JP3083346B2 - Method for producing propylene block copolymer - Google Patents
Method for producing propylene block copolymerInfo
- Publication number
- JP3083346B2 JP3083346B2 JP03161817A JP16181791A JP3083346B2 JP 3083346 B2 JP3083346 B2 JP 3083346B2 JP 03161817 A JP03161817 A JP 03161817A JP 16181791 A JP16181791 A JP 16181791A JP 3083346 B2 JP3083346 B2 JP 3083346B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- compound
- component
- group
- chloride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 title claims description 22
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 title claims description 22
- 229920001400 block copolymer Polymers 0.000 title claims description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 52
- -1 polypropylene Polymers 0.000 claims description 45
- 239000011777 magnesium Substances 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 15
- 150000002367 halogens Chemical class 0.000 claims description 15
- 229910052736 halogen Inorganic materials 0.000 claims description 14
- 229910044991 metal oxide Inorganic materials 0.000 claims description 14
- 150000004706 metal oxides Chemical class 0.000 claims description 14
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 10
- 239000005977 Ethylene Substances 0.000 claims description 10
- 229910052749 magnesium Inorganic materials 0.000 claims description 10
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 9
- 239000004743 Polypropylene Substances 0.000 claims description 7
- 229920001155 polypropylene Polymers 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 7
- 150000003961 organosilicon compounds Chemical class 0.000 claims description 6
- 239000002685 polymerization catalyst Substances 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 150000002430 hydrocarbons Chemical group 0.000 claims description 5
- 230000000379 polymerizing effect Effects 0.000 claims description 5
- 239000011949 solid catalyst Substances 0.000 claims description 4
- 150000002902 organometallic compounds Chemical class 0.000 claims description 3
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 48
- 238000000034 method Methods 0.000 description 31
- 125000000217 alkyl group Chemical group 0.000 description 12
- 125000001183 hydrocarbyl group Chemical group 0.000 description 12
- 229920000642 polymer Polymers 0.000 description 12
- 125000003118 aryl group Chemical group 0.000 description 11
- 150000002681 magnesium compounds Chemical class 0.000 description 11
- 238000006116 polymerization reaction Methods 0.000 description 11
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 150000003609 titanium compounds Chemical class 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 8
- 229910052782 aluminium Inorganic materials 0.000 description 8
- 125000000753 cycloalkyl group Chemical group 0.000 description 8
- 239000010703 silicon Substances 0.000 description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 7
- 239000002253 acid Substances 0.000 description 7
- 150000001336 alkenes Chemical class 0.000 description 7
- 125000003710 aryl alkyl group Chemical group 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 7
- 125000005843 halogen group Chemical group 0.000 description 7
- 239000001257 hydrogen Substances 0.000 description 7
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical group N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 150000001735 carboxylic acids Chemical class 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 150000004820 halides Chemical class 0.000 description 5
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 150000001298 alcohols Chemical class 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 4
- 229910052796 boron Inorganic materials 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- 229930195733 hydrocarbon Natural products 0.000 description 4
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 4
- 150000002894 organic compounds Chemical class 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 4
- 230000000704 physical effect Effects 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 3
- 150000001733 carboxylic acid esters Chemical class 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- 238000010908 decantation Methods 0.000 description 3
- 150000002170 ethers Chemical class 0.000 description 3
- MTZQAGJQAFMTAQ-UHFFFAOYSA-N ethyl benzoate Chemical compound CCOC(=O)C1=CC=CC=C1 MTZQAGJQAFMTAQ-UHFFFAOYSA-N 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229940052308 general anesthetics halogenated hydrocarbons Drugs 0.000 description 3
- 150000008282 halocarbons Chemical class 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- IUGYQRQAERSCNH-UHFFFAOYSA-N pivalic acid Chemical compound CC(C)(C)C(O)=O IUGYQRQAERSCNH-UHFFFAOYSA-N 0.000 description 3
- 229920000098 polyolefin Polymers 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000006228 supernatant Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- VOITXYVAKOUIBA-UHFFFAOYSA-N triethylaluminium Chemical compound CC[Al](CC)CC VOITXYVAKOUIBA-UHFFFAOYSA-N 0.000 description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N 1-Octanol Chemical compound CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 2
- KPWDGTGXUYRARH-UHFFFAOYSA-N 2,2,2-trichloroethanol Chemical compound OCC(Cl)(Cl)Cl KPWDGTGXUYRARH-UHFFFAOYSA-N 0.000 description 2
- BSWWXRFVMJHFBN-UHFFFAOYSA-N 2,4,6-tribromophenol Chemical compound OC1=C(Br)C=C(Br)C=C1Br BSWWXRFVMJHFBN-UHFFFAOYSA-N 0.000 description 2
- FAXWFCTVSHEODL-UHFFFAOYSA-N 2,4-dibromophenol Chemical compound OC1=CC=C(Br)C=C1Br FAXWFCTVSHEODL-UHFFFAOYSA-N 0.000 description 2
- RXGUIWHIADMCFC-UHFFFAOYSA-N 2-Methylpropyl 2-methylpropionate Chemical compound CC(C)COC(=O)C(C)C RXGUIWHIADMCFC-UHFFFAOYSA-N 0.000 description 2
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 2
- CMAOLVNGLTWICC-UHFFFAOYSA-N 2-fluoro-5-methylbenzonitrile Chemical compound CC1=CC=C(F)C(C#N)=C1 CMAOLVNGLTWICC-UHFFFAOYSA-N 0.000 description 2
- SZNYYWIUQFZLLT-UHFFFAOYSA-N 2-methyl-1-(2-methylpropoxy)propane Chemical compound CC(C)COCC(C)C SZNYYWIUQFZLLT-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000006201 3-phenylpropyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 2
- RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
- KCXZNSGUUQJJTR-UHFFFAOYSA-N Di-n-hexyl phthalate Chemical compound CCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCC KCXZNSGUUQJJTR-UHFFFAOYSA-N 0.000 description 2
- FHUODBDRWMIBQP-UHFFFAOYSA-N Ethyl p-anisate Chemical compound CCOC(=O)C1=CC=C(OC)C=C1 FHUODBDRWMIBQP-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229910010199 LiAl Inorganic materials 0.000 description 2
- YZBOVSFWWNVKRJ-UHFFFAOYSA-N Monobutylphthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(O)=O YZBOVSFWWNVKRJ-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 125000005234 alkyl aluminium group Chemical group 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
- DIKBFYAXUHHXCS-UHFFFAOYSA-N bromoform Chemical compound BrC(Br)Br DIKBFYAXUHHXCS-UHFFFAOYSA-N 0.000 description 2
- GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
- VJVUKRSEEMNRCM-UHFFFAOYSA-L butan-1-olate titanium(4+) dichloride Chemical compound [Cl-].[Cl-].CCCCO[Ti+2]OCCCC VJVUKRSEEMNRCM-UHFFFAOYSA-L 0.000 description 2
- NMJJFJNHVMGPGM-UHFFFAOYSA-N butyl formate Chemical compound CCCCOC=O NMJJFJNHVMGPGM-UHFFFAOYSA-N 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000001485 cycloalkadienyl group Chemical group 0.000 description 2
- 125000000392 cycloalkenyl group Chemical group 0.000 description 2
- KWOIDDOVDJYZLT-UHFFFAOYSA-L dichlorotitanium;phenol Chemical compound Cl[Ti]Cl.OC1=CC=CC=C1.OC1=CC=CC=C1 KWOIDDOVDJYZLT-UHFFFAOYSA-L 0.000 description 2
- HJXBDPDUCXORKZ-UHFFFAOYSA-N diethylalumane Chemical compound CC[AlH]CC HJXBDPDUCXORKZ-UHFFFAOYSA-N 0.000 description 2
- YNLAOSYQHBDIKW-UHFFFAOYSA-M diethylaluminium chloride Chemical compound CC[Al](Cl)CC YNLAOSYQHBDIKW-UHFFFAOYSA-M 0.000 description 2
- MGWAVDBGNNKXQV-UHFFFAOYSA-N diisobutyl phthalate Chemical compound CC(C)COC(=O)C1=CC=CC=C1C(=O)OCC(C)C MGWAVDBGNNKXQV-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- MNLMLEWXCMFNFO-UHFFFAOYSA-K ethanol;trichlorotitanium Chemical compound CCO.Cl[Ti](Cl)Cl MNLMLEWXCMFNFO-UHFFFAOYSA-K 0.000 description 2
- GCPCLEKQVMKXJM-UHFFFAOYSA-N ethoxy(diethyl)alumane Chemical compound CCO[Al](CC)CC GCPCLEKQVMKXJM-UHFFFAOYSA-N 0.000 description 2
- UAIZDWNSWGTKFZ-UHFFFAOYSA-L ethylaluminum(2+);dichloride Chemical compound CC[Al](Cl)Cl UAIZDWNSWGTKFZ-UHFFFAOYSA-L 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- OKJPEAGHQZHRQV-UHFFFAOYSA-N iodoform Chemical compound IC(I)I OKJPEAGHQZHRQV-UHFFFAOYSA-N 0.000 description 2
- NNPPMTNAJDCUHE-UHFFFAOYSA-N isobutane Chemical compound CC(C)C NNPPMTNAJDCUHE-UHFFFAOYSA-N 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 2
- QWTDNUCVQCZILF-UHFFFAOYSA-N isopentane Chemical compound CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
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- JGHYBJVUQGTEEB-UHFFFAOYSA-M dimethylalumanylium;chloride Chemical compound C[Al](C)Cl JGHYBJVUQGTEEB-UHFFFAOYSA-M 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- DWNAQMUDCDVSLT-UHFFFAOYSA-N diphenyl phthalate Chemical compound C=1C=CC=C(C(=O)OC=2C=CC=CC=2)C=1C(=O)OC1=CC=CC=C1 DWNAQMUDCDVSLT-UHFFFAOYSA-N 0.000 description 1
- XOCWTYIVWYOSGQ-UHFFFAOYSA-N dipropylalumane Chemical compound C(CC)[AlH]CCC XOCWTYIVWYOSGQ-UHFFFAOYSA-N 0.000 description 1
- PWWSSIYVTQUJQQ-UHFFFAOYSA-N distearyl thiodipropionate Chemical compound CCCCCCCCCCCCCCCCCCOC(=O)CCSCCC(=O)OCCCCCCCCCCCCCCCCCC PWWSSIYVTQUJQQ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- ZSWFCLXCOIISFI-UHFFFAOYSA-N endo-cyclopentadiene Natural products C1C=CC=C1 ZSWFCLXCOIISFI-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- MNFTYNIMQNJVJI-UHFFFAOYSA-N ethoxy(dipropyl)alumane Chemical compound CC[O-].CCC[Al+]CCC MNFTYNIMQNJVJI-UHFFFAOYSA-N 0.000 description 1
- XGAIERUWZADBAO-UHFFFAOYSA-N ethoxy-bis(2-methylpropyl)alumane Chemical compound CCO[Al](CC(C)C)CC(C)C XGAIERUWZADBAO-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 229960003750 ethyl chloride Drugs 0.000 description 1
- JJOYCHKVKWDMEA-UHFFFAOYSA-N ethyl cyclohexanecarboxylate Chemical compound CCOC(=O)C1CCCCC1 JJOYCHKVKWDMEA-UHFFFAOYSA-N 0.000 description 1
- XCTLDQQOHIEUCJ-UHFFFAOYSA-N ethyl naphthalene-1-carboxylate Chemical compound C1=CC=C2C(C(=O)OCC)=CC=CC2=C1 XCTLDQQOHIEUCJ-UHFFFAOYSA-N 0.000 description 1
- NARCMUVKZHPJHP-UHFFFAOYSA-L ethyl(diiodo)alumane Chemical compound [I-].[I-].CC[Al+2] NARCMUVKZHPJHP-UHFFFAOYSA-L 0.000 description 1
- JFICPAADTOQAMU-UHFFFAOYSA-L ethylaluminum(2+);dibromide Chemical compound CC[Al](Br)Br JFICPAADTOQAMU-UHFFFAOYSA-L 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- NKHAVTQWNUWKEO-UHFFFAOYSA-N fumaric acid monomethyl ester Natural products COC(=O)C=CC(O)=O NKHAVTQWNUWKEO-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- JLYXXMFPNIAWKQ-GNIYUCBRSA-N gamma-hexachlorocyclohexane Chemical compound Cl[C@H]1[C@H](Cl)[C@@H](Cl)[C@@H](Cl)[C@H](Cl)[C@H]1Cl JLYXXMFPNIAWKQ-GNIYUCBRSA-N 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- 229910021480 group 4 element Inorganic materials 0.000 description 1
- 229940093920 gynecological arsenic compound Drugs 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- CKAPSXZOOQJIBF-UHFFFAOYSA-N hexachlorobenzene Chemical compound ClC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl CKAPSXZOOQJIBF-UHFFFAOYSA-N 0.000 description 1
- VHHHONWQHHHLTI-UHFFFAOYSA-N hexachloroethane Chemical compound ClC(Cl)(Cl)C(Cl)(Cl)Cl VHHHONWQHHHLTI-UHFFFAOYSA-N 0.000 description 1
