JP3061573B2 - Manufacturing method of multilayer ceramics - Google Patents
Manufacturing method of multilayer ceramicsInfo
- Publication number
- JP3061573B2 JP3061573B2 JP8240652A JP24065296A JP3061573B2 JP 3061573 B2 JP3061573 B2 JP 3061573B2 JP 8240652 A JP8240652 A JP 8240652A JP 24065296 A JP24065296 A JP 24065296A JP 3061573 B2 JP3061573 B2 JP 3061573B2
- Authority
- JP
- Japan
- Prior art keywords
- rare earth
- layer
- silicon carbide
- oxide
- earth oxide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Laminated Bodies (AREA)
- Ceramic Products (AREA)
Description
【0001】[0001]
【発明の属する技術分野】本発明は、強度等の機械的性
質に優れ、高温下での耐酸化性、耐食性も備えた機械部
品材料及び構造材料として好適なセラミックスの製造に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the production of ceramics which are excellent in mechanical properties such as strength, and which are excellent in oxidation resistance and corrosion resistance at high temperatures, and which are suitable as a mechanical component material and a structural material.
【0002】[0002]
【従来の技術】炭化珪素(SiC)セラミックスは、耐
熱性、耐熱衝撃性及び耐クリープ特性に優れ、又、酸化
性雰囲気下で表面に酸化皮膜が形成されて天然の保護膜
として働くため、耐酸化性にも優れている。このため、
ガスタービンや自動車エンジン等の機械部品用材料とし
て利用が期待されている。しかし、1500℃を越える
ような高温環境下では、環境温度と酸化珪素の融点が近
いために、もはや保護膜としての作用は期待できず、酸
化の進行による劣化は避けられない。2. Description of the Related Art Silicon carbide (SiC) ceramics have excellent heat resistance, thermal shock resistance and creep resistance, and have an oxide film formed on the surface in an oxidizing atmosphere to act as a natural protective film. Also excellent in chemical properties. For this reason,
It is expected to be used as a material for mechanical parts such as gas turbines and automobile engines. However, in a high-temperature environment exceeding 1500 ° C., since the ambient temperature is close to the melting point of silicon oxide, the effect as a protective film can no longer be expected, and deterioration due to the progress of oxidation cannot be avoided.
【0003】[0003]
【発明が解決しようとする課題】そこで、炭化珪素セラ
ミックスの表面に高温環境下でも保護膜として作用し得
る酸化物層を形成することにより高温での使用に耐える
機械部品材料となることが予想される。Therefore, it is anticipated that forming an oxide layer which can act as a protective film even in a high temperature environment on the surface of silicon carbide ceramics will result in a mechanical component material that can withstand use at high temperatures. You.
【0004】ところが、通常、非酸化物セラミックスと
酸化物セラミックスとの接合・一体化は難しく、接合し
ようとしてもすぐに分離する。又、接合した場合であっ
ても、一体化操作に加熱処理を伴うことによって、両者
の物性の差、特に熱膨張係数の差から、冷却過程におい
て両者に引っ張りあるいは圧縮の残留応力が生じて亀裂
の発生を招くことが多い。従って、従来の手法では炭化
珪素セラミックスと酸化物層との一体化は難しい。However, it is usually difficult to join / integrate non-oxide ceramics and oxide ceramics, and even if they are joined, they are separated immediately. Also, even in the case of joining, the heat treatment accompanying the integration operation causes tensile or compressive residual stress to occur in the cooling process due to the difference in physical properties between the two, especially the difference in the coefficient of thermal expansion, and the cracks Often occurs. Therefore, it is difficult to integrate the silicon carbide ceramic and the oxide layer by the conventional method.
【0005】本発明は、この様な従来技術の課題を解決
するためになされたもので、強度及び耐熱性に優れ、高
温下での酸化及び腐食に充分対応可能な機械部品材料を
提供することを目的とするものである。The present invention has been made in order to solve such problems of the prior art, and provides a mechanical component material which has excellent strength and heat resistance and can sufficiently cope with oxidation and corrosion at high temperatures. It is intended for.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するため
に、本発明者らは鋭意研究を重ねた結果、炭化珪素を主
成分とするセラミックスと希土類元素の珪酸化合物の層
とが一体化された積層セラミックスを好適に製造でき、
高温下での使用に十分対応できることを見いだし、本発
明の積層セラミックスの製造方法を発明するに至った。Means for Solving the Problems In order to achieve the above-mentioned object, the present inventors have conducted intensive studies, and as a result, a ceramic having silicon carbide as a main component and a layer of a silicate compound of a rare earth element have been integrated. Laminated ceramics can be suitably manufactured,
They have found that they can sufficiently cope with use at high temperatures, and have invented a method for producing a laminated ceramic of the present invention.
