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JP3027074B2 - X-ray diffraction dynamic measurement device - Google Patents
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JP3027074B2 - X-ray diffraction dynamic measurement device - Google Patents

X-ray diffraction dynamic measurement device

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Publication number
JP3027074B2
JP3027074B2 JP5224336A JP22433693A JP3027074B2 JP 3027074 B2 JP3027074 B2 JP 3027074B2 JP 5224336 A JP5224336 A JP 5224336A JP 22433693 A JP22433693 A JP 22433693A JP 3027074 B2 JP3027074 B2 JP 3027074B2
Authority
JP
Japan
Prior art keywords
film
ray
sample
ray diffraction
ray detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP5224336A
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Japanese (ja)
Other versions
JPH0777503A (en
Inventor
千寿子 後藤
順一 下村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
JFE Steel Corp
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Filing date
Publication date
Application filed by JFE Steel Corp filed Critical JFE Steel Corp
Priority to JP5224336A priority Critical patent/JP3027074B2/en
Publication of JPH0777503A publication Critical patent/JPH0777503A/en
Application granted granted Critical
Publication of JP3027074B2 publication Critical patent/JP3027074B2/en
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Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明はX線回折動的測定装置に
係り、特に金属、セラミックス、磁性材料など種々の材
料における熱処理、機械的処理、化学反応などで変化す
る材料の結晶構造の変化過程を逐次動的に測定すること
が可能なX線回折動的測定装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an X-ray diffraction dynamic measurement apparatus, and more particularly to a change in the crystal structure of various materials such as metals, ceramics, and magnetic materials which is changed by heat treatment, mechanical treatment, chemical reaction, and the like. The present invention relates to an X-ray diffraction dynamic measurement device capable of sequentially and dynamically measuring a process.

【0002】[0002]

【従来の技術】従来、熱処理や機械的処理、あるいは化
学反応など製造プロセスで生じる結晶構造の変化を解析
することは、材料設計を行う上で必要不可欠である。た
とえば、自動車の車体や建材に大量に使用される合金化
溶融亜鉛めっき鋼板において、めっき密着性とか摺動
性、プレス加工性などを向上させるためには、脆いη−
Zn相やΓ相を低減させ、δ1 相主体のめっき層となるよ
う合金化反応を制御する必要がある。また、ハードフェ
ライト磁石の磁気特性を高めるためには、Z型マグネト
プランバイト(M2Sr3Fe24O41) やヘマタイト(Fe2O3) の
生成を抑え、M型マグネトプランバイト(MFe12O19) が
主相となるような焼結条件で製造しなければならない。
2. Description of the Related Art Conventionally, it is indispensable to analyze a change in crystal structure caused by a manufacturing process such as heat treatment, mechanical treatment, or chemical reaction in designing a material. For example, in the case of alloyed hot-dip galvanized steel sheets used in large quantities in automobile bodies and building materials, in order to improve plating adhesion, slidability, press workability, etc., a brittle η-
Reduces the Zn phase and Γ phase, it is necessary to control the alloying reaction to be a plating layer of [delta] 1 main phase. Further, in order to enhance the magnetic properties of the hard ferrite magnet, generation of Z-type magnetoplumbite (M 2 Sr 3 Fe 24 O 41 ) and hematite (Fe 2 O 3 ) is suppressed, and M-type magnetoplumbite (MFe 12 It must be manufactured under sintering conditions such that O 19 ) is the main phase.

【0003】このような製造プロセス中に生じる結晶構
造の変化を測定するには、従来、そのプロセスの途中で
試料を引き出し、直ちに反応を凍結した後、X線回折を
行う方法が最も一般的であった。すなわち、従来用いら
れているX線回折装置としては、集中ビーム光学系を有
するギニエカメラや擬平行ビーム光学系を有する斜め入
射ギニエカメラなどのギニエ法によるもの、あるいはデ
バイシェラーカメラによるものがある。以下にそれぞれ
の構成について簡単に説明する。
In order to measure the change in the crystal structure that occurs during such a manufacturing process, conventionally, a method of extracting a sample during the process, immediately freezing the reaction, and then performing X-ray diffraction is most commonly used. there were. That is, conventionally used X-ray diffractometers include those based on the Guinier method, such as a Guinier camera having a concentrated beam optical system and an oblique incidence Guinier camera having a quasi-parallel beam optical system, or a Debye-Scherrer camera. Hereinafter, each configuration will be briefly described.