- VFDYKPARTDCDCU-UHFFFAOYSA-N hexachloropropene Chemical group ClC(Cl)=C(Cl)C(Cl)(Cl)Cl VFDYKPARTDCDCU-UHFFFAOYSA-N 0.000 description 1
- UJGPNLWJDSIACI-UHFFFAOYSA-N hexanedioyl dibromide Chemical compound BrC(=O)CCCCC(Br)=O UJGPNLWJDSIACI-UHFFFAOYSA-N 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APHGZSBLRQFRCA-UHFFFAOYSA-M indium(1+);chloride Chemical compound [In]Cl APHGZSBLRQFRCA-UHFFFAOYSA-M 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 1
- INQOMBQAUSQDDS-UHFFFAOYSA-N iodomethane Chemical compound IC INQOMBQAUSQDDS-UHFFFAOYSA-N 0.000 description 1
- 239000001282 iso-butane Substances 0.000 description 1
- 229960004592 isopropanol Drugs 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 229960002809 lindane Drugs 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- YSMZEMQBSONIMJ-UHFFFAOYSA-M magnesium;2-methanidylpropane;chloride Chemical compound [Mg+2].[Cl-].CC(C)[CH2-] YSMZEMQBSONIMJ-UHFFFAOYSA-M 0.000 description 1
- CQRPUKWAZPZXTO-UHFFFAOYSA-M magnesium;2-methylpropane;chloride Chemical compound [Mg+2].[Cl-].C[C-](C)C CQRPUKWAZPZXTO-UHFFFAOYSA-M 0.000 description 1
- IWCVDCOJSPWGRW-UHFFFAOYSA-M magnesium;benzene;chloride Chemical compound [Mg+2].[Cl-].C1=CC=[C-]C=C1 IWCVDCOJSPWGRW-UHFFFAOYSA-M 0.000 description 1
- LWLPYZUDBNFNAH-UHFFFAOYSA-M magnesium;butane;bromide Chemical compound [Mg+2].[Br-].CCC[CH2-] LWLPYZUDBNFNAH-UHFFFAOYSA-M 0.000 description 1
- QUXHCILOWRXCEO-UHFFFAOYSA-M magnesium;butane;chloride Chemical compound [Mg+2].[Cl-].CCC[CH2-] QUXHCILOWRXCEO-UHFFFAOYSA-M 0.000 description 1
- YHNWUQFTJNJVNU-UHFFFAOYSA-N magnesium;butane;ethane Chemical compound [Mg+2].[CH2-]C.CCC[CH2-] YHNWUQFTJNJVNU-UHFFFAOYSA-N 0.000 description 1
- DLPASUVGCQPFFO-UHFFFAOYSA-N magnesium;ethane Chemical compound [Mg+2].[CH2-]C.[CH2-]C DLPASUVGCQPFFO-UHFFFAOYSA-N 0.000 description 1
- FRIJBUGBVQZNTB-UHFFFAOYSA-M magnesium;ethane;bromide Chemical compound [Mg+2].[Br-].[CH2-]C FRIJBUGBVQZNTB-UHFFFAOYSA-M 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- BQBCXNQILNPAPX-UHFFFAOYSA-N methoxy(dimethyl)alumane Chemical compound [O-]C.C[Al+]C BQBCXNQILNPAPX-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- QSSJZLPUHJDYKF-UHFFFAOYSA-N methyl 4-methylbenzoate Chemical compound COC(=O)C1=CC=C(C)C=C1 QSSJZLPUHJDYKF-UHFFFAOYSA-N 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 229940102396 methyl bromide Drugs 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N methyl p-hydroxycinnamate Natural products OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- XBKBZMOLSULOEA-UHFFFAOYSA-L methylaluminum(2+);dibromide Chemical compound C[Al](Br)Br XBKBZMOLSULOEA-UHFFFAOYSA-L 0.000 description 1
- YSTQWZZQKCCBAY-UHFFFAOYSA-L methylaluminum(2+);dichloride Chemical compound C[Al](Cl)Cl YSTQWZZQKCCBAY-UHFFFAOYSA-L 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910000096 monohydride Inorganic materials 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NKHAVTQWNUWKEO-NSCUHMNNSA-N monomethyl fumarate Chemical compound COC(=O)\C=C\C(O)=O NKHAVTQWNUWKEO-NSCUHMNNSA-N 0.000 description 1
- 229940005650 monomethyl fumarate Drugs 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- SNMVRZFUUCLYTO-UHFFFAOYSA-N n-propyl chloride Chemical compound CCCCl SNMVRZFUUCLYTO-UHFFFAOYSA-N 0.000 description 1
- 125000005487 naphthalate group Chemical group 0.000 description 1
- NSNPSJGHTQIXDO-UHFFFAOYSA-N naphthalene-1-carbonyl chloride Chemical compound C1=CC=C2C(C(=O)Cl)=CC=CC2=C1 NSNPSJGHTQIXDO-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 239000002667 nucleating agent Substances 0.000 description 1
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- AJYOOHCNOXWTKJ-UHFFFAOYSA-N p-Chlorobenzhydrol Chemical compound C=1C=C(Cl)C=CC=1C(O)C1=CC=CC=C1 AJYOOHCNOXWTKJ-UHFFFAOYSA-N 0.000 description 1
- 238000005453 pelletization Methods 0.000 description 1
- BNIXVQGCZULYKV-UHFFFAOYSA-N pentachloroethane Chemical compound ClC(Cl)C(Cl)(Cl)Cl BNIXVQGCZULYKV-UHFFFAOYSA-N 0.000 description 1
- PHLZDCSVSDSPPH-UHFFFAOYSA-N pentanedioyl dibromide Chemical compound BrC(=O)CCCC(Br)=O PHLZDCSVSDSPPH-UHFFFAOYSA-N 0.000 description 1
- YVOFTMXWTWHRBH-UHFFFAOYSA-N pentanedioyl dichloride Chemical compound ClC(=O)CCCC(Cl)=O YVOFTMXWTWHRBH-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 239000002574 poison Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- VWQXLMJSFGLQIT-UHFFFAOYSA-N prop-2-enoyl bromide Chemical compound BrC(=O)C=C VWQXLMJSFGLQIT-UHFFFAOYSA-N 0.000 description 1
- GLFSWJDJMXUVEV-UHFFFAOYSA-N prop-2-enoyl iodide Chemical compound IC(=O)C=C GLFSWJDJMXUVEV-UHFFFAOYSA-N 0.000 description 1
- GKIVTXLMSMDQJI-UHFFFAOYSA-N propanedioyl dibromide Chemical compound BrC(=O)CC(Br)=O GKIVTXLMSMDQJI-UHFFFAOYSA-N 0.000 description 1
- SXYFKXOFMCIXQW-UHFFFAOYSA-N propanedioyl dichloride Chemical compound ClC(=O)CC(Cl)=O SXYFKXOFMCIXQW-UHFFFAOYSA-N 0.000 description 1
- YYFIGOPUHPDIBO-UHFFFAOYSA-N propanoic acid;hydrochloride Chemical compound Cl.CCC(O)=O YYFIGOPUHPDIBO-UHFFFAOYSA-N 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- QMKUYPGVVVLYSR-UHFFFAOYSA-N propyl 2,2-dimethylpropanoate Chemical compound CCCOC(=O)C(C)(C)C QMKUYPGVVVLYSR-UHFFFAOYSA-N 0.000 description 1
- 229920005653 propylene-ethylene copolymer Polymers 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N sec-butylidene Natural products CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- STOSPPMGXZPHKP-UHFFFAOYSA-N tetrachlorohydroquinone Chemical compound OC1=C(Cl)C(Cl)=C(O)C(Cl)=C1Cl STOSPPMGXZPHKP-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- 150000007970 thio esters Chemical class 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- ZWYDDDAMNQQZHD-UHFFFAOYSA-L titanium(ii) chloride Chemical compound [Cl-].[Cl-].[Ti+2] ZWYDDDAMNQQZHD-UHFFFAOYSA-L 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- RJIFVNWOLLIBJV-UHFFFAOYSA-N tributyl benzene-1,2,4-tricarboxylate Chemical compound CCCCOC(=O)C1=CC=C(C(=O)OCCCC)C(C(=O)OCCCC)=C1 RJIFVNWOLLIBJV-UHFFFAOYSA-N 0.000 description 1
- ORYGRKHDLWYTKX-UHFFFAOYSA-N trihexylalumane Chemical compound CCCCCC[Al](CCCCCC)CCCCCC ORYGRKHDLWYTKX-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 1
- CNWZYDSEVLFSMS-UHFFFAOYSA-N tripropylalumane Chemical compound CCC[Al](CCC)CCC CNWZYDSEVLFSMS-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
- JLYXXMFPNIAWKQ-UHFFFAOYSA-N γ Benzene hexachloride Chemical compound ClC1C(Cl)C(Cl)C(Cl)C(Cl)C1Cl JLYXXMFPNIAWKQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Graft Or Block Polymers (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明はプロピレンブロック共重
合体の製造方法に関し、詳しくは、耐衝撃性と剛性のバ
ランスに優れたプロピレンブロック共重合体を製造する
方法に関する。The present invention relates to a method for producing a propylene block copolymer, and more particularly to a method for producing a propylene block copolymer having an excellent balance between impact resistance and rigidity.
【0002】[0002]
【従来の技術】さまざまな種類の高立体規則性触媒を用
いて製造される高結晶性ポリプロピレンは、剛性や耐熱
性に優れていることから、近年需要が急増している。し
かしながら、これらの性質も、使用目的によっては未だ
不十分であり、剛性を改良する方法が種々提案されてい
るが、それらの多くはポリプロピレンに核剤等を添加す
るなどの後処理を施す方法である。従って、プロセス面
のコスト高である上、添加剤によっては成形品の外観を
損うものもある。添加剤による処理なしで、重合方法に
より剛性を改良する方法も提案されているが、いずれも
剛性は不十分である。2. Description of the Related Art In recent years, the demand for highly crystalline polypropylene produced by using various kinds of highly stereoregular catalysts has been rapidly increasing because of its excellent rigidity and heat resistance. However, these properties are still inadequate depending on the purpose of use, and various methods for improving rigidity have been proposed, but most of them are methods in which post-treatment such as adding a nucleating agent to polypropylene is performed. is there. Therefore, the cost of the process is high, and some additives impair the appearance of the molded article. A method of improving rigidity by a polymerization method without treatment with an additive has also been proposed, but none of these methods has insufficient rigidity.
【0003】さらに、ポリプロピレンは本来、耐衝撃強
度が低いという欠点を有するため、エチレンなど他のオ
レフィンと共重合することによって耐衝撃性を改良する
方法が広く行われている。この方法により耐衝撃性は向
上するが、それに伴って剛性が低下する。そこでプロピ
レンの他のオレフィンの重合比を変えながら段階的に重
合する方法、すなわち多段重合を行うことにより、共重
合体の剛性と耐衝撃性の物性パランスを改良する方法が
種々提案されている。しかし、これらの方法によって
も、十分にすぐれた物性バランスは得られない。[0003] Furthermore, since polypropylene originally has a drawback of low impact strength, a method of improving impact resistance by copolymerizing with other olefins such as ethylene has been widely used. Although the impact resistance is improved by this method, the rigidity is reduced accordingly. Therefore, various methods have been proposed in which polymerization is performed stepwise while changing the polymerization ratio of other olefins of propylene, that is, multistage polymerization is performed to improve the rigidity and impact resistance of the copolymer. However, even with these methods, a sufficiently good balance of physical properties cannot be obtained.
【0004】[0004]
【発明が解決しようとする課題】本発明は、より効果的
に、耐衝撃性と剛性のバランスに優れたプロピレンブロ
ック共重合体を製造する方法を提供することを目的とす
る。SUMMARY OF THE INVENTION It is an object of the present invention to provide a method for more effectively producing a propylene block copolymer having an excellent balance between impact resistance and rigidity.
【0005】[0005]
【課題を解決するための手段】本発明者らは、鋭意研究
を行った結果、特定の有機硅素化合物を必須成分とする
重合触媒を用いて共重合することにより、本発明の目的
を達成し得ることを見出し、本発明を完成した。Means for Solving the Problems As a result of intensive studies, the present inventors have achieved the object of the present invention by copolymerizing using a polymerization catalyst containing a specific organosilicon compound as an essential component. The inventors have found that the present invention has been completed and completed the present invention.
【0006】発明の要旨 すなわち、本発明の要旨は、 (A)金属酸化物、マグネシウム、チタン、ハロゲン及
び電子供与性化合物を必須成分とする固体触媒成分、 (B)有機金属化合物及び (C)一般式 The gist of the invention, that is, the gist of the present invention is as follows: (A) a solid catalyst component containing metal oxide, magnesium, titanium, halogen and an electron donating compound as essential components; (B) an organometallic compound; General formula
【化2】 〔但し、R1 及びR2 は同一か異なる炭素数1〜10個
の炭化水素基、OR4、OSiR5 3 又はSiR6 3 、
R3 は炭素数1〜10個の二価の炭化水素基であり、R
4 、R5 及びR6 はそれぞれ炭素数1〜10個の炭化水
素基である。〕で表わされる有機珪素化合物とからなる
重合用触媒の存在下、(1)プロピレンを重合して高結
晶性ポリプロピレンを製造する工程(a)及び(2)プ
ロピレンとエチレンを共重合する工程(b)からなるプ
ロピレンのブロック共重合体の製造方法にある。Embedded image [However, R 1 and R 2 are the same or different carbon atoms from 1 to 10 hydrocarbon group, OR 4, OSiR 5 3 or SiR 6 3,
R 3 is a divalent hydrocarbon group having 1 to 10 carbon atoms;
4 , R 5 and R 6 are each a hydrocarbon group having 1 to 10 carbon atoms. (A) in the presence of a polymerization catalyst comprising an organosilicon compound represented by the following formula (1): (a) a step of polymerizing propylene to produce a highly crystalline polypropylene; and (2) a step (b) of copolymerizing propylene with ethylene. )) To produce a propylene block copolymer.
【0007】固体触媒成分 本発明の触媒の一成分である固体触媒成分(以下、成分
Aという)は、金属酸化物、マグネシウム、チタン、ハ
ロゲン及び電子供与性化合物を必須成分とするが、この
ような成分は通常金属酸化物、マグネシウム化合物、チ
タン化合物及び電子供与性化合物、更に前記各化合物が
ハロゲンを有しない化合物の場合は、ハロゲン含有化合
物を、それぞれ接触することにより調製される。 Solid catalyst component The solid catalyst component (hereinafter referred to as component A), which is one component of the catalyst of the present invention, comprises metal oxides, magnesium, titanium, halogen and an electron donating compound as essential components. These components are usually prepared by contacting a metal oxide, a magnesium compound, a titanium compound, an electron donating compound, and, in the case where each of the above compounds has no halogen, a halogen-containing compound.