【0007】本発明の積層セラミックスの製造方法は、
炭化珪素を含有する第1層に、一般式:RE2 O3 (式
中のREは、Y,Yb,Er及びDyからなる群より選
ばれる希土類元素を示す)で表される希土類酸化物を含
有する第2層を積層して積層体を形成し、該積層体を酸
化性雰囲気中で加熱することによって該第1層の炭化珪
素を酸化して酸化珪素を生成し該第2層の希土類酸化物
と該酸化珪素とから一般式:RE2 SiO5 (式中のR
Eは、Y,Yb,Er及びDyからなる群より選ばれる
希土類元素を示す)で表される希土類珪酸化合物を生成
することを要旨とする。[0007] The method for producing a laminated ceramic of the present invention comprises:
In the first layer containing silicon carbide, a rare earth oxide represented by a general formula: RE 2 O 3 (wherein RE represents a rare earth element selected from the group consisting of Y, Yb, Er and Dy) The second layer is laminated to form a laminate, and the laminate is heated in an oxidizing atmosphere to oxidize the silicon carbide of the first layer to produce silicon oxide and to form a rare earth element of the second layer. From the oxide and the silicon oxide, a general formula: RE 2 SiO 5 (R in the formula)
E represents a rare earth element selected from the group consisting of Y, Yb, Er and Dy).
【0008】前記積層体の形成は、前記第1層を希土類
酸化物の分散液中に投入して電気泳動により該第1層の
表面に希土類酸化物を付着することによってなされ、該
積層体の加熱は1400〜1700℃で行われる。[0008] The formation of the laminate is performed by charging the first layer into a rare earth oxide dispersion and attaching the rare earth oxide to the surface of the first layer by electrophoresis. Heating is performed at 1400-1700 ° C.
【0009】更に、前記第1層は、炭化珪素を含有する
粉末を成形し焼結して得られる焼結体層であり、前記積
層体の加熱によって、厚さ100μm以下の希土類珪酸
化合物層又は希土類珪酸化合物と希土類酸化物とを含ん
だ層を形成する上記方法によって、希土類元素の珪酸化
合物の層が炭化珪素の表面に良好に形成され、希土類元
素の珪酸化合物によって炭化珪素の酸化が防止されるこ
とにより、得られる積層セラミックスは高温での強度と
耐酸化性、耐腐食性を兼ね備える。又、炭化珪素と希土
類元素の珪酸化合物とは熱膨張係数値が近いため、層間
に生じる残留応力が低く、亀裂の発生が防止され、ガス
タービンや自動車エンジン等の高温に晒される機械部品
としての使用に耐える性能を備える。Further, the first layer is a sintered body layer obtained by molding and sintering a powder containing silicon carbide, and the rare earth silicate compound layer having a thickness of 100 μm or less is formed by heating the laminated body. By the above method of forming a layer containing a rare earth silicate compound and a rare earth oxide, a layer of a rare earth silicate compound is favorably formed on the surface of silicon carbide, and oxidation of silicon carbide is prevented by the rare earth silicate compound. As a result, the obtained laminated ceramic has both high-temperature strength, oxidation resistance, and corrosion resistance. In addition, since silicon carbide and a silicate compound of a rare earth element have similar thermal expansion coefficients, the residual stress generated between the layers is low, cracks are prevented, and the mechanical parts such as gas turbines and automobile engines are exposed to high temperatures. It has the performance to withstand use.
【0010】[0010]
【発明の実施の形態】炭化珪素は、高温強度に優れるセ
ラミックスであり、高温での耐酸化性、耐食性が改善さ
れれば好適な機械部品材料となる。この改善は、耐酸化
性、耐食性を有する酸化物セラミックスで炭化珪素表面
を被覆することにより実現され、この目的のための酸化
物として、複合酸化物である希土類元素の珪酸化合物:
RE2SiO5 (式中のREは、Y,Yb,Er及びD
yからなる群より選ばれる希土類元素を示す)が適して
いることを本発明者らは見出した。上記希土類元素の珪
酸化合物:RE2 SiO5 (以下、本願においては単に
シリケートと称する)は耐熱性に優れ熱膨張係数が炭化
珪素と近く、熱膨張挙動が類似している。但し、炭化珪
素とシリケートとは、接触させて加熱しても接合され
ず、同時焼結によっても一体化しない。つまり、単に加
熱処理するだけではこれらを一体化した積層物を得るこ
とはできない。BEST MODE FOR CARRYING OUT THE INVENTION Silicon carbide is a ceramic excellent in high-temperature strength, and if it is improved in oxidation resistance and corrosion resistance at high temperatures, it is a suitable material for mechanical parts. This improvement is realized by coating the surface of silicon carbide with an oxide ceramic having oxidation resistance and corrosion resistance. As an oxide for this purpose, a silicate compound of a rare earth element which is a composite oxide:
RE 2 SiO 5 (where RE is Y, Yb, Er and D
The present inventors have found that a rare earth element selected from the group consisting of y is suitable. The above-mentioned rare earth silicate compound: RE 2 SiO 5 (hereinafter simply referred to as silicate in the present application) has excellent heat resistance, has a thermal expansion coefficient close to that of silicon carbide, and is similar in thermal expansion behavior. However, the silicon carbide and the silicate are not joined even if they are brought into contact and heated, and they are not integrated by simultaneous sintering. That is, it is not possible to obtain a laminate in which these are integrated by simply performing the heat treatment.
