルベンゼン
スルホニルチタネート等のチタン系カップリング剤、ア
セトアルコキシアルミニウムジイソプロピレート等のア
ルミ系カップリング剤等を配合することができる。The resin composition using the filler of the present invention contains rubber components such as butyl rubber, acrylic rubber, ethylene propylene rubber, silicone rubber, polyester elastomer, and polybutadiene in these resins in order to enhance thermal shock resistance. Can also. Further, if necessary, benzoguanamine, 2,4-dihydrazino-6-methylamino-S-triazine, 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-
Imidazole derivatives such as ethyl-4-methylimidazole, various amine complexes of boron fluoride, trisdimethylaminomethylphenol, 1,8-diazabicyclo (5,4,0)
Tertiary amine compounds such as undecene-7 and benzyldimethylamine, dicyandiamide, amino alcohol compounds obtained by reaction of bisphenol type epoxy resin or cresol novolak type epoxy resin with ammonia, and nitrogen-containing curing such as adipic hydrazide (promoted) )
Phenolic hardeners such as phenol novolak and cresol novolak, acid anhydride hardeners such as tetrahydrophthalic anhydride, hexahydrophthalic anhydride and methylhexahydrophthalic anhydride, triphenylphosphine, tricyclohexylphosphine, methyldiphenyl Organic phosphine-based curing (acceleration) agents such as phosphine, tolytriosphin, 1,2-bis (diphenylphosphino) ethane, bis (diphenylphosphino) methane, bis- (tributyltin) oxide, tin dioctenoate, octane Curing catalysts such as antimony acid, tin butyrate, lead monoxide, lead sulfide, and lead carbonate; polymerization catalysts such as platinum compounds; vulcanizing agents such as benzoyl peroxide and dicumyl peroxide; carnauba wax, montana wax, polyester oligomer, and silicone oil , Low molecular weight Ethylene, paraffin, metal salts of linear fatty acids, acid amides, lubricants, mold release agents, such as esters, 2,
6-di-t-butyl-4-methylphenol, 1,3,5-tris (2-methyl-4-hydroxy-5-t-butylphenol) butane, distearylthiodipropionate, trinonylphenyl phosphite, Stabilizers such as tridecyl phosphite, 2,2'-dihydroxy-4-methoxybenzophenone, 2 (2'-hydroxy-5-methylphenyl) benzotriazole, 4-t-butylphenyl salicylate, ethyl-2- Light stabilizers such as cyano-3,3-diphenyl acrylate, colorants such as red iron oxide and carbon black, antimony trioxide, antimony tetroxide, triphenylstibine, hydrated alumina, ferrocene, phosphazene, hexabromobenzene, and tetrabromophthalate Acid anhydride, tricresyl phosphate, tetrabromobisphenol A, odor Flame retardants such as fluorinated epoxy derivatives, vinyltrimethoxysilane, γ-glycidoxypropyltrimethoxysilane, γ-ureidopropyltriethoxysilane, N-β- (aminoethyl) -γ-aminopropyltrimethoxysilane, β- Silane coupling agents such as (3,4-epoxycyclohexyl) ethyltrimethoxysilane, isopropyltriinstearoyl titanate, dicumylphenyloxyacetate titanate, bis (dioctylpyrophosphate) oxyacetate titanate, isopropyltridecylbenzenesulfonyl titanate, etc. And an aluminum-based coupling agent such as acetoalkoxyaluminum diisopropylate.
本発明の充填剤を含有する樹脂組成物は、前記した各
成分の所定量をヘンシェルミキサー等により充分混合
後、ロール、バンバリーミキサー、ニーダー、らいかい
機、アジホモミキサー、2軸押出機、1軸押出機等の公
知の混練手段により加熱混練して製造することができ
る。The resin composition containing the filler of the present invention is prepared by sufficiently mixing a predetermined amount of each of the above-mentioned components with a Henschel mixer or the like, and then using a roll, a Banbury mixer, a kneader, a grinder, an azihomo mixer, a twin screw extruder, It can be manufactured by heating and kneading by a known kneading means such as a screw extruder.
以下本発明を実施例により具体的に説明するが、本発
明はこれらの実施例に限定されるものではない。実施例
および比較例において「部」、「%」とあるのは、「重
量部」、「重量%」を意味する。Hereinafter, the present invention will be described specifically with reference to Examples, but the present invention is not limited to these Examples. In the examples and comparative examples, “parts” and “%” mean “parts by weight” and “% by weight”.