【0008】(1)金属酸化物 本発明で用いられる金属酸化物は、元素の周期表第II族
〜第IV族の元素の群から選ばれる元素の酸化物であり、
それらを例示すると、B2 O3 、MgO、Al 2 O3 、
SiO2 、CaO、TiO2 、ZnO、ZrO2 、Sn
O2 、BaO、ThO2 等が挙げられる。これらの中で
もB2 O3 、MgO、Al2 O3 、SiO2 、Ti
O2 、ZrO2 が望ましく、特にSiO2 が望ましい。
更に、これら金属酸化物を含む複合酸化物、例えばSi
O2 −MgO、SiO2 −Al2 O3、SiO2 −Ti
O2 、SiO2 −V2 O5 、SiO2 −Cr2 O3 、S
iO2−TiO2 −MgO等も使用し得る。これら金属
酸化物の形状は通常粉末状のものが用いられる。粉末の
大きさ及び形状等の形体は、得られるオレフィン重合体
の形体に影響を及ぼすことが多いので、適宜調節するこ
とが望ましい。金属酸化物は、使用に当って被毒物質を
除去する目的等から、可能な限り高温で焼成し、更に大
気と直接接触しないように取扱うのが望ましい。(1) Metal Oxide The metal oxide used in the present invention is selected from Group II of the periodic table of elements.
~ An oxide of an element selected from the group of group IV elements,
To illustrate them, BTwoOThree, MgO, Al TwoOThree,
SiOTwo, CaO, TiOTwo, ZnO, ZrOTwo, Sn
OTwo, BaO, ThOTwoAnd the like. Among these
Also BTwoOThree, MgO, AlTwoOThree, SiOTwo, Ti
OTwo, ZrOTwoIs preferable, especially SiO.TwoIs desirable.
Further, composite oxides containing these metal oxides, for example, Si
OTwo-MgO, SiOTwo-AlTwoOThree, SiOTwo−Ti
OTwo, SiOTwo-VTwoOFive, SiOTwo−CrTwoOThree, S
iOTwo-TiOTwo-MgO or the like may be used. These metals
The oxide is usually in the form of a powder. Powdered
The shape, such as size and shape, depends on the olefin polymer obtained.
It may affect the shape of the
Is desirable. Metal oxides reduce poisons during use.
For the purpose of removal, bake at the highest possible temperature.
It is desirable to handle it so that it does not come into direct contact with air.
【0009】(2)マグネシウム化合物 マグネシウム化合物は、一般式MgR1 R2 で表わされ
る。式において、R1及びR2 は同一か異なる炭化水素
基、OR基(Rは炭化水素基)、ハロゲン原子を示す。
より詳細には、R1 及びR2 の炭化水素基としては、炭
素数1〜20個のアルキル基、シクロアルキル基、アリ
ール基、アルアルキル基が、OR基としては、Rが炭素
数1〜12個のアルキル基、シクロアルキル基、アリー
ル基、アルアルキル基が、ハロゲン原子としては塩素、
臭素、ヨウ素、弗素等である。(2) Magnesium compound The magnesium compound is represented by the general formula MgR 1 R 2 . In the formula, R 1 and R 2 represent the same or different hydrocarbon groups, OR groups (R is a hydrocarbon group), and halogen atoms.
More specifically, as the hydrocarbon group of R 1 and R 2 , an alkyl group having 1 to 20 carbon atoms, a cycloalkyl group, an aryl group, or an aralkyl group is used. 12 alkyl groups, cycloalkyl group, aryl group, aralkyl group is chlorine as a halogen atom,
Bromine, iodine, fluorine and the like.
【0010】それら化合物の具体例を下記に示すが、化
学式において、Me:メチル、Et:エチル、Pr :プ
ロピル、Bu:ブチル、He:ヘキシル、Oct:オク
チル、Ph:フェニル、cyHe:シクロヘキシルをそ
れぞれ示す。 MgMe2 ,MgEt2 , Mgi−Pr2 , MgB
u2 ,MgHe2 ,MgOct2 ,MgEtBu,Mg
Ph2 ,MgcyHe2 ,Mg(OMe)2 ,Mg(O
Et)2 ,Mg(OBu)2 ,Mg(OHe)2 ,Mg
(OOct)2 ,Mg(OPh)2 ,Mg(OcyH
e)2 , EtMgCl,BuMgCl,HeMgCl,
i−BuMgCl,t−BuMgCl,PhMgCl,
PhCH2 MgCl,EtMgBr,BuMgBr,P
hMgBr,BuMgI,EtOMgCl,BuOMg
Cl,HeOMgCl,PhOMgCl,EtOMgB
r,BuOMgBr,EtOMgI,MgCl2 ,Mg
Br2 ,MgI2 。Specific examples of these compounds are shown below. In the chemical formula, Me: methyl, Et: ethyl, Pr: propyl, Bu: butyl, He: hexyl, Oct: octyl, Ph: phenyl, and cyHe: cyclohexyl Show. MgMe 2 , MgEt 2 , Mgi-Pr 2 , MgB
u 2 , MgHe 2 , MgOct 2 , MgEtBu, Mg
Ph 2 , MgcyHe 2 , Mg (OMe) 2 , Mg (O
Et) 2 , Mg (OBu) 2 , Mg (OHe) 2 , Mg
(OOct) 2 , Mg (OPh) 2 , Mg (OcyH
e) 2 , EtMgCl, BuMgCl, HeMgCl,
i-BuMgCl, t-BuMgCl, PhMgCl,
PhCH 2 MgCl, EtMgBr, BuMgBr, P
hMgBr, BuMgI, EtOMgCl, BuOMg
Cl, HeOMgCl, PhOMgCl, EtOMgB
r, BuOMgBr, EtOMgI, MgCl 2 , Mg
Br 2 , MgI 2 .
【0011】上記マグネシウム化合物は、成分Aを調製
する際に、金属マグネシウム又はその他のマグネシウム
化合物から調製することも可能である。その一例とし
て、金属マグネシウム、ハロゲン化炭化水素及び一般式
Xn M(OR) m-n のアルコキシ基含有化合物〔式に
おいて、Xは水素原子、ハロゲン原子又は炭素数1〜2
0個の炭化水素基、Mは硼素、炭素、アルミニウム、珪
素又は燐原子、Rは炭素数1〜20個の炭化水素基、m
はMの原子価、m>n≧0を示す。〕を接触させる方法
が挙げられる。該アルコキシ基含有化合物の一般式のX
及びRの炭化水素基としては、メチル(Me)、エチル
(Et) 、プロピル、(Pr)、i−プロピル(i−P
r) 、ブチル(Bu) 、i−ブチル(i−Bu) 、ヘキ
シル(He) 、オクチル(Oct)等のアルキル基、シ
クロヘキシル(cyHe) 、メチルシクロヘキシル等の
シクロアルキル基、アリル、プロペニル、ブテニル等の
アルケニル基、フェニル(Ph) 、トリル、キシリル基
のアリール基、フェネチル、3−フェニルプロピル等の
アルアルキル等が挙げられる。これらの中でも、特に炭
素数1〜10個のアルキル基が望ましい。以下、アルコ
キシ基含有化合物の具体例を挙げる。The above magnesium compound can be prepared from metallic magnesium or other magnesium compounds when preparing component A. Examples thereof include metallic magnesium, halogenated hydrocarbons and alkoxy-group-containing compounds of the general formula X n M (OR) mn [wherein X is a hydrogen atom, a halogen atom or a carbon atom having 1 to 2 carbon atoms.
0 hydrocarbon groups, M is a boron, carbon, aluminum, silicon or phosphorus atom, R is a hydrocarbon group having 1 to 20 carbon atoms, m
Represents the valence of M and m> n ≧ 0. ] Is contacted. X of the general formula of the alkoxy group-containing compound
And the hydrocarbon group of R include methyl (Me), ethyl (Et), propyl, (Pr), i-propyl (i-P
r), an alkyl group such as butyl (Bu), i-butyl (i-Bu), hexyl (He), octyl (Oct), a cycloalkyl group such as cyclohexyl (cyHe), methylcyclohexyl, allyl, propenyl, butenyl, etc. Phenyl (Ph), tolyl, aryl groups such as xylyl group, phenethyl, aralkyl such as 3-phenylpropyl and the like. Among these, an alkyl group having 1 to 10 carbon atoms is particularly desirable. Hereinafter, specific examples of the alkoxy group-containing compound will be described.
【0012】Mが炭素の場合の化合物 式 C(OR)4 に含まれるC(OMe)4 ,C(OE
t)4 , C(OPr) 4 , C(OBu)4 , C(Oi−
Bu)4 ,C(OHe)4 , C(OOct)4:式 X
C(OR)3 に含まれるHC(OMe)3 , HC(OE
t)3 ,HC(OPr)3 , HC(OBu)3 ,HC
(OHe)3 , HC(OPh)3 ;MeC(OM
e)3 , MeC(OEt)3 ,EtC(OMe)3 ,E
tC(OEt)3,cyHeC(OEt)3 , PhC
(OMe)3 ,PhC(OEt)3 ,CH2ClC(O
Et)3 ,MeCHBrC(OEt)3 , MeCHCl
C(OEt) 3 ;ClC(OMe)3 ,ClC(OE
t)3 ,ClC(Oi−Bu)3 ,BrC(OE
t)3 ;式 X2 C(OR)2 に含まれるMeCH(O
Me)2 , MeCH(OEt)2 , CH2 (OM
e)2 , CH2 (OEt)2 ,CH2 ClCH(OE
t)2 ,CHCl2 CH(OEt)2 ,CCl3 CH
(OEt)2 ,CH 2 BrCH(OEt)2 ,PhCH
(OEt)2 。Compounds wherein M is carbon Formula C (OR)Four(OMe) contained inFour, C (OE
t)Four, C (OPr) Four, C (OBu)Four, C (Oi-
Bu)Four, C (OHe)Four, C (OOct)Four: Formula X
C (OR)Three(OMe) contained inThree, HC (OE
t)Three, HC (OPr)3,HC (OBu)Three, HC
(OHe)Three, HC (OPh)ThreeMeC (OM
e)Three, MeC (OEt)Three, EtC (OMe)Three , E
tC (OEt)Three, CyHeC (OEt)Three, PhC
(OMe)Three, PhC (OEt)Three, CHTwoClC (O
Et)Three, MeCHBrC (OEt)Three, MeCHCl
C (OEt) Three; ClC (OMe)Three, ClC (OE
t)Three, ClC (Oi-Bu)Three, BrC (OE
t)ThreeFormula XTwoC (OR)TwoMeCH (O
Me)Two, MeCH (OEt)Two, CHTwo(OM
e)Two, CHTwo(OEt)Two, CHTwoClCH (OE
t)Two, CHClTwoCH (OEt)Two, CClThreeCH
(OEt)Two, CH TwoBrCH (OEt)Two, PhCH
(OEt)Two.
【0013】Mが珪素の場合の化合物 式 Si(OR)4 に含まれるSi(OMe)4 ,Si
(OEt)4 ,Si(OBu)4 ,Si(Oi−Bu)
4 ,Si(OHe)4 ,Si(OOct)4 ,Si(O
Ph)4 :式 XSi(OR)3 に含まれるHSi(O
Et)3 ,HSi(OBu)3 ,HSi(OHe)3 ,
HSi(OPh)3 ;MeSi(OMe)3 ,MeSi
(OEt)3 ,MeSi(OBu)3 ,EtSi(OE
t)3 ,PhSi(OEt)3 ,EtSi(OP
h)3 ;ClSi(OMe)3 ,ClSi(OE
t)3 ,ClSi(OBu)3 ,ClSi(OP
h)3 ,BrSi(OEt)3 ;式 X2 Si(OR)
2 に含まれるMe2 Si(OMe)2 ,Me2Si(O
Et)2 ,Et2 Si(OEt)2 ;MeClSi(O
Et)2 ;CHCl2 SiH(OEt)2 ;CCl3 S
iH(OEt)2 ;MeBeSi(OEt)2 :X3 S
iORに含まれるMe3 SiOMe,Me3 SiOE
t,Me3SiOBu,Me3 SiOPh,Et3 Si
OEt,Ph3 SiOEt。Compound when M is silicon Si (OMe) 4 , Si contained in formula Si (OR) 4
(OEt) 4 , Si (OBu) 4 , Si (Oi-Bu)
4 , Si (OHe) 4 , Si (OOct) 4 , Si (O
Ph) 4 : HSi (O) contained in the formula XSi (OR) 3
Et) 3 , HSi (OBu) 3 , HSi (OHe) 3 ,
HSi (OPh) 3 ; MeSi (OMe) 3 , MeSi
(OEt) 3 , MeSi (OBu) 3 , EtSi (OE
t) 3 , PhSi (OEt) 3 , EtSi (OP
h) 3 ; ClSi (OMe) 3 , ClSi (OE
t) 3 , ClSi (OBu) 3 , ClSi (OP
h) 3 , BrSi (OEt) 3 ; Formula X 2 Si (OR)
2 contained in Me 2 Si (OMe) 2 , Me 2 Si (O
Et) 2 , Et 2 Si (OEt) 2 ; MeClSi (O
Et) 2 ; CHCl 2 SiH (OEt) 2 ; CCl 3 S
iH (OEt) 2 ; MeBeSi (OEt) 2 : X 3 S
Me 3 SiOMe, Me 3 SiOE contained in iOR
t, Me 3 SiOBu, Me 3 SiOPh, Et 3 Si
OEt, Ph 3 SiOEt.
