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JP3031219B2 - Article surface treatment method and apparatus - Google Patents
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JP3031219B2 - Article surface treatment method and apparatus - Google Patents

Article surface treatment method and apparatus

Info

Publication number
JP3031219B2
JP3031219B2 JP7289753A JP28975395A JP3031219B2 JP 3031219 B2 JP3031219 B2 JP 3031219B2 JP 7289753 A JP7289753 A JP 7289753A JP 28975395 A JP28975395 A JP 28975395A JP 3031219 B2 JP3031219 B2 JP 3031219B2
Authority
JP
Japan
Prior art keywords
article
fine particles
gas
voltage
frequency power
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP7289753A
Other languages
Japanese (ja)
Other versions
JPH09125258A (en
Inventor
孝浩 中東
創 桑原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP7289753A priority Critical patent/JP3031219B2/en
Publication of JPH09125258A publication Critical patent/JPH09125258A/en
Application granted granted Critical
Publication of JP3031219B2 publication Critical patent/JP3031219B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プラズマ及び微粒
子を用いて被処理物品表面を改質する物品表面改質処理
方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for modifying a surface of an article to be treated using plasma and fine particles.

【0002】[0002]

【従来の技術】従来、物品の有する耐摩耗性、潤滑性、
耐熱性その他の特性を改善するために、目的とする特性
に優れた膜を該物品上に形成することがよく行われてい
る。このような成膜方法としては熱CVD法、プラズマ
CVD法等のCVD法や真空蒸着法、スパッタ蒸着法、
イオンプレーティング法等のPVD法等が採用される。
2. Description of the Related Art Conventionally, wear resistance, lubricity,
In order to improve the heat resistance and other properties, it is common to form a film having the desired properties on the article. Examples of such a film forming method include a CVD method such as a thermal CVD method and a plasma CVD method, a vacuum evaporation method, a sputter evaporation method,
A PVD method such as an ion plating method is employed.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、従来の
CVD法、PVD法等による膜形成では、例えば高硬度
を有する物品上には密着性良く膜形成することが困難で
あり、膜剥離が生じる等して、目的とする特性を十分に
付与できない場合がある。また、従来のCVD法、PV
D法によると、物品表面改質のために物品上に目的とす
る粒子の層を形成したいとき、これを達成し難い。
However, it is difficult to form a film with good adhesion on an article having a high hardness, for example, by the conventional CVD method, PVD method, etc. As a result, the desired properties may not be sufficiently provided. In addition, the conventional CVD method, PV
According to the method D, it is difficult to achieve this when it is desired to form a layer of target particles on an article for modifying the article surface.

【0004】そこで本発明は、被処理物品の表面硬度が
高硬度でないときは勿論、たとえ高硬度であるときでも
該物品表面部に密着性良好に所望の特性の膜を形成して
該表面を改質したり、被処理物品表面に目的とする粒子
の層を選択的に形成して該表面を改質したり、或いは該
物品表面を叩く等して改質できる物品表面改質処理方法
及び装置を提供することを課題とする。
Accordingly, the present invention provides a method of forming a film having desired characteristics with good adhesion on the surface of an article to be treated, not only when the surface hardness of the article is not high, but also when the article has high hardness. An article surface modification method capable of modifying or modifying the surface by selectively forming a layer of target particles on the surface of the article to be treated, or modifying the surface by hitting the article surface, and the like. It is an object to provide a device.

【0005】[0005]

【課題を解決するための手段】前記課題を解決するため
に本発明は、次のの方法及びの装置を提供する。 真空容器内に設けた被処理物品支持手段に被処理物
品を支持させ、該容器内に該物品への目的とする処理に
応じたプラズマ雰囲気用ガス及び微粒子を導入し、所定
真空下で該ガスを高周波電力印加によりプラズマ化し、
該プラズマ雰囲気で前記微粒子を帯電させる一方、前記
被処理物品支持手段に該微粒子の帯電極性と逆極性の直
流電圧を印加することで前記帯電微粒子を前記被処理物
品へ向けて加速して該被処理物品に目的とする処理を施
すことを特徴とする物品表面改質処理方法。 真空容器と、該真空容器内に備えられた被処理物品
支持手段と、該容器に付設された排気手段、プラズマ雰
囲気用ガス供給手段、微粒子供給手段及び該プラズマ雰
囲気用ガス供給手段により該容器内に導入されるプラズ
マ雰囲気用ガスに高周波電力を印加して該ガスをプラズ
マ化させるとともに該プラズマ雰囲気下で、該微粒子供
給手段により導入される微粒子を帯電させるための高周
波電力印加手段と、前記支持手段に前記微粒子の帯電極
性と逆極性の直流電圧を印加して帯電した前記微粒子を
該支持手段上の被処理物品に向けて加速するための、該
支持手段に接続された直流電圧印加手段とを有すること
を特徴とする物品表面改質処理装置。
According to the present invention, there is provided the following method and apparatus. The article to be treated is supported by the article to be treated supporting means provided in the vacuum vessel, and a gas for plasma atmosphere and fine particles corresponding to the intended treatment of the article are introduced into the vessel, and the gas is applied under a predetermined vacuum. Into plasma by applying high frequency power,
While charging the fine particles in the plasma atmosphere, the charged fine particles are accelerated toward the article to be processed by applying a DC voltage having a polarity opposite to the charging polarity of the fine particles to the article supporting means, thereby accelerating the charged particles. An article surface modification treatment method, comprising subjecting a treated article to a target treatment. A vacuum vessel, an article supporting means provided in the vacuum vessel, and an exhaust means, a plasma atmosphere gas supply means, a fine particle supply means, and a plasma atmosphere gas supply means provided in the vessel. A high-frequency power applying means for applying high-frequency power to the plasma atmosphere gas introduced into the gas to convert the gas into plasma and charging the fine particles introduced by the fine particle supply means under the plasma atmosphere; and DC voltage applying means connected to the supporting means for applying a DC voltage having a polarity opposite to the charging polarity of the fine particles to the means to accelerate the charged fine particles toward the article to be processed on the supporting means. An article surface modification treatment device comprising:

【0006】本発明の物品表面改質処理方法及び装置に
よると、プラズマ雰囲気用ガスへの高周波電力印加によ
り発生したプラズマ雰囲気下で帯電した微粒子は、被処
理物品支持手段に該微粒子の帯電極性(通常は負)と逆
極性(通常は正)の直流電圧が印加されることで該支持
手段に支持された被処理物品へ向けて加速される。該支
持手段に印加する電圧を比較的大きくする場合、微粒子
は該支持手段に支持される被処理物品表面部分に打ち込
まれ、該電圧を比較的小さくする場合、微粒子は物品表
面を叩く。
According to the method and apparatus for modifying the surface of an article of the present invention, fine particles charged in a plasma atmosphere generated by applying high-frequency power to a gas for a plasma atmosphere are charged to a means for supporting an article to be processed by a charging polarity of the fine particles ( When a DC voltage having a polarity opposite to that of the normal (usually negative) is applied, the object is accelerated toward the article to be processed supported by the support means. When the voltage applied to the supporting means is relatively large, the fine particles are driven into the surface of the article to be processed supported by the supporting means. When the voltage is relatively small, the fine particles hit the surface of the article.

