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JP3040313B2 - Low concentration adjustment device - Google Patents
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JP3040313B2 - Low concentration adjustment device - Google Patents

Low concentration adjustment device

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Publication number
JP3040313B2
JP3040313B2 JP6168303A JP16830394A JP3040313B2 JP 3040313 B2 JP3040313 B2 JP 3040313B2 JP 6168303 A JP6168303 A JP 6168303A JP 16830394 A JP16830394 A JP 16830394A JP 3040313 B2 JP3040313 B2 JP 3040313B2
Authority
JP
Japan
Prior art keywords
concentration
target
density
chemical
target value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP6168303A
Other languages
Japanese (ja)
Other versions
JPH0835079A (en
Inventor
敏朗 ▲廣▼江
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Original Assignee
Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Screen Holdings Co Ltd, Dainippon Screen Manufacturing Co Ltd filed Critical Screen Holdings Co Ltd
Priority to JP6168303A priority Critical patent/JP3040313B2/en
Publication of JPH0835079A publication Critical patent/JPH0835079A/en
Application granted granted Critical
Publication of JP3040313B2 publication Critical patent/JP3040313B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は、低濃度調整装置、特
に、薬液が低濃度の目標濃度になるように調整する低濃
度調整装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a low-concentration adjusting device, and more particularly to a low-concentration adjusting device for adjusting a chemical solution to a low-concentration target concentration.

【0002】[0002]

【従来の技術】半導体や液晶表示装置の製造工程では、
エッチングや、エッチング後のフォトレジストの剥離処
理や、剥離後の基板の洗浄処理等の処理液による基板処
理工程が不可欠である。この種の基板処理工程では、た
とえばフッ酸(HF)の低濃度液でのエッチング処理や
洗浄処理が行われている。
2. Description of the Related Art In the manufacturing process of semiconductors and liquid crystal display devices,
A substrate processing step using a processing liquid such as etching, photoresist stripping after etching, and substrate cleaning after stripping is indispensable. In this type of substrate processing process, for example, an etching process or a cleaning process using a low concentration solution of hydrofluoric acid (HF) is performed.

【0003】低濃度の処理液を調合する場合、従来、調
合槽で所望の濃度に薬液を調合した後に処理槽に供給し
たり、処理槽内で所望の濃度に薬液を調合することが行
われている。このような薬液の調合時には、まず、薬液
と希釈液とを目標濃度となるようにそれぞれ定量供給
し、その濃度を濃度センサーで計測し、目標濃度から外
れている場合にはさらに検出された濃度と目標濃度との
差分だけ薬液又は希釈液を供給する。
[0003] In the case of preparing a low-concentration processing solution, conventionally, a chemical solution is prepared in a mixing tank to a desired concentration and then supplied to the processing tank, or a chemical solution is prepared in the processing tank to a desired concentration. ing. In the preparation of such a drug solution, first, the drug solution and the diluent are supplied in a fixed amount to each of the target concentrations, and the concentrations are measured by a concentration sensor. The chemical solution or the diluent is supplied by the difference between the target solution and the target concentration.

【0004】[0004]

【発明が解決しようとする課題】この種の低濃度の薬液
の濃度を測定する濃度センサーは、センサーの再現性及
び検出精度が良好ではないために、所定範囲の検出誤差
が生じる。たとえば、1%濃度のフッ酸の濃度を測定す
ると1%±0.01%程度の検出誤差が生じる。したが
って、低濃度の処理液を濃度センサーの検出濃度に応じ
て一定濃度に制御するのが困難である。このため、最初
から目標濃度を狙って薬液と希釈液とを供給すると、薬
液濃度が濃くなりすぎることがある。このとき、逆に薄
めるように希釈液を入れると逆に薄くなりすぎ、次に濃
くなりすぎるということを繰り返し、濃度が目標濃度に
迅速に収束しにくい。
In such a concentration sensor for measuring the concentration of a low-concentration chemical solution, a reproducibility and detection accuracy of the sensor are not good, so that a detection error in a predetermined range occurs. For example, when measuring the concentration of 1% hydrofluoric acid, a detection error of about 1% ± 0.01% occurs. Therefore, it is difficult to control the low-concentration processing solution to a constant concentration according to the detection concentration of the concentration sensor. For this reason, if the chemical solution and the diluent are supplied with the aim of the target concentration from the beginning, the chemical solution concentration may be too high. At this time, if a diluting solution is added so as to make the concentration thinner, it repeatedly becomes too thin and then becomes too dense, so that the concentration hardly quickly converges to the target concentration.

【0005】また、処理槽内で調合する際に処理の進行
につれて濃度が薄くなることがある。このような場合
に、目標濃度を狙って薬液を調合すると同様な問題が生
じ、目標濃度に迅速に収束しにくい。本発明の目的は、
低濃度の薬液を目標濃度に迅速に収束させるようにする
ことにある。
[0005] In addition, when the mixture is prepared in a processing tank, the concentration may decrease as the processing proceeds. In such a case, if a chemical solution is prepared for the target concentration, a similar problem occurs, and it is difficult to quickly converge to the target concentration. The purpose of the present invention is
An object of the present invention is to make a low-concentration chemical solution quickly converge to a target concentration.