【0014】Mが硼素の場合の化合物 式 B(OR)3 に含まれるB(OEt)3 ,B(OB
u)3 , B(OHe)3 ,B(OPh)3 。Compound where M is boron B (OEt) 3 , B (OB) contained in formula B (OR) 3
u) 3 , B (OHe) 3 , B (OPh) 3 .
【0015】Mがアルミニウムの場合の化合物 式 Al(OR)3 に含まれるAl(OMe)3 ,Al
(OEt)3 ,Al(OPr)3 ,Al(Oi−Pr)
3 ,Al(OBu)3 ,Al(Ot−Bu)3,Al
(OHe)3 ,Al(OPh)3 。Compound when M is aluminum Al (OMe) 3 , Al contained in formula Al (OR) 3
(OEt) 3 , Al (OPr) 3 , Al (Oi-Pr)
3 , Al (OBu) 3 , Al (Ot-Bu) 3 , Al
(OHe) 3 , Al (OPh) 3 .
【0016】Mが燐の場合の化合物 式 P(OR)3 に含まれるP(OMe)3 , P(OE
t)3 , P(OBu) 3 ,P(OHe)3 ,P(OP
h)3 。Compound when M is phosphorus Formula P (OR)Three(OMe) contained inThree, P (OE
t)Three, P (OBu) Three, P (OHe)Three, P (OP
h)Three.
【0017】更に、前記マグネシウム化合物は、周期表
第II族又は第 IIIa族金属(M)の有機化合物との錯体
も使用することができる。該錯体は一般式 MgR1 R
2 ・n(MR3 m ) で表わされる。該金属としては、ア
ルミニウム、亜鉛、カルシウム等であり、R3 は炭素数
1〜12個のアルキル基、シクロアルキル基、アリール
基、アルアルキル基である。又、mは金属Mの原子価
を、nは0.1〜10の数を示す。MR3 m で表わされ
る化合物の具体例としては、AlMe3 , AlEt3 ,
Ali−Bu3 ,AlPh3 ,ZnMe2 ,ZnE
t2 ,ZnBu2 ,ZnPh2 ,CaEt2 ,CaPh
2 等が挙げられる。Further, as the magnesium compound, a complex with an organic compound of a metal (M) of Group II or Group IIIa of the periodic table can be used. The complex has the general formula MgR 1 R
2 · n (MR 3 m ). Examples of the metal include aluminum, zinc, and calcium, and R 3 is an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group, an aryl group, or an aralkyl group. M represents the valence of the metal M, and n represents a number of 0.1 to 10. Specific examples of the compound represented by MR 3 m include AlMe 3 , AlEt 3 ,
Ali-Bu 3, AlPh 3, ZnMe 2, ZnE
t 2 , ZnBu 2 , ZnPh 2 , CaEt 2 , CaPh
And the like.
【0018】(3)チタン化合物 チタン化合物は、二価、三価及び四価のチタンの化合物
であり、それらを例示すると、四塩化チタン、四臭化チ
タン、トリクロルエトキシチタン、トリクロルブトキシ
チタン、ジクロルジエトキシチタン、ジクロルジブトキ
シチタン、ジクロルジフェノキシチタン、クロルトリエ
トキシチタン、クロルトリブトキシチタン、テトラブト
キシチタン、三塩化チタン等を挙げることができる。こ
れらの中でも、四塩化チタン、トリクロルエトキシチタ
ン、ジクロルジブトキシチタン、ジクロルジフェノキシ
チタン等の四価のチタンハロゲン化物が望ましく、特に
四塩化チタンが望ましい。(3) Titanium compound Titanium compounds are divalent, trivalent and tetravalent titanium compounds. Examples thereof include titanium tetrachloride, titanium tetrabromide, trichloroethoxytitanium, trichlorobutoxytitanium and dichlorotitanium. Examples thereof include rudiethoxytitanium, dichlorodibutoxytitanium, dichlorodiphenoxytitanium, chlorotriethoxytitanium, chlorotributoxytitanium, tetrabutoxytitanium, and titanium trichloride. Among these, tetravalent titanium halides such as titanium tetrachloride, trichloroethoxytitanium, dichlorodibutoxytitanium and dichlorodiphenoxytitanium are desirable, and titanium tetrachloride is particularly desirable.
【0019】(4)電子供与性化合物 電子供与性化合物としては、カルボン酸類、カルボン酸
無水物、カルボン酸エステル類、カルボン酸ハロゲン化
物、アルコール類、エーテル類、ケトン類、アミン類、
アミド類、ニトリル類、アルデヒド類、アルコレート
類、有機基と炭素もしくは酸素を介して結合した燐、ヒ
素およびアンチモン化合物、ホスホアミド類、チオエー
テル類、チオエステル類、炭酸エステル等が挙げられ
る。これのうちカルボン酸類、カルボン酸無水物、カル
ボン酸エステル類、カルボン酸ハロゲン化物、アルコー
ル類、エーテル類が好ましく用いられる。(4) Electron-donating compounds The electron-donating compounds include carboxylic acids, carboxylic anhydrides, carboxylic esters, carboxylic halides, alcohols, ethers, ketones, amines,
Examples include amides, nitriles, aldehydes, alcoholates, phosphorus, arsenic, and antimony compounds bonded to an organic group via carbon or oxygen, phosphoamides, thioethers, thioesters, and carbonate esters. Of these, carboxylic acids, carboxylic anhydrides, carboxylic esters, carboxylic halides, alcohols and ethers are preferably used.
【0020】カルボン酸の具体例としては、ギ酸、酢
酸、プロピオン酸、酪酸、イソ酪酸、吉草酸、カプロン
酸、ピバリン酸、アクリル酸、メタクリル酸、クロトン
酸等の脂肪族モノカルボン酸、マロン酸、コハク酸、グ
ルタル酸、アジピン酸、セバシン酸、マレイン酸、フマ
ル酸等の脂肪族ジカルボン酸、酒石酸等の脂肪族オキシ
カルボン酸、シクロヘキサンモノカルボン酸、シクロヘ
キセンモノカルボン酸、シス−1,2−シクロヘキサン
ジカルボン酸、シス−4−メチルシクロヘキセン−1,
2−ジカルボン酸等の脂環式カルボン酸、安息香酸、ト
ルイル酸、アニス酸、p−第三級ブチル安息香酸、ナフ
トエ酸、ケイ皮酸等の芳香族モノカルボン酸、フタル
酸、イソフタル酸、テレフタル酸、ナフタル酸、トリメ
リト酸、ヘミメリト酸、トリメシン酸、ピロメリト酸、
メリト酸等の芳香族多価カルボン酸等が挙げられる。カ
ルボン酸無水物としては、上記のカルボン酸類の酸無水
物が使用し得る。Specific examples of the carboxylic acid include aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, isobutyric acid, valeric acid, caproic acid, pivalic acid, acrylic acid, methacrylic acid and crotonic acid, and malonic acid. , Succinic acid, glutaric acid, adipic acid, sebacic acid, maleic acid, aliphatic dicarboxylic acids such as fumaric acid, aliphatic oxycarboxylic acids such as tartaric acid, cyclohexane monocarboxylic acid, cyclohexene monocarboxylic acid, cis-1,2- Cyclohexanedicarboxylic acid, cis-4-methylcyclohexene-1,
Alicyclic carboxylic acids such as 2-dicarboxylic acid, benzoic acid, toluic acid, anisic acid, p-tert-butyl benzoic acid, naphthoic acid, aromatic monocarboxylic acids such as cinnamic acid, phthalic acid, isophthalic acid, Terephthalic acid, naphthalic acid, trimellitic acid, hemimellitic acid, trimesic acid, pyromellitic acid,
And aromatic polycarboxylic acids such as melitic acid. As the carboxylic acid anhydride, the acid anhydrides of the above carboxylic acids can be used.
【0021】カルボン酸エステルとしては、上記のカル
ボン酸類のモノ又は多価エステルが使用することがで
き、その具体例として、ギ酸ブチル、酢酸エチル、酢酸
ブチル、イソ酪酸イソブチル、ピバリン酸プロピル、ピ
バリン酸イソブチル、アクリル酸エチル、メタクリル酸
メチル、メタクリル酸エチル、メタクリル酸イソブチ
ル、マロン酸ジエチル、マロン酸ジイソブチル、コハク
酸ジエチル、コハク酸ジブチル、コハク酸ジイソブチ
ル、グルタル酸ジエチル、グルタル酸ジブチル、グルタ
ル酸ジイソブチル、アジピン酸ジイソブチル、セバシン
酸ジブチル、セバシン酸ジイソブチル、マレイン酸ジエ
チル、マレイン酸ジブチル、マレイン酸ジイソブチル、
フマル酸モノメチル、フマル酸ジエチル、フマル酸ジイ
ソブチル、酒石酸ジエチル、酒石酸ジブチル、酒石酸ジ
イソブチル、シクロヘキサンカルボン酸エチル、安息香
酸メチル、安息香酸エチル、p−トルイル酸メチル、p
−第三級ブチル安息香酸エチル、p−アニス酸エチル、
α−ナフトエ酸エチル、α−ナフトエ酸イソブチル、ケ
イ皮酸エチル、フタル酸モノメチル、フタル酸モノブチ
ル、フタル酸ジブチル、フタル酸ジイソブチル、フタル
酸ジヘキシル、フタル酸ジオクチル、フタル酸ジ2−エ
チルヘキシル、フタル酸ジアリル、フタル酸ジフェニ
ル、イソフタル酸ジエチル、イソフタル酸ジイソブチ
ル、テレフタル酸ジエチル、テレフタル酸ジブチル、ナ
フタル酸ジエチル、ナフタル酸ジブチル、トリメリト酸
トリエチル、トリメリト酸トリブチル、ピロメリト酸テ
トラメチル、ピロメリト酸テトラエチル、ピロメリト酸
テトラブチル等が挙げられる。As the carboxylic acid ester, mono- or polyvalent esters of the above carboxylic acids can be used. Specific examples thereof include butyl formate, ethyl acetate, butyl acetate, isobutyl isobutyrate, propyl pivalate, and pivalic acid. Isobutyl, ethyl acrylate, methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, diethyl malonate, diisobutyl malonate, diethyl succinate, dibutyl succinate, diisobutyl succinate, diethyl glutarate, dibutyl glutarate, diisobutyl glutarate, Diisobutyl adipate, dibutyl sebacate, diisobutyl sebacate, diethyl maleate, dibutyl maleate, diisobutyl maleate,
Monomethyl fumarate, diethyl fumarate, diisobutyl fumarate, diethyl tartrate, dibutyl tartrate, diisobutyl tartrate, ethyl cyclohexanecarboxylate, methyl benzoate, ethyl benzoate, methyl p-toluate, p
-Tert-butyl ethyl benzoate, ethyl p-anisate,
α-Ethyl naphthoate, isobutyl α-naphthoate, ethyl cinnamate, monomethyl phthalate, monobutyl phthalate, dibutyl phthalate, diisobutyl phthalate, dihexyl phthalate, dioctyl phthalate, di-2-ethylhexyl phthalate, phthalic acid Diallyl, diphenyl phthalate, diethyl isophthalate, diisobutyl isophthalate, diethyl terephthalate, dibutyl terephthalate, diethyl naphthalate, dibutyl naphthalate, triethyl trimellitate, tributyl trimellitate, tetramethyl pyromellitate, tetraethyl pyromellitate, tetraethyl pyromellitate And the like.
【0022】カルボン酸ハロゲン化物としては、上記の
カルボン酸類の酸ハロゲン化物が使用することができ、
その具体例として、酢酸クロリド、酢酸ブロミド、酢酸
アイオダイド、プロピオン酸クロリド、酪酸クロリド、
酪酸ブロミド、酪酸アイオダイド、ピバリン酸クロリ
ド、ピバリン酸ブロミド、アクリル酸クロリド、アクリ
ル酸ブロミド、アクリル酸アイオダイド、メタクリル酸
クロリド、メタクリル酸ブロミド、メタクリル酸アイオ
ダイド、クロトン酸クロリド、マロン酸クロリド、マロ
ン酸ブロミド、コハク酸クロリド、コハク酸ブロミド、
グルタル酸クロリド、グルタル酸ブロミド、アジピン酸
クロリド、アジピン酸ブロミド、セバシン酸クロリド、
セバシン酸ブロミド、マレイン酸クロリド、マレイン酸
ブロミド、フマル酸クロリド、フマル酸ブロミド、酒石
酸クロリド、酒石酸ブロミド、シクロヘキサンカルボン
酸クロリド、シクロヘキサンカルボン酸ブロミド、1−
シクロヘキセンカルボン酸クロリド、シス−4−メチル
シクロヘキセンカルボン酸クロリド、シス−4−メチル
シクロヘキセンカルボン酸ブロミド、塩化ベンゾイル、
臭化ベンゾイル、p−トルイル酸クロリド、p−トルイ
ル酸ブロミド、p−アニス酸クロリド、p−アニス酸ブ
ロミド、α−ナフトエ酸クロリド、ケイ皮酸クロリド、
ケイ皮酸ブロミド、フタル酸ジクロリド、フタル酸ジブ
ロミド、イソフタル酸ジクロリド、イソフタル酸ジブロ
ミド、テレフタル酸ジクロリド、ナフタル酸ジクロリド
が挙げられる。又、アジピン酸モノメチルクロリド、マ
レイン酸モノエチルクロリド、マレイン酸モノメチルク
ロリド、フタル酸ブチルクロリドのようなジカルボン酸
のモノアルキルハロゲン化物も使用し得る。As the carboxylic acid halide, acid halides of the above carboxylic acids can be used.