【0011】本発明は、炭化珪素とシリケートとが接合
された積層セラミックスを製造するために、希土類酸化
物と酸化珪素(SiO2 )との反応を利用してシリケー
トを生成するもので、炭化珪素表面に希土類酸化物層を
形成した後に、炭化珪素表面を酸化させて酸化珪素を生
成することによって、生成した酸化珪素と希土類酸化物
との反応によってシリケートを含有する層を形成する。
これによって、両層が十分な強度で接合され、熱膨張挙
動の差に起因する残留応力の問題がなく高温での使用に
耐えられる積層セラミックスが得られる。希土類酸化物
は多種存在するが、一般式:RE2 O3 (式中のRE
は、Y,Yb,Er及びDyからなる群より選ばれる希
土類元素を示す)で表される希土類酸化物が特に適して
いる。According to the present invention, a silicate is produced by utilizing a reaction between a rare earth oxide and silicon oxide (SiO 2 ) in order to produce a laminated ceramic in which silicon carbide and silicate are joined. After forming the rare earth oxide layer on the surface, the silicon carbide surface is oxidized to generate silicon oxide, and thereby a layer containing silicate is formed by a reaction between the generated silicon oxide and the rare earth oxide.
As a result, the two layers are joined with sufficient strength, and a laminated ceramic that can withstand use at high temperatures without a problem of residual stress caused by a difference in thermal expansion behavior can be obtained. Although there are many kinds of rare earth oxides, a general formula: RE 2 O 3 (wherein RE
Represents a rare earth element selected from the group consisting of Y, Yb, Er and Dy).
【0012】以下、本発明をさらに詳細に説明する。Hereinafter, the present invention will be described in more detail.
【0013】まず、常法に従って製造される炭化珪素焼
結体の表面にシリケート層を形成するために、炭化珪素
焼結体に希土類酸化物層を積層して被覆する。積層され
る希土類酸化物層の厚さは、次の段階において希土類酸
化物層を通じて内部の炭化珪素を酸化するために、雰囲
気中の酸素が炭化珪素層に達し得る程度の厚さである必
要がある。希土類酸化物層の積層方法については特に限
定する必要はなく、希土類酸化物のペーストを塗布する
ことによっても可能であるが、本発明において特に有効
なのは、電気泳動効果を利用する積層方法である。電気
泳動による積層は数百μm以下の薄い層を好適に形成で
きる方法で、これにより形成される希土類酸化物層を通
して炭化珪素の酸化は十分に進行する。炭化珪素セラミ
ックスは導電性であるので、電気泳動法を利用した積層
を行うことができる。First, in order to form a silicate layer on the surface of a silicon carbide sintered body manufactured according to a conventional method, a rare earth oxide layer is laminated and coated on the silicon carbide sintered body. The thickness of the laminated rare earth oxide layer must be such that oxygen in the atmosphere can reach the silicon carbide layer in order to oxidize the internal silicon carbide through the rare earth oxide layer in the next stage. is there. The method for laminating the rare-earth oxide layer is not particularly limited, and can be applied by applying a paste of a rare-earth oxide. Particularly effective in the present invention is a lamination method utilizing an electrophoretic effect. The lamination by electrophoresis is a method capable of suitably forming a thin layer having a thickness of several hundred μm or less, and the oxidation of silicon carbide sufficiently proceeds through the rare earth oxide layer formed thereby. Since silicon carbide ceramics is conductive, lamination using electrophoresis can be performed.