【0004】まず、集中ビーム光学系のギニエカメラの
場合については図5に示すように、X線源1で発生した
入射X線2は湾曲結晶モノクロメータ3で単色X線2a
に単色化し、焦点F1を経て試料Sに入射する。そうする
と、試料S上においてその結晶構造に応じてX線回折が
起こり、ギニエカメラ4の中心点Cから半径rなるロー
ランド円と呼ばれる焦点円周5上でF1′,F2′…のよう
に回折X線2bが焦点を結ぶ。この焦点円周5に沿って
フィルム状X線検出器6をセットして時間露出を行うこ
とによって、X線回折パターンを検出する。
First, in the case of a Guinier camera using a concentrated beam optical system, an incident X-ray 2 generated by an X-ray source 1 is converted into a monochromatic X-ray 2a by a curved crystal monochromator 3 as shown in FIG.
To monochromatic incident on the sample S through the focal point F 1. Then, X-ray diffraction occurs on the sample S in accordance with the crystal structure thereof, and is diffracted on the focal point circumference 5 called a Roland circle having a radius r from the center point C of the Guinier camera 4 like F 1 ′, F 2 ′,. The X-ray 2b is focused. An X-ray diffraction pattern is detected by setting the film-shaped X-ray detector 6 along the focal circumference 5 and performing time exposure.

【0005】フィルム状X線検出器6の帯状のX線フィ
ルムには、図6に示すように焦点円周5方向の回折X線
焦点F1′,F2′…のところでフィルムが感光して筋状に
黒化したX線回折パターンP1,P2…が得られる。このパ
ターンP1,P2…の位置L1,L2…は回折角2θ1 ,2θ2
…とギニエカメラの半径rの関数であるから、このパタ
ーンの位置L1,L2…を測定すれば回折角2θが求めら
れ、さらにブラッグ条件から結晶格子面間隔dhkl が決
まるので、試料Sの結晶構造がわかるのである。
As shown in FIG. 6, the film X-ray film 6 of the film X-ray detector 6 is exposed at diffraction X-ray focal points F 1 ′, F 2 ′,. X-ray diffraction patterns P 1 , P 2 . The pattern P 1, P 2 ... position L 1, L 2 ... is the diffraction angle 2 [Theta] 1 of, 2 [Theta] 2
.. And a function of the radius r of the Guinier camera, the diffraction angle 2θ can be obtained by measuring the positions L 1 , L 2 ... Of this pattern, and the crystal lattice spacing d hkl is determined from the Bragg condition. The crystal structure is known.

【0006】また、擬平行ビーム光学系の斜め入射ギニ
エカメラの場合は、図7に示すように、X線源1に取付
けた入射ソーラスリット(またはコリメータ)7と平板
結晶モノクロメータ3aで入射X線2を平行かつ単色化
し、この単色X線2aを試料Sに低角度入射して、ギニ
エカメラ4のフィルム状X線検出器6で回折パターンを
検出するものである。この斜め入射ギニエカメラの特徴
は、上記した集中ビーム光学系のギニエカメラと比べて
X線回折を起こす位置が相対的に浅くなるため、試料表
面でのX線回折の感度が向上するので、薄膜や試料表面
での化学反応を測定するのに好適である。
In the case of an oblique incidence Guinier camera of a quasi-parallel beam optical system, as shown in FIG. 7, an incident solar slit (or collimator) 7 attached to an X-ray source 1 and a flat crystal monochromator 3a enter an incident X-ray. 2 is made parallel and monochromatic, this monochromatic X-ray 2a is incident on the sample S at a low angle, and the diffraction pattern is detected by the film X-ray detector 6 of the Guinier camera 4. The feature of this oblique incidence Guinier camera is that the position where X-ray diffraction occurs is relatively shallower than that of the above-mentioned Guinier camera of the concentrated beam optical system, so that the sensitivity of X-ray diffraction on the sample surface is improved. It is suitable for measuring a chemical reaction on a surface.

【0007】さらに、デバイシェラーカメラの場合は、
図8に示すように、コリメータ8で収束した入射X線2
を円筒形状の試料Sに入射し、試料中心から円錐状に広
がる回折X線2bを円筒形または半円筒形のデバイシェ
ラーカメラ9のフィルム状X線検出器6で検出する。こ
のデバイシェラーカメラ9は、前出図5のギニエカメラ
4をそのまま使用することもできるが、2台を円筒形状
に組み合わせて使用することにより、X線回折を±180
°ほぼ全方向から検出することができるので、感度と精
度の向上を図ることができる。なお、この光学系は、試
料の微小領域やワイヤ状の試料の構造変化の測定に好適
である。
In the case of a Debye-Scherrer camera,
As shown in FIG. 8, the incident X-rays 2 converged by the collimator 8
Is incident on the cylindrical sample S, and the diffracted X-rays 2b spreading conically from the center of the sample are detected by the film X-ray detector 6 of the cylindrical or semi-cylindrical Debye-Scherrer camera 9. This Debye-Scherrer camera 9 can use the Guinier camera 4 shown in FIG. 5 as it is, but by using two of them in a cylindrical shape, the X-ray diffraction is ± 180.
° Since detection can be performed from almost all directions, sensitivity and accuracy can be improved. Note that this optical system is suitable for measuring a minute area of a sample or a structural change of a wire-shaped sample.

