JP3105271B2 - Method and apparatus for rinsing and cleaning an object to be cleaned - Google Patents
Method and apparatus for rinsing and cleaning an object to be cleanedInfo
- Publication number
- JP3105271B2 JP3105271B2 JP03020471A JP2047191A JP3105271B2 JP 3105271 B2 JP3105271 B2 JP 3105271B2 JP 03020471 A JP03020471 A JP 03020471A JP 2047191 A JP2047191 A JP 2047191A JP 3105271 B2 JP3105271 B2 JP 3105271B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- rinsing
- liquid
- cleaned
- steam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
- Inking, Control Or Cleaning Of Printing Machines (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【0001】[0001]
【産業上の利用分野】本発明は、炭化水素系溶剤または
シリコン系溶剤から成る洗浄液を用いて洗浄した、被洗
浄物の濯ぎ洗浄方法及びその装置に係るものであって、
シルクスクリーン、機械部品、電子部品、プリント基板
等の被洗浄物の洗浄作業により、被洗浄物に付着した洗
浄液を、有効に除去するとともに洗浄液の確実な回収を
目的とするものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for rinsing an object to be cleaned, which has been cleaned using a cleaning solution comprising a hydrocarbon solvent or a silicon solvent.
The object of the present invention is to effectively remove a cleaning liquid adhering to an object to be cleaned and reliably recover the cleaning liquid by performing a cleaning operation on the object to be cleaned such as a silk screen, a mechanical component, an electronic component, and a printed circuit board.
【0002】[0002]
【従来の技術】従来、シルクスクリーン、機械部品、電
子部品、プリント基板等の洗浄を行うには、不燃性で引
火の危険がないこと、洗浄力に優れていること等から、
一般的にフロンや塩素系溶剤が用いられていた。しか
し、これらの溶剤は、地球環境の破壊を伴うことから使
用が規制されるものとなった。2. Description of the Related Art Conventionally, silk screens, mechanical parts, electronic parts, printed circuit boards, and the like have been used for cleaning because they are nonflammable and have no danger of ignition, and are excellent in cleaning power.
Generally, CFCs and chlorine-based solvents have been used. However, the use of these solvents has been regulated because of the destruction of the global environment.
【0003】この、フロンや塩素系溶剤を用いた洗浄方
法に代わる洗浄方法としては、水をベースとして用いた
水系洗浄が考慮される。しかしながら、水系洗浄は洗浄
能力が落ちるため、その分、洗浄作業に長い時間を必要
とし、作業効率が悪いものとなる。また、水系洗浄は、
被洗浄物から除去した汚物を含んだ汚水の処理に的確な
方法がなく、フロン系溶剤を用いた場合とは異なる、新
たな公害問題を生じる可能性がある。As an alternative to the cleaning method using chlorofluorocarbon or a chlorine-based solvent, an aqueous cleaning method using water as a base is considered. However, since the water-based cleaning has a low cleaning ability, a long time is required for the cleaning operation, resulting in poor working efficiency. In addition, water-based cleaning
There is no accurate method for treating sewage containing sewage removed from the object to be washed, and there is a possibility that a new pollution problem different from the case of using a chlorofluorocarbon-based solvent may occur.
【0004】また、フロンや塩素系溶剤を用いない非水
溶系の溶剤としては、洗浄力が優れていることから、シ
リコン系溶剤、炭化水素系溶剤等の溶剤が考慮される。[0004] Solvents such as silicon solvents and hydrocarbon solvents are considered as non-aqueous solvents that do not use chlorofluorocarbons or chlorine solvents because of their excellent detergency.
【0005】しかしながら、これらの炭化水素系溶剤ま
たはシリコン系溶剤は引火の危険があり、溶剤洗浄後
に、被洗浄物に付着した溶剤を除去するため、加熱した
り、蒸気洗浄を行うことが難しいものであった。そのた
め、被洗浄物に付着した炭化水素系溶剤またはシリコン
系溶剤を除去するには、空気を被洗浄物に吹き付けて、
非水溶系の可燃性溶剤を吹き飛ばすことが行われてい
る。However, these hydrocarbon-based solvents or silicon-based solvents have a danger of ignition, and it is difficult to perform heating or steam cleaning in order to remove the solvent attached to the object to be cleaned after the solvent cleaning. Met. Therefore, in order to remove the hydrocarbon-based solvent or silicon-based solvent attached to the object to be cleaned, blow air onto the object to be cleaned,
It has been practiced to blow off non-aqueous flammable solvents.
【0006】そして、この非水溶系の可燃性溶剤を多く
含んだ空気は、屋外にそのまま排気しているが、溶剤の
消費量が多く不経済であるばかりでなく、大気汚染、引
火の危険性等の点からも好ましくないものである。The air containing a large amount of the non-aqueous flammable solvent is exhausted to the outside as it is. However, the consumption of the solvent is not only uneconomical, but also the danger of air pollution and ignition. It is not preferable from the viewpoint of the above.