Specific examples thereof include acetate chloride, acetate bromide, acetate iodide, propionate chloride, butyrate chloride,
Butyric acid bromide, Butyric acid iodide, Pivalic acid chloride, Pivalic acid bromide, Acrylic acid chloride, Acrylic acid bromide, Acrylic acid iodide, Methacrylic acid chloride, Methacrylic acid bromide, Methacrylic acid iodide, Crotonic acid chloride, Malonic acid chloride, Malonic acid bromide, Succinic chloride, succinic bromide,
Glutaric acid chloride, glutaric acid bromide, adipic acid chloride, adipic acid bromide, sebacic acid chloride,
Sebacic acid bromide, maleic acid chloride, maleic acid bromide, fumaric acid chloride, fumaric acid bromide, tartaric acid chloride, tartaric acid bromide, cyclohexanecarboxylic acid chloride, cyclohexanecarboxylic acid bromide, 1-
Cyclohexenecarboxylic acid chloride, cis-4-methylcyclohexenecarboxylic acid chloride, cis-4-methylcyclohexenecarboxylic acid bromide, benzoyl chloride,
Benzoyl bromide, p-toluic acid chloride, p-toluic acid bromide, p-anisic acid chloride, p-anisic acid bromide, α-naphthoic acid chloride, cinnamic acid chloride,
Examples include cinnamic acid bromide, phthalic acid dichloride, phthalic acid dibromide, isophthalic acid dichloride, isophthalic acid dibromide, terephthalic acid dichloride, and naphthalic acid dichloride. Further, monoalkyl halides of dicarboxylic acids such as adipic acid monomethyl chloride, maleic acid monoethyl chloride, maleic acid monomethyl chloride and phthalic acid butyl chloride can also be used.
【0023】アルコール類は、一般式 ROHで表わさ
れる。式においてRは炭素数1〜12個のアルキル、ア
ルケニル、シクロアルキル、アリール、アルアルキルで
ある。その具体例としては、メタノール、エタノール、
プロパノール、イソプロパノール、ブタノール、イソブ
タノール、ペンタノール、ヘキサノール、オクタノー
ル、2−エチルヘキサノール、シクロヘキサノール、ベ
ンジルアルコール、アリルアルコール、フェノール、ク
レゾール、キシレノール、エチルフェノール、イソプロ
ピルフェノール、p−ターシャリーブチルフェノール、
n−オクチルフェノール等である。Alcohols are represented by the general formula ROH. In the formula, R is alkyl, alkenyl, cycloalkyl, aryl, aralkyl having 1 to 12 carbon atoms. Specific examples include methanol, ethanol,
Propanol, isopropanol, butanol, isobutanol, pentanol, hexanol, octanol, 2-ethylhexanol, cyclohexanol, benzyl alcohol, allyl alcohol, phenol, cresol, xylenol, ethylphenol, isopropylphenol, p-tert-butylphenol,
and n-octylphenol.
【0024】エーテル類は、一般式ROR1 で表わされ
る。式においてR,R1 は炭素数1〜12個のアルキ
ル、アルケニル、シクロアルキル、アリール、アルアル
キルであり、RとR1 は同じでも異ってもよい。その具
体例としては、ジエチルエーテル、ジイソプロピルエー
テル、ジブチルエーテル、ジイソブチルエーテル、ジイ
ソアミルエーテル、ジ−2−エチルヘキシルエーテル、
ジアリルエーテル、エチルアリルエーテル、ブチルアリ
ルエーテル、ジフェニルエーテル、アニソール、エチル
フェニルエーテル等である。The ethers are represented by the general formula ROR 1. In the formula, R and R 1 are alkyl, alkenyl, cycloalkyl, aryl and aralkyl having 1 to 12 carbon atoms, and R and R 1 may be the same or different. Specific examples thereof include diethyl ether, diisopropyl ether, dibutyl ether, diisobutyl ether, diisoamyl ether, di-2-ethylhexyl ether,
Diallyl ether, ethyl allyl ether, butyl allyl ether, diphenyl ether, anisole, ethyl phenyl ether and the like.
【0025】成分Aの調製法としては、金属酸化物
(成分1)、マグネシウム化合物(成分2)、チタン化
合物(成分3)及び電子供与性化合物(成分4)をその
順序に接触させる。成分1と成分3を接触させた後、
成分4と成分3をその順序に接触させる。成分1,成
分2を接触させた後、成分3と成分4を同時に用いて接
触させる、成分2と成分3を接触させた後、成分4と
成分1をその順序に接触させる、成分2と成分4を接
触させた後、成分3と成分1をその順序に接触させる、
成分2,成分3及び成分4を同時に接触させた後、成
分1を接触させる等の方法が採用し得る。又、成分3を
用いて接触させる前にハロゲン含有化合物と接触させる
こともできる。As a method for preparing component A, a metal oxide (component 1), a magnesium compound (component 2), a titanium compound (component 3) and an electron donating compound (component 4) are brought into contact in that order. After contacting component 1 and component 3,
Contact component 4 and component 3 in that order. After the components 1 and 2 are brought into contact, the components 3 and 4 are simultaneously used to contact each other. After the components 2 and 3 are brought into contact, the components 4 and 1 are brought into contact in that order. After contacting 4, contact component 3 and component 1 in that order,
A method such as contacting the component 1, the component 3, and the component 4 at the same time and then contacting the component 1 can be adopted. It is also possible to contact with a halogen-containing compound before contacting with Component 3.
【0026】ハロゲン含有化合物としては、ハロゲン化
炭化水素、ハロゲン含有アルコール、水素−珪素結合を
有するハロゲン化珪素化合物、周期表第IIa族、IVa
族、Va族元素のハロゲン化物(以下、金属ハライドと
いう。)等が挙げられる。Examples of the halogen-containing compound include halogenated hydrocarbons, halogen-containing alcohols, silicon halide compounds having a hydrogen-silicon bond, groups IIa and IVa of the periodic table.
And halides of Group Va elements (hereinafter referred to as metal halides).
【0027】ハロゲン化炭化水素としては、炭素数1〜
12個の飽和又は不飽和の脂肪族、脂環式及び芳香族炭
化水素のモノ及びポリハロゲン置換体である。それら化
合物の具体的な例は、脂肪族化合物では、メチルクロラ
イド、メチルブロマイド、メチルアイオダイド、メチレ
ンクロライド、メチレンブロマイド、メチレンアイオダ
イド、クロロホルム、ブロモホルム、ヨードホルム、四
塩化炭素、四臭化炭素、四沃化炭素、エチルクロライ
ド、エチルブロマイド、エチルアイオダイド、1,2−
ジクロルエタン、1,2−ジブロムエタン、1,2−ジ
ヨードエタン、メチルクロロホルム、メチルブロモホル
ム、メチルヨードホルム、1,1,2−トリクロルエチ
レン、1,1,2−トリブロモエチレン、1,1,2,
2−テトラクロルエチレン、ペンタクロルエタン、ヘキ
サクロルエタン、ヘキサブロモエタン、n−プロピルク
ロライド、1,2−ジクロルプロパン、ヘキサクロロプ
ロピレン、オクタクロロプロパン、デカブロモブタン、
塩素化パラフィンが、脂環式化合物ではクロロシクロプ
ロパン、テトラクロルシクロペンタン、ヘキサクロロシ
クロペンタジェン、ヘキサクロルシクロヘキサンが、芳
香族化合物ではクロルベンゼン、ブロモベンゼン、o−
ジクロルベンゼン、p−ジクロルベンゼン、ヘキサクロ
ロベンゼン、ヘキサブロモベンゼン、ベンゾトリクロラ
イド、p−クロロベンゾトリクロライド等が挙げられ
る。これらの化合物は、一種のみならず二種以上用いて
もよい。Halogenated hydrocarbons include those having 1 to 1 carbon atoms.
Mono- and poly-halogen substituents of 12 saturated or unsaturated aliphatic, cycloaliphatic and aromatic hydrocarbons. Specific examples of such compounds include, for aliphatic compounds, methyl chloride, methyl bromide, methyl iodide, methylene chloride, methylene bromide, methylene iodide, chloroform, bromoform, iodoform, carbon tetrachloride, carbon tetrabromide, Carbon iodide, ethyl chloride, ethyl bromide, ethyl iodide, 1,2-
Dichloroethane, 1,2-dibromoethane, 1,2-diiodoethane, methylchloroform, methylbromoform, methyliodoform, 1,1,2-trichloroethylene, 1,1,2-tribromoethylene, 1,1,2,2
2-tetrachloroethylene, pentachloroethane, hexachloroethane, hexabromoethane, n-propyl chloride, 1,2-dichloropropane, hexachloropropylene, octachloropropane, decabromobutane,
Chlorinated paraffins are chlorocyclopropane, tetrachlorocyclopentane, hexachlorocyclopentagen, and hexachlorocyclohexane for alicyclic compounds, and chlorobenzene, bromobenzene, o-
Examples thereof include dichlorobenzene, p-dichlorobenzene, hexachlorobenzene, hexabromobenzene, benzotrichloride, p-chlorobenzotrichloride and the like. These compounds may be used alone or in combination of two or more.
【0028】ハロゲン含有アルコールとしては、一分子
中に一個又は二個以上の水酸基を有するモノ又は多価ア
ルコール中の、水酸基以外の任意の一個又は二個以上の
水素原子がハロゲン原子で置換された化合物を意味す
る。ハロゲン原子としては、塩素、臭素、ヨウ素、弗素
原子が挙げられるが、塩素原子が望ましい。それら化合
物を例示すると、2−クロルエタノール、1−クロル−
2−プロパノール、3−クロル−1−プロパノール、1
−クロル−2−メチル−2−プロパノール、4−クロル
−1−ブタノール、5−クロル−1−ペンタノール、6
−クロル−1−ヘキサノール、3−クロル−1,2−プ
ロパンジオール、2−クロルシクロヘキサノール、4−
クロルベンズヒドロール、(m,o,p)−クロルベン
ジルアルコール、4−クロルカテコール、4−クロル−
(m,o)−クレゾール、6−クロル−(m,o)−ク
レゾール、4−クロル−3,5−ジメチルフェノール、
クロルハイドロキノン、2−ベンジル−4−クロルフェ
ノール、4−クロル−1−ナフトール、(m,o,p)
−クロルフェノール、p−クロル−α−メチルベンジル
アルコール、2−クロル−4−フェニルフェノール、6
−クロルチモール、4−クロルレゾルシン、2−ブロム
エタノール、3−ブロム−1−プロパノール、1−ブル
ム−2−プロパノール、1−ブロム−2−ブタノール、
2−ブロム−p−クレゾール、1−ブロム−2−ナフト
ール、6−ブロム−2−ナフトール、(m,o,p)−
ブロムフェノール、4−ブロムレゾルシン、(m,o,
p)−フロロフェノール、p−イオドフェノール:2,
2−ジクロルエタノール、2,3−ジクロル−1−プロ
パノール、1,3−ジクロル−2−プロパノール、3−
クロル−1−(α−クロルメチル)−1−プロパノー
ル、2,3−ジブロム−1−プロパノール、1,3−ジ
ブロム−2−プロパノール、2,4−ジブロムフェノー
ル、2,4−ジブロム−1−ナフトール:2,2,2−
トリクロルエタノール、1,1,1−トリクロル−2−
プロパノール、β,β,β−トリクロル−tert−ブ
タノール、2,3,4−トリクロルフェノール、2,
4,5−トリクロルフェノール、2,4,6−トリクロ
ルフェノール、2,4,6−トリブロムフェノール、
2,3,5−トリブロム−2−ヒドロキシトルエン、
2,3,5−トリブロム−4−ヒドロキシトルエン、
2,2,2−トリフルオロエタノール、α,α,α−ト
リフルオロ−m−クレゾール、2,4,6−トリイオド
フェノール:2,3,4,6−テトラクロルフェノー
ル、テトラクロルハイドロキノン、テトラクロルビスフ
ェノールA、テトラブロムビスフェノールA、2,2,
3,3−テトラフルオロ−1−プロパノール、2,3,
5,6−テトラフルオロフェノール、テトラフルオロレ
ゾルシン等が挙げられる。As the halogen-containing alcohol, any one or two or more hydrogen atoms other than a hydroxyl group in a mono- or polyhydric alcohol having one or more hydroxyl groups in one molecule are substituted with a halogen atom. Means a compound. Examples of the halogen atom include chlorine, bromine, iodine and fluorine atoms, and a chlorine atom is preferable. Examples of these compounds include 2-chloroethanol, 1-chloro-
2-propanol, 3-chloro-1-propanol, 1
-Chloro-2-methyl-2-propanol, 4-chloro-1-butanol, 5-chloro-1-pentanol, 6
-Chloro-1-hexanol, 3-chloro-1,2-propanediol, 2-chlorocyclohexanol, 4-
Chlorbenzhydrol, (m, o, p) -chlorobenzyl alcohol, 4-chlorocatechol, 4-chloro-
(M, o) -cresol, 6-chloro- (m, o) -cresol, 4-chloro-3,5-dimethylphenol,
Chlorohydroquinone, 2-benzyl-4-chlorophenol, 4-chloro-1-naphthol, (m, o, p)
-Chlorophenol, p-chloro-α-methylbenzyl alcohol, 2-chloro-4-phenylphenol, 6
-Chlorthymol, 4-chlororesorcin, 2-bromoethanol, 3-bromo-1-propanol, 1-bromo-2-propanol, 1-bromo-2-butanol,
2-bromo-p-cresol, 1-bromo-2-naphthol, 6-bromo-2-naphthol, (m, o, p)-
Bromphenol, 4-bromoresorcinol, (m, o,
p) -fluorophenol, p-iodophenol: 2,
2-dichloroethanol, 2,3-dichloro-1-propanol, 1,3-dichloro-2-propanol, 3-
Chlor-1- (α-chloromethyl) -1-propanol, 2,3-dibromo-1-propanol, 1,3-dibromo-2-propanol, 2,4-dibromophenol, 2,4-dibromo-1- Naphthol: 2,2,2-
Trichloroethanol, 1,1,1-trichloro-2-
Propanol, β, β, β-trichloro-tert-butanol, 2,3,4-trichlorophenol, 2,
4,5-trichlorophenol, 2,4,6-trichlorophenol, 2,4,6-tribromophenol,
2,3,5-tribromo-2-hydroxytoluene,
2,3,5-tribromo-4-hydroxytoluene,
2,2,2-trifluoroethanol, α, α, α-trifluoro-m-cresol, 2,4,6-triiodophenol: 2,3,4,6-tetrachlorophenol, tetrachlorohydroquinone, tetra Chlorbisphenol A, tetrabromobisphenol A, 2,2,2
3,3-tetrafluoro-1-propanol, 2,3
5,6-tetrafluorophenol, tetrafluororesorcin and the like.