【0007】前記微粒子を物品表面部分に打ち込むとき
には、微粒子の材質等により定まる特性を該物品に新た
に付与したり、或いは該物品の有する特性を向上させた
りする等して該物品表面を改質することができる。この
ように、単に物品表面に堆積されたものではなく、物品
表面に打ち込まれて形成された粒子層は、該物品の硬度
等にかかわらず、剥離し難く、密着性良好である。
When the fine particles are driven into the surface of the article, the surface of the article is modified by newly imparting a property determined by the material of the fine particles to the article or by improving the properties of the article. can do. As described above, the particle layer formed by being driven into the surface of the article, not simply deposited on the surface of the article, hardly peels off and has good adhesion regardless of the hardness or the like of the article.

【0008】なお、前記微粒子に物品表面を叩かせると
きには、物品表面を清浄化してその濡れ性を向上させた
り、該物品表面粗度を改善したりすることができる。微
粒子の材質等と被処理物品材質との組み合わせによって
微粒子を物品に打ち込むことが困難な場合、プラズマ雰
囲気用ガスとして成膜可能なガスを用い、微粒子の物品
への加速と成膜とを同時に行うことで内部に微粒子が分
散した膜を容易に形成することができる。
When the fine particles are used to strike the surface of the article, the article surface can be cleaned to improve its wettability, or the article surface roughness can be improved. When it is difficult to drive the fine particles into the article due to the combination of the material of the fine particles and the material of the article to be processed, a gas capable of forming a film is used as the gas for the plasma atmosphere, and the acceleration of the fine particles and the film formation are performed simultaneously. This makes it possible to easily form a film in which fine particles are dispersed.

【0009】本発明の物品表面改質処理方法及び装置に
おける微粒子の材質としては、金属、樹脂、ダイアモン
ド等の炭素等を挙げることができるが、特に限定はされ
ない。微粒子として例えばポリイミド等の樹脂や炭素か
らなるものを用い、該微粒子を被処理物品の表面部分に
打ち込む場合、該物品表面の潤滑性を向上させることが
できる。
The material of the fine particles in the article surface modification method and apparatus of the present invention may be, but is not particularly limited to, metal, resin, carbon such as diamond and the like. When particles made of resin such as polyimide or carbon are used as the fine particles and the fine particles are driven into the surface portion of the article to be treated, the lubricity of the article surface can be improved.

【0010】また、微粒子として例えば導電性金属から
なるものを用い、該微粒子を例えば樹脂等の電気絶縁性
材料からなる物品の表面部分に打ち込むことで、該物品
表面を導電性にすることができる。電気絶縁性物質から
なる物品に導電性を付与するため、従来は物品に導電性
の塗料等を塗布していたが、塗布されてできる層は密着
性が悪く、外力によりクラックが生じがちであった。本
発明方法及び装置によると、導電性の微粒子を物品に打
ち込むことができるため、外力が加わっても脱落し難
い。
The surface of the article can be made conductive by using fine particles made of, for example, a conductive metal and driving the fine particles into the surface of an article made of an electrically insulating material such as a resin. . In order to impart conductivity to an article made of an electrically insulating substance, a conductive paint or the like has conventionally been applied to the article. However, the applied layer has poor adhesion and tends to crack due to external force. Was. According to the method and apparatus of the present invention, since conductive fine particles can be driven into an article, it is difficult to fall off even when an external force is applied.

【0011】また、微粒子として例えばダイアモンドか
らなるものを用い、該微粒子を例えば金属物品に打ち込
むときには、従来の金属物品上へのダイアモンド微粒子
の接合の場合に生じる密着性不良の問題が生じない。例
えば金属からなる切断用回転砥石基体等のブレードの基
体にダイアモンド微粒子を打ち込むときには、ダイアモ
ンド微粒子をブレード基体に接着させる際に一般に必要
とされるブレード基体及びダイアモンド微粒子のメタラ
イズが不要になる。
Further, when fine particles made of, for example, diamond are used and the fine particles are driven into, for example, a metal article, the problem of poor adhesion which occurs in the conventional bonding of diamond fine particles onto a metal article does not occur. For example, when diamond particles are driven into a blade substrate such as a metal rotary grindstone substrate, metallization of the blade substrate and the diamond particles, which is generally required when bonding the diamond particles to the blade substrate, becomes unnecessary.

【0012】また、前記微粒子は2種類以上のものを用
いても構わない。また、前記微粒子の粒径は、この微粒
子により目的とする物品表面改質処理を行える範囲で適
宜選択すればよいが、概ね100Å〜5000Åの範囲
のものが考えられる。但し、これには限定されない。前
記微粒子は、それには限定されないが、例えば熱CVD
装置を応用した微粒子発生装置やプラズマCVD装置を
応用した微粒子発生装置等を用い、原料ガスを適宜選択
することで所定真空状態の気相中に目的とする微粒子を
発生させ、集めることで得られる。
Further, two or more kinds of fine particles may be used. The particle size of the fine particles may be appropriately selected within a range in which a target article surface modification treatment can be performed with the fine particles, but may be approximately in a range of 100 to 5000 °. However, it is not limited to this. The fine particles include, but are not limited to, for example, thermal CVD.
It is obtained by generating and collecting target particles in a gas phase in a predetermined vacuum state by appropriately selecting a raw material gas using a particle generator that applies the apparatus or a particle generator that applies a plasma CVD apparatus. .

【0013】本発明の物品表面改質処理方法及び装置に
おいて用いるプラズマ雰囲気用ガスは微粒子を帯電(通
常は負に帯電)させるためのものであり、その種類は特
に限定されない。また複数のガスを用いてもよい。物品
表面部分に該微粒子を含む層を形成するために例えばア
ルゴン(Ar)ガス等の不活性ガスを用いることがで
き、物品表面部分に酸化された微粒子を含む層を形成す
るために例えば酸素(O2 )ガス、酸化2窒素(N
2 O)ガスを用いることができ、物品表面部分に窒化さ
れた微粒子を含む層を形成するために例えば窒素
(N2 )ガス、アンモニア(NH3 )ガスを用いること
ができ、物品表面部分に炭化された微粒子を含む層を形
成するために例えばメタン(CH4 )ガス、エタン(C
2 6 )ガス、6フッ化2炭素(C2 6 )ガスを用い
ることができる。
The gas for the plasma atmosphere used in the method and apparatus for modifying the surface of an article of the present invention is for charging fine particles (usually negatively charged), and the type thereof is not particularly limited. Further, a plurality of gases may be used. An inert gas such as, for example, argon (Ar) gas can be used to form a layer containing the fine particles on the surface of the article, and oxygen (eg, oxygen) can be used to form a layer containing the oxidized fine particles on the surface of the article. O 2 ) gas, dinitrogen oxide (N
2 O) gas can be used. For example, nitrogen (N 2 ) gas and ammonia (NH 3 ) gas can be used to form a layer containing nitrided fine particles on the surface of the article. In order to form a layer containing carbonized fine particles, for example, methane (CH 4 ) gas, ethane (C
2 H 6 ) gas and dicarbon hexafluoride (C 2 F 6 ) gas can be used.

