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JP3022129B2 - Thin film solar cell and manufacturing method - Google Patents
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JP3022129B2 - Thin film solar cell and manufacturing method - Google Patents

Thin film solar cell and manufacturing method

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Publication number
JP3022129B2
JP3022129B2 JP6005117A JP511794A JP3022129B2 JP 3022129 B2 JP3022129 B2 JP 3022129B2 JP 6005117 A JP6005117 A JP 6005117A JP 511794 A JP511794 A JP 511794A JP 3022129 B2 JP3022129 B2 JP 3022129B2
Authority
JP
Japan
Prior art keywords
solar cell
cdx
mgx
thin
chalcogenide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6005117A
Other languages
Japanese (ja)
Other versions
JPH07211926A (en
Inventor
光佑 池田
裕子 和田
幹彦 西谷
隆博 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP6005117A priority Critical patent/JP3022129B2/en
Publication of JPH07211926A publication Critical patent/JPH07211926A/en
Application granted granted Critical
Publication of JP3022129B2 publication Critical patent/JP3022129B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/543Solar cells from Group II-VI materials
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Photovoltaic Devices (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、光透過窓層の改良され
薄膜太陽電池とその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin-film solar cell having an improved light-transmitting window layer and a method for manufacturing the same.

【0002】[0002]

【従来の技術】近い将来、エネルギー供給が次第に困難
になることが予想され、太陽電池の高効率化、低コスト
化が大きな課題になってきた。なかでも、大面積化が容
易な薄膜系太陽電池は、大幅な低コスト化が可能なの
で、そのエネルギー変換効率の向上が強く望まれてい
る。この薄膜系太陽電池には、化合物半導体(II−VI族
やI−III−VI2族)薄膜を用いたものが広く開発されつ
つある。化合物半導体薄膜を用いた太陽電池の構成は、
バンドギャップが広くて光を透過する窓層としてのn型
CdS系半導体層と、バンドギャップが狭くて光吸収層
として機能するCdTe系あるいはCuInSe2系な
どのp型の半導体層を積層したヘテロ接合が用いられ
る。
2. Description of the Related Art In the near future, it is expected that energy supply will gradually become more difficult, and high efficiency and low cost of solar cells have become major issues. Above all, thin-film solar cells, which can be easily enlarged, can be significantly reduced in cost, and therefore, there is a strong demand for improvement in energy conversion efficiency. As this thin-film solar cell, a solar cell using a compound semiconductor (II-VI or I-III-VI 2 ) thin film is being widely developed. The structure of a solar cell using a compound semiconductor thin film is as follows:
And n-type CdS-based semiconductor layer as a window layer that transmits light wide band gap heterojunction formed by laminating a p-type semiconductor layer, such as CdTe-based or CuInSe 2 system narrow band gap functions as a light absorbing layer Is used.

【0003】構成としては、例えばITO(Indium T
in Oxide)を設けたガラス基板上にn型CdS層を、
次いでp型CdTe層をそれぞれ蒸着法で積層形成し、
最後に金属電極を設けて太陽電池とする。あるいは、ガ
ラス基板上にスクリーン印刷と焼成によってn型CdS
層を、次いで同様にスクリーン印刷と焼成によってp型
CdTe層を形成し、最後に金属あるいは炭素電極層を
設けて太陽電池とする。CdSの代わりにバンドギャッ
プのより広い半導体、例えばCdS−ZnS固溶体薄膜
を用いることが、透過光量を増やし変換効率を上げるこ
とに大変有効であることが知られている。
As a configuration, for example, ITO (Indium T
an N-type CdS layer on a glass substrate provided with
Next, a p-type CdTe layer is formed by vapor deposition, respectively.
Finally, a metal electrode is provided to complete a solar cell. Alternatively, n-type CdS is formed by screen printing and firing on a glass substrate.
The layer is then formed into a p-type CdTe layer by screen printing and firing in the same manner, and finally a metal or carbon electrode layer is provided to form a solar cell. It is known that using a semiconductor having a wider band gap, for example, a CdS-ZnS solid solution thin film instead of CdS is very effective in increasing the amount of transmitted light and increasing the conversion efficiency.