β−窒化硅素粉末の製造 金属Si粉末(最大粒径149μm、平均粒径10μm、純
度99.9%)100部、ランプブラック70部、アエロジルOX
−50(日本アエロジル社製)30部、カルボキシメチルセ
ルロースのアンモニウム塩5%水溶液13部をVブレンダ
ーにて20分間混合後、金型プレス成形、乾燥、脱脂後窒
素気流中で250℃/hrの昇温速度で1450℃まで昇温し、14
50℃でさらに48hr時間反応させて、反応塊を得た。この
反応塊を粗砕後ボールミルで2hr粉砕し、目開き149μm
の篩網で粗粒を除去分級して表−2に示す粉末A−1〜
3を得た。これらの粉末のX線回折の結果、金属Si0.08
%、シリコンオキシナイトライド0.6%、α−窒化硅素1
4.3%、残りがβ−窒化硅素であった。Production of β-silicon nitride powder 100 parts of metal Si powder (maximum particle diameter 149 μm, average particle diameter 10 μm, purity 99.9%), lamp black 70 parts, Aerosil OX
-50 (manufactured by Nippon Aerosil Co., Ltd.), 30 parts of a 5% aqueous solution of ammonium salt of carboxymethylcellulose were mixed in a V-blender for 20 minutes, then pressed in a mold, dried, degreased, and heated at 250 ° C./hr in a nitrogen stream. Temperature to 1450 ° C,
The reaction was further carried out at 50 ° C. for 48 hours to obtain a reaction mass. This reaction mass is coarsely crushed and then pulverized for 2 hours with a ball mill, and the aperture is 149 μm.
The coarse particles were removed and classified with a sieve mesh of
3 was obtained. As a result of X-ray diffraction of these powders, metallic Si 0.08
%, Silicon oxynitride 0.6%, α-silicon nitride 1
4.3%, the balance was β-silicon nitride.
さらに粉末A−1〜3を分級点を変えてターボグラシ
ファイア(日清エンジニアリング社製)空気分級機で分
級し粉末A−4〜12を得た。The powders A-1 to A-3 were further classified by using a turbo classifier (manufactured by Nisshin Engineering Co., Ltd.) air classifier while changing the classification points to obtain powders A-4 to A-12.
α−窒化硅素粉末の製造 金属Si粉末(最大粒径149μm、平均粒径10μm、純
度99.9%)100部、カルボキシメチルセルロースのアン
モニウム塩5%水溶液10部をVブレンダーにて20分間混
合し、金型プレス成形、乾燥、脱脂後窒素気流中で1000
℃まで200℃/hrで昇温し、1000〜1450℃の間を10℃/hr
で昇温し、1450℃でさらに10hr反応をさせて反応塊を得
た。この反応塊を粉砕後、ボールミルで6hr及び2hr微粉
砕し目開き141μmの篩網で粗粒を除去し、表−2に示
す粉末A−13及びA−14を得た。X線回折の結果、金属
Si0.04%、α−窒化硅素91.2%、残りがβ−窒化硅素で
あった。Manufacture of α-silicon nitride powder 100 parts of metal Si powder (maximum particle size 149 μm, average particle size 10 μm, purity 99.9%) and 10 parts of 5% aqueous solution of ammonium salt of carboxymethylcellulose are mixed in a V blender for 20 minutes, and then a mold is prepared. Press molding, drying, degreasing, then 1000 in a nitrogen stream
Temperature up to 200 ℃ / hr, 10 ℃ / hr between 1000 and 1450 ℃
And the reaction was further allowed to proceed at 1450 ° C. for 10 hours to obtain a reaction mass. After pulverizing the reaction mass, the mixture was finely pulverized for 6 hours and 2 hours with a ball mill, and coarse particles were removed with a sieve mesh having an opening of 141 μm to obtain powders A-13 and A-14 shown in Table-2. As a result of X-ray diffraction, metal
Si was 0.04%, α-silicon nitride was 91.2%, and the balance was β-silicon nitride.
さらに粉末A−13を分級点を変えてターボグラシファ
イア(日清エンジニアリング社製)空気分級機で分級し
粉末A−15を得た。The powder A-13 was further classified with a turbo classifier (manufactured by Nisshin Engineering Co., Ltd.) air classifier while changing the classification point to obtain powder A-15.