【0014】また、物品表面部分に、炭素(C)、チタ
ン(Ti)、シリコン(Si)、アルミニウム(Al)
等と化合した微粒子を含む層を形成するためにメタンガ
ス、エタンガス、6フッ化2炭素ガス、4塩化チタン
(TiCl4 )ガス、4塩化シリコン(SiCl4 )ガ
ス、4フッ化シリコン(SiF4 )ガス、モノシラン
(SiH4 )ガス、3塩化アルミニウム(AlCl3
ガス等の化合物ガスであって、微粒子構成物質と化合し
てその一部が微粒子中に取り込まれるガスの1又は2以
上と、不活性ガス及び水素(H2 )ガス、酸素(O2
ガス、フッ素(F2)ガス、塩素(Cl2 )ガス等の化
合物ガスでない単体の活性ガスから選ばれた1又は2以
上のガス(不活性ガス又は(及び)活性ガス)を用いる
ことが考えられる。
Further, carbon (C), titanium (Ti), silicon (Si), aluminum (Al)
Methane gas, ethane gas, dicarbon hexafluoride gas, titanium tetrachloride (TiCl 4 ) gas, silicon tetrachloride (SiCl 4 ) gas, silicon tetrafluoride (SiF 4 ) Gas, monosilane (SiH 4 ) gas, aluminum trichloride (AlCl 3 )
A compound gas, such as a gas, which is one or more of a gas that is combined with the fine particle constituent material and a part of which is taken into the fine particles, an inert gas, a hydrogen (H 2 ) gas, and an oxygen (O 2 )
It is conceivable to use one or more gases (inert gas and / or active gas) selected from a single active gas which is not a compound gas such as gas, fluorine (F 2 ) gas, chlorine (Cl 2 ) gas, etc. Can be

【0015】本発明の物品表面改質処理方法及び装置に
おいて用いる被処理物品の材質としては、金属、高分子
材料、セラミック等を挙げることができるが、特に限定
されない。電気絶縁性材料からなる物品を用いるときに
は、被処理物品支持手段に直流電圧と共に高周波電圧を
印加することで該物品表面の帯電(チャージアップ)を
防止することができる。
The material of the article to be treated used in the article surface modification method and apparatus of the present invention may be a metal, a polymer material, a ceramic or the like, but is not particularly limited. When an article made of an electrically insulating material is used, charging (charging up) of the article surface can be prevented by applying a high frequency voltage together with a DC voltage to the article supporting means to be processed.

【0016】また、本発明の前記物品表面改質処理方法
及び装置においては、それには限定されないが、好まし
い態様(態様1)として、方法については、前記被処理
物品の表面改質処理にあたり、前記真空容器内への前記
微粒子の導入及び前記被処理物品支持手段への前記直流
電圧の印加は間欠的に繰り返し行い、前記各微粒子の導
入と同時的に、又は該微粒子の導入途中から、又は該微
粒子の導入停止後に前記被処理物品支持手段への前記各
直流電圧の印加を開始し、次の微粒子導入開始前に該直
流電圧の印加を停止する物品表面改質処理方法を挙げる
ことができる。
In the method and apparatus for modifying the surface of an article of the present invention, the method is not limited thereto. In a preferred embodiment (aspect 1), the method is applied to the surface modification of the article to be treated. The introduction of the fine particles into the vacuum vessel and the application of the DC voltage to the article-to-be-processed supporting means are repeatedly performed intermittently, simultaneously with the introduction of the fine particles, or during the introduction of the fine particles, or An article surface modification method in which the application of each of the DC voltages to the article supporting means to be processed is started after the introduction of the fine particles is stopped, and the application of the DC voltage is stopped before the next introduction of the fine particles is started.

【0017】装置については、前記微粒子供給手段は前
記被処理物品の表面改質処理にあたり前記真空容器内に
間欠的に繰り返し微粒子を導入するものであり、また前
記直流電圧印加手段は前記被処理物品の表面改質処理に
あたり前記被処理物品支持手段に間欠的に繰り返し直流
電圧を印加するものであり、前記直流電圧印加手段は前
記各微粒子の導入と同時的に、又は該微粒子の導入途中
から、又は該微粒子の導入停止後に前記被処理物品支持
手段への前記各直流電圧の印加を開始し、次の微粒子供
給開始前に該直流電圧の印加を停止するものである物品
表面改質処理装置を挙げることができる。
In the apparatus, the fine particle supply means intermittently and repeatedly introduces fine particles into the vacuum vessel in performing a surface modification treatment of the article to be treated, and the DC voltage applying means comprises: In the surface modification treatment, a DC voltage is intermittently and repeatedly applied to the article-to-be-processed supporting means, and the DC voltage applying means is simultaneously with the introduction of the fine particles, or during the introduction of the fine particles, Alternatively, after the introduction of the fine particles is stopped, the application of the DC voltage to the article supporting means to be processed is started, and the application of the DC voltage is stopped before the next fine particle supply is started. Can be mentioned.

【0018】この方法及び装置においては、真空容器内
からの排気は連続的に行えばよい。被処理物品支持手段
とプラズマとの間に形成されるシース内に捕獲し得る帯
電微粒子の量には限りがあるが、このように、真空容器
内への微粒子供給を一定の周期で断続的に行うときに
は、該シース内に捕獲できる以上の微粒子を供給するこ
とによる微粒子の無駄な消費が回避される。
In this method and apparatus, the evacuation from the vacuum vessel may be performed continuously. Although the amount of charged fine particles that can be captured in the sheath formed between the article supporting means and the plasma is limited, the supply of the fine particles into the vacuum vessel is intermittently performed at a constant cycle. When performing, unnecessary consumption of fine particles by supplying more fine particles than can be captured in the sheath is avoided.