【0004】[0004]

【発明が解決しようとする課題】この様に、バンドギャ
ップの広い低抵抗の半導体薄膜の窓層を用いることは、
変換効率の向上に有効であるが、CdS−ZnS固溶体
薄膜でもZnSの組成比が高くなると高抵抗になり、か
えって変換効率を低くしてしまうことがある。バンドギ
ャップの広い低抵抗のn型半導体薄膜を用いることが望
まれる。さらに、一般に窓層と光吸収層とが結晶構造や
格子定数が異なるため、この両層の界面で多くの欠陥が
生じ、これらが再結合中心となり、光発生した電子・正
孔の再結合をうながし、それらの寿命を短くし、変換効
率向上を妨げている。
As described above, using a window layer of a semiconductor thin film having a wide bandgap and a low resistance is difficult.
Although effective for improving the conversion efficiency, the CdS-ZnS solid solution thin film may have a high resistance if the composition ratio of ZnS is high, and may instead lower the conversion efficiency. It is desired to use a low-resistance n-type semiconductor thin film having a wide band gap. Furthermore, since the window layer and the light absorbing layer generally have different crystal structures and lattice constants, many defects are generated at the interface between the two layers, and these become recombination centers, which cause recombination of photo-generated electrons and holes. They shorten their life and hinder the improvement of the conversion efficiency.

【0005】[0005]

【課題を解決するための手段】本発明の薄膜太陽電池の
構成は、電極層を設けた基板あるいは電極性を備えた金
属基板上に、p型半導体薄膜からなる光吸収層を設け、
この光吸収層の上にCdのカルコゲン化物CdX(カル
コゲンX=S、Se、あるいはTe)とMgのカルコゲ
ン化物MgXの固溶体CdX−MgXを主体とするn型
半導体薄膜からなる窓層、および透明導電層を順次積層
した構成、あるいは透光性基板上に、透明導電層を設
け、この透明導電層の上にCdのカルコゲン化物CdX
とMgのカルコゲン化物MgXの固溶体CdX−MgX
を主体とするn型半導体薄膜からなる窓層、p型半導体
薄膜からなる光吸収層、および電極層を順次積層した構
成である。
According to the structure of the thin-film solar cell of the present invention, a light-absorbing layer made of a p-type semiconductor thin film is provided on a substrate provided with an electrode layer or a metal substrate having electrode properties .
A window layer made of an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of a chalcogenide CdX of Cd (chalcogen X = S, Se, or Te) and a chalcogenide MgX of Mg on the light absorbing layer , and a transparent conductive layer. sequentially stacked structure of the layers, or on a transparent substrate, set the transparent conductive layer
The Cd chalcogenide CdX is placed on the transparent conductive layer.
Solution CdX-MgX of Mg and chalcogenide MgX
Layer composed mainly of n-type semiconductor thin film , p-type semiconductor
In this configuration, a light absorption layer made of a thin film and an electrode layer are sequentially laminated.

【0006】また、前記のように、固溶体CdX−Mg
Xを主体とするn型半導体薄膜からなる窓層を有する
太陽電池の製造方法は、CdXとMgを同時に蒸着す
ることにより前記窓層を形成する方法である。前記窓層
を形成する他の方法は、Cd、MgおよびカルコゲンX
を同時に蒸着する方法、CdXとMgXの固溶体をスパ
ッタリング蒸着する方法、CdとMgを同時に蒸着また
は順次蒸着して積層した後、カルコゲンXを含む雰囲気
中で熱処理する方法、あるいはCdとMgを同時または
積層して蒸着した後カルコゲンXを蒸着し、その後、熱
処理する方法である。
Further, as described above, the solid solution CdX-Mg
Thin having a window layer composed of n-type semiconductor thin film mainly made of X
The method for manufacturing a membrane solar cell is a method for forming the window layer by simultaneously depositing CdX and Mg. Other methods of forming the window layer include Cd, Mg and chalcogen X.
Simultaneously, a method of sputtering and depositing a solid solution of CdX and MgX, a method of simultaneously depositing or sequentially depositing Cd and Mg, and a heat treatment in an atmosphere containing chalcogen X, or a method of simultaneously or simultaneously depositing Cd and Mg. This is a method in which chalcogen X is deposited after the layers are deposited and then heat-treated.