【0006】[0006]

【課題を解決するための手段】本発明に係る低濃度調整
装置は、薬液が低濃度の目標濃度になるように調整する
装置であって、貯溜槽と濃度検出手段と目標値設定手段
と濃度調整手段とを備えている。貯溜槽は、薬液を貯溜
するためのものである。濃度検出手段は、目標濃度に対
して、貯溜槽に貯溜された薬液の濃度を所定の検出誤差
範囲で断続的に検出するものである。目標値設定手段
は、濃度検出手段が目標濃度と異なる濃度を検出したと
き、目標濃度と検出濃度との間の濃度を新たな目標値に
設定するものである。濃度調整手段は、貯溜槽内の薬液
の濃度が目標値設定手段で設定された目標値となるよう
に薬液濃度を調整するものである。
SUMMARY OF THE INVENTION A low concentration adjusting apparatus according to the present invention is an apparatus for adjusting a chemical solution to a low concentration target concentration, comprising a storage tank, a concentration detection means, a target value setting means, and a concentration control means. Adjusting means. The storage tank is for storing a chemical solution. The concentration detecting means intermittently detects the concentration of the chemical solution stored in the storage tank within a predetermined detection error range with respect to the target concentration. The target value setting means sets a density between the target density and the detected density to a new target value when the density detecting means detects a density different from the target density. The concentration adjusting means adjusts the chemical concentration such that the concentration of the chemical in the storage tank becomes the target value set by the target value setting means.

【0007】なお、目標値設定手段は、検出濃度と目標
濃度との間の半分の濃度を目標値に設定するのが好まし
い。また、濃度調整手段が、目標濃度より濃い濃度の薬
液を貯溜槽に供給する薬液供給手段と、検出濃度が目標
濃度より薄いとき、目標値設定手段で設定された目標値
に応じて薬液供給手段を動作させる動作手段とを有して
いるのが好ましい。
It is preferable that the target value setting means sets a half of the density between the detected density and the target density as the target value. A concentration adjusting unit configured to supply a chemical solution having a concentration higher than the target concentration to the storage tank; and a liquid supply unit configured to supply the chemical solution according to the target value set by the target value setting unit when the detected concentration is lower than the target concentration. It is preferable to have an operating means for operating.

【0008】また、濃度調整手段が、薬液を希釈するた
めの希釈液を貯溜槽に供給する希釈液供給手段と、検出
濃度が目標濃度より濃いとき、目標値設定手段で設定さ
れた目標値に応じて希釈液供給手段を動作させる動作手
段とを有しているのが好ましい。また、貯溜槽から薬液
を排出して貯溜槽に戻す循環手段をさらに備え、濃度検
出手段が、循環している薬液の濃度を検出するのが好ま
しい。
The concentration adjusting means includes a diluting liquid supply means for supplying a diluting liquid for diluting the chemical to the storage tank, and a detecting means for adjusting the target concentration set by the target value setting means when the detected concentration is higher than the target concentration. It is preferable to have operating means for operating the diluting liquid supply means accordingly. Further, it is preferable that the apparatus further comprises a circulating means for discharging the chemical solution from the storage tank and returning it to the storage tank, and the concentration detecting means detects the concentration of the circulating chemical solution.

【0009】また、動作手段は、貯溜槽内で新たな薬液
を調合するとき、目標濃度の検出誤差範囲の下限の濃度
になるように薬液供給手段及び希釈液供給手段を動作さ
せるのが好ましい。
Preferably, the operating means operates the chemical liquid supply means and the diluent liquid supply means so that the concentration of the chemical liquid becomes lower than the lower limit of the detection error range of the target concentration when a new chemical liquid is prepared in the storage tank.

【0010】[0010]

【作用】本発明に係る低濃度調整装置では、薬液が貯溜
槽に貯溜されると、濃度検出手段が所定の検出誤差範囲
で薬液の濃度を検出する。検出された濃度が目標濃度と
異なるとき、目標値設定手段は、目標濃度と検出濃度と
の間の濃度を新たな目標値に設定する。そして薬液の濃
度が目標値設定手段で設定された目標値となるように濃
度調整手段が薬液の濃度を調整する。
In the low-concentration adjusting device according to the present invention, when the chemical is stored in the storage tank, the concentration detecting means detects the concentration of the chemical within a predetermined detection error range. When the detected density is different from the target density, the target value setting means sets a density between the target density and the detected density to a new target value. Then, the concentration adjusting means adjusts the concentration of the chemical so that the concentration of the chemical becomes the target value set by the target value setting means.