【0019】また、この方法及び装置において、前記各
直流電圧印加の停止は、次の微粒子供給開始前であれば
よいが、いずれにしても、できるだけ、真空容器内に目
的とする処理を行えるだけの所定量の微粒子が存在する
期間内に前記直流電圧を印加することが望ましい。被処
理物品に向けて加速される微粒子の量が少なくなり過ぎ
ると、該物品の微粒子による均一な処理を行い難くなる
が、このように真空容器内に微粒子が所定量残っている
状態で被処理物品支持手段への直流電圧の印加を停止す
るときには、被処理物品表面部分に所定量の微粒子を打
ち込んだり、被処理物品上に所定量の微粒子を含有する
膜を形成したり、被処理物品表面を所定量の微粒子で叩
いたりすることができ、その結果、このような被処理物
品表面改質処理を均一に行うことができる。
In this method and apparatus, the application of each DC voltage may be stopped before the start of the supply of the next fine particles, but in any case, the target processing can be performed in the vacuum vessel as much as possible. It is desirable to apply the DC voltage during a period in which a predetermined amount of fine particles exist. If the amount of the fine particles accelerated toward the article to be processed becomes too small, it becomes difficult to perform uniform processing with the fine particles of the article, but the processing is performed in a state where a predetermined amount of the fine particles remains in the vacuum vessel. When the application of the DC voltage to the article supporting means is stopped, a predetermined amount of fine particles is driven into the surface of the article to be processed, a film containing the predetermined amount of fine particles is formed on the article to be processed, Can be beaten with a predetermined amount of fine particles, and as a result, such an article surface modification treatment can be performed uniformly.

【0020】さらに、本発明の前記物品表面改質処理方
法及び装置においては、それには限定されないが、好ま
しい態様(態様2)として、前記態様1において、さら
に、方法については、前記プラズマ雰囲気用ガスへの前
記高周波電力印加を間欠的に繰り返し行い、前記各微粒
子導入開始前に、又は該微粒子導入開始と同時的に前記
各高周波電力印加を開始し、前記各直流電圧印加停止と
同時的に、又はその後に前記各高周波電力印加を停止す
る物品表面改質処理方法を挙げることができる。
In the method and apparatus for modifying the surface of an article according to the present invention, the present invention is not limited thereto, but as a preferred embodiment (aspect 2), the method according to aspect 1 is further described. Performing the high-frequency power application intermittently and intermittently, before starting the introduction of each fine particle, or simultaneously starting the application of the high-frequency power with the start of the introduction of the fine particles, and simultaneously with stopping the application of the DC voltage, Alternatively, there may be mentioned an article surface modification treatment method in which the application of the high-frequency power is stopped thereafter.

【0021】装置については、前記高周波電力印加手段
は前記被処理物品の表面改質処理にあたり前記プラズマ
雰囲気用ガスに間欠的に繰り返し高周波電力を印加する
ものであり、該高周波電力印加手段は前記各微粒子導入
開始前に、又は該微粒子導入開始と同時的に前記高周波
電力印加を開始し、前記各直流電圧印加停止と同時的
に、又はその後に前記各高周波電力印加を停止するもの
である物品表面改質処理装置を挙げることができる。
In the apparatus, the high-frequency power applying means intermittently and repeatedly applies high-frequency power to the plasma atmosphere gas in the surface modification treatment of the article to be treated. Before the introduction of the fine particles, or simultaneously with the start of the introduction of the fine particles, the application of the high-frequency power is started, and the application of the high-frequency power is stopped simultaneously with or after the stop of the application of the respective DC voltages, or the surface of the article. A reforming treatment device can be mentioned.

【0022】この方法及び装置において、真空容器内へ
のプラズマ雰囲気用ガスの導入については、高周波電力
の印加と同期的に間欠的に行ってもよいが、ガスの供給
を開始したり停止したりすると真空容器内の圧力が変動
してプラズマ発生が安定しにくくなるので、連続的に供
給するのが好ましい。前記のようなタイミングで前記高
周波電力印加を間欠的に繰り返し行うことにより、被処
理物品の改質処理に消費される微粒子のプラズマによる
帯電を十分に行うことができる。また、真空容器内への
微粒子導入及び被処理物品支持手段への直流電圧印加が
ない状態で高周波電力印加を停止する期間を間欠的に繰
り返し設けるため、該期間に被処理物品の改質処理に消
費されない余った微粒子を容易に真空容器外へ排出する
ことができる。
In the method and the apparatus, the introduction of the plasma atmosphere gas into the vacuum vessel may be performed intermittently in synchronization with the application of the high-frequency power. Then, since the pressure in the vacuum vessel fluctuates and the plasma generation becomes difficult to stabilize, it is preferable to supply the plasma continuously. By intermittently repeating the application of the high-frequency power at the timing as described above, it is possible to sufficiently charge the fine particles consumed in the reforming process of the article to be processed by the plasma. In addition, a period in which the application of high-frequency power is stopped intermittently without the introduction of fine particles into the vacuum vessel and the application of a DC voltage to the support of the article to be treated is intermittently repeated. The surplus fine particles that are not consumed can be easily discharged out of the vacuum container.

【0023】余った微粒子を一旦真空容器外へ排出しな
いときには、次の微粒子導入によりこの余った微粒子に
さらに微粒子を追加することになり、真空容器内の微粒
子量が物品の改質処理に必要な量より多くなったり少な
くなったりするが、このように余った微粒子を一旦容器
外へ排出するときには、これを避けることができる。そ
して、その結果、被処理物品表面改質処理を所定量の微
粒子でさらに均一に行うことができる。
If the surplus fine particles are not once discharged to the outside of the vacuum container, the fine particles are further added to the surplus fine particles by the next introduction of the fine particles, and the amount of the fine particles in the vacuum container is necessary for the article reforming process. The amount may be larger or smaller than the amount, but when such extra fine particles are once discharged out of the container, this can be avoided. As a result, the surface modification treatment of the article to be treated can be performed more uniformly with a predetermined amount of fine particles.

【0024】[0024]

【発明の実施の形態】以下、本発明の実施の形態を図面
を参照して説明する。図1は本発明に係る物品表面改質
処理装置の1例の概略構成を示す図である。この装置
は、排気装置11が付設された真空容器1を有し、容器
1内の互いに対向する位置には電極2及び電極31が備
えられている。電極2は物品支持ホルダを兼ねる電極
で、マッチングボックス41を介した高周波電源42と
ローパスフィルター51及びオンオフスイッチ52を介
した正の直流電源53とが並列に接続されている。ま
た、電極2にはヒータ20が付設されている。スイッチ
52は図示しない制御部の指示のもとに後述する所定の
タイミングで開閉される。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing a schematic configuration of an example of an article surface modification treatment apparatus according to the present invention. This device has a vacuum vessel 1 to which an exhaust device 11 is attached, and an electrode 2 and an electrode 31 are provided at positions in the vessel 1 facing each other. The electrode 2 is an electrode also serving as an article support holder, and a high-frequency power supply 42 via a matching box 41 and a positive DC power supply 53 via a low-pass filter 51 and an on / off switch 52 are connected in parallel. The electrode 2 is provided with a heater 20. The switch 52 is opened and closed at a predetermined timing, which will be described later, under an instruction from a control unit (not shown).

