JP3058882B2 - Composition for temporary surface coating - Google Patents
Composition for temporary surface coatingInfo
- Publication number
- JP3058882B2 JP3058882B2 JP63025171A JP2517188A JP3058882B2 JP 3058882 B2 JP3058882 B2 JP 3058882B2 JP 63025171 A JP63025171 A JP 63025171A JP 2517188 A JP2517188 A JP 2517188A JP 3058882 B2 JP3058882 B2 JP 3058882B2
- Authority
- JP
- Japan
- Prior art keywords
- solder mask
- resin
- surface coating
- composition
- temporary surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title claims description 12
- 239000011248 coating agent Substances 0.000 title claims description 11
- 238000000576 coating method Methods 0.000 title claims description 11
- 229920005989 resin Polymers 0.000 claims description 24
- 239000011347 resin Substances 0.000 claims description 24
- 238000006116 polymerization reaction Methods 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 5
- 239000003112 inhibitor Substances 0.000 claims description 4
- 229910000679 solder Inorganic materials 0.000 description 29
- 238000000034 method Methods 0.000 description 18
- 239000010408 film Substances 0.000 description 16
- 239000008199 coating composition Substances 0.000 description 11
- 238000007650 screen-printing Methods 0.000 description 11
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- -1 -butylhydroquinone Chemical class 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 238000005476 soldering Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 3
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 2
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- NJVOHKFLBKQLIZ-UHFFFAOYSA-N (2-ethenylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C=C NJVOHKFLBKQLIZ-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- 150000005208 1,4-dihydroxybenzenes Chemical class 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 229920005692 JONCRYL® Polymers 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229920000180 alkyd Polymers 0.000 description 1
- CSDREXVUYHZDNP-UHFFFAOYSA-N alumanylidynesilicon Chemical compound [Al].[Si] CSDREXVUYHZDNP-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- GXCSNALCLRPEAS-CFYXSCKTSA-N azane (Z)-hydroxyimino-oxido-phenylazanium Chemical class N.O\N=[N+](/[O-])c1ccccc1 GXCSNALCLRPEAS-CFYXSCKTSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004202 carbamide Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- 239000013039 cover film Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- YPHMISFOHDHNIV-FSZOTQKASA-N cycloheximide Chemical compound C1[C@@H](C)C[C@H](C)C(=O)[C@@H]1[C@H](O)CC1CC(=O)NC(=O)C1 YPHMISFOHDHNIV-FSZOTQKASA-N 0.000 description 1
- 239000013530 defoamer Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- ZADYMNAVLSWLEQ-UHFFFAOYSA-N magnesium;oxygen(2-);silicon(4+) Chemical compound [O-2].[O-2].[O-2].[Mg+2].[Si+4] ZADYMNAVLSWLEQ-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Description
【発明の詳細な説明】 〔技術分野〕 本発明はプリント配線基板製造用はんだマスクを形成
するための一時的表面被覆用組成物に関する。Description: TECHNICAL FIELD The present invention relates to a temporary surface coating composition for forming a solder mask for manufacturing a printed wiring board.
最近、プリント配線板上に部品を搭載したプリント配
線板の実装において、実装の高密度化が急速に進んでい
る。特に最近注目を集めているVLSIを搭載したプリント
配線板および面実装技術による面実装基板の普及によ
り、プリント配線板の配線パターン板の細線パターン化
とはんだ付けランドの面積の縮小化が進んでいる。In recent years, in mounting a printed wiring board having components mounted on the printed wiring board, the density of mounting has been rapidly increasing. In particular, the spread of printed wiring boards equipped with VLSIs, which have recently attracted attention, and the use of surface-mounting boards with surface-mounting technology, has led to the progress of thinner wiring patterns on printed wiring boards and the reduction in the area of soldering lands. .
更に、これら高密度プリント配線板を大型化し、部品
の実装あるいは装置の効率化が進められている。Further, these high-density printed wiring boards have been increased in size, and the mounting of components or the efficiency of devices have been promoted.
