JP3074724B2 - Adhesive prepreg and multilayer board for mounting on semiconductor using the same - Google Patents
Adhesive prepreg and multilayer board for mounting on semiconductor using the sameInfo
- Publication number
- JP3074724B2 JP3074724B2 JP02290943A JP29094390A JP3074724B2 JP 3074724 B2 JP3074724 B2 JP 3074724B2 JP 02290943 A JP02290943 A JP 02290943A JP 29094390 A JP29094390 A JP 29094390A JP 3074724 B2 JP3074724 B2 JP 3074724B2
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- resin
- semiconductor
- multilayer board
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/0353—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
- H05K1/0366—Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/075—Connecting or disconnecting of bond wires
- H10W72/07551—Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
- H10W72/07554—Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting changes in dispositions
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/541—Dispositions of bond wires
- H10W72/547—Dispositions of multiple bond wires
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/50—Bond wires
- H10W72/551—Materials of bond wires
- H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
- H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
Landscapes
- Reinforced Plastic Materials (AREA)
- Laminated Bodies (AREA)
Description
【発明の詳細な説明】 <産業上の利用分野> 本願は多層配線板に於て、配線板同志、又は、配線板
と基材等とを接着するために使用される接着用プリプレ
グに関し、特に、半導体搭載多層板に好適な接着用プリ
プレグに関する。DETAILED DESCRIPTION OF THE INVENTION <Industrial application field> The present invention relates to a prepreg for bonding used for bonding between wiring boards or a wiring board and a base material in a multilayer wiring board, and in particular, And a bonding prepreg suitable for a semiconductor-mounted multilayer board.
<従来の技術> ピングリッドアレー等半導体を搭載した配線板にも多
層板を用いたものが利用されるようになってきている。<Prior Art> A wiring board using a multilayer board has been used as a wiring board on which a semiconductor such as a pin grid array is mounted.
半導体搭載多層板は、例えば、ピングリッドアレーの
場合には第1図のように示される。第1図に於て、配線
板1にはザグリ開口部5が設けられ、該開口部には、半
導体3が搭載されている。又、配線板1は内層回路7を
有し、回路7はザグリ開口部5の周縁部近くに、ボンデ
ィングパッド部8を有する。一方、配線板2は、ザグリ
開口部5よりも大きな開口部4を有し、更に表層回路9
を有する。A semiconductor-mounted multilayer board is shown, for example, in FIG. 1 in the case of a pin grid array. In FIG. 1, a counterbore opening 5 is provided in a wiring board 1, and a semiconductor 3 is mounted in the opening. The wiring board 1 has an inner layer circuit 7, and the circuit 7 has a bonding pad 8 near the periphery of the counterbore opening 5. On the other hand, the wiring board 2 has an opening 4 larger than the counterbore opening 5 and further has a surface circuit 9.
Having.
表層回路9は、開口部4の周縁部近くにボンディング
パッド部10を有する。配線板1と2とは、接着用プリプ
レグ6により接着されている。又、半導体3と回路との
間は夫々のボンディングパッド部との間で、金線11によ
り結ばれており、半導体搭載多層板を形成している。表
層回路9、内層回路7は夫々配線板にとりつけられた多
数のピン12により更に他の回路との接続がはかられる。The surface layer circuit 9 has a bonding pad 10 near the periphery of the opening 4. The wiring boards 1 and 2 are bonded by a bonding prepreg 6. The semiconductor 3 and the circuit are connected to the respective bonding pad portions by gold wires 11 to form a semiconductor mounting multilayer board. The surface layer circuit 9 and the inner layer circuit 7 can be further connected to other circuits by a large number of pins 12 attached to the wiring board.