【0007】[0007]
【発明が解決しようとする課題】本発明は上述のごとき
課題を解決しようとするものであって、環境汚染防止の
ため、フロンや塩素系有機溶剤を用いずに、炭化水素系
溶剤またはシリコン系溶剤を洗浄液として用いながら、
引火の危険がなく、また洗浄液の回収を確実に行い、経
済的であるばかりでなく、大気汚染、引火の危険性等の
ない、安全で確実な濯ぎ洗浄を可能にしようとするもの
である。DISCLOSURE OF THE INVENTION The present invention is to solve the above-mentioned problems. In order to prevent environmental pollution, a hydrocarbon-based solvent or a silicon-based solvent is used without using chlorofluorocarbon or a chlorine-based organic solvent. While using a solvent as a cleaning solution,
An object of the present invention is to provide a safe and reliable rinsing and washing method which is not economical and has no risk of ignition and no risk of ignition.
【0008】[0008]
【課題を解決するための手段】本発明は上述のごとき課
題を解決するため、炭化水素系溶剤またはシリコン系溶
剤から実質的に成る洗浄液を用いて被洗浄物を洗浄する
洗浄工程と、この洗浄液が付着した被洗浄物を、完全フ
ッ素化液体を主成分とする濯ぎ洗浄液に浸漬して濯ぎ洗
浄する濯ぎ工程と、前記濯ぎ洗浄後の被洗浄物を、完全
フッ素化液体を主成分とする濯ぎ蒸気を用い、被洗浄物
が蒸気温度に到達するまでは、被洗浄物に濯ぎ蒸気を付
着し凝縮させることにより、前記濯ぎ洗浄液が前記洗浄
工程の洗浄液を伴って、被洗浄物から洗浄液を分離除去
し、蒸気温度に到達した時に、被洗浄物を乾燥させる蒸
気洗浄工程とを有することを特徴として成るものであ
る。SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides a cleaning step of cleaning an object to be cleaned by using a cleaning liquid substantially consisting of a hydrocarbon solvent or a silicon solvent; A rinsing step of immersing the object to be washed with the rinsing liquid containing a perfluorinated liquid as a main component, and rinsing the object to be cleaned after the rinsing with the perfluorinated liquid as a main component. using steam, until the object to be cleaned reaches the steam temperature, by condensing adhered steam rinsing to be cleaned, and the rinsing wash solution is accompanied by the cleaning liquid of the cleaning process, the cleaning liquid from the cleaning object And a steam cleaning step of drying the object to be cleaned when the temperature reaches the steam temperature.
【0009】 また、上記の洗浄方法において、さらに
被洗浄物に完全フッ素化液体を主成分とする洗浄液を噴
射する洗浄工程を有することを特徴とするものであって
も良い。[0009] In the cleaning method may be characterized in that it has a higher cleaning Engineering for injecting further washing liquid composed mainly of completely fluorinated liquid to be cleaned.
【0010】また、別個の洗浄装置の発明は、炭化水素
系溶剤またはシリコン系溶剤から実質的に成る洗浄液を
用いて洗浄した被洗浄物を、完全フッ素化液体を主成分
とする濯ぎ洗浄液に浸漬する手段と、完全フッ素化液体
を主成分とする濯ぎ洗浄液を収納した洗浄槽と、少なく
とも蒸気発生用ヒーターと、蒸気冷却凝縮用の冷却コイ
ルと、蒸気の圧力制御用に開閉可能に設置された中蓋と
を具備し、完全フッ素化液体を主成分とする濯ぎ洗浄液
を収納した蒸気発生槽とを有することを特徴として成る
ものである。[0010] The invention of a separate cleaning device is a hydrocarbon
Cleaning solution consisting essentially of a system solvent or a silicon solvent
The object to be cleaned by washing with, complete means for immersing the perfluorinated liquid to rinse the cleaning solution mainly composed, a cleaning tank accommodating a rinsing cleaning liquid mainly containing fully fluorinated liquid, at least a steam generating heater A cooling coil for steam cooling and condensation, and a steam generating tank containing a rinse liquid containing a perfluorinated liquid as a main component, the tank including an openable / closable lid for controlling the pressure of steam. It is characterized by the following.
【0011】また、上記の洗浄装置において、前記洗浄
槽と前記蒸気発生槽は前記完全フッ素化液体を主成分と
する濯ぎ洗浄液の蒸気を供給する開閉弁を備えた供給口
を介して接続されているものであっても良い。In the above-described cleaning apparatus, the cleaning tank and the steam generating tank are connected via a supply port provided with an on-off valve for supplying a vapor of a rinsing cleaning liquid containing the perfluorinated liquid as a main component. May be available.
【0012】[0012]
【作用】本発明方法に於いて、シルクスクリーン、機械
部品、電子部品、プリント基板等の被洗浄物の濯ぎ洗浄
作業を行うには、まず第1に、非水溶系の可燃性溶剤を
用いて被洗浄物を洗浄し汚れを除去する。この洗浄は、
炭化水素系溶剤であっても良いし、洗浄目的に応じてシ
リコン系溶剤を用いるものであっても良い。In the method of the present invention, the rinsing operation of an object to be cleaned such as a silk screen, a mechanical part, an electronic part, a printed circuit board, etc. is performed by first using a non-aqueous flammable solvent. The object to be cleaned is washed to remove dirt. This wash
A hydrocarbon solvent may be used, or a silicon solvent may be used depending on the purpose of cleaning.