【0007】ここで、カルコゲンがTeであると、通常
p型半導体の光吸収層として用いられるCdTeやCu
InSe2系材料とのマッチングが良く好ましい。ま
た、前記固溶体中のMgTeの組成比が50モル%以上
であると、その吸収端波長がCdSのそれより短波長と
なるのでさらに好ましい。光透過窓層がCdTe−Mg
Te固溶体であるときに、p型半導体の光吸収層がCd
Teであると、それぞれの格子定数がほとんど変わらな
いので都合が良く、特にMgTeの組成比が50モル%
以上であるときは、透過光量、格子定数のマッチングの
点で最良の組合せとなる。
Here, when the chalcogen is Te, CdTe or Cu which is usually used as a light absorbing layer of a p-type semiconductor is used.
Good matching with InSe 2 -based material is preferable. Further, it is more preferable that the composition ratio of MgTe in the solid solution is 50 mol% or more, since the absorption edge wavelength becomes shorter than that of CdS. Light transmission window layer is CdTe-Mg
When it is a Te solid solution, the light absorbing layer of the p-type semiconductor is Cd
Te is convenient because the lattice constants of each are hardly changed. Particularly, the composition ratio of MgTe is 50 mol%.
When the above is satisfied, the best combination is obtained in terms of matching of the amount of transmitted light and the lattice constant.

【0008】[0008]

【作用】本発明の太陽電池の構成によれば、CdX−M
gX固溶体のバンドギャップがCdSに比較して広いの
で窓層を透過する光量が増え、そのためp型半導体の光
吸収層に吸収される光量が増え、その結果太陽電池の効
率が向上する。特に、カルコゲンがTeである場合に
は、光吸収層をCdTeで形成し、窓層をCdTe−M
gTe固溶体で形成すれば、両層の半導体における格子
常数の差が殆どないので、pn接合界面にでき易い再結
合中心となる欠陥の発生が押さえられ、著しい特性向
上、特に開放電圧の向上が得られる。また、本発明のC
dXとMgの2源による同時蒸着、あるいはCdXとM
gXの同時蒸着、あるいはCdXとMgXの固溶体ある
いは混合物を直接蒸着、あるいはCdとMgを同時また
は積層蒸着後カルコゲンXを含む雰囲気中で熱処理、あ
るいはCdとMgを同時または積層蒸着後カルコゲンX
を蒸着して熱処理するという製造方法によれば、バンド
ギャップの広いCdX−MgX固溶体薄膜を安価な蒸着
装置で容易に得ることができる。
According to the structure of the solar cell of the present invention, CdX-M
Since the band gap of the gX solid solution is wider than that of CdS, the amount of light transmitted through the window layer increases, and therefore the amount of light absorbed by the light absorbing layer of the p-type semiconductor increases, and as a result, the efficiency of the solar cell improves. In particular, when the chalcogen is Te, the light absorbing layer is formed of CdTe, and the window layer is formed of CdTe-M
When formed of a gTe solid solution, since there is almost no difference in lattice constant between the semiconductors in both layers, the generation of defects that are likely to form recombination centers at the pn junction interface is suppressed, and a remarkable improvement in characteristics, particularly an improvement in open-circuit voltage, is obtained. Can be The C of the present invention
Simultaneous deposition using two sources of dX and Mg, or CdX and M
gX simultaneous deposition, or direct deposition of a solid solution or a mixture of CdX and MgX, or simultaneous treatment of Cd and Mg or laminated deposition followed by heat treatment in an atmosphere containing chalcogen X, or simultaneous deposition of Cd and Mg or laminated deposition of chalcogen X
Can be easily obtained with an inexpensive deposition apparatus using a CdX-MgX solid solution thin film having a wide band gap.