<発明が解決しようとする課題> このような半導体搭載多層板の接着用プリプレグで
は、内層回路を有する配線板1と表層回路を有する配線
板2との間の接着を充分に保持すると共に、回路の凹凸
を樹脂で埋める必要がある。この凹凸を完全に埋め切ら
ないと、その部分に気泡を有することになり、後工程で
の加熱等により、剥離やふくれの原因となる。<Problems to be Solved by the Invention> In such a prepreg for bonding a semiconductor-mounted multilayer board, the bonding between the wiring board 1 having an inner layer circuit and the wiring board 2 having a surface layer circuit is sufficiently maintained, and the circuit Must be filled with resin. If the irregularities are not completely filled, bubbles will be present in those portions, which may cause peeling or blistering due to heating or the like in a later step.
この気泡を発生させないために、プリプレグの樹脂分
を多くすると、回路の凹凸はほぼ完全に樹脂で埋められ
るが、プリプレグの樹脂分が多くなることにより、プリ
プレグの表面が樹脂リッチになり、積層プレス時にスリ
ップしやすくなり作業上危険が増大する。又、樹脂分を
多くすることにより第2図に示す如く、プリプレグの樹
脂がボンディングパッド部上に流れでてくる。この樹脂
の流出量6aが多いと、ボンディングパッド部8を覆って
しまうか、又は、露出しているボンディングバッド部の
面積がわずかになるため、ボンディングワイヤ11による
半導体と回路との結線に支障をきたす。If the resin content of the prepreg is increased to prevent the generation of these bubbles, the unevenness of the circuit is almost completely filled with the resin.However, the resin content of the prepreg increases, so that the surface of the prepreg becomes rich in resin and the lamination press Occasionally, slipping easily occurs, increasing the danger in work. In addition, by increasing the resin content, the resin of the prepreg flows on the bonding pad portion as shown in FIG. If the resin outflow 6a is large, the bonding pad portion 8 is covered or the exposed area of the bonding pad portion becomes small, so that the connection between the semiconductor and the circuit by the bonding wire 11 is not hindered. Come.
<課題を解決するための手段> 本願発明者等は、ガラスクロスとエポキシ樹脂ワニス
とからなる接着用プリプレグに於て該プリプレグの樹脂
分を55±5%の範囲とし、且つ、該プリプレグを構成す
る樹脂ワニスのゲルタイムが20±10秒であるような接着
用プリプレグを提案することにより、前記課題の解決が
可能であることを見出した。<Means for Solving the Problems> The inventors of the present invention set the resin content of the prepreg in the range of 55 ± 5% in the adhesive prepreg comprising the glass cloth and the epoxy resin varnish, and configure the prepreg. It has been found that the above problem can be solved by proposing an adhesive prepreg having a gel time of a resin varnish of 20 ± 10 seconds.
又、上記接着用プリプレグに於て、開繊処理されてい
るガラスクロスを用いたプリプレグを使用することによ
り、更に、好適な課題の解決が可能であることを見出し
た。In addition, it has been found that, by using a prepreg using a glass cloth which has been subjected to fiber opening treatment in the above-mentioned bonding prepreg, it is possible to further solve a suitable problem.
又、内層回路を有する半導体搭載多層板に於て、該多
層板の各接着層に、前記接着用プリプレグを1枚もしく
は2枚合わせて用いることにより、前記課題の解決をは
かった半導体搭載多層板の得られることが判った。Further, in a semiconductor-mounted multilayer board having an inner layer circuit, by using one or two of the adhesive prepregs for each adhesive layer of the multilayer board, the semiconductor-mounted multilayer board which solves the above-mentioned problem is provided. Was obtained.
<作用> 内層回路の凹凸に対する樹脂の埋め込み性を良くする
ためには、プリプレグの樹脂分の高い方が好ましいが、
樹脂分を高くするとプレス時の基板のスリップが発生し
やすくなり、又、ボンディングパッド部への溶融樹脂の
流出が起こる。<Effect> In order to improve the resin embedding property to the unevenness of the inner layer circuit, it is preferable that the resin content of the prepreg is higher.
When the resin content is increased, slip of the substrate at the time of pressing is likely to occur, and the molten resin flows out to the bonding pad portion.
