JP3034366B2 - Manufacturing method of color filter substrate - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a color filter substrate used in an active matrix type liquid crystal display device using a thin film transistor (TFT) as a switching element.

[0002]

2. Description of the Related Art A color filter substrate is composed of, for example, a glass substrate, a black matrix layer, a coloring layer, an overcoat layer and a transparent electrode layer. Of these, the transparent electrode layer is formed only on the effective portion of the color filter by means such as sputtering. And is patterned into an arbitrary shape so as to have a power supply terminal for applying a voltage from the outside.

[0003]

The exposed overcoat layer outside the effective portion of the color filter causes flaws and stains during the manufacturing process, leading to contamination of the effective portion of the color filter. In some cases, the liquid crystal material was contaminated after the cell was formed, and the display performance was sometimes deteriorated. The present invention has been made in view of the above circumstances.

[0004]

According to the present invention, there is provided a method for mounting on a substrate.
Color layer, overcoat layer and transparent electrode layer are sequentially laminated
Form the color filter pixel part and its peripheral part
After that, at the boundary between the color filter pixel part and the peripheral part
Then, a color filter for cutting and removing the peripheral portion is manufactured.
The transparent electrode layer is formed in the pixel portion of the color filter.
And each of the peripheral parts.

[0005]

According to the present invention, in the vicinity of the color filter pixel portion,
By also on the peripheral portion to form a transparent electrode layer for protection, it is possible to prevent contamination of the color filter pixel region caused by the contamination of the peripheral portion, and the like.

[0006]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The details of the present invention will be described below with reference to the drawings.

FIG. 1 is a view showing one embodiment of the present invention, and FIG. 1 (a) corresponds to a cross section taken along the line AA 'of FIG. 1 (b). 1A and 1B, a description will be given according to the manufacturing process. First, a colored layer 2 made of a resin paste in which a pigment is dispersed, for example, corresponding to each pixel, and a chromium Is formed. Next, an overcoat layer 4 made of, for example, polyimide is formed on the coloring layer 2 and the black matrix layer 3. Subsequently, on the overcoat layer 4, for example, a sheet resistance of 60Ω / □ and a film thickness of 15Ω
A transparent electrode layer 5 made of 00 angstroms of ITO is formed by mask sputtering, and the transparent electrode layer 5 is further patterned to separate the color filter pixel portion from unnecessary peripheral portions. At this time, the transparent electrode layer 5 in the color filter pixel portion is provided with terminal portions for applying a voltage from outside at four corner portions. Subsequently, the transparent electrode layer 5
After forming an alignment layer 6 made of, for example, polyimide, rubbing is performed thereon using a cloth or the like. Next, a predetermined color filter substrate as shown in FIG. 1C is obtained by cutting along the dotted line portion 7 in FIG. 1B and cutting unnecessary peripheral portions from the color filter pixel portion. .

In this embodiment, the overcoat layer 4 is protected by leaving the transparent electrode layer 5 also at unnecessary peripheral portions, so that the overcoat layer 4 at the peripheral portion is damaged and peeled off during the manufacturing process, particularly during rubbing. Can be prevented. As a result, contamination of the pixel portion of the color filter caused by the overcoat layer 4 is eliminated. In addition, since the transparent electrode layer 5 provided in the unnecessary portion in the periphery is separated from the color filter pixel portion, there is no influence of contamination on the color filter pixel portion.

[0009]

According to the present invention, the overcoat layer in unnecessary portions in the periphery is covered with a transparent electrode layer during the manufacturing process, thereby preventing the color filter pixel area from being contaminated due to the overcoat layer, thereby improving image quality. It is possible to obtain a good active matrix liquid crystal display device.

[Brief description of the drawings]

FIG. 1 is a diagram showing an embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Substrate 2 ... Colored layer 3 ... Black matrix layer 4 ... Overcoat layer 5 ... Transparent electrode layer

Claims (3)

(57) [Claims] A color filter pixel portion and a color layer, an overcoat layer and a transparent electrode layer are sequentially laminated on a substrate.
After forming the peripheral part around the color filter,
Cutting the peripheral part along the boundary between the pixel part and the peripheral part
A method of manufacturing a color filter to be removed , wherein the transparent electrode layer is formed of the color filter pixel portion and the peripheral portion.
A method for manufacturing a color filter substrate, wherein the color filter substrates are arranged on respective substrates. (2) The transparent electrode layer is disposed across the boundary
The color filter according to claim 1, wherein
-The method of manufacturing the substrate. (3) The peripheral part is over the substrate
It is characterized in that a coating layer and the transparent electrode layer are laminated.
2. The method for manufacturing a color filter substrate according to claim 1,
Law.