JP3063107B2 - Electrostatic deflection device and method of manufacturing electrostatic deflection device - Google Patents
Electrostatic deflection device and method of manufacturing electrostatic deflection deviceInfo
- Publication number
- JP3063107B2 JP3063107B2 JP2078373A JP7837390A JP3063107B2 JP 3063107 B2 JP3063107 B2 JP 3063107B2 JP 2078373 A JP2078373 A JP 2078373A JP 7837390 A JP7837390 A JP 7837390A JP 3063107 B2 JP3063107 B2 JP 3063107B2
- Authority
- JP
- Japan
- Prior art keywords
- electrodes
- deflecting
- space
- electrostatic
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は電子線描画装置、イオンビーム装置、等の
荷電粒子線装置で用いられる高精度な静電偏向装置及び
その製造方法に関するものである。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-precision electrostatic deflection device used in a charged particle beam device such as an electron beam lithography device and an ion beam device, and a method of manufacturing the same. .
従来のこの種の装置は特公昭63−55744号に示されて
いるように、周辺が連続している中空の絶縁体とこの中
空絶縁体の内面から突出する複数の電極片とを備えてな
り、電極間のスペースを通ってビーム通路から絶縁物が
見えないよう、電極間のスペースを湾曲させた構造を採
用している。As shown in Japanese Patent Publication No. 63-55744, a conventional device of this type includes a hollow insulator having a continuous periphery and a plurality of electrode pieces protruding from the inner surface of the hollow insulator. The space between the electrodes is curved so that the insulator cannot be seen from the beam path through the space between the electrodes.
また、電極間を分離して前記スペースを加工する時、
ワイヤーカット放電加工を用いている。When processing the space by separating the electrodes,
Wire cut electrical discharge machining is used.
上記の如き従来の技術に於いてはスペースを湾曲させ
る必要があるため、ワイヤーカット放電加工の必要な寸
法が長くなり、加工に長時間必要である事、ワイヤーカ
ット放電加工した面は、放電の跡が粗面として残り、表
面積が大きいため、放出ガスが多く、荷電粒子線を出し
た時境筒内部を汚し易かった。In the conventional technology as described above, since the space needs to be curved, the dimensions required for the wire cut electric discharge machining are long, and it is necessary to perform the machining for a long time. Traces remained as a rough surface, and the surface area was large, so that a large amount of gas was emitted, and the inside of the cylinder was easily contaminated when the charged particle beam was emitted.
さらに、ワイヤーカット放電加工を絶縁油の中で行っ
た後、加熱ベーキング処理を行うと、絶縁物と金属との
膨張係数の違い等により寸法精度が狂う問題点があり、
他方、加熱を行わないと荷電粒子線を当てた時に多量の
ハイドロカーボンを放出する問題点があった。Furthermore, if the wire cut electric discharge machining is performed in the insulating oil and then the heating baking is performed, there is a problem that the dimensional accuracy is deteriorated due to a difference in an expansion coefficient between the insulator and the metal.
On the other hand, if heating is not performed, there is a problem that a large amount of hydrocarbon is released when the charged particle beam is applied.
上記の問題点の解決のために、本発明では電極を支え
ている円筒形状の絶縁材料の内側の、偏向電極間の空間
の位置に、その空間より幅の広い凹形の溝を軸方向に設
け、その溝の中央部に前記電極間空間より広い幅の導体
膜を設け、その導体膜は接地されるようにした。In order to solve the above problems, in the present invention, a concave groove having a width wider than the space is provided in the cylindrical insulating material supporting the electrode, at the position of the space between the deflecting electrodes in the axial direction. A conductive film having a width wider than the space between the electrodes was provided at the center of the groove, and the conductive film was grounded.
上記他の問題点の解決のために、あらかじめ表面を滑
らかな面に仕上げ、ガス出しを行った電極を、その電極
とは少くとも表面素材が異る治具を用いて組立てを行
い、組立てた後、精度が規格内に収まっている事を確認
した後上記治具を薬品・水等で溶解するか、加熱で溶解
するか、燃焼で炭化するかあるいは熱膨張の差を利用し
て冷却あるいは加熱により除去する組立方法を採用し
た。In order to solve the above-mentioned other problems, the surface was previously finished to a smooth surface, and the electrode that had been degassed was assembled using a jig whose surface material was at least different from the electrode, and assembled. Then, after confirming that the accuracy is within the standard, dissolve the jig with chemicals, water, etc., dissolve by heating, carbonize by combustion, or cool by using the difference in thermal expansion or An assembly method of removing by heating was adopted.
