JP3078415B2 - Aluminum nitride wiring board - Google Patents
Aluminum nitride wiring boardInfo
- Publication number
- JP3078415B2 JP3078415B2 JP04342986A JP34298692A JP3078415B2 JP 3078415 B2 JP3078415 B2 JP 3078415B2 JP 04342986 A JP04342986 A JP 04342986A JP 34298692 A JP34298692 A JP 34298692A JP 3078415 B2 JP3078415 B2 JP 3078415B2
- Authority
- JP
- Japan
- Prior art keywords
- aluminum nitride
- sintered body
- frequency
- substrate
- dielectric loss
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Production Of Multi-Layered Print Wiring Board (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、高熱伝導性の窒化アル
ミニウム質焼結体を絶縁体として用い、且つ高周波領域
で使用される多層基板や半導体パッケージなどの半導体
素子搭載用基板に好適な窒化アルミニウム配線基板に関
する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a semiconductor device such as a multilayer substrate or a semiconductor package, such as a semiconductor package, using a high thermal conductivity aluminum nitride sintered body as an insulator. The present invention relates to an aluminum wiring board.
【0002】[0002]
【従来技術】従来、半導体素子を搭載するセラミック基
板や多層配線用セラミック基板におけるセラミック絶縁
体としては、アルミナセラミックなどの高電気絶縁性の
材料から構成されていたが、その内部や表面に形成され
る配線層やそれに搭載される半導体素子の高集積化に伴
い、それらからの発熱をいかに効率的に外部に放散する
かが大きな問題となっているが、従来のアルミナセラミ
ックスはその熱伝導率が20W/m・k程度と非常に低
く、これらの要求に応えることができないのであった。
また、多層配線基板や半導体素子搭載用基板は、情報量
の増大、処理の高速化の要求に伴い、配線層中に伝送さ
れる電気信号の周波数も高周波化する傾向にある。2. Description of the Related Art Conventionally, a ceramic insulator for a ceramic substrate on which a semiconductor element is mounted or a ceramic substrate for multilayer wiring is made of a material having high electrical insulation such as alumina ceramic, but is formed inside or on the surface thereof. With the increasing integration of wiring layers and the semiconductor elements mounted on them, it has become a major issue how to efficiently dissipate the heat generated from them, but conventional alumina ceramics have a low thermal conductivity. It was very low, about 20 W / m · k, and could not meet these requirements.
In addition, in a multilayer wiring board and a substrate for mounting a semiconductor element, the frequency of an electric signal transmitted in a wiring layer tends to increase with the demand for an increase in the amount of information and a higher processing speed.
【0003】最近に至り、非酸化性セラミックスの1種
である窒化アルミニウム焼結体が高電気絶縁性を有し、
しかも100W/m・k以上の高熱伝導性を有すること
から従来のアルミナセラミックスに代わり、窒化アルミ
ニウム焼結体を絶縁体とする基板の開発が進められてい
る。[0003] Recently, a sintered body of aluminum nitride, which is a kind of non-oxidizing ceramics, has high electrical insulation,
In addition, since it has high thermal conductivity of 100 W / m · k or more, development of a substrate using an aluminum nitride sintered body as an insulator instead of conventional alumina ceramics is being advanced.
【0004】通常、窒化アルミニウム焼結体は、窒化ア
ルミニウム粉末に周期律表第3a族元素や周期律表第2
a族元素の酸化物、窒化物などからなる焼結助剤を添加
し、これを成形して窒素などの非酸化性雰囲気中で16
00乃至2000℃の温度で焼成することに得られ、か
かる方法によれば、結晶粒子径が1〜20μmの焼結体
が得られる。[0004] Usually, aluminum nitride sintered bodies are prepared by adding an element belonging to Group 3a of the periodic table or a second element of the periodic table to the aluminum nitride powder.
A sintering aid consisting of an oxide or nitride of a group a element is added, and the resultant is molded to form a sintering aid in a non-oxidizing atmosphere such as nitrogen.
It is obtained by firing at a temperature of 00 to 2000 ° C. According to this method, a sintered body having a crystal particle diameter of 1 to 20 μm is obtained.
