JP3051638B2 - Method for producing glass containing Sm ions - Google Patents
Method for producing glass containing Sm ionsInfo
- Publication number
- JP3051638B2 JP3051638B2 JP6132199A JP13219994A JP3051638B2 JP 3051638 B2 JP3051638 B2 JP 3051638B2 JP 6132199 A JP6132199 A JP 6132199A JP 13219994 A JP13219994 A JP 13219994A JP 3051638 B2 JP3051638 B2 JP 3051638B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- ions
- ion
- gel
- precursor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000002500 ions Chemical class 0.000 title claims description 69
- 239000011521 glass Substances 0.000 title claims description 56
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000005354 aluminosilicate glass Substances 0.000 claims description 27
- 239000002243 precursor Substances 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 19
- 239000007789 gas Substances 0.000 claims description 16
- 230000009467 reduction Effects 0.000 claims description 6
- 238000003980 solgel method Methods 0.000 claims description 5
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 239000011261 inert gas Substances 0.000 claims description 2
- -1 silicon alkoxides Chemical class 0.000 description 22
- 229910052782 aluminium Inorganic materials 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 12
- 239000010703 silicon Substances 0.000 description 12
- 230000007062 hydrolysis Effects 0.000 description 11
- 238000006460 hydrolysis reaction Methods 0.000 description 11
- 239000011159 matrix material Substances 0.000 description 10
- 150000004703 alkoxides Chemical class 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- 230000007704 transition Effects 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 239000005385 borate glass Substances 0.000 description 7
- 238000001228 spectrum Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 239000005383 fluoride glass Substances 0.000 description 6
- 238000006722 reduction reaction Methods 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- 238000000295 emission spectrum Methods 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 239000005368 silicate glass Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 150000003317 samarium compounds Chemical class 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 229910000323 aluminium silicate Inorganic materials 0.000 description 3
- 125000004432 carbon atom Chemical group C* 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 3
- 230000008025 crystallization Effects 0.000 description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical class O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- MYWQGROTKMBNKN-UHFFFAOYSA-N tributoxyalumane Chemical compound [Al+3].CCCC[O-].CCCC[O-].CCCC[O-] MYWQGROTKMBNKN-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical group C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000013522 chelant Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000695 excitation spectrum Methods 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000011259 mixed solution Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229960005235 piperonyl butoxide Drugs 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920000306 polymethylpentene Polymers 0.000 description 2
- 239000011116 polymethylpentene Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- BHXBZLPMVFUQBQ-UHFFFAOYSA-K samarium(iii) chloride Chemical compound Cl[Sm](Cl)Cl BHXBZLPMVFUQBQ-UHFFFAOYSA-K 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- 241000841159 Anaka Species 0.000 description 1
- 229910016036 BaF 2 Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- JPUHCPXFQIXLMW-UHFFFAOYSA-N aluminium triethoxide Chemical compound CCO[Al](OCC)OCC JPUHCPXFQIXLMW-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- LSHXECWFSXBAMI-UHFFFAOYSA-N disilanyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound C(C1CO1)OCCC[SiH2][SiH2][SiH3] LSHXECWFSXBAMI-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 1
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000000156 glass melt Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004020 luminiscence type Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- NBTOZLQBSIZIKS-UHFFFAOYSA-N methoxide Chemical compound [O-]C NBTOZLQBSIZIKS-UHFFFAOYSA-N 0.000 description 1
- ARYZCSRUUPFYMY-UHFFFAOYSA-N methoxysilane Chemical compound CO[SiH3] ARYZCSRUUPFYMY-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- DABIZUXUJGHLMW-UHFFFAOYSA-H oxalate;samarium(3+) Chemical compound [Sm+3].[Sm+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O DABIZUXUJGHLMW-UHFFFAOYSA-H 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- MOWNZPNSYMGTMD-UHFFFAOYSA-N oxidoboron Chemical class O=[B] MOWNZPNSYMGTMD-UHFFFAOYSA-N 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical class [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical class [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- JPDBEEUPLFWHAJ-UHFFFAOYSA-K samarium(3+);triacetate Chemical compound [Sm+3].CC([O-])=O.CC([O-])=O.CC([O-])=O JPDBEEUPLFWHAJ-UHFFFAOYSA-K 0.000 description 1
- YZDZYSPAJSPJQJ-UHFFFAOYSA-N samarium(3+);trinitrate Chemical compound [Sm+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O YZDZYSPAJSPJQJ-UHFFFAOYSA-N 0.000 description 1
- LVSITDBROURTQX-UHFFFAOYSA-H samarium(3+);trisulfate Chemical compound [Sm+3].[Sm+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O LVSITDBROURTQX-UHFFFAOYSA-H 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- 150000004685 tetrahydrates Chemical class 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- UAEJRRZPRZCUBE-UHFFFAOYSA-N trimethoxyalumane Chemical compound [Al+3].[O-]C.[O-]C.[O-]C UAEJRRZPRZCUBE-UHFFFAOYSA-N 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C11/00—Multi-cellular glass ; Porous or hollow glass or glass particles
- C03C11/007—Foam glass, e.g. obtained by incorporating a blowing agent and heating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/30—Doped silica-based glasses containing metals
- C03C2201/34—Doped silica-based glasses containing metals containing rare earth metals
- C03C2201/3441—Samarium
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はSm2+イオン含有ガラス
の製造方法に関する。本発明の方法により得られたSm
2+イオン含有ガラスは、ホールバーニングやレーザー
等、光情報分野において用いられるガラス材料として使
用される。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing Sm 2+ ion-containing glass. Sm obtained by the method of the present invention
2+ ion-containing glass is used as a glass material used in the optical information field such as hole burning and laser.
【0002】[0002]
【従来の技術】Nd、Erなどの希土類元素を含有した
ガラスは、レーザーなどの材料として用いられる。希土
類元素の原子価は、周囲のマトリックスの影響をほとん
ど受けず、多くは3価の状態で存在している。2. Description of the Related Art Glass containing rare earth elements such as Nd and Er is used as a material for lasers and the like. The valence of the rare earth element is hardly affected by the surrounding matrix, and most of them exist in a trivalent state.
【0003】最近2価のイオンであるSm2+イオン等を
含有したハロゲン化物結晶において、永続的な光化学ホ
ールバーニング(Photochemical Hole Burning,以
下、PHBという)現象が見いだされ、大容量記録媒体
として、その開発が注目されている。Recently, a permanent photochemical hole burning (hereinafter, referred to as PHB) phenomenon has been found in a halide crystal containing divalent ions such as Sm 2+ ions. Its development is drawing attention.