本発明に於いては、荷電粒子線の通路から見える絶縁
物表面は接地された導体の薄膜でコーティングされてい
るので、絶縁物が帯電して荷電粒子線に影響を与えるこ
とはない。In the present invention, since the surface of the insulator viewed from the path of the charged particle beam is coated with a thin film of a grounded conductor, the insulator is not charged and does not affect the charged particle beam.
また、電極間を絶縁している空間は直線的であるの
で、表面積は小さく放出ガスは少い。Further, since the space insulating between the electrodes is linear, the surface area is small and the amount of released gas is small.
さらに、ワイヤーカット放電加工で最終加工を行わな
いで、治具を用いて組立てるので、組立前に、絶縁物や
電極を放出ガスが少くなるメッキ等の表面処理が行え、
ベーキング処理も行えるので、境筒内に実装した時の真
空度劣化を起さない。Furthermore, since final assembly is not performed by wire-cut electric discharge machining, the assembly is performed using a jig.
Since the baking process can also be performed, the degree of vacuum does not deteriorate when mounted inside the envelope.
そして、従来の治具を用いる組立てでは、治具を取り
はずし易いように多少のガタを設けた治具を用いるため
組立て精度が悪い問題があったが、治具を薬品等で溶
解、加熱で溶融、燃焼で炭化あるいは熱膨張の差を利用
して除去することによりこのようなガタは不要であるた
め高精度の組立てが可能となった。In the assembly using the conventional jig, there was a problem in that the assembly accuracy was poor because a jig provided with a slight play was used so that the jig could be easily removed.However, the jig was melted with a chemical or the like and melted by heating. By removing the carbonization by combustion or utilizing the difference in thermal expansion, such a play is not required, so that high-precision assembly is possible.
第1図は本発明の第1の実施例の断面図であって、断
面形状が略おおぎ形で、かつ柱状(長手方向は紙面に鉛
直方向)の偏向電極1a〜1dは荷電粒子線の通路4を形成
する中央部及び隣接する互いの間に空間を形成してセラ
ミックの円筒2の内面にそれぞれの電極に対応したネジ
6aから6dで締め付け固定されている。中央の荷電粒子線
の通路からみて電極間の空間7a〜7dそれぞれの奥のセラ
ミック円筒2表面には断面形状が半円形の溝3a〜3dが紙
面鉛直方向(荷電粒子線の進行方向)に形成されてい
る。溝の内周面には金属5a〜5dが電極3a〜3dに接しない
範囲で蒸着等により付着されている。電極間の幅(d1)
<蒸着部の幅(d2)<溝の幅(d3)、の関係にあるので
荷電粒子線の通路4からセラミック円筒2の表面は見え
ないので、セラミック円筒2表面の帯電が荷電粒子線に
影響を及ぼす事はない。また、金属膜5a〜5dは電極3a〜
3dとは接触していないので、電極3ae3dがショートする
事はない。セラミック円筒2の全表面は、電極1a〜1d及
び締め付けネジ6a〜6d(6cのみ図示)と接触する所以外
は金属膜5(膜5a〜5dはその一部である)でコーティン
グされ、この偏向器を取り付ける金具を通して接地され
ている。なお、この金属膜を形成する領域を第1図に破
線で図示している。なお、上述の溝3a〜3dは断面形状が
半円形のものに限られず、コ字状、三角形状等他の形状
のものでもよい。FIG. 1 is a cross-sectional view of a first embodiment of the present invention, in which a deflection electrode 1a to 1d having a substantially oval cross section and a columnar shape (the longitudinal direction is vertical to the paper surface) is a charged particle beam. A screw corresponding to each electrode is formed on the inner surface of the ceramic cylinder 2 by forming a space between a central portion forming the passage 4 and an adjacent one another.