【0011】ここでは、濃度調整を直接目標濃度に対し
て行うのではなく、目標濃度と検出濃度との間の目標値
に対して行うので、濃度検出手段が所定の検出誤差範囲
で濃度を検出しても、濃度が濃くなったり薄くなったり
せず迅速に目標濃度に収束する。なお、検出濃度と目標
濃度との半分の濃度を目標値に設定する場合には、より
効率良く目標濃度に収束できる。
Here, since the density adjustment is not performed directly on the target density but on a target value between the target density and the detected density, the density detecting means detects the density within a predetermined detection error range. However, the density quickly converges to the target density without increasing or decreasing. When half the detected density and the target density are set to the target value, the target density can be converged more efficiently.

【0012】また、濃度調整手段が、目標濃度より濃い
濃度の薬液を貯溜槽に供給する薬液供給手段と、検出濃
度が目標濃度より薄いとき、目標値設定手段で設定され
た目標値に応じて薬液供給手段を動作させる動作手段と
を有する場合には、検出濃度が薄いときに目標値に対し
て迅速に濃度が制御され、目標濃度に対する収束がより
迅速になる。
The concentration adjusting means includes a chemical liquid supply means for supplying a chemical liquid having a concentration higher than the target concentration to the storage tank, and when the detected concentration is lower than the target concentration, the concentration adjusting means is adapted to the target value set by the target value setting means. In the case of having the operating means for operating the chemical liquid supply means, when the detected concentration is low, the concentration is quickly controlled with respect to the target value, and the convergence with respect to the target concentration becomes more rapid.

【0013】また、薬液を希釈するための希釈液を貯溜
槽に供給する希釈液供給手段と、検出濃度が目標濃度よ
り濃いとき、目標値設定手段で設定された目標値に応じ
て希釈液供給手段を動作させ動作手段とを有する場合に
は、検出濃度が濃いときに目標値に対して迅速に濃度が
制御され、目標濃度に対する収束がより迅速になる。ま
た、貯溜槽から薬液を排出して貯溜槽に戻す循環手段を
さらに備え、濃度検出手段は循環している薬液の濃度を
検出する場合には、薬液が常に循環しているので、薬液
濃度をより精度良く検出できる。
A diluting liquid supply means for supplying a diluting liquid for diluting the chemical to the storage tank; and a diluting liquid supply means for supplying the diluting liquid according to the target value set by the target value setting means when the detected concentration is higher than the target concentration. When the means is operated and the operating means is provided, when the detected density is high, the density is quickly controlled with respect to the target value, and the convergence with respect to the target density is quicker. In addition, the apparatus further includes a circulating means for discharging the chemical solution from the storage tank and returning it to the storage tank, and when the concentration detecting means detects the concentration of the circulating chemical solution, the chemical solution is constantly circulating. More accurate detection is possible.

【0014】さらに、動作手段が、貯溜槽内で新たな薬
液を調合するとき、目標濃度の検出誤差範囲の下限の濃
度になるように薬液供給手段及び希釈液供給手段を動作
させる場合には、薄めに濃度を設定した状態で濃度調整
を行うので、濃度が濃くなることがなくなり、迅速に所
望の目標濃度に収束する。
Further, when the operating means operates the chemical liquid supply means and the diluent liquid supply means such that the concentration becomes the lower limit of the detection error range of the target concentration when dispensing a new chemical liquid in the storage tank, Since the density adjustment is performed in a state where the density is set slightly, the density does not increase, and the density quickly converges to a desired target density.

【0015】[0015]

【実施例】図1において、本発明の一実施例を採用した
基板処理装置は、希釈液貯溜槽1と薬液貯溜槽2と基板
処理槽3とを有している。希釈液貯溜槽1には、希釈液
として例えば純水が貯溜されている。また薬液貯溜槽2
には、薬液として例えばフッ酸が貯溜されている。希釈
液貯溜槽1の底部には、基板処理槽3に希釈液を供給す
るための希釈液供給配管4が接続されている。希釈液供
給配管4の途中には、定量ポンプP1が配置されてい
る。同様に薬液貯溜槽2の底部には、薬液を基板処理槽
3に供給するための薬液供給配管5が接続されており、
その途中には定量ポンプP2が配置されている。
1, a substrate processing apparatus according to an embodiment of the present invention includes a diluent storage tank 1, a chemical storage tank 2, and a substrate processing tank 3. In the diluent storage tank 1, for example, pure water is stored as a diluent. Chemical storage tank 2
Contains, for example, hydrofluoric acid as a chemical solution. A diluent supply pipe 4 for supplying diluent to the substrate processing tank 3 is connected to the bottom of the diluent storage tank 1. In the middle of the diluent supply pipe 4, a metering pump P1 is arranged. Similarly, a chemical supply pipe 5 for supplying a chemical to the substrate processing tank 3 is connected to the bottom of the chemical storage tank 2.
A metering pump P2 is arranged on the way.