本願は、樹脂分を高めに設定しながらスリップの発生
や樹脂の流出を抑えるため、プリプレグの硬化を進め、
プリプレグを構成しているエポキシ樹脂ワニスのゲルタ
イムを20±10秒の範囲で選択することにより可能である
ことを見出した。This application promotes the curing of the prepreg, in order to suppress the occurrence of slip and the outflow of the resin while setting the resin content higher,
It has been found that it is possible by selecting the gel time of the epoxy resin varnish constituting the prepreg within a range of 20 ± 10 seconds.
ゲルタイムを短くすることにより、樹脂の硬化が進ん
でいるため、プレス時の再溶融樹脂の粘度が大きくな
り、スリップの発生が起り難く、樹脂の流出も小さく抑
えることができる。樹脂分の範囲としては55±5%、ゲ
ルタイムは20±10秒の範囲から適宜状況に応じて選択さ
れる。By shortening the gel time, the curing of the resin is progressing, so that the viscosity of the remelted resin at the time of pressing increases, so that the occurrence of slip hardly occurs and the outflow of the resin can be suppressed to a small value. The range of the resin component is selected from 55 ± 5%, and the gel time is selected from the range of 20 ± 10 seconds according to the situation.
樹脂分がこの範囲より低いと、樹脂の埋め込みが悪く
なり、内層回路の一部に気泡を抱くことになる。又、こ
の範囲より高い場合は、プレス時にスリップ発生の確率
が大きくなり、又、樹脂の流出も大きくなる。If the resin content is lower than this range, the embedding of the resin becomes worse, and air bubbles are buried in a part of the inner layer circuit. On the other hand, if it is higher than this range, the probability of occurrence of slip at the time of pressing increases, and the outflow of resin also increases.
ゲルタイムがこの範囲より小さい場合は、樹脂が回路
の凹凸を充分に埋め込む前に樹脂が硬化してしまうため
に、やはり回路の一部に気泡を抱くことになる。大きい
場合は樹脂の流出が大きくなり不都合である。If the gel time is shorter than this range, the resin will harden before the resin sufficiently embeds the irregularities of the circuit, so that a part of the circuit will also have bubbles. If it is large, the outflow of resin becomes large, which is inconvenient.
更に、本願の好ましい態様としては、プリプレグに開
繊処理を施こされたガラスクロスを使用することであ
る。ここでいう開繊処理とは、ガラスクロスを構成する
経糸、緯糸が何らかの方法で開繊されていることを言
う。Further, in a preferred embodiment of the present application, a glass cloth obtained by subjecting a prepreg to an opening process is used. Here, the opening process means that the warp and the weft constituting the glass cloth are opened by some method.
例えば特開昭61−230900号に開示されている高圧流体
加工装置を用い、高圧流体をガラスクロスに噴射し、そ
の衝撃エネルギーでガラスクロスを開繊する方法等が好
ましく使用される。開繊処理されたガラスクロスは構成
糸が開繊されているために、プリプレグ製造時に樹脂ワ
ニスを含みやすくなり、樹脂分を多くしても樹脂が表面
に余計に付着するようなこともなくクロスの内部に含ま
れるようになる。従って樹脂分を高めにしてもプレス時
にスリップが発生しにくく、又、回路の凹凸を充分に埋
め込みながら、且つ、樹脂の流出を小さく抑えることが
できる。For example, a method in which a high-pressure fluid is sprayed onto a glass cloth using a high-pressure fluid processing apparatus disclosed in JP-A-61-230900 and the glass cloth is opened with the impact energy is preferably used. Since the constituent yarns of the opened glass cloth are spread, it is easy to include a resin varnish during prepreg production, and even if the resin content is increased, the resin cloth does not adhere to the surface without excessively attaching the resin. Will be included inside. Therefore, even if the resin content is increased, slippage is less likely to occur at the time of pressing, and the outflow of the resin can be suppressed while sufficiently embedding the unevenness of the circuit.