It is tightened and fixed at 6a to 6d. Semi-circular grooves 3a to 3d having a semicircular cross section are formed in the surface of the ceramic cylinder 2 at the back of each of the spaces 7a to 7d between the electrodes when viewed from the path of the charged particle beam at the center. Have been. Metals 5a to 5d are adhered to the inner peripheral surface of the groove by vapor deposition or the like in a range not in contact with the electrodes 3a to 3d. Width between electrodes (d 1 )
Since the surface of the ceramic cylinder 2 cannot be seen from the passage 4 of the charged particle beam because of the relationship of <width of the vapor deposition section (d 2 ) <width of the groove (d 3 ), the charged surface of the ceramic cylinder 2 is charged. It does not affect. The metal films 5a to 5d are electrodes 3a to
Since there is no contact with 3d, the electrode 3ae3d does not short-circuit. The entire surface of the ceramic cylinder 2 is coated with a metal film 5 (the films 5a to 5d are a part thereof) except where they come into contact with the electrodes 1a to 1d and the tightening screws 6a to 6d (only 6c is shown). It is grounded through the metal fittings for mounting the vessel. The area where the metal film is formed is shown by a broken line in FIG. The above-described grooves 3a to 3d are not limited to those having a semicircular cross-sectional shape, but may have another shape such as a U-shape, a triangular shape, or the like.
第2図は本発明の第2実施例を4電極の場合に適用し
て記した図である。セラミック円筒2及び各電極1a〜1d
を加工後、表面処理及び脱ガスのベーキング処理を施し
た後、組立を行う。FIG. 2 is a diagram showing the second embodiment of the present invention applied to the case of four electrodes. Ceramic cylinder 2 and each electrode 1a-1d
Is processed, subjected to a surface treatment and a baking treatment for degassing, and then assembled.
なお、電極1a〜1dの形状は基本的には第1図と同様で
あるが、隣り合う相互の電極間には円筒状の空間が形成
されるように、電極1a〜1dのそれぞれの対向面には溝が
形成されている。組立の時、各電極1a〜1dの半径方向の
精度はネジを充分締付ければ容易に得られる。θ方向の
精度を出すため、円筒状の治具8a〜8dを電極間スペース
7a〜7dに形成した円筒状の空間70a〜70dに入れて組立を
行う。ここで治具8a〜8dと電極1a〜1dが接する面は両方
の面を高精度に仕上げておくことによりθ方向の精度を
得ている。組立て後電極材料によってはアニール処理を
行った方が良い場合がある。高精度で組立てるために
は、治具8a〜8dと電極1a〜1dの間のガタを無くさなけれ
ばならないので、そのままでは治具8a〜8dを抜取ること
ができない。本実施例では円筒状の空間及び治具8a〜8d
の直径を電極間スペース7a〜7dの幅より大きくし、治具
を液体窒素に浸し収縮させて除去した。この場合、電極
材料はTi等の膨張係数の小さい材料を用い、治具にAl等
の同係数の大きい材料を用いた。他の実施例として、治
具8a〜8dをアクリル等の有機物で作り、溶剤で溶解除
去、岩塩で作り水で除去、低融点金属で作り熔融除去、
Al、Mg等のイオン化傾向の大きい金属で作り酸又はアル
カリで溶解除去してもよい。また偏向器が軸方向に長い
場合は、ビーム通路の残留ガスが排気し難いので、半径
方向へ排気できるとコンダクタンスが大きくなる。第2
図では、ネジ6a〜6dとは長手方向にずらせて形成した穴
10a〜10dを複数個セラミック円筒に設けた。そしてこの
穴の内側にも帯電防止の金属コーティングを行った。The shapes of the electrodes 1a to 1d are basically the same as those shown in FIG. 1, but the opposing surfaces of the electrodes 1a to 1d are so formed that a cylindrical space is formed between adjacent electrodes. Is formed with a groove. At the time of assembly, the accuracy in the radial direction of each of the electrodes 1a to 1d can be easily obtained by sufficiently tightening the screws. In order to obtain the accuracy in the θ direction, the cylindrical jigs 8a to 8d
Assembling is performed in cylindrical spaces 70a to 70d formed in 7a to 7d. Here, the surfaces in contact with the jigs 8a to 8d and the electrodes 1a to 1d have high accuracy in the θ direction by finishing both surfaces with high precision. Depending on the electrode material after assembly, it may be better to perform annealing. In order to assemble with high precision, the play between the jigs 8a to 8d and the electrodes 1a to 1d must be eliminated, so that the jigs 8a to 8d cannot be removed as they are. In the present embodiment, a cylindrical space and jigs 8a to 8d
Was made larger than the width of the inter-electrode spaces 7a to 7d, and the jig was immersed in liquid nitrogen, contracted, and removed. In this case, a material having a small expansion coefficient such as Ti was used as the electrode material, and a material having a large expansion coefficient such as Al was used for the jig. As another embodiment, the jigs 8a to 8d are made of an organic substance such as acrylic, removed by dissolution with a solvent, made of rock salt and removed with water, made of a low-melting metal and removed by melting,
It may be made of a metal having a high ionization tendency, such as Al or Mg, and may be dissolved and removed with an acid or alkali. If the deflector is long in the axial direction, it is difficult to exhaust the residual gas in the beam passage. Therefore, if the deflector can be exhausted in the radial direction, the conductance increases. Second
In the figure, holes formed by shifting the screws 6a to 6d in the longitudinal direction
A plurality of ceramic cylinders 10a to 10d were provided. The inside of this hole was also coated with an antistatic metal coating.