窒化アルミニウム破砕粉末の製造 アトマイズアルミニウム粉末(最大粒径200μm、純
度99.99%)100部を黒鉛トレーに厚さ3cmになるように
均一に充填し、0.3気圧の窒素雰囲気下中、650℃で3h
r、750℃で2hr反応させたのち、さらに1000℃まで30℃/
hrで昇温し、その温度で1気圧の窒素雰囲気にし5hr反
応させて反応塊を得た。これを前述のα−窒化硅素粉末
の製造の場合と同様に粗粒を除去後分級して粉末A−16
を得た。X線回折の結果、未反応アルミニウム0.13%を
含む窒化アルミニウムであった。Manufacture of crushed aluminum nitride powder 100 parts of atomized aluminum powder (maximum particle size: 200 μm, purity: 99.99%) are uniformly filled in a graphite tray to a thickness of 3 cm, and then at 650 ° C for 3 hours in a nitrogen atmosphere at 0.3 atm.
r, After reacting at 750 ° C for 2 hours, further up to 1000 ° C at 30 ° C /
The temperature was raised in 1 hr, and the temperature was increased to 1 atm in a nitrogen atmosphere, and the reaction was carried out for 5 hr to obtain a reaction mass. In the same manner as in the production of α-silicon nitride powder described above, coarse particles were removed and classified to obtain powder A-16.
I got As a result of X-ray diffraction, it was aluminum nitride containing 0.13% of unreacted aluminum.
β−サイアロンの製造 金属Si粉末(最大粒径149μm、平均粒径10μm、純
度99.9%)42部、溶融シリカ粉末(最大粒径44μm、平
均粒径5μm、純度99.9%)29部、金属Al粉末(最大粒
径44μm、平均粒径10μm、純度99.9%)47部及びα−
アルミナ68部配合した。Production of β-sialon 42 parts of metal Si powder (maximum particle size 149 μm, average particle size 10 μm, purity 99.9%), fused silica powder (maximum particle size 44 μm, average particle size 5 μm, purity 99.9%) 29 parts, metal Al powder (Maximum particle size 44 μm, average particle size 10 μm, purity 99.9%) 47 parts and α-
68 parts of alumina were blended.
これをV型ブレンダーにて20分間混合した後、カルボ
キシメチルセルロースのアンモニウム塩の10%水溶液を
外割で8%添加しロールミルにて混練後成形し、それを
窒素ガス雰囲気中1400〜1500℃で15時間加熱して窒化焼
結体を製造し、6hr粉砕後分級して、粉末A−17を得
た。X線回折の結果、金属Si0.06%、金属アルミニウム
0.11%、α−アルミナ2.5%、残りがβ−サイアロンで
あった。This was mixed in a V-type blender for 20 minutes, then a 10% aqueous solution of an ammonium salt of carboxymethylcellulose was added in an amount of 8%, kneaded with a roll mill, and molded. After heating for a period of time, a nitrided sintered body was manufactured, pulverized for 6 hours and then classified to obtain powder A-17. X-ray diffraction results: metal Si 0.06%, metal aluminum
0.11%, α-alumina 2.5%, and the remainder were β-sialon.
シリコンオキシナイトライド結晶の製造 金属Si粉末(最大粒径74μm、平均粒径12μm、純度
99.9%)60部と生シリカ粉末(最大粒径44μm、平均粒
径10μm、純度99.9%)40部をV型ブレンダーにて20分
間混合した後カルボキシメチルセルロースのアンモニウ
ム塩の10%水溶液を外割で8%添加しロールミルにて混
練した。これをプレス成型により成形し乾燥後窒素ガス
雰囲気中1450〜1500℃で5時間加熱して窒化物を製造し
た。この窒化物をクラッシャーで1次粗砕後ボールミル
で微粉砕し、149μの篩網で粗粒を除去し、分級・粒度
調整して粉末A−18を得た。X線回折の結果、金属Si0.
11%、β−窒化硅素2.2%、α−窒化硅素1.3%、残りが
シリコンオキシナイトライドであった。Manufacture of silicon oxynitride crystals Metallic Si powder (maximum particle size 74μm, average particle size 12μm, purity
60 parts of 99.9%) and 40 parts of raw silica powder (maximum particle diameter 44μm, average particle diameter 10μm, purity 99.9%) were mixed in a V-type blender for 20 minutes, and then a 10% aqueous solution of carboxymethylcellulose ammonium salt was divided 8% was added and kneaded with a roll mill. This was molded by press molding, dried and heated in a nitrogen gas atmosphere at 1450 to 1500 ° C. for 5 hours to produce a nitride. The nitride was subjected to primary crushing with a crusher and then finely crushed with a ball mill, coarse particles were removed with a 149 μm sieve, and classification and particle size were adjusted to obtain powder A-18. As a result of X-ray diffraction, metal Si0.
