JP3058006B2 - Film forming equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion beam sputtering method (IBS) for forming a film by a sputtering method using an ion beam or the like, and to an ion deposition thin film forming method (IBS) using ion beam irradiation in combination with vacuum deposition by sputtering or the like.
VD) and other physical vapor deposition methods, etc.
In particular, the apparatus has a vacuum film formation container in which a load lock chamber for taking in and out a substrate to be formed is connected, a substrate support tray is arranged in the container, and the load lock chamber opening communicating with the inside of the container is formed by the tray. through the load lock chamber of the substrate along with the opening and closing
Then , the film formation preventing cover part for the other part is placed at a film forming position provided around the film forming part, and after film formation, the film is returned to the load lock chamber, and the substrate is rotated by rotating the tray during film formation. The present invention relates to a film forming apparatus.

[0002]

2. Description of the Related Art An IBS film forming apparatus will be described as a typical example of such a film forming apparatus, and one example thereof will be described with reference to FIGS. FIG. 4 shows an outline of the overall configuration of the apparatus, and FIG. 5 mainly shows the configuration of the transfer mechanism of the substrate support tray. The illustrated IBS film forming apparatus
The vacuum deposition container 1 is included. In the container 1, a sputter target 11 is disposed, and an ion source 12 for irradiating the target with ions is provided. Below the target 11, there is a film formation position P on the film formation target substrate S, and a cover wall portion 13 that extends to the inner wall of the container 1 is formed therearound. In other words, the cover wall 13 has the opening 131, which faces the film formation position P. An exhaust device (not shown) is connected to the container 1, and the inside of the container 1 is set to a predetermined vacuum degree for film formation by the operation thereof.

[0003] A portion of the container 1 opposite to the ion source 12 and the like with respect to the cover wall portion 13 (a portion below the wall portion 13 in the illustrated example) extends slightly laterally. A load lock chamber 14 is connected to the upper end of the load lock chamber 14. An opening 141 communicating with the outside of the load lock chamber 14 is opened and closed by a lid 15. When the lid 15 is closed, the lid 15 comes into air-tight contact with the O-ring 151 mounted on the upper end surface around the opening.

An exhaust pipe 143 and a vent pipe 144 are connected to the load lock chamber 14, and the exhaust pipe 143 is connected to an exhaust device (not shown), and the vent pipe 144 is connected to a vent gas supply unit (not shown). A substrate support tray 2 for supporting a film formation target substrate S is disposed in the container 1.
The upper surface of the tray 2 has a circular concave portion 21 on which the substrate S is placed, and the lower surface has a concave portion 22 with which a nail of a tray support member to be described later engages.

[0005] The tray 2 is supported by the first transfer device 3 and has an inner opening 142 communicating with the container 1 in the load lock chamber 14.
From the position Q1 facing the film formation position P to the position Q2 facing the film formation position P. The conveying device 3 has a horizontal arm 31 which is cantilevered at the upper end of a vertical shaft 32 and has a ring-shaped or partly removed tray support 311 at its free end. have. The tray 2 has a circular concave step portion 23 as viewed from the bottom side at the peripheral edge of the lower surface, and at this portion, the tray 2 can be fitted on the tray support portion 311 from above and can ride thereon. In addition, by being pushed up from below in this state, it is possible to move up and away from the tray support 311. The shaft bar 32 is horizontally reciprocated by a rotation drive unit 33 provided outside the container 1. That is, the tray 2 supported by the arm 31 is moved to the position Q1 facing the load lock indoor side opening 142 by the operation of the drive unit 33.
And a position Q2 facing the film forming position P. Position Q1
Is reciprocated by the second transfer device 4 from the first transfer device 3 to the position Q3 at which the load lock chamber side opening 142 is closed.