【0016】基板処理槽3の内部には多数の基板Wを主
面を対向配置させて保持するための基板保持部10が設
けられている。基板処理槽3の底部には、循環配管6の
一端が接続されている。循環配管6の他端は、基板処理
槽3の上部から内部に導入されている。循環配管6の途
中には、循環ポンプP3、温度調節用の熱交換器7、濃
度センサー8、フィルター9及び循環バルブV1が一端
からこの順に配置されている。また、フィルター9と循
環バルブV1との間には、排出バルブV2が接続されて
いる。濃度センサー8は、低濃度のフッ酸(例えば1
%)の水溶液を±0.01%の検出誤差範囲で検出可能
なものであり、例えば、静電容量センサーや光センサー
から構成されている。
A substrate holding section 10 for holding a large number of substrates W with their main surfaces opposed to each other is provided inside the substrate processing tank 3. One end of a circulation pipe 6 is connected to the bottom of the substrate processing tank 3. The other end of the circulation pipe 6 is introduced into the substrate processing tank 3 from above. In the middle of the circulation pipe 6, a circulation pump P3, a heat exchanger 7 for temperature control, a concentration sensor 8, a filter 9, and a circulation valve V1 are arranged in this order from one end. Further, a discharge valve V2 is connected between the filter 9 and the circulation valve V1. The concentration sensor 8 has a low concentration of hydrofluoric acid (for example, 1
%) Can be detected within a detection error range of ± 0.01%, and includes, for example, a capacitance sensor and an optical sensor.

【0017】基板処理装置は、図2に示す制御部20を
有している。制御部20は、CPU,RAM,ROMを
含むマイクロコンピュータから構成されている。制御部
20には、目標濃度等の入力を行うための操作パネル2
1及び濃度センサー8が接続されている。また、制御部
20には、定量ポンプP1,P2、循環ポンプP3、循
環バルブV1、供給バルブV2及び他の入出力部が接続
されている。
The substrate processing apparatus has a control unit 20 shown in FIG. The control unit 20 includes a microcomputer including a CPU, a RAM, and a ROM. The control unit 20 includes an operation panel 2 for inputting a target density and the like.
1 and a density sensor 8 are connected. Further, the control unit 20 is connected to the metering pumps P1 and P2, the circulation pump P3, the circulation valve V1, the supply valve V2, and other input / output units.

【0018】次に、制御部20の制御動作を、図3〜図
6に示す制御フローチャートに従って説明する。プログ
ラムがスタートするとまずステップS1で初期設定を行
う。この際、各ポンプP1〜P3をオフし、各バルブV
1,V2を閉状態にする。また、各種のセット値を初期
値にセットする。
Next, the control operation of the control unit 20 will be described with reference to the control flowcharts shown in FIGS. When the program starts, first, initial settings are made in step S1. At this time, the respective pumps P1 to P3 are turned off, and the respective valves V
1, V2 is closed. Also, various set values are set to initial values.

【0019】ステップS2では、操作パネル21から目
標濃度Ctが入力されたか否かを判断する。ステップS
3では、調合指令がなされたか否かを判断する。ステッ
プS4では基板処理指令がなされたか否かを判断する。
ステップS5では排出指令がなされたか否かを判断す
る。ステップS6では他の指令がなされたか否かを判断
する。他の指令がなされていないと判断するとステップ
S2に戻る。
In step S2, it is determined whether or not the target density Ct has been input from the operation panel 21. Step S
At 3, it is determined whether or not a blending command has been issued. In step S4, it is determined whether a substrate processing command has been issued.
In step S5, it is determined whether a discharge command has been issued. In step S6, it is determined whether another command has been issued. If it is determined that another command has not been issued, the process returns to step S2.

【0020】目標濃度Ctが入力されたと判断されると
ステップS2からステップS10に移行する。ステップ
S10では、入力された目標濃度Ctをセットする。な
おこの目標濃度は、例えば1%にセットされる。この目
標濃度Ctは、若干の幅(例えばCt±0.005%程
度の幅)を持ってセットされる。調合指令がなされたと
判断するとステップS3からステップS11に移行す
る。ステップS11では調合処理(後述)を行う。基板
処理指令がなされたと判断するとステップS4からステ
ップS12に移行する。ステップS12では基板処理
(後述)がなされる。排出指令がなされたと判断すると
ステップS5からステップS13に移行する。ステップ
S13では排出処理(後述)がなされる。他の指令がな
されるとステップS6からステップS14に移行する。
ステップS14ではその指令に応じた他の処理が実行さ
れる。
When it is determined that the target density Ct has been input, the process proceeds from step S2 to step S10. In step S10, the input target density Ct is set. This target density is set to, for example, 1%. The target density Ct is set with a certain width (for example, a width of about Ct ± 0.005%). If it is determined that a blending command has been issued, the process proceeds from step S3 to step S11. In step S11, a blending process (described later) is performed. When it is determined that the substrate processing command has been issued, the process proceeds from step S4 to step S12. In step S12, substrate processing (described later) is performed. When it is determined that the discharge command has been issued, the process proceeds from step S5 to step S13. In step S13, a discharging process (described later) is performed. When another command is issued, the process moves from step S6 to step S14.
In step S14, another process according to the command is performed.