しかし、このようなプリント配線板の微細パターン
化、大型化が進むにつれて、はんだマスクパターンの形
成に大きな問題が生じるようになった。それは、従来の
スクリーン印刷法により、はんだマスク用インキ(ソル
ダーレジストインキ)をプリント配線板上に印刷塗布し
てもパターン間隔が狭いためにインキがパターンの間に
入らなかったり、またスクリーンの目開きを大きくして
インキの出を多くしてインキをパターン間に入る様にす
ると、はんだ付けを必要とするスルホール内やはんだ付
けランドにはんだマスク用インキが付着したりして、前
者の場合は絶縁不良、後者の場合は、はんだ付け不良な
どを生じ、かつそれらの不良はパターンの高密度化およ
びプリント配線板の大型化により多数発生するようにな
った。However, as such printed wiring boards have become finer and larger, there has been a great problem in forming solder mask patterns. This is because even if the solder mask ink (solder resist ink) is printed and applied on the printed wiring board by the conventional screen printing method, the ink does not enter between the patterns due to the narrow pattern interval, and the screen openings If the ink is inserted between the patterns by increasing the size of the ink, the solder mask ink will adhere to the through holes and solder lands that require soldering. In the latter case, soldering defects and the like occur, and many of these defects occur due to the increase in the density of the pattern and the size of the printed wiring board.
これらの問題を解決する方法として、上記スクリーン
印刷法に代って1976年頃より、従来多層プリント配線板
の回路パターン形成法に採用されていた写真法(フォト
リソグラフィー法)によるはんだマスクパターンの形成
法が採用されるようになった。フォトリソグラフィー法
によるはんだマスクパターンの形成法には、プリント配
線板上に厚さ25μmのカバーフィルムと称する保護膜の
付いた感光膜を形成した後、保護膜上に厚さ170μmの
ネガ(またはポジ)フィルムを真空中で密着させて、露
光現像する方法(米国E.I.du Pontドライフィルムソル
ダーレジスト“バクレル”を使用する方法)と液状の感
光性膜をプリント配線板上に形成し、その液状の塗膜と
300μm〜1000μmの間隔でネガ(またはポジ)フィル
ムを置いて露光現像する方法(米国W.R.Grace社のアキ
ュトレース法)および感光性膜をプリント配線上に形成
した後、その感光性膜上に厚さ170μmのネガ(または
ポジ)フィルムを真空中で密着させて、露光現像する方
法(スイス国Ciba Geigy社のプロビマー法)などがあ
る。As a method of solving these problems, a solder mask pattern forming method using a photographic method (photolithography method) which has been employed in the circuit pattern forming method of a multilayer printed wiring board since about 1976 instead of the above screen printing method. Came to be adopted. A method of forming a solder mask pattern by photolithography involves forming a photosensitive film with a protective film called a cover film having a thickness of 25 μm on a printed wiring board, and then forming a negative (or positive) film having a thickness of 170 μm on the protective film. ) Adhesion of the film in a vacuum, exposure and development (using EIdu Pont dry film solder resist "Bacrel") and liquid photosensitive film formed on the printed wiring board and the liquid coating When
A method of exposing and developing by placing a negative (or positive) film at an interval of 300 μm to 1000 μm (Accutrace method of WRGrace, USA) and forming a photosensitive film on printed wiring, and then forming a 170 μm thick film on the photosensitive film A negative (or positive) film is adhered in a vacuum and exposed and developed (Provimer method of Ciba Geigy, Switzerland).
しかし、これらの写真法によるはんだマスク形成法は
露光に用いる光の照度が低く、露光に要する時間が長く
かかったり、パターンの解像度を良くするために光線の
平行度を向上させた露光機を使用する必要があったりし
て、生産性の面と設備投資費用の面で大きな問題となっ
ている。However, the solder mask forming method using these photographic methods requires low exposure of light used for exposure and takes a long time for exposure, and uses an exposure machine that improves the parallelism of light beams to improve pattern resolution. This has become a major problem in terms of productivity and capital investment costs.
本発明は従来のスクリーン印刷方式で高解像性のPCB
製造用はんだマスクパターンの形成を可能とする一時的
表面被覆用組成物である。The present invention is based on the conventional screen printing method and high resolution PCB.
This is a temporary surface coating composition that enables the formation of a manufacturing solder mask pattern.
本発明者は前記目的を達成するために鋭意研究した結
果アルカリ可溶性又は溶剤可溶性樹脂(a)、重合禁止
剤(b)および溶剤(c)を主成分とする一時的表面被
覆溶組成物を見出し、従来のスクリーン印刷方式で高解
像性のPCB製造用はんだマスクを容易に形成できること
を確証した。The present inventor has conducted intensive studies to achieve the above object, and as a result, has found a temporary surface coating solution composition mainly composed of an alkali-soluble or solvent-soluble resin (a), a polymerization inhibitor (b) and a solvent (c). It has been confirmed that a high-resolution solder mask for manufacturing a PCB can be easily formed by a conventional screen printing method.