【0004】このようなPHB現象を有するガラスが得
られれば、ガラスの持つ透明性、成形性、量産性等の優
れた特性を活かして各種の応用が可能となる。[0004] If a glass having such a PHB phenomenon is obtained, various applications can be made by utilizing the excellent properties of the glass, such as transparency, moldability, and mass productivity.
【0005】ガラスは通常原料を熔融後、冷却固化して
製造されているが、ガラス融液内での希土類元素の原子
価の状態は、マトリックスの影響をほとんど受けず、一
般にガラス内では3価の状態で存在する。[0005] Glass is usually produced by melting a raw material and then solidifying it by cooling. However, the valence state of the rare earth element in the glass melt is hardly affected by the matrix, and generally, trivalent in glass. Exists in the state of.
【0006】しかしSm2+イオンはSrF2 、BaF2
などの一部のフッ化物中で存在することが知られてお
り、フッ化物ガラスをマトリックスとしたSm2+イオン
含有ガラスが得られている。そして1993年5月発行
の「機能材料」第13巻、第5号の12〜18頁には、
Sm2+イオン含有フッ化物ガラスがPHB現象を示すこ
とが記載されている。However, Sm 2+ ions are SrF 2 , BaF 2
It is known that it exists in some fluorides such as Sm 2+ ion-containing glass using fluoride glass as a matrix. And in "Functional Materials", Volume 13, No. 5 published in May 1993, pages 12-18,
It is described that Sm 2+ ion-containing fluoride glass exhibits PHB phenomenon.
【0007】また、限られたホウ酸塩ガラスにおいても
Sm2+イオンを含有するものの作製例が報告されてい
る。[0007] Further, there has been reported an example of producing a limited borate glass containing Sm 2+ ions.
【0008】このようなSm2+イオン含有フッ化物ガラ
スやSm2+イオン含有ホウ酸塩ガラスを作製する場合、
製造条件の調整が重要であり、特に強い還元雰囲気内で
の熔融が不可欠とされている。When producing such Sm 2+ ion-containing fluoride glass or Sm 2+ ion-containing borate glass,
Adjustment of manufacturing conditions is important, and melting in a particularly strong reducing atmosphere is indispensable.
【0009】上記2種のガラスのうち、ホウ酸塩ガラス
の場合、酸化物であるためにSm2+イオンが酸化され易
く、その製造条件の選定が容易でない。[0009] Among the above two types of glasses, in the case of borate glass, since it is an oxide, Sm 2+ ions are easily oxidized, and it is not easy to select the manufacturing conditions.
【0010】また、Sm2+イオンのPHB現象の発現
は、3f6 の 7Fi → 5Dj 遷移(680〜750nm
の波長領域)の光吸収および発光を用いてなされるが、
Sm2+イオンの3f5 4d準位がそれ程、大きくないた
めにf−d遷移も見られることがあり、特にフッ化物や
ホウ酸塩ガラスをマトリックスにしたものでは、このf
−d遷移が可視光域にあるために、f−f遷移の効率を
下げるので好ましくない。さらに、この様なガラスは耐
候性(化学的耐久性)が劣り、実用的なガラスとしては
問題点が多い。[0010] Expression of PHB phenomenon of Sm 2+ ions, 7 F i → 5 D j transition 3f 6 (680~750nm
Is performed using light absorption and emission in the wavelength region of
3f 5 4d level of sm 2+ ions less, may be seen also f-d transition in order not large, in particular fluorides and borate glasses obtained by the matrix, the f
Since the -d transition is in the visible light range, the efficiency of the ff transition is lowered, which is not preferable. Further, such glass has poor weather resistance (chemical durability), and has many problems as a practical glass.
【0011】耐候性(化学的耐久性)の優れたガラスを
得るためには、フッ化物やホウ酸塩ガラスではなく、S
iO2 を主成分としたケイ酸塩ガラスであることが望ま
しい。In order to obtain a glass having excellent weather resistance (chemical durability), instead of fluoride or borate glass, S
Desirably, it is a silicate glass containing iO 2 as a main component.
【0012】特開平2−145453号公報には、Sm
2+含有石英(SiO2 )ガラスがPHB現象を示すこと
が記載されている。JP-A-2-145453 discloses that Sm
It is described that 2 + -containing quartz (SiO 2 ) glass exhibits PHB phenomenon.
【0013】[0013]
【発明が解決しようとする課題】しかしながらSm2+イ
オンは石英マトリックスガラス中において不安定であ
り、Sm2+イオン含有石英ガラスではPHB現象の発現
が弱く、またPHB現象の発現の再現性がないという欠
点があった。However, Sm 2+ ions are unstable in a quartz matrix glass, and the Sm 2+ ion-containing quartz glass has a weak PHB phenomenon and no reproducibility of the PHB phenomenon. There was a disadvantage.
【0014】従って本発明の目的は、上記特開平2−1
45453号公報のSm2+イオン含有石英ガラスの欠点
を解決し、耐候性(化学的耐久性)に優れ、かつf−f
遷移の効率の向上による、強いPHB現象を再現性よく
発現し得るSm2+イオン含有ケイ酸塩ガラスを製造する
方法を提供することにある。Accordingly, the object of the present invention is to provide
No. 45453, which solves the shortcomings of the Sm 2+ ion-containing quartz glass, has excellent weather resistance (chemical durability), and has an ff
It is an object of the present invention to provide a method for producing a Sm 2+ ion-containing silicate glass capable of expressing a strong PHB phenomenon with good reproducibility by improving transition efficiency.
【0015】[0015]
【課題を解決するための手段】上記目的を達成するため
本発明者らは鋭意研究した結果、Sm3+イオンを含有さ
せたアルミノシリケートガラス前駆体を還元性雰囲気中
で熱処理することにより、ガラス前駆体をガラス化し、
かつSm3+イオンをSm2+イオンに還元して得たSm2+
イオン含有アルミノシリケートガラスが、(i) ケイ酸塩
ガラスの中でも特に耐候性(化学的耐久性)に優れてい
ること、および(ii)Sm2+イオンの安定性に優れ、f−
f遷移の効率の向上による、強いPHB現象を再現性よ
く発現し得ることを見い出した。Means for Solving the Problems In order to achieve the above object, the present inventors have conducted intensive studies. As a result, a heat treatment of an aluminosilicate glass precursor containing Sm 3+ ions in a reducing atmosphere is carried out. Vitrify the precursor,
Sm 2+ and obtained by reduction of the Sm 3+ ion in Sm 2+ ion
The ion-containing aluminosilicate glass is (i) particularly excellent in weather resistance (chemical durability) among silicate glasses, (ii) excellent in Sm 2+ ion stability, and f−
It has been found that a strong PHB phenomenon can be expressed with good reproducibility by improving the efficiency of f transition.