ガラスクロスの開繊処理については、前記高圧流体を
使用する場合は、圧力を30〜150kg/cm2程度の高圧水流
を噴射することにより充分な開繊効果が得られる。In the case of using the above-mentioned high-pressure fluid, a sufficient opening effect can be obtained by injecting a high-pressure water stream at a pressure of about 30 to 150 kg / cm 2 .
又、本願の好ましい他の態様として、請求項1記載の
接着用プリプレグを2枚合せて用いることにより、内層
回路に気泡の抱きこみが少なく、且つ、樹脂の流出の少
ない半導体搭載多層板を得ることができる。Further, as another preferred embodiment of the present invention, by using two bonding prepregs according to claim 1 together, it is possible to obtain a semiconductor-mounted multilayer board with less entrapment of air bubbles in the inner layer circuit and less outflow of resin. be able to.
接着用プリプレグ1枚の場合は、回路への埋め込み性
をよくするために、樹脂分を高くするとどうしてもガラ
スクロスの表面に付着する樹脂の量が多くなり、従っ
て、それだけスリップを起しやすくなり、又、樹脂の流
出量も多くなりやすい。プリプレグを2枚使用すること
により、1枚の樹脂量としては少なくても、2枚合わせ
ることにより、内層回路を埋める樹脂量としては多くな
ることになり、回路凹凸の埋めこみ性はよくなる。しか
しガラスクロスの表面に付着している樹脂量は1枚だけ
の場合より少なくすることができるため、スリップの発
生は起りにくく、又樹脂の流出も小さく抑えることがで
きる。従って。プリプレグを2枚合わせて使用する場合
は、1枚の場合と比較して作業条件の許容範囲幅を広く
することが可能となる。In the case of one adhesive prepreg, if the resin content is increased to improve the embedding property in the circuit, the amount of resin adhering to the surface of the glass cloth will inevitably increase, and therefore, slip will easily occur, Also, the outflow of resin tends to increase. By using two prepregs, even if the amount of resin of one sheet is small, by combining two sheets, the amount of resin for filling the inner layer circuit becomes large, and the embedding property of circuit unevenness is improved. However, the amount of resin adhering to the surface of the glass cloth can be made smaller than in the case of only one glass cloth, so that the occurrence of slip hardly occurs and the outflow of the resin can be suppressed to be small. Therefore. When two prepregs are used together, it is possible to increase the allowable range of working conditions as compared with the case of using one prepreg.
本願の接着用プリプレグに使用されるガラスクロス
は、厚さ50μm〜200μmのガラスクロスが適してい
る。ガラスクロスの選択にあたっては、プリプレグの厚
さが回路銅箔の厚さの1.5〜3.0倍の範囲に入るようなガ
ラスクロスを選択することが望ましい。As the glass cloth used for the adhesive prepreg of the present application, a glass cloth having a thickness of 50 μm to 200 μm is suitable. In selecting the glass cloth, it is desirable to select a glass cloth in which the thickness of the prepreg falls within the range of 1.5 to 3.0 times the thickness of the circuit copper foil.
<実 施 例> 実施例1〜5 ガラスクロスWEA116E〔日東紡績(株):厚さ100μ
m〕をシランカップリング剤〔東レシリコーン(株):S
Z−6032〕で表面処理し、下記組成のFR−4タイプエポ
キシ樹脂ワニスに含浸し、プリプレグを作成する。<Examples> Examples 1 to 5 Glass cloth WEA116E [Nitto Boseki Co., Ltd .: thickness 100μ]
m] with a silane coupling agent [Toray Silicone Co., Ltd .: S
Z-6032], and impregnated in FR-4 type epoxy resin varnish having the following composition to prepare a prepreg.