【0029】水素−珪素結合を有するハロゲン化珪素化
合物としては、HSiCl3 ,H2SiCl2 ,H3 S
iCl,HCH3 SiCl2 , HC2 H5 SiCl2 ,
H(t−C4 H9 )SiCl2 ,HC6 H5 SiCl
2 , H(CH3 ) 2 SiCl,H(i−C3 H7 )2 S
iCl,H2 C2 H5 SiCl,H2 (n−C4 H9 )
SiCl、H2 (C6 H4 CH3 )SiCl、HSiC
l(C6 H5 )2 等が挙げられる。Examples of the silicon halide compound having a hydrogen-silicon bond include HSiCl 3 , H 2 SiCl 2 , and H 3 S.
iCl, HCH 3 SiCl 2 , HC 2 H 5 SiCl 2 ,
H (t-C 4 H 9 ) SiCl 2, HC 6 H 5 SiCl
2, H (CH 3 ) 2 SiCl, H (i-C 3 H 7 ) 2 S
iCl, H 2 C 2 H 5 SiCl, H 2 (n-C 4 H 9)
SiCl, H 2 (C 6 H 4 CH 3 ) SiCl, HSiC
l (C 6 H 5 ) 2 and the like.
【0030】金属ハライドとしては、B,Al,Ga,
In,Tl,Si,Ge,Sn,Pb,As,Sb,B
iの塩化物、弗化物、臭化物、ヨウ化物が挙げられ、特
にBCl3 ,BBr3 , BI3 ,AlCl3 ,AlBr
3 , GaCl3 ,GaBr3, InCl3 ,TlC
l3 ,SiCl4 ,SnCl4 ,SbCl5 ,SbF5
等が好適である。As metal halides, B, Al, Ga,
In, Tl, Si, Ge, Sn, Pb, As, Sb, B
and i) chlorides, fluorides, bromides, and iodides, especially BCl 3 , BBr 3 , BI 3 , AlCl 3 , and AlBr.
3 , GaCl 3 , GaBr 3 , InCl 3 , TIC
l 3 , SiCl 4 , SnCl 4 , SbCl 5 , SbF 5
Etc. are preferred.
【0031】成分1,成分2,成分3及び成分4、更に
必要に応じて接触させることのできるハロゲン含有化合
物との接触は、不活性媒体の存在下、又は不存在下、混
合攪拌するが、機械的に共粉砕することによりなされ
る。接触は40〜150℃の加熱下で行うことができ
る。The contact with the component 1, the component 2, the component 3 and the component 4, and the halogen-containing compound which can be brought into contact as required, is carried out by mixing and stirring in the presence or absence of an inert medium. This is done by mechanically co-milling. The contact can be performed under heating at 40 to 150 ° C.
【0032】不活性媒体としては、ヘキサン、ヘプタ
ン、オクタン等の飽和脂肪族炭化水素、シクロペンタ
ン、シクロヘキサン等の飽和脂環式炭化水素、ベンゼ
ン、トルエン、キシレン等の芳香族炭化水素が使用し得
る。As the inert medium, saturated aliphatic hydrocarbons such as hexane, heptane and octane, saturated alicyclic hydrocarbons such as cyclopentane and cyclohexane, and aromatic hydrocarbons such as benzene, toluene and xylene can be used. .
【0033】本発明における成分Aの調製法の具体例と
しては、特開昭58−162607号、同55−949
09号、同55−115405号、同57−10810
7号、同61−21109号、同61−174204
号、同61−174205号、同61−174206
号、同62−7706号公報等に開示されている方法等
が挙げられる。より詳細には、Specific examples of the method for preparing Component A in the present invention include JP-A-58-162607 and JP-A-55-949.
No. 09, No. 55-115405, No. 57-10810
No. 7, No. 61-21109, No. 61-174204
Nos. 61-174205 and 61-174206
And the methods disclosed in JP-A-62-7706 and the like. More specifically,
【0034】 金属酸化物とマグネシウムジアルコキ
シドとの反応生成物を、電子供与性化合物及び4価のハ
ロゲン化チタンと接触させる方法(特開昭58−162
607号公報)、 無機酸化物とマグネシウムヒドロカルビルハライド
化合物との反応生成物を、ルイス塩基化合物及び四塩化
チタンと接触させる方法(特開昭55−94909号公
報)、 シリカ等の多孔質担体とアルキルマグネシウム化合
物との反応生成物を、チタン化合物と接触させる前に電
子供与性化合物及びハロゲン化珪素化合物と接触させる
方法(特開昭55−115405号、同57−1081
07号公報)、 金属酸化物、アルコキシ基含有マグネシウム化合
物、オルト位にカルボキシル基を持つ芳香族多価カルボ
ン酸若しくはその誘導体及びチタン化合物を接触させる
方法(特開昭61−174204号公報)、 金属酸化物、アルコキシ基含有マグネシウム化合
物、水素−珪素結合を有する珪素化合物、電子供与性化
合物及びチタン化合物を接触させる方法(特開昭61−
174205号公報)、 金属酸化物、アルコキシ基含有マグネシウム化合
物、ハロゲン元素若しくはハロゲン含有化合物、電子供
与性化合物及びチタン化合物を接触させる方法(特開昭
61−174206号公報)、 金属酸化物、ジヒドロカルビルマグネシウム及びハ
ロゲン含有アルコールを接触させることによって得られ
る反応生成物を、電子供与性化合物及びチタン化合物を
接触させる方法(特開昭61−21109号公報)、 金属酸化物、ヒドロカルビルマグネシウム及びヒド
ロカルビルオキシ基含有化合物(前記アルコキシ基含有
化合物に相当)を接触させることによって得られる固体
を、ハロゲン含有アルコールと接触させ、更に電子供与
性化合物及びチタン化合物と接触させる方法(特開昭6
2−7706号公報)である。これらの内でも〜の
方法が、特に,の方法が望ましい。A method in which a reaction product of a metal oxide and a magnesium dialkoxide is brought into contact with an electron-donating compound and a tetravalent titanium halide (JP-A-58-162).
607), a method in which a reaction product of an inorganic oxide and a magnesium hydrocarbyl halide compound is brought into contact with a Lewis base compound and titanium tetrachloride (Japanese Patent Application Laid-Open No. 55-94909), and a method in which a porous carrier such as silica and the like are used. A method in which a reaction product of a magnesium compound is brought into contact with an electron donating compound and a silicon halide compound before being brought into contact with a titanium compound (JP-A-55-115405 and JP-A-57-1081).
No. 07), a method of contacting a metal oxide, an alkoxy group-containing magnesium compound, an aromatic polycarboxylic acid having a carboxyl group at an ortho position or a derivative thereof, and a titanium compound (Japanese Patent Application Laid-Open No. 61-174204). A method of contacting an oxide, an alkoxy group-containing magnesium compound, a silicon compound having a hydrogen-silicon bond, an electron-donating compound and a titanium compound (Japanese Patent Application Laid-Open No. Sho 61-61).
174205), a method of contacting a metal oxide, a magnesium compound containing an alkoxy group, a halogen element or a compound containing a halogen, an electron-donating compound and a titanium compound (Japanese Patent Application Laid-Open No. 61-174206), a metal oxide, dihydrocarbyl A method of contacting a reaction product obtained by contacting magnesium and a halogen-containing alcohol with an electron-donating compound and a titanium compound (JP-A-61-21109), containing a metal oxide, hydrocarbylmagnesium and a hydrocarbyloxy group-containing compound; A method in which a solid obtained by contacting a compound (corresponding to the above-mentioned alkoxy group-containing compound) is contacted with a halogen-containing alcohol, and further contacted with an electron-donating compound and a titanium compound (Japanese Patent Laid-Open No.
2-7706). Among these, the method (1) is preferable, and the method (2) is particularly preferable.
【0035】上記のようにして成分Aは調製されるが、
成分Aは必要に応じて前記の不活性媒体で洗浄してもよ
く、更に乾燥してもよい。Component A is prepared as described above,
Component A may be washed with the above-mentioned inert medium, if necessary, and further dried.
【0036】又、成分Aは、更に有機アルミニウム化合
物の存在下、オレフィンと接触させて成分A中に生成す
るオレフィンポリマーを含有させてもよい。有機アルミ
ニウム化合物としては、本発明の触媒の一成分である後
記の有機金属化合物の中から選ばれる。The component A may further contain an olefin polymer formed in the component A upon contact with an olefin in the presence of an organoaluminum compound. The organoaluminum compound is selected from the below-mentioned organometallic compounds which are one component of the catalyst of the present invention.
【0037】オレフィンとしては、エチレンの他プロピ
レン、1−ブテン、1−ヘキセン、4−メチル−1−ペ
ンテン等のα−オレフィンが使用し得る。オレフィンと
の接触は、前記の不活性媒体の存在下行うのが望まし
い。接触は、通常100℃以下、望ましくは−10〜+
50℃の温度で行われる。成分A中に含有させるオレフ
ィンポリマーの量は、成分A1g当り通常0.1〜10
0gである。As the olefin, α-olefins such as propylene, 1-butene, 1-hexene and 4-methyl-1-pentene can be used in addition to ethylene. The contact with the olefin is preferably carried out in the presence of the above-mentioned inert medium. Contact is usually 100 ° C. or less, preferably -10 to +
It is performed at a temperature of 50 ° C. The amount of the olefin polymer contained in Component A is usually 0.1 to 10 per 1 g of Component A.
0 g.
【0038】成分Aとオレフィンの接触は、有機アルミ
ニウム化合物と共に電子供与性化合物を存在させてもよ
い。電子供与性化合物は、成分Aを調製させる際に用い
られる化合物およびSi−O−C結合もしくはSi−N
−C結合を有する有機珪素化合物などの中から選択され
る。オレフィンと接触した成分Aは必要に応じて前記の
不活性媒体で洗浄することができ、又更に乾燥すること
ができる。The contact between the component A and the olefin may be carried out in the presence of an electron donating compound together with the organoaluminum compound. The electron donating compound includes a compound used for preparing the component A and a Si—O—C bond or a Si—N
It is selected from organic silicon compounds having a -C bond. Component A, which has come into contact with the olefin, can be optionally washed with the above-mentioned inert medium and further dried.
【0039】有機金属化合物 有機金属化合物(以下成分Bという。)は、周期表第I
族ないし第III 族金属の有機化合物である。成分Bとし
ては、リチウム、マグネシウム、カルシウム、亜鉛及び
アルミニウムの有機化合物が使用し得る。これらの中で
も特に、有機アルミニウム化合物が好適である。用い得
る有機アルミニウム化合物としては、一般式 Rn Al
X3-n (但し、Rはアルキル基又はアリール基、Xはハ
ロゲン原子、アルコキシ基又は水素原子を示し、nは1
≦n≦3の範囲の任意の数である。)で示されるもので
あり、例えばトリアルキルアルミニウム、ジアルキルア
ルミニウムモノハライド、モノアルキルアルミニウムジ
ハライド、アルキルアルミニウムセスキハライド、ジア
ルキルアルミニウムモノアルコキシド及びジアルキルア
ルミニウムモノハイドライドなどの炭素数1ないし18
個、好ましくは炭素数2ないし6個のアルキルアルミニ
ウム化合物又はその混合物もしくは錯化合物が特に好ま
しい。具体的には、トリメチルアルミニウム、トリエチ
ルアルミニウム、トリプロピルアルミニウム、トリイソ
ブチルアルミニウム、トリヘキシルアルミニウムなどの
トリアルキルアルミニウム、ジメチルアルミニウムクロ
リド、ジエチルアルミニウムクロリド、ジエチルアルミ
ニウムブロミド、ジエチルアルミニウムアイオダイド、
ジイソブチルアルミニウムクロリドなどのジアルキルア
ルミニウムモノハライド、メチルアルミニウムジクロリ
ド、エチルアルミニウムジクロリド、メチルアルミニウ
ムジブロミド、エチルアルミニウムジブロミド、エチル
アルミニウムジアイオダイド、イソブチルアルミニウム
ジクロリドなどのモノアルキルアルミニウムジハライ
ド、エチルアルミニウムセスキクロリドなどのアルキル
アルミニウムセスキハライド、ジメチルアルミニウムメ
トキシド、ジエチルアルミニウムエトキシド、ジエチル
アルミニウムフェノキシド、ジプロピルアルミニウムエ
トキシド、ジイソブチルアルミニウムエトキシド、ジイ
ソブチルアルミニウムフェノキシドなどのジアルキルア
ルミニウムモノアルコキシド、ジメチルアルミニウムハ
イドライド、ジエチルアルミニウムハイドライド、ジプ
ロピルアルミニウムハイドライド、ジイソブチルアルミ
ニウムハイドライドなどのジアルキルアルミニウムハイ
ドライドが挙げられる。これらの中でも、トリアルキル
アルミニウムが、特にトリエチルアルミニウム、トリイ
ソブチルアルミニウムが望ましい。又、これらトリアル
キルアルミニウムは、その他の有機アルミニウム化合
物、例えば、工業的に入手し易いジエチルアルミニウム
クロリド、エチルアルミニウムジクロリド、エチルアル
ミニウムセスキクロリド、ジエチルアルミニウムエトキ
シド、ジエチルアルミニウムハイドライド又はこれらの
混合物若しくは錯化合物等と併用することができる。 Organometallic compounds Organometallic compounds (hereinafter referred to as component B) are listed in the Periodic Table I.