【0005】[0005]
【発明が解決しようとする問題点】そこで、本発明者等
は窒化アルミニウム焼結体の高周波領域に用いられる多
層配線基板や半導体素子搭載用基板への応用を検討して
いたところ、窒化アルミニウム焼結体の誘電正接が特定
の周波数で高い値を示し、これにより配線層を伝送する
信号が減衰するという問題が生じることがわかった。The present inventors have been studying the application of aluminum nitride sintered bodies to multilayer wiring boards and semiconductor element mounting boards used in the high-frequency range. It has been found that the dielectric loss tangent of the composite shows a high value at a specific frequency, which causes a problem that the signal transmitted through the wiring layer is attenuated.
【0006】[0006]
【問題点を解決するための手段】本発明者等は、前記挙
動について研究を進めた結果、配線層に伝送される信号
の周波数によって、焼結体の誘電正接が変動し、特定の
周波数域で誘電正接が極大値を有すること、誘電正接が
極大値を呈する周波数が窒化アルミニウム焼結体の結晶
粒径により変動することを見出した。そこで、使用する
電気信号の周波数に応じて基板を構成する焼結体の結晶
粒径を特定の条件を満足するように選択することによ
り、伝送される電気信号の周波数に係わらず、常に低い
誘電正接に維持することができる基板を提供できること
を知見し、本発明に至った。Means for Solving the Problems The present inventors have conducted research on the above-mentioned behavior, and as a result, the dielectric loss tangent of the sintered body fluctuates depending on the frequency of a signal transmitted to the wiring layer, and the specific frequency range is changed. It was found that the dielectric tangent had a maximum value and that the frequency at which the dielectric tangent exhibited a maximum value varied depending on the crystal grain size of the aluminum nitride sintered body. Therefore, by selecting the crystal grain size of the sintered body constituting the substrate according to the frequency of the electric signal to be used so as to satisfy a specific condition, the dielectric constant is always low regardless of the frequency of the transmitted electric signal. The present inventors have found that a substrate that can maintain a tangent can be provided, and have reached the present invention.
【0007】即ち、本発明の窒化アルミニウム配線基板
によれば、窒化アルミニウム結晶の平均結晶粒径が0.
5〜40μmの窒化アルミニウム質焼結体からなる絶縁
体の内部あるいは表面に配線層が形成され、該配線層に
伝送される電気信号の周波数が100MHz以上である
窒化アルミニウム配線基板であって、前記窒化アルミニ
ウム質焼結体の平均結晶粒径をd(mm)、前記配線層
に伝送される電気信号の周波数をf(Hz)とした時、
前記dと前記fとの積が3000以下、または3000
0以上とすることにより、前記窒化アルミニウム質焼結
体の誘電正接を0.01以下としたことを特徴とするも
のである。That is, according to the aluminum nitride wiring substrate of the present invention, the average crystal grain size of the aluminum nitride crystal is 0.1 mm.
An aluminum nitride wiring substrate, wherein a wiring layer is formed inside or on a surface of an insulator made of an aluminum nitride sintered body of 5 to 40 μm, and a frequency of an electric signal transmitted to the wiring layer is 100 MHz or more, When the average crystal grain size of the aluminum nitride sintered body is d (mm) and the frequency of an electric signal transmitted to the wiring layer is f (Hz),
The product of the d and the f is 3000 or less, or 3000
By setting it to 0 or more, the dielectric loss tangent of the aluminum nitride-based sintered body is made 0.01 or less.
【0008】[0008]
【作用】本発明によれば、配線基板に形成された配線層
に伝送される電気信号の周波数f(Hz)に対して、基
板の絶縁体を形成する窒化アルミニウム焼結体の平均結
晶粒径d(m)をd×f値が3000以下、または30
000以上となる関係を満足するように電気信号の周波
数と基板を構成する焼結体を選択することにより、常に
0.01以下の低い値に制御することができる。これに
より、誘電正接の増大による伝送される信号が減衰する
ことがなく、常に安定した状態を維持することができ、
配線基板としての長期信頼性を付与することができる。According to the present invention, the average crystal grain size of the aluminum nitride sintered body forming the insulator of the substrate is determined with respect to the frequency f (Hz) of the electric signal transmitted to the wiring layer formed on the wiring substrate. d (m) is d × f value of 3000 or less, or 30
By selecting the frequency of the electric signal and the sintered body constituting the substrate so as to satisfy the relationship of not less than 000, the value can always be controlled to a low value of 0.01 or less. As a result, a signal transmitted due to an increase in the dielectric loss tangent is not attenuated, and a stable state can always be maintained.
Long-term reliability as a wiring board can be provided.
