JP3049761B2 - Cleaning equipment - Google Patents
Cleaning equipmentInfo
- Publication number
- JP3049761B2 JP3049761B2 JP2318234A JP31823490A JP3049761B2 JP 3049761 B2 JP3049761 B2 JP 3049761B2 JP 2318234 A JP2318234 A JP 2318234A JP 31823490 A JP31823490 A JP 31823490A JP 3049761 B2 JP3049761 B2 JP 3049761B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- carrier gas
- turbine
- radial
- cleaned
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は、半導体、精密機械部品など、表面に残留し
た微小な物質が欠陥を引き起こすような被洗浄体に好適
に使用される洗浄装置に関するものである。Description: FIELD OF THE INVENTION The present invention relates to a cleaning apparatus suitably used for an object to be cleaned, such as a semiconductor or a precision machine part, in which a minute substance remaining on the surface causes a defect. Things.
［従来の技術］ ウェハ、プリント基板、精密歯車などは、表面に付着
したゴミ、半田、バリなどの微小な物質が欠陥の原因と
なることが少なくない。このため、従来からそれらの被
洗浄体をフロン系の溶剤中に侵漬し、ゴミ等を除去する
ことが行われてきた。しかし、今日的課題として地球環
境保全の問題がにわかに持ち上がっており、世界は近い
将来に向けてフロン系物質の全面撤廃に向かう機運にあ
り、フロン系の溶剤を使用することは今後急速に困難に
なってくるものと思われる。そこで、これに代わる技術
として、水、アルコ−ル等の環境破壊を生じない洗浄剤
を使用することが検討され始めている。[Related Art] In wafers, printed circuit boards, precision gears, and the like, minute substances such as dust, solder, and burrs attached to the surface often cause defects. For this reason, conventionally, the objects to be cleaned have been immersed in a CFC-based solvent to remove dust and the like. However, the issue of global environmental protection has emerged as a challenge today, and the world is on the road to the complete elimination of CFC-based substances in the near future, and the use of CFC-based solvents will quickly become difficult in the future. It seems to be coming. Therefore, as an alternative technique, the use of a cleaning agent that does not cause environmental destruction, such as water and alcohol, is being studied.
［発明が解決しようとする課題］ ところで、水、アルコ−ル等の洗浄剤はフロン系の洗
浄剤に比べて浸透力、溶解度が小さい。このため、単に
侵漬するだけでは十分な洗浄ができず、これらの洗浄剤
を微粒子にして被洗浄体に吹きつける等の工夫が必要に
なる。しかし、現在の技術で考えられる手法、すなわ
ち、溶剤をノズルで微粒子状にしこれを冷気中に噴出し
て凍らせる程度の手法では、微粒子を大量に生成するこ
とができず、直径の大きなウエハや大量の被洗浄体に対
応することが困難であった。[Problems to be Solved by the Invention] By the way, cleaning agents such as water and alcohol have lower penetrating power and solubility than fluorocarbon-based cleaning agents. For this reason, sufficient washing cannot be performed simply by immersion, and it is necessary to devise such a method that these cleaning agents are made into fine particles and sprayed on the object to be cleaned. However, with the method considered in the current technology, that is, a method in which the solvent is made into fine particles with a nozzle and jetted into cold air and frozen, a large amount of fine particles cannot be generated, and a wafer having a large diameter or It was difficult to handle a large number of objects to be cleaned.
本発明は、このような課題に着目してなされたもので
あって、環境破壊と無関係な水やアルコ−ル等の洗浄剤
を使っても十分な洗浄力を発揮しかつ大量生産にも適し
た洗浄装置を提供することを目的としている。SUMMARY OF THE INVENTION The present invention has been made in view of such a problem, and has a sufficient detergency even when using a cleaning agent such as water or alcohol which is unrelated to environmental destruction, and is suitable for mass production. The purpose of the present invention is to provide a cleaning apparatus.
［課題を解決するための手段］ 本発明は、かかる目的を達成するために、次のような
手段を講じたものである。[Means for Solving the Problems] The present invention employs the following means to achieve the above object.
すなわち、本発明の洗浄装置は、被洗浄体を収容する
洗浄室と、洗浄剤を含ませたキャリアガスを断熱膨張さ
せ、これによる噴流を前記被洗浄体に吹き付ける膨張タ
ービンと、該膨張タービン及び洗浄剤を収容する蒸発室
とからなる。In other words, the cleaning apparatus of the present invention includes a cleaning chamber for storing a body to be cleaned, an expansion turbine that adiabatically expands a carrier gas containing a cleaning agent, and blows a jet by the carrier gas to the body to be cleaned, the expansion turbine, And an evaporation chamber for accommodating a cleaning agent.