すなわち、導体回路が形成されたプリント配線板上の
はんだ付け部にあらかじめ本発明の一時的表面被覆用組
成物ではんだマスクの逆パターン画像を形成し、次に光
硬化型はんだマスク組成物を前記パターンを含めプリン
ト配線板の全面又は必要部分に直接塗布して、その上か
ら光を照射し、しかる後に溶剤又はアルカリ水溶液で現
像処理を施してプリント配線板上にはんだマスクパター
ンを形成する方法が提供できるものとなった。That is, a reverse pattern image of a solder mask is formed in advance on the soldering portion on the printed wiring board on which the conductive circuit is formed with the temporary surface coating composition of the present invention, and then the photocurable solder mask composition is coated A method in which a solder mask pattern is formed on a printed wiring board by directly applying light to the entire surface or a required portion of the printed wiring board including a pattern, irradiating light from above, and then performing development processing with a solvent or an aqueous alkali solution. It can be provided.
本発明の一時的表面被覆用組成物を用いればいずれも
スクリーン印刷と同等以上の生産性が得られ、かつ従来
のスクリーン印刷法より解像度が良好であり、しかも設
備投資面でもスクリーン法に現像設備を追加した程度の
設備で済むでの巨額の投資をする必要はない。By using the composition for temporary surface coating of the present invention, productivity equal to or higher than screen printing can be obtained, and resolution is better than conventional screen printing. There is no need to invest in a huge amount of equipment just by adding facilities.
本発明の一時的表面被覆用組成物における樹脂成分
は、該組成物が形成している塗膜が溶剤又は低濃度のア
ルカリ水溶液によって溶解あるいは膨潤して、該塗膜が
きれいに除去できる性質のものであればいずれの樹脂成
分も使用することができる。溶剤可溶性樹脂として、フ
ェノール系、キシレン系、尿素系、メラミン系、エポキ
シ系、アルキッド系、ビニル系、アクリル系、塩化ゴム
系、環化ゴム系、ポリアミド系、テルペン系、ブチラー
ル系、ケトン系及びセルロース誘導体などを挙げられる
がビニル系、ゴム系及びセルロース誘導体などの熱可塑
性樹脂が好ましい。The resin component in the temporary surface coating composition of the present invention has such a property that the coating film formed by the composition is dissolved or swelled by a solvent or a low-concentration aqueous alkaline solution and the coating film can be removed cleanly. If so, any resin component can be used. Solvent-soluble resins include phenolic, xylene, urea, melamine, epoxy, alkyd, vinyl, acrylic, chloride rubber, cyclized rubber, polyamide, terpene, butyral, ketone and Cellulose derivatives and the like can be mentioned, but thermoplastic resins such as vinyl-based, rubber-based and cellulose derivatives are preferred.
又アルカリ可溶性樹脂として、ノボラック樹脂、ロジ
ン樹脂、ロジン変性樹脂、及びカルボキシル含有重合体
などがある。これらの樹脂は同時に溶剤可溶性であり全
て好ましい。Examples of the alkali-soluble resin include a novolak resin, a rosin resin, a rosin-modified resin, and a carboxyl-containing polymer. These resins are simultaneously solvent-soluble and are all preferred.
ロジン変性樹脂とは、ロジン変性マレイン酸樹脂で代
表される樹脂で、通常、ロジンに酸やアルコールを反応
させて変性させたものである。The rosin-modified resin is a resin represented by a rosin-modified maleic resin, and is usually a resin modified by reacting rosin with an acid or alcohol.
カルボキシル基含有重合体とは重合体鎖にカルボキシ
ル基を含有するもので、アクリル酸、メタクリル酸、マ
レイン酸などの単量体の重合体又は共重合体、アクリル
酸エステル、メタクリル酸エステルの重合体又は共重合
体などを挙げることができる。市販のものとしてはジョ
ンソン社製JONCRYL(スチレン−アクリレート共重合
体)、アルコ・ケミカル社製SMA(スチレン−マレイン
酸共重合体)などがある。Carboxyl group-containing polymer is a polymer containing a carboxyl group in the polymer chain, acrylic acid, methacrylic acid, a polymer or copolymer of monomers such as maleic acid, acrylic acid ester, polymer of methacrylic acid ester Or a copolymer. Commercially available products include JONCRYL (styrene-acrylate copolymer) manufactured by Johnson Corporation and SMA (styrene-maleic acid copolymer) manufactured by Alco Chemical Company.