【0025】電極31は高周波電極で、マッチングボッ
クス32及び高周波パワーアンプ33を介して任意の波
形を発生させることができる高周波信号発生器34が接
続されている。さらに容器1には、電磁弁61及びこれ
を介して接続された微粒子ホッパー62からなる微粒子
供給部6が付設されているとともに、プラズマ雰囲気用
ガス供給部7が付設されている。ガス供給部7には、マ
スフローコントローラ711、712・・・及び電磁弁
721、722を介して接続された1又は2以上のプラ
ズマ雰囲気用ガスのガス源731、732・・・が含ま
れる。各電磁弁は図示しない制御部の指示のもとに後述
する所定のタイミングで開閉される。
The electrode 31 is a high-frequency electrode, and is connected to a high-frequency signal generator 34 that can generate an arbitrary waveform via a matching box 32 and a high-frequency power amplifier 33. Further, the container 1 is provided with a fine particle supply unit 6 including a solenoid valve 61 and a fine particle hopper 62 connected via the solenoid valve 61, and a plasma atmosphere gas supply unit 7 is additionally provided. The gas supply section 7 includes mass flow controllers 711, 712,... And one or more plasma atmosphere gas sources 731, 732,... Connected via electromagnetic valves 721, 722. Each solenoid valve is opened and closed at a predetermined timing described below under an instruction from a control unit (not shown).

【0026】この装置を用いて本発明方法を実施するに
あたっては、被処理物品Sを容器1内に搬入し、ホルダ
2に支持させた後、排気装置11の運転にて容器1内を
所定の真空度にする。次いで、ガス供給部7から容器1
内へプラズマ雰囲気用ガスを導入すると共に、微粒子供
給部6から容器1内への微粒子の導入、装置34から高
周波パワーアンプ33及びマッチングボックス32を介
して電極31への高周波電力の印加及び電源53からオ
ンオフスイッチ52を介して電極2への正電圧の印加を
それぞれ同期的に、一定の周期で開始及び停止を繰り返
して行う。
In carrying out the method of the present invention using this apparatus, the article S to be treated is carried into the container 1 and is supported by the holder 2. Apply vacuum. Next, the container 1 is supplied from the gas supply unit 7.
A gas for plasma atmosphere is introduced into the container, fine particles are introduced into the container 1 from the fine particle supply unit 6, high frequency power is applied from the device 34 to the electrode 31 via the high frequency power amplifier 33 and the matching box 32, and a power source 53 is supplied. , The application of a positive voltage to the electrode 2 via the on / off switch 52 is synchronously repeated and repeatedly started and stopped at a constant cycle.

【0027】なお、前記導入する微粒子は直径100Å
〜5000Åの範囲のものを用いる。また、微粒子供給
部62からの微粒子供給量は、微粒子ホッパー62の開
口部サイズを適宜定めることで調整する。このとき電極
31への高周波電力の印加開始停止のサイクルと、電極
2への正電圧の印加開始停止のサイクルとは同タイミン
グで行い、各サイクルについて微粒子供給部6からの微
粒子供給の開始停止のタイミングは、前記2者のオンと
同時に開始するとともに、前記2者のオフより前に停止
するようにした。
The fine particles to be introduced are 100 mm in diameter.
Those having a range of up to 5000 ° are used. The supply amount of the fine particles from the fine particle supply unit 62 is adjusted by appropriately determining the size of the opening of the fine particle hopper 62. At this time, the cycle of starting and stopping the application of the high-frequency power to the electrode 31 and the cycle of starting and stopping the application of the positive voltage to the electrode 2 are performed at the same timing. The timing starts at the same time as the turning on of the two parties and stops before the turning off of the two parties.

【0028】図2に、容器1内への微粒子供給パターン
(A)、電極31への高周波電力印加パターン(B)、
及び電極2への正電圧印加パターン(C)の1例を示
す。以上により、電極31に高周波電力を印加すること
で発生したプラズマP中で、微粒子は負に帯電するが、
このとき電極2に正電圧が印加されるため、負に帯電し
た微粒子がプラズマPと電極2との間に形成されるシー
ス内に捕獲され、さらに電極2に向けて加速される。そ
して、電極2に印加する電圧を比較的大きくするときは
該微粒子が物品Sに打ち込まれ、該電圧を比較的小さく
するときには該微粒子が物品S表面を叩いて該面をクリ
ーニングしたり、表面粗度を改善したりする。
FIG. 2 shows a pattern (A) for supplying fine particles into the container 1, a pattern (B) for applying high-frequency power to the electrode 31,
And an example of a positive voltage application pattern (C) to the electrode 2 is shown. As described above, in the plasma P generated by applying the high-frequency power to the electrode 31, the fine particles are negatively charged.
At this time, since a positive voltage is applied to the electrode 2, the negatively charged fine particles are captured in a sheath formed between the plasma P and the electrode 2, and further accelerated toward the electrode 2. When the voltage applied to the electrode 2 is relatively large, the fine particles are driven into the article S. When the voltage is relatively small, the fine particles hit the surface of the article S to clean the surface, To improve the degree.

【0029】微粒子を物品Sに打ち込むときには、図3
(A)に示すように、物品S表面部分に微粒子を含む層
S1が形成されるため、該層は物品Sの硬度等にかかわ
らず密着性よく形成される。また、このとき、プラズマ
雰囲気用ガスとして、微粒子を構成する物質と化合でき
るガスを用いるときには、物品S表面に該化合物からな
る微粒子を含む層を形成できる。
When driving the fine particles into the article S, FIG.
As shown in (A), since the layer S1 containing fine particles is formed on the surface of the article S, the layer is formed with good adhesion regardless of the hardness of the article S or the like. At this time, when a gas that can be combined with a substance constituting the fine particles is used as the plasma atmosphere gas, a layer containing the fine particles made of the compound can be formed on the surface of the article S.

【0030】また、微粒子材質等や物品S材質によって
微粒子を物品Sに打ち込むことが困難な場合、プラズマ
雰囲気用ガスとして成膜可能なガスを用いることによ
り、図3(B)に示すように、物品S表面に微粒子を含
む膜S2を形成できる。また、容器1内への微粒子の供
給を断続的に行うため、物品Sに向けて加速される微粒
子の量がシース内に捕獲できる量を超えて無駄に消費さ
れない。また、微粒子のこのような断続的な供給により
必要な帯電微粒子が断続的に不足することになるが、電
極2への正電圧印加を断続的に行うため、真空容器1内
に所定量の微粒子が存在する状態でのみ物品Sに向けて
微粒子を加速することができる。さらに、電極31への
高周波電力印加を断続的に行い、微粒子供給、正電圧印
加、高周波電力印加のいずれも行わない期間を間欠的に
繰り返し設けるため、この期間に余った微粒子が排気装
置11の連続的な運転により真空容器1外へ排出され、
次の微粒子供給により物品Sの処理に必要な量の微粒子
を正確に容器1内に存在させることができる。そして、
これらのことから物品S表面の均一な改質処理を行うこ
とができる。
When it is difficult to drive the fine particles into the article S due to the material of the fine particles or the material of the article S, as shown in FIG. A film S2 containing fine particles can be formed on the surface of the article S. Further, since the supply of the fine particles into the container 1 is performed intermittently, the amount of the fine particles accelerated toward the article S exceeds the amount that can be captured in the sheath, and is not wastefully consumed. In addition, although the required charged fine particles are intermittently deficient due to the intermittent supply of the fine particles, a predetermined amount of the fine particles is placed in the vacuum vessel 1 because the positive voltage is applied to the electrode 2 intermittently. Particles can be accelerated toward the article S only in the state where. Further, the application of high-frequency power to the electrode 31 is performed intermittently, and a period in which none of the supply of fine particles, the application of positive voltage, and the application of high-frequency power is performed is intermittently repeated. It is discharged out of the vacuum vessel 1 by continuous operation,
By the next supply of the fine particles, the amount of the fine particles required for processing the article S can be accurately present in the container 1. And
From these facts, it is possible to perform a uniform modification treatment on the surface of the article S.