【0009】[0009]
【実施例】本発明において用いられる窒化アルミニウム
焼結体は、周知の方法により作製することができる。即
ち、平均粒径が0.3〜2.5μmの窒化アルミニウム
粉末と、周期律表第3a族や第2a族元素の酸化物、窒
化物などからなる焼結助剤を0.01〜20重量%の割
合で添加し、これを周知の方法により成形後、1600
〜2000℃の窒素などの非酸化性雰囲気中で焼成する
ことにより得ることができる。なお、焼結体中の結晶粒
径は、窒化アルミニウム原料粉末の粒径が大きいほど大
きくなり、焼成時間が長いほど粒成長を起こし大きくな
る傾向にあるため、平均粒径は、原料粉末粒径、焼成温
度、焼成時間などを調整することによりを適宜制御する
ことができる。DESCRIPTION OF THE PREFERRED EMBODIMENTS The aluminum nitride sintered body used in the present invention can be manufactured by a known method. That is, 0.01 to 20% by weight of an aluminum nitride powder having an average particle diameter of 0.3 to 2.5 μm and a sintering aid composed of an oxide, nitride or the like of an element of Group 3a or Group 2a of the periodic table. %, And after molding by a known method, 1600
It can be obtained by firing in a non-oxidizing atmosphere such as nitrogen at 20002000 ° C. Note that the crystal grain size in the sintered body tends to increase as the grain size of the aluminum nitride raw material powder increases, and the size tends to increase as the firing time increases. By adjusting the firing temperature, the firing time, and the like, the temperature can be appropriately controlled.
【0010】かかる焼結体表面に配線層を形成するに
は、例えば、銅などの金属を含む導体ペーストを焼結体
表面に塗布し、700〜900℃で焼成することにより
形成することができるが、かかる場合、導体層と焼結体
との密着性を高めるために、焼結体表面を酸化処理して
Al2 O3 膜を介在させたり、導体層中に窒化アルミニ
ウム粉末を添加することもできる。In order to form a wiring layer on the surface of such a sintered body, for example, a conductor paste containing a metal such as copper can be applied to the surface of the sintered body and fired at 700 to 900 ° C. However, in such a case, in order to increase the adhesion between the conductor layer and the sintered body, the surface of the sintered body is oxidized to interpose an Al 2 O 3 film, or aluminum nitride powder is added to the conductor layer. Can also.
【0011】また、多層配線基板を作製する場合には、
例えば上記の方法によりグリーンシート成形体を作製
し、かかるシート表面にタングステン、モリブデンなど
の高融点金属、所望により窒化アルミニウム粉末などの
基板の成分を添加した導体ペーストを塗布し、これらを
積層圧着した後、1600〜2000℃の窒素などの非
酸化性雰囲気中で成形体と導体を同時に焼成して得るこ
とができる。In the case of manufacturing a multilayer wiring board,
For example, a green sheet molded body was prepared by the above-described method, and a conductor paste containing a high melting point metal such as tungsten and molybdenum and, if desired, a component of a substrate such as aluminum nitride powder was applied to the sheet surface, and these were laminated and pressed. Thereafter, the molded body and the conductor can be simultaneously fired in a non-oxidizing atmosphere such as nitrogen at 1600 to 2000 ° C.
【0012】上記のようにして得られた基板の表面に
は、適宜受動部品や半導体素子などが搭載され、電気回
路が形成される。On the surface of the substrate obtained as described above, passive components, semiconductor elements, and the like are appropriately mounted to form an electric circuit.
【0013】そこで、まず、上記の方法に基づき窒化ア
ルミニウムの平均結晶粒径が異なる複数の基板を作製し
た。得られた焼結体の平均結晶粒径は電子顕微鏡写真に
おいて直線を引いて線上の結晶の粒径を測定し、その結
晶粒子の個数で割った値を20点取り、その平均値を2
次元粒子径とし補正係数を用いて3次元平均結晶粒子径
として得た。Therefore, first, a plurality of substrates having different average crystal grain sizes of aluminum nitride were manufactured based on the above method. The average crystal grain size of the obtained sintered body was determined by drawing a straight line in an electron micrograph, measuring the crystal grain size on the line, dividing the number by the number of crystal grains, and taking 20 points.
The three-dimensional average crystal particle diameter was obtained using the correction coefficient and the three-dimensional particle diameter.