【0014】図1に示すように、希土類酸化物の粉末P
をエタノールに分散させた分散液1に電極3,5を投入
して直流電源7により電圧を印加すると陰極側の電極3
の方へ希土類酸化物粉末Pが移動し付着する。従って、
電気泳動による希土類酸化物の積層は、希土類酸化物粉
末を分散させた分散液に炭化珪素焼結体を投入し、炭化
珪素焼結体に負電圧を印加することによって行われる。
これを実際に行う装置としては、例えば、図2のような
ものが挙げられる。この装置10は電着槽11と環状電
極13と直流電源15とを備え、希土類酸化物の粉末P
をアルコール等の分散媒に分散させた分散液17が電着
槽11中に投入される。直流電源15の陽極に接続させ
た環状電極13を分散液17中に浸し、直流電源15の
陰極に接続させた炭化珪素焼結体Sを環状電極13の中
央に据えて電圧を印加する。これにより、希土類酸化物
の粉末Pは炭化珪素焼結体Sに引き寄せられ表面に付着
し、希土類酸化物の層が積層される。これを乾燥して積
層体が得られる。使用する分散媒によっては正極側に希
土類酸化物が積層される場合もあるので、印加電圧の正
負は分散媒等を考慮して適宜設定する。As shown in FIG. 1, powder P of rare earth oxide
When the electrodes 3 and 5 are put into a dispersion liquid 1 in which ethanol is dispersed in ethanol, and a voltage is applied by a DC power supply 7,
, The rare earth oxide powder P moves and adheres. Therefore,
Lamination of the rare earth oxide by electrophoresis is performed by charging the silicon carbide sintered body into a dispersion liquid in which the rare earth oxide powder is dispersed, and applying a negative voltage to the silicon carbide sintered body.
As an apparatus for actually performing this, for example, the apparatus shown in FIG. This apparatus 10 includes an electrodeposition tank 11, an annular electrode 13, and a DC power supply 15, and is provided with rare earth oxide powder P.
Is dispersed in a dispersion medium such as alcohol, and the dispersion liquid 17 is charged into the electrodeposition tank 11. The ring electrode 13 connected to the anode of the DC power supply 15 is immersed in the dispersion liquid 17, and a voltage is applied while the silicon carbide sintered body S connected to the cathode of the DC power supply 15 is placed at the center of the ring electrode 13. As a result, the rare earth oxide powder P is attracted to the silicon carbide sintered body S and adheres to the surface, and the rare earth oxide layer is laminated. This is dried to obtain a laminate. Depending on the dispersion medium to be used, a rare earth oxide may be laminated on the positive electrode side, so that the sign of the applied voltage is appropriately set in consideration of the dispersion medium and the like.
【0015】電気泳動による積層では、基体である炭化
珪素焼結体が平板状である必要がなく、複雑な形状であ
っても均一に希土類酸化物を積層することができるの
で、任意の形状の炭化珪素焼結体の採用が可能となる。
又、積層に要する時間が短時間で済み、操作も簡便であ
る。In the lamination by electrophoresis, the silicon carbide sintered body as the base does not need to be flat, and the rare earth oxide can be uniformly laminated even in a complicated shape. It is possible to use a silicon carbide sintered body.
In addition, the time required for lamination is short, and the operation is simple.
【0016】炭化珪素焼結体に積層する希土類酸化物層
の厚さは少なくとも100μm以上であればよく、積層
した希土類酸化物層が過剰に厚いと、乾燥時にひび割れ
を生じるので、500μm程度以下の厚さに積層するの
が望ましい。次に行われる酸化処理によって約10〜1
00μmの厚さのシリケート層の形成が可能なように希
土類酸化物の積層を制御すると好ましい。The thickness of the rare earth oxide layer laminated on the silicon carbide sintered body may be at least 100 μm or more. If the laminated rare earth oxide layer is excessively thick, cracks occur during drying. It is desirable to laminate to a thickness. Approximately 10 to 1
It is preferable to control the lamination of rare earth oxides so that a silicate layer having a thickness of 00 μm can be formed.
【0017】希土類酸化物を炭化珪素焼結体に積層した
積層体は酸化処理を施す。酸化処理の条件は、炭化珪素
が酸化珪素皮膜を形成する条件であればよく、具体的に
は、酸化性雰囲気において1400〜1700℃で少な
くとも1時間以上加熱すればよい。1400℃より低い
温度では炭化珪素の酸化が進行し難い。1700℃を越
えると、炭化珪素の酸化が過度に激しいために発泡状態
となり、緻密なシリケート皮膜が形成されない。この酸
化処理によって、図3の(a)に示すような希土類酸化
物Pが積層された炭化珪素焼結体Sにおける炭化珪素の
酸化が進行して、(b)に示すように希土類酸化物Pの
積層中に酸化珪素19が混在するようになる。この状態
において、酸化珪素19は希土類酸化物Pと反応して、
図3の(c)に示すように、一般式:RE2 SiO5
(式中のREは、Y,Yb,Er及びDyからなる群よ
り選ばれる希土類元素を示す)で表されるシリケート含
有層21が生成する。生成するシリケート含有層21の
厚さは酸化処理を施す時間が長いほど厚くなり、加熱温
度が高いほど厚くなる。シリケート含有層は、酸化処理
条件や積層体の状態によって、シリケート単独の層であ
る場合もシリケートと希土類酸化物との混合物層である
場合もある。炭化珪素焼結体に積層した希土類酸化物層
が薄いと、酸化処理後の積層セラミックスの表面部に希
土類酸化物層は残存せず、シリケートと希土類酸化物と
の混合物層ができ、積層した希土類酸化物層が所定の厚
さ以上であると、酸化処理後の積層セラミックスは表面
部の希土類酸化物層とほぼシリケート単独の層とが形成
される。シリケート含有層の厚さは少なくとも10μm
程度あれば、炭化珪素焼結体の保護の役割を果たすこと
ができ、10〜100μm程度であるのが好ましい。表
面に残存する希土類酸化物Pの層はシリケート含有層2
1からの剥離が容易であるので、酸化処理後に残存する
希土類酸化物の層を除去すると、シリケートで被覆され
た炭化珪素焼結体が得られる。未反応の希土類酸化物が
残存するように酸化処理条件等を調整すると、酸化処理
後に得られた積層セラミックスを高温環境下においた際
に、炭化珪素の更なる酸化に伴って新たに発生する酸化
珪素によるシリケートの生成が進行するので、自己修復