11%, β-silicon nitride 2.2%, α-silicon nitride 1.3%, the remainder was silicon oxynitride.
エポキシ樹脂組成物の製造 クレゾールノボラックエポキシ樹脂(エポキシ当量21
5)150部、臭素化クレゾールノボラックエポキシ樹脂
(エポキシ当量350)45部、フェノールノボラック樹脂
(フェノール当量107)87部からなる樹脂組成物に表−
2で示す充填剤、三酸化アンチモン5.6部、カーボンブ
ラック3部、カルナバワックス4.4部および硬化促進剤
として2−ウンデシルイミダゾール2.5部、γ−グリシ
ドキシプロピルトリメトキシシラン5部をミキシングロ
ールで混練後粉砕してエポキシ樹脂組成物を調整した。
これらの樹脂組成物を次に示す評価試験を実施した。そ
の結果を表−3に示す。Production of epoxy resin composition Cresol novolak epoxy resin (epoxy equivalent 21
5) A resin composition comprising 150 parts, 45 parts of a brominated cresol novolak epoxy resin (epoxy equivalent: 350), and 87 parts of a phenol novolak resin (phenol equivalent: 107) is shown in Table 1.
Kneading a filler indicated by 2, kneading 5.6 parts of antimony trioxide, 3 parts of carbon black, 4.4 parts of carnauba wax, 2.5 parts of 2-undecylimidazole as a curing accelerator, and 5 parts of γ-glycidoxypropyltrimethoxysilane. Thereafter, the resultant was pulverized to prepare an epoxy resin composition.
These resin compositions were subjected to the following evaluation tests. Table 3 shows the results.
表−2〜3において記載した測定値は次の方法によっ
た。The measurement values described in Tables 2 to 3 were based on the following methods.
(1) 粒度 レーザー回折式法による粒度測定(シーラス社製Gran
ulometerモデル715型)を行なった。(1) Particle size Particle size measurement by laser diffraction method (Cirrus Gran
ulometer model 715).
(2) 成形性(スパイラルフロー) EMMI規格に準じた金型を使用し成形温度170℃、成形
圧力70kg/cm2で測定した。(2) Moldability (spiral flow) The moldability was measured at a molding temperature of 170 ° C. and a molding pressure of 70 kg / cm 2 using a mold conforming to the EMMI standard.
(3) バリ 2,5,10,30μmの所定厚みのスリットを持つ金型を用
い成形温度170℃、成形圧力70kg/cm2で流動長を測定
し、その最大値を示した。(3) Burr Using a mold having slits of predetermined thicknesses of 2, 5, 10, and 30 μm, the flow length was measured at a molding temperature of 170 ° C. and a molding pressure of 70 kg / cm 2 , and the maximum value was shown.
(4) 放熱性 熱伝導率測定装置(アグネ社製「ARC−TC−1型」)
を用い、室温において温度傾斜法で測定した。(4) Heat dissipation Thermal conductivity measurement device (Agne “ARC-TC-1”)
Was measured at room temperature by a temperature gradient method.
(5) 耐ヒートショック性評価(耐T/S性) アイランドサイズ4×7.5mmの16ピンリードフレーム
を各組成物によりトランスファー成形し、その16ピンDI
P型成形体を−196℃の液体と260℃の液体に30秒ずつ浸
漬を200回繰り返して成形体表面のクラックの発生率を
試料個数50個から求めた。(5) Heat shock resistance evaluation (T / S resistance) A 16-pin lead frame with an island size of 4 x 7.5 mm was transfer-molded with each composition, and its 16-pin DI
The P-shaped molded body was repeatedly immersed in a liquid at −196 ° C. and a liquid at 260 ° C. for 30 seconds for 200 times, and the crack occurrence rate on the surface of the molded body was determined from 50 samples.