エピコート 5046−B−80〔油化シエルエポキシ
(株)〕 100部 エピコート 154〔油化シエルエポキシ(株)〕 20〃 ジシアンジアミド 4〃 ベンジルジメチルアミン 0.2〃 メチルエチルケトン 15〃 ジメチルホルムアミド 30〃 5種類のプリプレグの夫々の樹脂分、ゲルタイムを第
1表に示す。樹脂分の測定はJIS C 6521 5.4により、ゲ
ルタイムの測定はJIS C 6521 5.7により行った。Epicoat 5046-B-80 [Yuika Ciel Epoxy Co., Ltd.] 100 parts Epicoat 154 [Yuika Ciel Epoxy Co., Ltd.] 20〃 Dicyandiamide 4〃 Benzyldimethylamine 0.2 エ チ ル Methylethylketone 15〃 Dimethylformamide 30〃 5 types of prepreg Table 1 shows the respective resin components and gel times. The resin content was measured according to JIS C 6521 5.4, and the gel time was measured according to JIS C 6521 5.7.
実施例6 実施例1で使用したガラスクロスに特開昭61−230900
号に開示された高圧流体加工装置により高圧水流を噴射
し、開繊処理を施こした。(圧力100kg/cm2)このガラ
スクロスを用い実施例1と同様にプレプレグを作成す
る。樹脂分及びゲルタイムは第1表に示す。Example 6 The glass cloth used in Example 1 was replaced with JP-A-61-230900.
The high-pressure fluid processing device disclosed in No. 1 was used to spray a high-pressure water stream to perform fiber opening processing. (Pressure: 100 kg / cm 2 ) A prepreg is prepared in the same manner as in Example 1 using this glass cloth. Table 1 shows the resin content and the gel time.
実施例7 ガラスクロスWEA05E〔日東紡績(株):厚さ50μm〕
をシランカップリング剤〔東レシリコーン(株):SZ−6
032〕で表面処理し、実施例1と同じFR−4エポキシ樹
脂ワニスに含浸し、プリプレグを作成する。樹脂分及び
ゲルタイムは第1表に示す。Example 7 Glass cloth WEA05E [Nitto Boseki Co., Ltd .: 50 μm thickness]
To a silane coupling agent [Toray Silicone Co., Ltd .: SZ-6
032], and impregnated in the same FR-4 epoxy resin varnish as in Example 1 to prepare a prepreg. Table 1 shows the resin content and the gel time.
<比 較 例> 比較例1〜3 実施例1と同じガラスクロス及び樹脂ワニスを用い、
プリプレグを作成する。3種類のプリプレグの樹脂分及
びゲルタイムは第1表に示す。<Comparative Examples> Comparative Examples 1 to 3 Using the same glass cloth and resin varnish as in Example 1,
Create a prepreg. Table 1 shows the resin content and gel time of the three types of prepregs.
実施例1〜7及び比較例1〜3の10種類のプリプレグ
を図−3の様にカットした。(49mm×49mm) 又、銅箔回路を有する積層板1(ガラスエポキシ)と
銅箔回路を有さない積層板2(ガラスエポキシ)とを用
意し、図−3のようにカットした。尚、銅箔の厚さは35
μmである。Ten types of prepregs of Examples 1 to 7 and Comparative Examples 1 to 3 were cut as shown in FIG. (49 mm × 49 mm) A laminate 1 having a copper foil circuit (glass epoxy) and a laminate 2 having no copper foil circuit (glass epoxy) were prepared and cut as shown in FIG. The thickness of the copper foil is 35
μm.
9種類のプリプレグについて、夫々積層板1と積層板
2との間に実施例1〜6及び比較例1〜3については、
プリプレグを1枚づつ、実施例7については2枚を合せ
て挿入し、170℃、30kg/cm2の条件で加熱加圧し、積層
板1と積層板2をプリプレグを介して接着した。積層板
1は銅箔回路を有する面を内側にした。About nine types of prepregs, between Examples 1-6 and Comparative Examples 1-3 between the laminated board 1 and the laminated board 2, respectively,
The prepregs were inserted one by one, and in Example 7, two sheets were inserted together, heated and pressed at 170 ° C. and 30 kg / cm 2 , and the laminates 1 and 2 were bonded via the prepreg. The laminate 1 had the side having the copper foil circuit inside.