【0031】また、物品Sが電気絶縁性である場合、電
極2に、電源53からの正電圧と高周波電源42からの
高周波電圧とを重畳して印加することができ、これによ
り、物品S表面のチャージアップを防止することができ
る。なお、ここでは図1に示すように、平行平板型のプ
ラズマCVD装置を応用した物品表面改質処理装置を用
いたが、物品Sとして立体構造を有するものを用いると
きには、誘導結合型のプラズマCVD装置を応用した装
置を用いることもできる。
When the article S is electrically insulating, a positive voltage from the power supply 53 and a high-frequency voltage from the high-frequency power supply 42 can be applied to the electrode 2 in a superimposed manner. Can be prevented from being charged up. Here, as shown in FIG. 1, an article surface modification treatment apparatus to which a parallel plate type plasma CVD apparatus is applied is used. However, when an article S having a three-dimensional structure is used, an inductively coupled plasma CVD apparatus is used. An apparatus to which the apparatus is applied can also be used.

【0032】次に図1の装置を用いた本発明方法実施の
具体例を説明する。なお、各実施例に共通の装置条件及
び処理条件は、次のとおりである。 高周波電極31サイズ 直径270mm 電極2サイズ 直径300mm 電極間距離 30mm 使用周波数 13.56MHz 高周波電圧印加、正電圧印加の周期 40kHz、デューティ比20% 微粒子供給の周期 40kHz、デューティ比10% 実施例1 処理条件 微粒子材質 DLC (Diamond Like Carbon) サイズ 直径1000ű20% 被処理物品S ステンレススチール製の切断加工用ブレード サイズ 直径100mm×厚さ5mm 高周波電力 200W 正電圧 5kV オンパルス幅5μsec、オフタイム20μsec プラズマ雰囲気用ガス アルゴン(Ar) 200sccm 処理真空度 0.1Torr 処理時間 5min この結果、図3(A)に示すと同様に、ステンレススチ
ールからなるブレードS表面部分に、DLCからなる微
粒子を含有する層S1が形成された。これにより、ブレ
ードSの切削物に対する摩擦係数は層S1を形成しない
場合に比べ1/2になり、従来のブレードでは潤滑剤を
用いることが必要であったが、これが不要になった。 実施例2 処理条件 微粒子材質 シリコン サイズ 直径1000ű30% 被処理物品S プラスチック製物品 サイズ 直径100mm×厚さ5mm 高周波電力 200W 正電圧 5kV オンパルス幅5μsec、オフタイム20μsec プラズマ雰囲気用ガス アルゴン(Ar) 200sccm 処理真空度 0.1Torr 処理時間 10min この結果、図3(A)に示すと同様に、プラスチックか
らなる物品S表面部分に、シリコンからなる微粒子を含
有する層S1が形成され、物品S表面硬度が10倍に向
上した。実施例3 処理条件 微粒子材質 シリコン サイズ 直径1000ű30% 被処理物品S プラスチック製物品 サイズ 直径100mm×厚さ5mm 高周波電力 200W 正電圧 5kV オンパルス幅5μsec、オフタイム20μsec (高周波電圧を重畳印加、300W) プラズマ雰囲気用ガス アルゴン(Ar) 200sccm メタン(CH4 ) 100sccm 処理真空度 0.1Torr 処理時間 10min この結果、図3(A)に示すと同様に、プラスチックか
らなる物品S表面部分に、炭化シリコンからなる微粒子
を含有する層S1が形成され、物品S表面硬度が15倍
に向上するとともに、相手方部材に摺動させて使用する
場合、層S1が無い場合に比べ摩擦係数が1/2になっ
た。 実施例4 処理条件 微粒子材質 ダイアモンド サイズ 直径500ű20% 被処理物品S ステンレススチール製の切断加工用ブレード サイズ 直径100mm×厚さ0.5mm 高周波電力 200W 正電圧 5kV オンパルス幅5μsec、オフタイム20μsec プラズマ雰囲気用ガス アルゴン(Ar) 200sccm 処理真空度 0.1Torr 処理時間 20min この結果、図3(A)に示すと同様に、ステンレススチ
ールからなるブレード物品S表面部分にダイアモンド微
粒子含有層S1が形成され、層S1形成前はブレードと
して使用できなかったものが、ブレードとして使用可能
となり、その切削寿命は500時間となった。 実施例5 処理条件 微粒子材質 ステンレススチール サイズ 直径1000ű20% 被処理物品S ポリエチレン製物品 サイズ 直径100mm×厚さ5mm 高周波電力 200W 正電圧 5kV オンパルス幅5μsec、オフタイム20μsec プラズマ雰囲気用ガス アルゴン(Ar) 200sccm 処理真空度 0.1Torr 処理時間 5min この結果、図3(A)に示すと同様に、ポリエチレンか
らなる物品Sの表面部分にステンレススチールからなる
微粒子を含有する層S1が形成され、物品S表面の抵抗
率は10×1011Ω・cmから10×102 Ω・cmと
なり、良好な導電性が得られた。
Next, a concrete example of carrying out the method of the present invention using the apparatus shown in FIG. 1 will be described. The apparatus conditions and processing conditions common to each embodiment are as follows. High-frequency electrode 31 size Diameter 270 mm Electrode 2 size Diameter 300 mm Distance between electrodes 30 mm Operating frequency 13.56 MHz Frequency of high-frequency voltage application, positive voltage application 40 kHz, duty ratio 20% Particle supply period 40 kHz, duty ratio 10% Example 1 Processing conditions Fine particle material DLC (Diamond Like Carbon) Size Diameter 1000 mm ± 20% Workpiece S Cutting blade made of stainless steel Size Diameter 100 mm x thickness 5 mm High frequency power 200 W Positive voltage 5 kV On pulse width 5 μsec, Off time 20 μsec Gas for plasma atmosphere Argon (Ar) 200 sccm Processing vacuum degree 0.1 Torr Processing time 5 min As a result, as shown in FIG. 3 (A), fine particles made of DLC are contained on the surface of the blade S made of stainless steel. A layer S1 was formed. As a result, the coefficient of friction of the blade S with respect to the cut object is reduced to one-half that of the case where the layer S1 is not formed, and the conventional blade requires the use of a lubricant, which is no longer necessary. Example 2 Processing Conditions Fine Particle Material Silicon Size Diameter 1000Å ± 30% Treated Article S Plastic Article Size Diameter 100 mm × Thickness 5 mm High Frequency Power 200 W Positive Voltage 5 kV On Pulse Width 5 μsec, Off Time 20 μsec Plasma Atmosphere Gas Argon (Ar) 200 sccm As a result, as shown in FIG. 3 (A), a layer S1 containing fine particles made of silicon is formed on the surface of the article S made of plastic, and the surface hardness of the article S is reduced. 10 times improvement. Example 3 Processing Conditions Fine Particle Material Silicon Size Diameter 1000Å ± 30% Treated Article S Plastic Article Size Diameter 100 mm × Thickness 5 mm High Frequency Power 200 W Positive Voltage 5 kV On Pulse Width 5 μsec, Off Time 20 μsec (High Frequency Voltage Superimposed, 300 W) Gas for plasma atmosphere Argon (Ar) 200 sccm Methane (CH 4 ) 100 sccm Processing vacuum degree 0.1 Torr Processing time 10 min As a result, as shown in FIG. A layer S1 containing fine particles was formed, the surface hardness of the article S was improved by 15 times, and the coefficient of friction was halved when used by sliding against a counterpart member, compared to the case without the layer S1. . Example 4 Processing Conditions Fine Particle Material Diamond Size Diameter 500 mm ± 20% Article to be Treated S Stainless Steel Cutting Blade Size 100 mm Diameter x 0.5 mm Thickness High Frequency Power 200 W Positive Voltage 5 kV On Pulse Width 5 μsec, Off Time 20 μsec Plasma Atmosphere As a result, as shown in FIG. 3A, a diamond fine particle-containing layer S1 is formed on the surface of the blade article S made of stainless steel, as shown in FIG. What could not be used as a blade before forming S1 became usable as a blade, and its cutting life was 500 hours. Example 5 Processing Conditions Fine Particle Material Stainless Steel Size Diameter 1000Å ± 20% Article to be Treated S Polyethylene Article Size Diameter 100 mm × Thickness 5 mm High Frequency Power 200 W Positive Voltage 5 kV On Pulse Width 5 μsec, Off Time 20 μsec Plasma Atmosphere Gas Argon (Ar) As a result, a layer S1 containing fine particles made of stainless steel is formed on the surface portion of the article S made of polyethylene, as shown in FIG. From 10 × 10 11 Ω · cm to 10 × 10 2 Ω · cm, and good conductivity was obtained.