ノボラック樹脂とはアルカリ水溶液に可溶なフェノー
ル樹脂、クレゾーン樹脂及びアルキルフェノール樹脂を
いう。The novolak resin refers to a phenol resin, a crezone resin, and an alkylphenol resin that are soluble in an aqueous alkaline solution.
次に重合禁止剤(b)の代表的なものとしては、ハイ
ドロキノンp−t−ブチルカテコールもしくはモノ−t
−ブチルハイドロキノンなどのハイドロキノン類、ハイ
ドロキノンモノメチルエーテルもしくはジ−t−ブチル
−p−クレゾールなどのフェノール類、p−ベンゾキナ
ン、ナフトキノン、もしくはp−トルキノンなどのキノ
ン類、あるいはN−ニトロソフェニルヒドロキシルアミ
ンのアンモニウム塩やそのアルミニウム、銅、亜鉛等の
キレート、ナフテン酸銅の如き銅塩などを挙げることが
できる。樹脂(a)と重合禁止剤(b)の配合比率は重
量比95:5〜5:95で好ましくは65:35〜35:65、とくに好ま
しくは50:50である。樹脂(a)が多いと重合禁止効果
が悪くはんだマスクの現像時に強い機械研磨を併用して
画像を形成する必要が生じるためはんだマスクの表面に
深い傷が入り塗膜の信頼性が低下する。また樹脂が少な
いとスクリーン印刷適性が失なわれると共に一時的表面
被覆組成物のアルカリ可溶に時間を費やし生産性が劣
る。Next, typical examples of the polymerization inhibitor (b) include hydroquinone pt-butylcatechol or mono-t.
Hydroquinones such as -butylhydroquinone, phenols such as hydroquinone monomethyl ether or di-t-butyl-p-cresol, quinones such as p-benzoquinane, naphthoquinone or p-toluquinone, or ammonium N-nitrosophenylhydroxylamine Salts and chelates thereof, such as aluminum, copper and zinc, and copper salts such as copper naphthenate, can be mentioned. The mixing ratio of the resin (a) and the polymerization inhibitor (b) is 95: 5 to 5:95 by weight, preferably 65:35 to 35:65, and particularly preferably 50:50. When the amount of the resin (a) is large, the polymerization inhibiting effect is poor and an image needs to be formed by using strong mechanical polishing in developing the solder mask. Therefore, the surface of the solder mask is deeply scratched and the reliability of the coating film is reduced. When the amount of the resin is too small, the suitability for screen printing is lost, and at the same time, it takes time to dissolve the alkali in the temporary surface coating composition, resulting in poor productivity.
溶剤(c)は樹脂(a)を溶解するものであり、使用
する樹脂に対応する公知の有機溶剤が使用される。代表
的にはトルエン、キシレンなどの芳香族炭化水素、メタ
ノール、エタノールなどのアルコール類、酢酸エチル、
酢酸ブチルなどのエステル類、1,4ジオキサン、テトラ
ヒドロフランなどのエーテル類、メチルエチルケトンな
どのケトン類、セロソルブ、セロソルブアセテート、カ
ルビトールなどのグリコール誘導体などが挙げられる。
これらの有機溶剤の含有量は特に制限されないが10〜40
%が好ましい。The solvent (c) dissolves the resin (a), and a known organic solvent corresponding to the resin to be used is used. Typically, toluene, aromatic hydrocarbons such as xylene, methanol, alcohols such as ethanol, ethyl acetate,
Examples include esters such as butyl acetate, ethers such as 1,4 dioxane and tetrahydrofuran, ketones such as methyl ethyl ketone, and glycol derivatives such as cellosolve, cellosolve acetate and carbitol.
The content of these organic solvents is not particularly limited, but 10 to 40
% Is preferred.