上記のようにして得られた9種類の積層板について、
ボイド不良率及び樹脂の流出量を測定した。その結果を
第1表に示す。About nine kinds of laminated boards obtained as described above,
The void defect rate and the outflow of resin were measured. Table 1 shows the results.
ボイド不良率の測定法 積層板の中心部を切断し、断面に於ける接着層部を光
学顕微鏡によりボイドの有無を調べ、 により算出。Measurement method of void defect rate Cut the center part of the laminate, check the adhesive layer part in the cross section with an optical microscope for the presence of voids, Calculated by
樹脂の流出量の測定 積層板の中央開口部の周縁部で、接着層部から流出し
ている樹脂量を長さで測定 流出量が0.3mm以下 ○ 0.3〜1.0mm △ 1.0mm以上 × で判断 <発明の効果> 本願の接着用プリプレグを半導体搭載多層板に用いる
ことにより、内層回路の埋め込み性が良く、従って接着
層中に気泡の抱きこみが少なく、又接着層中からの樹脂
の流出量が少なく、従って、内層回路のボンディングパ
ッド部を樹脂が被覆することを抑えられ、半導体とのワ
イヤボンディング性を良好に保つことができる。Measurement of resin outflow At the periphery of the central opening of the laminate, measure the amount of resin flowing out of the adhesive layer by length Outflow is 0.3 mm or less ○ 0.3 to 1.0 mm △ 1.0 mm or more × <Effects of the Invention> By using the adhesive prepreg of the present invention for a semiconductor-mounted multilayer board, the embedding property of the inner layer circuit is good, so that bubbles are less entrapped in the adhesive layer, and the amount of resin flowing out of the adhesive layer. Therefore, it is possible to suppress the resin from covering the bonding pad portion of the inner layer circuit, and it is possible to maintain good wire bonding property with the semiconductor.
特に、開繊処理されたガラスクロスをプリプレグの基
材として使用することにより、更に、気泡抱きこみの少
ない、且つ樹脂流出量の少ない半導体搭載多層板を得る
ことができる。Particularly, by using the glass cloth subjected to the fiber opening treatment as the base material of the prepreg, it is possible to obtain a semiconductor-mounted multilayer board with less air bubbles and less resin outflow.
更に、本願の接着用プリプレグを2枚合せて用いた半
導体搭載多層板は、1枚の場合と比較して本願の効果を
より一層発揮する。Furthermore, a semiconductor-mounted multilayer board using two bonding prepregs of the present application together exhibits the effects of the present application more than a single board.
第1図は半導体搭載多層板の断面図、第2図はその部分
拡大図を示す。第3図は実施例、比較例における接着用
プリプレグの切断例を示す。 符号の説明 1:内層回路基板、7,9:回路 2:表層回路基板、8,10:ボンディングパッド 3:半導体、11:ボンディングワイヤ 6:接着用プリプレグ、12:ピンFIG. 1 is a sectional view of a semiconductor-mounted multilayer board, and FIG. 2 is a partially enlarged view thereof. FIG. 3 shows an example of cutting an adhesive prepreg in Examples and Comparative Examples. Explanation of symbols 1: inner circuit board, 7, 9: circuit 2: surface circuit board, 8, 10: bonding pad 3: semiconductor, 11: bonding wire 6: prepreg for bonding, 12: pin