【0013】次に、上記の洗浄手段での洗浄により炭化
水素系溶剤またはシリコン系溶剤が付着した被洗浄物
を、完全フッ素化液体を主成分とする濯ぎ洗浄液が供給
される濯ぎ洗浄槽内に収納し、上記洗浄液が付着した被
洗浄物を、完全フッ素化液体を主成分とする濯ぎ洗浄液
に浸漬して濯ぎ洗浄を行う。Next, the object to be cleaned to which the hydrocarbon-based solvent or the silicon-based solvent has adhered by the above-described cleaning means is placed in a rinsing cleaning tank to which a rinsing cleaning liquid mainly containing a perfluorinated liquid is supplied. The object to be cleaned, which has been stored and to which the cleaning liquid is attached, is immersed in a rinsing cleaning liquid containing a perfluorinated liquid as a main component to perform rinsing cleaning.
【0014】この完全フッ素化液体を用いた濯ぎ洗浄
は、完全フッ素化液体を収納した洗浄槽に、被洗浄物を
浸漬して行うものである。この浸漬洗浄においては、超
音波振動、揺動等を加えて行うものであってもよい。The rinsing using the perfluorinated liquid is performed by immersing the object to be cleaned in a cleaning tank containing the perfluorinated liquid. This immersion cleaning may be performed by applying ultrasonic vibration, rocking or the like.
【0015】次に、この浸漬濯ぎ洗浄を行った被洗浄物
を、完全フッ素化液体を主成分とする濯ぎ蒸気で蒸気洗
浄を行う。この蒸気洗浄によって、被洗浄物に付着し凝
縮した濯ぎ洗浄液が、洗浄液を伴って被洗浄物から分離
することにより、被洗浄物から洗浄液を除去することが
できる。また、この蒸気洗浄においては、被洗浄物が蒸
気温度まで高められた時に、蒸気洗浄は完了し、被洗浄
物の乾燥が可能となるから、蒸気洗浄工程を乾燥工程と
することができる。Next, the object to be cleaned which has been subjected to the immersion rinsing cleaning is subjected to steam cleaning with rinsing steam containing a perfluorinated liquid as a main component. By the steam cleaning, the rinse liquid adhered to the object to be cleaned and condensed is separated from the object to be cleaned together with the cleaning liquid, whereby the cleaning liquid can be removed from the object to be cleaned. Further, in the steam cleaning, when the object to be cleaned is heated to the steam temperature, the steam cleaning is completed and the object to be cleaned can be dried, so that the steam cleaning step can be a drying step.
【0016】ここで蒸気洗浄に使用する濯ぎ洗浄液は、
完全フッ素化液体を主成分としたものを用いるが、完全
フッ素化液体は、構造中の炭素原子に結合し得るすべて
の置換基がフッ素原子である化合物である。しかしなが
ら、工業的生産においてこのような純粋物を得ることは
困難で、一部の不純物として、水素、塩素、臭素等が0.
5〜5.0wt%程度含まれるのは不可避なものであって、こ
れらは実用上全く問題のないものである。また完全フッ
素化液体は、不燃性、不活性、無毒、無臭で、安全性が
高く、実質的に塩素を含まないものであるから環境破壊
を生じることがない。The rinsing liquid used for the steam cleaning is as follows.
Although a liquid containing a perfluorinated liquid as a main component is used, a perfluorinated liquid is a compound in which all substituents capable of bonding to carbon atoms in the structure are fluorine atoms. However, it is difficult to obtain such a pure product in industrial production, and hydrogen, chlorine, bromine, etc., as some impurities, are not contained.
It is unavoidable that about 5 to 5.0 wt% is contained, and these are practically no problem at all. In addition, the perfluorinated liquid is nonflammable, inert, non-toxic, odorless, has high safety, and does not substantially contain chlorine, so that it does not cause environmental destruction.
【0017】したがって、完全フッ素化液体を主成分と
する濯ぎ洗浄液に、前記の洗浄液が混入しても、フッ素
系溶剤以外は溶解することがなく、後述するごとく、洗
浄液と濯ぎ洗浄液との分離を容易に行うことができる。Therefore, even if the above-mentioned cleaning solution is mixed with the rinsing cleaning solution containing a perfluorinated liquid as a main component, only the fluorinated solvent will not be dissolved, and separation of the cleaning solution and the rinsing cleaning solution will be described later. It can be done easily.
【0018】このような完全フッ素化液体としては、C
3F6、C4F8、C5F10、C6F12、C6F12O、C
6F14、C7F14、C7F14O、C7F16、C8F16O、C8
F18、C9F18O、C10F20O等の分子式で表すもの
や、Examples of such a fully fluorinated liquid include C
3 F 6, C 4 F 8 , C 5 F 10, C 6 F 12, C 6 F 12 O, C
6 F 14, C 7 F 14 , C 7 F 14 O, C 7 F 16, C 8 F 16 O, C 8
Those represented by molecular formulas such as F 18 , C 9 F 18 O, and C 10 F 20 O;
【0019】[0019]
【化1】 Embedded image
【0020】の構造を有するものが例示される。A structure having the following structure is exemplified.