第3図は本発明の第3実施例である。第1図の断面形
状が半円形の溝3a〜3dは絶縁物の内側に加工する必要が
ある(凹部を形成する)。これは加工が難しい。第3図
のように電極側に段差の形で逃げ部12を設ければ外側加
工でしかも金属であるので加工し易い。FIG. 3 shows a third embodiment of the present invention. The grooves 3a to 3d having a semicircular cross section in FIG. 1 need to be processed inside the insulator (to form a concave portion). This is difficult to process. If the relief portion 12 is provided in the form of a step on the side of the electrode as shown in FIG.
この段差によってできた電極1a〜1dとセラミック円筒
2との間の空間を利用して、電極間スペース7a〜7dに臨
むセラミック円筒2表面に金属膜5a〜5dをメッキで形成
することにより、偏向電極1a〜1dと接地された金属膜5a
〜5dとのショートを防ぎ、しかもビーム通路から見える
絶縁物表面を金属膜とすることができる。By utilizing the space between the electrodes 1a to 1d and the ceramic cylinder 2 formed by the steps, the metal films 5a to 5d are formed by plating on the surface of the ceramic cylinder 2 facing the inter-electrode spaces 7a to 7d, so that deflection is performed. Metal film 5a grounded to electrodes 1a-1d
5d can be prevented, and the surface of the insulator visible from the beam path can be made of a metal film.
請求項(1)記載の本発明によれば、電極間のスペー
スを湾曲させることなしに、絶縁物表面が帯電して荷電
粒子線に影響を与えることがなくなった。According to the present invention, the surface of the insulator is not charged and does not affect the charged particle beam without curving the space between the electrodes.
そして、電極間スペースを湾曲させる必要がなくなっ
たので、加工時間短縮、表面積縮小による放出ガスの減
少が達成された。Since the space between the electrodes does not need to be curved, a reduction in processing time and a reduction in gas emission due to a reduction in surface area are achieved.
また、請求項(2)の本発明によれば、治具と電極の
ガタをほとんど無くして組立てられるので高精度の偏向
器ができる。According to the invention of claim (2), the jig and the electrode can be assembled with almost no play, so that a highly accurate deflector can be obtained.
なお、第2の実施例では、部品加工後表面処理、ベー
キング処理を行った部品で組立てを行えるので、組立て
た後熱処理を行わなくてよい。In the second embodiment, since it is possible to assemble the components that have been subjected to the surface treatment and the baking process after the component processing, it is not necessary to perform the heat treatment after the assembly.
さらに、第2の実施例、第3の実施例によれば、荷電
粒子線の通路からの排気コンダクタンスを大きくでき
る。Further, according to the second embodiment and the third embodiment, the exhaust conductance from the passage of the charged particle beam can be increased.
第1図は本発明の第1実施例の偏向電極の断面図であ
り、第2図は本発明の第2実施例の偏向電極の断面図で
あり、第3図は本発明の第3実施例の偏向器の断面図で
ある。 〔主要部分の符号の説明〕 1a〜1d……偏向電極、 2……セラミック円筒、 3……凹形溝、 5、5a〜5d……金属膜、 7a〜7d……電極間スペース、 8a〜8d……組立治具。FIG. 1 is a sectional view of a deflection electrode according to a first embodiment of the present invention, FIG. 2 is a sectional view of a deflection electrode according to a second embodiment of the present invention, and FIG. 3 is a third embodiment of the present invention. It is sectional drawing of the example deflector. [Explanation of Signs of Main Parts] 1a to 1d: deflecting electrode, 2: ceramic cylinder, 3: concave groove, 5, 5a to 5d: metal film, 7a to 7d: space between electrodes, 8a to 8d …… Assembly jig.