───────────────────────────────────────────────────── フロントページの続き (72)発明者 畑中 英之 福島県郡山市長者2‐16‐19 (56)参考文献 特開 平2−227422(JP,A) 特開 平2−200861(JP,A) 昭和56年8月1日(株)近代科学社発 行,CLYDE F.COOMBS,J r編「プリント回路ハンドブック(全訂 第2版)」第6部「多層プリント回路」 21.多層板材料の選択と規格(21−1〜 21−7) 昭和51年11月10日(株)シーエムシー 発行,英一太 著「プリント配線基板」 3.4エポキシ樹脂・ガラスクロス糸銅 張り積層板の製造(56〜57頁) (58)調査した分野(Int.Cl.7,DB名) C08J 5/24 H01L 23/14 B32B 17/04 ────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hideyuki Hatanaka 2-16-19, Mayor of Koriyama, Fukushima Prefecture (56) References JP-A-2-227422 (JP, A) JP-A-2-200861 (JP, A ) August 1, 1981, published by Modern Science Co., Ltd., CLYDEF. 21. COOMBS, Jr., "Printed Circuit Handbook (Complete Edition 2nd Edition)", Part 6, "Multilayer Printed Circuits". Selection and Standards of Multilayer Board Materials (21-1 to 21-7) Published by CMC Co., Ltd., November 10, 1976, "Printed Wiring Boards" by Eiichi Eita "Printed circuit boards" 3.4 Epoxy resin, glass cloth thread copper Production of laminates (pages 56-57) (58) Fields investigated (Int. Cl. 7 , DB name) C08J 5/24 H01L 23/14 B32B 17/04
Claims (3)
らなる接着用プリプレグに於いて該プリプレグの樹脂分
を55±5%の範囲とし、且つ、該プリプレグを構成する
樹脂ワニスのゲルタイムが20±10秒であることを特徴と
する半導体搭載多層板用プリプレグ。In an adhesive prepreg comprising a glass cloth and an epoxy resin varnish, the resin content of the prepreg is in the range of 55 ± 5%, and the resin varnish constituting the prepreg has a gel time of 20 ± 10%. A prepreg for a multi-layer board mounted with a semiconductor, wherein the second is a second.
プレグに使用されたガラスクロスが、開繊処理されてい
ることを特徴とする半導体搭載多層板用プリプレグ。2. The prepreg for a semiconductor-mounted multilayer board according to claim 1, wherein the glass cloth used for the prepreg has been subjected to fiber opening treatment.
て、該多層板の各接着層に請求項1記載のプリプレグが
1枚もしくは2枚合わせて使用されていることを特徴と
する半導体搭載多層板。3. A semiconductor mounting multilayer board having an inner layer circuit, wherein one or two of the prepregs according to claim 1 are used for each adhesive layer of said multilayer board. Multilayer board.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02290943A JP3074724B2 (en) | 1990-10-30 | 1990-10-30 | Adhesive prepreg and multilayer board for mounting on semiconductor using the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02290943A JP3074724B2 (en) | 1990-10-30 | 1990-10-30 | Adhesive prepreg and multilayer board for mounting on semiconductor using the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH04261438A JPH04261438A (en) | 1992-09-17 |
| JP3074724B2 true JP3074724B2 (en) | 2000-08-07 |
Family
ID=17762499
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02290943A Expired - Fee Related JP3074724B2 (en) | 1990-10-30 | 1990-10-30 | Adhesive prepreg and multilayer board for mounting on semiconductor using the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3074724B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7252871B2 (en) * | 2019-09-26 | 2023-04-05 | 京セラ株式会社 | SUBSTRATE STRUCTURE AND ELECTRONIC DEVICE USING SUBSTRATE STRUCTURE |
-
1990
- 1990-10-30 JP JP02290943A patent/JP3074724B2/en not_active Expired - Fee Related
Non-Patent Citations (2)
| Title |
|---|
| 昭和51年11月10日(株)シーエムシー発行,英一太 著「プリント配線基板」3.4エポキシ樹脂・ガラスクロス糸銅張り積層板の製造(56〜57頁) |
| 昭和56年8月1日(株)近代科学社発行,CLYDE F.COOMBS,Jr編「プリント回路ハンドブック(全訂第2版)」第6部「多層プリント回路」21.多層板材料の選択と規格(21−1〜21−7) |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04261438A (en) | 1992-09-17 |
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