The transport device 4 includes a tray supporting member 41 for supporting the tray 2 from below by contacting the lower surface thereof, a vertical shaft 42 for supporting the member at the upper end, and a container 1 for raising and lowering the shaft 42. Including the outer drive unit 43 and the tray support member 41
Is a claw 4 which engages with the recess 22 on the lower surface of the tray when supporting the tray
11 is provided. The tray support member 41 has a shape and a size that allow the tray support portion 311 of the horizontal arm 31 of the transport device 3 to penetrate and move up and down.

That is, the tray 2 supported by the apparatus 3 and placed at the position Q1 is supported by the tray support member 41 raised by the operation of the drive unit 43 of the apparatus 4 and is pushed up to the position Q3 to be loaded. Lock room side opening 142
Can be closed. At this time, the tray 2 has the opening 14
2 is in airtight contact with the O-ring 145 mounted on the peripheral portion thereof. In addition, by driving the drive unit 43 in the reverse direction from that state, the tray 2 at the position Q3 can be lowered and transferred to the device 3.

The tray 2 placed at the position Q2 is reciprocated by the third transfer device 5 from the first transfer device 3 to the film formation position P. The transfer device 5 has a horizontal arm 51, which is cantilevered at the upper end of a vertical shaft 52, and rotatably supports a tray support member 53 at a free end with a bearing 54. . The tray support member 53 is shaped and sized to be able to penetrate and move up and down the tray support portion 311 of the horizontal arm 31 of the horizontal transfer device 3, and can support the tray 2 from below by contacting the lower surface thereof. The claw 531 engages with the concave portion 22 on the lower surface of the tray 2 when the tray is supported. The shaft 52 is a driving unit 5 outside the container 1.
4 to drive up and down. That is, the tray 2 supported by the horizontal transfer device 3 and placed at the position Q2 is
When the tray supporting member 53 is raised by the operation of the driving unit 54, the tray supporting member 53 is supported by the tray supporting member 53 and is pushed up to the film forming position P.
The substrate S supported by the tray 2 can be arranged at the position P. In addition, by driving the drive unit 54 in the reverse direction from that state, the position P
The substrate S and the tray 2 supporting the substrate S can be lowered and transferred to the apparatus 3. When the substrate S is placed at the position P, its peripheral edge is covered with the above-described cover wall 13, and a portion where a film is to be formed is exposed to the target 11.

The peripheral portion of the substrate S does not come into contact with the cover wall 13 in order to rotate the substrate S during film formation.
It is arranged close to it. Tray 2 placed at position P
During the film forming operation, the substrate S is rotated by the rotation driving device 6, whereby the substrate S supported on the tray 2 is also rotated. The device 6 is provided with the tray support member 5 in the third transport device 5.
A bearing 54 for rotatably supporting the arm 3 on the arm 51 is a part of a component.
And a rotation drive unit 63 outside the vessel 1 connected to the rotation shaft 532 supporting the shaft 1 via an expansion joint 61 by a spline shaft mechanism. That is, the tray 2 raised to the film forming position P is driven to rotate by the operation of the drive unit 63, whereby the substrate S is also turned, and a film is formed uniformly on the surface.

According to the conventional film forming apparatus described above, the inside of the container 1 is maintained at a predetermined film forming vacuum degree by an exhaust device (not shown). Initially, the tray 2 is supported by the first transport device 3 and is arranged at the position Q1, is pushed up from below by the second transport device 4, and is held at the position Q3 in which the load lock chamber side opening 142 is closed airtightly. In this state, the outer lid 15 of the load lock chamber 14 is opened, and the substrate S on which a film is to be formed is carried into the chamber and is placed on the tray 2.

Thereafter, the lid 15 is closed in an airtight manner, the inside of the chamber 14 is evacuated to almost the same degree of vacuum as the inside of the container 1 through the exhaust pipe 143, and then the tray support member 41 of the first transfer device 4 is lowered. , So that tray 2 is first
Tray support section 31 in horizontal arm 31 of transfer device 3
1 is placed. Next, the arm 31 is turned, and the tray 2 is placed at the position Q2. Subsequently, the tray support member 53 of the third transfer device 5 is raised, whereby the tray 2 is pushed up and arranged at the film forming position P, and accordingly, the substrate S is also arranged at the position P.