［作用］ このような構成のものであると、膨脹タ−ビンで断熱
膨脹した際にキャリヤガスの温度が低下し、その中に含
有する洗浄剤は蒸気からの凝結、凝固が起こって、非常
に微細な粒子状の液体または固体となる。そして、この
洗浄剤は膨脹したキャリヤガスとともにタ−ビン機構の
特徴である軸方向への噴流となって高速で噴出する。こ
のため、その噴流を被洗浄体に吹きつければ、表面に付
着している微小な物質を凝結、凝固した洗浄剤の粒子に
よって擦り取り、或いは溶解させて、その上で高速のキ
ャリヤガス流によって吹き飛ばすことができる。[Operation] With such a configuration, the temperature of the carrier gas decreases when the carrier gas is adiabatically expanded in the expansion turbine, and the cleaning agent contained therein condenses and solidifies from the steam, causing an extremely high temperature. It becomes a finely particulate liquid or solid. The cleaning agent is jetted at a high speed together with the expanded carrier gas as a jet in the axial direction which is a characteristic of the turbine mechanism. For this reason, when the jet is sprayed on the object to be cleaned, minute substances adhering to the surface are condensed, scraped or dissolved by the particles of the coagulated cleaning agent, and then the carrier gas flow is performed at a high speed. Can be blown away.
［実施例］ 以下、本発明の一実施例を図面を参照して説明する。Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
この洗浄装置は、ラジアルタ−ビン２の軸方向に洗浄
室１を設け、ラジアルタ−ビン２から噴出するキャリヤ
ガス（ここではN2ガス）を洗浄室１内に配置した被洗浄
体ｗに吹きつけるようにしている。ラジアルタ−ビン２
は、シャフト６を介してラジアルコンプレッサ３に単軸
結合させてあり、シャフト６は高周波モ−タ７によって
駆動されるようになっている。ラジアルコンプレッサ３
のスクロ−ル3bとラジアルタ−ビン２のスクロ−ル2bは
後述する蒸発器４によって接続され、ラジアルコンプレ
ッサ３からディフュ−ザ3aを介してスクロ−ル3bに排出
されたガスをその蒸発器４内を通じてスクロ−ル2bに案
内し、ノズル2aを介してラジアルタ−ビン２に導入する
ことができるようになっている。また、前記シャフト６
の高速回転を支持するために静圧式のラジアルベアリン
グ8a、8bおよびスラストベアリング9a、9bが設けてあ
り、これらのベアリング8a、8b、9a、9bを機能させるた
めの高圧ガス（ここではキャリヤガスと同様のN2ガス）
を流路10、圧力レギュレ−タ11、ボンベＧおよび抽気昇
圧用ポンプ12を通じて供給できるようになっている。In this cleaning apparatus, a cleaning chamber 1 is provided in the axial direction of a radial turbine 2, and a carrier gas (here, N 2 gas) spouted from the radial turbine 2 is blown onto an object to be cleaned w arranged in the cleaning chamber 1. Like that. Radial Tabin 2
Is monoaxially connected to the radial compressor 3 via a shaft 6, and the shaft 6 is driven by a high-frequency motor 7. Radial compressor 3
The scroll 3b of the radial turbine 2 and the scroll 2b of the radial turbine 2 are connected by an evaporator 4, which will be described later, and the gas discharged from the radial compressor 3 to the scroll 3b via the diffuser 3a is used for the evaporator 4. It can be guided to the scroll 2b through the inside and can be introduced into the radial turbine 2 through the nozzle 2a. The shaft 6
In order to support the high-speed rotation of the bearings, there are provided radial bearings 8a and 8b of static pressure type and thrust bearings 9a and 9b, and a high-pressure gas (here, a carrier gas and a carrier gas) for operating these bearings 8a, 8b, 9a and 9b. similar N 2 gas)
Can be supplied through a flow path 10, a pressure regulator 11, a cylinder G and a bleeding pressure increasing pump 12.