【0009】[0009]

【実施例】以下、本発明の実施例を説明する。図1およ
び図2は本発明による太陽電池の構成例を示す。図1
は、電極性を備えた金属基板または電極層を設けた基板
1上に、p型半導体からなる光吸収層2、固溶体CdX
−MgXを主体とするn型半導体からなる窓層3、およ
び透明導電層4を順次形成した構成を有する太陽電池で
ある。
Embodiments of the present invention will be described below. 1 and 2 show examples of the configuration of a solar cell according to the present invention. FIG.
A light absorbing layer 2 made of a p-type semiconductor and a solid solution CdX on a metal substrate having electrode properties or a substrate 1 provided with an electrode layer.
-A solar cell having a configuration in which a window layer 3 made of an n-type semiconductor mainly composed of MgX and a transparent conductive layer 4 are sequentially formed.

【0010】また、図2の太陽電池は、透明導電層6を
設けた透光性基板5上に、CdXとMgXの薄膜を主体
とするn型半導体からなる窓層7を形成し、その上にp
型半導体からなる光吸収層8を、さらにその上に電極層
9を形成したものである。
In the solar cell shown in FIG. 2, a window layer 7 made of an n-type semiconductor mainly composed of a thin film of CdX and MgX is formed on a light-transmitting substrate 5 provided with a transparent conductive layer 6. To p
A light absorption layer 8 made of a mold semiconductor, and an electrode layer 9 is further formed thereon.

【0011】[実施例1]Pt電極層を設けたガラス基
板上に、5μm厚のCdTeを主体とするp型半導体か
らなる光吸収層を蒸着により形成し、この表面を約10
0オングストロームほどエッチング法で除去し、その上
にCdTeとMgの同時蒸着によりCdTeとMgTe
のモル比が1:1で、全体の厚さが0.5μmのCdT
e−MgTe固溶体膜Cd0.5Mg0.5Teを形成する。
次に、この膜にInを添加する。すなわち、Cd0.5
0.5Te膜の上に全体の1%のInを蒸着し、N2ガス
中400℃で30分加熱し、拡散させInの有効添加を
施す。この様にして形成したn型半導体からなる窓層の
上に、透明電極層ITOを形成する。こうして、図1に
示すような構成の太陽電池を作製する。
[Example 1] On a glass substrate provided with a Pt electrode layer, a light absorbing layer made of a p-type semiconductor mainly composed of CdTe and having a thickness of 5 μm was formed by vapor deposition.
0 angstrom is removed by an etching method, and CdTe and MgTe are further deposited thereon by co-evaporation of CdTe and Mg.
Is 1: 1 and the total thickness is 0.5 μm.
An e-MgTe solid solution film Cd 0.5 Mg 0.5 Te is formed.
Next, In is added to this film. That is, Cd 0.5 M
On the g 0.5 Te film, 1% of the whole In is vapor-deposited and heated in N 2 gas at 400 ° C. for 30 minutes to be diffused and effective addition of In is performed. A transparent electrode layer ITO is formed on the window layer made of the n-type semiconductor thus formed. Thus, a solar cell having a configuration as shown in FIG. 1 is manufactured.

【0012】[実施例2]CdTeとMgTeのモル比
が2:8の固溶体膜Cd0.2Mg0.8Teを用いた他は実
施例1と同様にして太陽電池を形成する。 [比較例1]窓層を通常のCdS、すなわちCdS蒸着
膜に1%のInを添加し、他は実施例1と同様にして太
陽電池を作製する。
Example 2 A solar cell is formed in the same manner as in Example 1 except that a solid solution film Cd 0.2 Mg 0.8 Te having a molar ratio of CdTe and MgTe of 2: 8 is used. Comparative Example 1 A solar cell is manufactured in the same manner as in Example 1 except that the window layer is made of ordinary CdS, that is, 1% of In is added to a CdS vapor-deposited film.