Subsequently, the ion source 12 and the target 11
The substrate is irradiated with ions, and the generated sputtered particles fly to the surface of the substrate S to form a film. Further, during this film formation, the tray 2 is rotated by the rotary drive device 6, and thereby the substrate S
Is also turned to form a uniform film on the surface of the substrate S. Tray 2
Parts that do not support the substrate, the first and third transfer devices,
Further, the attachment of the sputtered particles to the rotation driving device 6 and the like is prevented by the cover wall portion 13 surrounding the position P.

When the film formation is completed, the tray support member 53 of the third transfer device 5 is lowered, whereby the substrate support tray 2 is transferred to the tray support 311 of the arm 31 of the first transfer device 3. Thereafter, the arm 31 is rotated, and the tray 2 is transported to the position Q1, where the tray support member 41 of the second transport device 4 is raised, whereby the tray 2 is raised to the position Q3, and the load lock chamber is located inside. The opening 142 is closed.

Thus, the film-formed substrate S is returned into the chamber 14. Here, a vent gas is introduced into the chamber 14 through the vent pipe 144, the indoor pressure is made substantially equal to the external pressure of the container 1, and then the lid 15 is opened and the substrate S is carried out.
Thereafter, the above operation is repeated.

[0015]

However, according to such a conventional film forming apparatus, a cover for preventing film formation outside the substrate is provided around the film forming position.
Actually, a slight gap is left between the peripheral portion of the substrate disposed at the film forming position and the cover portion covering the same to allow rotation of the substrate. Or on the lower mechanism. Since the tray also serves as a lid for the opening inside the load lock chamber, the deposition of the tray has a problem that the airtight closing of the opening is hindered, and the deposition on the mechanism causes a malfunction. There is.

In the case of a mass production apparatus, the film formation time per substrate is several seconds, and several hundred r. p. m. In many cases, high-speed substrate rotation is required, but in this case, since the substrate is merely placed on the tray, slippage occurs between the substrate and the tray, and the desired substrate rotation speed cannot be achieved. There is a problem. Therefore, the present invention provides a vacuum film forming container and a vacuum film forming container.
And a film forming pair having an opening communicating with the inside of the vacuum film forming container.
A load lock chamber for loading and unloading elephant substrates, and the vacuum
Placed in the membrane container, facing the opening of the load lock chamber
Supports the position for opening and closing the opening and the substrate for film formation.
Between the position facing the film formation position for forming a film on the substrate
A reciprocating substrate support tray and an opening facing the film forming position.
A film formation preventing cap provided around the film formation position.
A vacuum deposition container for the deposition target substrate, the
When loading / unloading the substrate support tray,
In the opening of the load lock chamber communicating with the inside of the vacuum deposition container
Close the opening with the substrate support tray,
A substrate for film formation is set on the tray through the lock chamber, and
Takes out the film-formed substrate from the substrate support tray and forms
When forming a film on the target substrate, the load lock chamber
The substrate to be deposited, which is set on the substrate support tray through
The entire substrate supporting tray is moved to a position facing the film forming position.
And place it at the film forming position, and rotate the tray at the film forming position.
A film forming apparatus that rotates the substrate to form a film.
Thus , the substrate can be rotated at a desired high speed during the film forming operation, and the load lock chamber of the substrate supporting tray is opened.
A first object of the present invention is to provide a film forming apparatus capable of more reliably preventing film deposition on a part involved in closing an opening (an opening communicating with the inside of a vacuum film forming container), a tray conveying mechanism, a rotary driving device, and the like. Subject.

Further, the present invention can solve the first problem, and can form a film on a substrate having a central hole by forming a film on a tray through the hole and a film on a peripheral portion of the hole of the substrate. A second object is to provide a film formation apparatus which can be performed while preventing a film.