一方、前記蒸発器４にはノズル５が挿入してあり、フ
ィルタ17を介して移送されてくる洗浄剤たる洗浄水Ｓを
ガスの流れに沿ってノズル５より蒸発器４内に噴霧させ
得るようになっている。洗浄水Ｓは蒸発器４の底に常時
貯溜された状態にしてあり、この蒸発器４からポンプ15
で汲み出して、前記フィルタ17に移送するようになって
いる。On the other hand, a nozzle 5 is inserted into the evaporator 4 so that the cleaning water S, which is a cleaning agent, transferred through the filter 17 can be sprayed into the evaporator 4 from the nozzle 5 along the gas flow. It has become. The washing water S is always stored at the bottom of the evaporator 4.
And transported to the filter 17.
さらに、前記洗浄室１の出口と前記ラジアルコンプレ
ッサ３の入口とは流路Ｌを介して接続してあり、洗浄室
１内に噴出されたキャリヤガスを再利用できるようにな
っている。この流路Ｌには、キャリヤガスに含まれる洗
浄水Ｓの液体粒子とゴミ等の粒子を分離除去するセパレ
−タ14が取り付けてある。16はセパレ−タ14の底に溜ま
った洗浄水Ｓを汲み上げて前記フィルタ17に移送するポ
ンプであり、18は高周波モ−タ用電源である。Further, the outlet of the cleaning chamber 1 and the inlet of the radial compressor 3 are connected via a flow path L so that the carrier gas jetted into the cleaning chamber 1 can be reused. The channel L is provided with a separator 14 for separating and removing liquid particles of cleaning water S contained in the carrier gas and particles such as dust. Reference numeral 16 denotes a pump for pumping up the washing water S collected at the bottom of the separator 14 and transferring the same to the filter 17, and reference numeral 18 denotes a power supply for a high-frequency motor.
次に、本実施例の作用を説明する。洗浄室１に被洗浄
体ｗ（ウェハ、シリコン基板、歯車など）が装着される
と、キャリヤガスがラジアルコンプレッサ３に入り、こ
こで断熱圧縮されることによって高温高圧となる。この
ガスは蒸発器４内を通ってラジアルタ−ビン２に向かう
が、このとき蒸発器４内にノズル５から洗浄水Ｓが噴霧
され、ここで洗浄水Ｓは気化してキャリヤガスの湿度を
上昇させる。その後、キャリヤガス冷却用のク−ラ13に
よってキャリヤガスに必要以上に含まれる水分を除去
し、キャリヤガスの必要以上の温度上昇を防ぐととも
に、膨張時に効率良く洗浄剤（洗浄水Ｓ）の粒子ができ
るようにほぼ飽和状態となるまで冷却する効果を有す
る。その後キャリヤガスはラジアルタ−ビン２に供給さ
れる。ラジアルタ−ビン２では断熱膨脹が行われ、キャ
リヤガスの温度が低下することにより洗浄水Ｓは蒸気か
らの凝結、凝固が起こり、非常に微細な粒子状の液体又
は固体となる。そして、膨脹したキャリヤガスとともに
高速でラジアルタ−ビン２の軸方向に噴出し、被洗浄体
ｗに吹きつけられる。このとき、被洗浄体ｗの表面に付
着している微細なゴミ等は凝結、凝固した洗浄水Ｓの粒
子によって擦り取られたり、溶かされたりした上で、高
速のキャリヤガス流によって吹き飛ばされる。洗浄室１
を出たキャリヤガスは流路Ｌを通って再びラジアルコン
プレッサ３へ向かうが、粒子状の洗浄水Ｓはゴミ等と共
にセパレ−タ14に捕獲される。セパレ−タ14に溜まった
洗浄水Ｓは蒸発器４内の洗浄水Ｓとともにフィルタ17を
介して再びノズル５に供給される。Next, the operation of the present embodiment will be described. When an object to be cleaned w (a wafer, a silicon substrate, a gear, or the like) is mounted in the cleaning chamber 1, the carrier gas enters the radial compressor 3, where it is adiabatically compressed to a high temperature and high pressure. This gas passes through the inside of the evaporator 4 to the radial turbine 2. At this time, the washing water S is sprayed from the nozzle 5 into the evaporator 4, and the washing water S evaporates to increase the humidity of the carrier gas. Let it. Thereafter, the carrier gas cooling cooler 13 removes the water contained in the carrier gas more than necessary to prevent the temperature of the carrier gas from rising more than necessary, and efficiently removes particles of the cleaning agent (cleaning water S) during expansion. And has the effect of cooling until it is almost saturated so that Thereafter, the carrier gas is supplied to the radial turbine 2. In the radial turbine 2, adiabatic expansion is performed, and as the temperature of the carrier gas decreases, the washing water S condenses and solidifies from steam, and becomes very fine liquid or solid particles. Then, the carrier gas is spouted at high speed in the axial direction of the radial turbine 2 together with the inflated carrier gas, and is sprayed on the cleaning object w. At this time, fine dust and the like adhering to the surface of the object to be cleaned w are scraped off or dissolved by the particles of the coagulated and coagulated cleaning water S, and then blown off by the high-speed carrier gas flow. Cleaning room 1
The carrier gas having passed through the flow path L flows again to the radial compressor 3 through the flow path L, but the particulate washing water S is captured by the separator 14 together with dust and the like. The washing water S accumulated in the separator 14 is supplied to the nozzle 5 again through the filter 17 together with the washing water S in the evaporator 4.