【0021】次に、上記の完全フッ素化液体を主成分と
する濯ぎ洗浄により、被洗浄物に付着している、炭化水
素系溶剤またはシリコン系溶剤から成る洗浄液は、被洗
浄物から分離して濯ぎ洗浄液中に混入する。しかしなが
ら、完全フッ素化液体を主成分とする濯ぎ洗浄液は、不
活性であって、フッ素系溶剤以外の他の液体を溶解しな
いから、洗浄液と濯ぎ洗浄液とは容易に分離し、その各
々を回収することが可能となる。Next, by the rinsing cleaning mainly containing the above-mentioned perfluorinated liquid, the cleaning liquid consisting of a hydrocarbon solvent or a silicon-based solvent adhering to the object to be cleaned is separated from the object to be cleaned. Mix into rinse fluid. However, since the rinse liquid mainly containing the perfluorinated liquid is inert and does not dissolve other liquids other than the fluorinated solvent, the rinse liquid and the rinse liquid are easily separated and each of them is recovered. It becomes possible.
【0022】この回収は例えば、完全フッ素化液体は市
販の製品では、25℃に於いての比重が、約1.6〜2.
0であるが、炭化水素系溶剤またはシリコン系溶剤から
成る洗浄液は、完全フッ素化液体よりも遥かに比重が軽
いものである。そのため、この比重の差によって完全フ
ッ素化液体を沈降させ、洗浄液と濯ぎ洗浄液を分離する
ことがでる。また、この比重の差を利用し、遠心分離法
により洗浄液と濯ぎ洗浄液とを分離してもよい。また洗
浄液と濯ぎ洗浄液の沸点の差を利用し、蒸留再生を行っ
て洗浄液と濯ぎ洗浄液とを再生してもよい。This recovery can be achieved, for example, by using a commercially available product of a perfluorinated liquid having a specific gravity at 25 ° C. of about 1.6 to 2.
Although it is 0, the cleaning liquid composed of the hydrocarbon-based solvent or the silicon-based solvent has a much lower specific gravity than the perfluorinated liquid. Therefore, the perfluorinated liquid is settled by the difference in specific gravity, and the cleaning liquid and the rinsing cleaning liquid can be separated. Further, by utilizing this difference in specific gravity, the washing solution and the rinsing washing solution may be separated by a centrifugal separation method. In addition, by utilizing the difference in boiling point between the cleaning liquid and the rinsing cleaning liquid, distillation regeneration may be performed to regenerate the cleaning liquid and the rinsing cleaning liquid.
【0023】このように、従来の水を使用した濯ぎ洗浄
のごとく、被洗浄物に付着している洗浄液が、排水とと
もにそのまま廃棄されるような事がなく、洗浄液および
濯ぎ洗浄液の確実な回収が可能となり、これを再生して
洗浄液の消費量を極めて少なくし、洗浄作業を経済的な
ものにするとともに、排水処理施設を不要とするか、極
めて簡略化することが可能となる。As described above, unlike the conventional rinsing cleaning using water, the cleaning liquid adhering to the object to be cleaned is not discarded as it is together with the waste water, and the recovery of the cleaning liquid and the rinsing cleaning liquid can be reliably performed. This makes it possible to regenerate the wastewater, thereby greatly reducing the consumption of the cleaning liquid, making the cleaning operation economical, and eliminating or extremely simplifying the wastewater treatment facility.
【0024】また、更に他の発明においては、炭化水素
系溶剤またはシリコン系溶剤から成る洗浄液が付着した
被洗浄物を、完全フッ素化液体を主成分とする濯ぎ洗浄
液にて濯ぎ洗浄するのに、被洗浄物に濯ぎ洗浄液を噴射
して行う。この濯ぎ洗浄液は、被洗浄物に付着した炭化
水素系溶剤またはシリコン系溶剤から成る洗浄液を、被
洗浄物にノズルから加圧噴射するか、シャワー状に吹き
付ける事により行う。この濯ぎ洗浄液の噴射により被洗
浄物に付着した洗浄液は、その殆どが濯ぎ洗浄液の物理
的圧力、表面張力による一体化等によって除去される。In still another aspect of the present invention, an object to be cleaned to which a cleaning liquid comprising a hydrocarbon solvent or a silicon solvent has adhered is rinsed and washed with a rinsing liquid mainly containing a perfluorinated liquid. The cleaning is performed by spraying a rinse liquid onto the object to be cleaned. This rinsing cleaning liquid is performed by spraying a cleaning liquid composed of a hydrocarbon-based solvent or a silicon-based solvent adhered to the object to be cleaned from the nozzle under pressure or spraying it in a shower. Most of the cleaning liquid adhered to the object to be cleaned by spraying the rinsing cleaning liquid is removed by physical pressure of the rinsing cleaning liquid, integration by surface tension, or the like.