【0008】[0008]

【発明が解決しようとする課題】しかしながら、上記し
た各種のX線回折装置を用いて測定する場合はいずれ
も、材料組成や昇温速度などの実験条件が増加すると解
析に必要なサンプリング試料数が大幅に増加するばかり
でなく、たとえば上記した合金化溶融亜鉛めっき鋼板の
Zn−Fe合金化反応のように、反応時間が数秒〜10数秒と
短い場合には、焼入れなどの急冷によっても反応を正確
に凍結すること自体が困難であった。また、焼結試料で
は急冷処理により破砕する場合もあるが、この方法が適
用できるのは反応時間が長い固体試料に限られていた。
However, in the case of using any of the above-mentioned various types of X-ray diffractometers, the number of sampling samples required for analysis is increased when the experimental conditions such as the material composition and the rate of temperature rise increase. Not only does it significantly increase, for example,
When the reaction time is as short as several seconds to several tens of seconds as in the Zn-Fe alloying reaction, it was difficult to freeze the reaction accurately even by rapid cooling such as quenching. In addition, although a sintered sample may be crushed by quenching treatment, this method can be applied only to a solid sample having a long reaction time.

【0009】なお、上記以外には、従来のシンチレーシ
ョン検出器を用いたX線回折装置に試料加熱炉を搭載し
た高温X線回折装置が実用化されており、熱処理による
相変態の観察に利用されているが、しかし、この装置で
は、1枚のX線回折パターンにおいて測定開始から終了
までにシンチレーション検出器の角度走査時間分の測定
ずれが生じており、解析に注意を要するばかりではな
く、反応時間の短い試料には適用することができなかっ
た。
In addition to the above, a high-temperature X-ray diffractometer having a sample heating furnace mounted on a conventional X-ray diffractometer using a scintillation detector has been put to practical use, and is used for observation of phase transformation by heat treatment. However, in this apparatus, a measurement deviation corresponding to the angular scanning time of the scintillation detector occurs from the start to the end of one X-ray diffraction pattern in one X-ray diffraction pattern. It could not be applied to short time samples.

【0010】また、この欠点を補うために、シンチレー
ション検出器に代えてフィルム送り機構を備えた円筒状
の連続高温カメラが実用化されているが、X線フィルム
の感度が低いため露光時間を数10分〜数時間としなけれ
ばならないため、亜鉛めっきの合金化のような反応の速
い現象に追随した測定を行うことができないという問題
があった。
In order to compensate for this drawback, a cylindrical continuous high-temperature camera equipped with a film feed mechanism has been put into practical use instead of a scintillation detector. Since the time must be set to 10 minutes to several hours, there is a problem that it is not possible to perform measurement following a fast reaction phenomenon such as alloying of zinc plating.

【0011】さらに、X線フィルムはダイナミックレン
ジが小さいため、フィルムに感光させた黒化パターンを
フォトメータで定量的に読み取ってもシンチレーション
検出器で測定したようなピーク強度比をもつ分解能のよ
いパターンとはならないので、亜鉛めっきの合金化反応
時に生じるZn−Fe金属間化合物のような複雑なピークの
同定を行うことは不可能であった。
Furthermore, since the X-ray film has a small dynamic range, even if the blackened pattern exposed on the film is quantitatively read by a photometer, it has a high resolution pattern having a peak intensity ratio as measured by a scintillation detector. Therefore, it was impossible to identify a complex peak such as a Zn-Fe intermetallic compound generated during the galvanizing alloying reaction.

【0012】本発明は、上記のような従来技術の課題を
解決すべくなされたものであって、各種材料に熱処理、
機械的加工、化学反応などを与えながら、瞬時に回折X
線を検出することによって経時的なX線回折パターンの
変化を捉え、結晶構造の変化を動的に追跡できるX線回
折動的測定装置を提供することを目的とする。
SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned problems of the prior art.
Instant diffraction X while giving mechanical processing, chemical reaction, etc.
An object of the present invention is to provide an X-ray diffraction dynamic measurement device capable of capturing a change in an X-ray diffraction pattern over time by detecting a line and dynamically tracking a change in a crystal structure.

【0013】[0013]

【課題を解決するための手段】本発明は、X線源と湾曲
結晶からなる入射モノクロメータとギニエカメラとから
構成されて試料に集中ビームを照射して生じる回折X線
をフィルム状X線検出器で検出するX線回折装置におい
て、前記試料を処理する試料処理装置を備え、前記フィ
ルム状X線検出器は半円筒形とされるとともに、該フィ
ルムを一定距離送るフィルム自動送り機構と、フィルム
送り方向にX線回折パターンを画素積算する画像処理機
能を備えた読み取り装置を設けたことを特徴とするX線
回折動的測定装置である。
SUMMARY OF THE INVENTION The present invention provides a film-shaped X-ray detector which comprises an X-ray source, an incident monochromator comprising a curved crystal, and a Guinier camera, and which diffracts X-rays generated by irradiating a sample with a concentrated beam. in X Senkai OriSo location detecting in, provided with a sample processing device for processing the sample, the film-like X-ray detector together are semi-cylindrical, the automatic film feeding mechanism for sending the film a certain distance, An X-ray diffraction dynamic measurement device is provided with a reading device having an image processing function of pixel-integrating an X-ray diffraction pattern in a film feeding direction.