のような効果が得られる。The laminate in which the rare earth oxide is laminated on the silicon carbide sintered body is subjected to an oxidation treatment. The condition of the oxidation treatment may be a condition under which silicon carbide forms a silicon oxide film, and specifically, heating may be performed at 1400 to 1700 ° C. in an oxidizing atmosphere for at least one hour. At a temperature lower than 1400 ° C., oxidation of silicon carbide hardly proceeds. If the temperature exceeds 1700 ° C., the silicon carbide is excessively vigorously oxidized to a foamed state, and a dense silicate film is not formed. By this oxidation treatment, oxidation of silicon carbide in silicon carbide sintered body S on which rare earth oxide P is laminated as shown in FIG. 3A progresses, and as shown in FIG. 3B, rare earth oxide P And the silicon oxide 19 is mixed in the stacking. In this state, the silicon oxide 19 reacts with the rare earth oxide P,
As shown in FIG. 3C, the general formula: RE 2 SiO 5
(Wherein RE in the formula represents a rare earth element selected from the group consisting of Y, Yb, Er and Dy), and a silicate-containing layer 21 represented by the formula (1) is generated. The thickness of the generated silicate-containing layer 21 increases as the time for performing the oxidation treatment increases, and increases as the heating temperature increases. The silicate-containing layer may be a single layer of silicate or a layer of a mixture of silicate and rare earth oxide, depending on the conditions of the oxidation treatment and the state of the laminate. When the rare earth oxide layer laminated on the silicon carbide sintered body is thin, the rare earth oxide layer does not remain on the surface of the laminated ceramic after the oxidation treatment, and a mixture layer of silicate and rare earth oxide is formed, and the laminated rare earth oxide is formed. When the thickness of the oxide layer is greater than or equal to the predetermined thickness, the laminated ceramic after the oxidation treatment has a rare earth oxide layer on the surface and a layer of substantially silicate alone. The thickness of the silicate-containing layer is at least 10 μm
If it is on the order, it can play a role of protecting the silicon carbide sintered body, and it is preferably about 10 to 100 μm. The layer of the rare earth oxide P remaining on the surface is a silicate-containing layer 2
The silicon carbide sintered body coated with silicate can be obtained by removing the layer of the rare earth oxide remaining after the oxidation treatment because it is easy to peel off from silicon oxide. When the oxidation treatment conditions and the like are adjusted so that unreacted rare earth oxides remain, when the multilayer ceramic obtained after the oxidation treatment is placed in a high-temperature environment, the oxidation newly generated along with the further oxidation of silicon carbide is performed. Since the generation of silicate by silicon proceeds, an effect such as self-repair can be obtained.
【0018】上述の酸化処理によって得られる積層セラ
ミックでは、炭化珪素層とシリケート層とが密接に接合
されており、一体材と同様の強度を有する。これは、形
成されるシリケート含有層が炭化珪素の酸化によって生
成されるものであるために両層の界面部分が破断するこ
となく連続的に接合された安定な結合となるためと考え
られる。又、被覆層の厚さが薄いので、炭化珪素の耐熱
衝撃性や耐クリープ特性を殆ど損なうことがなく、耐熱
性と耐酸化性とを兼ね備えた材料となる。炭化珪素とシ
リケートとは熱膨張変化が非常に似ているので、加熱・
冷却を行っても亀裂が生じ難く、高温での使用に十分耐
えるものとなる。本発明に係る製造方法によって得られ
る積層セラミックスのシリケート含有層上に更に耐熱性
のある酸化物による被覆処理を施してもよい。In the multilayer ceramic obtained by the above-described oxidation treatment, the silicon carbide layer and the silicate layer are closely bonded, and have the same strength as that of the integrated material. This is considered to be because the silicate-containing layer to be formed is formed by oxidation of silicon carbide, so that the interface between the two layers is continuously bonded without breaking, resulting in a stable bond. Further, since the thickness of the coating layer is small, the material has both heat resistance and oxidation resistance without substantially impairing the thermal shock resistance and creep resistance of silicon carbide. Silicon carbide and silicate have very similar thermal expansion changes,
Even if it is cooled, cracks are hardly generated, and it can withstand use at a high temperature. The silicate-containing layer of the multilayer ceramic obtained by the production method according to the present invention may be further subjected to a coating treatment with a heat-resistant oxide.