[0018]

In order to solve the above-mentioned first problem, the present invention provides a vacuum film forming container and the vacuum film forming container.
Having an opening communicating with the inside of the vacuum film forming container.
And a load lock chamber for the film formation target substrate loading and unloading, the
An opening of the load lock chamber, which is disposed in a vacuum film forming container.
The position for opening and closing the opening facing the
A position facing a film forming position for supporting and forming a film on the substrate;
A substrate support tray can reciprocate between, on the film formation position
Film formation having an opening facing and provided around the film formation position
And a vacuum cover for the film formation target substrate.
When taking in and out of the membrane container,
Connecting the ray to the vacuum deposition chamber of the load lock chamber
Close the opening with the substrate support tray facing the opening,
Set the substrate to be deposited on the tray via the load lock chamber
Or take out the substrate after film formation from the substrate support tray.
When forming a film on the substrate to be formed,
Film deposition target installed on the substrate support tray via a lock chamber
Move the substrate together with the substrate support tray to a position facing the film forming position
The tray is moved and placed at the film forming position, and the tray is placed at the film forming position.
A film forming apparatus for forming a film by rotating the substrate by rotating
The load lock chamber is attached to the substrate support tray.
The opening together with the substrate supporting tray in contact with a peripheral portion of the opening;
The wearing the hermetic sealing elastic ring for closing hermetically, to the film forming position, the substrate is brought into contact with the peripheral portion of the substrate disposed on the installation has been <br/> said position on the substrate support tray A ring member for holding the substrate between the tray and the elastic ring for hermetic sealing of the tray supporting the tray in an airtight manner is provided, and the ring member is rotatably supported by the film formation preventing cover portion. Provided is a film forming apparatus characterized by including a mechanism for performing the above.

Further, in order to solve the second problem, the present invention provides the film forming apparatus, wherein a substrate having a central hole can be used as a film formation target substrate.
A film forming apparatus, comprising: a hole closing rotation member that covers a central hole of the substrate sandwiched between the substrate support tray and the ring member , contacts a peripheral portion of the hole, and rotates together with the substrate. I will provide a. In this case, it is conceivable that the hole closing rotation member is rotatably supported, for example, on a free end of an arm that is cantilevered by the cover.

In any of the film forming apparatuses, in order to reduce the impact on the substrate when the peripheral portion of the substrate is brought into contact with the ring member, a cushion such as an elastic rubber sheet is provided on the substrate mounting portion of the tray. It is conceivable to lay a sheet. In any of the film forming apparatuses,
As a simple mechanism for rotatably supporting the ring member on the cover portion, a mechanism including a ball bearing in which an outer ring is fixedly supported by the cover portion and an inner ring supports the ring member can be exemplified.

Preferably, the bearing is a covered bearing having a cover for covering between the inner and outer rings.

[0022]

According to the film forming apparatus of the present invention, the substrate disposed at the film forming position has its peripheral edge abutting on the ring member rotatably supported by the cover while being mounted on the tray supporting the substrate. The elastic ring for the hermetic seal is held between the ring member and the tray by elastically and airtightly contacting the ring member, and when the tray is rotated during the film forming operation, the elastic ring for the seal and The ring member is driven to rotate by the frictional force with the ring member, and thus the substrate is rotationally driven without slipping on the tray while being sandwiched between the ring member and the tray, and a desired high-speed rotation is achieved.

Further, since the elastic ring for hermetic sealing is in air-tight contact with the ring member, deposition of the film on the transfer mechanism of the tray and the portion of the rotary driving device is more reliably prevented than before, and the vacuum film forming vessel Of the load lock chamber communicating with
Filming on the surface of the elastic ring for hermetic sealing, which is involved in closing the opening , is also prevented, whereby the load rod by the tray is prevented.
The airtight closing of the lock chamber opening is also ensured.

In the case of a film forming apparatus for solving the second problem, for example, when a substrate having a center hole such as a substrate of a compact disk is supported by a tray and arranged at a film forming position,
As described above, the substrate is sandwiched between the ring member and the tray to achieve a desired high-speed rotation, to prevent film deposition on the tray transport mechanism, the tray rotation drive unit, and the like, and to open the load lock chamber side opening. In addition to preventing film deposition on the surface of the elastic ring for hermetic sealing on the tray involved in the hermetic closing of the substrate, the central hole of the substrate and its peripheral portion are covered with a hole closing rotating member that rotates following the rotation of the substrate. , And deposition on the tray through the hole is prevented.