【0013】[実施例3] 透明導電層ITOを設けたガラス基板上に、CdTeと
Mgの同時蒸着によりCdTeとMgTeのモル比が
1:1で、全体の厚さが0.5μmの固溶体膜Cd0.5
Mg0.5Teを形成する。次いで、この膜にInを添加
する。すなわち、Cd0.5Mg0.5Te膜の上に全体の1
%のInを蒸着し、N2ガス中400℃で30分加熱
し、拡散させInの有効添加を施す。成したn型半導
体からなる窓層の上に、5μm厚のCdTeを主体とす
るp型半導体からなる光吸収層を蒸着形成し、その上に
Au電極を形成する。こうして図2に示すような構成の
太陽電池を作製する。
Example 3 A solid solution film having a molar ratio of CdTe and MgTe of 1: 1 and a total thickness of 0.5 μm on a glass substrate provided with a transparent conductive layer ITO by simultaneous vapor deposition of CdTe and Mg. Cd 0.5
Mg 0.5 Te is formed. Next, In is added to this film. That is, the entire 1d layer is formed on the Cd 0.5 Mg 0.5 Te film.
% Of In is vapor-deposited and heated at 400 ° C. for 30 minutes in N 2 gas to be diffused and effectively added to In. On the window layer made of n-type semiconductor which forms the shape, the light-absorbing layer made of p-type semiconductor consisting mainly of a 5μm thick CdTe is vapor deposited to form an Au electrode thereon. Thus, a solar cell having a configuration as shown in FIG. 2 is manufactured.

【0014】[実施例4]CdTeとMgTeのモル比
が2:8の固溶体膜Cd0.2Mg0.8Teを用いた他は実
施例3と同様にして太陽電池を形成する。[比較例2]
窓層を従来通りのCdS蒸着膜に1%のInを添加し、
他は実施例3と同様にして太陽電池を作製する。
Example 4 A solar cell is formed in the same manner as in Example 3 except that a solid solution film Cd 0.2 Mg 0.8 Te having a molar ratio of CdTe to MgTe of 2: 8 is used. [Comparative Example 2]
A window layer is formed by adding 1% of In to a conventional CdS vapor-deposited film,
Otherwise, a solar cell is manufactured in the same manner as in Example 3.

【0015】上記各実施例および比較例の太陽電池のA
M1(100mW/cm2)の照射光に対する特性を表
1および表2に示す。なお、Voc(V)は放電圧、
Jsc(mA/cm2)は閉路電流、η(%)は変換効
率、F.F.は曲線因子を表す。
A of the solar cells of each of the above Examples and Comparative Examples
Tables 1 and 2 show the characteristics with respect to the irradiation light of M1 (100 mW / cm 2 ). Incidentally, Voc (V) is a voltage discharge opening,
Jsc (mA / cm 2 ) is the closing current, η (%) is the conversion efficiency, F. Represents a fill factor.

【0016】[0016]

【表1】 [Table 1]

【0017】[0017]

【表2】 [Table 2]