【0016】従って本発明は、Sm3+イオン含有アルミ
ノシリケートガラス前駆体を還元性雰囲気中で熱処理す
ることにより、ガラス前駆体をガラス化するとともに、
Sm3+イオンをSm2+イオンに還元してSm2+イオン含
有アルミノシリケートガラスを得ることを特徴とするS
m2+イオン含有ガラスの製造方法を要旨とする。Accordingly, the present invention provides a method of vitrifying a glass precursor by heat-treating an Sm 3+ ion-containing aluminosilicate glass precursor in a reducing atmosphere.
S the Sm 3+ ions are reduced to Sm 2+ ions, characterized in that to obtain a Sm 2+ ion-containing aluminosilicate glass
The gist is a method for producing a glass containing m 2+ ions.
【0017】以下本発明を詳説する。本発明において
は、マトリックスガラスの原料としてアルミノシリケー
トガラス前駆体を用いる。ここにアルミノシリケートガ
ラス前駆体とは、熱処理によりアルミノシリケートガラ
スとなる前の物質を意味する。このアルミノシリケート
ガラス前駆体は、これに限定されるものではないが、ケ
イ素のアルコキシドとアルミニウムのアルコキシドを用
いたゾルゲル法により製造されたゲル固化体が好まし
い。Hereinafter, the present invention will be described in detail. In the present invention, an aluminosilicate glass precursor is used as a raw material of the matrix glass. Here, the aluminosilicate glass precursor means a substance before it becomes an aluminosilicate glass by heat treatment. The aluminosilicate glass precursor is not limited to this, but is preferably a solidified gel produced by a sol-gel method using an alkoxide of silicon and an alkoxide of aluminum.
【0018】ケイ素のアルコキシドとしては、テトラメ
トキシシラン、テトラエトキシシラン、テトラプロポキ
シシラン、テトラブトキシシランなどのケイ素のテトラ
アルコキシド類や、メチルトリメトキシシラン、ビニル
トリエトキシシラン、γ−グリシドキシプロピルトリメ
トキシシランなどのケイ素アルコキシド誘導体類が用い
られる。Examples of silicon alkoxides include silicon tetraalkoxides such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane and tetrabutoxysilane, and methyltrimethoxysilane, vinyltriethoxysilane, γ-glycidoxypropyltrisilane. Silicon alkoxide derivatives such as methoxysilane are used.
【0019】またアルミニウムのアルコキシドとして
は、トリメトキシアルミニウム、トリエトキシアルミニ
ウム、トリプロポキシアルミニウム、トリブトキシアル
ミニウム、トリアミロキシアルミニウムなどのアルミニ
ウムのトリアルコキシド類や、アルミニウムジイソプロ
ポキシドエチルアセテートキレート、アルミニウムジセ
カンダリーブトキシドエチルアセトアセテートキレート
などのアルミニウムアルコキシド誘導体類が挙げられ
る。Examples of aluminum alkoxides include aluminum trialkoxides such as trimethoxyaluminum, triethoxyaluminum, tripropoxyaluminum, tributoxyaluminum, and triamiroxyaluminum; aluminum diisopropoxide ethyl acetate chelate; Aluminum alkoxide derivatives such as secondary butoxide ethyl acetoacetate chelate.
【0020】次に上記ケイ素のアルコキシドおよびアル
ミニウムのアルコキシドを用いるゾルゲル法によるアル
ミノシリケートガラス前駆体(ゲル固化体)の製造方法
について述べる。Next, a method for producing an aluminosilicate glass precursor (solidified gel) by a sol-gel method using the above silicon alkoxide and aluminum alkoxide will be described.
【0021】上記2種のアルコキシドにおいて、アルミ
ニウムのアルコキシドは、ケイ素のアルコキシドに比べ
て、著しく加水分解速度が速いため、単に混合し加水分
解すると、アルミニウムのアルコキシドが選択的に加水
分解され、均質なゾルやゲル固化体を得ることができな
い。In the above two types of alkoxides, aluminum alkoxides have a significantly higher hydrolysis rate than silicon alkoxides. Therefore, if they are simply mixed and hydrolyzed, aluminum alkoxides are selectively hydrolyzed to obtain a homogeneous alkoxide. Sol or gel solidified body cannot be obtained.
【0022】アルミニウムのアルコキシドの選択的な加
水分解を防ぎ、均質なゾル、ゲルを得る方法は2つあ
る。1つの方法はアルコキシドの加水分解速度が、アル
キル基の炭素数の影響を受け、一般的に炭素数が多くな
るほど加水分解速度が遅くなる(逆に炭素数が少なくな
れば速くなる)ことを利用する。例えば、アルミニウム
のアルコキシドとして、アミロキシドやブトキシドを、
そしてケイ素のアルコキシドとして、メトキシドやエト
キシドを使用して、注意深く加水分解することにより、
均質なゾルやゲル固化体を調製することが出来る。もう
一つの方法は、加水分解速度の遅いケイ素のアルコキシ
ドを予め部分的に加水分解した後、アルミニウムのアル
コキシドを反応させる方法である。この方法によれば、
後続の加水分解の前にケイ素のアルコキシドとアルミニ
ウムのアルコキシドが反応しているので、選択的な加水
分解を起こさず、均質なゾル、ゲル固化体を得ることが
できる。There are two methods for preventing the selective hydrolysis of the aluminum alkoxide to obtain a homogeneous sol or gel. One method utilizes the fact that the hydrolysis rate of an alkoxide is affected by the number of carbon atoms of an alkyl group, and generally the hydrolysis rate decreases as the number of carbon atoms increases (conversely, the hydrolysis rate increases as the number of carbon atoms decreases). I do. For example, as alkoxides of aluminum, amiloxide and butoxide,
And as a silicon alkoxide, using methoxide and ethoxide, by careful hydrolysis,
A homogeneous sol or gel solid can be prepared. Another method is a method in which a silicon alkoxide having a low hydrolysis rate is partially hydrolyzed in advance and then reacted with an aluminum alkoxide. According to this method,
Since the alkoxide of silicon and the alkoxide of aluminum have reacted before the subsequent hydrolysis, a uniform sol or gel solidified body can be obtained without causing selective hydrolysis.