【0019】本発明においては、炭化珪素焼結体の生成
において、焼結助剤、潤滑剤等の通常用いられるような
添加物を一般的な手法に従って使用することが可能であ
り、又、繊維強化材等を用いた複合材であっても、本発
明の方法を適用して好適な積層セラミックスが得られ
る。In the present invention, in producing a silicon carbide sintered body, additives such as sintering aids, lubricants and the like which are usually used can be used according to a general method. Even if it is a composite material using a reinforcing material or the like, a suitable laminated ceramic can be obtained by applying the method of the present invention.
【0020】加熱処理により接合された積層セラミック
スは、熱膨張係数の違いによる残留応力の発生が少ない
安定した積層体であるが、急激な温度変化による亀裂の
発生等を防止するために、加熱処理後の冷却は穏やかに
行うのが好ましい。The laminated ceramics joined by the heat treatment is a stable laminate having little residual stress due to a difference in thermal expansion coefficient. However, in order to prevent the occurrence of cracks due to a rapid temperature change, the heat treatment is performed. The subsequent cooling is preferably performed gently.
【0021】[0021]
【実施例】以下、実験結果を参照して、本発明の実施例
をさらに詳細に説明する。EXAMPLES Examples of the present invention will be described below in more detail with reference to experimental results.
【0022】(操作1)Y2 O3 粉末を15重量%の割
合でエタノールに加えてボールミル中で24時間混合し
て、スラリー状の分散液を調製した。図1の構成を利用
して、Y2 O3の分散液を装置に投入し、炭化珪素焼結
体の電極3とカーボン板による電極5とを1.5cmの間
隔をおいて分散液中に浸し、直流電源7により50Vの
電圧を10秒間印加した。電圧印加後に電極3を取り出
し、電極3の表面を被覆したY2O3 粉末の膜厚を測定
した。この後、Y2 O3 で被覆された電極3をアルミナ
製の敷板上に据え、大気中において1550℃で24時
間加熱して炭化珪素の酸化を進行させ、シリケート層を
形成して積層セラミックスを得た。積層セラミックスの
走査型電子顕微鏡による観察によってシリケート層の厚
さを測定した。(Operation 1) Y 2 O 3 powder was added to ethanol at a ratio of 15% by weight and mixed in a ball mill for 24 hours to prepare a slurry dispersion. Using the configuration of FIG. 1, a dispersion liquid of Y 2 O 3 is charged into the apparatus, and the electrode 3 of the silicon carbide sintered body and the electrode 5 of the carbon plate are placed in the dispersion liquid at an interval of 1.5 cm. Then, a voltage of 50 V was applied from the DC power supply 7 for 10 seconds. After applying the voltage, the electrode 3 was taken out, and the thickness of the Y 2 O 3 powder covering the surface of the electrode 3 was measured. Thereafter, the electrode 3 coated with Y 2 O 3 is placed on an alumina flooring plate and heated at 1550 ° C. for 24 hours in the air to promote oxidation of silicon carbide, thereby forming a silicate layer and forming a laminated ceramic. Obtained. The thickness of the silicate layer was measured by observing the laminated ceramic with a scanning electron microscope.
【0023】上記において測定したY2 O3 粉末の膜
厚、シリケート層の厚さを表1に示す。Table 1 shows the thickness of the Y 2 O 3 powder and the thickness of the silicate layer measured above.
【0024】(操作2〜4)電気泳動の電圧印加時間を
各々20秒、40秒、60秒とした点以外は操作1と同
様の操作を繰り返して積層セラミックス得た。Y2 O3
粉末の膜厚、シリケート層の厚さを同様に測定した。結
果を表1に示す。(Operations 2 to 4) The same operation as in operation 1 was repeated except that the voltage application time of electrophoresis was set to 20 seconds, 40 seconds and 60 seconds, respectively, to obtain a laminated ceramic. Y 2 O 3
The thickness of the powder and the thickness of the silicate layer were measured in the same manner. Table 1 shows the results.
【0025】(操作5)希土類酸化物としてY2 O3 粉
末に代えてYb2 O3 粉末を用いた点以外は操作1と同
様の操作を繰り返して積層セラミックス得た。Yb2 O
3 粉末の膜厚、シリケート層の厚さを同様に測定した。
結果を表1に示す。(Operation 5) A multilayer ceramic was obtained by repeating the same operation as in Operation 1 except that Yb 2 O 3 powder was used instead of Y 2 O 3 powder as the rare earth oxide. Yb 2 O
3 The thickness of the powder and the thickness of the silicate layer were measured in the same manner.
Table 1 shows the results.