【0018】表1および表2に見られる様に、本発明の
構成で得られた太陽電池の特性は、従来の構成で得られ
る太陽電池の特性よりはるかに優れている。これは本発
明の太陽電池のCdTe−MgTe固溶体膜は、従来の
太陽電池のCdS膜に比べて分光透過率が大であるから
である。また、開放電圧(Voc)の著しい向上は、先
に述べたpn両層を構成する半導体層CdTeとCdT
e−MgTe固溶体の格子常数の差異が著しく小さいこ
とによると考えられる。この様にCdTe、Mgの同時
蒸着により得られたCdTe−MgTe固溶体膜を備え
た太陽電池は、優れた特性を有する。Inの添加は、光
透過率と電気伝導度を高める。
As can be seen from Tables 1 and 2, the characteristics of the solar cell obtained with the structure of the present invention are far superior to those of the solar cell obtained with the conventional structure. This is because the CdTe-MgTe solid solution film of the solar cell of the present invention has a higher spectral transmittance than the CdS film of the conventional solar cell. Further, the remarkable improvement of the open circuit voltage (Voc) is due to the above-mentioned semiconductor layers CdTe and CdT constituting both pn layers.
It is considered that the difference of the lattice constant of the e-MgTe solid solution is extremely small. A solar cell including a CdTe-MgTe solid solution film obtained by co-evaporation of CdTe and Mg has excellent characteristics. Addition of In increases light transmittance and electric conductivity.

【0019】CdTeとMgTeの他の組成比の固溶体
CdTe−MgTeを用いても、またInの代わりにA
lやGaを用いても同様の効果が得られる。この固溶体
薄膜は、以下の方法によっても得ることができる。すな
わち、Cd、TeとMgを同時に蒸着する方法、CdT
eとMgTeの同時蒸着でMgTeを電子ビーム法で蒸
着する方法、CdTe−MgTeの固溶体や混合物をス
パッタリング法で蒸着する方法、CdとMgを同時にま
たは積層して蒸着後Teを含む雰囲気中で熱処理する方
法、あるいはCdとMgを同時にまたは積層して蒸着後
Teを蒸着し、次いで熱処理する方法などである。ある
いは、さらにTe化物やTeの代わりに他のカルコゲン
化物(CdSあるいはCdSe)やカルコゲン(Sある
いはSe)を用いても同様の効果が得られる。
Even if a solid solution CdTe-MgTe having another composition ratio of CdTe and MgTe is used, A may be used instead of In.
Similar effects can be obtained by using 1 or Ga. This solid solution thin film can also be obtained by the following method. That is, a method of simultaneously depositing Cd, Te and Mg, CdT
a method of evaporating MgTe by an electron beam method by co-evaporation of e and MgTe, a method of evaporating a solid solution or a mixture of CdTe-MgTe by a sputtering method, and a heat treatment in an atmosphere containing Te after evaporating Cd and Mg simultaneously or laminated. Or a method of simultaneously depositing or depositing Cd and Mg and depositing Te after vapor deposition, followed by heat treatment. Alternatively, the same effect can be obtained by using another chalcogenide (CdS or CdSe) or chalcogen (S or Se) instead of Te compound or Te.

【0020】[0020]

【発明の効果】本発明により、変換効率の非常に高い優
れた太陽電池を容易に得ることが可能となる。この太陽
電池は、薄膜構成であることから、大幅なコストダウン
も図れる。
According to the present invention, an excellent solar cell having a very high conversion efficiency can be easily obtained. Since this solar cell has a thin-film configuration, a significant cost reduction can be achieved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例の太陽電池の構成を示す縦断
面図である。
FIG. 1 is a longitudinal sectional view showing a configuration of a solar cell according to one embodiment of the present invention.

【図2】本発明の他の実施例における太陽電池の構成を
示す縦断面図である。
FIG. 2 is a longitudinal sectional view showing a configuration of a solar cell according to another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 電極層を設けた基板あるいは電極性を備えた金属
基板 2 p型半導体からなる光吸収層 3 CdX−MgX固溶体を主体とするn型半導体か
らなる窓層 4 透明導電層 5 透光性基板 6 透明導電層 7 CdX−MgX固溶体を主体とするn型半導体か
らなる窓層 8 p型半導体からなる光吸収層 9 電極層
Reference Signs List 1 substrate provided with electrode layer or metal substrate provided with electrode properties 2 light absorption layer made of p-type semiconductor 3 window layer made of n-type semiconductor mainly composed of CdX-MgX solid solution 4 transparent conductive layer 5 translucent substrate 6 Transparent conductive layer 7 Window layer made of n-type semiconductor mainly composed of CdX-MgX solid solution 8 Light absorbing layer made of p-type semiconductor 9 Electrode layer