【0014】なお、前記X線回折装置は、X線源とソー
ラスリットまたはコリメータと平板結晶からなる入射モ
ノクロメータとギニエカメラとから構成されて試料に
平行ビームを照射して生じる回折X線をフィルム状X線
検出器で検出する擬平行ビームX線回折装置、あるいは
X線源とコリメータと円筒形または半円筒形フィルム状
X線検出器を具備したデバイシェラーカメラとから構成
されて試料にX線ビームを照射して生じる回折X線をフ
ィルム状X線検出器で検出するX線回折装置であっても
よい。
[0014] Incidentally, the X Senkai OriSo location is diffracted X-rays generated by irradiating a擬平line beam is configured to sample from the incident monochromator and Guinier camera comprising a X-ray source and the Soller slit or collimator and the flat plate crystals X-ray film
Detected by the detector擬平line beam X Senkai OriSo location or X-ray source and the collimator and a cylindrical or semi-cylindrical film is composed of a shaped X-ray detector Debye-Scherrer camera provided with the by X-ray beam on the sample, X-rays generated by irradiating
In Irumu shaped X-ray detector may be an X Senkai OriSo location you detected.

【0015】また、前記フィルム状X線検出器のフィル
ムとしては輝尽性発光体を用い、フィルム送り方向に画
素積算することが好ましい。
It is preferable that a stimulable luminous body is used as the film of the film X-ray detector, and that the pixels be integrated in the film feed direction.

【0016】[0016]

【作 用】本発明によれば、ギニエカメラやデバイシェ
ラーカメラに試料処理装置とフィルム自動送り機構とを
付加することにより、試料に熱処理や機械的処理を加え
ながら瞬時に連続的にX線回折パターンを測定できるよ
うにしたので、金属あるいはセラミックス、磁性材料な
ど種々の材料の熱処理や機械的処理、化学反応などの過
程において発生する構造変化状況を動的に測定すること
ができる。
According to the present invention, by adding a sample processing apparatus and an automatic film feed mechanism to a Guinier camera or a Debye-Scherrer camera, an X-ray diffraction pattern can be instantaneously and continuously applied while heat treatment or mechanical processing is applied to the sample. , It is possible to dynamically measure the state of structural change occurring in the process of heat treatment, mechanical treatment, chemical reaction, and the like of various materials such as metals, ceramics, and magnetic materials.

【0017】[0017]

【実施例】以下に、本発明のX線回折動的測定装置の実
施例について、図面を参照して詳しく説明する。図1は
本発明の集中ビーム光学系を有するギニエカメラにおけ
る実施例を示したものであり、図中における従来例と同
一要素は同一符号を付して説明を省略する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the X-ray diffraction dynamic measuring apparatus according to the present invention will be described below in detail with reference to the drawings. FIG. 1 shows an embodiment of a Guinier camera having a concentrated beam optical system according to the present invention. In FIG. 1, the same elements as those of the conventional example in FIG.

【0018】図に示すように、X線源1と入射モノクロ
メータ3とギニエカメラ4とから構成される従来の装置
に試料処理室10が設けられる。また、フィルム状X線検
出器6は半円筒形状とされ、その内蔵のフィルムはフィ
ルム自動送り機構11で自動送りが可能とされる。これら
試料処理室10およびフィルム自動送り機構11は試料処理
制御装置12によってそれぞれ制御される。
As shown in FIG. 1, a sample processing chamber 10 is provided in a conventional apparatus comprising an X-ray source 1, an incident monochromator 3, and a Guinier camera 4. The film X-ray detector 6 has a semi-cylindrical shape, and the built-in film can be automatically fed by an automatic film feed mechanism 11. The sample processing chamber 10 and the automatic film feed mechanism 11 are controlled by a sample processing control device 12, respectively.

【0019】試料処理室10においては、試料処理制御装
置12からの指令に基づいて測定中の試料Sに加熱とか冷
却の熱処理、あるいは引張とか圧縮などの機械的処理、
さらには溶液中での腐食反応などの化学反応等の各種の
制御が必要に応じて行われる。すなわち、まず試料Sを
加熱する場合は、試料処理室10そのものを加熱炉として
外部に対してX線パスをシーリングするようにする。な
お、試料Sが金属のような導体の試料の場合は通電加熱
炉を、セラミックスのように通電ができない試料の場合
は赤外線加熱炉を使用するのがよい。
In the sample processing chamber 10, a sample S under measurement is subjected to heat treatment such as heating or cooling, or mechanical treatment such as tension or compression, based on a command from the sample processing controller 12.
Further, various controls such as a chemical reaction such as a corrosion reaction in a solution are performed as necessary. That is, when the sample S is first heated, the sample processing chamber 10 itself is used as a heating furnace to seal the X-ray path to the outside. When the sample S is a sample of a conductor such as a metal, it is preferable to use an electric heating furnace, and when the sample S is a sample to which electric current cannot be applied such as ceramics, it is preferable to use an infrared heating furnace.