Organic compounds of Group III or Group III metals. As component B, organic compounds of lithium, magnesium, calcium, zinc and aluminum can be used. Among these, an organoaluminum compound is particularly preferable. As the organoaluminum compound that can be used, a compound represented by the general formula R n Al
X 3-n (where R represents an alkyl group or an aryl group, X represents a halogen atom, an alkoxy group or a hydrogen atom, and n represents 1
It is an arbitrary number in the range of ≦ n ≦ 3. And C1 to C18 such as trialkylaluminum, dialkylaluminum monohalide, monoalkylaluminum dihalide, alkylaluminum sesquihalide, dialkylaluminum monoalkoxide and dialkylaluminum monohydride.
And preferably an alkylaluminum compound having 2 to 6 carbon atoms or a mixture or complex compound thereof. Specifically, trimethylaluminum, triethylaluminum, tripropylaluminum, triisobutylaluminum, trialkylaluminum such as trihexylaluminum, dimethylaluminum chloride, diethylaluminum chloride, diethylaluminum bromide, diethylaluminum iodide,
Monoalkylaluminum dihalides such as dialkylaluminum monohalide such as diisobutylaluminum chloride, methylaluminum dichloride, ethylaluminum dichloride, methylaluminum dibromide, ethylaluminum dibromide, ethylaluminum diiodide, isobutylaluminum dichloride, and ethylaluminum sesquichloride Dialkyl aluminum monoalkoxides such as alkyl aluminum sesquihalide, dimethyl aluminum methoxide, diethyl aluminum ethoxide, diethyl aluminum phenoxide, dipropyl aluminum ethoxide, diisobutyl aluminum ethoxide, diisobutyl aluminum phenoxide, dimethyl aluminum hydride, diethyl Aluminum hydride, dipropyl aluminum hydride, dialkyl aluminum hydride such as diisobutyl aluminum hydride. Among these, trialkyl aluminum, particularly triethyl aluminum and triisobutyl aluminum are desirable. These trialkylaluminums are other organic aluminum compounds, for example, diethylaluminum chloride, ethylaluminum dichloride, ethylaluminum sesquichloride, diethylaluminum ethoxide, diethylaluminum hydride, or mixtures or complex compounds thereof, which are easily available industrially. Etc. can be used in combination.
【0040】又、酸素原子や窒素原子を介して2個以上
のアルミニウムが結合した有機アルミニウム化合物も使
用可能である。そのような化合物としては、例えばAn organic aluminum compound in which two or more aluminum atoms are bonded via an oxygen atom or a nitrogen atom can also be used. Such compounds include, for example,
【化3】 等を例示できる。Embedded image Etc. can be exemplified.
【0041】アルミニウム金属以外の金属の有機化合物
としては、ジエチルマグネシウム、エチルマグネシウム
クロリド、ジエチル亜鉛等の他LiAl(C
2 H5 )4 ,LiAl(C7 H15)4 等の化合物が挙げ
られる。Examples of organic compounds of metals other than aluminum metal include diethyl magnesium, ethyl magnesium chloride, diethyl zinc, and other LiAl (C
2 H 5) 4, LiAl ( C 7 H 15) compounds such as 4.
【0042】有機珪素化合物 本発明の触媒の一成分である有機珪素化合物(以下、成
分Cという。)は、前記一般式で表わされる。該式にお
いて、R1 ,R2 の炭化水素基及びOR4 ,OSiR5
3 ,SiR6 3 におけるR4 ,R5 ,R6 の炭化水素基
としては、アルキル基、アルケニル基、シクロアルキル
基、シクロアルケニル基、シクロアルカジエニル基、ア
リール基、アルアルキル基等が挙げられる。 Organosilicon compound The organosilicon compound (hereinafter referred to as component C), which is one component of the catalyst of the present invention, is represented by the above general formula. In the formula, the hydrocarbon groups of R 1 and R 2 and OR 4 and OSiR 5
3, as the hydrocarbon group for R 4, R 5, R 6 in the SiR 6 3, include alkyl groups, alkenyl group, cycloalkyl group, cycloalkenyl group, cycloalkadienyl group, an aryl group, an aralkyl group or the like Can be
【0043】アルキル基としては、メチル、エチル、プ
ロピル、i−プロピル、ブチル、i−ブチル、s−ブチ
ル、t−ブチル、アミル、i−アミル、t−アミル、ヘ
キシル、オクチル、2−エチルヘキシル、デシル基等
が、アルケニル基としては、ビニル、アリル、プロペニ
ル、1−ブテニル、1−ペンテニル、1−ヘキセニル、
1−オクテニル、1−デケニル、1−メチル−1−ペン
チニル、1−メチル−1−ヘプテニル等が、シクロアル
キル基としては、シクロペンチル、シクロヘキシル、メ
チルシクロヘキシル基等が、シクロアルケニル基として
は、シクロペンテニル、シクロヘキセニル、メチルシク
ロヘキセニル基等が、シクロアルカジエニル基として
は、シクロペンタジエニル、メチルシクロペンタジエニ
ル、インデニル基等が、アリール基としては、フェニ
ル、トリル、キシリル基等が、アルアルキル基として
は、ベンジル、フェネチル、3−フェニルプロピル基等
が挙げられる。Examples of the alkyl group include methyl, ethyl, propyl, i-propyl, butyl, i-butyl, s-butyl, t-butyl, amyl, i-amyl, t-amyl, hexyl, octyl, 2-ethylhexyl, A decyl group or the like, as an alkenyl group, vinyl, allyl, propenyl, 1-butenyl, 1-pentenyl, 1-hexenyl,
1-octenyl, 1-decenyl, 1-methyl-1-pentynyl, 1-methyl-1-heptenyl and the like; cycloalkyl groups such as cyclopentyl, cyclohexyl and methylcyclohexyl; cycloalkenyl groups such as cyclopentenyl , Cyclohexenyl, methylcyclohexenyl group, etc .; cycloalkadienyl group, cyclopentadienyl, methylcyclopentadienyl, indenyl group, etc .; and aryl group, phenyl, tolyl, xylyl group, etc. Examples of the alkyl group include a benzyl, phenethyl, and 3-phenylpropyl group.
【0044】又、前記一般式におけるR3 は、二価の炭
化水素基であり、具体的には下記の一般式で表わされる
基が挙げられる。R 3 in the above general formula is a divalent hydrocarbon group, and specific examples include groups represented by the following general formula.
【化4】 上記において、mは1〜10であり、n,p,qはそれ
ぞれ2〜8である。Embedded image In the above, m is 1 to 10, and n, p, and q are 2 to 8, respectively.
【0045】上記〜の基の具体例は下記の通りであ
る。Specific examples of the above groups are as follows.
【化5】 Embedded image
【化6】 Embedded image
【0046】[0046]
【化7】 Embedded image
【0047】[0047]
【化8】 Embedded image
【0048】[0048]
【化9】 Embedded image
【0049】成分Cは、通常、一般式R1 R2 SiX2
(Xはハロゲン原子)で表わされる化合物と一般式HO
R3 OHで表わされる化合物とを、ピリジン、キノリン
等の脱ハロゲン化水素剤の存在下反応させるか、一般式
R1 R2 Si(OR7 )2 (R7 は炭化水素基)で表わ
される化合物と一般式HOR3 OHで表わされる化合物
とを酸又は塩基触媒の存在下で反応させることにより合
成することができる。Component C is generally represented by the general formula R 1 R 2 SiX 2
(X is a halogen atom) and a compound represented by the general formula HO
The compound represented by R 3 OH is reacted in the presence of a dehydrohalogenating agent such as pyridine or quinoline, or represented by the general formula R 1 R 2 Si (OR 7 ) 2 (R 7 is a hydrocarbon group) It can be synthesized by reacting a compound with a compound represented by the general formula HOR 3 OH in the presence of an acid or base catalyst.
【0050】本発明の触媒は、成分A,成分B及び成分
Cからなるが、それらの構成割合は、成分Bが成分A中
のチタン1グラム原子当り1〜2,000グラムモル、
望ましくは20〜500グラムモル、成分Cが成分B1
モルに対して0.001〜10モル、望ましくは0.0
1〜1.0モルとなるように用いられる。The catalyst of the present invention comprises Component A, Component B and Component C. The component ratio of Component B is 1 to 2,000 g mol per 1 g atom of titanium in Component A.
Desirably, 20 to 500 gmol, wherein component C is component B1
0.001 to 10 mol, preferably 0.0
It is used so as to be 1 to 1.0 mol.
【0051】プロピレン−エチレンブロック共重合体の
製造法 プロピレン−エチレンブロック共重合体の製造法の製造
法は、プロピレンを重合して高結晶性ポリプロピレンと
する工程(工程a)と、プロピレンとエチレンを共重合
する工程(工程b)とからなる。The propylene-ethylene block copolymer
Production Method The production method of the method for producing a propylene-ethylene block copolymer comprises a step of polymerizing propylene to a highly crystalline polypropylene (step a) and a step of copolymerizing propylene and ethylene (step b). .
【0052】(1)工程a 工程aは、前記重合触媒の存在下、プロピレンを重合す
ることからなる。重合反応は、気相、液相のいずれでも
よく、液相で重合させる場合は、ノルマルブタン、イソ
ブタン、ノルマルペンタン、イソペンタン、ヘキサン、
ヘプタン、オクタン、シクロヘキサン、ベンゼン、トル
エン、キシレン等の不活性炭化水素中及び液状モノマー
中で行うことができる。重合温度は、通常−80℃〜+
150℃、好ましくは40〜120℃の範囲である。重
合圧力は、例えば1〜60気圧でよい。又得られる重合
体の分子量の調節は、水素若しくは他の公知の分子量調
節剤を存在せしめることにより行われる。工程aでは、
そこで得られるポリプロピレンが該ブロック共重合体の
50〜98重量%、特に70重量%〜95重量%となる
ようにするのが望ましい。(1) Step a Step a) comprises polymerizing propylene in the presence of the polymerization catalyst. The polymerization reaction may be any of a gas phase and a liquid phase, and when polymerizing in a liquid phase, normal butane, isobutane, normal pentane, isopentane, hexane,
It can be carried out in an inert hydrocarbon such as heptane, octane, cyclohexane, benzene, toluene, xylene and in a liquid monomer. The polymerization temperature is usually from -80 ° C to +
It is in the range of 150C, preferably 40-120C. The polymerization pressure may be, for example, 1 to 60 atm. The molecular weight of the resulting polymer is adjusted by the presence of hydrogen or other known molecular weight regulators. In step a,
It is desirable that the obtained polypropylene accounts for 50 to 98% by weight, particularly 70 to 95% by weight of the block copolymer.
【0053】(2)工程b プロピレンとエチレンの共重合は、前記の重合触媒の存
在下で行なわれる。共重合は、そこで得られる共重合体
中のエチレン含有量が30〜95重量%、望ましくは4
0〜80重量%となるように、プロピレンとエチレンを
接触して反応することによりなされる。共重合反応は、
工程aで行なわれる重合条件の範囲の中から適宜選択す
るすることができ、又水素等の分子量調節剤の使用も工
程aの場合と同じである。工程bで得られる共重合体の
量は、通常該ブロック共重合体の50〜2重量%である
が、望ましくは30〜5重量%である。(2) Step b The copolymerization of propylene and ethylene is carried out in the presence of the above-mentioned polymerization catalyst. The copolymerization is carried out when the ethylene content in the copolymer obtained therefrom is 30 to 95% by weight, preferably 4% by weight.
The reaction is carried out by bringing propylene and ethylene into contact with each other so as to be 0 to 80% by weight. The copolymerization reaction is
It can be appropriately selected from the range of polymerization conditions performed in step a, and the use of a molecular weight regulator such as hydrogen is the same as in step a. The amount of the copolymer obtained in the step b is usually 50 to 2% by weight of the block copolymer, but preferably 30 to 5% by weight.
【0054】本発明の方法は、工程aと工程bとからな
るが、工程aと工程bは、その順序に、又は逆に行う直
列方式の他、工程aと工程bを並列に行い、それぞれで
得られるポリマーを合体する方法が採用することができ
るが、これらの中でも、特に工程aと工程bをその順序
に行う方法が、装置上有利であり望ましい。The method of the present invention comprises a step a and a step b. The steps a and b may be performed in order or vice versa. Alternatively, the steps a and b may be performed in parallel. A method of combining the polymers obtained in the above can be adopted, and among these, a method in which step a and step b are performed in that order is particularly advantageous and desirable in terms of the apparatus.
【0055】[0055]
【実施例】本発明を実施例及び比較例により具体的に説
明する。なお、例におけるパーセント(%)は特に断ら
ない限り重量による。ポリマーの物性測定は、該ポリマ
ー粉末に、BHT(2,6−ジターシャリーブチル−4
−メチルフェノール)を0.18重量%、DSTDP
(ジステリアルチオジプロピオネート)を0.08重量
%、IRGANOX1010〔テトラキス−{メチレン
−(3,5−ジターシャリーブチル−4−ヒドロキシヒ
ドロ−シンナメート)メタン}〕を0.04重量%、カ
ルシウムステアレートを0.06重量%それぞれ添加
し、溶融混練によりペレットとした後、射出成形形によ
り試験片を作成して行った。曲げ弾性率:JIS K
7203−1982に:デュポン衝撃強度:JIS K
7211−1976にそれぞれ準拠。又、ポリマーの
MFRはASTM D−1238に従って測定した。EXAMPLES The present invention will be specifically described with reference to Examples and Comparative Examples. The percentages (%) in the examples are by weight unless otherwise specified. The physical properties of the polymer were measured by adding BHT (2,6-di-tert-butyl-4) to the polymer powder.