【0023】また上記2つの方法を併用すれば、特に好
ましいので、以下に2つの方法の併用例を説明する。It is particularly preferable to use the above two methods in combination, and an example of the combination of the two methods will be described below.
【0024】先ずテトラエトキシシランなどのケイ素の
アルコキシドを、塩酸、硝酸、酢酸などの酸触媒の水溶
液とエタノールなどのアルコールとの混合溶液に加え、
攪拌してケイ素のアルコキシドの部分加水分解液を得
る。First, an alkoxide of silicon such as tetraethoxysilane is added to a mixed solution of an aqueous solution of an acid catalyst such as hydrochloric acid, nitric acid, and acetic acid and an alcohol such as ethanol.
Stir to obtain a partial hydrolyzate of the silicon alkoxide.
【0025】次に、この部分加水分解液にアルミニウム
トリブトキシドなどのアルミニウムのアルコキシドを添
加、攪拌しながら加熱して、アルミニウムのアルコキシ
ドを、部分加水分解したケイ素のアルコキシドと反応さ
せる。Next, an aluminum alkoxide such as aluminum tributoxide is added to the partially hydrolyzed solution, and the mixture is heated with stirring to react the aluminum alkoxide with the partially hydrolyzed silicon alkoxide.
【0026】次に、必要に応じて塩酸、硝酸、酢酸など
の酸触媒またはアンモニア、コリンなどの塩基触媒の水
溶液とエタノールなどのアルコールとをさらに加えた
後、攪拌し、ポリプロピレン製またはポリメチルペンテ
ン製などの容器に移し、室温で放置する。この放置によ
り、加水分解がさらに進行するとともにゲル化する。Next, if necessary, an aqueous solution of an acid catalyst such as hydrochloric acid, nitric acid or acetic acid or an aqueous solution of a base catalyst such as ammonia or choline and an alcohol such as ethanol are further added, and the mixture is stirred and made of polypropylene or polymethylpentene. Transfer to a container made of plastic and leave at room temperature. By this standing, hydrolysis proceeds further and gelation occurs.
【0027】次にこのゲル体を乾燥することにより、余
分の水分や有機溶媒が揮発して、ゲル固化体が得られ
る。本発明においては、上記で得られたゲル固化体をア
ルミノシリケートガラス前駆体として用いることができ
る。Next, by drying the gel, excess water and organic solvent are volatilized to obtain a solidified gel. In the present invention, the solidified gel obtained above can be used as an aluminosilicate glass precursor.
【0028】このアルミノシリケートガラス前駆体にお
いて、Al2 O3 とSiO2 の組成割合は、Al2 O3
が1〜40mol %、SiO2 が99〜60mol %である
のが好ましい。その理由は次のとおりである。すなわ
ち、Al2 O3 が1mol %未満であると、このアルミノ
シリケートマトリックスガラス中に含有させたSm3+イ
オンが、後記還元処理により、Sm2+イオンに還元され
にくく、また仮に還元されてもSm2+イオンの凝集が起
こり、Sm2+イオンの 7F− 5D遷移による発光が発現
しにくい。またAl2 O3 が40mol %を越え、SiO
2 が60mol %未満になると、加熱中に結晶化が起こり
透明なガラスが得にくく、また製造中にゲル固化体にひ
びなどが入りやすい。Al2 O3 は5〜30mol %であ
り、SiO2 は95〜70mol %であるのが特に好まし
い。In this aluminosilicate glass precursor, the composition ratio of Al 2 O 3 and SiO 2 is Al 2 O 3
Is preferably 1 to 40 mol%, and SiO 2 is 99 to 60 mol%. The reason is as follows. That is, if Al 2 O 3 is less than 1 mol%, Sm 3+ ions contained in this aluminosilicate matrix glass are hardly reduced to Sm 2+ ions by the reduction treatment described later, and even if they are temporarily reduced. occurs agglomeration of Sm 2+ ions, of Sm 2+ ions 7 F- 5 D emission by transition hardly expressed. Also, when Al 2 O 3 exceeds 40 mol%, SiO 2
If the content of 2 is less than 60 mol%, crystallization occurs during heating and it is difficult to obtain a transparent glass, and cracks or the like are apt to occur in the solidified gel during production. It is particularly preferred that Al 2 O 3 is 5 to 30 mol% and SiO 2 is 95 to 70 mol%.
【0029】なお、本発明で用いるアルミノシリケート
ガラス前駆体は、本発明の目的を損なわない範囲でアル
カリ金属酸化物、アルカリ土類金属酸化物、ホウ素酸化
物、チタン酸化物、ジルコニウム酸化物などの酸化物を
Al2 O3 とSiO2 との合量100mol %に対して外
割で30mol %まで含ませることができる。The aluminosilicate glass precursor used in the present invention may be any of alkali metal oxides, alkaline earth metal oxides, boron oxides, titanium oxides, zirconium oxides and the like as long as the object of the present invention is not impaired. The oxide can be included up to 30 mol% on an outer basis with respect to 100 mol% of the total amount of Al 2 O 3 and SiO 2 .
【0030】本発明においては、上記アルミノシリケー
トガラス前駆体中にSm3+イオンを含有させてなる、S
m3+イオン含有アルミノシリケートガラス前駆体を出発
原料として用いるが、アルミノシリケートガラスへSm
3+イオンを含有させる方法として、これに限定されるも
のではないが、次の2つの方法がある。In the present invention, an Sm 3+ ion is contained in the aluminosilicate glass precursor.
An aluminosilicate glass precursor containing m 3+ ions is used as a starting material.
As a method for containing 3+ ions, there are, but not limited to, the following two methods.
【0031】(1)ゾルゲル法によるゲル固化体(ガラ
ス前駆体)製造における任意の段階でSm3+イオン源を
加える。(1) An Sm 3+ ion source is added at an arbitrary stage in the production of a solidified gel (glass precursor) by the sol-gel method.