【0021】ステップS11の調合処理では、図4のス
テップS21で目標濃度Ctから検出誤差範囲αを減じ
た値を目標値Csとして設定する。ステップS22で
は、この目標値Csとなるように定量ポンプP1,P2
をオンする。例えば目標濃度Ctが1%にセットされ、
検出誤差範囲が±0.01%である場合には、目標値C
sとして0.99%が設定される。この目標値Csに応
じて、ポンプP1とポンプP2の吐出量がそれぞれ制御
され、希釈液及び薬液が希釈液貯留槽1及び薬液貯留槽
2からそれぞれ基板処理槽3に供給される。なお、基板
処理槽3の容量は予め定められているので、ここでは、
その容量に応じた目標値Csの濃度となるように各ポン
プP1,P2が制御される。この結果、図7に示すよう
な濃度になる。
In the blending process of step S11, a value obtained by subtracting the detection error range α from the target density Ct in step S21 of FIG. 4 is set as the target value Cs. In step S22, the metering pumps P1, P2
Turn on. For example, the target density Ct is set to 1%,
If the detection error range is ± 0.01%, the target value C
0.99% is set as s. The discharge amounts of the pumps P1 and P2 are respectively controlled in accordance with the target value Cs, and the diluent and the chemical are supplied from the diluent storage tank 1 and the chemical storage tank 2 to the substrate processing tank 3, respectively. Here, since the capacity of the substrate processing tank 3 is predetermined, here,
The pumps P1 and P2 are controlled so that the concentration of the target value Cs according to the displacement is obtained. As a result, the density becomes as shown in FIG.

【0022】ステップS23では時間T1の経過を待
つ。この時間T1は、希釈液及び処理液が基板処理槽3
に供給されるのに充分な時間である。ステップS24で
は循環バルブV1を開く。ステップS25では、循環ポ
ンプP3をオンする。この結果、基板処理槽3内の薬液
が循環配管6により循環する。ステップS26では時間
T2の経過を待つ。この時間T2は、循環時間を定める
ためのものである。所定の時間T2が経過するとステッ
プS27に移行する。
In step S23, the process waits until the time T1 has elapsed. During this time T1, the diluting liquid and the processing liquid are
Is enough time to be supplied to In step S24, the circulation valve V1 is opened. In step S25, the circulation pump P3 is turned on. As a result, the chemical in the substrate processing tank 3 is circulated by the circulation pipe 6. In step S26, the process waits for the lapse of time T2. This time T2 is for determining the circulation time. After the elapse of the predetermined time T2, the process proceeds to step S27.

【0023】ステップS27では濃度センサー8の出力
を取り込み、濃度Cmを測定する。ステップS28で
は、検出された濃度Cmが目標濃度Ctの範囲に入って
いるか否かを判断する。目標濃度Ctの範囲に入ってい
る場合にはメインルーチンに戻る。目標濃度Ctからそ
れている場合にはステップS29に移行する。ステップ
S29では、図7に示すように、目標濃度Ctと検出濃
度Cmとの半分の濃度を新たな目標値Csとして設定す
る。ステップS30では、検出濃度Cmが目標濃度Ct
より大きいか否かを判断する。検出濃度Cmが目標濃度
Ctより小さい場合には濃度が薄すぎるので、ステップ
S31に移行し、検出濃度Cmと目標値Csとの差分に
応じて定量ポンプP2をオンさせ、薬液を基板処理槽3
に供給する。また検出濃度Cmが目標濃度Ctより大き
いと判断した場合には濃度が濃すぎるので、ステップS
32に移行し、検出濃度Cmと目標値Csの差分に応じ
て定量ポンプP1をオンさせ、希釈液を基板処理槽3に
供給する。これらの処理が終了するとステップS26に
戻る。そして検出濃度Cmが目標濃度Ctの許容範囲内
に入るまでステップS26以降の動作を繰り返す。
In step S27, the output of the density sensor 8 is fetched and the density Cm is measured. In step S28, it is determined whether or not the detected density Cm falls within the range of the target density Ct. If it is within the range of the target density Ct, the process returns to the main routine. If it deviates from the target density Ct, the process moves to step S29. In step S29, as shown in FIG. 7, a half of the target density Ct and the detected density Cm is set as a new target value Cs. In step S30, the detected density Cm is set to the target density Ct.
Determine if it is greater than. If the detected concentration Cm is smaller than the target concentration Ct, the concentration is too low, so the flow shifts to step S31 to turn on the metering pump P2 in accordance with the difference between the detected concentration Cm and the target value Cs.
To supply. If it is determined that the detected density Cm is higher than the target density Ct, the density is too high, so that step S
The flow then proceeds to 32, where the metering pump P1 is turned on according to the difference between the detected concentration Cm and the target value Cs, and the diluent is supplied to the substrate processing tank 3. When these processes are completed, the process returns to the step S26. The operation from step S26 is repeated until the detected density Cm falls within the allowable range of the target density Ct.