さらに本発明一時的表面被覆組成物のスクリーン印刷
適性を付与するために充填剤として二酸化ケイ素、ケイ
素アルミニウム、ケイ酸マグネシウム、水酸化アルミニ
ウム、硫酸バリウムなど一般の樹脂充填剤として使用さ
れているものを使用する。その使用量は(a)(b)
(c)の合計量に対し、3〜90%、望ましくは10〜30%
であり、かつその平均粒径は15μ以下のものが好まし
い。Further, as a filler for imparting screen printability of the temporary surface coating composition of the present invention, those used as general resin fillers such as silicon dioxide, silicon aluminum, magnesium silicate, aluminum hydroxide, and barium sulfate. use. The amount used is (a) (b)
3 to 90%, preferably 10 to 30%, based on the total amount of (c)
And the average particle size is preferably 15 μm or less.
その他本発明の組成物には通常スクリーン印刷用レジ
ストが使用されている各種添加物、例えば充填剤、チキ
ットロピー剤、レベリング剤、着色剤、消泡剤(例えば
弗素系界面活性剤)を添加することができる。In addition to the composition of the present invention, various additives usually used for screen printing resists, for example, fillers, chiquity agents, leveling agents, coloring agents, defoaming agents (for example, fluorine-based surfactants) may be added. Can be.
次に本発明の実施例を示す。ここに示す実施例は本発
明の実施態様を示すものであり、これによって限定され
るものではない。実施例の〔%〕は〔重量%〕である。Next, examples of the present invention will be described. The examples shown here illustrate embodiments of the present invention and are not intended to be limiting. [%] In the examples is [% by weight].
実施例1 ロジン変性マレイン酸樹脂 34.0% ハイドロキノン 20.0 ブチルセロソルブ 22.0 コロイダルシリカ(日本アエロジール社製、アエロジ
ール#300) 4.0 バリファストブルー(着色剤) 3.0 タルク(平均粒子径10μ) 15.0 弗素系界面活性剤(住友スリーエム社製フロラードFC
−430) 2.0 上記配合で一時的表面被覆用組成物を調製した。Example 1 Rosin-Modified Maleic Resin 34.0% Hydroquinone 20.0 Butyl Cellosolve 22.0 Colloidal Silica (Aerilil # 300, manufactured by Nippon Aerosil Co., Ltd.) 4.0 Varifast Blue (colorant) 3.0 Talc (average particle diameter 10μ) 15.0 Fluorosurfactant (Sumitomo) 3M Florard FC
-430) 2.0 A temporary surface coating composition was prepared with the above formulation.
本発明の組成物をエッチング加工されたプリント配線
板の銅箔上にはんだマスクの逆パターンでスクリーン印
刷し乾燥する。次にはんだマスク形成のために従来公知
のラジカル重合可能なエチレン性二重結合を感光成分と
するはんだマスク(エポキシアクリレート系タムラ化研
製USR−2G)をスクリーン印刷方法を用いて前記パター
ンを含めて全面に直接印刷する。印刷後スクリーン印刷
で作用される紫外線照射装置(照度300mW/cm2)で3秒
間露光しはんだマスクを硬化する。ここで形成されるは
んだマスクの感光性膜はエチレン性二重結合を有する不
飽和基を含有するので一時的表面被覆用組成物のパター
ンと接する部分は露光しても硬化しない。The composition of the present invention is screen-printed on an etched copper foil of a printed wiring board with a reverse pattern of a solder mask and dried. Next, a solder mask (epoxy acrylate based Tamura Kaken USR-2G) using a conventionally known radical polymerizable ethylenic double bond as a photosensitive component is formed using a screen printing method for forming the solder mask. Print directly on the entire surface. After printing, the solder mask is cured by exposing for 3 seconds with an ultraviolet irradiation device (illuminance: 300 mW / cm 2 ) operated by screen printing. Since the photosensitive film of the solder mask formed here contains an unsaturated group having an ethylenic double bond, the portion in contact with the pattern of the temporary surface coating composition does not cure even when exposed.
次に、5%水酸化ナトリウム水溶液で現像すると一時
的表面被覆用組成物と接するはんだマスク及び一時的表
面被覆用組成物は室温では15秒程度で除去されはんだマ
スクの画像が得られた。現像後、後硬化を必要としない
が紫外線硬化又は熱硬化を併用しても良い。Next, when developed with a 5% aqueous sodium hydroxide solution, the solder mask in contact with the temporary surface coating composition and the temporary surface coating composition were removed at room temperature in about 15 seconds, and an image of the solder mask was obtained. After development, post-curing is not required, but ultraviolet curing or heat curing may be used in combination.