【0032】(2)ゾルゲル法によるゾル固化体(ガラ
ス前駆体)製造後、Sm3+イオン源含有溶液にゾル固化
体を浸漬して、Sm3+イオンをゾル固化体に浸漬させ
る。[0032] (2) a sol solidified by sol-gel method (glass precursor) after production, by immersing the sol solidified body Sm 3+ ion source containing solution, immersing the Sm 3+ ions in the sol solidified body.
【0033】ここにSm3+イオン源としては、塩化サマ
リウム、硝酸サマリウム、硫酸サマリウム、しゅう酸サ
マリウム、酢酸サマリウムなどの無機サマリウム化合物
や、サマリウムのアルコキシドなどの有機サマリウム化
合物を用いることができ、前記方法(1)および(2)
において、無機サマリウム化合物および有機サマリウム
化合物を用いることができる。As the Sm 3+ ion source, inorganic samarium compounds such as samarium chloride, samarium nitrate, samarium sulfate, samarium oxalate and samarium acetate, and organic samarium compounds such as samarium alkoxide can be used. Method (1) and (2)
In the above, an inorganic samarium compound and an organic samarium compound can be used.
【0034】アルミノシリケートガラス前駆体に含有さ
れる上記Sm3+イオンの量は、ガラス前駆体に対してS
m2 O3 として0.1〜20wt%となる量であるのが好
ましい。その理由は、0.1wt%未満であると、強いP
HB現象を得ることが困難になり、一方、20wt%を越
えると、(a) Sm2+イオンの凝集が起り、均一なガラス
が得難くなり、またSm2+イオンの 7F− 5D遷移によ
る発光が発現し難い、(b) 加熱中に結晶化が起こりやす
くなり透明なガラスが得難くなるからである。Sm3+イ
オンの量は、Sm2 O3 として0.5〜10wt%である
のが特に好ましい。The amount of the Sm 3+ ions contained in the aluminosilicate glass precursor is S
The amount is preferably 0.1 to 20% by weight as m 2 O 3 . The reason is that if it is less than 0.1 wt%, strong P
It becomes difficult to obtain HB phenomenon, whereas, if it exceeds 20 wt%, (a) occur agglomeration of Sm 2+ ions, uniform glass becomes difficult to obtain, also 7 F- 5 D transition Sm 2+ ions (B) crystallization is likely to occur during heating, making it difficult to obtain a transparent glass. The amount of Sm 3+ ions is particularly preferably 0.5 to 10% by weight as Sm 2 O 3 .
【0035】本発明においては、出発原料である上記の
Sm3+イオン含有アルミノシリケートガラス前駆体を還
元雰囲気で熱処理することを必須の工程とする。In the present invention, an essential step is to heat-treat the above-mentioned Sm 3+ ion-containing aluminosilicate glass precursor as a starting material in a reducing atmosphere.
【0036】還元性雰囲気としては、水素などの還元性
ガス雰囲気や水素などの還元性ガスと窒素、ヘリウム、
アルゴンなどの不活性ガスとの混合ガス雰囲気が用いら
れる。As the reducing atmosphere, a reducing gas atmosphere such as hydrogen or a reducing gas such as hydrogen and nitrogen, helium,
A mixed gas atmosphere with an inert gas such as argon is used.
【0037】上記還元性雰囲気中でSm3+イオン含有ア
ルミノシリケートガラス前駆体を熱処理することによ
り、ガラス前駆体はガラス化され、かつSm3+イオンは
Sm2+イオンに還元されて、目的とするSm2+イオン含
有アルミノシリケートガラスが得られる。By subjecting the Sm 3+ ion-containing aluminosilicate glass precursor to a heat treatment in the reducing atmosphere, the glass precursor is vitrified, and the Sm 3+ ions are reduced to Sm 2+ ions. Aluminosilicate glass containing Sm 2+ ions is obtained.
【0038】この熱処理は400〜1200℃の温度で
行なうのが好ましい。その理由は以下のとおりである。This heat treatment is preferably performed at a temperature of 400 to 1200 ° C. The reason is as follows.
【0039】熱処理を400℃未満で行なった場合、 (i) 水分や有機物の除去が十分になされず、それらが残
存するためガラス化が不完全となる (ii)Sm3+イオン(ゲル中ではSm元素は、Sm3+イオ
ンとして存在している) のSm2+イオンへの還元が
十分でない ことから、本発明の目的とするガラスを作製することが
困難になる。When the heat treatment is carried out at a temperature lower than 400 ° C., (i) water and organic substances are not sufficiently removed, and vitrification becomes incomplete because they remain, and (ii) Sm 3+ ions (in the gel) The Sm element is present as Sm 3+ ions) is not sufficiently reduced to Sm 2+ ions, so that it becomes difficult to produce the glass intended for the present invention.
【0040】一方、1200℃を越える温度で熱処理を
行った場合、ガラスマトリックスの結晶化が起こり、ガ
ラスが不透明となりやすい。On the other hand, when heat treatment is performed at a temperature exceeding 1200 ° C., crystallization of the glass matrix occurs, and the glass tends to be opaque.
【0041】上記の方法で得られたガラス中のSm2+イ
オンの割合は、ガラス化する際の加熱温度、時間、ガス
流量に依存する。すなわち、温度を上げ、時間を長くす
ることで、Sm2+イオンの存在割合を高くすることがで
きる。また、雰囲気ガスの量を多くしても、同様の効果
がある。The ratio of Sm 2+ ions in the glass obtained by the above method depends on the heating temperature, time and gas flow during vitrification. That is, by increasing the temperature and lengthening the time, the proportion of Sm 2+ ions present can be increased. The same effect can be obtained even if the amount of the atmosphere gas is increased.
【0042】H2 などの還元性ガスはSm3+イオンの還
元反応に必要であり、その流量を多くする程、低温、短
時間の内にSm2+イオンへの変化が終了する。A reducing gas such as H 2 is necessary for the reduction reaction of Sm 3+ ions. As the flow rate is increased, the conversion to Sm 2+ ions is completed at a lower temperature in a shorter time.
【0043】しかし、還元性ガスをある流量(炉内容
積、熱処理するガラスの量に依存する)以上とすると、
ガラスマトリックスになるゲル中に残存している有機物
の酸化が妨げられるので、最終的に遊離の炭素がガラス
中に残留してしまい、透明なガラスを得られ難くなる。However, if the reducing gas is used at a flow rate (depending on the furnace volume and the amount of glass to be heat-treated),
Oxidation of the organic matter remaining in the gel that becomes the glass matrix is prevented, so that finally free carbon remains in the glass, making it difficult to obtain transparent glass.