[0025]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a cross-sectional view of a main part of one embodiment, particularly according to the present invention, and shows a state in which a substrate supporting tray is disposed immediately below a film forming position. FIG. 2 is a cross-sectional view of the same part as that shown in FIG. 1 and shows a state where a tray is arranged at a film forming position. FIG. 3 is a cross-sectional view showing another embodiment of the present invention, particularly showing a main part according to the present invention.

Although the film forming apparatus shown in FIGS. 1 and 2 is not shown in its entirety, it is an IBS film forming apparatus having the same structure as the conventional apparatus shown in FIGS. 4 and 5 except for the following points. . That is, the film forming apparatus has a vacuum film forming container 1 in which a load lock chamber 14 for loading and unloading the substrate S for film formation is connected. A first substrate supporting tray 2 serving as an inner lid for opening and closing an inner opening 142 communicating with the container, and supporting the tray to reciprocate from a position Q1 facing the inner opening 142 to a position Q2 facing the film forming position P. Transport device 3,
The second transport device 4 reciprocates the tray 2 disposed at the position Q1 from the first transport device 3 to the position Q3 at which the inner opening 142 is closed, and the first tray 2 disposed at the position Q2 facing the film forming position P. A third transporting device 5 for reciprocating from the transporting device 3 to the position P, a device 6 for rotating and driving the tray 2 disposed at the position P, and a cover for preventing film formation on other portions provided around the position P It has a part 130. Of course,
An ion source 12 and a sputter target 11 are also provided, and a vacuum exhaust device (not shown) is connected to the container 1. The load lock chamber 14 has an outer lid 1 for opening and closing the load lock chamber 14.
5, the exhaust pipe 143 and the vent pipe 144 are connected.

In the film forming apparatus shown in FIGS. 1 and 2, the same parts and portions as those in the conventional film forming apparatus shown in FIGS. 4 and 5 are denoted by the same reference numerals. In the film forming apparatus according to the present invention, unlike the conventional apparatus, instead of providing the hermetic sealing O-ring around the inner opening 142 of the load lock chamber 14, the periphery of the substrate supporting recess 21 of the substrate supporting tray 2 is replaced. An O-ring 20 for hermetic sealing is attached to the portion.

A circular ring member 7 is provided at the film forming position P, and is rotatably supported by the cover wall 130 via a support mechanism 8. The circular ring member 7 has a shallow step 71 abutting the upper surface of the peripheral portion of the substrate S on the lower surface of the inner peripheral portion, and has a flat lower surface 72 continuous with the step 71. The flat lower surface 72 is a portion where the O-ring 20 on the tray 2 is pressed.

The support mechanism 8 includes a ball bearing 81 with a cover. The upper and lower gaps between the outer ring 811 and the inner ring 812 are closed by a circular ring cover 813. The outer ring 811 of the bearing 81 has its outer peripheral surface and the lower surface held by a support member 911 having a circular ring shape, and a circular ring-shaped retainer fixed to the support member by screws 913.
The upper surface is pressed by the member 912. The support member 911 is fixed to the cover wall 130 with screws 914.

The inner ring 812 of the bearing 81 has its upper surface and inner peripheral surface held by a circular ring-shaped support member 915.
The ring member 7 is fixed to this member with screws 916. The upper surface of the rear portion 73 of the ring member 7 is formed as a shallow step, and the step is pressed against the lower surface of the inner ring 812. Thus, the ring member 7 is a ball bearing 8
1 and rotatably supported by the cover wall 130.