───────────────────────────────────────────────────── フロントページの続き (72)発明者 和田 隆博 大阪府門真市大字門真1006番地 松下電 器産業株式会社内 (56)参考文献 特開 平4−74481(JP,A) 特開 平4−83379(JP,A) 特開 平3−64974(JP,A) 特公 昭51−26366(JP,B2) (58)調査した分野(Int.Cl.7,DB名) H01L 31/04 - 31/078 C01G 11/00 - 11/02 ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Takahiro Wada 1006 Kazuma Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd. (56) References JP-A-4-74481 (JP, A) JP-A-4-4- 83379 (JP, A) JP-A-3-64974 (JP, A) JP-B-51-26366 (JP, B2) (58) Fields investigated (Int. Cl. 7 , DB name) H01L 31/04-31 / 078 C01G 11/00-11/02

Claims (10)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 電極層を設けた基板あるいは電極性を備
えた金属基板上に、p型半導体薄膜からなる光吸収層
設け、前記光吸収層の上にCdのカルコゲン化物CdX
(カルコゲンX=S、Se、あるいはTe)とMgのカ
ルコゲン化物MgXの固溶体CdX−MgXを主体とす
るn型半導体薄膜からなる窓層、および透明導電層を
積層した構成を有することを特徴とする薄膜太陽電
池。
To 1. A electrode layer provided substrate or metal substrate having an electrode of the light-absorbing layer made of p-type semiconductor thin film
Cd chalcogenide CdX on the light absorbing layer.
(Chalcogen X = S, Se, or Te) and a chalcogenide of Mg, a window layer composed of an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of MgX, and a transparent conductive layer in this order.
A thin-film solar cell having the following laminated structure.
【請求項2】 透光性基板上に、透明導電層を設け、前
記透明導電層の上にCdのカルコゲン化物CdX(カル
コゲンX=S、Se、あるいはTe)とマグネシウムの
カルコゲン化物MgXの固溶体CdX−MgXを主体と
するn型半導体薄膜からなる窓層、p型半導体からなる
光吸収層、および電極層を順次積層した構成を有するこ
とを特徴とする薄膜太陽電池。
2. A transparent conductive layer is provided on a translucent substrate.
A window layer made of an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of Cd chalcogenide CdX (chalcogen X = S, Se, or Te) and magnesium chalcogenide MgX on the transparent conductive layer, p-type semiconductor A thin-film solar cell having a configuration in which a light absorption layer made of a material and an electrode layer are sequentially laminated.
【請求項3】 カルコゲンがTeであり、前記固溶体中
のMgTeの組成比が50%モル以上である請求項1ま
たは2記載の薄膜太陽電池。
3. The thin-film solar cell according to claim 1, wherein the chalcogen is Te, and the composition ratio of MgTe in the solid solution is 50% by mole or more.
【請求項4】 光吸収層のp型半導体薄膜がCdTeで
ある請求項3記載の薄膜太陽電池。
4. The thin-film solar cell according to claim 3, wherein the p-type semiconductor thin film of the light absorbing layer is CdTe.
【請求項5】 Cdのカルコゲン化物CdX(カルコゲ
ンX=S、Se、あるいはTe)とMgのカルコゲン化
物MgXの固溶体CdX−MgXを主体とするn型半導
薄膜からなる窓層を有する薄膜太陽電池の製造方法で
あって、CdXとMgを同時に蒸着することにより前記
窓層を形成することを特徴とする薄膜太陽電池の製造方
法。
5. A thin-film solar cell having a window layer comprising an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of a chalcogenide CdX of Cd (chalcogen X = S, Se or Te) and a chalcogenide MgX of Mg. A method of manufacturing a thin-film solar cell, wherein the window layer is formed by simultaneously depositing CdX and Mg.
【請求項6】 Cdのカルコゲン化物CdX(カルコゲ
ンX=S、Se、あるいはTe)とMgのカルコゲン化
物MgXの固溶体CdX−MgXを主体とするn型半導
薄膜からなる窓層を有する薄膜太陽電池の製造方法で
あって、Cd、MgおよびカルコゲンXを同時に蒸着す
ることにより前記窓層を形成することを特徴とする薄膜
太陽電池の製造方法。