〔発明の効果〕 本発明の充填材を使用することにより、スパイラルフ
ロー特性、バリ特性及び放熱性のいずれにおいても優れ
た樹脂組成物を得ることができる。 [Effects of the Invention] By using the filler of the present invention, it is possible to obtain a resin composition having excellent spiral flow characteristics, burr characteristics and heat dissipation.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平1−115940(JP,A) 特開 平1−261435(JP,A) ────────────────────────────────────────────────── ─── Continuation of the front page (56) References JP-A-1-115940 (JP, A) JP-A-1-261435 (JP, A)
Claims (1)
は酸窒化物粉末を含有してなる無機粉末からなることを
特徴とする樹脂用充填材。 (粒度分布) −1μ 5〜10% −2μ 6〜12% −3μ 10〜16% −8μ 35〜47% −24μ 51〜63% −48μ 67〜75% −96μ 88〜92% (平均粒径) 9〜22μm (RRS−n値) ≦0.801. A resin filler comprising an inorganic powder containing a nitride powder and / or an oxynitride powder having the following particle size characteristics. (Particle size distribution) -1μ 5-10% -2μ 6-12% -3μ 10-16% -8μ 35-47% -24μ 51-63% -48μ 67-75% -96μ 88-92% ) 9 ~ 22μm (RRS-n value) ≤0.80
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2110200A JP3020995B2 (en) | 1990-04-27 | 1990-04-27 | Filler for resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2110200A JP3020995B2 (en) | 1990-04-27 | 1990-04-27 | Filler for resin |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH048740A JPH048740A (en) | 1992-01-13 |
| JP3020995B2 true JP3020995B2 (en) | 2000-03-15 |
Family
ID=14529590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2110200A Expired - Fee Related JP3020995B2 (en) | 1990-04-27 | 1990-04-27 | Filler for resin |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3020995B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001348488A (en) * | 2000-06-06 | 2001-12-18 | Matsushita Electric Works Ltd | Thermal conductive resin composition, prepreg, heat dissipating circuit board and heat dissipating heat generating component |
| JP7852219B2 (en) * | 2021-10-05 | 2026-04-28 | Ube株式会社 | Silicon oxynitride-containing composition, heat-dissipating resin composition, and heat-dissipating resin composition film sheet using the same. |
| JP2023157669A (en) * | 2022-04-15 | 2023-10-26 | Ube株式会社 | Heat dissipating resin composition and heat dissipating member |
-
1990
- 1990-04-27 JP JP2110200A patent/JP3020995B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH048740A (en) | 1992-01-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP7069485B2 (en) | Hexagonal boron nitride powder and its manufacturing method, as well as compositions and radiating materials using it. | |
| JP6794613B2 (en) | Boron Nitride Agglomerated Particles, Method for Producing Boron Nitride Aggregated Particles, Boron Nitride Agglomerated Particle-Containing Resin Composition, and Mold | |
| US6207296B1 (en) | Inorganic filler, epoxy resin composition, and semiconductor device | |
| EP1997777B1 (en) | Silica powder and use thereof | |
| JP3468996B2 (en) | Epoxy resin composition and resin-encapsulated semiconductor device | |
| JP3937494B2 (en) | Alumina-filled resin or rubber composition | |
| JP2023146761A (en) | Spherical alumina particles, manufacturing method thereof, surface treatment method of spherical alumina particle raw material, resin composite composition containing the spherical alumina particles, and resin composite composition | |
| JP2583261B2 (en) | filler | |
| CN115348951A (en) | Carbon-containing alumina powder, resin composition, heat-dissipating member, and method for producing carbon-containing alumina powder | |
| JP3020995B2 (en) | Filler for resin | |
| JP2825158B2 (en) | Filler for resin | |
| JP2021113267A (en) | Thermosetting resin composition, electronic apparatus, method for producing thermally conductive material, and method for producing thermosetting resin composition | |
| WO2019111707A1 (en) | Epoxy resin composition and electronic device | |
| JP3458196B2 (en) | High thermal conductive resin composition | |
| JP2021138864A (en) | Sealing resin composition and electronic device | |
| JP2019100935A (en) | Inspection method and method for producing epoxy resin composition | |
| JP3572692B2 (en) | α-Alumina powder-containing resin composition and rubber composition | |
| JP2022019065A (en) | Resin composition for semiconductor sealing and semiconductor device | |
| JP2601255B2 (en) | Filler for semiconductor resin sealing | |
| JP2021113269A (en) | Thermosetting resin composition, electronic apparatus, and method for producing thermosetting resin composition | |
| JPH03140322A (en) | Epoxy resin molding material for semiconductor-sealing and resin-sealed semiconductor device | |
| JP2789088B2 (en) | Method for producing particulate inorganic composite | |
| JP2649054B2 (en) | Particulate inorganic composite and method for producing the same | |
| JP2019099726A (en) | Epoxy resin and electronic apparatus | |
| JPH01115940A (en) | Filler for semiconductor sealing resin |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| LAPS | Cancellation because of no payment of annual fees |