【0044】そこで、Sm2+イオンを含有する透明なガ
ラスを短時間の内に製造するために、残留炭素が残らな
いようゲル固化体を予め酸化性雰囲気(大気を含む)中
で加熱しておき、その後還元性ガス中で熱処理すること
が望ましい。酸化性雰囲気での前熱処理は、400〜1
000℃の温度で行うことが望ましい。Therefore, in order to produce a transparent glass containing Sm 2+ ions in a short time, the solidified gel is heated in an oxidizing atmosphere (including air) in advance so that no residual carbon remains. And then heat-treated in a reducing gas. The pre-heat treatment in an oxidizing atmosphere is 400 to 1
It is desirable to carry out at a temperature of 000 ° C.
【0045】前熱処理温度が400℃より低い場合、有
機物が残存していても分解、揮発することがない。ま
た、1000℃より高い温度では、多孔質であるゲル固
化体が焼結して細孔量が極めて少なくなる、もしくは無
孔化するため、その後還元ガス中で熱処理してもSm3+
イオンをSm2+イオンへ変化させることができなくな
る。When the pre-heat treatment temperature is lower than 400 ° C., no decomposition or volatilization occurs even if organic substances remain. Also, at temperatures higher than 1000 ° C., the gel solidified porous pore volume becomes extremely small by sintering, or for non-Anaka, be heat-treated in the subsequent reduction in gas Sm 3+
The ions cannot be changed to Sm 2+ ions.
【0046】本発明により、Sm3+イオン含有アルミノ
シリケートガラス前駆体を還元性雰囲気で熱処理するこ
とにより得られたSm2+イオン含有アルミノシリケート
ガラスは、SiO2 にAl2 O3 を含有させたことによ
り、(i) ケイ酸塩ガラスの中でも特に耐候性(化学的耐
久性)に優れている、(ii)Sm3+イオンの還元により生
じたSm2+イオンの安定性に優れ、f−f遷移の効率が
向上して、強いPHB現象を再現性よく発現し得るとい
う利点を有し、PHB材料などの光情報分野において好
ましく用いられる。According to the present invention, the Sm 2+ ion-containing aluminosilicate glass obtained by subjecting the Sm 3+ ion-containing aluminosilicate glass precursor to a heat treatment in a reducing atmosphere has SiO 2 containing Al 2 O 3 . Thus, (i) excellent weather resistance (chemical durability) among silicate glasses, (ii) excellent stability of Sm 2+ ions generated by reduction of Sm 3+ ions, and f− It has the advantage that the f-transition efficiency can be improved and a strong PHB phenomenon can be expressed with good reproducibility, and it is preferably used in the field of optical information such as PHB materials.
【0047】[0047]
【実施例】以下、実施例により本発明をさらに説明す
る。The present invention will be further described with reference to the following examples.
【0048】[実施例1]テトラエトキシシラン(Si
(OC2 H5 )4 )149.0gを0.15M塩酸(H
Cl)水溶液12.9gとエタノール(C2 H5 OH)
33.0gとの混合溶液に攪拌しながら滴下した。全て
のSi(OC2 H5 )4 を加えた後、さらに1時間攪拌
して、Si(OC2 H5 )4 の部分加水分解液を得た。
この部分加水分解液へアルミニウムトリブトキシド(A
l(OC4 H9 )3 )38.4gを添加し、攪拌しなが
ら60℃で1時間加熱した。その後、塩化サマリウム6
水塩(SmCl3 ・6H2 O)5.2gをC2 H5 OH
25.0gに溶解した液を上記の液に加え、さらに1
時間攪拌を続けた。C2 H5 OH 33.0gと0.1
5M HCl水溶液51.6gとの混合液を加えた後、
1時間攪拌し、ポリプロピレンやポリメチルペンテンな
どのプラスチック容器に移し、室内で放置した。更に加
水分解が進行するとともにゲル化し、乾燥することによ
り、余分の水分や有機溶媒が揮発して、ゲル固化体を得
た。Example 1 Tetraethoxysilane (Si
(OC 2 H 5 ) 4 ) 149.0 g was added to 0.15 M hydrochloric acid (H
Cl) aqueous solution (12.9 g) and ethanol (C 2 H 5 OH)
It was added dropwise to the mixed solution with 33.0 g while stirring. After adding all the Si (OC 2 H 5 ) 4 , the mixture was further stirred for 1 hour to obtain a partially hydrolyzed liquid of Si (OC 2 H 5 ) 4 .
Aluminum tributoxide (A
1 (OC 4 H 9 ) 3 ) was added and heated at 60 ° C. for 1 hour with stirring. Then, samarium chloride 6
Tetrahydrate and (SmCl 3 · 6H 2 O) 5.2g C 2 H 5 OH
The solution dissolved in 25.0 g was added to the above solution, and 1
Stirring was continued for hours. 33.0 g of C 2 H 5 OH and 0.1
After adding a mixture with 51.6 g of 5M HCl aqueous solution,
The mixture was stirred for 1 hour, transferred to a plastic container such as polypropylene or polymethylpentene, and left indoors. Further, as the hydrolysis progressed, it gelled and dried, whereby excess water and organic solvent were volatilized to obtain a solidified gel.
【0049】このゲル固化体を大気中で室温から800
℃まで50℃/hrの速度で加熱し、その温度で2時間保
持して前熱処理した後、電気炉の電源を切り、室温まで
冷却して、ガラス体を得た。The solidified gel was heated from room temperature to 800
After heating to 50 ° C. at a rate of 50 ° C./hr and holding at that temperature for 2 hours for pre-heat treatment, the electric furnace was turned off and cooled to room temperature to obtain a glass body.
【0050】このガラス体の仕込組成は、5.0wt%の
Sm2 O3 を含むアルミノシリケートガラス(10Al
2 O3 ・90SiO2 mol %)である。ガラス中のS
mは3価の状態で存在しており、ガラスの色は無色透明
である。The charged composition of this glass body was aluminosilicate glass (10 Al) containing 5.0 wt% of Sm 2 O 3.
2 O 3 · 90 SiO 2 mol%). S in glass
m exists in a trivalent state, and the color of the glass is colorless and transparent.