【0020】このときの加熱雰囲気としては大気とかア
ルゴン、窒素、真空など目的に応じて選択して行うこと
ができるが、X線パスでのX線の吸収による強度低下を
最小に抑えるためには真空がもっとも望ましい。なお、
加熱炉のシーリング材はX線吸収の少ないベリリウム箔
が最適であるが、アルミニウムのような軽元素金属箔や
入射X線のKβフィルタとなる金属箔を用いても、加熱
炉壁によるX線強度の低下を少なくすることができる。
また、試料Sを冷却する場合は、必要に応じてアルゴン
ガスまたは窒素ガスを用いて行うようにする。
The heating atmosphere at this time can be selected depending on the purpose, such as air, argon, nitrogen, and vacuum. However, in order to minimize the decrease in intensity due to absorption of X-rays in the X-ray path, A vacuum is most desirable. In addition,
Beryllium foil with low X-ray absorption is optimal for the sealing material of the heating furnace. However, even if a light element metal foil such as aluminum or a metal foil used as a Kβ filter for incident X-rays is used, the X-ray intensity due to the heating furnace wall can be improved. Can be reduced.
Further, when cooling the sample S, an argon gas or a nitrogen gas is used as necessary.

【0021】試料Sに引張処理を施す場合は、従来の引
張試験機で行っているように試料Sをチャックで掴み、
油圧シリンダなどを用いて紙面に対して水平方向あるい
は垂直方向の引張力を負荷する。また、圧縮処理を施す
場合は、引張処理とは逆に油圧シリンダなどで圧縮する
ようにすればよい。さらに高圧が必要な場合は四角錐形
のダイヤモンド圧縮子などを利用すればよい。なお、こ
れら引張処理あるいは圧縮処理を行う場合は、試料処理
室10のX線パスをオープンとする。
When a tensile treatment is performed on the sample S, the sample S is gripped by a chuck as in a conventional tensile tester.
Using a hydraulic cylinder or the like, a tensile force is applied to the paper in the horizontal or vertical direction. In the case of performing the compression process, the compression process may be performed by a hydraulic cylinder or the like, contrary to the tension process. If a higher pressure is required, a quadrangular pyramid-shaped diamond compressor may be used. When performing the tension processing or the compression processing, the X-ray path of the sample processing chamber 10 is opened.

【0022】つぎに、フィルム状X線検出器6について
説明すると、回折X線2bの検出には従来のX線フィル
ムを使用して、前出図6に示したようなX線回折パター
ンP1,P2…の黒化度の変化をカメラの円周方向に設けた
フォトメータまたは画像解析装置を用いることで測定す
ることができる。さらに、本発明の目的である動的測定
を実現するためには、短時間でS/N比の高いX線回折
パターンを得ることが重要であるから、高感度かつダイ
ナミックレンジの高い輝尽性発光体を使用することが最
も望ましい。
Next, the film X-ray detector 6 will be described. The conventional X-ray film is used to detect the diffracted X-rays 2b, and the X-ray diffraction pattern P 1 shown in FIG. , P 2 ... Can be measured by using a photometer or an image analyzer provided in the circumferential direction of the camera. Furthermore, in order to realize the dynamic measurement which is the object of the present invention, it is important to obtain an X-ray diffraction pattern having a high S / N ratio in a short time, and therefore, a photosensitivity having a high sensitivity and a high dynamic range is obtained. It is most desirable to use a light emitter.

【0023】ここで、この輝尽性発光体について補足す
ると、X線の照射によりこのX線エネルギーの一部が内
部に蓄積され、その後He−Neレーザ等の励起光を照射す
ると、蓄積されたエネルギー量に応じた輝尽発光光を発
するものであり、蓄積性発光体とも呼ばれている(たと
えば、特開平3−180835号公報参照)。画像処理機能を
備えた専用の読み取り装置を用いて、前出図6の黒化し
たX線回折パターンP1,P2…の黒線方向にn画素の積算
を行うと、回折X線強度は実際の検出時間における測定
値のn倍に向上する。たとえば50画素分の積算を行うこ
とにより、18kW程度のX線を用いても検出時間が1秒程
度でS/N比のよいX線回折パターンの測定が可能であ
る。
Here, to supplement this stimulable luminescent material, a part of the X-ray energy is accumulated inside by the irradiation of X-rays, and then it is accumulated when irradiated with excitation light such as He-Ne laser. It emits stimulated emission light in accordance with the amount of energy, and is also called a stimulable luminous body (see, for example, JP-A-3-180835). By using a dedicated reading device having an image processing function and performing integration of n pixels in the black line direction of the blackened X-ray diffraction patterns P 1 , P 2 ... Shown in FIG. This is improved to n times the measured value at the actual detection time. For example, by performing integration for 50 pixels, it is possible to measure an X-ray diffraction pattern with a high S / N ratio in a detection time of about 1 second even with X-rays of about 18 kW.