以上のような構成のものであると、膨脹タ−ビン２に
おける凝結、凝固作用によって洗浄水Ｓを非常に微細な
粒子状の液体または固体にすることができ、その上で、
その洗浄水Ｓの粒子を被洗浄体ｗに高速で吹きつけるこ
とができる。このため、従来の技術を用いて洗浄装置を
構成する場合に比べて格段に大量の洗浄剤の生成能力を
有することができる。特に、噴流は高速の旋回流とする
ことができるため円形のウェハ等には好適となる。しか
も、この構成によると小型のタ−ビンコンプレッサ１機
を用いるだけでよく、外形をコンパクトにできる上に、
ラジアルタ−ビン２の発生動力をシャフト６を介してラ
ジアルコンプレッサ３に入力し圧縮動力として利用する
ことで高周波モ−タ７に圧縮動力の不足分を補うだけの
エネルギを与えるだけで済ませることができ、エネルギ
効率に優れたシステムとすることができる。さらに、タ
−ビン２、コンプレッサ３、シャフト６は完全非接触と
なるため、ここよりゴミ等が発生することも防止でき
る。With the above-described structure, the washing water S can be converted into very fine liquid or solid by the coagulation and coagulation action in the expansion turbine 2, and then,
The particles of the cleaning water S can be sprayed on the cleaning target w at a high speed. For this reason, compared with the case where the cleaning device is configured using the conventional technology, it is possible to have a much larger amount of cleaning agent generation capability. In particular, since the jet can be a high-speed swirling flow, it is suitable for a circular wafer or the like. In addition, according to this configuration, it is sufficient to use only one small turbine compressor.
By inputting the generated power of the radial turbine 2 to the radial compressor 3 via the shaft 6 and using it as compression power, it is only necessary to provide the high-frequency motor 7 with energy sufficient to compensate for the shortage of compression power. Thus, a system with excellent energy efficiency can be obtained. Further, since the turbine 2, the compressor 3, and the shaft 6 are completely out of contact with each other, it is possible to prevent the generation of dust and the like.
なお、洗浄剤は水に限らずアルコ−ル等も利用可能で
あり、キャリヤガスはN2ガスに限らず他の不活性ガス等
を用いることもできる。また、ラジアルコンプレッサの
前段に電動コンプレッサを配置して圧縮比を高め、高周
波モ−タを不要にすることもできる。さらに、静圧ベア
リングの代わりに磁気軸受や動圧ベアリングを用いるこ
とも有益となる。その他、各部の具体的構成は図示例に
限定されず、本発明の趣旨を逸脱しない範囲で種々変形
が可能である。Incidentally, detergent alcohol not limited to water - Le etc. are also available, the carrier gas may also be used another inert gas or the like is not limited to the N 2 gas. In addition, an electric compressor can be arranged in front of the radial compressor to increase the compression ratio and eliminate the need for a high-frequency motor. Furthermore, it is also beneficial to use a magnetic bearing or a dynamic bearing in place of the hydrostatic bearing. In addition, the specific configuration of each unit is not limited to the illustrated example, and various modifications can be made without departing from the spirit of the present invention.