【0033】[0033]

【発明の効果】以上説明したように本発明によると、被
処理物品の表面硬度が高硬度でないときは勿論、たとえ
高硬度であるときでも該物品表面部に密着性良好に所望
の特性の膜を形成して該表面を改質したり、被処理物品
表面に目的とする粒子の層を選択的に形成して該表面を
改質したり、或いは該物品表面を叩く等して改質できる
物品表面改質処理方法及び装置を提供することができ
る。
As described above, according to the present invention, not only when the surface hardness of the article to be treated is not high, but also when the hardness is high, a film having desired properties and good adhesion to the surface of the article is obtained. To improve the surface, or to selectively form a layer of target particles on the surface of the article to be treated to modify the surface, or to modify the surface of the article by hitting the surface. An article surface modification treatment method and apparatus can be provided.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明に係る物品表面改質処理装置の1例の概
略構成を示す図である。
FIG. 1 is a view showing a schematic configuration of an example of an article surface modification treatment apparatus according to the present invention.

【図2】本発明方法における、真空容器内への微粒子の
供給(A)、プラズマ雰囲気用ガスへの高周波電力印加
(B)及び物品支持手段への正電圧印加(C)のそれぞ
れのタイミングの1例を示す図である。
FIG. 2 shows the timing of the supply of fine particles into a vacuum vessel (A), the application of high-frequency power to a gas for plasma atmosphere (B), and the application of a positive voltage to article support means (C) in the method of the present invention. It is a figure showing an example.

【図3】図(A)、(B)はそれぞれ本発明方法の実施
により得られる改質処理後の物品の一部の拡大断面図で
ある。
FIGS. 3A and 3B are enlarged cross-sectional views of a part of an article after a modification treatment obtained by performing the method of the present invention.

【符号の説明】[Explanation of symbols]

1 真空容器 11 排気装置 2 物品支持ホルダ兼電極 20 ヒータ 31 高周波電極 32、41 マッチングボックス 33 高周波パワーアンプ 34 高周波信号発生装置 42 高周波電源 51 ローパスフィルター 52 オンオフスイッチ 53 直流正電圧電源 6 微粒子供給部 7 プラズマ雰囲気用ガス供給部 S 被処理物品 P プラズマ DESCRIPTION OF SYMBOLS 1 Vacuum container 11 Exhaust apparatus 2 Article support holder and electrode 20 Heater 31 High frequency electrode 32, 41 Matching box 33 High frequency power amplifier 34 High frequency signal generator 42 High frequency power supply 51 Low pass filter 52 On / Off switch 53 DC positive voltage power supply 6 Particle supply part 7 Gas supply section for plasma atmosphere S Article to be processed P Plasma