【0026】[0026]
【表1】 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 電気泳動 シリケート 厚さ 操作 電圧印加 希土類 膜厚 時間(秒) 酸化物 (μm) (μm) −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 1 10 Y2 O3 100 Y2 SiO5 10 2 20 Y2 O3 150 Y2 SiO5 15 3 40 Y2 O3 400 Y2 SiO5 30 4 60 Y2 O3 480 Y2 SiO5 30 5 40 Yb2 O3 500 Yb2 SiO5 35 −−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−−− 操作2〜4で得られた積層セラミックスは表層部に白色
の薄層が形成されており、これはX線解折による解析の
結果、Y2 O3 であり、これは容易に剥がすことができ
た。白色の薄層の下には灰色の緻密な層があり、炭化珪
素に強固に結合していた。この灰色の層はX線解折によ
りY2 SiO5 の単相であることが判明した。操作1で
得られた積層セラミックスは表層部に白色の層はなく、
Y2 O3とY2 SiO5 との相であった。操作5では、
白色のYb2 O3 の薄層とその下にYb2 SiO5 層が
形成されていた。Table 1 Electrophoretic silicate Thickness Operation Voltage application Rare earth film thickness Time (seconds) Oxide (μm) (μm) --------------------------------------------------- 110 Y 2 O 3 100 Y 2 SiO 5 10 220 Y 2 O 3 150 Y 2 SiO 5 15 340 Y 2 O 3 400 Y 2 SiO 5 30 460 Y 2 O 3 480 Y 2 SiO 5 30 540 Yb 2 O 3 500 Yb 2 SiO 5 35 ----------------------------------------------------------- Obtained by operations 2-4. The laminated ceramics had a white thin layer formed on the surface layer, and as a result of analysis by X-ray analysis, it was Y 2 O 3 , which could be easily peeled off. Below the white thin layer was a dense gray layer that was firmly bonded to silicon carbide. This gray layer was found by X-ray diffraction to be a single phase of Y 2 SiO 5 . The multilayer ceramic obtained in operation 1 has no white layer on the surface layer,
It was a phase of Y 2 O 3 and Y 2 SiO 5 . In operation 5,
A white Yb 2 O 3 thin layer and a Yb 2 SiO 5 layer were formed thereunder.
【0027】上記操作1〜5で得た積層セラミックスを
大気中において1600℃で24時間加熱したところ、
いずれの積層セラミックスにおいても、重量変化はほと
んどなく、構造的にも組成的にも変化はみられなかっ
た。つまり、シリケートの被覆により炭化珪素基材が保
護され、安定に使用できる温度範囲を向上できることが
解った。When the laminated ceramics obtained in the above operations 1 to 5 were heated in the air at 1600 ° C. for 24 hours,
In each of the laminated ceramics, there was almost no change in weight, and there was no change in structure or composition. That is, it was found that the silicon carbide base material was protected by the silicate coating, and the temperature range in which the silicon carbide base material could be used stably could be improved.
【0028】[0028]
【発明の効果】以上説明したように、本発明の積層セラ
ミックスの製造方法は、高温強度と高温における耐酸化
性、耐食性に優れた積層セラミックスが得られるもので
あり、その工業的価値は極めて大である。また、本発明
の製造方法によって得られる積層セラミックスは、その
優れた耐熱性により、高温下で使用される機械部品用材
料として適しており、高品質の機械部品の供給が可能と
なる。As described above, the method for producing a laminated ceramic according to the present invention is capable of obtaining a laminated ceramic excellent in high-temperature strength, high-temperature oxidation resistance and corrosion resistance, and its industrial value is extremely large. It is. Moreover, the laminated ceramics obtained by the production method of the present invention is suitable as a material for mechanical parts used at high temperatures due to its excellent heat resistance, and enables the supply of high-quality mechanical parts.
【図1】本発明に係る積層セラミックスの製造方法に用
いる電気泳動の操作を説明するための概略構成図。FIG. 1 is a schematic diagram illustrating the operation of electrophoresis used in the method for producing a laminated ceramic according to the present invention.
【図2】本発明に係る積層セラミックスの製造方法に用
いられる装置の一実施形態を示す概略構成図。FIG. 2 is a schematic configuration diagram showing an embodiment of an apparatus used in the method for producing a laminated ceramic according to the present invention.
【図3】本発明に係る積層セラミックスの製造方法にお
ける工程を説明する図で、(a)は希土類酸化物の積層
工程を示す図、(b)は酸化処理工程を示す図、(c)
は酸化処理によって得られる積層セラミックスを示す
図。3A and 3B are diagrams illustrating steps in a method for manufacturing a multilayer ceramic according to the present invention, wherein FIG. 3A illustrates a step of laminating a rare earth oxide, FIG. 3B illustrates an oxidation step, and FIG.