【0025】そして、濯ぎ洗浄液と混合した、炭化水素
系溶剤またはシリコン系溶剤から成る洗浄液は、フッ素
系溶剤以外は、濯ぎ洗浄液に溶解することがないから、
時間の経過により比重差で水と分離させたり、遠心分離
法により分離させたり、蒸留再生することでき、洗浄液
も、濯ぎ洗浄液もそのまま再利用することが可能とな
り、経済的であるばかりでなく、排水による公害等の問
題を生じることがない。[0025] The cleaning liquid comprising a hydrocarbon-based solvent or a silicon-based solvent mixed with the rinsing cleaning liquid does not dissolve in the rinsing cleaning liquid except for the fluorine-based solvent.
It can be separated from water with a difference in specific gravity over time, or separated by centrifugation, can be regenerated by distillation, and the washing solution can be reused as it is, not only economically, but also economically, There is no problem such as pollution caused by drainage.
【0026】[0026]
【実施例】以下本発明の一実施例を第1図において説明
すれば、(1)は洗浄槽で、完全フッ素化液体を主成分と
する濯ぎ洗浄液(2)を収納している。そして同じく完全
フッ素化液体を主成分とする濯ぎ洗浄液(2)を収納し
た、蒸気発生槽(3)と分離して形成している。そして、
この蒸気発生槽(3)の濯ぎ洗浄液(2)中には、蒸気発生
用のヒーター(4)を設置する。また、蒸気発生槽(3)の
上部内面には、不燃性の蒸気(5)の冷却凝縮を行う冷却
コイル(6)を設け、この冷却コイル(6)と、充填した濯
ぎ洗浄液(2)との間に、適宜の重量を有する中蓋(7)
を、開閉可能に設置し、不燃性の蒸気(5)の圧力制御を
行っている。DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to FIG. 1. (1) is a cleaning tank containing a rinsing cleaning liquid (2) containing a perfluorinated liquid as a main component. And it is formed separately from the steam generating tank (3) which also contains the rinsing and cleaning liquid (2) mainly composed of a perfluorinated liquid. And
A heater (4) for generating steam is provided in the rinsing liquid (2) of the steam generating tank (3). Further, a cooling coil (6) for cooling and condensing the non-combustible steam (5) is provided on the inner surface of the upper part of the steam generating tank (3), and the cooling coil (6) and the filled rinse fluid (2) are provided. Between the inner lid (7) having the appropriate weight
Is installed so as to be openable and closable to control the pressure of the nonflammable steam (5).
【0027】そしてこの蒸気発生槽(3)は、開閉弁(8)
を備えた供給口(10)を介して洗浄槽(1)に接続し、完
全フッ素化液体を主成分とする濯ぎ洗浄液(2)の蒸気
(5)を供給可能としている。またこの洗浄槽(1)は、蒸
気発生槽(3)側に、エアーシリンダーやオイルシリンダ
ー等を用いた上下動手段(11)を位置している。そし
て、この上下動手段(11)に上下動杆(12)を接続し、
この上下動杆(12)の下端に固定した洗浄台(13)を上
下動可能としている。また洗浄槽(1)の上部には、濯ぎ
洗浄液(2)の蒸気(5)の凝縮を行う冷却コイル(14)を
介して被洗浄物(15)の出入部(16)を設け、この出入
部(16)には、被洗浄物(15)を出入するための出入口
(17)を形成するとともにこの出入口(17)を、シャッ
ター(18)により閉止可能としている。また出入口(1
7)には、被洗浄物(15)を載置するための載置台(2
0)を設けている。尚図中(21)は水分分離器である。The steam generating tank (3) is provided with an on-off valve (8).
Is connected to the cleaning tank (1) through a supply port (10) provided with a gas, and the vapor of the rinsing cleaning liquid (2) containing a perfluorinated liquid as a main component.
(5) can be supplied. The washing tank (1) is provided with a vertical moving means (11) using an air cylinder, an oil cylinder, etc., on the side of the steam generating tank (3). Then, a vertically moving rod (12) is connected to the vertically moving means (11),
The washing table (13) fixed to the lower end of the vertically movable rod (12) can be moved up and down. In addition, an inlet / outlet (16) for an object to be cleaned (15) is provided at an upper portion of the cleaning tank (1) through a cooling coil (14) for condensing vapor (5) of the rinsing liquid (2). In the section (16), an entrance for entering and exiting the object to be cleaned (15)
(17) is formed, and the entrance (17) can be closed by a shutter (18). In addition, doorway (1
7), a mounting table (2) for mounting an object to be cleaned (15).
0) is provided. (21) in the figure is a water separator.
【0028】上述のごとく構成したものにおいて、濯ぎ
洗浄を行うには、炭化水素系溶剤またはシリコン系溶剤
で洗浄を行い、これらの溶剤を付着した被洗浄物(15)
を、完全フッ素化液体を主成分とする濯ぎ洗浄液(2)に
浸漬する。この浸漬は、載置台(20)から出入口(17)
を介して出入部(16)に被洗浄物(15)を挿入し、上下
動手段(11)を上昇作動して、洗浄台(13)を出入部
(16)に位置し、この洗浄台(13)に被洗浄物(15)を
のせて濯ぎ洗浄液(2)まで下降して行う。この濯ぎ洗浄
液(2)への浸漬による洗浄は、洗浄台(13)を小刻みに
上下動して行っても良いし、超音波振動子(22)を作動
し超音波洗浄を行っても良い。In the apparatus constructed as described above, in order to carry out rinsing cleaning, cleaning is performed with a hydrocarbon-based solvent or a silicon-based solvent, and the object to be cleaned (15) to which these solvents are adhered.