【0024】ステップS12の基板処理では、図5のス
テップS40でバルブV1を開いてバルブV2を閉じ
る。ステップS41では、循環ポンプP3をオンする。
ステップS42では、時間T3の経過を待つ。この時間
T3は、濃度センサー8による検出間隔を定めるための
時間である。ステップS43では濃度センサー8の出力
を取り込み、濃度Cmを測定する。ステップS44で
は、検出濃度Cmが目標濃度Ctの範囲に入っているか
否かを判断する。許容範囲からそれている場合にはステ
ップS45に移行する。ステップS45では、ステップ
S29と同様に、検出濃度Cmと目標濃度Ctとの半量
分の濃度を新たな目標値Csとして設定する。
In the substrate processing in step S12, the valve V1 is opened and the valve V2 is closed in step S40 in FIG. In step S41, the circulation pump P3 is turned on.
In step S42, the process waits for the elapse of time T3. This time T3 is a time for determining a detection interval by the density sensor 8. In step S43, the output of the density sensor 8 is fetched and the density Cm is measured. In step S44, it is determined whether or not the detected density Cm falls within the range of the target density Ct. If not, the process proceeds to step S45. In step S45, similarly to step S29, a half amount of the detected density Cm and the target density Ct is set as a new target value Cs.

【0025】ステップS46では、検出濃度Cmが目標
濃度Ctより大きいか否かを判断する。検出濃度Cmが
目標濃度Ctより大きい場合にはステップS47に移行
する。この場合には濃度が濃すぎるので、ステップS4
7で目標値Csと検出濃度Cmの差分に応じてポンプP
1をオンさせ、希釈液を供給する。また、検出濃度Cm
が目標濃度Ctより小さい場合にはステップS48に移
行する。この場合には濃度が薄すぎるので、ステップS
48で目標濃度Csと検出濃度Cmとの差分に応じてポ
ンプP2をオンさせ、薬液を供給する。またこれらの処
理が終了するとステップS49に移行する。ステップS
49では基板終了指令がなされたか否かを判断する。基
板終了指令がなされるまでステップS42からステップ
S49の動作を繰り返す。基板終了指令がなされるとメ
インルーチンに戻る。
In step S46, it is determined whether the detected density Cm is higher than the target density Ct. If the detected density Cm is higher than the target density Ct, the process proceeds to step S47. In this case, since the density is too high, step S4
In step 7, the pump P is set according to the difference between the target value Cs and the detected concentration Cm.
1 is turned on and the diluent is supplied. Further, the detected concentration Cm
Is smaller than the target density Ct, the process proceeds to step S48. In this case, since the density is too low, step S
At 48, the pump P2 is turned on in accordance with the difference between the target concentration Cs and the detected concentration Cm to supply the chemical. When these processes are completed, the process moves to step S49. Step S
At 49, it is determined whether or not a substrate end command has been issued. The operations from step S42 to step S49 are repeated until a substrate end command is issued. When a substrate end command is issued, the process returns to the main routine.

【0026】ステップS13の搬出処理では、図6のス
テップS51で、バルブV1を閉じてバルブV2を開
く、ステップS52では循環ポンプP3をオンする。ス
テップS53では、時間T4の経過を待つ。この時間T
4は、基板処理槽3から薬液が僅かに残った状態で排出
されるまでに充分な時間である。ステップS54では、
循環ポンプP3をオフする。この結果、僅かに残留した
薬液が自然落下により排出される。ステップS55で
は、バルブV1,V2を共に閉じる。
In the unloading process at step S13, the valve V1 is closed and the valve V2 is opened at step S51 in FIG. 6, and the circulation pump P3 is turned on at step S52. In step S53, the process waits for the lapse of time T4. This time T
Reference numeral 4 denotes a sufficient time for the chemical solution to be discharged from the substrate processing tank 3 with a slight amount remaining. In step S54,
The circulation pump P3 is turned off. As a result, the slightly remaining chemical liquid is discharged by natural fall. In step S55, both valves V1 and V2 are closed.