0.18% by weight of DSTDP
0.08% by weight (disterial thiodipropionate), 0.04% by weight of IRGANOX1010 [tetrakis- {methylene- (3,5-ditert-butyl-4-hydroxyhydro-cinnamate) methane]], calcium stearate After adding 0.06% by weight of each rate and pelletizing by melt kneading, test pieces were prepared by injection molding. Flexural modulus: JIS K
7203-1982: Dupont impact strength: JIS K
7211-1976. The MFR of the polymer was measured according to ASTM D-1238.
【0056】実施例1 成分Aの調製 滴下ロート及び攪拌機を取付けた200mlのフラスコを
窒素ガスで置換した。このフラスコに、酸化ケイ素(D
AVISON社製、商品名G−952)を窒素気流中に
おいて200℃で2時間、更に700℃で5時間焼成し
たものを5g及びn−ヘプタンを40ml入れた。更にn
−ブチルエチルマグネシウム(以下、BEMという。)
の20%n−ヘプタン溶液(テキサスアルキルズ社製、
商品名MAGALA BEM)20mlを加え、90℃で
1時間攪拌した。上記懸濁液を0℃に冷却した後、これ
にテトラエトキシシラン11.2gを20mlのn−ヘプ
タンに溶解した溶液を滴下ロートから30分掛けて滴下
した。滴下終了後、2時間掛けて50℃に昇温し、50
℃で1時間攪拌を続けた。反応終了後、デカンテーショ
ンにより上澄液を除去し、生成した固体を60mlのn−
ヘプタンにより室温で洗浄し、更にデカンテーションに
より上澄液を除去した。このn−ヘプタンによる洗浄処
理を更に4回行った。上記の固体に、50mlのn−ヘプ
タンを加えて懸濁液とし、これに2,2,2−トリクロ
ルエタノール8.0gを10mlのn−ヘプタンに溶解し
た溶液を、滴下ロートから25℃において15分間掛け
て滴下した。滴下終了後25℃で30分間攪拌を続け
た。反応終了後、室温において、60mlのn−ヘプタン
にて2回、60mlのトルエンにて3回それぞれ洗浄を行
った。得られた固体(固体成分I)を分析したところ、
SiO2 36.6%、マグネシウム5.1%、塩素3
8.5%を含んでいた。上記で得られた固体成分Iに、
n−ヘプタン10ml及び四塩化チタン40mlを加え、9
0℃迄昇温し、n−ヘプタン5mlに溶解したフタル酸ジ
n−ブチル0.6gを5分間掛けて添加した。その後、
115℃に昇温し、2時間反応させた。90℃に降温し
た後、デカンテーションにより上澄液を除き、n−ヘプ
タン70mlで2回洗浄を行った。更に、n−ヘプタン1
5mlと四塩化チタン40mlを加え、115℃で2時間反
応させた。反応終了後、得られた固体物質を60mlのn
−ヘキサンにて室温で8回洗浄を行った。次いで、減圧
下室温にて1時間乾燥を行い、8.3gの触媒成分(成
分A)を得た。この成分Aには、3.1%のチタンの他
酸化ケイ素、塩素及びフタル酸ジn−ブチルが含まれて
いた。 Example 1 Preparation of Component A A 200 ml flask equipped with a dropping funnel and a stirrer was replaced with nitrogen gas. In this flask, silicon oxide (D
5g of n-heptane and 40 ml of n-heptane were placed in a nitrogen stream at 200 ° C for 2 hours and then at 700 ° C for 5 hours. And n
-Butylethylmagnesium (hereinafter referred to as BEM)
20% n-heptane solution (manufactured by Texas Alkyls,
20 ml (trade name: MAGALA BEM) was added and stirred at 90 ° C. for 1 hour. After the suspension was cooled to 0 ° C., a solution of 11.2 g of tetraethoxysilane dissolved in 20 ml of n-heptane was dropped from the dropping funnel over 30 minutes. After completion of dropping, the temperature was raised to 50 ° C. over 2 hours,
Stirring was continued for 1 hour at ° C. After completion of the reaction, the supernatant was removed by decantation, and the resulting solid was reconstituted in 60 ml of n-
After washing with heptane at room temperature, the supernatant was removed by decantation. This washing treatment with n-heptane was further performed four times. To the above solid, 50 ml of n-heptane was added to make a suspension, and a solution of 8.0 g of 2,2,2-trichloroethanol dissolved in 10 ml of n-heptane was added to the suspension at 25 ° C from a dropping funnel at 15 ° C. It was dropped over a period of minutes. After completion of the dropwise addition, stirring was continued at 25 ° C. for 30 minutes. After completion of the reaction, washing was performed twice at room temperature with 60 ml of n-heptane and three times with 60 ml of toluene. When the obtained solid (solid component I) was analyzed,
SiO 2 36.6%, magnesium 5.1%, chlorine 3
8.5%. In the solid component I obtained above,
10 ml of n-heptane and 40 ml of titanium tetrachloride were added, and 9
The temperature was raised to 0 ° C., and 0.6 g of di-n-butyl phthalate dissolved in 5 ml of n-heptane was added over 5 minutes. afterwards,
The temperature was raised to 115 ° C., and the reaction was performed for 2 hours. After the temperature was lowered to 90 ° C., the supernatant was removed by decantation, and the mixture was washed twice with 70 ml of n-heptane. Further, n-heptane 1
5 ml and 40 ml of titanium tetrachloride were added and reacted at 115 ° C. for 2 hours. At the end of the reaction, the solid material obtained is
Washing was carried out eight times with hexane at room temperature. Next, drying was performed at room temperature under reduced pressure for 1 hour to obtain 8.3 g of a catalyst component (component A). Component A contained 3.1% titanium, as well as silicon oxide, chlorine and di-n-butyl phthalate.
【0057】重合 窒素置換をして充分に乾燥された5リットルのオートク
レーブに、上記で得られた成分A43.6mg、n−ヘプ
タン1リットル中に0.6モルのトリエチルアルミニウ
ムを含む溶液4ml、及びn−ヘプタン1リットル中に
0.08モルの2−シクロヘキシル−2−メチル−2−
シラ−1,3−ジオキサンを含む溶液3mlを混合し、5
分間保持したものを入れた。次いで水素を4.8リット
ル及び液体プロピレン3リットルを圧入した後、オート
クレーブ内部温度を70℃に昇温し、第1段重合を行っ
た。1時間後、未反応プロピレンおよび水素をパージし
て、器内圧力を0.2kg/cm2 ・Gとした。第1段
目のポリマーを少量採取した後、系内に水素を導入し
た。引き続いてプロピレンとエチレンのモル比が1.5
の混合ガスを供給して、プロピレン−エチレン共重合を
行った。器内圧力を6kg/cm2 ・Gに保ち、75℃
で2時間共重合を行った。重合終了後、未反応ガスをパ
ージし、ポリマーを取り出し乾燥した。未反応ガス中に
は0.4モル%の水素が含まれていた。得られたポリマ
ーのMFRは13.9g/10分であった。分析の結
果、共重合によって得られたポリマーの生成量は20重
量%であり、エチレン含有量は50重量%であった。ま
た、1段目終了後にサンプリングしたポリマーのMFR
は31.9g/10分であった。最終ポリマーの物性を
測定したところ、曲げ弾性率は8.41×10 3 kg/
cm2 、デュポン衝撃強度は74.9kg・cmであっ
た。[0057]polymerization 5 liters of autoclaved with nitrogen replacement
In a reave, 43.6 mg of the component A obtained above, n-heptane
0.6 mol of triethylaluminum per liter of tan
In 4 ml of a solution containing the solution and 1 liter of n-heptane
0.08 mol of 2-cyclohexyl-2-methyl-2-
3 ml of a solution containing sila-1,3-dioxane is mixed, and 5
What was held for a minute was put in. Then 4.8 l of hydrogen
Pressure and 3 liters of liquid propylene
The internal temperature of the clave was raised to 70 ° C., and the first-stage polymerization was performed.
Was. After one hour, unreacted propylene and hydrogen are purged.
And the internal pressure is 0.2kg / cmTwo・ G First stage
After collecting a small amount of eye polymer, introduce hydrogen into the system
Was. Subsequently, the molar ratio of propylene to ethylene is 1.5
To supply propylene-ethylene copolymer
went. 6kg / cm internal pressureTwo・ Keep at G, 75 ℃
For 2 hours. After the polymerization, unreacted gas is purged.
And the polymer was removed and dried. In unreacted gas
Contained 0.4 mol% of hydrogen. The resulting polymer
-Had an MFR of 13.9 g / 10 min. Analysis results
As a result, the amount of polymer produced by copolymerization was 20
% Ethylene content was 50% by weight. Ma
MFR of polymer sampled after the first stage
Was 31.9 g / 10 minutes. Physical properties of final polymer
Upon measurement, the flexural modulus was 8.41 × 10 Threekg /
cmTwo, The DuPont impact strength was 74.9 kg · cm.
Was.
【0058】実施例2〜4、比較例1〜2 重合触媒の一成分として用いた2−シクロヘキシル−2
−メチル−2−シラ−1,3−ジオキサンのかわりに表
1に示す有機硅素化合物を用いて、さらに表1に示すよ
うなMFRになるように水素量を調節した以外は実施例
1と同様にしてプロピレンの共重合を行った。得られた
最終ポリマーの物性も表1に示した。これより、本発明
に係るブロック共重合体が弾性率と衝撃強度においてバ
ランスよく優れていることがわかる。 Examples 2 to 4 and Comparative Examples 1 and 2 2-cyclohexyl-2 used as one component of the polymerization catalyst
Same as Example 1 except that the organosilicon compound shown in Table 1 was used instead of -methyl-2-sila-1,3-dioxane, and the amount of hydrogen was further adjusted to obtain the MFR shown in Table 1. Was used to copolymerize propylene. The physical properties of the final polymer obtained are also shown in Table 1. This indicates that the block copolymer according to the present invention is excellent in elastic modulus and impact strength in a well-balanced manner.
【表1】 [Table 1]
【0059】[0059]
【発明の効果】本発明の方法により、耐衝撃性と剛性の
バランスに優れたプロピレンのブロック共重合体を製造
することができる。According to the method of the present invention, a block copolymer of propylene having an excellent balance between impact resistance and rigidity can be produced.
【図1】図1は、本発明の方法を示すフローチャート図
である。FIG. 1 is a flow chart illustrating the method of the present invention.
フロントページの続き (72)発明者 植木 聰 埼玉県入間郡大井町西鶴ケ岡一丁目3番 1号 東燃株式会社 総合研究所内 (72)発明者 斉藤 博夫 埼玉県入間郡大井町西鶴ケ岡一丁目3番 1号 東燃株式会社 総合研究所内 (72)発明者 滝 敬之 埼玉県入間郡大井町西鶴ケ岡一丁目3番 1号 東燃株式会社 総合研究所内 (56)参考文献 特開 平6−73112(JP,A) (58)調査した分野(Int.Cl.7,DB名) C08F 297/08 C08F 4/658 Continuing from the front page (72) Inventor Satoshi Ueki 1-3-1, Nishitsurugaoka, Oimachi, Iruma-gun, Saitama Prefecture Within Tonen Co., Ltd. (72) Inventor Hiroo Saito 1-3-3, Nishitsurugaoka, Oimachi, Iruma-gun, Saitama No. 1 Tonen Co., Ltd. (72) Inventor Takayuki Taki 1-3-1, Nishitsurugaoka, Oi-machi, Iruma-gun, Saitama 1st Tonen Co., Ltd. (56) References JP-A-6-73112 (JP, A (58) Fields surveyed (Int. Cl. 7 , DB name) C08F 297/08 C08F 4/658
Claims (1)
ン、ハロゲン及び電子供与性化合物を必須成分とする固
体触媒成分、 (B)有機金属化合物及び (C)一般式 【化1】 〔但し、R1 及びR2 は同一か異なる炭素数1〜10個
の炭化水素基、OR4、OSiR5 3 又はSiR6 3 、
R3 は炭素数1〜10個の二価の炭化水素基であり、R
4 、R5 及びR6 はそれぞれ炭素数1〜10個の炭化水
素基である。〕で表わされる有機珪素化合物とからなる
重合用触媒の存在下、(1)プロピレンを重合して高結
晶性ポリプロピレンを製造する工程(a)及び(2)プ
ロピレンとエチレンを共重合する工程(b)からなるプ
ロピレンのブロック共重合体の製造方法。1. A solid catalyst component comprising (A) a metal oxide, magnesium, titanium, a halogen and an electron donating compound as essential components, (B) an organometallic compound, and (C) a general formula: [However, R 1 and R 2 are the same or different carbon atoms from 1 to 10 hydrocarbon group, OR 4, OSiR 5 3 or SiR 6 3,
R 3 is a divalent hydrocarbon group having 1 to 10 carbon atoms;
4 , R 5 and R 6 are each a hydrocarbon group having 1 to 10 carbon atoms. (A) in the presence of a polymerization catalyst comprising an organosilicon compound represented by the following formula (1): (a) a step of polymerizing propylene to produce a highly crystalline polypropylene; and (2) a step (b) of copolymerizing propylene with ethylene. A method for producing a propylene block copolymer comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03161817A JP3083346B2 (en) | 1991-07-02 | 1991-07-02 | Method for producing propylene block copolymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03161817A JP3083346B2 (en) | 1991-07-02 | 1991-07-02 | Method for producing propylene block copolymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0673143A JPH0673143A (en) | 1994-03-15 |
| JP3083346B2 true JP3083346B2 (en) | 2000-09-04 |
Family
ID=15742476
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03161817A Expired - Fee Related JP3083346B2 (en) | 1991-07-02 | 1991-07-02 | Method for producing propylene block copolymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3083346B2 (en) |
-
1991
- 1991-07-02 JP JP03161817A patent/JP3083346B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0673143A (en) | 1994-03-15 |
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