Is immersed in a rinse liquid (2) containing a perfluorinated liquid as a main component. This immersion is performed from the mounting table (20) to the entrance (17).
The object to be cleaned (15) is inserted into the entrance (16) through the, and the vertical movement means (11) is moved up to move the cleaning table (13) into and out of the entrance.
The cleaning object (15) is placed on the cleaning stand (13), and the cleaning is performed by descending to the rinsing cleaning liquid (2). The cleaning by immersion in the rinsing cleaning liquid (2) may be performed by moving the cleaning table (13) up and down little by little, or by performing ultrasonic cleaning by operating the ultrasonic vibrator (22).
【0029】また、炭化水素系溶剤またはシリコン系溶
剤にて洗浄した被洗浄物の濯ぎ洗浄は、上記のごとく濯
ぎ洗浄液(2)に浸漬して行う浸漬濯ぎ洗浄に加えて蒸気
洗浄による濯ぎを行う。The rinsing of the object to be cleaned which has been cleaned with a hydrocarbon solvent or a silicon solvent is performed by steam cleaning in addition to the immersion rinsing performed by immersion in the rinsing cleaning liquid (2) as described above. .
【0030】蒸気洗浄による濯ぎは、蒸気発生槽(3)で
発生させた蒸気を開閉弁(8)を開放して洗浄槽(1)に導
入して行う。Rinsing by steam cleaning is performed by introducing the steam generated in the steam generating tank (3) into the cleaning tank (1) by opening the on-off valve (8).
【0031】また、炭化水素系溶剤またはシリコン系溶
剤にて洗浄した被洗浄物の濯ぎ洗浄は、上記の浸漬濯ぎ
洗浄、蒸気濯ぎ洗浄に加えて、完全フッ素化液体を主成
分とする濯ぎ洗浄液を噴射して行うことができる。The rinsing of the object to be cleaned, which has been cleaned with a hydrocarbon-based solvent or a silicon-based solvent, is performed in addition to the above-described immersion rinsing cleaning and steam rinsing cleaning. It can be done by spraying.
【0032】この完全フッ素化液体を主成分とする濯ぎ
洗浄液(2)を被洗浄物(15)に噴射して行う洗浄は、図
2に示すごとく洗浄槽(1)の上端開口(23)を蓋体(2
4)で閉止するとともに、完全フッ素化液体を主成分と
する濯ぎ洗浄液(2)を充填した濯ぎ溶剤槽(25)と洗浄
槽(1)の下底とを、連通路(26)により接続している。The cleaning performed by spraying the rinsing cleaning liquid (2) containing the perfluorinated liquid as a main component onto the object (15) to be cleaned is performed by opening the upper end opening (23) of the cleaning tank (1) as shown in FIG. Lid (2
Closed in 4), the rinsing solvent tank (25) filled with the rinsing cleaning liquid (2) containing a perfluorinated liquid as a main component and the lower bottom of the cleaning tank (1) are connected by a communication path (26). ing.
【0033】また、洗浄槽(1)の内面には、濯ぎ洗浄液
(2)の噴射ノズル(27)を形成している。この噴射ノズ
ル(27)には、濯ぎ溶剤槽(25)と連通した噴射ポンプ
(28)を、導出管(29)を介して接続し、この噴射ポン
プ(28)で、高圧の濯ぎ洗浄液(2)を噴射ノズル(27)
に供給噴射して、被洗浄物(15)の濯ぎ洗浄を可能とし
ている。A rinsing cleaning liquid is provided on the inner surface of the cleaning tank (1).
The injection nozzle (27) of (2) is formed. The injection nozzle (27) has an injection pump connected to the rinsing solvent tank (25).
(28) is connected through an outlet pipe (29), and the high-pressure rinsing cleaning liquid (2) is injected by the injection pump (28) into the injection nozzle (27).
To be rinsed, thereby enabling the object (15) to be rinsed and cleaned.
【0034】上述のごとく構成したものに於いて、被洗
浄物(15)の濯ぎ洗浄を行うには、被洗浄物(15)を濯
ぎ洗浄槽(2)に挿入した後、被洗浄物(15)に臨ませて
噴射ノズル(27)から、濯ぎ洗浄液(2)を高圧で被洗浄
物(15)に噴射する。この噴射により、濯ぎ洗浄液(2)
は被洗浄物(15)に接触し、被洗浄物(15)の洗浄を行
う。In the above-described structure, the rinsing of the object (15) is performed by inserting the object (15) into the rinsing tank (2) and then rinsing the object (15). ), The rinsing cleaning liquid (2) is jetted at a high pressure onto the article (15) to be cleaned from the jet nozzle (27). By this injection, the rinse liquid (2)
Contacts the object to be cleaned (15) and cleans the object to be cleaned (15).