【0027】ここでは、最初の調合時には、検出誤差範
囲の下限の濃度を狙って調合を行い、調合中又は基板処
理中においては、検出濃度と目標濃度との半量分の濃度
に目標値を設定した薬液または希釈液を補給している。
このため、最初から目標濃度になるように薬液を調合す
る場合に比べて濃度センサーが検出誤差範囲を有してい
ても、濃度が濃くなったり薄くなったりせず目標濃度に
迅速に収束する。 〔他の実施例〕 (a) 目標値を検出濃度と目標濃度との半量に設定す
るのは一例であり、目標濃度と検出濃度との間の値であ
ればどのような濃度に目標値を設定しても良い。 (b) 調合処理時には目標濃度の検出誤差範囲の下限
を狙って調合を行うだけにして、濃度測定やそれに伴う
制御を省いてもよい。この場合には、図4のステップS
26以下の処理を省略してメインルーチンに戻れば良
い。これにより、調合処理が短時間で終了する。 (c) 基板処理時において、常に目標値を検出濃度と
目標濃度との半量に設定するのではなく、検出濃度が目
標濃度の検出誤差範囲から外れている場合には、検出誤
差範囲の境界濃度(例えばCt±α)を新たな目標値に
設定し、検出濃度が検出誤差範囲内に入っている場合に
のみ半量制御を行うようにしても良い。 (d) 調合処理時において、基板処理槽に供給する薬
液の濃度を意図的に薄くまたは濃くすることで、希釈液
供給または薬液供給を省くことができる。
Here, at the time of the first blending, blending is performed aiming at the density of the lower limit of the detection error range, and during blending or during substrate processing, the target value is set to a half amount of the detected density and the target density. Replenished liquid or diluent.
For this reason, even if the concentration sensor has a detection error range as compared with the case where the chemical solution is prepared from the beginning to the target concentration, the concentration does not increase or decrease and quickly converges to the target concentration. [Other Embodiments] (a) Setting the target value to a half of the detected density and the target density is an example, and the target value is set to any density between the target density and the detected density. May be set. (B) At the time of the blending process, the blending may be performed only aiming at the lower limit of the detection error range of the target density, and the density measurement and the accompanying control may be omitted. In this case, step S in FIG.
It is only necessary to skip the processing from step 26 onward and return to the main routine. Thereby, the blending process is completed in a short time. (C) At the time of substrate processing, the target value is not always set to a half of the detected density and the target density. If the detected density is out of the detection error range of the target density, the boundary density of the detection error range is set. (For example, Ct ± α) may be set as a new target value, and the half-amount control may be performed only when the detected density is within the detection error range. (D) During the blending process, the supply of the diluent or the supply of the chemical solution can be omitted by intentionally reducing or increasing the concentration of the chemical solution supplied to the substrate processing tank.

【0028】[0028]

【発明の効果】本発明に係る低濃度調整装置では、濃度
調整を直接目標濃度に対して行うのではなく、目標濃度
と検出濃度との間の目標値に対してなされるので、濃度
検出手段が所定の検出誤差範囲で濃度を検出しても、濃
度が濃くなったり薄くなったりせず迅速に目標濃度に収
束する。
In the low density adjusting apparatus according to the present invention, the density adjustment is performed not on the target density directly but on the target value between the target density and the detected density. However, even if the density is detected within a predetermined detection error range, the density quickly converges to the target density without increasing or decreasing.

【0029】なお、検出濃度と目標濃度との半分の濃度
を目標値に設定する場合には、より効率良く目標濃度に
収束できる。また、濃度調整手段が薬液供給手段と動作
手段とを有する場合には、検出濃度が薄いときに目標値
に対して迅速に濃度が制御され、目標濃度に対しての収
束がより迅速になる。
When a half of the detected density and the target density is set as the target value, the target density can be converged more efficiently. In addition, when the concentration adjusting unit has the chemical solution supply unit and the operating unit, when the detected concentration is low, the concentration is quickly controlled with respect to the target value, and the convergence with respect to the target concentration is quickened.

【0030】また、濃度調整手段が希釈液供給手段と動
作手段とを有する場合には、検出濃度が濃いときに目標
値に対して迅速に濃度が制御され、目標濃度に対しての
収束がより迅速になる。また、循環手段をさらに備え、
濃度検出手段は循環している薬液の濃度を検出する場合
には、薬液が常に循環しているので、薬液濃度をより精
度良く検出できる。
When the concentration adjusting means has a diluting liquid supply means and an operating means, when the detected concentration is high, the concentration is quickly controlled with respect to the target value, and the convergence with respect to the target concentration is improved. Be quick. In addition, a circulation means is further provided,
When the concentration detecting means detects the concentration of the circulating drug solution, the drug solution is constantly circulating, so that the drug solution concentration can be detected with higher accuracy.

【0031】さらに、動作手段が、貯溜槽内で新たな薬
液を調合するとき、目標濃度の検出誤差範囲の下限の濃
度になるように薬液供給手段及び希釈液供給手段を動作
させる場合には、薄めに濃度を設定した状態で濃度調整
を行うので、濃度が濃くなることがなくなり、迅速に所
望の目標濃度に収束する。
Further, when the operating means operates the chemical liquid supply means and the diluent liquid supply means so as to adjust the concentration to the lower limit of the detection error range of the target concentration when dispensing a new chemical liquid in the storage tank, Since the density adjustment is performed in a state where the density is set slightly, the density does not increase, and the density quickly converges to a desired target density.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例を採用した基板処理装置のブ
ロック構成図。
FIG. 1 is a block diagram of a substrate processing apparatus employing one embodiment of the present invention.

【図2】その制御系のブロック構成図。FIG. 2 is a block diagram of the control system.

【図3】制御部の制御動作を示すフローチャート。FIG. 3 is a flowchart showing a control operation of a control unit.

【図4】その調合処理の制御フローチャート。FIG. 4 is a control flowchart of the blending process.

【図5】その基板処理のフローチャート。FIG. 5 is a flowchart of the substrate processing.

【図6】その排出処理の制御フローチャート。FIG. 6 is a control flowchart of the discharging process.

【図7】調合時の濃度の変化を示す模式図。FIG. 7 is a schematic diagram showing a change in density during preparation.