The upper concave portion 21 on which the substrate S of the tray 2 is placed is formed deeper than that of the conventional tray.
A cushion rubber sheet 24 is laid on the bottom.
According to the film forming apparatus according to the present invention described above, the procedure of carrying in the substrate S from outside the container 1, arranging it at the film forming position P, forming the film, and carrying out the substrate S out of the container after the film forming is completed. The operation of each part is the same as that of the conventional film forming apparatus shown in FIGS. 4 and 5 except for the points described below. Therefore, the detailed description is omitted here.

The difference from the conventional film forming apparatus is as follows. In other words, the substrate S, which is arranged at the position Q2, supported from below by the apparatus 5, and pushed up and arranged at the film forming position P, has its peripheral upper surface rotatable on the cover wall 130 by the support mechanism 8. Abuts against the inner peripheral step 71 of the ring member 7 supported by the airtight seal, while the hermetic sealing O-ring 20 mounted on the tray 2 supporting the substrate S elastically and airtightly contacts the flat lower surface 72 of the ring member 7. As a result, the tray 2 is held between the ring member 7 and the
Is rotated by the apparatus 6, the ring member 7 is driven to rotate by the frictional force between the sealing O-ring 20 and the ring member 7, and thus the substrate S is held between the ring member 7 and the tray 2. , Is rotated without slipping with respect to the tray 2, a desired high-speed rotation is achieved, and a film is uniformly formed on the substrate S.

Further, since the O-ring 20 is in air-tight contact with the ring member 7, deposition of the tray 2 on the transfer devices 3, 4, 5 and the rotary drive device 6 is more reliably prevented than before, and the load is reduced. Film formation on the surface of the hermetic sealing O-ring 20 on the tray involved in closing the lock chamber interior opening 142 is also prevented, whereby the load lock chamber interior opening 142 by the tray 2 is also securely sealed.

Further, since the cushion rubber sheet 24 is laid under the support substrate S on the tray 2, the impact on the substrate S when the substrate S is brought into contact with the ring member 7 is thereby alleviated. . Next, the film forming apparatus shown in FIG. 3 will be described. This apparatus has the same structure and operation as the film forming apparatus shown in FIGS. 1 and 2 except for the following points.

This film forming apparatus is suitable for forming a film on a substrate S1 having a central hole, such as a compact disk substrate. In this apparatus, in addition to the components of the apparatus shown in FIGS.
0 is provided. The member 10 includes the ball bearing 8
1 is fixed to a part 921a of a member 912 supporting the outer ring 811 with a screw 101, so that a free end of the arm 102 cantilevered on the cover wall 130 and a bearing 10
3, the substrate S1 is pushed up to the film forming position P and is sandwiched between the ring member 7 and the tray 2 so as to cover the central hole H of the substrate S1 and to form an upper peripheral portion thereof. Abut. Then, during film formation, the substrate S1 rotates following the rotation of the substrate S1.

In this way, deposition on the portion around the hole H and deposition on the tray 2 through the hole are prevented. The portion around the hole where the film is not formed can be used, for example, as a label sticking portion. Although the above-described embodiment apparatus is a film forming apparatus using ion beam sputtering, the present invention can be applied to a film forming apparatus such as an ion vapor deposition thin film formation (IVD) apparatus.

[0037]

As described above, according to the present invention, the true
An empty film formation container and the vacuum film formation container
Loading and unloading of a substrate to be formed having an opening communicating with the inside of the film container
And a load lock chamber for the vacuum deposition chamber
Opening and closing the opening facing the opening of the load lock chamber
To support the film formation target substrate and the film formation target substrate
Base that can reciprocate between the position facing the deposition position
A plate support tray, and an opening facing the film forming position;
A film formation prevention cover provided around the film position.
And putting the film formation target substrate into the vacuum film formation container.
When loading, load the substrate support tray into the load
Facing the opening communicating with the vacuum deposition chamber in the
Close the opening with a plate support tray and pass through the load lock chamber.
And place the substrate to be deposited on the tray, or support the substrate.
Remove the substrate after film formation from the tray and transfer it to the film formation target substrate
When forming the film, the above-mentioned through the load lock chamber
The substrate to be film-formed is set on the substrate support tray.
Each ray is moved to a position facing the film forming position,
By rotating the tray at the film forming position.
A film forming apparatus for forming a film by rotating the substrate, wherein the substrate can be reliably rotated at a desired high speed during the film forming operation, and a load lock chamber opening of the substrate support tray (vacuum film forming)
It is possible to provide a film forming apparatus that can more reliably prevent film deposition on a portion involved in closing the opening communicating with the inside of the container), a tray transport mechanism, a rotary driving device, and the like.