フロントページの続き (72)発明者 守田 憲司 東京都品川区西大井1丁目6番3号 株 式会社ニコン大井製作所内 (56)参考文献 特開 平2−247966(JP,A) 特開 昭59−46744(JP,A) 特開 昭63−110542(JP,A) 特開 昭64−89135(JP,A)Continuation of the front page (72) Inventor Kenji Morita 1-6-3 Nishioi, Shinagawa-ku, Tokyo Nikon Oi Works Co., Ltd. (56) References JP-A-2-247966 (JP, A) JP-A-59- 46744 (JP, A) JP-A-63-110542 (JP, A) JP-A-64-89135 (JP, A)
Claims (3)
極の偏向電極を持つ静電偏向装置において、前記円筒の
内周面の前記偏向電極間の空間の位置にその空間より幅
が広く、断面が円の一部の形状の凹部を設け、その凹部
の中央部に前記電極間空間より広い幅の導体膜を設け、
その導体膜を接地したことを特徴とする静電偏向装置。1. An electrostatic deflecting device having a multi-pole deflecting electrode inside one concentric cylindrical insulating material, wherein the inner peripheral surface of the cylinder has a width between the deflecting electrodes at a position of a space between the deflecting electrodes. Wide, the cross section is provided with a concave part of a part of a circle, a conductive film having a width wider than the inter-electrode space is provided at the center of the concave part,
An electrostatic deflecting device characterized in that the conductor film is grounded.
極の偏向電極を持つ静電偏向装置の製造方法において、
前記電極間に形成した位置決め用空間に治具を嵌入させ
て組み立てた後、前記治具を薬品等で溶解するか、過熱
で溶解するか、燃焼で炭化あるいは熱膨張の差を利用し
て除去することを特徴とする静電偏向装置の製造方法。2. A method of manufacturing an electrostatic deflection device having a multipolar deflection electrode inside one concentric cylindrical insulating material,
After assembling by fitting a jig into the positioning space formed between the electrodes, the jig is dissolved with a chemical or the like, dissolved by overheating, or removed by utilizing the difference in carbonization or thermal expansion by combustion. A method of manufacturing an electrostatic deflection device.
極の偏向電極を持つ静電偏向装置において、前記円筒の
内周面の前記偏向電極間の空間の中央位置にその空間よ
り幅の広い接地した導体膜を設け、前記偏向電極には前
記導体膜と接触しない様逃げが設けられていることを特
徴とする静電偏向装置の製造方法。3. An electrostatic deflecting device having a multi-pole deflecting electrode inside one concentric cylindrical insulating material, wherein the inner peripheral surface of the cylinder is located at the center of the space between the deflecting electrodes. A method for manufacturing an electrostatic deflecting device, comprising: providing a wide grounded conductor film; and providing a relief to the deflection electrode so as not to contact the conductor film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2078373A JP3063107B2 (en) | 1990-03-27 | 1990-03-27 | Electrostatic deflection device and method of manufacturing electrostatic deflection device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2078373A JP3063107B2 (en) | 1990-03-27 | 1990-03-27 | Electrostatic deflection device and method of manufacturing electrostatic deflection device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH03276548A JPH03276548A (en) | 1991-12-06 |
| JP3063107B2 true JP3063107B2 (en) | 2000-07-12 |
Family
ID=13660213
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2078373A Expired - Fee Related JP3063107B2 (en) | 1990-03-27 | 1990-03-27 | Electrostatic deflection device and method of manufacturing electrostatic deflection device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3063107B2 (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4610029B2 (en) * | 1999-02-02 | 2011-01-12 | 株式会社アドバンテスト | Electron beam irradiation device electrostatic deflector |
| TWI297167B (en) | 2000-06-27 | 2008-05-21 | Ebara Corp | Inspection apparatus and inspection method |
| EP2587515A1 (en) | 2000-06-27 | 2013-05-01 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| WO2002013227A1 (en) | 2000-07-27 | 2002-02-14 | Ebara Corporation | Sheet beam test apparatus |
| US6953938B2 (en) * | 2002-10-03 | 2005-10-11 | Canon Kabushiki Kaisha | Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus |
| JP2006127879A (en) * | 2004-10-28 | 2006-05-18 | Jeol Ltd | Multipole |
| US7550739B2 (en) * | 2006-03-30 | 2009-06-23 | Tokyo Electron Limited | Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate |
-
1990
- 1990-03-27 JP JP2078373A patent/JP3063107B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH03276548A (en) | 1991-12-06 |
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