Claims (8)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 真空容器内に設けた被処理物品支持手段
に被処理物品を支持させ、該容器内に該物品への目的と
する処理に応じたプラズマ雰囲気用ガス及び微粒子を導
入し、所定真空下で該ガスを高周波電力印加によりプラ
ズマ化し、該プラズマ雰囲気で前記微粒子を帯電させる
一方、前記被処理物品支持手段に該微粒子の帯電極性と
逆極性の直流電圧を印加することで前記帯電微粒子を前
記被処理物品へ向けて加速して該被処理物品に目的とす
る処理を施すことを特徴とする物品表面改質処理方法。
An article to be processed is supported by means for supporting the article to be processed provided in a vacuum vessel, and a gas for plasma atmosphere and fine particles corresponding to a desired treatment for the article are introduced into the vessel, and The gas is turned into plasma by applying high-frequency power under vacuum, and the fine particles are charged in the plasma atmosphere, and a DC voltage having a polarity opposite to the charging polarity of the fine particles is applied to the article-to-be-processed supporting means. The surface of the article to be treated is subjected to a desired treatment by accelerating the article toward the article to be treated.
【請求項2】 前記被処理物品の表面改質処理にあた
り、前記真空容器内への前記微粒子の導入及び前記被処
理物品支持手段への前記直流電圧の印加は間欠的に繰り
返し行い、前記各微粒子の導入と同時的に、又は該微粒
子の導入途中から、又は該微粒子の導入停止後に前記被
処理物品支持手段への前記各直流電圧の印加を開始し、
次の微粒子導入開始前に該直流電圧の印加を停止する請
求項1記載の物品表面改質処理方法。
2. In the surface modification treatment of the article to be treated, the introduction of the particles into the vacuum vessel and the application of the DC voltage to the article supporting means are intermittently repeated, Simultaneously with the introduction, or during the introduction of the fine particles, or after the introduction of the fine particles is stopped, start applying the DC voltage to the article-to-be-processed supporting means,
2. The method for modifying the surface of an article according to claim 1, wherein the application of the DC voltage is stopped before starting the introduction of the next fine particles.
【請求項3】 前記プラズマ雰囲気用ガスへの前記高周
波電力印加を間欠的に繰り返し行い、前記各微粒子導入
開始前に、又は該微粒子導入開始と同時的に前記各高周
波電力印加を開始し、前記各直流電圧印加停止と同時的
に、又はその後に前記各高周波電力印加を停止する請求
項2記載の物品表面改質処理方法。
3. The application of the high-frequency power to the plasma atmosphere gas is intermittently repeated, and the application of the high-frequency power is started before or simultaneously with the start of the introduction of the fine particles, and The article surface reforming method according to claim 2, wherein the application of the high-frequency power is stopped simultaneously with or after each DC voltage application is stopped.
【請求項4】 前記プラズマ雰囲気用ガスとして、化合
物ガスであって前記微粒子を構成する物質と化合してそ
の一部が微粒子に取り込まれる少なくとも1種の化合物
ガスと、不活性ガス及び活性ガスから選ばれる1又は2
以上のガスとを用いる請求項1、2又は3記載の物品表
面改質処理方法。
4. The plasma atmosphere gas comprises at least one compound gas which is a compound gas which is combined with a substance constituting the fine particles and a part of which is incorporated into the fine particles, and an inert gas and an active gas. 1 or 2 to be chosen
4. The method according to claim 1, wherein the above gas is used.
【請求項5】 真空容器と、該真空容器内に備えられた
被処理物品支持手段と、該容器に付設された排気手段、
プラズマ雰囲気用ガス供給手段、微粒子供給手段及び該
プラズマ雰囲気用ガス供給手段により該容器内に導入さ
れるプラズマ雰囲気用ガスに高周波電力を印加して該ガ
スをプラズマ化させるとともに該プラズマ雰囲気下で、
該微粒子供給手段により導入される微粒子を帯電させる
ための高周波電力印加手段と、前記支持手段に前記微粒
子の帯電極性と逆極性の直流電圧を印加して帯電した前
記微粒子を該支持手段上の被処理物品に向けて加速する
ための、該支持手段に接続された直流電圧印加手段とを
有することを特徴とする物品表面改質処理装置。
5. A vacuum vessel, an article supporting means provided in the vacuum vessel, and an exhaust means attached to the vessel.
Under the plasma atmosphere, high-frequency power is applied to the plasma atmosphere gas introduced into the container by the plasma atmosphere gas supply means, the fine particle supply means, and the plasma atmosphere gas supply means, and the gas is turned into plasma.
A high-frequency power applying means for charging the fine particles introduced by the fine particle supply means; and a DC voltage having a polarity opposite to the charging polarity of the fine particles is applied to the supporting means, so that the fine particles charged on the supporting means are covered with the fine particles. An article surface reforming apparatus, comprising: a DC voltage applying means connected to the support means for accelerating toward a treated article.
【請求項6】 前記微粒子供給手段は前記被処理物品の
表面改質処理にあたり前記真空容器内に間欠的に繰り返
し微粒子を導入するものであり、また前記直流電圧印加
手段は前記被処理物品の表面改質処理にあたり前記被処
理物品支持手段に間欠的に繰り返し直流電圧を印加する
ものであり、前記直流電圧印加手段は前記各微粒子の導
入と同時的に、又は該微粒子の導入途中から、又は該微
粒子の導入停止後に前記被処理物品支持手段への前記各
直流電圧印加を開始し、次の微粒子供給開始前に該直流
電圧印加を停止するものである請求項5記載の物品表面
改質処理装置。
6. The fine particle supply means intermittently and repeatedly introduces fine particles into the vacuum vessel upon performing a surface modification treatment of the article to be treated, and the DC voltage applying means comprises: In the reforming treatment, a DC voltage is repeatedly and intermittently applied to the article supporting means, and the DC voltage applying means is simultaneously with the introduction of the fine particles, or during the introduction of the fine particles, or 6. The article surface reforming apparatus according to claim 5, wherein the application of each DC voltage to the article support means is started after the introduction of the fine particles is stopped, and the DC voltage application is stopped before the next supply of the fine particles. .
【請求項7】 前記高周波電力印加手段は前記被処理物
品の表面改質処理にあたり前記プラズマ雰囲気用ガスに
間欠的に繰り返し高周波電力を印加するものであり、該
高周波電力印加手段は前記各微粒子導入開始前に、又は
該微粒子導入開始と同時的に前記高周波電力印加を開始
し、前記各直流電圧印加停止と同時的に、又はその後に
前記各高周波電力印加を停止するものである請求項6記
載の物品表面改質処理装置。
7. The high-frequency power applying means intermittently and repeatedly applies high-frequency power to the plasma atmosphere gas during the surface modification treatment of the article to be treated, and the high-frequency power applying means is adapted to introduce the fine particles. 7. The method according to claim 6, wherein the application of the high-frequency power is started before the start or simultaneously with the start of the introduction of the fine particles, and the application of the high-frequency power is stopped simultaneously with or after stopping the application of the DC voltage. Surface treatment equipment for goods.
【請求項8】 前記プラズマ雰囲気用ガス供給手段が、
プラズマ雰囲気用ガスとして、化合物ガスであって前記
微粒子供給手段により供給される微粒子の構成物質と化
合してその一部が微粒子に取り込まれる少なくとも1種
の化合物ガスと、不活性ガス及び活性ガスから選ばれる
1又は2以上のガスとを供給するものである請求項5、
6又は7記載の物品表面改質処理装置。
8. The gas supply means for plasma atmosphere,
As the plasma atmosphere gas, at least one compound gas which is a compound gas and is combined with a constituent material of the fine particles supplied by the fine particle supply means and a part of which is taken into the fine particles, and an inert gas and an active gas. A gas for supplying one or more selected gases.
An article surface modification treatment apparatus according to 6 or 7.
JP7289753A 1995-11-08 1995-11-08 Article surface treatment method and apparatus Expired - Fee Related JP3031219B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7289753A JP3031219B2 (en) 1995-11-08 1995-11-08 Article surface treatment method and apparatus

Publications (2)

Publication Number Publication Date
JPH09125258A JPH09125258A (en) 1997-05-13
JP3031219B2 true JP3031219B2 (en) 2000-04-10

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ID=17747321

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Country Link
JP (1) JP3031219B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3952695B2 (en) * 2000-05-26 2007-08-01 学校法人金沢工業大学 Method and apparatus for surface modification of polymer compound container

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