【0014】そして、導体層に100MHz〜30GH
zの周波数、出力1mWの電気信号を伝送し、この時の
絶縁体の誘電正接を測定した。誘電正接の測定は、10
0MHz〜1GHzでは反射波法に基づき、5GHz〜
30GHz帯域では空洞共振器法に基づいてそれぞれ測
定した。図1に平均粒径が11μmの窒化アルミニウム
焼結体を用いた基板における周波数と誘電正接との関係
を示した。図1から明らかなように、100MHz以上
の周波数に対して窒化アルミニウム焼結体は、ある特定
の周波数帯域において誘電正接が極大値を有することが
理解される。The conductor layer has a frequency of 100 MHz to 30 GH.
An electric signal having a frequency of z and an output of 1 mW was transmitted, and the dielectric loss tangent of the insulator at this time was measured. Measurement of dielectric loss tangent is 10
From 0 MHz to 1 GHz, based on the reflected wave method, from 5 GHz to
In the 30 GHz band, each was measured based on the cavity resonator method. FIG. 1 shows the relationship between the frequency and the dielectric loss tangent of a substrate using an aluminum nitride sintered body having an average particle size of 11 μm. As is clear from FIG. 1, it is understood that the dielectric loss tangent of the aluminum nitride sintered body has a maximum value in a specific frequency band at a frequency of 100 MHz or more.
【0015】次に、図1の性質に基づき、平均粒径が異
なる焼結体において、それぞれ誘電正接を測定し、横軸
に周波数foを、縦軸に平均粒径dをとり図2に周波数
と平均粒径との関係を図2に示した。そして、各座標点
における誘電正接の値を、25×10-4以下を○、25
〜75×10-4を△、75〜125を×10-4を□、1
25×10-4以上を◇として表示した。図2によれば、
各焼結体における誘電正接の極大値を示す周波数は粒径
が小さくなるにつれて大きくなる傾向にあることがわか
った。Next, based on the properties shown in FIG. 1, the dielectric loss tangents of the sintered bodies having different average particle diameters were measured, and the frequency fo was plotted on the horizontal axis, and the average particle diameter d was plotted on the vertical axis. FIG. 2 shows the relationship between and the average particle size. Then, the value of the dielectric loss tangent at each coordinate point is represented by を, 25 × 10 −4 or less.
~ 75 × 10 -4 for △, 75-125 for × 10 -4 for □, 1
25 × 10 −4 or more was indicated as Δ. According to FIG.
It was found that the frequency showing the maximum value of the dielectric loss tangent in each sintered body tends to increase as the grain size decreases.
【0016】図2において線Xは、d×f=3000の
ライン、線Yはd×f=30000のラインである。図
中、線Xと線Yにはさまれた領域Bは誘電正接が0.0
1を越える領域であり、線Xと線Yの外側の領域Aは誘
電正接が0.01以下の領域である。In FIG. 2, line X is a line of d × f = 3000, and line Y is a line of d × f = 30000. In the figure, a region B sandwiched between line X and line Y has a dielectric loss tangent of 0.0.
The region A outside the line X and the line Y is a region having a dielectric loss tangent of 0.01 or less.
【0017】よって、基板の絶縁体の誘電正接を常に
0.01以下に維持するためには、焼結体の平均結晶粒
径d(m)と使用周波数(Hz)との関係が図2の領域
Aにあることが必要となる。即ち、本発明によれば、d
×fが3000以下、または30000以上であること
が必要となる。Therefore, in order to always maintain the dielectric loss tangent of the insulator of the substrate at 0.01 or less, the relationship between the average crystal grain size d (m) of the sintered body and the operating frequency (Hz) is shown in FIG. It is necessary to be in the area A. That is, according to the present invention, d
Xf needs to be 3,000 or less, or 30,000 or more.
【0018】また、本発明の配線層が形成された窒化ア
ルミニウム基板は、パルス伝送基板としても利用される
ものであるが、その場合には、パルスの立ち上がり時間
Tr(sec)についてfmax=0.35/Trで規
定される最大周波数成分fmaxと基板を構成する結晶
の平均粒径d(m)との積が3000以下、または30
000以上であることが必要である。The aluminum nitride substrate on which the wiring layer of the present invention is formed is also used as a pulse transmission substrate. In this case, the pulse rise time Tr (sec) is such that fmax = 0. The product of the maximum frequency component fmax defined by 35 / Tr and the average grain size d (m) of the crystal constituting the substrate is 3000 or less, or 30.
000 or more.