FIG. 3 is a view showing a laminated ceramic obtained by an oxidation treatment.
1,17 分散液 3,5 電極 7,15 直流電源 11 電着槽 13 環状電極 P 希土類酸化物の粉末 S 炭化珪素焼結体 Reference Signs List 1,17 Dispersion liquid 3,5 Electrode 7,15 DC power supply 11 Electrodeposition tank 13 Ring electrode P Powder of rare earth oxide S Sintered silicon carbide
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI C04B 41/87 C25D 13/02 Z C25D 13/02 C04B 35/56 101X (56)参考文献 特開 平7−277861(JP,A) (58)調査した分野(Int.Cl.7,DB名) C04B 41/87,41/89 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI C04B 41/87 C25D 13/02 Z C25D 13/02 C04B 35/56 101X (56) References JP-A-7-277861 (JP, A) (58) Field surveyed (Int. Cl. 7 , DB name) C04B 41/87, 41/89
Claims (3)
RE2 O3 (式中のREは、Y,Yb,Er及びDyか
らなる群より選ばれる希土類元素を示す)で表される希
土類酸化物を含有する第2層を積層して積層体を形成
し、該積層体を酸化性雰囲気中で加熱することによって
該第1層の炭化珪素を酸化して酸化珪素を生成し該第2
層の希土類酸化物と該酸化珪素とから一般式:RE2 S
iO5 (式中のREは、Y,Yb,Er及びDyからな
る群より選ばれる希土類元素を示す)で表される希土類
珪酸化合物を生成することを特徴とする積層セラミック
スの製造方法。The first layer containing silicon carbide has a general formula:
A second layer containing a rare earth oxide represented by RE 2 O 3 (where RE represents a rare earth element selected from the group consisting of Y, Yb, Er and Dy) is laminated to form a laminate. Heating the laminated body in an oxidizing atmosphere to oxidize the silicon carbide of the first layer to produce silicon oxide;
From the rare earth oxide of the layer and the silicon oxide, a general formula: RE 2 S
A method for producing a laminated ceramic, comprising producing a rare earth silicate compound represented by iO 5 (wherein RE represents a rare earth element selected from the group consisting of Y, Yb, Er and Dy).
類酸化物の分散液中に投入して電気泳動により該第1層
の表面に希土類酸化物を付着することによってなされ、
該積層体の加熱は1400〜1700℃で行われること
を特徴とする請求項1記載の製造方法。2. The formation of the laminate is performed by charging the first layer into a rare earth oxide dispersion and attaching the rare earth oxide to the surface of the first layer by electrophoresis,
The method according to claim 1, wherein the heating of the laminate is performed at 1400 to 1700C.
を成形し焼結して得られる焼結体層であり、前記積層体
の加熱によって、厚さ100μm以下の希土類珪酸化合
物層又は希土類珪酸化合物と希土類酸化物とを含んだ層
を形成することを特徴とする請求項1又は2記載の製造
方法。3. The first layer is a sintered body layer obtained by molding and sintering a powder containing silicon carbide, and the rare earth silicate compound layer having a thickness of 100 μm or less by heating the laminate. 3. The method according to claim 1, wherein a layer containing a rare earth silicate compound and a rare earth oxide is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8240652A JP3061573B2 (en) | 1996-09-11 | 1996-09-11 | Manufacturing method of multilayer ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8240652A JP3061573B2 (en) | 1996-09-11 | 1996-09-11 | Manufacturing method of multilayer ceramics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH1087386A JPH1087386A (en) | 1998-04-07 |
| JP3061573B2 true JP3061573B2 (en) | 2000-07-10 |
Family
ID=17062685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8240652A Expired - Fee Related JP3061573B2 (en) | 1996-09-11 | 1996-09-11 | Manufacturing method of multilayer ceramics |
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| Country | Link |
|---|---|
| JP (1) | JP3061573B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2355005B (en) | 1999-10-04 | 2004-03-24 | Caterpillar Inc | Rare earth silicate coating on a silicon-based ceramic component by controlled oxidation for improved corrosion resistance |
| JP4531404B2 (en) | 2004-01-13 | 2010-08-25 | 財団法人電力中央研究所 | Environment-resistant film structure and ceramic structure |
| JP6067166B1 (en) * | 2016-05-13 | 2017-01-25 | 三菱日立パワーシステムズ株式会社 | COATING STRUCTURE, TURBINE COMPONENT HAVING THE SAME, AND METHOD FOR PRODUCING COATING STRUCTURE |
| JP2023127960A (en) * | 2022-03-02 | 2023-09-14 | 国立大学法人京都大学 | Silicon carbide ceramics and their manufacturing method |
-
1996
- 1996-09-11 JP JP8240652A patent/JP3061573B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH1087386A (en) | 1998-04-07 |
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