【0024】図2は、X線フィルムまたは輝尽性発光体
を装填するフィルムカセットの一例を示したもので、フ
ィルムカセット本体13はギニエカメラ4の曲率に沿った
半円筒形をしており、送り側フィルムカセット14とカメ
ラのX線露光窓15、受け側フィルムカセット16の3つの
部分で構成される。送り側フィルムカセット14および受
け側フィルムカセット16は照明光や散乱X線による感光
を防ぐために鉛板を貼ったステンレス鋼板で作製するの
が最もよい。また、カメラのX線露光窓15の材料として
は、遮光効果がありX線吸収係数が小さいベリリウム箔
などを使用するのがよい。
FIG. 2 shows an example of a film cassette for loading an X-ray film or a stimulable luminous body. The film cassette body 13 has a semi-cylindrical shape along the curvature of the Guinier camera 4, and It comprises three parts: a side film cassette 14, an X-ray exposure window 15 of the camera, and a receiving side film cassette 16. The feed-side film cassette 14 and the receiving-side film cassette 16 are best made of a stainless steel plate on which a lead plate is stuck to prevent exposure to illumination light or scattered X-rays. Further, as the material of the X-ray exposure window 15 of the camera, it is preferable to use a beryllium foil or the like having a light shielding effect and a small X-ray absorption coefficient.

【0025】ここで、回折X線の露光とフィルム送りに
ついて説明すると、まずはじめにX線フィルムまたは輝
尽性発光体を送り側フィルムカセット14に装填し、露光
時間、送り長さ(積算に必要な画素以上)およびコマ数
(測定回数)を設定する。その後、フィルム自動送り機
構11によりフィルムのみがフィルムガイド17によって矢
示A方向にガイドされてX線露光窓15まで送り出され、
所定時間露光されると直ちに受け側フィルムカセット16
に送り出され、次のコマに送られる。これを設定した測
定回数繰り返し、一連の動的X線回折測定を終了する。
なお、フィルム自動送り機構11を試料処理制御装置12に
よって同時制御を行うようにすれば、試料Sの履歴に連
動したX線回折測定を行うことができて、より望まし
い。
Here, the exposure of the diffracted X-rays and the film feeding will be described. First, an X-ray film or a stimulable luminous body is loaded into the film cassette 14 on the sending side, and the exposure time and the feeding length (necessary for the integration). Set the number of pixels) and the number of frames (number of measurements). Thereafter, only the film is guided by the film guide 17 in the direction of arrow A by the automatic film feed mechanism 11 and is sent out to the X-ray exposure window 15,
Immediately after exposure for a predetermined time, the receiving film cassette 16
Is sent to the next frame. This is repeated for the set number of measurements, and a series of dynamic X-ray diffraction measurements is completed.
If the automatic film feed mechanism 11 is controlled simultaneously by the sample processing controller 12, X-ray diffraction measurement linked to the history of the sample S can be performed, which is more preferable.

【0026】図3は、本発明の擬平行ビーム光学系を有
する斜め入射ギニエカメラにおける実施例を示すもの
で、上記した図1の集中ビーム光学系を有するギニエカ
メラと同様に、試料処理室10とフィルム自動送り機構11
と試料処理制御装置12とが設けられ、同じように制御さ
れることによって、X線回折パターンが測定される。図
4は、本発明のデバイシェラーカメラにおける実施例を
示すもので、デバイシェラーカメラ9は半円筒形のフィ
ルム状X線検出器6をそのままあるいは円筒形状に組み
合わせて構成され、上記した図1の集中ビーム光学系を
有するギニエカメラと同様に、試料処理室10とフィルム
自動送り機構11と試料処理制御装置12とが設けられ、同
じように制御されることによって、X線回折パターンが
測定される。
FIG. 3 shows an embodiment of an oblique incidence Guinier camera having a quasi-parallel beam optical system according to the present invention. As in the Guinier camera having a concentrated beam optical system shown in FIG. Automatic feed mechanism 11
And a sample processing controller 12 are provided, and the X-ray diffraction pattern is measured by the same control. FIG. 4 shows an embodiment of the Debye-Scherrer camera according to the present invention. The Debye-Scherrer camera 9 is constituted by combining the semi-cylindrical film-shaped X-ray detector 6 as it is or in a cylindrical shape. As with the Guinier camera having the concentrated beam optical system, a sample processing chamber 10, an automatic film feed mechanism 11, and a sample processing control device 12 are provided, and the X-ray diffraction pattern is measured by the same control.