【0051】このガラスを電気環状炉に入れ、20%水
素(H2 )/80%窒素(N2 )混合ガスを25ml/mi
n で流しながら150℃/hrで700℃まで昇温し、そ
の温度で2時間保持することにより、Sm3+をSm2+に
還元して透明なSm2+イオン含有ガラスを製造した。This glass was placed in an electric annular furnace, and a mixed gas of 20% hydrogen (H 2 ) / 80% nitrogen (N 2 ) was added at 25 ml / mi.
By raising the temperature to 700 ° C. at 150 ° C./hr while flowing at n, and maintaining the temperature for 2 hours, Sm 3+ was reduced to Sm 2+ to produce a transparent Sm 2+ ion-containing glass.
【0052】Sm3+とSm2+の判別は、ガラスの発光ス
ペクトルから行うことができる。すなわち、Sm3+の状
態では、562、596および645nmに発光ピーク
を持つスペクトルを与え、またSm2+の状態では、68
3、700および725nmに発光ピークを与え、これ
らの発光ピークは互いに重なることはない。The discrimination between Sm 3+ and Sm 2+ can be made from the emission spectrum of glass. That is, in the state of Sm 3+ , a spectrum having emission peaks at 562, 596 and 645 nm is given, and in the state of Sm 2+ , the spectrum has 68
The emission peaks are given at 3,700 and 725 nm, and these emission peaks do not overlap each other.
【0053】上記のように大気中800℃で加熱して前
熱処理したガラスのスペクトルは、図1に示すようにS
m3+のみのスペクトルであったのに対し、還元ガス雰囲
気内での加熱後のガラスのスペクトルは図2に示すよう
に、Sm3+からの発光は全く認められず、Sm2+のみの
スペクトルに変化していた。The spectrum of the glass preheat-treated by heating at 800 ° C. in the air as described above has a spectrum as shown in FIG.
whereas was spectra m 3+ only, the spectrum of the glass after heating in a reducing gas atmosphere as shown in FIG. 2, the light emitting from the Sm 3+ was not observed at all, Sm 2+ only The spectrum had changed.
【0054】以上のように、還元処理後に得られたガラ
スは、無色透明であり、ガラス中のSmは全てSm2+の
状態で存在していることが分かる。As described above, the glass obtained after the reduction treatment is colorless and transparent, and it can be seen that all Sm in the glass exists in the state of Sm 2+ .
【0055】このガラスに波長685nmのレーザーを
照射した後、725nmの発光に対する励起スペクトル
を670〜700nmの範囲で測定したところ、683
nmにピークを持つ励起スペクトルで685nmに凹み
が生じており、PHB現象の確認ができた。After irradiating the glass with a laser having a wavelength of 685 nm, the excitation spectrum for emission at 725 nm was measured in the range of 670 to 700 nm.
In the excitation spectrum having a peak at nm, a depression occurred at 685 nm, and the PHB phenomenon was confirmed.
【0056】耐久性の評価は次のように行なった。すな
わち、50℃の純水中に、実施例1のアルミノシリケー
ト系ガラスと、比較試料のフッ化物ガラス、ホウ酸塩ガ
ラスをそれぞれ浸漬した。48時間後ガラスを取り出し
て見たところ、フッ化物ガラス、ホウ酸塩ガラスは、溶
解、表面変質が生じていたのに対し実施例1のアルミノ
シリケート系ガラスは全く変質しておらず、耐久性に優
れていることが明らかとなった。The durability was evaluated as follows. That is, the aluminosilicate glass of Example 1 and the fluoride glass and the borate glass of the comparative sample were immersed in pure water at 50 ° C., respectively. After 48 hours, when the glass was taken out and examined, the fluoride glass and the borate glass were melted and the surface was altered, whereas the aluminosilicate glass of Example 1 was not altered at all, and the durability was high. It became clear that it was excellent.
【0057】[実施例2〜8]Smの含有量、ガラスの
組成および/または加熱条件を表1に示すように変えた
以外は、実施例1と同様にして、表1に示すようなガラ
スを作製した。得られたガラスの発光スペクトルは全て
Sm2+からの発光を示すのみで、全てSm2+のみを含有
するガラスである。また、得られたガラスは実施例1と
同様、PHB現象の確認ができた。また実施例1と同様
に耐久性にも優れていた。Examples 2 to 8 Glasses as shown in Table 1 were prepared in the same manner as in Example 1 except that the content of Sm, the composition of the glass and / or the heating conditions were changed as shown in Table 1. Was prepared. All of the emission spectra of the obtained glasses only show emission from Sm 2+ , and all the glasses contain only Sm 2+ . Moreover, the obtained glass was able to confirm the PHB phenomenon as in Example 1. Also, as in Example 1, the durability was excellent.
【0058】[比較例1]Al(OC4 H9 )3 を加え
ないで実施例1と同様に作製したゲルを大気中800℃
で2時間加熱して、SiO2 のみをマトリックスにした
ガラスを作製した。このガラスを次いで、実施例1と同
様に20%H2 /80%N2 混合ガス中で加熱したが、
この発光スペクトルはSm3+のみからのもので、Sm2+
に由来する発光ピークは認められず、PHBの確認もで
きなかった。Comparative Example 1 A gel prepared in the same manner as in Example 1 except that Al (OC 4 H 9 ) 3 was not added was prepared at 800 ° C. in air.
For 2 hours to produce a glass having only SiO 2 as a matrix. The glass was then heated in a 20% H 2 /80% N 2 gas mixture as in Example 1,
This emission spectrum is only from Sm 3+ , and Sm 2+
No luminescence peak derived from No. was found, and no PHB was confirmed.
【0059】[0059]
【表1】 [Table 1]
【0060】[0060]
【発明の効果】以上詳しく述べたように、本発明によれ
ば、耐候性(化学的耐久性)に優れ、かつf−f遷移の
効率の向上による、強いPHB現象を再現性よく発現し
得るSm2+含有ケイ酸塩ガラスを製造する方法が提供さ
れた。As described in detail above, according to the present invention, a strong PHB phenomenon due to an improvement in the weather resistance (chemical durability) and an improvement in the efficiency of the ff transition can be exhibited with good reproducibility. A method for making a Sm 2+ -containing silicate glass has been provided.
【図面の簡単な説明】[Brief description of the drawings]
【図1】アルミノシリケートゲルの空気中800℃で2
時間加熱後の発光スペクトル図。FIG. 1. Aluminosilicate gel in air at 800 ° C.