【0035】また、この濯ぎ洗浄によって、完全フッ素
化液体を主成分とする濯ぎ洗浄液(2)中に混入した、炭
化水素系溶剤またはシリコン系溶剤から成る洗浄液は、
完全フッ素化液体を主成分とする濯ぎ洗浄液(2)よりも
比重が軽いため、洗浄槽(1)の上層に位置するものとな
り分離回収を容易とする。Further, by this rinsing cleaning, the cleaning liquid composed of a hydrocarbon-based solvent or a silicon-based solvent mixed into the rinsing cleaning liquid (2) containing a perfluorinated liquid as a main component:
Since the specific gravity is lower than that of the rinse liquid (2) containing a perfluorinated liquid as a main component, the liquid is located in the upper layer of the cleaning tank (1), thereby facilitating separation and recovery.
【0036】[0036]
【発明の効果】本発明は上述のごとく、環境汚染防止の
ため、フロンや塩素系溶剤を用いずに、シリコン系溶
剤、炭化水素系溶剤等の非水溶系溶剤を洗浄液として用
いながら、濯ぎ洗浄作業においては、完全フッ素化液体
を主成分とする濯ぎ洗浄液を使用するから引火の危険が
ない。According to the present invention, as described above, in order to prevent environmental pollution, rinsing and washing are performed using non-aqueous solvents such as silicon solvents and hydrocarbon solvents as cleaning liquids without using chlorofluorocarbon or chlorine solvents. In operation, there is no danger of ignition due to the use of a rinsing and cleaning liquid containing a perfluorinated liquid as a main component.
【0037】また、洗浄液の回収を確実に行うことが可
能で、経済的であるばかりでなく、大気汚染、引火の危
険性等がない、安全で確実な濯ぎ洗浄を可能にするもの
である。Further, it is possible to reliably collect the cleaning liquid, and it is economical, and also enables safe and reliable rinsing without any risk of air pollution and ignition.
【図1】断面図、FIG. 1 is a sectional view,
【図2】異なる実施例の断面図。FIG. 2 is a cross-sectional view of another embodiment.
1 洗浄槽 2 濯ぎ洗浄液 3 蒸気発生槽 4 ヒーター 5 蒸気 6 冷却コイル 7 中蓋 DESCRIPTION OF SYMBOLS 1 Cleaning tank 2 Rinse cleaning liquid 3 Steam generation tank 4 Heater 5 Steam 6 Cooling coil 7 Inner lid
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI C11D 17/00 C11D 17/00 H05K 3/26 H05K 3/26 (72)発明者 今城 康隆 東京都港区芝浦1丁目1番1号 株式会 社東芝本社事務所内────────────────────────────────────────────────── ─── Continued on the front page (51) Int.Cl. 7 Identification code FI C11D 17/00 C11D 17/00 H05K 3/26 H05K 3/26 (72) Inventor Yasutaka Imajo 1-chome, Shibaura, Minato-ku, Tokyo No. 1 Inside the Toshiba head office
Claims (4)
ら実質的に成る洗浄液を用いて被洗浄物を洗浄する洗浄
工程と、この洗浄液が付着した被洗浄物を、完全フッ素
化液体を主成分とする濯ぎ洗浄液に浸漬して濯ぎ洗浄す
る濯ぎ工程と、前記濯ぎ洗浄後の被洗浄物を、完全フッ
素化液体を主成分とする濯ぎ蒸気を用い、被洗浄物が蒸
気温度に到達するまでは、被洗浄物に濯ぎ蒸気を付着し
凝縮させることにより、前記濯ぎ洗浄液が前記洗浄工程
の洗浄液を伴って、被洗浄物から洗浄液を分離除去し、
蒸気温度に到達した時に、被洗浄物を乾燥させる蒸気洗
浄工程とを有することを特徴とする被洗浄物の濯ぎ洗浄
方法。1. A cleaning step of cleaning an object to be cleaned using a cleaning liquid substantially consisting of a hydrocarbon-based solvent or a silicon-based solvent; A rinsing step of immersing and rinsing in the rinsing liquid to be rinsed, and the object to be cleaned after the rinsing, using a rinsing steam containing a perfluorinated liquid as a main component, until the object to be cleaned reaches the vapor temperature, by adhering the vapor rinse the object to be cleaned condensate, said rinsing wash solution is accompanied by the cleaning liquid of the cleaning process, the cleaning liquid is separated and removed from the object to be cleaned,
A rinsing step of drying the object to be cleaned when the temperature of the object reaches the steam temperature.
に被洗浄物に完全フッ素化液体を主成分とする洗浄液を
噴射する洗浄工程を有することを特徴とする被洗浄物の
濯ぎ洗浄方法。2. A method of cleaning according to claim 1, wherein rinsing method object to be cleaned, characterized in that it comprises a higher cleaning Engineering for injecting further washing liquid composed mainly of completely fluorinated liquid to be cleaned.