【0019】[0019]
【発明の効果】以上詳述した通り、本発明によれば、配
線基板に形成された配線層に伝送される電気信号の周波
数f(Hz)に対して、基板の絶縁体を形成する窒化ア
ルミニウム焼結体の平均結晶粒径d(m)を特定の条件
を満足するように制御することにより、窒化アルミニウ
ム焼結体からなる絶縁体の誘電正接を常に低い値に制御
することができ、伝送される信号の減衰を防止し、常に
安定した基板特性を維持し、配線基板としての長期信頼
性を付与することができる。As described above in detail, according to the present invention, the frequency f (Hz) of the electric signal transmitted to the wiring layer formed on the wiring board is changed with respect to the frequency f (Hz) of the aluminum nitride forming the insulator of the substrate. By controlling the average crystal grain size d (m) of the sintered body to satisfy a specific condition, the dielectric loss tangent of the insulator made of the aluminum nitride sintered body can always be controlled to a low value. This prevents the signal from being attenuated, maintains stable substrate characteristics at all times, and provides long-term reliability as a wiring substrate.
【図1】平均粒径が11μmの窒化アルミニウム焼結体
からなる基板における周波数と誘電正接との関係を示し
た図である。FIG. 1 is a view showing the relationship between the frequency and the dielectric loss tangent of a substrate made of an aluminum nitride sintered body having an average particle size of 11 μm.
【図2】窒化アルミニウム焼結体の平均結晶粒径d
(m)と周波数(Hz)とを座標軸として、各座標点に
おける誘電正接の値を示した図である。FIG. 2 shows the average crystal grain size d of an aluminum nitride sintered body
FIG. 3 is a diagram showing values of dielectric loss tangent at each coordinate point using (m) and frequency (Hz) as coordinate axes.
フロントページの続き 合議体 審判長 松田 悠子 審判官 中澤 登 審判官 中嶋 清 (56)参考文献 特開 平1−189191(JP,A)Continuing on the front page Jury President Yuko Matsuda Judge Noboru Nakazawa Judge Judge Nakajima Kiyoshi (56) References JP-A-1-189191 (JP, A)
Claims (1)
0.5〜40μmの窒化アルミニウム質焼結体の内部あ
るいは表面に配線層が形成され、該配線層に伝送される
電気信号の周波数が100MHz以上である窒化アルミ
ニウム配線基板であって、前記窒化アルミニウム質焼結
体の前記平均結晶粒径をd(mm)、前記配線層に伝送
される電気信号の周波数をf(Hz)とした時、前記d
と前記fとの積が3000以下、または30000以上
とすることにより、前記窒化アルミニウム質焼結体の誘
電正接を0.01以下としたことを特徴とする窒化アル
ミニウム配線基板。A wiring layer is formed inside or on a surface of an aluminum nitride sintered body having an average crystal grain size of 0.5 to 40 μm, and the frequency of an electric signal transmitted to the wiring layer is 100 MHz. An aluminum nitride wiring substrate as described above, wherein the average crystal grain size of the aluminum nitride sintered body is d (mm), and the frequency of an electric signal transmitted to the wiring layer is f (Hz). Said d
An aluminum nitride wiring substrate, wherein the product of f and f is 3000 or less, or 30000 or more, whereby the dielectric loss tangent of the aluminum nitride sintered body is 0.01 or less.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04342986A JP3078415B2 (en) | 1992-12-24 | 1992-12-24 | Aluminum nitride wiring board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP04342986A JP3078415B2 (en) | 1992-12-24 | 1992-12-24 | Aluminum nitride wiring board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06196590A JPH06196590A (en) | 1994-07-15 |
| JP3078415B2 true JP3078415B2 (en) | 2000-08-21 |
Family
ID=18358054
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP04342986A Expired - Lifetime JP3078415B2 (en) | 1992-12-24 | 1992-12-24 | Aluminum nitride wiring board |
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| Country | Link |
|---|---|
| JP (1) | JP3078415B2 (en) |
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| JPH10275524A (en) * | 1997-03-31 | 1998-10-13 | Kyocera Corp | Plasma resistant material |
| JP2016092122A (en) * | 2014-10-31 | 2016-05-23 | 三井造船株式会社 | Silicon carbide substrate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01189191A (en) * | 1988-01-25 | 1989-07-28 | Toshiba Corp | Circuit board |
-
1992
- 1992-12-24 JP JP04342986A patent/JP3078415B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06196590A (en) | 1994-07-15 |
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