Further, according to the present invention, in addition to the above effect, film formation on a substrate having a central hole is prevented by forming a film on a tray through the hole and a film on a peripheral portion of the hole of the substrate. It is possible to provide a film forming apparatus which can be performed while performing.

[Brief description of the drawings]

FIG. 1 is a cross-sectional view of a main part of one embodiment of the present invention, particularly showing a state where a substrate support tray is disposed immediately below a film forming position.

FIG. 2 is a cross-sectional view of a main part of the embodiment shown in FIG. 1 particularly according to the present invention, showing a state where a substrate support tray is arranged at a film forming position.

FIG. 3 is a sectional view of a main part of another embodiment of the present invention.

FIG. 4 is an overall configuration diagram of a conventional film forming apparatus with a part omitted.

5 is a sectional view of a part of the device shown in FIG.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Vacuum film-forming container 11 Sputter target 12 Ion source 13, 130 Cover wall part 14 Load lock chamber 15 Outer lid S, S1 Substrate 2 Substrate support tray 21 Substrate mounting concave part 20 O-ring for airtight sealing 24 Cushion rubber sheet 3 First Transport device 311 Substrate support 4 Second transport device 41 Elevating tray support member 5 Third transport device 53 Elevating tray support member 6 Rotary drive device 7 Ring member 71 Substrate contact step of member 7 72 Member 7 O-ring contact flat surface 8 Ring member 7 support mechanism 81 Ball bearing 811 Bearing outer ring 812 Bearing inner ring 10 Hole closing and rotating member 102 Support arm of member 10 103 Bearing

Claims (2)

(57) [Claims] 1. A vacuum film forming container, wherein said vacuum film forming container is connected to said vacuum film forming container and communicates with said vacuum film forming container.
For loading and unloading the substrate to be formed having an opening that changes
A lock chamber, disposed in the vacuum film forming container,
Position for opening / closing the opening facing the opening and base for film formation
A position facing a film formation position for supporting a plate and forming a film on the substrate
A substrate support tray that can reciprocate between the substrate and an opening facing the film forming position, and is provided around the film forming position.
A film formation preventing cover portion, and taking the substrate for film formation into and out of the vacuum film formation container.
Before loading the substrate support tray into the load lock
The substrate support facing the opening communicating with the vacuum deposition chamber of the chamber.
Close the opening with the holding tray, and through the load lock chamber
Place the substrate to be deposited on the tray or
Take out the substrate after film formation from b) and carry out the load lock
Substrate to be deposited, which is set on the substrate support tray through a chamber
To the position facing the film formation position together with the substrate support tray
And place it at the film forming position, and rotate the tray at the film forming position.
By rotating the substrate, the substrate is rotated to form a film forming apparatus.
Oite, perimeter portion of the load lock chamber open to the substrate support tray
A hermetic sealing elastic ring for airtightly closing the opening together with the substrate support tray in close contact with the substrate support tray; And a ring member for holding the substrate between the tray by airtightly contacting the elastic ring for hermetic sealing of the tray supporting the substrate and holding the substrate between the tray and the film formation preventing cover portion. A film forming apparatus comprising a mechanism for rotatably supporting a ring member. 2. The film forming apparatus according to claim 1, wherein a substrate having a central hole can be used as a film forming target substrate, and the substrate supporting tray and the ring member are provided at the film forming position.
And a hole closing / rotating member that covers a central hole of the substrate sandwiched between the substrate and contacts a peripheral portion of the hole and rotates together with the substrate.