実質的に成る洗浄液を用いて洗浄した被洗浄物を、完全
フッ素化液体を主成分とする濯ぎ洗浄液に浸漬する手段
と、完全フッ素化液体を主成分とする濯ぎ洗浄液を収納
した洗浄槽と、少なくとも蒸気発生用ヒーターと、蒸気
冷却凝縮用の冷却コイルと、蒸気の圧力制御用に開閉可
能に設置された中蓋とを具備し、完全フッ素化液体を主
成分とする濯ぎ洗浄液を収納した蒸気発生槽とを有する
ことを特徴とする被洗浄物の濯ぎ洗浄装置。3. A hydrocarbon solvent or a silicon solvent.
The object to be cleaned by washing with a cleaning solution consisting essentially of, and means for immersing the rinse cleaning liquid mainly composed of fully fluorinated liquid, a cleaning tank accommodating a rinsing cleaning liquid mainly containing fully fluorinated liquid At least a heater for steam generation, a cooling coil for steam cooling and condensation, and an inner lid openably and closably provided for controlling pressure of steam, and containing a rinse liquid mainly containing a perfluorinated liquid. An apparatus for rinsing and cleaning an object to be cleaned, comprising a steam generating tank.
浄槽と前記蒸気発生槽は前記完全フッ素化液体を主成分
とする濯ぎ洗浄液の蒸気を供給する開閉弁を備えた供給
口を介して接続されていることを特徴とする被洗浄物の
濯ぎ洗浄装置。4. The cleaning apparatus according to claim 3, wherein the cleaning tank and the steam generating tank are connected via a supply port provided with an on-off valve for supplying steam of the rinsing cleaning liquid containing the perfluorinated liquid as a main component. A rinsing and cleaning apparatus for an object to be cleaned, which is connected.
Priority Applications (16)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03020471A JP3105271B2 (en) | 1991-01-21 | 1991-01-21 | Method and apparatus for rinsing and cleaning an object to be cleaned |
| DK91914665.4T DK0496899T3 (en) | 1990-08-22 | 1991-08-22 | Cleaning process |
| PCT/JP1991/001113 WO1992003205A1 (en) | 1990-08-22 | 1991-08-22 | Method and device for cleaning |
| AU83936/91A AU654297B2 (en) | 1990-08-22 | 1991-08-22 | Method and device for cleaning |
| SG1996009217A SG49923A1 (en) | 1990-08-22 | 1991-08-22 | Cleaning method and cleaning apparatus |
| EP91914665A EP0496899B1 (en) | 1990-08-22 | 1991-08-22 | Method for cleaning |
| SU915052031A RU2095162C1 (en) | 1990-08-22 | 1991-08-22 | Method of cleansing parts |
| DE69122740T DE69122740T2 (en) | 1990-08-22 | 1991-08-22 | CLEANING PROCEDURE |
| CA002066753A CA2066753A1 (en) | 1990-08-22 | 1991-08-22 | Cleaning method and cleaning apparatus |
| ES91914665T ES2095949T3 (en) | 1990-08-22 | 1991-08-22 | CLEANING METHOD. |
| KR92700929A KR0121453B1 (en) | 1990-08-22 | 1992-04-22 | Method for cleaning |
| AU72842/94A AU7284294A (en) | 1990-08-22 | 1994-09-09 | Cleaning method and cleaning apparatus |
| AU72840/94A AU660880B2 (en) | 1990-08-22 | 1994-09-09 | Cleaning method and cleaning apparatus |
| US08/355,312 US5593507A (en) | 1990-08-22 | 1994-12-12 | Cleaning method and cleaning apparatus |
| US08/454,729 US5823210A (en) | 1990-08-22 | 1995-05-31 | Cleaning method and cleaning apparatus |
| US08/455,890 US5690750A (en) | 1990-08-20 | 1995-05-31 | Cleaning method and cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03020471A JP3105271B2 (en) | 1991-01-21 | 1991-01-21 | Method and apparatus for rinsing and cleaning an object to be cleaned |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH06184778A JPH06184778A (en) | 1994-07-05 |
| JP3105271B2 true JP3105271B2 (en) | 2000-10-30 |
Family
ID=12028018
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP03020471A Expired - Lifetime JP3105271B2 (en) | 1990-08-20 | 1991-01-21 | Method and apparatus for rinsing and cleaning an object to be cleaned |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3105271B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100108094A1 (en) | 2005-07-29 | 2010-05-06 | Junichi Ishikawa | Solvent Composition for Removing Radioactive Substance and Removing Material, and Method for Removing Radioactive Substance |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4640719A (en) * | 1985-07-01 | 1987-02-03 | Petroleum Fermentations N.V. | Method for printed circuit board and/or printed wiring board cleaning |
| JPH0334312Y2 (en) * | 1986-08-30 | 1991-07-19 | ||
| GB2220951B (en) * | 1988-07-08 | 1992-09-16 | Isc Chemicals Ltd | Cleaning and drying of electronic assemblies |
| JPH02285083A (en) * | 1989-04-25 | 1990-11-22 | Hiroshi Nishiyama | Automatic rotary barrel-type cleaning device |
| JPH04161280A (en) * | 1990-10-23 | 1992-06-04 | Sumitomo 3M Ltd | Method for washing and drying article |
-
1991
- 1991-01-21 JP JP03020471A patent/JP3105271B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH06184778A (en) | 1994-07-05 |
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