【符号の説明】[Explanation of symbols]

1 希釈液貯溜槽 2 薬液貯溜槽 3 基板処理槽 4 希釈液供給配管 5 薬液供給配管 6 循環配管 8 濃度センサー P1,P2 定量ポンプ P3 循環ポンプ W 基板 DESCRIPTION OF SYMBOLS 1 Diluent storage tank 2 Chemical storage tank 3 Substrate processing tank 4 Diluent supply pipe 5 Chemical supply pipe 6 Circulation pipe 8 Concentration sensor P1, P2 Metering pump P3 Circulation pump W Substrate

Claims (6)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】薬液が低濃度の目標濃度になるように調整
する低濃度調整装置であって、 前記薬液を貯溜するための貯溜槽と、 前記目標濃度に対して、前記貯溜槽に貯溜された前記薬
液の濃度を所定の検出誤差範囲で断続的に検出する濃度
検出手段と、 前記濃度検出手段が前記目標濃度と異なる濃度を検出し
たとき、前記目標濃度と前記検出濃度との間の濃度を新
たな目標値に設定する目標値設定手段と、 前記貯溜槽内の薬液の濃度が前記目標値設定手段で設定
された目標値となるように前記薬液を濃度調整する濃度
調整手段と、を備えた低濃度調整装置。
1. A low-concentration adjusting device for adjusting a chemical solution to a low-concentration target concentration, comprising: a storage tank for storing the chemical solution; and a storage tank for storing the target solution with respect to the target concentration. Concentration detecting means for intermittently detecting the concentration of the chemical solution within a predetermined detection error range, and when the concentration detecting means detects a concentration different from the target concentration, a concentration between the target concentration and the detected concentration Target value setting means for setting a new target value, and concentration adjusting means for adjusting the concentration of the chemical so that the concentration of the chemical in the storage tank becomes the target value set by the target value setting means. Low concentration adjustment device provided.
【請求項2】前記目標値設定手段は、前記検出濃度と前
記目標濃度との間の半分の濃度を前記目標値に設定す
る、請求項1に記載の低濃度調整装置。
2. The low-concentration adjusting device according to claim 1, wherein said target value setting means sets half the density between said detected density and said target density as said target value.
【請求項3】前記濃度調整手段は、前記目標濃度より濃
い濃度の薬液を前記貯溜槽に供給する薬液供給手段と、
前記検出濃度が前記目標濃度より薄いとき、前記目標値
設定手段で設定された前記目標値に応じて前記薬液供給
手段を動作させる動作手段とを有する、請求項1又は2
に記載の低濃度調整装置。
3. A chemical liquid supply means for supplying a chemical liquid having a concentration higher than the target concentration to the storage tank,
3. An operating means for operating the chemical liquid supply means according to the target value set by the target value setting means when the detected concentration is lower than the target concentration.
The low-concentration adjusting device according to 1.
【請求項4】前記濃度調整手段は、前記薬液を希釈する
ための希釈液を前記貯溜槽に供給する希釈液供給手段
と、前記検出濃度が前記目標濃度より濃いとき、前記目
標値設定手段で設定された前記目標値に応じて前記希釈
液供給手段を動作させる動作手段とを有する、請求項1
から3のいずれかに記載の低濃度調整装置。
4. The concentration adjusting means comprising: a diluting liquid supply means for supplying a diluting liquid for diluting the chemical liquid to the storage tank; and a target value setting means when the detected concentration is higher than the target concentration. Operating means for operating said diluting liquid supply means in accordance with said set target value.
4. The low-concentration adjusting device according to any one of items 1 to 3.
【請求項5】前記貯留槽から薬液を排出して前記貯留槽
に戻す循環手段をさらに備え、前記濃度検出手段は循環
している薬液の濃度を検出する、請求項1から4のいず
れかに記載の低濃度調整装置。
5. The method according to claim 1, further comprising circulating means for discharging the chemical from the storage tank and returning the chemical to the storage tank, wherein the concentration detecting means detects the concentration of the circulating chemical. The low-concentration adjusting device according to the above.
【請求項6】前記動作手段は、前記貯溜槽内で新たに薬
液を調合するとき、前記目標濃度に対する検出誤差範囲
の下限の濃度となるように前記薬液供給手段及び前記希
釈液供給手段を動作させる、請求項1から5のいずれか
に記載の低濃度調整装置。
6. The operating means operates the chemical liquid supplying means and the diluting liquid supplying means such that when a new chemical liquid is prepared in the storage tank, the concentration becomes a lower limit of a detection error range with respect to the target concentration. The low-concentration adjusting device according to any one of claims 1 to 5, wherein
JP6168303A 1994-07-20 1994-07-20 Low concentration adjustment device Expired - Fee Related JP3040313B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6168303A JP3040313B2 (en) 1994-07-20 1994-07-20 Low concentration adjustment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6168303A JP3040313B2 (en) 1994-07-20 1994-07-20 Low concentration adjustment device

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US10832924B2 (en) 2016-09-23 2020-11-10 SCREEN Holdings Co., Ltd. Substrate treating device and substrate treating method
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