6. A thin-film solar cell having a window layer comprising an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of a chalcogenide CdX (chalcogen X = S, Se, or Te) and a chalcogenide MgX of Mg. A method for producing a thin-film solar cell, wherein the window layer is formed by simultaneously depositing Cd, Mg, and chalcogen X.
【請求項7】 Cdのカルコゲン化物CdX(カルコゲ
ンX=S、Se、あるいはTe)とMgのカルコゲン化
物MgXの固溶体CdX−MgXを主体とするn型半導
薄膜からなる窓層を有する薄膜太陽電池の製造方法で
あって、CdXとMgXの固溶体をスパッタリング蒸着
することにより前記窓層を形成することを特徴とする
太陽電池の製造方法。
7. A thin-film solar cell having a window layer comprising an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of a chalcogenide CdX of Cd (chalcogen X = S, Se or Te) and a chalcogenide MgX of Mg. a manufacturing method, a thin, characterized by forming the window layer by sputtering deposition of solid solution of CdX and MgX
Manufacturing method of membrane solar cell.
【請求項8】 Cdのカルコゲン化物CdX(カルコゲ
ンX=S、Se、あるいはTe)とMgのカルコゲン化
物MgXの固溶体CdX−MgXを主体とするn型半導
薄膜からなる窓層を有する薄膜太陽電池の製造方法で
あって、CdとMgを同時にまたは積層蒸着後、カルコ
ゲンXを含む雰囲気中で熱処理することにより前記窓層
を形成することを特徴とする薄膜太陽電池の製造方法。
8. A thin-film solar cell having a window layer comprising an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of a chalcogenide CdX of Cd (chalcogen X = S, Se or Te) and a chalcogenide MgX of Mg. A method for producing a thin-film solar cell, wherein the window layer is formed by performing a heat treatment in an atmosphere containing chalcogen X simultaneously or after depositing Cd and Mg in a laminated manner.
【請求項9】 Cdのカルコゲン化物CdX(カルコゲ
ンX=S、Se、あるいはTe)とMgのカルコゲン化
物MgXの固溶体CdX−MgXを主体とするn型半導
薄膜からなる窓層を有する薄膜太陽電池の製造方法で
あって、CdとMgを同時にまたは積層蒸着後、カルコ
ゲンXを蒸着し、熱処理することにより前記窓層を形成
することを特徴とする薄膜太陽電池の製造方法。
9. A thin-film solar cell having a window layer comprising an n-type semiconductor thin film mainly composed of a solid solution CdX-MgX of a chalcogenide CdX of Cd (chalcogen X = S, Se or Te) and a chalcogenide MgX of Mg. A method for manufacturing a thin-film solar cell, comprising: forming a window layer by depositing chalcogen X and performing heat treatment simultaneously or after laminating Cd and Mg.
【請求項10】 カルコゲンがTeである請求項5〜9
のいずれかに記載の薄膜太陽電池の製造方法。
10. The method according to claim 5, wherein the chalcogen is Te.
The method for producing a thin-film solar cell according to any one of the above.
JP6005117A 1994-01-21 1994-01-21 Thin film solar cell and manufacturing method Expired - Fee Related JP3022129B2 (en)

Priority Applications (1)

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Publications (2)

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JPH07211926A JPH07211926A (en) 1995-08-11
JP3022129B2 true JP3022129B2 (en) 2000-03-15

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Country Status (1)

Country Link
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Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5126366B2 (en) 2008-02-21 2013-01-23 富士通株式会社 Filter device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5126366B2 (en) 2008-02-21 2013-01-23 富士通株式会社 Filter device

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