比較例1 実施例1においてハイドロキノン20%を1%に変えて
一時的表面被覆用組成物を調製し同様に5%水酸化ナト
リウム水溶液で現像したが、はんだマスクの画像は形成
されなかった。COMPARATIVE EXAMPLE 1 A temporary surface coating composition was prepared in the same manner as in Example 1 except that hydroquinone was changed from 20% to 1%, and similarly developed with a 5% aqueous sodium hydroxide solution, but no solder mask image was formed.
実施例2 スチレン−アクリレート樹脂 38.0% パラメトキシフェノール 15.0 フタロシアニンブルー 2.0 アエロジール#300 10.0 シリコーン系消泡剤 2.0 テトラリン 10.0 ブチルセロソルブ 23.0 上記配合で一時的表面被覆用組成物を調製した。Example 2 Styrene-acrylate resin 38.0% Paramethoxyphenol 15.0 Phthalocyanine blue 2.0 Aeriel # 300 10.0 Silicone defoamer 2.0 Tetraline 10.0 Butyl cellosolve 23.0 A composition for temporary surface coating was prepared with the above composition.
本発明を実施例1と同様に銅箔上に印刷後はんだマス
クをスプレーコーティングし全面に塗工した。塗工後UV
炉で3秒間露光しはんだマスクを硬化した。次に塩化メ
チレンで現像し12秒ではんだマスクの画像が得られた。After printing the present invention on a copper foil in the same manner as in Example 1, a solder mask was spray-coated and applied over the entire surface. UV after coating
Exposure was performed in a furnace for 3 seconds to cure the solder mask. Next, it was developed with methylene chloride and an image of the solder mask was obtained in 12 seconds.
以上のとおり本発明の一時的表面被覆用組成物を使用
することにより、従来のスクリーン印刷法と生産性では
同等でありながら解像性においてははるかに高いはんだ
マスクの形成が可能となった。As described above, by using the composition for temporary surface coating of the present invention, it is possible to form a solder mask which is equivalent in productivity to a conventional screen printing method but has much higher resolution.
───────────────────────────────────────────────────── フロントページの続き (56)参考文献 特開 昭61−264783(JP,A) 特開 昭62−45677(JP,A) 特公 昭60−30243(JP,B2) (58)調査した分野(Int.Cl.7,DB名) H05K 3/28 C09D 5/20 ──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-61-264783 (JP, A) JP-A-62-45677 (JP, A) JP-B-60-30243 (JP, B2) (58) Field (Int.Cl. 7 , DB name) H05K 3/28 C09D 5/20
Claims (1)
(a)、重合禁止剤(b)および溶剤(c)を主成分と
する一時的表面被覆用組成物。1. A composition for temporary surface coating comprising as a main component an alkali-soluble or solvent-soluble resin (a), a polymerization inhibitor (b) and a solvent (c).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63025171A JP3058882B2 (en) | 1988-02-05 | 1988-02-05 | Composition for temporary surface coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63025171A JP3058882B2 (en) | 1988-02-05 | 1988-02-05 | Composition for temporary surface coating |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01200695A JPH01200695A (en) | 1989-08-11 |
| JP3058882B2 true JP3058882B2 (en) | 2000-07-04 |
Family
ID=12158558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63025171A Expired - Fee Related JP3058882B2 (en) | 1988-02-05 | 1988-02-05 | Composition for temporary surface coating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3058882B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6347687B2 (en) * | 2014-07-11 | 2018-06-27 | マクセルホールディングス株式会社 | Resist composition, method for producing transparent conductive pattern sheet using the same, and transparent conductive pattern sheet |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6030243A (en) * | 1983-07-28 | 1985-02-15 | Sharp Corp | Automatic dialing device with recording function |
| JPS61264783A (en) * | 1985-05-19 | 1986-11-22 | 日本シイエムケイ株式会社 | Printed wiring board and manufacture thereof |
| JPS6245677A (en) * | 1985-08-26 | 1987-02-27 | Taniguchi Ink Seizo Kk | Surface drying inhibitor for printing ink and method therefor |
-
1988
- 1988-02-05 JP JP63025171A patent/JP3058882B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01200695A (en) | 1989-08-11 |
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