【0027】[0027]

【発明の効果】以上説明したように、本発明によれば、
試料形状に合わせてX線カメラを選択することにより、
回折パターンのピーク本数を多くても強度が高く分解能
のよいX線回折パターン、試料表層から強度の高いX線
回折パターン、微小領域から強度の高いX線回折パター
ンを瞬時に連続的に測定できるので、金属あるいはセラ
ミックス、磁性材料など種々の材料の熱処理や機械的処
理、化学反応などの過程において発生する構造変化状況
を試料形状によらず動的に測定することができる。
As described above, according to the present invention,
By selecting an X-ray camera according to the sample shape,
Even if the number of peaks in the diffraction pattern is large, an X-ray diffraction pattern with high intensity and high resolution, an X-ray diffraction pattern with high intensity from the sample surface layer, and an X-ray diffraction pattern with high intensity from a small area can be instantaneously and continuously measured. It is possible to dynamically measure the state of structural change occurring in the process of heat treatment, mechanical treatment, chemical reaction, etc. of various materials such as metals, ceramics, and magnetic materials irrespective of the sample shape.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の集中ビーム光学系を有するギニエカメ
ラにおける実施例を模式的に示す概要図である。
FIG. 1 is a schematic diagram schematically showing an embodiment of a Guinier camera having a concentrated beam optical system according to the present invention.

【図2】フィルムカセットの一例を示す斜視図である。FIG. 2 is a perspective view showing an example of a film cassette.

【図3】本発明の擬平行ビーム光学系を有する斜め入射
ギニエカメラにおける実施例を模式的に示す概要図であ
る。
FIG. 3 is a schematic view schematically showing an embodiment of an oblique incidence Guinier camera having a quasi-parallel beam optical system according to the present invention.

【図4】本発明のデバイシェラーカメラにおける実施例
を模式的に示す概要図である。
FIG. 4 is a schematic diagram schematically showing an embodiment of the Debye-Scherrer camera of the present invention.

【図5】集中ビーム光学系を有するギニエカメラの従来
例を模式的に示す概要図である。
FIG. 5 is a schematic diagram schematically showing a conventional example of a Guinier camera having a concentrated beam optical system.

【図6】帯状X線フィルムで感光したX線回折パターン
を模式的に示す平面図である。
FIG. 6 is a plan view schematically showing an X-ray diffraction pattern exposed by a belt-shaped X-ray film.

【図7】擬平行ビーム光学系を有する斜め入射ギニエカ
メラの従来例を模式的に示す概要図である。
FIG. 7 is a schematic diagram schematically showing a conventional example of an oblique incidence Guinier camera having a quasi-parallel beam optical system.

【図8】デバイシェラーカメラの従来例を模式的に示す
概要図である。
FIG. 8 is a schematic diagram schematically showing a conventional example of a Debye-Scherrer camera.

【符号の説明】[Explanation of symbols]

1 X線源 2 入射X線 2a 単色X線 2b 回折X線 3 湾曲結晶モノクロメータ 3a 平板結晶モノクロメータ 4 ギニエカメラ 5 焦点円周 6 フィルム状X線検出器 7 入射ソーラスリット(またはコリメータ) 8 コリメータ 9 デバイシェラーカメラ 10 試料処理室 11 フィルム自動送り機構 12 試料処理制御装置 13 フィルムカセット本体 14 送り側フィルムカセット 15 X線露光窓 16 受け側フィルムカセット S 試料 DESCRIPTION OF SYMBOLS 1 X-ray source 2 Incident X-ray 2a Monochromatic X-ray 2b Diffracted X-ray 3 Curved crystal monochromator 3a Plate crystal monochromator 4 Guinier camera 5 Focal circumference 6 Film X-ray detector 7 Incident solar slit (or collimator) 8 Collimator 9 Debye-Scherrer camera 10 Sample processing chamber 11 Automatic film feed mechanism 12 Sample processing controller 13 Film cassette body 14 Feeding film cassette 15 X-ray exposure window 16 Receiving film cassette S Sample

───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 平1−196554(JP,A) 特開 昭58−35446(JP,A) 特開 平1−202649(JP,A) 特公 昭29−5766(JP,B1) 実公 昭34−3418(JP,Y1) 実公 昭44−30793(JP,Y1) (58)調査した分野(Int.Cl.7,DB名) G01N 23/20 - 23/207 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-1-196554 (JP, A) JP-A-58-35446 (JP, A) JP-A-1-202649 (JP, A) 5766 (JP, B1) Jigyo 34-3418 (JP, Y1) Jigyo 44-30793 (JP, Y1) (58) Fields investigated (Int. Cl. 7 , DB name) G01N 23/20-23 / 207