［発明の効果］ 本発明の洗浄装置は、以上のような構成であるから、
環境破壊とは無関係な水やアルコ−ル等の洗浄剤を用い
ても、膨脹タ−ビンの噴流中に生じる洗浄剤の微細な粒
子を大量に生成できるため被洗浄体に対する優れた洗浄
力が発揮される効果が得られる。[Effect of the Invention] Since the cleaning device of the present invention has the above configuration,
Even if a cleaning agent such as water or alcohol which is not related to environmental destruction is used, a large amount of fine particles of the cleaning agent generated in the jet of the expansion turbine can be generated in a large amount, so that excellent cleaning power for the object to be cleaned can be obtained. The effect to be exhibited is obtained.
図面は本発明の一実施例を示す模式図である。 Ｓ……洗浄剤（洗浄水） ｗ……被洗浄体 ２……膨脹タ−ビン（ラジアルタ−ビン） The drawings are schematic diagrams showing one embodiment of the present invention. S: cleaning agent (washing water) w: object to be cleaned 2: inflatable turbine (radial turbine)
Claims (1)
ませたキャリアガスを断熱膨張させ、これによる噴流を
前記被洗浄体に吹き付ける膨張タービンと、該膨張ター
ビン及び洗浄剤を収容する蒸発室とからなる洗浄装置。1. A cleaning chamber for accommodating a cleaning object, an expansion turbine for adiabatically expanding a carrier gas containing a cleaning agent, and blowing a jet by the carrier gas onto the cleaning object, and accommodating the expansion turbine and the cleaning agent. Cleaning device consisting of an evaporating chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2318234A JP3049761B2 (en) | 1990-11-21 | 1990-11-21 | Cleaning equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2318234A JP3049761B2 (en) | 1990-11-21 | 1990-11-21 | Cleaning equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04187275A JPH04187275A (en) | 1992-07-03 |
| JP3049761B2 true JP3049761B2 (en) | 2000-06-05 |
Family
ID=18096925
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2318234A Expired - Fee Related JP3049761B2 (en) | 1990-11-21 | 1990-11-21 | Cleaning equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3049761B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3415670B2 (en) * | 1994-03-03 | 2003-06-09 | 三菱電機株式会社 | Wafer cleaning equipment |
| KR101047862B1 (en) * | 2009-03-13 | 2011-07-08 | 주식회사 에이앤디코퍼레이션 | Substrate treatment apparatus using high pressure processor and gas recycling method of high pressure processor |
-
1990
- 1990-11-21 JP JP2318234A patent/JP3049761B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04187275A (en) | 1992-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5931721A (en) | Aerosol surface processing | |
| US5062898A (en) | Surface cleaning using a cryogenic aerosol | |
| US20070000521A1 (en) | System and method for mid-pressure dense phase gas and ultrasonic cleaning | |
| JPH02130921A (en) | Cleaning equipment for solid surface | |
| KR20040026639A (en) | Processing of semiconductor components with dense processing fluids and ultrasonic energy | |
| JPH1024270A (en) | Cleaning method using supercritical fluid as cleaning fluid | |
| JP2001137797A (en) | Dry cleaning apparatus and method using cluster | |
| JP3049761B2 (en) | Cleaning equipment | |
| US20090165819A1 (en) | Method for treating fine structure, system for treating fine structure, and method for producing electronic device | |
| WO2020174874A1 (en) | Substrate processing device, semiconductor manufacturing device, and substrate processing method | |
| JPH07201795A (en) | Cleaning method | |
| CN115283369B (en) | A carbon dioxide state control system and method | |
| JP2004008995A (en) | How to clean parts | |
| JP4844912B2 (en) | Photoresist removal method and removal apparatus | |
| JP2832190B2 (en) | Cleaning method using supercritical and subcritical fluids | |
| KR100734342B1 (en) | Processing of substrates with dense fluids comprising acetylenic diols and/or alcohols | |
| US5357718A (en) | Wafer rinsing apparatus | |
| JP2000308862A (en) | Cleaning method and device using supercritical or subcritical fluid | |
| JPH06294578A (en) | Component drying method, and drier | |
| KR102168153B1 (en) | Liquefaction recovering apparatus for dry liquid and semiconductor drying system using thereof | |
| KR20220047010A (en) | Integrated circuit sensor cleaning system | |
| JP4167720B2 (en) | Solvent washer | |
| JP3323584B2 (en) | Method and apparatus for drying object to be cleaned | |
| JPH04122024A (en) | Vapor cleaning method and its device | |
| JP2001255065A (en) | Method and device for drying component parts |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080331 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090331 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100331 Year of fee payment: 10 |
|
| LAPS | Cancellation because of no payment of annual fees |