FIG. 7 is an emission spectrum diagram after heating for a time.
【図2】アルミノシリケートゲルを空気中800℃で2
時間加熱後、還元性ガス(20%H2 −80%N2 )
中、700℃で2時間加熱後のSm2+含有アルミノシリ
ケートガラスの発光スペクトル図。FIG. 2 shows aluminosilicate gel in air at 800 ° C.
After heating for a time, reducing gas (20% H 2 -80% N 2 )
FIG. 4 is an emission spectrum diagram of the Sm 2+ -containing aluminosilicate glass after being heated at 700 ° C. for 2 hours.
───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.7,DB名) C03C 1/00 - 14/00 CA(STN) JICSTファイル(JOIS)──────────────────────────────────────────────────続 き Continued on the front page (58) Field surveyed (Int. Cl. 7 , DB name) C03C 1/00-14/00 CA (STN) JICST file (JOIS)
Claims (6)
ラス前駆体を還元性雰囲気中で熱処理することにより、
ガラス前駆体をガラス化するとともに、Sm3+イオンを
Sm2+イオンに還元してSm2+イオン含有アルミノシリ
ケートガラスを得ることを特徴とするSm2+イオン含有
ガラスの製造方法。1. A heat treatment of an Sm 3+ ion-containing aluminosilicate glass precursor in a reducing atmosphere,
A method for producing Sm 2+ ion-containing glass, which comprises vitrifying a glass precursor and reducing Sm 3+ ions to Sm 2+ ions to obtain Sm 2+ ion-containing aluminosilicate glass.
ゲル法により得られたゲル固化体である、請求項1に記
載の方法。2. The method according to claim 1, wherein the aluminosilicate glass precursor is a solidified gel obtained by a sol-gel method.
m2 O3 として0.1〜20wt%存在する、請求項1に
記載の方法。3. The Sm 3+ ion reacts with S
It exists 0.1-20 weight% as m 2 O 3, The method of claim 1.
還元性ガスと不活性ガスの混合ガス雰囲気である、請求
項1に記載の方法。4. The method according to claim 1, wherein the reducing atmosphere is a reducing gas atmosphere or a mixed gas atmosphere of a reducing gas and an inert gas.
る、請求項1に記載の方法。5. The method according to claim 1, wherein the heat treatment temperature is 400 to 1200 ° C.
する、請求項1に記載の方法。6. The method according to claim 1, wherein prior to the reduction, a pre-heat treatment is performed in an oxidizing atmosphere.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6132199A JP3051638B2 (en) | 1994-06-14 | 1994-06-14 | Method for producing glass containing Sm ions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6132199A JP3051638B2 (en) | 1994-06-14 | 1994-06-14 | Method for producing glass containing Sm ions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH07330369A JPH07330369A (en) | 1995-12-19 |
| JP3051638B2 true JP3051638B2 (en) | 2000-06-12 |
Family
ID=15075716
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6132199A Expired - Fee Related JP3051638B2 (en) | 1994-06-14 | 1994-06-14 | Method for producing glass containing Sm ions |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3051638B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4949546B2 (en) * | 2000-03-27 | 2012-06-13 | 岩崎電気株式会社 | Blue-emitting and visible-emitting sol-gel glass |
| EP1566367B1 (en) * | 2002-11-29 | 2015-01-07 | Japan Science and Technology Agency | Luminescent glass |
| JP5214138B2 (en) * | 2006-06-20 | 2013-06-19 | モーメンティブ・パフォーマンス・マテリアルズ・インク | Glass product and its manufacturing method |
-
1994
- 1994-06-14 JP JP6132199A patent/JP3051638B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH07330369A (en) | 1995-12-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5846889A (en) | Infrared transparent selenide glasses | |
| JP3411067B2 (en) | Wavelength up-converting transparent glass-ceramics and method for producing the same | |
| JP3040278B2 (en) | Method for producing product made of high silica glass | |
| US5093286A (en) | Semiconductor-containing glass and method of producing the same | |
| CA2276006A1 (en) | Transparent oxyfluoride glass-ceramic composition and process for making | |
| JPS63103840A (en) | Luminescent quartz glass and manufacture | |
| JP2004510665A (en) | Rare earth soluble telluride glass | |
| US5206189A (en) | Sol-gel method for the preparation of monolithic multicomponent oxide glasses | |
| US6360564B1 (en) | Sol-gel method of preparing powder for use in forming glass | |
| JP3051638B2 (en) | Method for producing glass containing Sm ions | |
| KR100768577B1 (en) | Organic-inorganic hybrid vitreous material and method for producing same | |
| JP2538527B2 (en) | Method for producing metal oxide glass film and spherical fine particles | |
| US7802450B2 (en) | Organic-inorganic hybrid glassy materials and their production processes | |
| JP4949546B2 (en) | Blue-emitting and visible-emitting sol-gel glass | |
| JP2005097030A (en) | Organic inorganic hybrid glass-like material and its manufacturing method | |
| Dejneka et al. | Sol‐Gel Synthesis of High‐Quality Heavy‐Metal Fluoride Glasses | |
| Dash et al. | Effect of Rare-Earth Doping on Upconversion Luminescence of CaF2 Glass–Ceramic Nanoparticles | |
| JP2005047779A (en) | Organic-inorganic hybrid vitreous material, and method of manufacturing the same | |
| Nogami et al. | Sol-Gel processing of Sm2+-doped glass and its spectral hole burning at room temperature | |
| Ła̧czka et al. | Rare earth elements as components of special glasses | |
| JP2002338253A (en) | Dispersal of optically active ions in glass | |
| JPH06316418A (en) | Method for producing photochromic glass | |
| JP2813393B2 (en) | Method for producing semiconductor-containing glass | |
| JP4516728B2 (en) | Organic-inorganic hybrid glassy material and method for producing the same | |
| JPH05270842A (en) | Glass containing gold particulate and production thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20000315 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20080331 Year of fee payment: 8 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090331 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20090331 Year of fee payment: 9 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100331 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100331 Year of fee payment: 10 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110331 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110331 Year of fee payment: 11 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120331 Year of fee payment: 12 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120331 Year of fee payment: 12 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130331 Year of fee payment: 13 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140331 Year of fee payment: 14 |
|
| LAPS | Cancellation because of no payment of annual fees |