Claims (5)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 X線源と湾曲結晶からなる入射モノクロ
メータとギニエカメラとから構成されて試料に集中ビー
ムを照射して生じる回折X線をフィルム状X線検出器で
検出するX線回折装置において、前記試料を処理する試
料処理装置を備え、前記フィルム状X線検出器は半円筒
形とされるとともに、該フィルムを一定距離送るフィル
ム自動送り機構と、フィルム送り方向にX線回折パター
ンを画素積算する画像処理機能を備えた読み取り装置を
設けたことを特徴とするX線回折動的測定装置。
1. A X Senkai OriSo for detecting the diffracted X-rays generated by irradiating a focused beam is configured to sample from the X-ray source and the incident monochromator and Guinier camera comprising a curved crystal filmy X-ray detector A film processing X-ray detector having a semi-cylindrical shape, an automatic film feeding mechanism for feeding the film at a constant distance, and an X-ray diffraction pattern in the film feeding direction. An X-ray diffraction dynamic measurement device, comprising: a reading device having an image processing function of integrating pixels.
【請求項2】線源とソーラスリットまたはコリメー
タと平板結晶からなる入射モノクロメータとギニエカメ
ラとから構成されて試料に擬平行ビームを照射して生じ
る回折X線をフィルム状X線検出器で検出するX線回
において、前記試料を処理する試料処理装置を備
え、前記フィルム状X線検出器は半円筒形とされるとと
もに、該フィルムを一定距離送るフィルム自動送り機構
と、フィルム送り方向にX線回折パターンを画素積算す
る画像処理機能を備えた読み取り装置を設けたことを特
徴とするX線回折動的測定装置。
2. An X- ray source, a solar slit or a collimator, an incident monochromator made of a flat crystal, and a Guinier camera, which are generated by irradiating a sample with a quasi-parallel beam.
X-ray diffraction to detect diffracted X-rays that a film-like X-ray detector
In equipment, Bei the sample processing device for processing the sample
If the film-shaped X-ray detector is formed into a semi-cylindrical shape,
In addition, an automatic film feed mechanism that feeds the film at a fixed distance
Pixel integration of the X-ray diffraction pattern in the film feed direction
That a reading device with an image processing function
X-ray diffraction dynamic measuring device according to symptoms.
【請求項3】線源とコリメータとデバイシェラーカ
メラとから構成されて試料にX線ビームを照射して生じ
る回折X線をフィルム状X線検出器で検出するX線回折
装置において、前記試料を処理する試料処理装置を備
え、前記フィルム状X線検出器は円筒形または半円筒形
フィルム状X線検出器であるとともに、該フィルムを一
定距離送るフィルム自動送り機構と、フィルム送り方向
にX線回折パターンを画素積算する画像処理機能を備え
た読み取り装置を設けたことを特徴とするX線回折動的
測定装置。
3. An apparatus comprising an X- ray source, a collimator, and a Debye-Scherrer camera, which is generated by irradiating a sample with an X-ray beam.
X-ray diffraction using a film X-ray detector to detect diffracted X-rays
A sample processing device for processing the sample.
For example, with the film-like X-ray detector is a cylindrical or semi-cylindrical film-shaped X-ray detector, the film-
Automatic film feed mechanism for feeding a fixed distance and the film feed direction
Equipped with an image processing function that integrates X-ray diffraction patterns into pixels
An X-ray diffraction dynamic measurement device provided with a reading device.
【請求項4】 前記試料処理装置は加熱/冷却の熱処
理、引張/圧縮の機械的処理、化学反応のうち少なくと
も1つ以上の処理機能を備えたものであることを特徴と
する請求項1、2または3記載のX線回折動的測定装
置。
4. The sample processing apparatus according to claim 1, wherein the sample processing apparatus has at least one of a heat treatment for heating / cooling, a mechanical treatment for tension / compression, and a chemical reaction. 4. The X-ray diffraction dynamic measurement device according to 2 or 3.
【請求項5】 前記フィルム状X線検出器のフィルム
に輝尽性発光体を用い、フィルム送り方向に画素積算す
ることを特徴とする請求項1、2、3または4記載のX
線回折動的測定装置。
5. The X-ray detector according to claim 1, wherein a stimulable luminous body is used for the film of the film-shaped X-ray detector, and pixels are integrated in a film feed direction.
X-ray diffraction dynamic measurement device.
JP5224336A 1993-09-09 1993-09-09 X-ray diffraction dynamic measurement device Expired - Fee Related JP3027074B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5224336A JP3027074B2 (en) 1993-09-09 1993-09-09 X-ray diffraction dynamic measurement device

Publications (2)

Publication Number Publication Date
JPH0777503A JPH0777503A (en) 1995-03-20
JP3027074B2 true JP3027074B2 (en) 2000-03-27

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ID=16812164

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Country Link
JP (1) JP3027074B2 (en)

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JP2006284187A (en) * 2005-03-31 2006-10-19 Japan Synchrotron Radiation Research Inst Rapid X-ray structure analysis method of interface structure between solution and solid
FR2914424B1 (en) * 2007-03-30 2012-07-27 Centre Nat Rech Scient X-RAY SAMPLE ANALYZING DEVICE COMPRISING ENERGY AND ANGLE-FILTERING DIFFRACTION ANALYZER SYSTEM.
JP5713357B2 (en) 2012-07-25 2015-05-07 株式会社リガク X-ray stress measurement method and apparatus
CN111721806A (en) * 2020-06-05 2020-09-29 国联汽车动力电池研究院有限责任公司 A method and system for testing phase change reaction of electrode materials for lithium batteries

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